Low-reflection anti-dazzle high-transmittance conductive glass and preparation method thereof

Abstract

The application discloses a kind of low reflection anti-dazzle high-transmittance conductive glass and preparation method thereof.Conductive glass includes ITO conductive glass substrate and the antireflection anti-dazzle coating coated on its surface;Its preparation method includes: first, ITO substrate is washed and oxygen plasma activation treatment;Then, prepare antireflection anti-dazzle auxiliary agent, the auxiliary agent is formed by tetraethyl orthosilicate, Pluronic F127 and silane coupling agent in ethanol solution Compound;Subsequently, the auxiliary agent is uniformly coated on the surface of activated substrate by spin coating method, to form wet film;Finally, low-temperature pre-curing and programmed temperature high-temperature heat treatment are sequentially carried out, to obtain the final product.The application forms coating with specific micro-nano porous structure by template agent, while significantly reducing surface reflectivity, realizing moderate light scattering haze and high transmittance, and maintaining good conductivity of substrate, and the coating has strong adhesion and excellent moisture and heat aging resistance.

Description

Technical Field

[0001] This invention relates to the field of photovoltaic and new energy technology, and in particular to a low-reflection, anti-glare, high-transmission conductive glass and its preparation method. Background Technology

[0002] In the field of photovoltaic and new energy technology, conductive glass, as a key fundamental material for optoelectronic devices, directly affects the photoelectric conversion efficiency and visual display effect of the entire device due to its optical performance. Currently, conventional conductive glasses on the market (such as ITO glass and FTO glass) possess good conductivity and a certain degree of light transmittance, but their surfaces have high light reflectivity (typically above 4%). Under strong light, this easily produces noticeable specular glare, causing not only the loss of incident light and reduced light energy utilization, but also affecting viewing comfort and display clarity. Especially in applications with extremely stringent light management requirements, such as high-efficiency solar cells, high-end display panels, and touch devices, achieving low reflectivity, anti-glare, and high transmittance simultaneously has become one of the core requirements for improving product performance.

[0003] Existing technologies typically employ the preparation of antireflective coatings or the construction of surface microstructures on the glass surface. For example, single-layer or multi-layer antireflective films are prepared using sol-gel methods, chemical vapor deposition, or physical vapor deposition, utilizing the principle of optical interference to reduce reflection. However, these methods are often complex and costly, and it is sometimes difficult to simultaneously achieve both mechanical strength and durability of the film. Another approach is to create a rough structure on the glass surface through chemical etching or physical grinding to achieve light scattering and thus anti-glare. However, this method often leads to a decrease in transmittance and may damage the conductive layer of the substrate, making it difficult to achieve a comprehensive improvement in optical performance.

[0004] Therefore, developing a conductive glass surface treatment technology that is relatively simple in process, cost-controllable, and can synergistically optimize low reflection, anti-glare, and high transmission performance has significant application value and market prospects. Summary of the Invention

[0005] To address the aforementioned problems, this invention proposes a low-reflection, anti-glare, high-transmittance conductive glass and its preparation method, which solves the comprehensive technical problems of high reflection, easy glare, and the need to improve transmittance in the optical performance of existing conductive glasses.

[0006] This invention can be achieved through the following technical solutions: A method for preparing low-reflection, anti-glare, high-transmission conductive glass includes the following steps: Step 1: Clean the conductive glass with deionized water, then ultrasonically treat the conductive glass with ethanol, sodium hydroxide, hydrochloric acid and deionized water in sequence for 15-30 minutes, dry it in an oven at 80-100℃, and then perform activation treatment. Step 2: Apply the anti-reflective and anti-glare agent to one surface of the conductive glass substrate to form a wet film; Step 3: Perform low-temperature pre-curing and high-temperature heat treatment on the wet film on the surface of the conductive glass to obtain low-reflection, anti-glare, and high-transmission conductive glass.

[0007] Preferably, the activation treatment in step 1 specifically involves placing the conductive glass in an oxygen plasma cleaner and treating it at a power of 100-300W for 2-10 minutes to complete surface activation.

[0008] Preferably, the preparation method of the anti-reflective and anti-glare agent in step 2 is as follows: Add tetraethyl orthosilicate, anhydrous ethanol, deionized water and hydrochloric acid to a beaker, mix, place in a flask equipped with a reflux condenser, and stir and reflux in a water bath at 60-70°C for 1.5-3 hours to obtain a hydrolyzed silica sol; add Pluronic F127, 3-(methacryloyloxy)propyltrimethoxysilane, methyltriethoxysilane and anhydrous ethanol to another beaker, stir for 30-60 minutes, then add the hydrolyzed silica sol dropwise, and then stir and age at 20-28°C for 24-72 hours to obtain the anti-reflective and anti-glare agent.

[0009] Preferably, in step 2, the coating is applied using a spin coating method with a rotation speed of 2000-3000 rpm and a time of 30 seconds.

[0010] Preferably, in step 3, the low-temperature pre-curing is carried out in an oven at 100°C for 1 hour; the high-temperature heat treatment is carried out in a muffle furnace, with the temperature programmed to rise to 400°C at a rate of 2-5°C / min, and held at this temperature for 2 hours, and then cooled to room temperature with the furnace.

[0011] Preferably, the molar ratio of the tetraethyl orthosilicate, anhydrous ethanol, deionized water and hydrochloric acid is 1:(3-5):(3-5):(0.005-0.02).

[0012] Preferably, the mass concentration of Pluronic F127 in the ethanol solution is 1.0%-3.0%.

[0013] Preferably, the molar ratio of 3-(methacryloyloxy)propyltrimethoxysilane to methyltriethoxysilane is (15-35):(5-15).

[0014] The beneficial effects of this invention are: This invention constructs a functional coating on the surface of ITO conductive glass by preparing an anti-reflective and anti-glare additive and optimizing the coating and heat treatment processes. This additive is based on tetraethyl orthosilicate hydrolyzed silica sol, using the block copolymer Pluronic F127 as a soft template, and works synergistically with a silane coupling agent. During the sol-gel process and subsequent heat treatment, it self-assembles to form a coating with a controllable micro / nano porous structure. This structure not only significantly reduces surface reflectivity (<2.2%) optically through precise matching of porosity and refractive index, but also achieves an appropriate roughness (Ra>78 nm) that forms effective light scattering centers, resulting in moderate haze (4.8%-7.1%). Thus, while ensuring an average visible light transmittance exceeding 91.9%, it resolves the inherent contradiction between high transmittance and anti-glare. Furthermore, the plasma surface activation pretreatment greatly enhances the interfacial adhesion between the coating and the ITO substrate. This not only ensures the coating's excellent mechanical adhesion and durability (minimal performance degradation after aging at 85℃ / 85%RH for 1000h), but also effectively suppresses the damage to the underlying ITO conductive layer during the heat treatment process, keeping the sheet resistance increase within 8.8%. This achieves a synergistic optimization of comprehensive improvement in optical performance and good maintenance of conductivity. Attached Figure Description

[0015] The accompanying drawings are provided to further illustrate the invention and form part of the specification. They are used in conjunction with embodiments of the invention to explain the invention and do not constitute a limitation thereof. In the drawings: Figure 1 The optical properties of conductive glass; Figure 2 The surface roughness of the conductive glass; Figure 3 The electrical properties of conductive glass. Detailed Implementation

[0016] The following provides a detailed description of the embodiments of the present invention: These embodiments are implemented based on the technical solution of the present invention, and provide detailed implementation methods and processes. However, the scope of protection of the present invention is not limited to the following embodiments. Experimental methods in the following embodiments that do not specify specific conditions are generally performed under conventional conditions.

[0017] Example 1: A method for preparing low-reflection, anti-glare, high-transmission conductive glass, comprising the following steps: Step 1: Add 0.1 mol tetraethyl orthosilicate, 17.5 mL anhydrous ethanol, 5.4 mL deionized water and 0.5 mmol hydrochloric acid to a beaker, mix, place in a flask equipped with a reflux condenser, and stir and reflux in a 60°C water bath for 3 hours to obtain hydrolyzed silica sol; add 0.4 g Pluronic F127, 0.15 mol 3-(methacryloyloxy)propyltrimethoxysilane, 0.5 mol methyltriethoxysilane and 50 mL anhydrous ethanol to another beaker, stir for 30 min, then add the hydrolyzed silica sol dropwise, and then stir and age at 20°C for 72 hours to obtain an anti-reflective and anti-glare additive; Step 2: Clean the ITO conductive glass with deionized water, then use ethanol, 1.0M sodium hydroxide, 1.0M hydrochloric acid and deionized water to ultrasonically treat the ITO conductive glass for 15 minutes in sequence, dry it in an 80℃ oven, and then put it into an oxygen plasma cleaner and treat it at 100W power for 10 minutes to complete the surface activation. Step 3: Fix the ITO conductive glass on the spin coater, use a dropper to add the anti-reflective and anti-glare additive to the center of the glass surface, start the spin coater, rotate at 500 rpm for 10 seconds to spread the sol, then accelerate to 2000 rpm for 30 seconds to form a uniform wet film. Step 4: Place the wet film on the surface of the ITO conductive glass in a 100℃ oven for 1 hour to pre-cur it, then place it in a muffle furnace and heat it to 400℃ at a rate of 2℃ / min, and hold it at this temperature for 2 hours. Then cool it to room temperature with the furnace to obtain low-reflection anti-glare high-transmission conductive glass.

[0018] Example 2: A method for preparing low-reflection, anti-glare, high-transmission conductive glass, comprising the following steps: Step 1: Add 0.1 mol tetraethyl orthosilicate, 23.35 mL anhydrous ethanol, 7.2 mL deionized water, and 1.25 mmol hydrochloric acid to a beaker, mix, and place in a flask equipped with a reflux condenser. Stir and reflux in a 75°C water bath for 2.25 h to obtain hydrolyzed silica sol. In another beaker, add 0.8 g Pluronic F127, 0.25 mol 3-(methacryloyloxy)propyltrimethoxysilane, 0.1 mol methyltriethoxysilane, and 50 mL anhydrous ethanol, stir for 45 min, then add the hydrolyzed silica sol dropwise, and then stir and age at 24°C for 48 h to obtain an anti-reflective and anti-glare additive. Step 2: Clean the ITO conductive glass with deionized water, then use ethanol, 1.0M sodium hydroxide, 1.0M hydrochloric acid and deionized water in sequence to ultrasonically treat the ITO conductive glass for 22.5 min, dry it in an oven at 90℃, and then put it into an oxygen plasma cleaner and treat it at 200W power for 6 min to complete the surface activation. Step 3: Fix the ITO conductive glass on the spin coater, use a dropper to add the anti-reflective and anti-glare additive to the center of the glass surface, start the spin coater, rotate at 500 rpm for 10 seconds to spread the sol, then accelerate to 2500 rpm for 30 seconds to form a uniform wet film. Step 4: Place the wet film on the surface of the ITO conductive glass in a 100℃ oven for pre-curing for 1 hour, then place it in a muffle furnace and program the temperature to 400℃ at a rate of 3.5℃ / min, and hold it at this temperature for 2 hours. Then cool it to room temperature with the furnace to obtain low-reflection anti-glare high-transmission conductive glass.

[0019] Example 3: A method for preparing low-reflection, anti-glare, high-transmission conductive glass, comprising the following steps: Step 1: Add 0.1 mol tetraethyl orthosilicate, 29.2 mL anhydrous ethanol, 9 mL deionized water, and 2 mmol hydrochloric acid to a beaker, mix, and place in a flask equipped with a reflux condenser. Stir and reflux in a 70°C water bath for 1.5 h to obtain hydrolyzed silica sol. In another beaker, add 1.2 g Pluronic F127, 0.35 mol 3-(methacryloyloxy)propyltrimethoxysilane, 0.15 mol methyltriethoxysilane, and 50 mL anhydrous ethanol, stir for 60 min, then add the hydrolyzed silica sol dropwise, and then stir and age at 28°C for 24 h to obtain an anti-reflective and anti-glare additive. Step 2: Clean the ITO conductive glass with deionized water, then use ethanol, 1.0M sodium hydroxide, 1.0M hydrochloric acid and deionized water in sequence to ultrasonically treat the ITO conductive glass for 30 minutes, dry it in an oven at 100℃, and then put it into an oxygen plasma cleaner and treat it at 300W power for 2 minutes to complete the surface activation. Step 3: Fix the ITO conductive glass on the spin coater, use a dropper to add the anti-reflective and anti-glare additive to the center of the glass surface, start the spin coater, rotate at 500 rpm for 10 seconds to spread the sol, then accelerate to 3000 rpm for 30 seconds to form a uniform wet film. Step 4: Place the wet film on the surface of the ITO conductive glass in a 100℃ oven for 1 hour to pre-cur it, then place it in a muffle furnace and heat it to 400℃ at a rate of 5℃ / min, and hold it at this temperature for 2 hours. Then cool it to room temperature with the furnace to obtain low-reflection anti-glare high-transmission conductive glass.

[0020] Example 4: A method for preparing low-reflection, anti-glare, high-transmission conductive glass, comprising the following steps: Step 1: Add 0.1 mol tetraethyl orthosilicate, 17.5 mL anhydrous ethanol, 9 mL deionized water, and 2 mmol hydrochloric acid to a beaker, mix, and place in a flask equipped with a reflux condenser. Stir and reflux in a 70°C water bath for 3 hours to obtain hydrolyzed silica sol. In another beaker, add 0.4 g Pluronic F127, 0.35 mol 3-(methacryloyloxy)propyltrimethoxysilane, 0.15 mol methyltriethoxysilane, and 50 mL anhydrous ethanol, stir for 60 min, then add the hydrolyzed silica sol dropwise, and then stir and age at 28°C for 24 hours to obtain an anti-reflective and anti-glare agent. Step 2: Clean the ITO conductive glass with deionized water, then use ethanol, 1.0M sodium hydroxide, 1.0M hydrochloric acid and deionized water to ultrasonically treat the ITO conductive glass for 15 minutes in sequence, dry it in an oven at 100℃, and then put it into an oxygen plasma cleaner and treat it at 300W power for 10 minutes to complete the surface activation. Step 3: Fix the ITO conductive glass on the spin coater, use a dropper to add the anti-reflective and anti-glare additive to the center of the glass surface, start the spin coater, rotate at 500 rpm for 10 seconds to spread the sol, then accelerate to 3000 rpm for 30 seconds to form a uniform wet film. Step 4: Place the wet film on the surface of the ITO conductive glass in a 100℃ oven for 1 hour to pre-cur it, then place it in a muffle furnace and heat it to 400℃ at a rate of 2℃ / min, and hold it at this temperature for 2 hours. Then cool it to room temperature with the furnace to obtain low-reflection anti-glare high-transmission conductive glass.

[0021] Comparative Example 1: The difference between this comparative example and the embodiment is that no anti-reflective and anti-glare additives are added.

[0022] A method for preparing conductive glass includes the following steps: Step 1: Clean the ITO conductive glass with deionized water, then use ethanol, 1.0M sodium hydroxide, 1.0M hydrochloric acid and deionized water to ultrasonically treat the ITO conductive glass for 15 minutes in sequence, dry it in an 80℃ oven, and then put it into an oxygen plasma cleaner and treat it at 100W power for 10 minutes to complete the surface activation. Step 2: Place the ITO conductive glass in a 100℃ oven for pre-curing for 1 hour, then place it in a muffle furnace and heat it to 400℃ at a rate of 2℃ / min, and hold it at this temperature for 2 hours. Then cool it to room temperature with the furnace to obtain conductive glass.

[0023] Comparative Example 2: The difference between this comparative example and the embodiment is that the ITO conductive glass is not surface activated.

[0024] A method for preparing low-reflection, anti-glare, high-transmission conductive glass includes the following steps: Step 1: Add 0.1 mol tetraethyl orthosilicate, 17.5 mL anhydrous ethanol, 5.4 mL deionized water and 0.5 mmol hydrochloric acid to a beaker, mix, place in a flask equipped with a reflux condenser, and stir and reflux in a 60°C water bath for 3 hours to obtain hydrolyzed silica sol; add 0.4 g Pluronic F127, 0.15 mol 3-(methacryloyloxy)propyltrimethoxysilane, 0.5 mol methyltriethoxysilane and 50 mL anhydrous ethanol to another beaker, stir for 30 min, then add the hydrolyzed silica sol dropwise, and then stir and age at 20°C for 72 hours to obtain an anti-reflective and anti-glare additive; Step 2: Clean the ITO conductive glass with deionized water, then ultrasonically treat the ITO conductive glass with ethanol, 1.0M sodium hydroxide, 1.0M hydrochloric acid and deionized water in sequence for 15 minutes, and dry it in an oven at 80℃. Step 3: Fix the ITO conductive glass on the spin coater, use a dropper to add the anti-reflective and anti-glare additive to the center of the glass surface, start the spin coater, rotate at 500 rpm for 10 seconds to spread the sol, then accelerate to 2000 rpm for 30 seconds to form a uniform wet film. Step 4: Place the wet film on the surface of the ITO conductive glass in a 100℃ oven for 1 hour to pre-cur it, then place it in a muffle furnace and heat it to 400℃ at a rate of 2℃ / min, and hold it at this temperature for 2 hours. Then cool it to room temperature with the furnace to obtain low-reflection anti-glare high-transmission conductive glass.

[0025] Comparative Example 3: The difference between this comparative example and the embodiment is that Pluronic F127 is not added.

[0026] A method for preparing low-reflection, anti-glare, high-transmission conductive glass includes the following steps: Step 1: Add 0.1 mol tetraethyl orthosilicate, 17.5 mL anhydrous ethanol, 5.4 mL deionized water and 0.5 mmol hydrochloric acid to a beaker, mix, place in a flask equipped with a reflux condenser, and stir and reflux in a 60°C water bath for 3 h to obtain hydrolyzed silica sol; add 0.15 mol 3-(methacryloyloxy)propyltrimethoxysilane, 0.5 mol methyltriethoxysilane and 50 mL anhydrous ethanol to another beaker, stir for 30 min, then add the hydrolyzed silica sol dropwise, and then stir and age at 20°C for 72 h to obtain template-free silica sol; Step 2: Clean the ITO conductive glass with deionized water, then use ethanol, 1.0M sodium hydroxide, 1.0M hydrochloric acid and deionized water to ultrasonically treat the ITO conductive glass for 15 minutes in sequence, dry it in an 80℃ oven, and then put it into an oxygen plasma cleaner and treat it at 100W power for 10 minutes to complete the surface activation. Step 3: Fix the ITO conductive glass on the spin coater, use a dropper to drop silica sol without template agent onto the center of the glass surface, start the spin coater, rotate at 500 rpm for 10 seconds to spread the sol, then accelerate to 2000 rpm for 30 seconds to form a uniform wet film. Step 4: Place the wet film on the surface of the ITO conductive glass in a 100℃ oven for 1 hour to pre-cur it, then place it in a muffle furnace and heat it to 400℃ at a rate of 2℃ / min, and hold it at this temperature for 2 hours. Then cool it to room temperature with the furnace to obtain low-reflection anti-glare high-transmission conductive glass.

[0027] Performance testing 1 Optical performance test (1) Transmittance: The transmittance of conductive glass was tested in accordance with GB / T 2680-2021 standard.

[0028] (2) Reflectivity: The reflectivity of conductive glass was tested in accordance with GB / T 2680-2021 standard.

[0029] (3) Haze: Cut the conductive glass to be tested into 30mm×30mm pieces to ensure that the surface is clean and free of scratches; use a haze meter, and when there is no sample, calibrate the transmitted light flux T1 to 100% to prevent the standard haze plate from verifying the accuracy of the instrument; when there is no sample, measure the total transmitted light flux T2, and use the built-in scattered light trap of the instrument to measure the scattered transmitted light flux T3, and calculate the haze = T3 / T2×100%.

[0030] (4) Gloss: Before the test, the conductive glass sample is placed in a standard environment (23±2°C, 50±5% RH) for 24 hours to ensure that the surface is clean, flat and the size is not smaller than the instrument measurement window (50mm×50mm); during the test, a gloss meter is used, usually with an incident angle of 60°. First, the instrument is calibrated with a high gloss standard plate (100GU) and a low gloss standard plate (10GU) respectively. Then, the instrument measurement port is tightly attached to the sample surface to avoid light leakage, trigger the measurement and record the gloss value (GU); at least three measurements are taken at different positions on the sample surface. Finally, the average value and standard deviation are calculated as the test results, and the incident angle used is noted.

[0031] Table 1 Optical performance test results

[0032] As shown in Table 1, the conductive glasses prepared in Examples 1-4 all exhibit excellent comprehensive optical performance, with the average transmittance significantly increased to over 91.9%, while the average reflectance is controlled below 2.2%, achieving true high transmittance and low reflectance. In addition, the haze value is between 4.8% and 7.1%, and the gloss is maintained at a low level of 38 to 48 GU, indicating that an effective micro-nano scattering structure is formed on the surface, which ensures high light transmittance while having a good anti-glare effect. In contrast, Comparative Example 1 (without additives) exhibited a high reflectivity of 8.5%, extremely low haze (0.5%), and a gloss of 120 GU, displaying typical high reflectivity and high gloss characteristics of ITO glass, highlighting the key role of the anti-reflective and anti-glare coating. Comparative Example 2 (without surface activation) had low transmittance and high gloss, indicating that the lack of surface activation treatment affected the uniformity and adhesion of the coating, resulting in the optical performance not reaching its optimal level. In contrast, Comparative Example 3 (without the template agent Pluronic F127) had a haze of only 1.0% and a gloss of 85 GU, with a significantly weakened anti-glare effect. This confirms the indispensable role of Pluronic F127 as a template agent in constructing the surface light scattering structure and achieving the anti-glare function.

[0033] 2 Surface roughness test Atomic force microscopy (AFM) was used: First, the sample was cut into 1×1cm pieces, and the surface was purged with dust-free compressed air to remove loose particles. In tapping or contact mode, at least three different regions (such as the center and edges) were randomly selected on the sample surface. The scanning range was typically 10×10μm, and the scanning rate was set to 0.5-1 Hz. After obtaining the three-dimensional morphology image, the selected region was analyzed using the instrument's software to extract the root mean square roughness (Rq) and arithmetic mean roughness (Ra) values. Before testing, the sample needed to be equilibrated in a constant temperature and humidity environment (23±2℃, 50±5% RH) for at least 2 hours to avoid the influence of environmental fluctuations.

[0034] Table 2 Surface roughness test results

[0035] As shown in Table 2, Examples 1-4 exhibited significantly improved surface roughness (Ra in the range of 78-135 nm, Rq in the range of 97-162 nm). Furthermore, the roughness showed a controllable increasing trend with adjustments in the amount of Pluronic F127 and process conditions. This is attributed to the template agent guiding the formation of porous micro / nano structures during the sol-gel process, effectively enhancing light scattering capabilities and providing a morphological basis for the anti-glare function. In contrast, Comparative Example 1 (uncoated) had an extremely smooth surface (Ra of 3 nm), completely lacking structured light scattering conditions. Comparative Example 2 (without plasma activation) had a significantly lower roughness (Ra of 50 nm) than the examples and exhibited poorer uniformity, indicating that surface activation treatment is crucial for uniform coating deposition and structural development. Comparative Example 3 (without Pluronic F127) had a much lower roughness (Ra of 25 nm) than the examples, clearly demonstrating that the lack of a template agent prevented the formation of a sufficiently rough micro / nano structure, resulting in a significant weakening of its anti-glare function.

[0036] 3. High temperature and high humidity aging The prepared low-reflection anti-glare high-transmittance conductive glass sample was placed in a constant temperature and humidity test chamber with the conditions set at 85℃ and 85%RH for 1000 hours. Before and after the test, the average transmittance and average reflectance of the sample in the wavelength range of 380-780nm were measured using a UV-Vis spectrophotometer, the haze value was measured using a haze meter, and the sheet resistance was measured using a four-probe tester.

[0037] Table 3. Results of high temperature and high humidity aging test (85℃ / 85%RH, 1000h)

[0038] As shown in Table 3, after undergoing rigorous environmental testing at 85℃ / 85%RH for 1000 hours, Examples 1-4 exhibited excellent stability in both optical and electrical properties. The transmittance decreased by -1.2% to -2.0%, the reflectance increased only slightly by 0.3% to 0.6%, the haze increased moderately by 5.5% to 7.8%, and the sheet resistance change rate remained below 5.0%. This indicates that the coating constructed by the present invention not only possesses good anti-reflection and anti-glare functions, but its dense structure and stable interface also effectively resist performance degradation under humid and hot conditions. In contrast, Comparative Example 1 (uncoated) showed the least performance change due to the lack of protection, but its original optical performance was poor. Comparative Example 2 (unactivated) suffered from insufficient coating adhesion due to the lack of surface activation, resulting in significant performance degradation during aging, especially a sharp increase in haze (15.0%), reflectivity (1.2%), and sheet resistance (8.7%), indicating that surface activation is crucial for the long-term stability of the coating. Comparative Example 3 (without template agent) showed only a 2.0% change in haze due to the lack of a porous anti-glare structure formed by Pluronic F127, further confirming the key role of the template agent in constructing the light scattering structure and achieving continuous anti-glare function, and also indicating that the structure can remain stable in the aging environment.

[0039] 4 Electrical properties Take a low-reflection, anti-glare, high-transmittance conductive glass sample and place it with the ITO conductive side facing up on a flat, insulated surface, ensuring the surface is clean and free of stains. Use a linearly arranged four-probe resistance meter, adjusting the probe pressure to a suitable level (usually 100g) to ensure that the four probe tips are in uniform contact with the sample surface and are in a straight line. Use constant current source mode and set the test current on the instrument (usually 10mA), ensuring that the current value is within the linear measurement range. Start the test, read and record the sheet resistance value displayed on the instrument. To reduce errors, measure at least 5 times at different locations on the sample surface (such as the center and four corners), and take the average value as the final result. The instrument needs to be calibrated with a standard resistance gauge before and after the test, and the ambient temperature and humidity need to be stable (23±2℃, 50±10%RH recommended). Finally, calculate the rate of change of the sheet resistance of the sample before and after the treatment to evaluate the impact of the coating process on the conductivity.

[0040] Table 4 Electrical performance test results

[0041] As shown in Table 4, the sheet resistance of the conductive glass samples prepared in Examples 1-4 all showed a slight upward trend (12.5-13.2 Ω / □). Compared with the uncoated original ITO glass (Comparative Example 1, 12.0 Ω / □), the rate of change was controlled between +4.2% and +8.8%, indicating that the prepared anti-reflective and anti-glare coating had a limited impact on the conductivity of the substrate and could still meet the requirements of most optoelectronic devices for conductive layers. In contrast, the sheet resistance of Comparative Example 2, which did not undergo surface activation, increased to 13.5 Ω / □, with a rate of change of +12.5%. This may be because the lack of surface activation resulted in poor adhesion between the coating and the substrate, causing interfacial stress or local defects during subsequent heat treatment, thereby exacerbating the thermal damage to the ITO conductive layer.

[0042] The above description is only a preferred embodiment of the present invention, but the scope of protection of the present invention is not limited thereto. Any equivalent substitutions or modifications made by those skilled in the art within the scope of the technology disclosed in the present invention, based on the technical solution and inventive concept of the present invention, should be covered within the scope of protection of the present invention.

Claims

1. A method for preparing low-reflection, anti-glare, high-transmission conductive glass, characterized in that, Includes the following steps: Step 1: Clean the conductive glass with deionized water, then ultrasonically treat the conductive glass with ethanol, sodium hydroxide, hydrochloric acid and deionized water in sequence for 15-30 minutes, dry it in an oven at 80-100℃, and then perform activation treatment. Step 2: Apply the anti-reflective and anti-glare agent to one surface of the conductive glass substrate to form a wet film; Step 3: Perform low-temperature pre-curing and high-temperature heat treatment on the wet film on the surface of the conductive glass to obtain low-reflection, anti-glare, and high-transmission conductive glass.

2. The method for preparing low-reflection, anti-glare, high-transmission conductive glass according to claim 1, characterized in that, The activation process in step 1 specifically involves placing the conductive glass in an oxygen plasma cleaner and treating it at a power of 100-300W for 2-10 minutes to complete surface activation.

3. The method for preparing low-reflection, anti-glare, high-transmission conductive glass according to claim 1, characterized in that, The preparation method of the anti-reflective and anti-glare agent in step 2 is as follows: Add tetraethyl orthosilicate, anhydrous ethanol, deionized water and hydrochloric acid to a beaker, mix them, place them in a flask equipped with a reflux condenser, and stir and reflux in a water bath at 60-70℃ for 1.5-3 hours to obtain hydrolyzed silica sol; add Pluronic F127, 3-(methacryloyloxy)propyltrimethoxysilane, methyltriethoxysilane and anhydrous ethanol to another beaker, stir for 30-60 minutes, then add the hydrolyzed silica sol dropwise, and then stir and age at 20-28℃ for 24-72 hours to obtain the anti-reflective and anti-glare agent.

4. The method for preparing low-reflection, anti-glare, high-transmission conductive glass according to claim 1, characterized in that, In step 2, the coating is applied using a spin coating method with a rotation speed of 2000-3000 rpm and a time of 30 seconds.

5. The method for preparing low-reflection, anti-glare, high-transmission conductive glass according to claim 1, characterized in that, In step 3, the low-temperature pre-curing is carried out in an oven at 100°C for 1 hour; the high-temperature heat treatment is carried out in a muffle furnace, with the temperature programmed to rise to 400°C at a rate of 2-5°C / min, and held at this temperature for 2 hours, and then cooled to room temperature with the furnace.

6. The method for preparing low-reflection, anti-glare, high-transmission conductive glass according to claim 3, characterized in that, The molar ratio of tetraethyl orthosilicate, anhydrous ethanol, deionized water and hydrochloric acid is 1:(3-5):(3-5):(0.005-0.02).

7. The method for preparing low-reflection, anti-glare, high-transmission conductive glass according to claim 3, characterized in that, The mass concentration of Pluronic F127 in ethanol solution is 1.0%-3.0%.

8. The method for preparing low-reflection, anti-glare, high-transmission conductive glass according to claim 3, characterized in that, The molar ratio of 3-(methacryloyloxy)propyltrimethoxysilane to methyltriethoxysilane is (15-35):(5-15).

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