Substrate carrier drive assembly, substrate carrier assembly and deposition apparatus

Abstract

The application discloses a base bearing driving assembly, a base assembly thereof and a deposition device. The base bearing driving assembly comprises a base lifting frame for bearing a base, the base having a plurality of lifting pin holes penetrating through the thickness of the base; a base driving device for driving the base lifting frame to move up and down; a lifting pin driving device fixedly connected with the base lifting frame; a bearing shaft connected with the lifting pin driving device; and a bearing disc supported on the bearing shaft, the bearing disc being used for bearing a plurality of mutually separate lifting pins, each of the lifting pins being located in each of the lifting pin holes, the lifting pin driving device being capable of driving the bearing shaft to move up and down, thereby driving the bearing disc and the lifting pins borne thereby to move up and down. The base bearing driving assembly sets the lifting pin driving device on the driving output route of the base driving device, thereby reducing the driving stroke requirement of the lifting pin driving device and the complexity of the driving operation.

Description

Technical Field

[0001] This invention relates to the field of semiconductor technology, and more particularly to a base-supported driving component, the base component itself, and a deposition apparatus. Background Technology

[0002] In the manufacturing process of semiconductor devices, processes such as plasma etching, physical vapor deposition (PVD), and chemical vapor deposition (CVD) are commonly used to micro-machin semiconductor components or substrates, for example, to manufacture flexible displays, flat panel displays, light-emitting diodes, and solar cells. Micromachining processes are typically carried out in a vacuum reaction chamber. Process gases are introduced into the vacuum reaction chamber, and external energy is used to activate the process gases, thereby processing the surface of the semiconductor component or wafer substrate.

[0003] With the rapid development of semiconductor technology and the increasing integration of devices, chip sizes are becoming smaller and smaller. To ensure chip quality, the requirements for semiconductor processes are becoming increasingly stringent. Although semiconductor processing equipment has undergone numerous upgrades and its performance has been greatly improved, there are still many shortcomings in the control of process conditions and the adjustment of the process environment. Existing equipment and processing methods are no longer sufficient to meet the requirements of substrate surface treatment. In practical applications, the adjustment and control programs of semiconductor equipment are often quite complex, making it difficult to achieve optimal coordination of various factors. For example, in thin film deposition equipment, to meet production needs, the substrate often needs to move frequently between different positions. However, because the distance between these positions is usually large, the travel of the substrate varies considerably. This movement of the substrate poses challenges to its surrounding components. For instance, the support plate used to support the lifting pins needs to be constantly careful to avoid the movement of the substrate to prevent collisions and other accidents, which can disrupt production, affect product quality, and impact the production process. Therefore, improvements to existing equipment are necessary.

[0004] It is understood that the above statements only provide background information related to the present invention and do not necessarily constitute prior art. Summary of the Invention

[0005] Based on the aforementioned technical problems, the purpose of this invention is to provide a base support drive assembly, a base assembly, and a deposition device. This base support drive assembly places the lifting pin drive device on the drive output path of the base drive device. By using the base drive device to drive the base lifting frame, synchronous movement of the lifting pin drive device and the support plate with the base can be achieved. This structure reduces the drive stroke requirement of the lifting pin drive device, helping to improve the control accuracy of the lifting pin drive device. Simultaneously, since the support plate can move synchronously with the base during lifting, there is no need to constantly monitor the support plate to avoid the base's movement, which helps reduce the complexity of the drive operation and simplifies the drive control process.

[0006] To achieve the above objectives, the present invention is implemented through the following technical solution:

[0007] A base support drive assembly for a deposition apparatus, comprising:

[0008] A base lifting frame for supporting a base, the base having a plurality of lifting pin holes penetrating its thickness;

[0009] A base drive device is used to drive the base lifting frame to move up and down;

[0010] A lifting pin drive device is fixedly connected to the base lifting frame;

[0011] A bearing shaft, which is connected to the lifting pin drive device;

[0012] A support plate is supported on the support shaft. The support plate is used to carry multiple independent lifting pins. Each lifting pin is located in a lifting pin hole. The lifting pin driving device can drive the support shaft to move up and down, thereby driving the support plate and the lifting pins it carries to move up and down together.

[0013] Optionally, the base drive device includes:

[0014] First support frame;

[0015] A ball screw is rotatably connected to the first support frame, and the base lifting frame is connected to the ball screw via a nut seat, the nut seat being located between the base lifting frame and the ball screw;

[0016] A first guide structure is provided through the base lifting frame. The first guide structure is arranged parallel to the ball screw and is fixedly connected to the first support frame.

[0017] The first driving device, wherein the ball screw is fixedly connected to the output end of the first driving device.

[0018] Optionally, the ball screw is rotatably connected to two connection points of the first support frame via a first bearing and a second bearing.

[0019] Optionally, the first support frame includes a side wall, a bottom wall connected to the side wall, an upper connection and a lower connection. The upper connection is connected to the side wall, and the lower connection is located on the bottom wall. The ball screw is connected to the upper connection through a first bearing and to the lower connection through a second bearing. The first bearing is a deep groove ball bearing, and the second bearing is an angular contact ball bearing.

[0020] Optionally, the outer ring of the second bearing is fixed to the first support frame by a bearing baffle;

[0021] And / or, the inner ring of the second bearing is locked to the ball screw by a locking block.

[0022] Optionally, the ball screw is connected to the output end of the first drive device via a coupling.

[0023] Optional, also includes:

[0024] At least one first limiting structure is provided, which is used to limit the vertical movement of the base lifting frame.

[0025] Optionally, the first limiting structure is provided with a first buffer structure on the side facing the base lifting frame.

[0026] Optional, also includes:

[0027] At least one first positioning device is provided for positioning the travel of the base lifting frame.

[0028] Optionally, the first positioning device includes:

[0029] At least one first photoelectric switch includes two first photoelectric sensors disposed opposite to each other, the first photoelectric sensors being used to receive light signals;

[0030] A first baffle is disposed on the base lifting frame, and the base lifting frame can be moved up and down to position the first baffle between the two first photoelectric sensors of the first photoelectric switch.

[0031] Optionally, the lifting pin drive device includes:

[0032] The second support frame is fixedly connected to the base lifting frame;

[0033] The second guide structure is fixedly connected to the second support frame;

[0034] An auxiliary support plate is slidably connected to the second guide structure, and the bearing shaft is connected to the auxiliary support plate;

[0035] The second driving device is connected to the auxiliary support plate. The second driving device can drive the auxiliary support plate to move up and down along the second guide structure, so as to drive the bearing shaft to move up and down.

[0036] Optionally, the bearing shaft is fixedly connected to the auxiliary support plate;

[0037] Alternatively, the bearing shaft and the auxiliary support plate are connected by an adjustment assembly, which can adjust the vertical position of the bearing shaft.

[0038] Optionally, the bearing shaft includes a flange with a first threaded hole, and the adjusting assembly includes:

[0039] A hollow stud structure has threaded structures on both its inner and outer walls, and the outer wall of the hollow stud structure is threadedly connected to the first threaded hole.

[0040] A screw structure comprising a nut and a stud, wherein a second threaded hole is provided on the auxiliary support plate, and the stud penetrates the hollow stud structure and its bottom is threadedly connected to the second threaded hole;

[0041] An adjusting nut is threaded to the outer wall of the hollow stud structure.

[0042] Optional, also includes:

[0043] At least one second limiting structure is provided, which is used to restrict the vertical movement of the auxiliary support plate.

[0044] Optionally, a second buffer structure is provided on the side of the second limiting structure facing the auxiliary support plate.

[0045] Optional, also includes:

[0046] At least one second positioning device is provided, which is used for positioning the stroke of the auxiliary support plate.

[0047] Optionally, the second positioning device includes:

[0048] At least one second photoelectric switch includes two second photoelectric sensors disposed opposite to each other, the second photoelectric sensors being used to receive light signals;

[0049] The second baffle is disposed on the auxiliary support plate. The up and down movement of the auxiliary support plate can cause the second baffle to be located between the two second photoelectric sensors of the second photoelectric switch.

[0050] Optional, also includes:

[0051] A retractable sealing component is disposed around the bearing shaft. The retractable sealing component is disposed outside the vacuum reaction chamber of the deposition device. One end of the retractable sealing component is connected to the outer wall of the vacuum reaction chamber, and the other end is connected to the lifting pin drive device.

[0052] Optionally, the retractable sealing component includes a gas inlet, which is connected to a gas source.

[0053] Optionally, the base support drive assembly includes multiple base drive devices, and each of the base drive devices is evenly arranged along the circumference of the base lifting frame;

[0054] And / or, the base bearing drive assembly includes a plurality of lifting pin drive devices and bearing shafts, and each of the lifting pin drive devices and bearing shafts is evenly arranged along the circumference of the bearing disk;

[0055] And / or, the base drive device is arranged opposite to the lifting pin drive device.

[0056] Optionally, a base assembly includes:

[0057] Base;

[0058] The aforementioned base support drive assembly is used to support and drive the base.

[0059] Optionally, the base includes a top plate and a neck, and the base lifting frame that carries the drive assembly has an opening extending through its thickness, with the neck positioned within the opening.

[0060] Optionally, the base is fixedly connected to the base lifting frame of the base-supporting drive assembly.

[0061] Optionally, a deposition apparatus includes:

[0062] The aforementioned base component.

[0063] Compared with the prior art, the technical solution of the present invention has at least the following beneficial effects:

[0064] The present invention provides a base-supporting drive assembly, a base assembly, and a deposition device. In this assembly, a lifting pin drive device is positioned on the drive output path of the base drive device. By driving the base lifting frame through the base drive device, the lifting pin drive device and the support plate move synchronously with the base. This structure eliminates the need for the lifting pin drive device to drive the support plate and lifting pin during base lifting, thus reducing the required drive stroke of the lifting pin drive device and improving its control accuracy. Simultaneously, since the support plate can move synchronously with the base during lifting, there is no need to constantly monitor the support plate to avoid base movement, reducing the complexity of the drive operation and simplifying the lifting control process. Furthermore, the integrated design of the lifting pin drive device and the base drive device reduces additional space occupation and improves space utilization efficiency.

[0065] Furthermore, the base drive device of the base-supported drive assembly combines the first support frame, ball screw, nut seat and first drive device, which can provide high transmission efficiency. The base drive device converts the rotational motion of the ball screw into the up and down movement of the base lifting frame, which can realize precise control and positioning of the base lifting frame drive, and helps to improve the control accuracy of the base lifting frame drive.

[0066] Furthermore, the lifting pin drive device of the base-supported drive assembly combines the second support frame, the second guide structure, the auxiliary support plate, and the second drive device. This not only enables precise control of the load-bearing plate and the lifting pin drive, ensuring transmission efficiency, but also ensures the alignment of the drive based on the second guide structure, preventing the lifting pin from touching the side wall of the lifting pin hole, thus helping to ensure the alignment and stability of the lifting pin. Attached Figure Description

[0067] To more clearly illustrate the technical solution of the present invention, the accompanying drawings used in the description will be briefly introduced below. Obviously, the drawings in the following description are one embodiment of the present invention. For those skilled in the art, other drawings can be obtained based on these drawings without creative effort:

[0068] Figure 1 This is a schematic diagram of the structure of an existing deposition apparatus;

[0069] Figure 2 This is a schematic diagram of the structure of a deposition apparatus according to the present invention;

[0070] Figure 3 This is a schematic diagram of the structure of a base-supported driving assembly according to the present invention;

[0071] Figure 4This is a schematic diagram showing the positional relationship between a first photoelectric switch and a first baffle according to the present invention;

[0072] Figure 5 This is a schematic diagram of the structure of an adjustment component according to the present invention;

[0073] Figure 6 This is a partial side view of a lifting pin drive device according to the present invention. Detailed Implementation

[0074] The following will be combined with the appendix in the embodiments of the present invention. Figure 1 ~Attached Figure 5 The technical solutions, structural features, objectives and effects achieved in the embodiments of the present invention will be described in detail.

[0075] It should be noted that the accompanying drawings are in a very simplified form and use non-precise proportions. They are only used to facilitate and clarify the purpose of illustrating the embodiments of the present invention, and are not intended to limit the implementation conditions of the present invention. Therefore, they have no substantial technical significance. Any modifications to the structure, changes in the proportional relationship, or adjustments to the size should still fall within the scope of the technical content disclosed in the present invention, provided that they do not affect the effects and objectives that the present invention can produce.

[0076] It should be noted that, in this invention, relational terms such as "first" and "second" are used merely to distinguish one entity or operation from another, and do not necessarily require or imply any such actual relationship or order between these entities or operations. Furthermore, the terms "comprising," "including," or any other variations thereof are intended to cover non-exclusive inclusion, such that a process, method, article, or apparatus that comprises a list of elements includes not only the expressly listed elements but also other elements not expressly listed, or elements inherent to such a process, method, article, or apparatus.

[0077] like Figure 1The diagram shows a schematic of a conventional deposition apparatus (chemical vapor deposition, CVD). This apparatus includes a vacuum reaction chamber 10, which can be used to process one or more substrates W, including depositing material on the upper surface of the substrate W. A transfer port 11 is provided on the vacuum reaction chamber 10 to facilitate the transfer of the substrate W between the inside and outside of the vacuum reaction chamber 10. The vacuum reaction chamber 10 includes a gas spray head 20 disposed above the interior of the vacuum reaction chamber 10. The gas spray head 20 is connected to a gas supply device 30 to deliver process gas from the gas supply device 30 into the vacuum reaction chamber 10. The vacuum reaction chamber 10 also includes a base 40 disposed opposite to the gas spray head 20, the base 40 including a support surface for supporting the substrate W. Furthermore, the deposition apparatus also includes a heating device (not shown) to provide heat energy for the reaction. During the vapor deposition process, the gas spray head 20 introduces the process gas from the gas supply device 30 into the vacuum reaction chamber 10. A heating device provides heat to the substrate W supported by the base 40 to bring it to a preset temperature, thereby depositing a thin film on the surface of the substrate W and ensuring the normal operation of substrate W production. Optionally, the deposited thin film material can be one or more of silicon carbide, silicon oxide, titanium nitride, gallium arsenide, gallium nitride, or aluminum gallium nitride.

[0078] In existing deposition apparatuses, a base 40 is typically connected to a first drive structure 50, allowing the first drive structure 50 to drive the base 40 to switch between at least two positions, up and down, thereby meeting the needs of substrate W transfer and processing. To facilitate wafer transfer, multiple lifting pin holes 41 penetrating the upper and lower surfaces of the base 40 can be formed within it. These lifting pin holes 41 accommodate lifting pins 42, the tips of which can contact the back side of the substrate W supported by the base 40. The multiple lifting pins 42 are supported by a support plate 61 below the base 40. The support plate 61 is typically connected to a second drive structure 60 to enable the lifting and lowering of the support plate 61 and the lifting pins 42. In existing deposition apparatuses, the lifting pins 42 are typically used to lift and lower the substrate W while the base 40 remains stationary. Therefore, the lifting drive of the lifting pins 42 and the lifting drive of the base 40 usually operate independently, meaning the first drive structure 50 and the second drive structure 60 operate independently of each other.

[0079] Based on the aforementioned deposition apparatus, before the process begins, the first drive structure 50 drives the base 40 to rise and fall, positioning it at the wafer transfer position. A robotic arm then grips the substrate W and transfers it from the wafer transfer port 11 into the vacuum reaction chamber 10, placing it on the support surface of the base 40. After wafer transfer, the first drive structure 50 drives the base 40 to rise and fall, reaching the reaction position to ensure that the substrate W supported by the base 40 is in the preset process position, thereby enabling the processing of the substrate W surface. After the process is completed, the first drive structure 50 adjusts the base 40 to the wafer transfer position, and the second drive structure 60 raises the lifting pin 42, causing the top of the lifting pin 42 to protrude beyond the upper surface of the base 40, thus detaching the substrate W from the support surface for the robotic arm to pick it up. After wafer transfer, the second drive structure 60 lowers the lifting pin 42, causing the top of the lifting pin 42 to be lower than or level with the support surface of the base 40.

[0080] Throughout the process, the carrier plate 61 supporting the lifting pin 42 needs to constantly avoid the movement of the base 40 to prevent collisions. For example, when the first drive structure 50 drives the base 40 to descend, the second drive structure 60 is needed to drive the carrier plate 61 to descend first to avoid collisions between the base 40 and the carrier plate 61, which could disrupt the production process. In this method, the base 40 has a large stroke between its various positions, which means the carrier plate 61, which needs to avoid the base 40, also has a large stroke variation. The second drive structure 60, which drives the carrier plate 61 to rise and fall, needs to meet not only the small stroke movement requirement when picking up the wafer but also the large stroke movement requirement when following the base 40. Therefore, the second drive structure 60 driving the carrier plate 61 needs to have a large drive stroke. At the same time, the large stroke movement of the carrier plate 61 means that the lifting pin 42 also has an excessively long stroke, which can easily lead to instability in the movement of the lifting pin 42 (e.g., it may easily hit the inner wall of the lifting pin hole 41 during movement), affecting control accuracy. Therefore, a balance needs to be struck between the large stroke range and control accuracy, which presents a challenge to the drive design of the lifting pin 42. On the other hand, based on the existing structure, in actual use, the control procedures for the cooperation between the various structures are also quite cumbersome, difficult to operate, and have low control convenience.

[0081] To solve this technical problem, the present invention provides a base support drive assembly 500 (see also...). Figure 2The base support drive assembly 500 is used to support and drive the base 400. This assembly integrates a lifting pin drive device 530 (which drives the support plate 550 and lifting pin 420) with a base drive device 520 (which drives the base 400). When the base drive device 520 drives the base 400 up and down, it synchronously drives the lifting pin drive device 530 and the connected support plate 550, reducing the impact of the base 400's movement on the lifting pin drive device 530 and the support plate 550. This allows the lifting pin drive device 530 to only drive the lifting pin 420 with a small stroke, significantly reducing the required drive stroke and improving the control accuracy of the lifting pin 420. Furthermore, the integrated design of the lifting pin drive device 530 and the base drive device 520 results in a simple and compact structure, reducing additional space occupation and improving space utilization efficiency. The integrated design also simplifies the operation and control process.

[0082] Specifically, such as Figure 2 and Figure 3 As shown, a deposition apparatus of the present invention includes a vacuum reaction chamber 100 with a transfer port 101. The vacuum reaction chamber 100 has a gas spray head 200 communicating with a gas supply device 300. The vacuum reaction chamber 100 also includes a base 400 disposed opposite to the gas spray head 200. The base 400 has a plurality of lifting pin holes 410 penetrating its thickness.

[0083] The deposition apparatus also includes a base support drive assembly 500, which includes a base lifting frame 510, a base drive device 520, a lifting pin drive device 530, a support shaft 540, and a support plate 550. The base lifting frame 510 supports the base 400, and the base drive device 520 drives the base lifting frame 510 to move up and down. Since the base lifting frame 510 is fixedly connected to the base 400, the base 400 moves up and down with the base lifting frame 510. Furthermore, the lifting pin drive device 530 is fixedly connected to the base lifting frame 510, the bearing shaft 540 is connected to the lifting pin drive device 530, the bearing plate 550 is supported on the bearing shaft 540, and the bearing plate 550 is used to carry multiple mutually independent lifting pins 420. Each lifting pin 420 is located in each lifting pin hole 410. The lifting pin drive device 530 can drive the bearing shaft 540 to move up and down, thereby driving the bearing plate 550 and the lifting pins 420 it carries to move up and down together.

[0084] Based on the above structure, when the base lifting frame 510 is driven to move up and down by the base driving device 520, it not only drives the base 400 connected to the base lifting frame 510 to move up and down, but also drives the lifting pin driving device 530 connected to the base lifting frame 510 to move up and down together with the base lifting frame 510. This, in turn, drives the bearing shaft 540 connected to the lifting pin driving device 530 and its bearing plate 550 to move synchronously, achieving synchronous movement between the bearing plate 550 and the base 400. During this process, the relative position of the lifting pin 420 within the lifting pin hole 410 remains unchanged. When it is necessary to drive the lifting pin 420 to pick up a piece, only a small distance needs to be moved by the lifting pin driving device 530; a large stroke is not required.

[0085] As described above, in this invention, the lifting pin drive device 530 is positioned on the drive output path of the base drive device 520. In this embodiment, the lifting pin drive device 530 is positioned on the base lifting frame 510, or even fixedly connected to the base drive device 520. By driving the base lifting frame 510 with the base drive device 520, the lifting pin drive device 530 and the bearing plate 550 can achieve synchronous movement with the base 400. This structure eliminates the need for the lifting pin drive device 530 to drive the bearing plate 550 during the lifting and lowering of the base 400, thus reducing the drive stroke requirement of the lifting pin drive device 530. This effectively shortens the transmission path and helps ensure that the structures along the transmission path (such as the output end of the lifting pin drive device 530 and / or the bearing shaft 540) have high rigidity and... Lower deflection results in better transmission performance, which in turn helps improve the control accuracy and response speed of the lifting pin drive device 530 in driving the lifting pin 420. Simultaneously, the relative position of the lifting pin 420 within the lifting pin hole 410 remains unchanged when the base 400 moves, helping to ensure the stability of the lifting pin 420. Furthermore, since the carrier plate 550 can move synchronously with the base 400 during its lifting and lowering, there is no need to constantly ensure that the carrier plate 550 avoids the movement of the base 400, which helps reduce the complexity of the drive operation and simplify the drive control process. On the other hand, the integrated design of the lifting pin drive device 530 and the base drive device 520 reduces additional space occupation and helps improve space utilization efficiency.

[0086] like Figure 2 As shown, the base 400 is fixedly connected to the base lifting frame 510. In this embodiment, the base 400 is placed on and locked onto the base lifting frame 510 via a transition plate. The base 400 includes a top plate 430 and a neck 440, and the base lifting frame 510 has an opening 511 extending through its thickness (see...). Figure 3The neck 440 of the base 400 is placed within the opening 511. Further, the neck 440 of the base 400 is fixedly connected to the opening 511 of the base lifting frame 510 via a flange assembly, so that when the base driving device 520 drives the base lifting frame 510 to move up and down, it drives the base 400 to move synchronously. On the other hand, the top plate 430 of the base 400 has three lifting pin holes 410 penetrating its thickness, and each lifting pin hole 410 is evenly arranged circumferentially. Correspondingly, the support plate 550 supported by the support shaft 540 is provided with three mutually independent lifting pins 420, each lifting pin 420 located in a respective lifting pin hole 410. In this embodiment, the support plate 550 is a ceramic plate, and the top of the support shaft 540 is connected by a pin clamp 541 (see...). Figure 3 The base drive device 520 is fixedly connected to the bottom of the support plate 550 to ensure the stability of the connection between the two. Optionally, the base drive device 520 can be arranged opposite to the lifting pin drive device 530.

[0087] like Figure 3 As shown, the base drive device 520 includes a first support frame 521, a ball screw 522, a first guide structure 525, and a first drive device 523. Specifically, the ball screw 522 is rotatably connected to the first support frame 521, and the base lifting frame 510 is connected to the ball screw 522 via a nut seat 524, which is located between the base lifting frame 510 and the ball screw 522. The ball screw 522 is also fixedly connected to the output end of the first drive device 523. The first guide structure 525 provides guidance for the movement of the base lifting frame 510, and it is disposed through the base lifting frame 510. The first guide structure 525 is parallel to the ball screw 522 and fixedly connected to the first support frame 521.

[0088] Based on the above structure, the ball screw 522 is rotatably fixed on the first support frame 521, so that the ball screw 522 can rotate on the first support frame 521 under the drive of the first drive device 523. At the same time, the structure converts the rotational motion of the ball screw 522 into the up and down movement of the base lifting frame 510 through the nut seat 524, so that the base lifting frame 510 moves up and down along the fixed first guide structure 525, thereby realizing the power transmission between the ball screw 522 and the base lifting frame 510, and thus realizing the drive of the base lifting frame 510. This structure combines the first drive device 523, ball screw 522, first guide structure 525, and nut seat 524, etc., to convert the rotational motion of the ball screw 522 into the vertical linear motion of the base lifting frame 510, thereby realizing the lifting and lowering of the base lifting frame 510. Its structure is compact and can provide high transmission efficiency. At the same time, it can also realize precise control and positioning of the base lifting frame 510 drive, which helps to improve the control accuracy of the movement of the base lifting frame 510.

[0089] Furthermore, the first guide structure 525 is slidably connected to the base lifting frame 510. In this embodiment, the first guide structure 525 is a linear guide rail, which includes a guide rail and a slider that slides along the guide rail. The guide rail passes through the base lifting frame 510 and is connected to the base lifting frame 510 through the slider. The guide rail is also fixedly connected to the first support frame 521.

[0090] Furthermore, such as Figure 3 As shown, in this embodiment, the first support frame 521 has a top wall, a bottom wall, and a side wall, and is fixedly disposed below the cavity. The first support frame 521 has an upper connection point and a lower connection point, which are connected to the ball screw 522. The upper connection point is connected to the side wall of the first support frame 521, and the lower connection point is located on the bottom wall of the first support frame 521. A nut seat 524 is located between the upper and lower connection points. The ball screw 522 is rotatably connected to the upper and lower connection points of the first support frame 521 via a first bearing 5221 and a second bearing 5222, respectively, thereby ensuring the stability of the connection between the ball screw 522 and the first support frame 521. Furthermore, since the ball screw 522 is connected to the first support frame 521 via two bearing structures, wear during transmission can be reduced, helping to improve its service life. Furthermore, the ball screw 522 and the first support frame 521 are connected by a bearing structure, which helps to ensure the rotational accuracy of the ball screw 522. At the same time, the bearing structure can also absorb the vibration of external forces acting on the ball screw 522.

[0091] To ensure proper fixation and transmission of the ball screw 522, the first bearing 5221 can be a deep groove ball bearing, and the second bearing 5222 can be an angular contact ball bearing. The deep groove ball bearing provides auxiliary support for the connection between the top of the ball screw 522 and the upper connection / side wall of the first support frame 521; the angular contact ball bearing can withstand larger axial loads (e.g., it can offset the weight of the base lifting frame 510 and its supporting components). The ball screw 522 is connected to the bottom wall of the first support frame 521 via the angular contact ball bearing, which helps ensure the stability of the connection at that point. Of course, the type of fit between the first bearing 5221 and the second bearing 5222 is not limited to the above. For example, in another embodiment, the first bearing 5221 is an angular contact ball bearing.

[0092] Furthermore, the outer ring of the second bearing 5222 is fixed to the first support frame 521 by a bearing baffle 5223; the inner ring of the second bearing 5222 is locked to the ball screw 522 by a locking block 5224 to prevent the ball screw 522 from falling off the inner ring of the second bearing 5222. This pre-tightening method eliminates the axial clearance between the ball screw 522 and the first support frame 521, increasing the rigidity of the overall structure and thus improving its stability when it supports the base lifting frame 510 via the nut seat 524.

[0093] Optionally, the first driving device 523 is a drive motor, which is fixedly mounted on the motor frame 5231 (see [link]). Figure 3 The ball screw 522 is connected to the output end of the drive motor via a coupling 5225, so that the output torque of the drive motor is transmitted to the ball screw 522 to make it rotate, thereby driving the base lifting frame 510 to move up and down. This method can improve the transmission efficiency and reliability of the entire transmission system.

[0094] On the other hand, such as Figure 3As shown, the base driving device 520 further includes at least one first positioning device. In this embodiment, the first positioning device includes a first baffle 5271 and two first photoelectric sensors 5272. The first positioning device is used for the stroke positioning of the base lifting frame 510. It can be understood that one first positioning device can realize the positioning of the base lifting frame 510 at at least one key position. In practical applications, multiple first positioning devices can be set along the circumference or vertical position of the base lifting frame as needed to achieve omnidirectional positioning. For example, in one embodiment, the first positioning device can realize the positioning of the base lifting frame 510 at three key positions, from top to bottom: upper limit position, initial position, and lower limit position. The upper limit position and lower limit position represent the highest and lowest suitable positions that the base lifting frame 510 can move in the process, respectively. Before the process starts, the base lifting frame 510 is located in the initial position. During the process, the base lifting frame 510 moves between the upper limit position and the lower limit position as needed.

[0095] Optionally, the first positioning device includes at least one first photoelectric switch and a first baffle 5271, wherein the first photoelectric switch can realize the positioning of the base lifting frame 510 at one position. Further optional, such as... Figure 3 and Figure 4 As shown, the first photoelectric switch includes two opposing first photoelectric sensors 5272, which are used to receive light signals emitted by a light source. A first baffle 5271 is mounted on a base lifting frame 510. The base lifting frame 510 can move up and down to position the first baffle 5271 between the two first photoelectric sensors 5272 of the first photoelectric switch. In practical applications, the first baffle 5271 moves synchronously with the base lifting frame 510. When the base lifting frame 510 moves so that the first baffle 5271 and the two first photoelectric sensors 5272 of the first photoelectric switch are on the same plane, the first baffle 5271 is positioned between the two first photoelectric sensors 5272 (see [link to relevant documentation]). Figure 4The first photoelectric switch of the first positioning device can block the light signal from reaching the first photoelectric sensor 5272 that is far from the light source, preventing the first photoelectric sensor 5272 that is far from the light source from receiving the light signal, while the first photoelectric sensor 5272 that is close to the light source can receive the light signal, thereby achieving the positioning of the base lifting frame 510. The first photoelectric switch of the first positioning device combines two first photoelectric sensors 5272. The first baffle 5271 is equivalent to the positioning structure of the base lifting frame 510. Only when the first baffle 5271 is located between the two first photoelectric sensors 5272 does it indicate that the base lifting frame 510 has moved to the corresponding position. This method can avoid the problem of inaccurate detection by the first photoelectric sensor 5272 due to light source failure or other factors, and helps to improve the positioning accuracy of the base lifting frame 510. It is understood that the present invention does not limit the specific structure of the first photoelectric switch, as long as it can achieve the corresponding function. For example, in another embodiment, the first photoelectric switch contains only one first photoelectric sensor 5272. Although its testing accuracy is less than that of two first photoelectric sensors 5272, it can still achieve the corresponding function. On the other hand, the present invention does not limit the placement of the first photoelectric sensor 5272. The first photoelectric sensor 5272 can be placed on the side wall of the first support frame 521, or it can be placed on other components around the base lifting frame 510, as long as it can achieve its corresponding function. The present invention does not limit this.

[0096] On the other hand, the base driving device 520 also includes at least one first limiting structure 526. At least a portion of the first limiting structure 526 is disposed on the vertical movement path of at least a portion of the base lifting frame 510 to restrict the vertical movement of the base lifting frame 510, thereby achieving a hard limit on the base lifting frame 510 to stop its movement. In practical applications, the base driving device 520 may include two first limiting structures 526 disposed vertically to respectively limit the upper and lower limit positions of the base lifting frame 510's movement. The first limiting structure 526 may be an extension plate extending from the side wall of the first support frame 521 toward the base lifting frame 510, or a limiting plate disposed on the bottom wall of the first support frame 521. When the base driving device 520 drives the base lifting frame 510 to approach the upper first limiting structure 526, the base lifting frame 510 and the base 400 it carries approach their respective upper limit positions. When the base driving device 520 drives the base lifting frame 510 to approach the lower first limiting structure 526, the base lifting frame 510 and the base 400 approach their respective lower limit positions.

[0097] Furthermore, to prevent damage caused by collisions when the base lifting frame 510 approaches the first limiting structure 526, a first buffer structure is provided on the side of the first limiting structure 526 facing the base lifting frame 510. This prevents the base lifting frame 510 from directly contacting and colliding with the first limiting structure 526, thus providing buffer protection for the base lifting frame 510. Optionally, the first buffer structure is made of an elastic material.

[0098] It is understood that the first positioning device is positioned between the two first limiting structures 526. In practical applications, when the base lifting frame 510 moves up and down, the first positioning device first positions the base lifting frame 510 to determine its travel distance, thus indicating that the base lifting frame 510 has reached a preset position. If the base lifting frame 510 continues to move, it will gradually approach the first limiting structure 526. If the base lifting frame 510 reaches its upper limit position, the first limiting structure 526 can block its movement, achieving both positioning and limiting of the base lifting frame 510. Therefore, combining the first positioning device and the first limiting structure 526 allows for dual positioning and limiting of the base lifting frame 510's movement, facilitating subsequent process control while ensuring the safety of the drive.

[0099] On the other hand, such as Figure 3 As shown, the lifting pin drive device 530 includes a second support frame 531, a second guide structure 532, an auxiliary support plate 533, and a second drive device 534. The second support frame 531 is fixedly connected to the base lifting frame 510, the second guide structure 532 is fixedly connected to the second support frame 531, the auxiliary support plate 533 is slidably connected to the second guide structure 532, and the bearing shaft 540 is connected to the auxiliary support plate 533. The output end of the second drive device 534 is connected to the auxiliary support plate 533, and the second drive device 534 can drive the auxiliary support plate 533 to move up and down along the second guide structure 532, thereby causing the bearing shaft 540 to move up and down.

[0100] Based on the above structure, the second guide structure 532 is fixedly positioned relative to the base lifting frame 510. The second drive device 534 can drive the auxiliary support plate 533 to move up and down along the second guide structure 532 based on the height of the base lifting frame 510, thereby driving the bearing shaft 540 connected to the auxiliary support plate 533 and its bearing plate 550 to move up and down, so that the lifting pin 420 carried by the bearing plate 550 can move up and down in the lifting pin hole 410 of the base 400. This device combines the second drive device 534, the auxiliary support plate 533, and the second guide structure 532, which not only achieves precise driving of the lifting of the bearing plate 550 and the lifting pin 420, ensuring transmission efficiency, but also ensures the alignment of the drive based on the second guide structure 532, preventing the lifting pin 420 from touching the side wall of the lifting pin hole 410, thus helping to ensure the alignment and stability of the lifting pin 420.

[0101] In one embodiment, the bearing shaft 540 is fixedly connected to the auxiliary support plate 533. After the fixed connection, the relative position between the bearing disk 550 carried by the bearing shaft 540 and the auxiliary support plate 533 remains essentially constant. Of course, other connection methods are also possible. For example, the bearing shaft 540 and the auxiliary support plate 533 can also be connected via an adjustment component 535. The adjustment component 535 can adjust the vertical position of the bearing shaft 540. Based on this, the vertical positions of the bearing disk 550 and the lifting pin 420 can be adjusted to meet more application requirements. Optionally, the bearing shaft 540 is connected to the auxiliary support plate 533 via multiple (e.g., three) adjustment components 535 evenly arranged circumferentially to ensure the uniformity of force on the bearing shaft 540 in the circumferential direction.

[0102] Furthermore, such as Figure 3 and Figure 5 As shown, the bearing shaft 540 includes a flange 542 at its bottom, and the flange 542 has a first threaded hole 5421. The adjusting assembly 535 includes a hollow stud structure 5351, a screw structure 5352, and an adjusting nut 5353. The hollow stud structure 5351 has threaded structures on both its inner and outer walls, and the outer wall of the hollow stud structure 5351 is threadedly connected to the first threaded hole 5421 of the flange 542. The screw structure 5352 includes a nut and a stud, and the diameter or maximum width of the nut is greater than the inner diameter of the hollow stud structure 5351. The auxiliary support plate 533 has a second threaded hole 5331, and the stud penetrates the hollow stud structure 5351, with its bottom threadedly connected to the second threaded hole 5331. The adjusting nut 5353 is threadedly connected to the outer wall of the hollow stud structure 5351 and is located above the flange 542.

[0103] Based on the above structure, during installation, the hollow stud structure 5351 is first screwed into the first threaded hole 5421 of the flange 542 to make the hollow stud structure 5351 threadedly connected to the flange 542, thereby determining the height position of the flange 542. Then, the stud of the screw structure 5352 passes through the hollow stud structure 5351 and is threadedly connected to the second threaded hole 5331 of the auxiliary support plate 533 to lock and position the hollow stud structure 5351 and the flange 542 on the auxiliary support plate 533. At this time, the bottom of the hollow stud structure 5351 is generally in contact with the upper surface of the auxiliary support plate 533. Then, the adjusting nut 5353 is threadedly connected to the outer wall of the hollow stud structure 5351 to lock the hollow stud structure 5351 and the stud of the screw structure 5352 surrounding it, thereby achieving stable fixation and limiting of the flange 542, that is, achieving stable fixation of the bearing shaft 540. When adjusting the height of flange 542 and its bearing shaft 540, first unscrew the adjusting nut 5353, then unscrew the hollow stud structure 5351, and then rotate the hollow stud structure 5351 in place to move flange 542 up or down along the outer wall of the hollow stud structure 5351, thereby adjusting the height of flange 542. After adjusting the height of flange 542, install and fix it according to the aforementioned installation steps. During installation and adjustment, the hollow stud structure 5351 is always in contact with the upper surface of auxiliary support plate 533. As can be seen from the above, the adjusting assembly 535 can not only fix the bearing shaft 540 on the auxiliary support plate 533, but also fine-tune the height of the bearing shaft 540, further improving the adjustment accuracy of the height of bearing plate 550 and lifting pin 420. Optionally, the screw structure 5352 is an internal hexagonal head screw, the outer diameter of which matches the inner diameter of the hollow stud structure 5351.

[0104] like Figure 3 and Figure 6As shown, in practical applications, the second support frame 531 can be an L-shaped structure, the second guide structure 532 is a straight guide rail connected to the vertical structure of the second support frame 531, and the auxiliary support plate 533 is also an L-shaped structure. The vertical structure of the auxiliary support plate 533 is slidably connected to the second guide structure 532, the planar structure at the bottom of the auxiliary support plate 533 is connected to the second drive device 534, and the bearing shaft 540 is disposed on the planar structure at the bottom of the auxiliary support plate 533. Alternatively, the second drive device 534 can be an electric push rod, comprising a fixed end and a movable push rod connected thereto. The fixed end is fixedly connected to the second support frame 531, and the movable push rod is equivalent to the output end of the second drive device 534, which is fixedly connected to the auxiliary support plate 533. In practical applications, the lifting and lowering of the auxiliary support plate 533 and the bearing shaft 540 are achieved by raising and lowering the movable push rod. It is understood that the type and structure of the second drive device 534, the second support frame 531, and the auxiliary support plate 533 are not limited to those described above. In other embodiments, they may be of other structural types, and the present invention does not limit them. For example, in another embodiment, the second support frame 531 is integrally disposed with the base lifting frame 510, that is, it is a part of the base lifting frame 510.

[0105] On the other hand, the lifting pin drive device 530 also includes at least one second positioning device, which is used for positioning the stroke of the auxiliary support plate 533. Similar to the first positioning device, in practical applications, the second positioning device can be used to position the auxiliary support plate 533 at various key positions. Optionally, its position setting logic is also similar to that of the first positioning device.

[0106] Optionally, the second positioning device includes at least one second photoelectric switch and a second baffle 5371. One second photoelectric switch can position the auxiliary support plate 533 at one location. Further optionally, the second photoelectric switch includes two opposing second photoelectric sensors 5372, which are used to receive light signals emitted by a light source. The second baffle 5371 (see...) Figure 3The second baffle 5371 is positioned on the auxiliary support plate 533. The vertical movement of the auxiliary support plate 533 causes the second baffle 5371 to be positioned between the two second photoelectric sensors 5372 of the second photoelectric switch. In practical applications, the second baffle 5371 moves synchronously with the auxiliary support plate 533. When the auxiliary support plate 533 moves so that the second baffle 5371 and the two second photoelectric sensors 5372 of the second photoelectric switch are on the same plane, the second baffle 5371 is positioned between the two second photoelectric sensors 5372. This blocks the light signal from reaching the second photoelectric sensor 5372 that is far from the light source, preventing it from receiving the light signal. The second photoelectric sensor 5372 that is close to the light source can receive the light signal, thus achieving the positioning of the auxiliary support plate 533. The second photoelectric switch of the second positioning device combines two second photoelectric sensors 5372. The second baffle 5371 serves as the positioning structure for the auxiliary support plate 533, avoiding inaccurate detection by the second photoelectric sensors 5372 due to light source failure or other factors, thus improving the accuracy of positioning the auxiliary support plate 533. It is understood that the present invention does not limit the specific structure and placement of the second photoelectric switch, as long as it achieves the corresponding function.

[0107] On the other hand, such as Figure 6 As shown, the lifting pin drive device 530 further includes at least one second limiting structure 536. At least a portion of the second limiting structure 536 is disposed on the vertical movement path of at least a portion of the auxiliary support plate 533 to restrict the vertical movement of the auxiliary support plate 533, thereby achieving a hard limit on the auxiliary support plate 533 to stop its movement. Figure 3 and Figure 6As shown, in one embodiment, the second limiting structure 536 is fixedly mounted on the second support frame 531. The cross-section of the second limiting structure 536 is Z-shaped (with a vertical middle section), and the cross-section of the auxiliary support plate 533 is L-shaped. The top extension surface of the second limiting structure 536 is located on the vertical movement path of the bottom extension surface of the auxiliary support plate 533, that is, the top extension surface of the second limiting structure 536 extends towards the auxiliary support plate 533. By limiting the bottom extension surface of the auxiliary support plate 533 through the second limiting structure 536, the upper limit of the movable position of the auxiliary support plate 533 can be limited. When the second driving device 534 drives the auxiliary support plate 533 to move upward along the second guide structure 532 and approach the second limiting structure 536, the lifting pin 420 carried by the bearing plate 550 extends out of the lifting pin hole 410 of the base 400 and approaches its upper limit position. It is understood that the structure type of the second limiting structure 536 is not limited to the above. In other embodiments, it can also be other structural types. The present invention does not limit this, as long as the corresponding function can be achieved. On the other hand, the lifting pin driving device 530 is not limited to including the second limiting structure 536 that limits the movement of the auxiliary support plate 533. It can also include the second limiting structure 536 that limits the movement of the auxiliary support plate 533. In practical applications, it can be set according to the requirements.

[0108] Optionally, the second positioning device and the second limiting structure 536 can be combined. In practical applications, the second positioning device first positions the auxiliary support plate 533 to ensure that the auxiliary support plate 533 and the lifting pin 420 have reached their respective preset positions. If the auxiliary support plate 533 continues to move upward, it will gradually approach the second limiting structure 536 used for upper limit positioning after passing the second positioning device. If the auxiliary support plate 533 reaches the upper limit position, the second limiting structure 536 can block the movement of the auxiliary support plate 533. Therefore, combining the second positioning device and the second limiting structure 536 can achieve dual positioning and limiting of the auxiliary support plate 533, facilitating subsequent process control while ensuring the safety of the drive.

[0109] Furthermore, to prevent damage caused by collisions when the auxiliary support plate 533 approaches the second limiting structure 536, a second buffer structure 5361 is provided on the side of the second limiting structure 536 facing the auxiliary support plate 533 (see [link]). Figure 6 This is to prevent the auxiliary support plate 533 from directly contacting and colliding with the second limiting structure 536, thus achieving buffer protection for the auxiliary support plate 533. Optionally, the second buffer structure 5361 is made of an elastic material.

[0110] On the other hand, such as Figure 3As shown, the deposition apparatus further includes a retractable sealing component 543 disposed around the bearing shaft 540. The retractable sealing component 543 is located outside the vacuum reaction chamber 100 of the deposition apparatus. One end of the retractable sealing component 543 is connected to the outer wall of the vacuum reaction chamber 100, and the other end is connected to the auxiliary support plate 533 of the lifting pin drive device 530 via a flange 542. The deposition apparatus uses the retractable sealing component 543 to surround the portion of the bearing shaft 540 located outside the vacuum reaction chamber 100, isolating it from the atmosphere and vacuum environment, sealing the bearing shaft 540 within the closed environment of the vacuum reaction chamber 100, thereby ensuring the stability of the internal environment of the vacuum reaction chamber 100. Optionally, the retractable sealing component 543 includes a bellows. The bellows has high mechanical toughness and a large telescopic stroke, and is not easily damaged even after repeated folding and expansion, eliminating the need for frequent replacement and reducing equipment maintenance costs.

[0111] Furthermore, the retractable sealing component 543 includes a gas inlet 5431, which is connected to a gas source for supplying purging or cleaning gas. In practical applications, the gas source supplies gas into the retractable sealing component 543 through the gas inlet 5431 to purge and clean the space around the bearing shaft 540, ensuring the cleanliness of the environment around the bearing shaft 540. Simultaneously, this gas also prevents process gases or residual oxides or other particles in the vacuum reaction chamber 100 from diffusing to the bearing shaft 540 and bellows, thus preventing the bearing shaft 540 and bellows from being affected by the internal environment (e.g., the deposition of a thin film on the surface of the bearing shaft 540 or bellows, with the risk of particle shedding, or oxide corrosion causing metal contamination). This helps extend the maintenance cycle of the bearing shaft 540 and the bearing disc 550, improving their service life.

[0112] Based on the same inventive concept, the present invention also provides a base assembly, the base assembly including a base 400 and the aforementioned base support driving assembly 500, the base support driving assembly 500 being used to support and drive the base 400.

[0113] Based on the same inventive concept, the present invention also provides a deposition apparatus including the aforementioned base assembly. It is understood that the base-supporting drive assembly 500 and its base assembly are not limited to the aforementioned deposition apparatus; in other embodiments, they can also be applied to other types of deposition apparatuses. The present invention does not limit this, meaning the deposition apparatus is not limited to the aforementioned chemical vapor deposition apparatus. For example, in another embodiment, the deposition apparatus includes four vacuum reaction chambers 100, each vacuum reaction chamber 100 being configured with a set of base assemblies including the base-supporting drive assembly 500.

[0114] In summary, in the base support drive assembly 500, its base 400 assembly, and the deposition apparatus of the present invention, the base support drive assembly 500 sets the lifting pin drive device 530 on the drive output path of the base drive device 520. By driving the base lifting frame 510 with the base drive device 520, the lifting pin drive device 530 and the support plate 550 move synchronously with the base 400. This method eliminates the need for the lifting pin drive device 530 to drive the support plate 550 and the lifting pin 420 during the lifting and lowering of the base 400, thus reducing the drive stroke requirement of the lifting pin drive device 530 and improving the control accuracy of the lifting pin drive device 530 in driving the lifting pin 420. Simultaneously, since the support plate 550 can move synchronously with the base 400 during its lifting and lowering, there is no need to constantly ensure that the support plate 550 avoids the movement of the base 400, which helps reduce the complexity of the drive operation and simplifies the lifting and lowering control process. On the other hand, the integrated design of the lifting pin drive device 530 and the base drive device 520 can reduce additional space occupation and help improve space utilization efficiency.

[0115] Furthermore, the base drive device 520 of the base support drive assembly 500 combines the first support frame 521, ball screw 522, nut seat 524 and first drive device 523, etc., to provide high transmission efficiency. The base drive device 520 converts the rotational motion of the ball screw 522 into the up and down movement of the base lifting frame 510, which can realize precise positioning and motion control of the base lifting frame 510 drive, and helps to improve the control accuracy of the base lifting frame 510 drive.

[0116] Furthermore, the lifting pin drive device 530 of the base-supported drive assembly 500 combines the second support frame 531, the second guide structure 532, the auxiliary support plate 533, and the second drive device 534, which not only enables precise control of the drive of the bearing plate 550 and the lifting pin 420 to ensure transmission efficiency, but also ensures the alignment of the drive based on the second guide structure 532, preventing the lifting pin 420 from touching the side wall of the lifting pin hole 410, thus helping to ensure the alignment and stability of the lifting pin 420.

[0117] Although the present invention has been described in detail through the preferred embodiments above, it should be understood that the above description should not be considered as a limitation of the present invention. Various modifications and substitutions to the present invention will be apparent to those skilled in the art after reading the above description. Therefore, the scope of protection of the present invention should be defined by the appended claims.

Claims

1. A base-supported drive assembly for a deposition apparatus, characterized in that, include: A base lifting frame for supporting a base, the base having a plurality of lifting pin holes penetrating its thickness; A base drive device is used to drive the base lifting frame to move up and down; A lifting pin drive device is fixedly connected to the base lifting frame; A bearing shaft, which is connected to the lifting pin drive device; A support plate is supported on the support shaft. The support plate is used to carry multiple independent lifting pins. Each lifting pin is located in a lifting pin hole. The lifting pin driving device can drive the support shaft to move up and down, thereby driving the support plate and the lifting pins it carries to move up and down together.

2. The base support drive assembly for a deposition apparatus as described in claim 1, characterized in that, The base driving device includes: First support frame; A ball screw is rotatably connected to the first support frame, and the base lifting frame is connected to the ball screw via a nut seat, the nut seat being located between the base lifting frame and the ball screw; A first guide structure is provided through the base lifting frame. The first guide structure is arranged parallel to the ball screw and is fixedly connected to the first support frame. The first driving device, wherein the ball screw is fixedly connected to the output end of the first driving device.

3. The base support drive assembly for a deposition apparatus as described in claim 2, characterized in that, The ball screw is rotatably connected to two connection points of the first support frame via a first bearing and a second bearing.

4. The base support drive assembly for a deposition apparatus as described in claim 3, characterized in that, The first support frame includes a side wall, a bottom wall connected to the side wall, an upper connection and a lower connection. The upper connection is connected to the side wall, and the lower connection is located on the bottom wall. The ball screw is connected to the upper connection through a first bearing and to the lower connection through a second bearing. The first bearing is a deep groove ball bearing, and the second bearing is an angular contact ball bearing.

5. The base support drive assembly for a deposition apparatus as described in claim 3 or 4, characterized in that, The outer ring of the second bearing is fixed to the first support frame by a bearing baffle. And / or, the inner ring of the second bearing is locked to the ball screw by a locking block.

6. The base support drive assembly for a deposition apparatus as described in claim 2, characterized in that, The ball screw is connected to the output end of the first drive device via a coupling.

7. The base support drive assembly for a deposition apparatus as described in claim 2, characterized in that, Also includes: At least one first limiting structure is provided, which is used to limit the vertical movement of the base lifting frame.

8. The base support drive assembly for a deposition apparatus as described in claim 7, characterized in that, The first limiting structure is provided with a first buffer structure on the side facing the base lifting frame.

9. The base support drive assembly for a deposition apparatus as described in claim 2, characterized in that, Also includes: At least one first positioning device is provided for positioning the travel of the base lifting frame.

10. The base support drive assembly for a deposition apparatus as described in claim 9, characterized in that, The first positioning device includes: At least one first photoelectric switch includes two first photoelectric sensors disposed opposite to each other, the first photoelectric sensors being used to receive light signals; A first baffle is disposed on the base lifting frame, and the base lifting frame can be moved up and down to position the first baffle between the two first photoelectric sensors of the first photoelectric switch.

11. The base support drive assembly for a deposition apparatus as claimed in claim 1, characterized in that, The lifting pin drive device includes: The second support frame is fixedly connected to the base lifting frame; The second guide structure is fixedly connected to the second support frame; An auxiliary support plate is slidably connected to the second guide structure, and the bearing shaft is connected to the auxiliary support plate; The second driving device is connected to the auxiliary support plate. The second driving device can drive the auxiliary support plate to move up and down along the second guide structure, so as to drive the bearing shaft to move up and down.

12. The base support drive assembly for a deposition apparatus as claimed in claim 11, characterized in that, The bearing shaft is fixedly connected to the auxiliary support plate; Alternatively, the bearing shaft and the auxiliary support plate are connected by an adjustment assembly, which can adjust the vertical position of the bearing shaft.

13. The base support drive assembly for a deposition apparatus as described in claim 12, characterized in that, The bearing shaft includes a flange, the flange having a first threaded hole, and the adjusting assembly includes: A hollow stud structure has threaded structures on both its inner and outer walls, and the outer wall of the hollow stud structure is threadedly connected to the first threaded hole. A screw structure comprising a nut and a stud, wherein a second threaded hole is provided on the auxiliary support plate, and the stud penetrates the hollow stud structure and its bottom is threadedly connected to the second threaded hole; An adjusting nut is threaded to the outer wall of the hollow stud structure.

14. The base support drive assembly for a deposition apparatus as claimed in claim 11, characterized in that, Also includes: At least one second limiting structure is provided, which is used to restrict the vertical movement of the auxiliary support plate.

15. The base support drive assembly for a deposition apparatus as described in claim 14, characterized in that, The second limiting structure has a second buffer structure on the side facing the auxiliary support plate.

16. The base support drive assembly for a deposition apparatus as claimed in claim 11, characterized in that, Also includes: At least one second positioning device is provided, which is used for positioning the stroke of the auxiliary support plate.

17. The base support drive assembly for a deposition apparatus as described in claim 16, characterized in that, The second positioning device includes: At least one second photoelectric switch includes two second photoelectric sensors disposed opposite to each other, the second photoelectric sensors being used to receive light signals; The second baffle is disposed on the auxiliary support plate. The up and down movement of the auxiliary support plate can cause the second baffle to be located between the two second photoelectric sensors of the second photoelectric switch.

18. The base support drive assembly for a deposition apparatus as claimed in claim 1, characterized in that, Also includes: A retractable sealing component is disposed around the bearing shaft. The retractable sealing component is disposed outside the vacuum reaction chamber of the deposition device. One end of the retractable sealing component is connected to the outer wall of the vacuum reaction chamber, and the other end is connected to the lifting pin drive device.

19. The base support drive assembly for a deposition apparatus as described in claim 18, characterized in that, The retractable sealing component includes a gas inlet, which is connected to a gas source.

20. The base support drive assembly for a deposition apparatus as claimed in claim 1, characterized in that, The base support drive assembly includes multiple base drive devices, and each of the base drive devices is evenly arranged along the circumference of the base lifting frame; And / or, the base bearing drive assembly includes a plurality of lifting pin drive devices and bearing shafts, and each of the lifting pin drive devices and bearing shafts is evenly arranged along the circumference of the bearing disk; And / or, the base drive device is arranged opposite to the lifting pin drive device.

21. A base assembly, characterized in that, include: Base; The base support drive assembly as described in any one of claims 1 to 20 is used to support and drive the base.

22. The base assembly as claimed in claim 21, characterized in that, The base includes a top plate and a neck, and the base lifting frame that carries the drive assembly has an opening extending through its thickness, with the neck positioned within the opening.

23. The base assembly as claimed in claim 21, characterized in that, The base is fixedly connected to the base lifting frame of the base-supporting drive assembly.

24. A deposition apparatus, characterized in that, include: The base assembly as claimed in any one of claims 21 to 23.

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