Electrolyte composition and mask plate

Abstract

The application discloses an electrolyte composition and a mask plate, the electrolyte composition comprising a corrosion inhibitor and a polyether modified polysiloxane compound, the corrosion inhibitor having a carboxylate group and an antistatic group, the carboxylate group being capable of providing a lone pair of electrons, strongly chemisorbing or coordinating with metal atoms or ions on the surface of the mask plate, and helping the corrosion inhibitor molecules to be tightly and firmly anchored on the metal surface to form a dense protective layer, the protective layer being capable of isolating the direct contact between corrosive media and the metal; in addition, the corrosion inhibitor also has the antistatic group, the antistatic group being capable of helping to homogenize the charge distribution on the cathode surface and preventing corrosion caused by excessively high local current density, so that the electrolyte composition has both high cleaning efficiency and excellent corrosion inhibition performance.

Description

Technical Field

[0001] This application relates to the field of display technology, and more particularly to an electrolyte composition and a photomask. Background Technology

[0002] A fine metal mask (FMM) is an ultra-thin, high-precision metal sheet, typically made of nickel-iron alloy, with a thickness of only tens of micrometers and an extremely low coefficient of thermal expansion. In the vapor deposition process of displays such as OLEDs, FMMs are used to precisely position the vapor-deposited material to form pixel patterns, and the precision of these patterns directly affects the resolution and image quality of the display.

[0003] During the vapor deposition process, contaminants such as organic light-emitting materials, metal particles, and environmental dust can easily adhere to the surface of the FMM and its micron-sized slits. If cleaning is not thorough, the residues will clog the openings, leading to problems such as uneven vapor deposition, color deviation, and decreased brightness. In severe cases, it can even cause permanent damage to the FMM.

[0004] Currently, the industry generally uses electrolytic cleaning to clean FMMs. This method places the FMM as the cathode in an electrolyte, and hydrogen bubbles are generated on the cathode surface through electrochemical polarization. The physical stripping effect of the bubbles is then used to remove contaminants.

[0005] However, in order to improve the cleaning efficiency of the electrolyte, most electrolytes are strongly alkaline. During long-term or high-current cleaning, electrochemical corrosion is likely to occur on the FMM surface, resulting in surface roughening, pore deformation, etc., which seriously affects the reusability accuracy and lifespan of the FMM. Summary of the Invention

[0006] In view of this, this application provides an electrolyte composition and a mask, which aims to improve the problem that electrolytes cannot simultaneously possess both high cleaning efficiency and excellent corrosion inhibition properties.

[0007] In a first aspect, the embodiments of this application are implemented as follows: an electrolyte composition comprising a strong electrolyte, a corrosion inhibitor, a surfactant, an additive, and a solvent; The corrosion inhibitor has the structure shown in formula (1): R-(Y) m COO - M + ) n Equation (1); R is selected from C2~C 20 Aliphatic groups; Y is selected from antistatic groups; COO - M + Selected from carboxylate groups; m is selected from integers from 1 to 20; n is an integer greater than or equal to 1.

[0008] Optionally, in some embodiments of this application, the antistatic group includes at least one of hydroxyl, amino, and thiol groups; and / or M is selected from H, K, or Na.

[0009] Optionally, in some embodiments of this application, the corrosion inhibitor has a structure as shown in formula (2): AR-(Y) m COO - M + ) n Equation (2); A is selected from at least one of aromatic rings, cycloalkyl groups, and heterocyclic groups.

[0010] Optionally, in some embodiments of this application, the corrosion inhibitor includes at least one of sodium citrate, hydrolyzed polymaleic anhydride, sodium tartrate, and sodium polyacrylate.

[0011] Optionally, in some embodiments of this application, the solvent includes at least one of water and an organic solvent; The surfactant includes polyether-modified polysiloxane; The strong electrolyte includes at least one of sodium carbonate, sodium bicarbonate, potassium carbonate, potassium bicarbonate, sodium borate, sodium metasilicate, potassium hydroxide, lithium hydroxide, sodium hydroxide, and calcium hydroxide. The adjuvant includes at least one of chelating agents, dispersants, and buffers; The organic solvent includes at least one of ethanol, ethylene glycol, propylene glycol, glycerol, isopropanol, isoamyl alcohol, n-butanol, cyclohexanol ethylene glycol butyl ether, and diethylene glycol monomethyl ether.

[0012] Optionally, in some embodiments of this application, the resistivity of the water in the solvent is greater than 18 MΩ / cm.

[0013] Optionally, in some embodiments of this application, the electrolyte composition comprises the following components in parts by weight: The strong electrolyte is 4 to 10 parts, the corrosion inhibitor is 0.001 to 3 parts, the surfactant is 0.001 to 6 parts, the additive is 0.001 to 1 part, and the solvent is 40 to 200 parts.

[0014] Optionally, in some embodiments of this application, the mass ratio of the corrosion inhibitor to the surfactant ranges from 1 to 30.

[0015] Secondly, embodiments of this application provide a mask obtained by cleaning with the electrolyte composition as described above.

[0016] The electrolyte composition of this application includes a strong electrolyte, a corrosion inhibitor, a surfactant, an additive, and a solvent. The corrosion inhibitor contains a carboxyl group, which can provide lone pairs of electrons and undergo strong chemical adsorption or coordination with metal atoms or ions on the substrate surface. This helps the corrosion inhibitor molecules to be tightly and firmly anchored on the FMM surface to form a dense protective film. The corrosion inhibitor also contains an antistatic group, which helps to make the charge distribution on the cathode surface more uniform and prevents corrosion caused by excessive local current density. Therefore, this electrolyte composition can play an effective cleaning role and also prevent corrosion of the substrate surface. Attached Figure Description

[0017] To more clearly illustrate the technical solutions in the embodiments of the present invention, the accompanying drawings used in the description of the embodiments will be briefly introduced below. Obviously, the accompanying drawings described below are only some embodiments of the present invention. For those skilled in the art, other drawings can be obtained based on these drawings without creative effort.

[0018] Figure 1 This is a schematic diagram of the planar structure of the mask in some embodiments of this application; Figure 2 This is a SEM image of the electrolyte composition of Comparative Example 1 provided in this application after washing for 300 h; Figure 3 These are SEM images of the electrolyte composition of Example 1 provided in this application after washing for 300 hours; Figure 4 These are images of Comparative Example 1 (left) and Example 1 (right) provided in this application after 300 hours.

[0019] Explanation of reference numerals in the attached figures: 10. Substrate; 101. Mask hole. Detailed Implementation

[0020] The technical solutions of the embodiments of this application will be clearly and completely described below with reference to the accompanying drawings. Obviously, the described embodiments are only some embodiments of this application, and not all embodiments. Based on the embodiments of this application, all other embodiments obtained by those skilled in the art without creative effort are within the scope of protection of this application. Furthermore, it should be understood that the specific embodiments described herein are only for illustration and explanation of this application and are not intended to limit this application. Unless otherwise defined, all technical and scientific terms used herein have the same meaning as commonly understood by those skilled in the art to which this invention pertains.

[0021] Currently, the industry commonly uses electrolytic cleaning to clean FMMs. This method places the FMM as the cathode in an electrolyte solution, where electrochemical polarization generates hydrogen bubbles on the cathode surface. These bubbles then physically remove contaminants. However, existing electrolytic cleaning technologies still have the following significant drawbacks: 1. Limited cleaning effect: Traditional electrolytes are insufficient for cleaning submicron-sized fine particles and organic residues, often requiring increased current density or extended cleaning time to compensate, resulting in increased energy consumption and extended process time. 2. Significant Corrosion Risk: To improve conductivity and cleaning efficiency, highly alkaline electrolytes (such as NaOH and KOH) are often used. During prolonged or high-current cleaning, the FMM surface is prone to electrochemical corrosion, especially due to dissolved oxygen or impurity ions in the solution (such as Cl). - The presence of ) will accelerate the corrosion of metal materials, leading to surface roughening and opening deformation, which will seriously affect the reusability accuracy and lifespan of FMM; 3. Insufficient corrosion inhibition measures: Corrosion inhibitors are often added to reduce corrosion. However, traditional inorganic corrosion inhibitors (such as phosphates and silicates) have limited corrosion inhibition efficiency in strongly alkaline systems and may introduce environmental burden; while organic corrosion inhibitors (such as amines and azoles) are prone to decomposition and failure under high temperature and strongly alkaline conditions, making it difficult to provide continuous and stable protection for FMM during the cleaning process.

[0022] Therefore, embodiments of this application provide an electrolyte composition and a mask, which aim to enable the electrolyte composition to simultaneously possess good cleaning ability and excellent corrosion inhibition properties.

[0023] According to a first aspect of the embodiments of this application, an electrolyte composition is provided, the electrolyte composition comprising a strong electrolyte, a corrosion inhibitor, a surfactant, an additive, and a solvent; The corrosion inhibitor has the structure shown in formula (1): R-(Y) m COO - M + ) n Equation (1); R is selected from C2~C 20 Aliphatic groups; Y is selected from antistatic groups; COO - M + Selected from carboxylate groups; m is selected from integers from 1 to 20; n is an integer greater than or equal to 1.

[0024] The electrolyte composition of this application includes a strong electrolyte, a corrosion inhibitor, a surfactant, an additive, and a solvent. The corrosion inhibitor contains a carboxyl group, which can provide lone pairs of electrons and undergo strong chemical adsorption or coordination with metal atoms or ions on the substrate surface. This helps the corrosion inhibitor molecules to be tightly and firmly anchored on the FMM surface to form a dense protective film. The corrosion inhibitor also contains an antistatic group, which helps to make the charge distribution on the cathode surface more uniform and prevents corrosion caused by excessive local current density. Therefore, this electrolyte composition can play an effective cleaning role and also prevent corrosion of the substrate surface.

[0025] More specifically, the corrosion inhibitor in this application embodiment has multiple carboxylate groups (n≥1). These multiple carboxylate groups can form multiple chemisorption sites on the substrate surface, which helps to enhance the adsorption strength of small particulate pollutants, thereby ensuring that the pollutants are not easily desorbed. Moreover, each carboxylate group also has multiple antistatic groups (m is selected from natural numbers from 1 to 20). These groups can not only enhance adsorption through hydrogen bonding and / or coordination, but also regulate interfacial charge, improve hydrophilicity, and inhibit local corrosion.

[0026] Furthermore, by selecting the chain length of R, the type and number of Y (m), and the number of carboxyl groups (n), corrosion inhibitors can help to finely adjust the hydrophilicity-hydrophobicity balance, adsorption configuration, and steric hindrance of molecules, thereby optimizing corrosion inhibition and cleaning effects in different electrolytes.

[0027] In some embodiments of this application, the antistatic group includes one of hydroxyl, amino, and mercapto groups.

[0028] By adopting the above scheme, during the electrolytic cleaning process, the surface of the mask serving as the cathode becomes rich in electrons and cations. The antistatic groups repel the cathode, which helps the carboxylate groups to better exert their anchoring effect. Hydroxyl, amino, and mercapto groups, among other antistatic groups, can adsorb or attract cations in the electrolyte through hydrogen bonding, dipole interactions, or weak coordination, thereby forming a more uniform and stable interface structure between the metal and the electrolyte. This effectively disperses and neutralizes locally accumulated charges, preventing pitting corrosion, intergranular corrosion, or surface roughening caused by uneven charge distribution and excessively high local current density, thus helping to maintain the uniformity of the substrate surface.

[0029] In some embodiments of this application, M is selected from H, K, or Na.

[0030] By adopting the above scheme, the carboxylate can be a carboxylic acid, potassium carboxylate, or sodium carboxylate, all of which can provide lone pair electrons and undergo strong chemical adsorption or coordination with metal atoms or ions on the substrate surface; moreover, sodium and potassium salts have good solubility in water, which helps to ensure that the corrosion inhibitor is uniformly dispersed in the electrolyte and effectively delivered to the substrate surface.

[0031] In some embodiments of this application, the corrosion inhibitor has a structure as shown in formula (2): AR-(Y) m COO - M + ) n Equation (2); A is selected from at least one of aromatic rings, cycloalkyl groups, and heterocyclic groups.

[0032] By employing the above scheme, A is selected from at least one of aromatic rings, cycloalkyl groups, and heterocyclic groups. These sterically hindered groups have a large volume, which helps to increase the spatial occupancy of the corrosion inhibitor molecules on the substrate surface, effectively preventing corrosive ions or active substances from directly contacting the substrate surface. In particular, it can effectively prevent local pitting corrosion and grain boundary corrosion, thereby maintaining the integrity of the substrate surface during long-term electrolytic cleaning. In addition, after introducing the A group, the adsorption energy of the corrosion inhibitor molecules on the substrate surface increases significantly, indicating that during dynamic cleaning, the corrosion inhibitor molecules are in a dynamic equilibrium of adsorption-desorption, but their desorption rate is relatively reduced and their adsorption state is more stable. When contaminants are peeled off during the cleaning process or the protective film is locally disturbed due to bubble impact, the corrosion inhibitor molecules containing A in the electrolyte can fill the gaps more quickly and accurately, realizing the self-repair of the protective film.

[0033] Moreover, these sterically hindered groups can enhance the adsorption strength and orientation stability of corrosion inhibitor molecules on the substrate surface, making the formed protective film more robust, dense, and corrosion-inhibiting. Cycloalkyl groups are flexible alicyclic structures, which allow them to better adapt to potential microscopic irregularities on the substrate surface through conformational adjustments, facilitating the formation of a more continuous and defect-free protective film.

[0034] In some embodiments of this application, the strong electrolyte includes, but is not limited to, at least one of sodium carbonate, sodium bicarbonate, potassium carbonate, potassium bicarbonate, sodium borate, sodium metasilicate, potassium hydroxide, lithium hydroxide, sodium hydroxide, and calcium hydroxide.

[0035] In some embodiments of this application, the surfactant includes polyether-modified polysiloxane. Preferably, the surfactant includes polyether-modified polydimethylsiloxane.

[0036] By adopting the above scheme, polyether-modified polysiloxanes possess hydrophobic, low surface tension, and high flexibility properties, which facilitate rapid adsorption and spreading on the FMM surface and within its micron-sized slits. This provides uniform interfacial conditions for subsequent electrolytic cleaning reactions, thereby ensuring thorough cleaning without dead zones. Furthermore, the flexible polyether-modified polysiloxane molecules are more likely to penetrate into the fine structure and carry in some electrolyte, playing a crucial role in removing contaminants deep within the slits.

[0037] In some embodiments of this application, the adjuvant includes at least one of chelating agents, dispersants, and buffers.

[0038] By employing the above scheme, the chelating agent may include at least one of ethylenediaminetetraacetic acid (EDTA) and its salts, diethylenetriaminepentaacetic acid (DTA) and its salts, polyaspartic acid and its salts, sodium citrate, and sodium silicate. For example, EDTA-2Na, EDTA-4Na, etc., may be used as EDTA; and DTPA, etc., may be used as DTA.

[0039] The dispersant may include at least one of polyacrylic acid and its salts, polymaleic anhydride copolymers, polyaspartic acid, and sodium hexametaphosphate. For example, sodium polyacrylate may be used as a dispersant.

[0040] The buffer may include at least one of carbonates, bicarbonates, borates, and phosphates. For example, carbonates may be sodium carbonate, potassium carbonate, etc.; bicarbonates may be sodium bicarbonate, potassium bicarbonate, etc.; borates may be boric acid, etc.; and phosphates may be sodium hydrogen phosphate, sodium dihydrogen phosphate, etc.

[0041] In some embodiments of this application, the solvent may include a combination of water and organic solvents.

[0042] In some embodiments of this application, the resistivity of water in the solvent is greater than 18 MΩ / cm. Water with a high resistivity can serve as a favorable solvent in the electrolyte, allowing it to fully ionize and providing the necessary ionic conductivity for the electrolytic cleaning process.

[0043] In some embodiments of this application, the organic solvent may include at least one of ethanol, ethylene glycol, propylene glycol, glycerol, isopropanol, isoamyl alcohol, n-butanol, cyclohexanol ethylene glycol butyl ether, and diethylene glycol monomethyl ether.

[0044] By employing the above method, contaminants on the substrate surface, including residual organic light-emitting materials from vapor deposition, can be dissolved in organic solvents, which helps improve the electrolyte's solubility in these contaminants. If water is used alone as a solvent, its high surface tension prevents effective wetting and penetration into the microstructure of the substrate surface. Organic solvents, on the other hand, reduce surface tension, facilitating rapid spread of the electrolyte and penetration into micron-level crevices, ensuring strong cleaning power and corrosion inhibition.

[0045] In some embodiments of this application, 4 to 10 parts of a strong electrolyte, 0.001 to 3 parts of a corrosion inhibitor, 0.001 to 6 parts of a surfactant, 0.001 to 1 part of an additive, and 40 to 200 parts of a solvent are used.

[0046] In some embodiments of this application, 4 to 8 parts of a strong electrolyte, 0.01 to 3 parts of a corrosion inhibitor, 0.01 to 6 parts of a surfactant, 0.001 to 1 part of an additive, and 40 to 200 parts of a solvent are used.

[0047] In some embodiments of this application, 5 to 7 parts of a strong electrolyte, 0.05 to 2 parts of a corrosion inhibitor, 0.01 to 3 parts of a surfactant, 0.01 to 1 part of an additive, and 40 to 200 parts of a solvent are used.

[0048] By adopting the above scheme, the corrosion inhibitor and surfactant can work synergistically to help optimize the wettability of the surface and maintain the dynamic balance of adsorption-desorption, so that the FMM surface has dynamic repair ability after cleaning, thereby ensuring that the electrolyte composition has high cleaning efficiency and excellent corrosion inhibition performance.

[0049] In some embodiments of this application, the mass ratio of corrosion inhibitor to surfactant ranges from 1 to 30. Exemplarily, the mass ratio of corrosion inhibitor to surfactant ranges from 1 to 10. Exemplarily, the mass ratio of corrosion inhibitor to surfactant can be 1, 2, 3, 4, 5, 6, 7, 8, 9, 10, or any value between two adjacent values ​​mentioned above.

[0050] By adopting the above scheme, the mass ratio of corrosion inhibitor to surfactant is within a suitable range, which helps to ensure that sufficient corrosion inhibitor molecules cover the active sites on the substrate surface, thereby achieving a good cleaning effect; at the same time, it can also stabilize the charge and wettability of the substrate surface.

[0051] According to a second aspect of the embodiments of this application, a mask is provided, which is obtained by cleaning with the electrolyte composition as described above.

[0052] Please see Figure 1The photomask includes a substrate 10 with mask holes 101, through which vapor deposition material can pass and be deposited in the photomask. The photomask in this embodiment has a clean surface and excellent corrosion inhibition capability.

[0053] The present application will be specifically described below through specific embodiments. These embodiments are only some embodiments of the present application and are not intended to limit the present application. Unless otherwise specified, the raw materials used in the following embodiments are all commercially available products.

[0054] Example 1 An electrolyte composition is prepared by the following method: Prepare 5% potassium hydroxide, 0.05% hydroxyethylidene diphosphonic acid, 0.025% polyether-modified polydimethylsiloxane 200, 0.025% ethylenediaminetetraacetic acid (EDTA), 0.05% sodium hexametaphosphate, 92% water, and 1.5% ethanol. The aforementioned components are stirred and mixed to obtain an electrolyte composition.

[0055] Example 2 The difference from Example 1 is that the type of electrolyte is changed; in this example, sodium hydroxide is used as the electrolyte.

[0056] Example 3 The difference from Example 1 is that the type of chelating agent has been changed. In this example, sodium silicate is used as the chelating agent.

[0057] Example 4 The difference from Example 1 is that the type of chelating agent has been changed. In this example, polyaspartic acid is used as the chelating agent.

[0058] Example 5 The difference from Example 1 is that the type of chelating agent has been changed. In this example, diethylenetriaminepentaacetic acid is used as the chelating agent.

[0059] Table 1 Composition of Specific Embodiments and Comparative Examples

[0060] Performance testing: The electrolytic cleaning effect of the electrolyte compositions of Examples 1-5 and Comparative Examples 1-5 on photomasks was investigated. The test methods are as follows: 1. Cut the FMM to a size of 2.0 cm × 3.0 cm and connect it to the cathode electrode. Use the platinum titanium mesh electrode as the anode for electrolysis. 2. Prepare the electrolytes for the examples and comparative examples; 3. The electrodes were placed in the electrolyte and cleaned by electrolysis at 25°C for 10 minutes at room temperature. A long-term corrosion test was conducted after 300 hours of electrolysis. After electrolysis for the specified time, the electrolyte residue on the electrodes was rinsed with isopropanol and then cleaned with pure water. The electrodes were then dried with nitrogen gas and observed under a microscope. The results are shown in Table 2. Figure 1-4 As shown; Among them: Bubble performance: In a graduated measuring cylinder, air is bubbled in from the bottom for an extended period of time, and the real-time height of the foam layer over time is recorded. After stabilization, it is observed whether the bubble height increases over time; Cleaning effect: An organic light-emitting material was deposited on the mask by evaporation, followed by electrolytic cleaning. The OM (50x) was used to check whether there was any organic material residue on the mask surface after cleaning. Corrosivity of 300h Mask: Electrolyze the mask at 10A for 300h and observe whether the mask changes weight and whether the surface turns yellow (percentage of yellowed area). Check for corrosion on the anode surface (use platinum-plated titanium as the anode and observe whether it turns black to determine if it is corroded). After 300 hours of testing, the electrolyte was sent for ICP-MS testing to compare the metal ions before and after the test to see if they increased (whether the iron and nickel ions in the mask were dissolved into the electrolyte).

[0061] The test results are shown in Table 2. Table 2

[0062] As can be seen from Tables 1 and 2, the combination of a specific corrosion inhibitor and surfactant used in this application has the best effect in terms of bubble removal, cleaning and corrosion performance. The corrosion inhibitor or surfactant used alone has slightly worse corrosion and cleaning results. The corrosion and cleaning effects of using a non-corrosion inhibitor and surfactant are very poor.

[0063] from Figure 2-4 It can be observed that after 300 hours of electrolysis, the SEM surface of the FMM showed that the alloy surface cleaned with the electrolyte containing the corrosion inhibitor and surfactant combination of this application was significantly rougher than the alloy surface cleaned with the electrolyte containing the corrosion inhibitor and surfactant combination of this application. The results indicate that cleaning with the electrolyte containing the corrosion inhibitor and surfactant combination of this application has a protective effect on the alloy surface.

[0064] In summary, compared with ordinary corrosion inhibitors, the corrosion inhibitor used in this application can effectively form a protective layer on the mask surface. This adsorbed molecular layer exerts its protective effect in the following ways: a) Physical barrier layer (barrier effect): The adsorbed molecular layer constitutes a microscopic, flexible barrier between the mask surface and the electrolyte. It sterically hinders active ions in the solution (such as H3O).+ Despite its low concentration in alkaline solutions, dissolved oxygen and any colloidal particles directly and rapidly impact or contact the mask surface. This reduces the probability of unintended chemical or electrochemical reactions on the surface. b. Synergistically interacting with polyether-modified siloxanes (surfactants), it stabilizes surface charge and wettability. The adsorbed molecular layer helps to homogenize the charge distribution on the cathode surface, preventing pitting or roughening caused by excessively high local current densities. Polyether-modified siloxanes improve the hydrophilicity of the FMM surface, allowing for uniform wetting by cleaning solutions and subsequent rinsing water, avoiding dry spots or residues caused by uneven wetting. The adsorption of the corrosion inhibitor on the mask surface is a dynamic adsorption-desorption equilibrium process; molecules continuously adsorb from the solution to the surface and continuously desorb from the surface. This dynamism ensures the self-healing ability of the protective layer, and when contaminants are peeled off the surface, molecules can quickly cover the newly exposed clean area.

[0065] The electrolyte composition and metal mask provided in the embodiments of this application have been described in detail above. Specific examples have been used to illustrate the principles and implementation methods of this application. The description of the above embodiments is only for the purpose of helping to understand the method and core ideas of this application. At the same time, for those skilled in the art, there will be changes in the specific implementation methods and application scope based on the ideas of this application. Therefore, the content of this specification should not be construed as a limitation of this application.

Claims

1. An electrolyte composition, characterized in that, The electrolyte composition includes a strong electrolyte, a corrosion inhibitor, a surfactant, an additive, and a solvent; The corrosion inhibitor has the structure shown in formula (1): R-(Y m COO - M + ) n Formula (1); R is selected from C2~C 20 Aliphatic groups; Y is selected from antistatic groups; COO - M + Selected from carboxylate groups; m is selected from integers from 1 to 20; n is an integer greater than or equal to 1.

2. The electrolyte composition according to claim 1, characterized in that, The antistatic group is selected from at least one of hydroxyl, amino, and thiol groups; and / or M is selected from H, K, or Na.

3. The electrolyte composition according to claim 1, characterized in that, The corrosion inhibitor has the structure shown in formula (2): A-R-(Y m COO - M + ) n Formula (2); A is selected from at least one of aromatic rings, cycloalkyl groups, and heterocyclic groups.

4. The electrolyte composition according to claim 1, characterized in that, The corrosion inhibitor includes at least one of sodium citrate, hydrolyzed polymaleic anhydride, sodium tartrate, and sodium polyacrylate.

5. The electrolyte composition according to any one of claims 1 to 4, characterized in that, The solvent includes at least one of water and organic solvents; The surfactant includes polyether-modified polysiloxane; The strong electrolyte includes at least one of sodium carbonate, sodium bicarbonate, potassium carbonate, potassium bicarbonate, sodium borate, sodium metasilicate, potassium hydroxide, lithium hydroxide, sodium hydroxide, and calcium hydroxide. The adjuvant includes at least one of chelating agents, dispersants, and buffers; The organic solvent includes at least one of ethanol, ethylene glycol, propylene glycol, glycerol, isopropanol, isoamyl alcohol, n-butanol, cyclohexanol ethylene glycol butyl ether, and diethylene glycol monomethyl ether.

6. The electrolyte composition according to claim 5, characterized in that, The water in the solvent has a resistivity greater than 18 MΩ / cm.

7. The electrolyte composition according to any one of claims 1 to 4, characterized in that, The electrolyte composition comprises the following components in parts by weight: The strong electrolyte is 4 to 10 parts, the corrosion inhibitor is 0.001 to 3 parts, the surfactant is 0.001 to 6 parts, the additive is 0.001 to 1 part, and the solvent is 40 to 200 parts.

8. The electrolyte composition according to any one of claims 1 to 4, characterized in that, The mass ratio of the corrosion inhibitor to the surfactant ranges from 1 to 30.

9. A photomask, characterized in that, It is obtained by cleaning with the electrolyte composition as described in any one of claims 1 to 8.

10. The photomask according to claim 9, characterized in that, The material of the mask includes a nickel-iron alloy.

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