A mask layout generation method, device, equipment and readable storage medium

By using mercury intrusion porosimetry pore size distribution data and full-size core scanning data to divide and establish statistical constraints during the microfluidic chip generation process, mask patterns for each domain are generated. Under the constraints of micro-nano fabrication technology, a consistent closed-loop processing is performed, which solves the problem of difficulty in unifying and coupling pore throat scale distribution and connectivity. This achieves the collaborative generation and manufacturability of high-precision biomimetic pores and fractures in cores.

CN122154567AActive Publication Date: 2026-06-05CHINA UNIV OF PETROLEUM (EAST CHINA)
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Patent Information

Authority / Receiving Office
CN · China
Patent Type
Applications(China)
Current Assignee / Owner
CHINA UNIV OF PETROLEUM (EAST CHINA)
Filing Date
2026-05-08
Publication Date
2026-06-05

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Abstract

The application discloses a mask layout generation method, device and equipment and a readable storage medium, relates to the technical field of oil and gas exploitation, and comprises the following steps: acquiring and utilizing mercury intrusion porosimetry pore size distribution data and full-size core scanning data of a target reservoir, dividing the target reservoir into a matrix domain, a micropore domain and a fracture domain, and establishing statistical constraints; in combination with the statistical constraints, generating a matrix domain mask layout corresponding to the matrix domain, generating a micropore domain mask layout corresponding to the micropore domain, and generating a fracture domain mask layout corresponding to the fracture domain; superimposing the matrix domain mask layout, the micropore domain mask layout and the fracture domain mask layout to obtain a superimposed mask layout; taking a micro-nano processing process as a hardware constraint and performing statistical consistency closed-loop processing on the mask layout, and obtaining a pore-fracture coupling mask layout satisfying silicon-based micro-nano processing manufacturability constraints when convergence is achieved. The application has the technical effect that a pore-fracture coupling mask layout satisfying manufacturability and statistical authenticity can be obtained.
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