Surge suppression method for etching machine power supply and related device

Abstract

The application provides a surge suppression method for an etching machine power supply and related devices, the method comprising: synchronously collecting and filtering the voltage and current of the load side of the etching machine power supply to obtain a voltage data sequence and a current data sequence; determining a voltage change rate sequence corresponding to the voltage data sequence; iteratively updating an initial load parameter vector to obtain a reference load parameter vector; updating an initial surge suppression model to obtain a target surge suppression model; determining a PWM duty cycle correction amount according to the target surge suppression model; determining a target switching frequency corresponding to the etching machine power supply; and performing a surge suppression operation on the etching machine power supply according to the PWM duty cycle correction amount and the target switching frequency to protect the etching machine load from overcurrent impact. By collecting voltage and current and updating electrical parameters, the surge suppression model is adaptively adjusted to improve the accuracy and adaptability of surge suppression.

Description

Technical Field

[0001] This application relates to the field of surge suppression technology, and in particular to a surge suppression method and related apparatus for etching machine power supplies. Background Technology

[0002] As a core process equipment in semiconductor manufacturing, etching machines require their power supplies to operate stably under complex conditions of strong electromagnetic interference, plasma radio frequency radiation, and frequent load step switching. Instantaneous spike currents and voltage surges are easily generated when the etching machine power supply is powered on, during sudden load changes, or when the mains voltage fluctuates. Existing conventional power supply protection solutions mostly employ fixed-parameter hardware clamping or a single PWM voltage regulation control method, which has poor load adaptability and cannot identify dynamic impedance changes in the etching machine load in real time.

[0003] Traditional suppression models have fixed parameters, which are difficult to adapt to the wide range of dynamic load characteristics of etching machines. They are prone to problems such as LC filter circuit resonance amplification, current suppression lag, parameter mismatch and reduced control accuracy. Relying solely on passive protection devices such as resistors and TVS cannot actively reduce surge impacts from the control level. Long-term repeated surge impacts can easily cause aging of power devices, burnout of back-end RF units and precision loads of etching machines, and limit the stability and service life of equipment operation.

[0004] Therefore, how to achieve adaptive surge suppression of the etching machine power supply to improve the accuracy and adaptability of surge suppression is an urgent problem to be solved. Summary of the Invention

[0005] This application provides a surge suppression method and related apparatus for etching machine power supplies. By real-time acquisition of the load-side voltage and current of the etching machine power supply, iteratively updating the resistance and capacitance parameters of the load to adaptively adjust the surge suppression model, and generating a PWM duty cycle correction amount accordingly, combined with the target switching frequency for control, adaptive surge suppression of the etching machine power supply is achieved, thereby improving the accuracy and adaptability of surge suppression.

[0006] In a first aspect, embodiments of this application provide a surge suppression method for an etching machine power supply, the method comprising: According to the preset acquisition frequency, the load-side voltage and load-side current of the etching machine power supply are synchronously acquired and filtered to obtain voltage data sequences and current data sequences; the etching machine power supply is used to supply power to the etching machine load. Determine the voltage change rate sequence corresponding to the voltage data sequence; Based on the voltage data sequence, the current data sequence, and the voltage change rate sequence, the preset initial load parameter vector is iteratively updated to obtain a reference load parameter vector; the reference load parameter vector includes reference resistance parameters and reference capacitance parameters, which are used to characterize the real-time electrical characteristics of the etching machine load; Based on the reference resistance parameters and the reference capacitance parameters, the preset initial surge suppression model is updated to obtain the target surge suppression model; The PWM duty cycle correction amount is determined based on the target surge suppression model; Determine the target switching frequency corresponding to the etching machine power supply; Based on the PWM duty cycle correction and the target switching frequency, surge suppression operation is performed on the etching machine power supply to protect the etching machine load from overcurrent surges.

[0007] Secondly, embodiments of this application provide a surge suppression device for an etching machine power supply. The device includes a data acquisition module, a first determination module, a first update module, a second update module, a second determination module, and a surge suppression module, wherein: The data acquisition module is used to synchronously acquire and filter the load-side voltage and load-side current of the etching machine power supply according to a preset acquisition frequency to obtain voltage data sequences and current data sequences; the etching machine power supply is used to supply power to the etching machine load. The first determining module is used to determine the voltage change rate sequence corresponding to the voltage data sequence; The first update module is used to iteratively update a preset initial load parameter vector according to the voltage data sequence, the current data sequence, and the voltage change rate sequence to obtain a reference load parameter vector; the reference load parameter vector includes reference resistance parameters and reference capacitance parameters, which are used to characterize the real-time electrical characteristics of the etching machine load; The second update module is used to update the preset initial surge suppression model according to the reference resistance parameters and the reference capacitance parameters to obtain the target surge suppression model; The second determining module is used to determine the PWM duty cycle correction amount based on the target surge suppression model; and to determine the target switching frequency corresponding to the etching machine power supply. The surge suppression module is used to perform surge suppression operation on the etching machine power supply according to the PWM duty cycle correction amount and the target switching frequency, so as to protect the etching machine load from overcurrent impact.

[0008] Thirdly, embodiments of this application provide an electronic device, including a processor, a memory, a communication interface, and one or more programs, wherein the one or more programs are stored in the memory and configured to be executed by the processor, and the programs include instructions for performing steps in any method of the first aspect of this application.

[0009] Fourthly, embodiments of this application provide a computer-readable storage medium storing a computer program for electronic data interchange, wherein the computer program causes a computer to perform some or all of the steps described in any method of the first aspect of this application.

[0010] Fifthly, embodiments of this application provide a computer program product, wherein the computer program product includes a non-transitory computer-readable storage medium storing a computer program operable to cause a computer to perform some or all of the steps described in any method of the first aspect of this application. The computer program product may be a software installation package.

[0011] As can be seen, by collecting the load-side voltage and current of the etching machine power supply in real time, iteratively updating the resistance and capacitance parameters of the load to adaptively adjust the surge suppression model, and generating the PWM duty cycle correction amount accordingly, combined with the target switching frequency for control, adaptive surge suppression of the etching machine power supply is achieved, thereby improving the accuracy and adaptability of surge suppression. Attached Figure Description

[0012] To more clearly illustrate the technical solutions of the embodiments of this application, the drawings used in the description of the embodiments will be briefly introduced below. Obviously, the drawings described below are some embodiments of this application. For those skilled in the art, other drawings can be obtained based on these drawings without creative effort.

[0013] Figure 1 This is a system architecture diagram of a surge suppression system provided in an embodiment of this application; Figure 2 This is a schematic diagram illustrating the composition of a digital control module provided in an embodiment of this application; Figure 3 This is a schematic diagram of the composition of a resistor divider-TVS cooperative clamping network provided in an embodiment of this application; Figure 4 This is a schematic diagram of the structure of an electronic device provided in an embodiment of this application; Figure 5 This is a schematic flowchart of a surge suppression method for an etching machine power supply provided in an embodiment of this application; Figure 6This is a schematic diagram of a process for determining the PWM duty cycle correction amount provided in an embodiment of this application; Figure 7 This is a flowchart illustrating the determination of a target switching frequency provided in an embodiment of this application; Figure 8 This is a functional module block diagram of a surge suppression device for an etching machine power supply provided in an embodiment of this application. Detailed Implementation

[0014] To enable those skilled in the art to better understand the present application, the technical solutions in the embodiments of the present application will be clearly and completely described below with reference to the accompanying drawings. Obviously, the described embodiments are only some embodiments of the present application, and not all embodiments. Based on the embodiments in the present application, all other embodiments obtained by those of ordinary skill in the art without creative effort are within the scope of protection of the present application.

[0015] The terms "first," "second," etc., in the specification, claims, and accompanying drawings of this application are used to distinguish different objects, not to describe a specific order. Furthermore, the terms "comprising" and "having," and any variations thereof, are intended to cover non-exclusive inclusion. For example, a process, method, system, product, or apparatus that includes a series of steps or units is not limited to the listed steps or units, but may optionally include steps or units not listed, or may optionally include other steps or units inherent to these processes, methods, products, or apparatuses.

[0016] It should be understood that the term "and / or" in this document is merely a description of the relationship between related objects, indicating that three relationships can exist. For example, A and / or B can represent: A existing alone, A and B existing simultaneously, or B existing alone. Additionally, the character " / " in this document indicates that the preceding and following related objects are in an "or" relationship. In the embodiments of this application, "multiple" refers to two or more.

[0017] In the embodiments of this application, "at least one item" or its similar expression refers to any combination of these items, including any combination of a single item or a plurality of items. "One or more" means one or more, while "multiple" means two or more. For example, "at least one item" of a, b, or c can represent the following seven cases: a, b, c; a and b; a and c; b and c; a, b, and c. Each of a, b, and c can be an element or a set containing one or more elements.

[0018] In this application, the term "connection" refers to various connection methods, such as direct connection or indirect connection, to achieve communication between devices. This application does not impose any limitations on this.

[0019] In this document, the term "embodiment" means that a particular feature, structure, or characteristic described in connection with an embodiment may be included in at least one embodiment of this application. The appearance of this phrase in various places throughout the specification does not necessarily refer to the same embodiment, nor is it a separate or alternative embodiment mutually exclusive with other embodiments. It will be explicitly and implicitly understood by those skilled in the art that the embodiments described herein can be combined with other embodiments.

[0020] The following is an explanation of the relevant terms used in this application: Transient Voltage Suppressor (TVS): A semiconductor device used for overvoltage protection of circuits. Utilizing its avalanche breakdown effect, it rapidly switches from a high-resistance state to a low-resistance state when the voltage across it exceeds its breakdown voltage, clamping the transient overvoltage within a preset safe voltage threshold, thereby protecting sensitive downstream circuits.

[0021] Pulse Width Modulation (PWM): A technique that modulates the width of a series of pulses to equivalently obtain a desired waveform (such as voltage or frequency). In power supply control and motor drive applications, the output voltage or current can be adjusted by changing the duty cycle (the ratio of the high-level time to the period).

[0022] Proportional-Integral-Derivative (PID) controller: A closed-loop feedback control algorithm widely used in industrial control systems. It generates a control quantity by weighting and summing the deviation between the setpoint and the actual value according to the proportional, integral and derivative terms, respectively, so that the system can quickly and stably follow the given value.

[0023] As a core process equipment in semiconductor manufacturing, etching machines require their power supplies to operate stably under complex conditions of strong electromagnetic interference, plasma radio frequency radiation, and frequent load step switching. Instantaneous spike currents and voltage surges are easily generated when the etching machine power supply is powered on, during sudden load changes, or when the mains voltage fluctuates. Existing conventional power supply protection solutions mostly employ fixed-parameter hardware clamping or a single PWM voltage regulation control method, which has poor load adaptability and cannot identify dynamic impedance changes in the etching machine load in real time.

[0024] Traditional suppression models have fixed parameters, which are difficult to adapt to the wide range of dynamic load characteristics of etching machines. They are prone to problems such as LC filter circuit resonance amplification, current suppression lag, parameter mismatch and reduced control accuracy. Relying solely on passive protection devices such as resistors and TVS cannot actively reduce surge impacts from the control level. Long-term repeated surge impacts can easily cause aging of power devices, burnout of back-end RF units and precision loads of etching machines, and limit the stability and service life of equipment operation.

[0025] Therefore, how to achieve adaptive surge suppression of the etching machine power supply to improve the accuracy and adaptability of surge suppression is an urgent problem to be solved.

[0026] To address the aforementioned problems, this application provides a surge suppression method and related apparatus for an etching machine power supply. First, based on a preset acquisition frequency, the load-side voltage and load-side current of the etching machine power supply are synchronously acquired and filtered to obtain voltage and current data sequences. The etching machine power supply provides power to the etching machine load. A voltage change rate sequence corresponding to the voltage data sequence is determined. Then, based on the voltage, current, and voltage change rate sequences, a preset initial load parameter vector is iteratively updated to obtain a reference load parameter vector. The reference load parameter vector includes reference resistance and reference capacitance parameters, used to characterize the real-time electrical characteristics of the etching machine load. Based on the reference resistance and reference capacitance parameters, a preset initial surge suppression model is updated to obtain a target surge suppression model. Then, a PWM duty cycle correction is determined based on the target surge suppression model. A target switching frequency corresponding to the etching machine power supply is determined. Finally, based on the PWM duty cycle correction and the target switching frequency, a surge suppression operation is performed on the etching machine power supply to protect the etching machine load from overcurrent surges.

[0027] As can be seen, by collecting the load-side voltage and current of the etching machine power supply in real time, iteratively updating the resistance and capacitance parameters of the load to adaptively adjust the surge suppression model, and generating the PWM duty cycle correction amount accordingly, combined with the target switching frequency for control, adaptive surge suppression of the etching machine power supply is achieved, thereby improving the accuracy and adaptability of surge suppression.

[0028] For easier understanding, please refer to Figure 1 , Figure 1 This is a system architecture diagram of a surge suppression system provided in an embodiment of this application. The surge suppression system includes an etching machine power supply, an etching machine load, a digital control module, and a resistor divider-TVS cooperative clamping network.

[0029] Specifically, the etching machine power supply powers the etching machine load; the etching machine load is the equivalent circuit of the plasma-generating chamber; the digital control module is responsible for data acquisition, parameter identification, surge suppression model updates, and PWM duty cycle correction calculations; the resistor divider-TVS collaborative clamping network is used to quickly clamp and dissipate transient surges at the hardware level. During system operation, the voltage and current signals of the etching machine load are fed back to the digital control module, which then performs load parameter identification and control quantity calculations. The digital control module outputs PWM modulation and switching frequency control commands to the etching machine power supply, forming a dual-layer surge suppression architecture of hardware passive protection and digital active control, effectively suppressing transient surge impacts under complex operating conditions of the etching machine.

[0030] It is evident that the dual-layer architecture combining hardware clamping and digital adaptive control enables rapid, precise, and adaptive suppression of transient surges in the etching machine's power supply, significantly improving the system's stability and load adaptability.

[0031] For easier understanding, please refer to Figure 2 , Figure 2 This is a schematic diagram of the composition of a digital control module provided in an embodiment of this application, wherein the digital control module includes a data acquisition unit, a parameter identification unit, a model update unit, and a control processing unit.

[0032] The data acquisition unit is responsible for synchronously sampling the load-side voltage and load-side current of the etching machine power supply according to the preset acquisition frequency, and performing digital filtering on the raw data to eliminate high-frequency noise, thereby obtaining voltage data sequence and current data sequence. At the same time, the backward differential method is used to calculate the voltage change rate sequence based on the voltage data sequence, providing accurate and aligned input data for subsequent parameter identification.

[0033] The parameter identification unit takes voltage data sequence, current data sequence and voltage change rate sequence as input, and uses a recursive least squares algorithm with forgetting factor to iteratively update the initial load parameter vector. By calculating the error between the predicted current and the actual current at each sampling point, and using the gain vector to correct the parameters, the unit finally outputs reference resistance parameters and reference capacitance parameters that reflect the real-time electrical characteristics of the etching machine load.

[0034] The model update unit extracts the real-time parasitic resistance and real-time load capacitance based on the reference resistance and reference capacitance parameters output by the parameter identification unit, and merges the fixed capacitance in the initial surge suppression model with the real-time load capacitance into an equivalent total capacitance. Then, the real-time parasitic resistance and equivalent total capacitance are used to replace the corresponding parameters in the initial transfer function, the poles are reconfigured, and a target surge suppression model that can adaptively match the current load condition is generated.

[0035] The control processing unit first calculates the deviation between the reference voltage and the real-time voltage, inputs the deviation into the target surge suppression model to obtain the PWM duty cycle correction, and superimposes it with the initial duty cycle to form the target duty cycle. At the same time, it calculates the LC resonant frequency based on the equivalent total capacitance and the filter inductance value, and determines the target switching frequency by combining it with the preset safety factor. Then, by comparing the real-time current with the surge current threshold, it immediately writes the target duty cycle and the target switching frequency into the PWM generator when an overcurrent occurs, generating a drive signal to suppress the surge in real time.

[0036] As can be seen, by real-time data acquisition, parameter identification, model updating and closed-loop control, adaptive matching and surge suppression of the etching machine load are achieved, which significantly improves the response speed and control accuracy of the etching machine power supply, thereby effectively protecting the etching machine load from overcurrent impact.

[0037] For easier understanding, please refer to Figure 3 , Figure 3 This is a schematic diagram of a resistor-TVS cooperative clamping network provided in an embodiment of this application. The resistor-TVS cooperative clamping network includes three stages of voltage divider resistors and a TVS (transient voltage suppressor diode). The three voltage divider resistors are connected in series, with one end connected to the positive terminal of the etching machine power supply output and the other end connected to the cathode of the TVS. The anode of the TVS is connected to the negative terminal of the etching machine power supply output. The three stages of voltage divider resistors are used to proportionally divide the input surge voltage, ensuring that the voltage across the TVS is within its rated breakdown voltage range, while simultaneously distributing power consumption and preventing individual resistors from overheating and failing.

[0038] The TVS (Transient Voltage Suppressor) operates using its avalanche breakdown characteristic: when the voltage after voltage division exceeds the TVS's breakdown voltage, the TVS quickly switches from a high-resistance state to a low-resistance state, clamping the transient overvoltage within a preset safety threshold. To prevent the TVS from being damaged by prolonged high current conduction, the network also integrates a bidirectional energy discharge channel, i.e., a pair of fast recovery diodes connected in reverse series in parallel across the TVS, forming a bidirectional low-impedance path. When the TVS breaks down, the fast recovery diodes conduct synchronously, guiding the surge energy to the ground terminal through the low-impedance path, thereby preventing the voltage divider resistor and TVS from failing due to overcurrent. The hardware layer (i.e., the resistor voltage divider-TVS collaborative clamping network) provides nanosecond-level response, smoothing out surge voltage spikes immediately; the software layer (i.e., the digital control module) dynamically adjusts the switching frequency and PWM duty cycle of the etching machine power supply on a microsecond to millisecond timescale to eliminate residual surge current.

[0039] As can be seen, rapid clamping is achieved by connecting a three-stage voltage divider resistor in series with a TVS, and a low-impedance discharge channel is formed by using a parallel bidirectional fast recovery diode. In conjunction with the digital control module, nanosecond-level hardware protection and microsecond-level adaptive regulation are achieved, effectively suppressing transient surge impacts on the etching machine power supply.

[0040] In one possible implementation, for multi-module parallel applications (such as multi-channel power supplies for etching machines), the surge suppression system also includes an input filtering and voltage equalization module. This module employs an integrated design of a planar transformer and a multilayer busbar to reduce lead inductance to below a preset requirement and balances impedance differences between parallel branches through cross-coupling capacitors. Simultaneously, the input filtering and voltage equalization module incorporates a current sharing feedback loop: a Hall current sensor is embedded at the output of each power module to collect current in each branch in real time; each sensor sends its current signal to the PID controller built into the surge suppression system, which adjusts the phase difference of the PWM signals of each module based on the current deviation, thereby controlling the current imbalance between multiple modules within the design requirements (e.g., less than 5%). This input filtering and voltage equalization module can be used in conjunction with a resistor divider-TVS co-clamping network and a digital control module to further enhance the surge suppression capability and current sharing performance of the multi-channel etching machine power supply.

[0041] The following is combined with Figure 4 The electronic devices in the embodiments of this application will be described. Figure 4 This is a schematic diagram of the structure of an electronic device provided in an embodiment of this application, such as... Figure 4 As shown, the electronic device includes one or more processors, a memory, a communication interface, and one or more programs. The processor is connected to the memory and the communication interface via an internal communication bus.

[0042] The processor can be used for: According to the preset acquisition frequency, the load-side voltage and load-side current of the etching machine power supply are synchronously acquired and filtered to obtain voltage data sequences and current data sequences; the etching machine power supply is used to supply power to the etching machine load. Determine the voltage change rate sequence corresponding to the voltage data sequence; Based on the voltage data sequence, the current data sequence, and the voltage change rate sequence, the preset initial load parameter vector is iteratively updated to obtain a reference load parameter vector; the reference load parameter vector includes reference resistance parameters and reference capacitance parameters, which are used to characterize the real-time electrical characteristics of the etching machine load; Based on the reference resistance parameters and the reference capacitance parameters, the preset initial surge suppression model is updated to obtain the target surge suppression model; The PWM duty cycle correction amount is determined based on the target surge suppression model; Determine the target switching frequency corresponding to the etching machine power supply; Based on the PWM duty cycle correction and the target switching frequency, surge suppression operation is performed on the etching machine power supply to protect the etching machine load from overcurrent surges.

[0043] The one or more programs are stored in the aforementioned memory and configured to be executed by the aforementioned processor, and the one or more programs include instructions for performing any step in the above method embodiments.

[0044] The processor can be a central processing unit (CPU), a general-purpose processor, a digital signal processor (DSP), an application-specific integrated circuit (ASIC), a field-programmable gate array (FPGA), or other programmable logic devices, transistor logic devices, hardware components, or any combination thereof. It can implement or execute the various exemplary logic blocks, cells, and circuits described in conjunction with the disclosure of this application. The processor can also be a combination that implements computational functions, such as a combination of one or more microprocessors, a combination of a DSP and a microprocessor, etc. The communication unit can be a communication interface, transceiver, transceiver circuit, etc., and the storage unit can be a memory.

[0045] The memory can be volatile or non-volatile, or a combination of both. Non-volatile memory can be read-only memory (ROM), programmable read-only memory (PROM), erasable programmable read-only memory (EPROM), electrically erasable programmable read-only memory (EEPROM), or flash memory. Volatile memory can be random access memory (RAM), used as an external cache. By way of example, but not limitation, many forms of random access memory (RAM) are available, such as static RAM (SRAM), dynamic RAM (DRAM), synchronous DRAM (SDRAM), double data rate synchronous DRAM (DDR SDRAM), enhanced synchronous DRAM (ESDRAM), synchronous linked DRAM (SLDRAM), and direct rambus RAM (DR RAM).

[0046] It is understood that the electronic device may include more or fewer structural elements than those shown in the block diagram above, such as a power module, physical buttons, a Wi-Fi module, a speaker, a Bluetooth module, sensors, a display module, etc., without limitation. It is understood that the electronic device may incorporate elements such as... Figure 2 The aforementioned digital control module.

[0047] After understanding the software and hardware architecture of this application, the following will be combined with... Figure 5 This application describes a surge suppression method for an etching machine power supply as described in an embodiment. Figure 5 This is a flowchart illustrating a surge suppression method for an etching machine power supply provided in an embodiment of this application, specifically including the following steps: Step S501: According to the preset acquisition frequency, synchronously acquire and filter the load-side voltage and load-side current of the etching machine power supply to obtain voltage data sequence and current data sequence.

[0048] The etching machine power supply is used to power the etching machine load. A synchronous analog-to-digital converter can simultaneously acquire the instantaneous voltage and current on the load side of the etching machine power supply, ensuring strict time alignment of the voltage and current data. The acquired raw data is then processed by a digital low-pass filter (such as a moving average filter) to eliminate switching ripple and high-frequency noise interference, yielding voltage and current data sequences respectively.

[0049] Step S502: Determine the voltage change rate sequence corresponding to the voltage data sequence.

[0050] The specific steps for determining the voltage change rate sequence corresponding to the voltage data sequence include: A1. Determine the sampling time interval based on the acquisition frequency; A2. Calculate the rate of change of all voltages in the voltage data sequence according to the preset rate of change calculation formula and the sampling time interval to obtain the voltage rate of change sequence.

[0051] In a specific embodiment, the acquisition frequency refers to the number of times data is acquired per unit time, and the sampling time interval is the time difference between two adjacent samples. The sampling time interval can be obtained by taking the reciprocal of the acquisition frequency. Then, based on the preset rate of change calculation formula and the sampling time interval, the rate of change for all voltages in the voltage data sequence is calculated to obtain the voltage rate of change sequence. The rate of change calculation formula is as follows: ; in, Indicates the first The rate of change of voltage at time t, when When it is 1, =0; Indicates the first The voltage at that moment; Indicates the first The voltage at that moment; Indicates the sampling time interval; This represents the total length of the voltage data sequence (i.e., the total number of sampling points).

[0052] Starting from the second sampling point (i.e., the second time moment), the current voltage is subtracted from the previous voltage, and then divided by the sampling time interval to obtain the instantaneous rate of change at each sampling moment, ultimately forming a voltage rate of change sequence. It should be noted that since the voltage corresponding to the first sampling point (when k=1) has no preceding voltage, the voltage rate of change corresponding to the first sampling point can be set to 0.

[0053] It is evident that by determining the sampling time interval and calculating the voltage change rate sequence, key dynamic voltage change information is provided for subsequent load parameter identification, thereby improving the accuracy of the estimation of the electrical characteristics of the etching machine load.

[0054] Step S503: Based on the voltage data sequence, the current data sequence, and the voltage change rate sequence, the preset initial load parameter vector is iteratively updated to obtain the reference load parameter vector.

[0055] The reference load parameter vector includes reference resistance parameters and reference capacitance parameters, which are used to characterize the real-time electrical characteristics of the etching machine load.

[0056] The step of iteratively updating the preset initial load parameter vector based on the voltage data sequence, the current data sequence, and the voltage change rate sequence to obtain the reference load parameter vector includes the following steps: B1. Obtain the preset forgetting factor and initial covariance matrix; B2. Determine the input data vector based on the first sampled voltage and the first voltage change rate; the first sampled voltage is any voltage in the voltage data sequence; the first voltage change rate is the voltage change rate corresponding to the first sampled voltage in the voltage change rate sequence; B3. Calculate the first gain vector based on the forgetting factor, the initial covariance matrix, and the input data vector; B4. Determine the first predicted current based on the input data vector and the initial load parameter vector; B5. Calculate the difference between the first sampled current and the first predicted current to obtain the first prediction error; the first sampled current is the current corresponding to the first sampled voltage in the current data sequence; B6. Update the initial load parameter vector based on the first prediction error and the first gain vector. If the preset iterative convergence condition is not met, continue the iterative update until the iterative convergence condition is met, and obtain the reference load parameter vector.

[0057] In a specific embodiment, firstly, a preset forgetting factor and an initial covariance matrix are obtained. The forgetting factor (denoted as λ, with a value range of 0 < λ ≤ 1) is used to control the weight of historical data in the current parameter update. The initial covariance matrix (denoted as...) The first sampled voltage and the first voltage change rate are denoted as a 2×2 positive definite matrix reflecting the initial uncertainty of parameter estimation. Then, the voltage and voltage change rate at the current processing time (denoted as the k-th sampling point) are extracted from the voltage data sequence and the voltage change rate sequence, respectively, and are called the first sampled voltage and the first voltage change rate. Using the first sampled voltage as the first element and the first voltage change rate as the second element, a 2x1 column vector is formed, which is the input data vector.

[0058] Next, the first gain vector is calculated based on the forgetting factor, the initial covariance matrix, and the input data vector. The calculation formula is shown below: ; in, Indicates the first The gain vector corresponding to the time step (e.g., the first gain vector); Indicates the first The covariance matrix at time point (e.g., the initial covariance matrix); Indicates the first The input data vector corresponding to each time step; Indicates the forgetting factor; express The transpose of .

[0059] Then, the inner product between the input data vector and the initial load parameter vector is calculated to obtain the first predicted current. The first element of the initial load parameter vector is the initial conductance (the reciprocal of the initial resistance), and the second element is the initial capacitance. Next, the current at the same moment as the first sampled voltage is obtained from the current data sequence; this is the first sampled current. Then, the difference between the first sampled current and the first predicted current is calculated to obtain the first prediction error.

[0060] Next, the initial load parameter vector is updated based on the first prediction error and the first gain vector. If the preset iterative convergence condition is not met, the iterative update continues until the iterative convergence condition is met, resulting in the reference load parameter vector. The calculation formula for the iterative update of the load parameter vector is as follows: ; in, Indicates the first The load parameter vector corresponding to the time (e.g., the reference load parameter vector); Indicates the first The load parameter vector corresponding to the time (such as the initial load parameter vector). Indicates the first The current prediction error at the corresponding time (such as the first prediction error).

[0061] It should be noted that the iterative convergence condition includes any one of the following: error convergence, parameter change convergence, and maximum number of iterations; no specific limitation is made here. Among these, error convergence is defined as follows: ( This indicates the preset error threshold, which can be set to 0.01A); parameter changes converge: ( This represents the preset parameter change threshold, which can be set to 10. -6 Maximum number of iterations: ( This represents the maximum number of iterations (which can be set to 100). Simultaneously, after each iteration, a new covariance matrix is ​​calculated and saved for the next iteration. The formula for calculating the iterative update of the covariance matrix is ​​as follows: ; in, Indicates the first The covariance matrix at time step 1, i.e., the updated covariance matrix; Represents the identity matrix; Indicates the first The covariance matrix at time step 1, i.e., the covariance matrix before the update.

[0062] As can be seen, by using the recursive least squares algorithm to iteratively update the load parameter vector online, the real-time and accurate identification of the load resistance and capacitance of the etching machine is achieved, providing a reliable model basis for adaptive surge suppression.

[0063] Step S504: Update the preset initial surge suppression model according to the reference resistance parameters and the reference capacitance parameters to obtain the target surge suppression model.

[0064] The step of updating the preset initial surge suppression model based on the reference resistance parameters and the reference capacitance parameters to obtain the target surge suppression model includes the following specific steps: C1. Determine the real-time parasitic resistance and real-time load capacitance based on the reference resistance parameters and the reference capacitance parameters; C2. Obtain the initial transfer function corresponding to the initial surge suppression model and the initial capacitance corresponding to the initial transfer function; C3. Determine the equivalent total capacitance based on the initial capacitance and the real-time load capacitance; C4. Replace the parameters of the initial transfer function according to the real-time parasitic resistance and the equivalent total capacitance to obtain the target transfer function; C5. Determine the poles of the target transfer function corresponding to the target transfer function; C6. Determine the target surge suppression model based on the poles of the target transfer function and the target transfer function.

[0065] In a specific embodiment, firstly, the reciprocal of the reference resistance parameter (i.e., reference conductance) is taken to obtain the real-time parasitic resistance, and the reference capacitance parameter (i.e., reference capacitance) is determined as the real-time load capacitance. Then, the initial transfer function corresponding to the initial surge suppression model and the initial capacitance corresponding to the initial transfer function are obtained. The initial transfer function is shown below: ; in, Indicates the initial transfer function; Represents the Laplace operator; This represents the initial resistance corresponding to the initial transfer function; This represents the initial capacitance corresponding to the initial transfer function.

[0066] Next, the sum of the initial capacitance and the real-time load capacitance is calculated to obtain the equivalent total capacitance. Then, the parameters of the initial transfer function are replaced based on the real-time parasitic resistance and the equivalent total capacitance to obtain the target transfer function. The target transfer function is shown below: ; in, Represents the target transfer function; Indicates real-time parasitic resistance; This represents the equivalent total capacitance.

[0067] Then, determine the poles of the target transfer function corresponding to the target transfer function. The poles of the target transfer function are: Finally, the poles of the target transfer function are combined with the target transfer function to obtain the target surge suppression model. This model includes the poles of the target transfer function and the target transfer function itself, which are used to generate the PWM duty cycle correction value later.

[0068] As can be seen, by dynamically adjusting the parameters in the initial model and reconfiguring the transfer function poles based on the real-time identified parasitic resistance and capacitance of the etching machine load, a target surge suppression model matching the current load electrical characteristics is generated. This ensures that the model can maintain the optimal dynamic response at different process stages (such as ignition, etching, and shutdown), significantly improving the accuracy of the PWM duty cycle correction, thereby enhancing the adaptability and robustness of surge suppression.

[0069] Step S505: Determine the PWM duty cycle correction amount based on the target surge suppression model.

[0070] For easier understanding, please refer to Figure 6 , Figure 6 This is a flowchart illustrating a method for determining a PWM duty cycle correction based on an embodiment of this application. The specific steps for determining the PWM duty cycle correction based on the target surge suppression model include: D1. Obtain a preset first reference voltage; the first reference voltage is the rated output voltage of the etching machine power supply; D2. Obtain the first real-time voltage corresponding to the current moment in the voltage data sequence; D3. Calculate the difference between the first reference voltage and the first real-time voltage to obtain the voltage regulation deviation. D4. Input the voltage regulation deviation into the target surge suppression model and output the PWM duty cycle correction.

[0071] In a specific embodiment, firstly, the rated voltage value that the etching machine power supply should output during normal operation (i.e., the first reference voltage) is obtained as the benchmark for voltage regulation. Then, the voltage value at the current moment, i.e., the first real-time voltage, is extracted from the voltage data sequence. Next, the difference between the first reference voltage and the first real-time voltage is calculated to obtain the voltage regulation deviation.

[0072] Next, the voltage regulation deviation is input into the target surge suppression model, and the PWM duty cycle correction is output. The PWM duty cycle correction is... ; in, Indicates the first The voltage regulation deviation at a given moment, i.e., the voltage regulation deviation at the current moment; Indicates the first The voltage regulation deviation at any given moment; Indicates the first The PWM duty cycle correction amount corresponding to the given time. It should be noted that... and All of these represent the discretization coefficients corresponding to the target transfer function, which can be calculated from the poles of the target transfer function. , , This indicates the preset PWM period.

[0073] As can be seen, by inputting the voltage regulation deviation into the adaptively updated target surge suppression model, and calculating and outputting the PWM duty cycle correction in real time, closed-loop dynamic regulation of the etching machine power supply output voltage is achieved. It can automatically adjust the drive duty cycle according to load changes and surge impact, effectively suppressing voltage overshoot and drop, and significantly improving the dynamic response capability and surge suppression accuracy of the etching machine power supply.

[0074] Step S506: Determine the target switching frequency corresponding to the etching machine power supply.

[0075] For easier understanding, please refer to Figure 7 , Figure 7This is a flowchart illustrating the determination of a target switching frequency according to an embodiment of this application. The specific steps for determining the target switching frequency corresponding to the etching machine power supply include: E1. Determine the filter inductance value corresponding to the filter inductance in the etching machine power supply; E2. Determine the target resonant frequency based on the equivalent total capacitance and the filter inductance value; E3. Determine the target switching frequency based on the target resonant frequency and the preset safety factor.

[0076] In a specific embodiment, the filter inductance value corresponding to the filter inductor installed at the power output terminal of the etching machine is obtained. This filter inductor is a fixed component in the power supply hardware, used to smooth high-frequency ripple in the output voltage. Then, based on the equivalent total capacitance and the filter inductance value, the target resonant frequency is calculated. This target resonant frequency is the resonant frequency of the LC filter network formed by the equivalent total capacitance and the filter inductance value. The calculation formula is as follows: ; in, Indicates the target resonant frequency; Indicates the value of the filter inductance; This represents the equivalent total capacitance.

[0077] Finally, the target resonant frequency is multiplied by a pre-set safety factor to obtain the target switching frequency. The safety factor is an integer greater than 1, typically between 5 and 10, used to ensure the switching frequency stays away from the resonant frequency and prevents oscillations. The target resonant frequency is then checked to ensure it falls within the range allowed by the power supply hardware (e.g., not exceeding the maximum operating frequency of the power switch). If the result exceeds the allowable range, it is limited to the nearest boundary value.

[0078] As can be seen, the resonant frequency of the LC filter network is calculated based on the filter inductance value and the equivalent total capacitance, and the target switching frequency is determined in combination with the preset safety factor. This ensures that the switching frequency of the etching machine power supply always avoids the resonant point, thus avoiding the instability risk in the surge suppression process and improving the reliability of the etching machine power supply under variable load conditions.

[0079] Step S507: Based on the PWM duty cycle correction amount and the target switching frequency, perform surge suppression operation on the etching machine power supply to protect the etching machine load from overcurrent impact.

[0080] The specific steps of performing surge suppression operation on the etching machine power supply based on the PWM duty cycle correction and the target switching frequency include: F1: Obtain the preset initial PWM duty cycle and surge current threshold; F2. Determine the target PWM duty cycle based on the initial PWM duty cycle and the PWM duty cycle correction amount; F3. Obtain the first real-time current corresponding to the first real-time voltage in the current data sequence; F4. If the first real-time current is greater than or equal to the surge current threshold, the etching machine power supply is adjusted in real time according to the target PWM duty cycle and the target switching frequency to complete the surge suppression operation of the etching machine power supply.

[0081] In a specific embodiment, firstly, the preset initial duty cycle and surge current threshold are read from the digital control system. The initial duty cycle corresponds to the basic switching duty cycle required for the etching machine power supply to maintain the rated output voltage under rated load, which can be determined through offline calibration or voltage closed-loop steady-state value. The surge current threshold is set according to the maximum transient current allowed by the etching machine load (e.g., 1.5 to 2 times the rated current of the power supply) and is used to distinguish between normal operating current and surge overcurrent.

[0082] Then, the initial PWM duty cycle and the PWM duty cycle correction are calculated to obtain the target PWM duty cycle. Next, the current corresponding to the first real-time voltage is obtained from the current data sequence to obtain the first real-time current. Then, the first real-time current is compared with the surge current threshold. If the first real-time current is less than the surge current threshold, it is determined to be a normal operating state, and surge suppression is not performed (the current initial PWM duty cycle can be maintained or the PWM correction for the next moment can be calculated). If the first real-time current is greater than or equal to the surge current threshold, it is determined that a surge overcurrent has occurred. The target PWM duty cycle is written to the PWM generator's duty cycle register, the target switching frequency is written to the PWM generator's period register, and the drive signal of the power switch is immediately updated to enable a rapid output voltage response and suppress the surge current. Finally, the digital control system continuously and cyclically executes the above real-time control steps to achieve dynamic and real-time surge suppression.

[0083] As can be seen, when the real-time current is detected to reach or exceed the surge current threshold, real-time control based on the target PWM duty cycle and target switching frequency is triggered, realizing selective and rapid response to surge overcurrent, avoiding ineffective regulation when there is no surge, reducing switching losses, and ensuring that the duty cycle and switching frequency can be corrected immediately when overcurrent occurs, actively suppressing inrush current, thereby effectively protecting the etching machine power supply and load from damage.

[0084] The above primarily describes the solutions of the embodiments of this application from the perspective of the method execution process. It is understood that, in order to achieve the above functions, the electronic device includes corresponding hardware structures and / or software modules for executing each function. Those skilled in the art should readily recognize that, in conjunction with the units and algorithm steps of the various examples described in the embodiments provided herein, this application can be implemented in hardware or a combination of hardware and computer software. Whether a function is executed by hardware or by computer software driving hardware depends on the specific application and design constraints of the technical solution. Those skilled in the art can use different methods to implement the described functions for each specific application, but such implementation should not be considered beyond the scope of this application.

[0085] This application embodiment can divide the electronic device into functional units according to the above method example. For example, each function can be divided into a separate functional unit, or two or more functions can be integrated into one processing unit. The integrated unit can be implemented in hardware or as a software functional unit. It should be noted that the unit division in this application embodiment is illustrative and only represents one logical functional division. In actual implementation, there may be other division methods.

[0086] When dividing each function into modules according to its corresponding function. Figure 8 This is a functional module block diagram of a surge suppression device for an etching machine power supply provided in an embodiment of this application. The surge suppression device 800 for the etching machine power supply includes a data acquisition module 810, a first determination module 820, a first update module 830, a second update module 840, a second determination module 850, and a surge suppression module 860, wherein: The data acquisition module 810 is used to synchronously acquire and filter the load-side voltage and load-side current of the etching machine power supply according to a preset acquisition frequency to obtain voltage data sequences and current data sequences; the etching machine power supply is used to supply power to the etching machine load. The first determining module 820 is used to determine the voltage change rate sequence corresponding to the voltage data sequence; The first update module 830 is used to iteratively update a preset initial load parameter vector according to the voltage data sequence, the current data sequence and the voltage change rate sequence to obtain a reference load parameter vector; the reference load parameter vector includes reference resistance parameters and reference capacitance parameters, which are used to characterize the real-time electrical characteristics of the etching machine load; The second update module 840 is used to update the preset initial surge suppression model according to the reference resistance parameters and the reference capacitance parameters to obtain the target surge suppression model; The second determining module 850 is used to determine the PWM duty cycle correction amount according to the target surge suppression model; and to determine the target switching frequency corresponding to the etching machine power supply. The surge suppression module 860 is used to perform surge suppression operation on the etching machine power supply according to the PWM duty cycle correction amount and the target switching frequency, so as to protect the etching machine load from overcurrent impact.

[0087] Optionally, in determining the voltage change rate sequence corresponding to the voltage data sequence, the first determining module 820 is specifically used for: The sampling time interval is determined based on the sampling frequency; Based on the preset rate of change calculation formula and the sampling time interval, the rate of change of all voltages in the voltage data sequence is calculated to obtain the voltage rate of change sequence.

[0088] Optionally, in the step of iteratively updating the preset initial load parameter vector based on the voltage data sequence, the current data sequence, and the voltage change rate sequence to obtain the reference load parameter vector, the first update module 830 is specifically used for: Obtain the preset forgetting factor and initial covariance matrix; An input data vector is determined based on a first sampled voltage and a first voltage change rate; the first sampled voltage is any voltage in the voltage data sequence; the first voltage change rate is the voltage change rate corresponding to the first sampled voltage in the voltage change rate sequence. Calculate the first gain vector based on the forgetting factor, the initial covariance matrix, and the input data vector; The first predicted current is determined based on the input data vector and the initial load parameter vector; The difference between the first sampled current and the first predicted current is calculated to obtain the first prediction error; the first sampled current is the current corresponding to the first sampled voltage in the current data sequence; The initial load parameter vector is updated based on the first prediction error and the first gain vector. If the preset iterative convergence condition is not met, the iterative update continues until the iterative convergence condition is met, and the reference load parameter vector is obtained.

[0089] Optionally, in updating the preset initial surge suppression model based on the reference resistance parameters and the reference capacitance parameters to obtain the target surge suppression model, the second update module 840 is specifically used for: The real-time parasitic resistance and real-time load capacitance are determined based on the reference resistance parameters and the reference capacitance parameters. Obtain the initial transfer function corresponding to the initial surge suppression model and the initial capacitance corresponding to the initial transfer function; The equivalent total capacitance is determined based on the initial capacitance and the real-time load capacitance. The initial transfer function is replaced with parameters based on the real-time parasitic resistance and the equivalent total capacitance to obtain the target transfer function; Determine the poles of the target transfer function corresponding to the target transfer function; The target surge suppression model is determined based on the poles of the target transfer function and the target transfer function.

[0090] Optionally, in determining the PWM duty cycle correction amount according to the target surge suppression model, the second determining module 850 is specifically used for: Obtain a preset first reference voltage; the first reference voltage is the rated output voltage of the etching machine power supply; Obtain the first real-time voltage corresponding to the current moment in the voltage data sequence; Calculate the difference between the first reference voltage and the first real-time voltage to obtain the voltage regulation deviation; The voltage regulation deviation is input into the target surge suppression model, and the PWM duty cycle correction is output.

[0091] Optionally, in determining the target switching frequency corresponding to the etching machine power supply, the second determining module 850 is further specifically used for: Determine the filter inductance value corresponding to the filter inductor in the etching machine power supply; The target resonant frequency is determined based on the equivalent total capacitance and the filter inductance value. The target switching frequency is determined based on the target resonant frequency and the preset safety factor.

[0092] Optionally, in performing surge suppression operation on the etching machine power supply based on the PWM duty cycle correction and the target switching frequency, the surge suppression module 860 is specifically used for: Obtain the preset initial PWM duty cycle and surge current threshold; The target PWM duty cycle is determined based on the initial PWM duty cycle and the PWM duty cycle correction amount; Obtain the first real-time current corresponding to the first real-time voltage in the current data sequence; If the first real-time current is greater than or equal to the surge current threshold, the etching machine power supply is adjusted in real time according to the target PWM duty cycle and the target switching frequency to complete the surge suppression operation of the etching machine power supply.

[0093] As can be seen, by collecting the load-side voltage and current of the etching machine power supply in real time, iteratively updating the resistance and capacitance parameters of the load to adaptively adjust the surge suppression model, and generating the PWM duty cycle correction amount accordingly, combined with the target switching frequency for control, adaptive surge suppression of the etching machine power supply is achieved, thereby improving the accuracy and adaptability of surge suppression.

[0094] It should be noted that the specific implementation of each operation can be described in the corresponding description of the method embodiments shown above. The surge suppression device 800 for the etching machine power supply can be used to execute the method embodiments of this application, and will not be described again here.

[0095] This application also provides a computer-readable storage medium storing a computer program for electronic data interchange, which causes a computer to perform some or all of the steps of any of the methods described in the above method embodiments, wherein the computer includes an electronic device.

[0096] This application also provides a computer program product, which includes a non-transitory computer-readable storage medium storing a computer program operable to cause a computer to perform some or all of the steps of any of the methods described in the above method embodiments. The computer program product may be a software installation package, and the computer may include an electronic device.

[0097] It should be noted that, for the sake of simplicity, the above embodiments are all described as a series of actions. Those skilled in the art should understand that this application is not limited to the described order of actions, as some steps in the embodiments of this application can be performed in other orders or simultaneously. Furthermore, those skilled in the art should also understand that the embodiments described in the specification are preferred embodiments, and the actions, steps, modules, or units involved are not necessarily essential to the embodiments of this application.

[0098] In the above embodiments, the descriptions of each embodiment in this application have different focuses. For parts not described in detail in a certain embodiment, please refer to the relevant descriptions in other embodiments.

[0099] Those skilled in the art will understand that all or part of the processes in the methods of the above embodiments can be implemented by a computer program instructing related hardware. This program can be stored in a computer-readable storage medium, and when executed, it can include the processes described in the above method embodiments. The aforementioned storage medium includes various media capable of storing program code, such as ROM or random access memory (RAM), magnetic disks, or optical disks.

[0100] The steps of the methods or algorithms described in the embodiments of this application can be implemented in hardware or by a processor executing software instructions. The software instructions can consist of corresponding software modules, which can be stored in RAM, flash memory, ROM, EPROM, electrically erasable programmable read-only memory (EEPROM), registers, hard disk, portable hard disk, read-only optical disk (CD-ROM), or any other form of storage medium well known in the art. An exemplary storage medium is coupled to a processor, enabling the processor to read information from and write information to the storage medium. Of course, the storage medium can also be a component of the processor. The processor and storage medium can reside in an ASIC. Furthermore, the ASIC can reside in a terminal device or management device. Alternatively, the processor and storage medium can exist as discrete components in the terminal device or management device.

[0101] Those skilled in the art will recognize that, in one or more of the examples above, the functions described in the embodiments of this application can be implemented, in whole or in part, by software, hardware, firmware, or any combination thereof. When implemented in software, it can be implemented, in whole or in part, as a computer program product. This computer program product includes one or more computer instructions. When these computer program instructions are loaded and executed on a computer, all or part of the processes or functions described in the embodiments of this application are generated. The computer can be a general-purpose computer, a special-purpose computer, a computer network, or other programmable device. The computer instructions can be stored in a computer-readable storage medium or transmitted from one computer-readable storage medium to another. For example, the computer instructions can be transmitted from one website, computer, server, or data center to another via wired (e.g., coaxial cable, fiber optic, digital subscriber line (DSL)) or wireless (e.g., infrared, wireless, microwave, etc.) means. The computer-readable storage medium can be any available medium accessible to a computer or a data storage device such as a server or data center that integrates one or more available media. The available media can be magnetic media (e.g., floppy disks, hard disks, magnetic tapes), optical media (e.g., digital video discs (DVDs)), or semiconductor media (e.g., solid-state disks (SSDs)).

[0102] The modules / units included in the various devices and products described in the above embodiments can be software modules / units, hardware modules / units, or a combination of both. For example, for devices and products applied to or integrated into a chip, all modules / units can be implemented using hardware methods such as circuits, or at least some modules / units can be implemented using software programs that run on a processor integrated within the chip, while the remaining (if any) modules / units can be implemented using hardware methods such as circuits. For devices and products applied to or integrated into a chip module, all modules / units can be implemented using hardware methods such as circuits. Different modules / units can be located in the same component (e.g., chip, circuit module, etc.) or different components of the chip module, or at least some modules / units can be implemented using hardware methods such as circuits. The implementation is achieved through a software program that runs on the processor integrated within the chip module. The remaining modules / units (if any) can be implemented using hardware methods such as circuits. For various devices and products applied to or integrated into terminal equipment, each of their modules / units can be implemented using hardware methods such as circuits. Different modules / units can be located in the same component (e.g., chip, circuit module, etc.) or different components within the terminal equipment. Alternatively, at least some modules / units can be implemented through a software program that runs on the processor integrated within the terminal equipment, while the remaining modules / units (if any) can be implemented using hardware methods such as circuits.

[0103] The specific embodiments described above further illustrate the purpose, technical solution, and beneficial effects of the embodiments of this application. It should be understood that the above descriptions are merely specific embodiments of the embodiments of this application and are not intended to limit the protection scope of the embodiments of this application. Any modifications, equivalent substitutions, improvements, etc., made on the basis of the technical solutions of the embodiments of this application should be included within the protection scope of the embodiments of this application.

Claims

1. A surge suppression method for an etching machine power supply, characterized in that, The method includes: According to the preset acquisition frequency, the load-side voltage and load-side current of the etching machine power supply are synchronously acquired and filtered to obtain voltage data sequences and current data sequences; the etching machine power supply is used to supply power to the etching machine load. Determine the voltage change rate sequence corresponding to the voltage data sequence; Based on the voltage data sequence, the current data sequence, and the voltage change rate sequence, the preset initial load parameter vector is iteratively updated to obtain a reference load parameter vector; the reference load parameter vector includes reference resistance parameters and reference capacitance parameters, which are used to characterize the real-time electrical characteristics of the etching machine load; Based on the reference resistance parameters and the reference capacitance parameters, the preset initial surge suppression model is updated to obtain the target surge suppression model; The PWM duty cycle correction amount is determined based on the target surge suppression model; Determine the target switching frequency corresponding to the etching machine power supply; Based on the PWM duty cycle correction and the target switching frequency, surge suppression operation is performed on the etching machine power supply to protect the etching machine load from overcurrent surges.

2. The method as described in claim 1, characterized in that, Determining the voltage change rate sequence corresponding to the voltage data sequence includes: The sampling time interval is determined based on the sampling frequency; Based on the preset rate of change calculation formula and the sampling time interval, the rate of change of all voltages in the voltage data sequence is calculated to obtain the voltage rate of change sequence.

3. The method as described in claim 1 or 2, characterized in that, The step of iteratively updating the preset initial load parameter vector based on the voltage data sequence, the current data sequence, and the voltage change rate sequence to obtain the reference load parameter vector includes: Obtain the preset forgetting factor and initial covariance matrix; The input data vector is determined based on the first sampled voltage and the first voltage change rate; the first sampled voltage is any voltage in the voltage data sequence; the first voltage change rate is the voltage change rate corresponding to the first sampled voltage in the voltage change rate sequence. Calculate the first gain vector based on the forgetting factor, the initial covariance matrix, and the input data vector; The first predicted current is determined based on the input data vector and the initial load parameter vector; The difference between the first sampled current and the first predicted current is calculated to obtain the first prediction error; the first sampled current is the current corresponding to the first sampled voltage in the current data sequence; The initial load parameter vector is updated based on the first prediction error and the first gain vector. If the preset iterative convergence condition is not met, the iterative update continues until the iterative convergence condition is met, and the reference load parameter vector is obtained.

4. The method as described in claim 1 or 2, characterized in that, The step of updating the preset initial surge suppression model based on the reference resistance parameters and the reference capacitance parameters to obtain the target surge suppression model includes: The real-time parasitic resistance and real-time load capacitance are determined based on the reference resistance parameters and the reference capacitance parameters. Obtain the initial transfer function corresponding to the initial surge suppression model and the initial capacitance corresponding to the initial transfer function; The equivalent total capacitance is determined based on the initial capacitance and the real-time load capacitance. The initial transfer function is replaced with parameters based on the real-time parasitic resistance and the equivalent total capacitance to obtain the target transfer function; Determine the poles of the target transfer function corresponding to the target transfer function; The target surge suppression model is determined based on the poles of the target transfer function and the target transfer function.

5. The method as described in claim 4, characterized in that, The step of determining the PWM duty cycle correction amount based on the target surge suppression model includes: Obtain a preset first reference voltage; the first reference voltage is the rated output voltage of the etching machine power supply; Obtain the first real-time voltage corresponding to the current moment in the voltage data sequence; Calculate the difference between the first reference voltage and the first real-time voltage to obtain the voltage regulation deviation; The voltage regulation deviation is input into the target surge suppression model, and the PWM duty cycle correction is output.

6. The method as described in claim 4, characterized in that, Determining the target switching frequency corresponding to the etching machine power supply includes: Determine the filter inductance value corresponding to the filter inductor in the etching machine power supply; The target resonant frequency is determined based on the equivalent total capacitance and the filter inductance value. The target switching frequency is determined based on the target resonant frequency and the preset safety factor.

7. The method as described in claim 5, characterized in that, The step of performing surge suppression operation on the etching machine power supply based on the PWM duty cycle correction and the target switching frequency includes: Obtain the preset initial PWM duty cycle and surge current threshold; The target PWM duty cycle is determined based on the initial PWM duty cycle and the PWM duty cycle correction amount; Obtain the first real-time current corresponding to the first real-time voltage in the current data sequence; If the first real-time current is greater than or equal to the surge current threshold, the etching machine power supply is adjusted in real time according to the target PWM duty cycle and the target switching frequency to complete the surge suppression operation of the etching machine power supply.

8. A surge suppression device for an etching machine power supply, characterized in that, The device includes a data acquisition module, a first determination module, a first update module, a second update module, a second determination module, and a surge suppression module, wherein: The data acquisition module is used to synchronously acquire and filter the load-side voltage and load-side current of the etching machine power supply according to a preset acquisition frequency to obtain voltage data sequences and current data sequences; the etching machine power supply is used to supply power to the etching machine load. The first determining module is used to determine the voltage change rate sequence corresponding to the voltage data sequence; The first update module is used to iteratively update a preset initial load parameter vector according to the voltage data sequence, the current data sequence, and the voltage change rate sequence to obtain a reference load parameter vector; the reference load parameter vector includes reference resistance parameters and reference capacitance parameters, which are used to characterize the real-time electrical characteristics of the etching machine load; The second update module is used to update the preset initial surge suppression model according to the reference resistance parameters and the reference capacitance parameters to obtain the target surge suppression model; The second determining module is used to determine the PWM duty cycle correction amount based on the target surge suppression model; and to determine the target switching frequency corresponding to the etching machine power supply. The surge suppression module is used to perform surge suppression operation on the etching machine power supply according to the PWM duty cycle correction amount and the target switching frequency, so as to protect the etching machine load from overcurrent impact.

9. An electronic device, characterized in that, include: Processor, memory, communication interface, and one or more programs; The one or more programs are stored in the memory and configured to be executed by the processor, the programs including instructions for performing the steps of the method as described in any one of claims 1-7.

10. A computer-readable storage medium, characterized in that, The computer-readable storage medium stores a computer program, the computer program including program instructions that, when executed by a processor, cause the processor to perform the method as described in any one of claims 1-7.

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