System and method for separating semiconductor wafers
By using advanced tools and automated equipment to monitor stress adjustment force settings, the problem of wafer separation in existing wafer bonding processes has been solved, achieving safe and efficient wafer separation, improving the separation success rate and reducing the risk of damage.
Patent Information
- Authority / Receiving Office
- CN Β· China
- Patent Type
- Applications(China)
- Current Assignee / Owner
- TAIWAN SEMICONDUCTOR MANUFACTURING CO LTD
- Filing Date
- 2025-12-03
- Publication Date
- 2026-06-05
AI Technical Summary
As the feature size of semiconductor integrated circuits shrinks, manufacturing processes become more challenging, and ensuring the reliability of semiconductor devices becomes increasingly difficult. Existing technologies struggle to effectively separate wafers in wafer bonding processes without damaging the wafers or their components.
Using cutting-edge tools, components are moved independently in multiple directions via automated equipment. Sensors monitor stress and controllers adjust force settings to ensure that the maximum stress limit is not exceeded, thus achieving safe wafer separation.
This technology enables efficient separation of wafers in wafer bonding processes without damaging the wafer or its components, improving separation success rate and reducing damage risk.
Smart Images

Figure CN122161375A_ABST