Non-destructive method for removing surface particle contaminants from a fused silica optical element plated with a chemical film

By combining nanosecond pulse width laser cleaning with short-time high-temperature annealing, the problem of difficult removal of particulate contaminants from the surface of fused silica optical elements was solved, the laser damage threshold was improved, and the performance and stability of high-power laser systems were enhanced.

CN122167038APending Publication Date: 2026-06-09NANJING FORESTRY UNIV
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Patent Information

Authority / Receiving Office
CN · China
Patent Type
Applications(China)
Current Assignee / Owner
NANJING FORESTRY UNIV
Filing Date
2026-02-10
Publication Date
2026-06-09

AI Technical Summary

Technical Problem

Existing technologies struggle to effectively remove particulate contaminants from the surface of fused silica optical components, especially fused silica particulate contaminants on the surface of chemically coated films. This results in a low laser damage threshold, affecting the performance and lifespan of high-power laser systems.

Method used

A method combining nanosecond pulse width laser cleaning with short-time high-temperature annealing is adopted. Particulate contaminants on the surface of the chemical film are removed by irradiation with nanosecond pulse width laser, and the particulate contaminants are removed from the surface by thermal expansion. Short-time thermal annealing is used to passivate point defects. Finally, hexamethyldisilazane treatment is used to improve the environmental stability of the chemical film.

Benefits of technology

This improves the laser-induced damage threshold of chemically coated fused silica optical elements, reduces the impact of particulate contaminants on optical elements, and enhances the cleanliness and operating efficiency of high-power solid-state laser devices.

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Abstract

A non-destructive method for removing particulate contaminants from the surface of chemically coated fused silica optical elements belongs to the field of precision manufacturing and surface engineering technology. The method includes the following steps: S1: irradiating the surface particles of the chemically coated fused silica optical element with a nanosecond pulse width laser; S2: subjecting the fused silica optical element treated in step S1 to a short-time high-temperature annealing process to passivate point defects on the surface of the fused silica particles; S3: subjecting the chemically coated fused silica optical element to HMDS treatment. This invention employs a nanosecond pulse width laser cleaning combined with short-time thermal annealing to remove some particles and passivate point defects on the surface of the fused silica particles, thereby significantly improving the laser damage threshold of the contaminated fused silica optical element. The method of this invention has important reference value for addressing the cleanliness issues of fused silica optical elements in high-power solid-state laser devices and is beneficial for improving the operating efficiency of high-power solid-state laser devices.
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