A sulfur deposition inhibitor for high-sulfur gas fields and a preparation method thereof

Abstract

This invention relates to the field of oil and gas field chemical agent preparation technology, and particularly to a sulfur deposition inhibitor for high-sulfur gas fields and its preparation method. The sulfur deposition inhibitor of this invention comprises the following components in parts by weight: 0.9-1.5 parts hexadecyltrimethylammonium chloride, 0.3-0.6 parts octadecyltrimethylammonium chloride, 4-6 parts cocamidopropyl betaine, 2.5-3.5 parts sodium α-alkenyl sulfonate, 1.5-2.2 parts sodium palmitate methyl sulfonate, 1.2-1.8 parts potassium carbonate, 0.6-1 parts magnesium chloride, and 83.4-89 parts solvent. This invention solves the problems of complex synthesis processes, low inhibition efficiency, high toxicity, and poor engineering adaptability of traditional sulfur inhibitors by adjusting the synergy and compatibility between inorganic salts and surfactants, making it suitable for large-scale application and promotion in high-sulfur gas fields.

Description

Technical Field

[0001] This invention relates to the field of oil and gas field chemical agent preparation technology, and in particular to a sulfur deposition inhibitor for high-sulfur gas fields and its preparation method. Background Technology

[0002] In the development of high-sulfur gas fields, sulfur deposition can cause wellbore blockage, equipment corrosion, and other problems, seriously affecting production safety. Currently, sulfur deposition inhibitors are an important prevention and control measure, primarily inhibiting sulfur deposition through mechanisms such as interface regulation, dissolution and dispersion, and thermodynamic regulation. Existing inhibitors are mainly classified into sulfur solvent inhibitors, polymer inhibitors, and surfactant inhibitors. Sulfur solvent inhibitors utilize the principle of "like dissolves like" or chemical reactions with elemental sulfur to alleviate sulfur deposition, such as chlorobenzene, N,N-dimethylformamide, and ethanolamine. Polymer inhibitors stabilize suspensions through steric hindrance, such as polyacrylamide, polyvinylpyrrolidone, and sodium polystyrene sulfonate. Surfactant inhibitors rely on hydrophobic-hydrophilic balance to encapsulate sulfur particles, such as sodium dodecylbenzene sulfonate and Tween-80. Although these inhibitors can alleviate sulfur deposition to some extent, they still suffer from significant drawbacks such as complex synthesis processes, high toxicity, low inhibition efficiency, and poor engineering adaptability. Therefore, there is a need to develop highly efficient, safe, environmentally friendly, and engineering-adaptable inhibitors. Summary of the Invention

[0003] The purpose of this invention is to provide a sulfur deposition inhibitor for high-sulfur gas fields and its preparation method, so as to solve the problems of low efficiency, unstable properties and harsh application conditions of existing sulfur deposition inhibitors for high-sulfur gas fields, and improve the various properties of sulfur deposition inhibitors for high-sulfur gas fields.

[0004] To achieve the above-mentioned objectives, the present invention provides the following technical solution: One of the technical solutions of the present invention is a sulfur deposition inhibitor, comprising the following components in parts by mass: 0.9-1.5 parts of hexadecyltrimethylammonium chloride, 0.3-0.6 parts of octadecyltrimethylammonium chloride, 4-6 parts of cocamidopropyl betaine, 2.5-3.5 parts of sodium α-alkenyl sulfonate, 1.5-2.2 parts of sodium palmitate methyl sulfonate, 1.2-1.8 parts of potassium carbonate, 0.6-1 part of magnesium chloride, and 83.4-89 parts of solvent.

[0005] The second technical solution of the present invention is a method for preparing the above-mentioned sulfur deposition inhibitor, comprising the following steps: A sulfur deposition inhibitor is obtained by mixing hexadecyltrimethylammonium chloride, octadecyltrimethylammonium chloride, cocamidopropyl betaine, sodium α-alkenyl sulfonate, sodium methyl palmitate sulfonate, potassium carbonate, magnesium chloride, and a solvent.

[0006] The third aspect of this invention is the application of the aforementioned sulfur deposition inhibitor in the development of high-sulfur gas fields.

[0007] Compared with the prior art, the present invention has the following beneficial effects: (1) The sulfur deposition inhibitor for high-sulfur gas fields prepared in this invention is composed of hexadecyltrimethylammonium chloride, octadecyltrimethylammonium chloride, cocamidopropyl betaine, sodium α-alkenyl sulfonate, sodium methyl palmitate sulfonate, potassium carbonate, and magnesium chloride in a specific ratio. It can effectively reduce the surface tension of the solution and increase the wettability of the solution for sulfur particles. This composite system maintains stable dispersion of sulfur particles through synergistic effects, providing a novel and efficient solution to the sulfur deposition problem in the development of high-sulfur gas fields.

[0008] (2) The raw materials selected for the sulfur deposition inhibitor for high sulfur gas fields prepared by this invention are conventional chemical raw materials. By adjusting the synergy and compatibility between inorganic salts and surfactants, the problems of complex synthesis process, low inhibition efficiency, high toxicity and poor engineering adaptability of traditional sulfur inhibitors are solved. It is suitable for large-scale application and promotion in high sulfur gas fields. Detailed Implementation

[0009] Various exemplary embodiments of the present invention will now be described in detail. This detailed description should not be considered as a limitation of the present invention, but rather as a more detailed description of certain aspects, features, and embodiments of the present invention.

[0010] It should be understood that the terminology used in this invention is merely for describing particular embodiments and is not intended to limit the invention. Furthermore, with respect to numerical ranges in this invention, it should be understood that each intermediate value between the upper and lower limits of the range is also specifically disclosed. Every smaller range between any stated value or intermediate value within a stated range, and any other stated value or intermediate value within said range, is also included in this invention. The upper and lower limits of these smaller ranges may be independently included or excluded from the range.

[0011] Unless otherwise stated, all technical and scientific terms used herein have the same meaning as commonly understood by one of ordinary skill in the art. While only preferred methods and materials have been described herein, any methods and materials similar or equivalent to those described herein may be used in the implementation or testing of this invention. All references to this specification are incorporated by way of citation to disclose and describe methods and / or materials associated with those references. In the event of any conflict with any incorporated reference, the content of this specification shall prevail.

[0012] Various modifications and variations can be made to the specific embodiments described in this specification without departing from the scope or spirit of the invention, as will be apparent to those skilled in the art. Other embodiments derived from this specification will also be obvious to those skilled in the art. This application specification and embodiments are merely exemplary.

[0013] The terms “include,” “including,” “have,” “contain,” etc., used in this article are all open-ended terms, meaning that they include but are not limited to.

[0014] All raw materials used in this invention can be obtained commercially or prepared using existing technologies.

[0015] This invention provides a sulfur deposition inhibitor comprising the following components in parts by weight: 0.9-1.5 parts of hexadecyltrimethylammonium chloride, 0.3-0.6 parts of octadecyltrimethylammonium chloride, 4-6 parts of cocamidopropyl betaine, 2.5-3.5 parts of sodium α-alkenyl sulfonate, 1.5-2.2 parts of sodium methyl palmitate sulfonate, 1.2-1.8 parts of potassium carbonate, 0.6-1 part of magnesium chloride, and 83.4-89 parts of solvent.

[0016] The sulfur deposition inhibitor of the present invention comprises a main agent, an auxiliary agent, and a solvent; wherein the main agent is hexadecyltrimethylammonium chloride (1631), octadecyltrimethylammonium chloride (1831), cocamidopropyl betaine (CAB), sodium α-alkenyl sulfonate (AOS), and sodium methyl palmitate sulfonate (C16-MES); the auxiliary agent is potassium carbonate (K2CO3) and magnesium chloride (MgCl2); and the solvent is water.

[0017] In this invention, the compounded surfactants significantly inhibit the aggregation of sulfur particles through synergistic effects such as electrostatic adsorption, hydrophobic interactions, and steric hindrance, making them potential inhibitors for effectively mitigating sulfur deposition. Taking quaternary ammonium salt surfactants as an example, their use alone suffers from poor stability and low inhibition efficiency. However, through targeted compounding with other surfactants, a network of charge complementarity and intermolecular forces can be formed, significantly enhancing the system's stability under high-temperature and high-salt environments. Simultaneously, the synergistic steric hindrance effect of hydrophobic chains further enhances their inhibitory performance. The compounded surfactants exhibit good inhibitory performance, high stability, and low toxicity, and their preparation and use pose minimal harm to the ecosystem, representing an important direction for the development of sulfur deposition inhibitors in high-sulfur gas fields.

[0018] In this invention, the sulfur deposition inhibitor comprises 0.9 to 1.5 parts of hexadecyltrimethylammonium chloride, for example, 0.9 parts, 1 part, 1.1 parts, 1.2 parts, 1.3 parts, 1.4 parts or 1.5 parts.

[0019] In this invention, the sulfur deposition inhibitor comprises 0.3 to 0.6 parts of octadecyltrimethylammonium chloride, for example, 0.3 parts, 0.4 parts, 0.5 parts or 0.6 parts.

[0020] In this invention, the sulfur deposition inhibitor comprises 4 to 6 parts of cocamidopropyl betaine, for example, 4, 5 or 6 parts.

[0021] In this invention, the sulfur deposition inhibitor comprises 2.5 to 3.5 parts of sodium α-alkenyl sulfonate, for example, 2.5 parts, 2.6 parts, 2.8 parts, 3 parts, 3.2 parts, or 3.5 parts.

[0022] In this invention, the sulfur deposition inhibitor comprises 1.5 to 2.2 parts of sodium methyl palmitate sulfonate, for example, 1.5 parts, 1.6 parts, 1.8 parts, 2 parts or 2.2 parts.

[0023] In this invention, the sulfur deposition inhibitor comprises 1.2 to 1.8 parts of potassium carbonate, for example, 1.2, 1.3, 1.4, 1.5, 1.6, 1.7 or 1.8 parts.

[0024] In this invention, the sulfur deposition inhibitor includes 0.6 to 1 part of magnesium chloride, for example, 0.6 parts, 0.7 parts, 0.8 parts, 0.9 parts or 1 part.

[0025] In this invention, the sulfur deposition inhibitor comprises 83.4 to 89 parts of solvent, for example, 83.4, 84, 85, 86, 87, 88 or 89 parts; the solvent is water.

[0026] In some embodiments of the present invention, the sulfur deposition inhibitor comprises the following components in parts by weight: 0.9 parts hexadecyltrimethylammonium chloride, 0.3 parts octadecyltrimethylammonium chloride, 4 parts cocamidopropyl betaine, 2.5 parts sodium α-alkenyl sulfonate, 1.5 parts sodium methyl palmitate sulfonate, 1.2 parts potassium carbonate, 0.6 parts magnesium chloride, and 89 parts water.

[0027] In some embodiments of the present invention, the sulfur deposition inhibitor comprises the following components in parts by weight: 1.2 parts hexadecyltrimethylammonium chloride, 0.4 parts octadecyltrimethylammonium chloride, 5 parts cocamidopropyl betaine, 3 parts sodium α-alkenyl sulfonate, 2 parts sodium methyl palmitate sulfonate, 1.5 parts potassium carbonate, 0.8 parts magnesium chloride, and 86.1 parts water.

[0028] In some embodiments of the present invention, the sulfur deposition inhibitor comprises the following components in parts by weight: 1.5 parts hexadecyltrimethylammonium chloride, 0.6 parts octadecyltrimethylammonium chloride, 6 parts cocamidopropyl betaine, 3.5 parts sodium α-alkenyl sulfonate, 2.2 parts sodium methyl palmitate sulfonate, 1.8 parts potassium carbonate, 1 part magnesium chloride, and 83.4 parts water.

[0029] In some embodiments of the present invention, the sulfur deposition inhibitor comprises the following components in parts by weight: 0.9 parts hexadecyltrimethylammonium chloride, 0.4 parts octadecyltrimethylammonium chloride, 6 parts cocamidopropyl betaine, 3.5 parts sodium α-alkenyl sulfonate, 1.6 parts sodium methyl palmitate sulfonate, 1.3 parts potassium carbonate, 0.7 parts magnesium chloride, and 85.6 parts water.

[0030] The present invention also provides a method for preparing the above-mentioned sulfur deposition inhibitor, comprising the following steps: A sulfur deposition inhibitor is obtained by mixing hexadecyltrimethylammonium chloride, octadecyltrimethylammonium chloride, cocamidopropyl betaine, sodium α-alkenyl sulfonate, sodium methyl palmitate sulfonate, potassium carbonate, magnesium chloride, and a solvent.

[0031] In some embodiments of the present invention, hexadecyltrimethylammonium chloride, octadecyltrimethylammonium chloride, cocamidopropyl betaine, sodium α-alkenyl sulfonate, and sodium palmitate methyl sulfonate are first mixed and stirred appropriately, then water is slowly added, followed by heating and stirring, and sodium carbonate and sodium chloride are added separately during the stirring process.

[0032] In this invention, the mixing temperature is 30~40℃, for example, 30, 35 or 40℃, the rotation speed is 300~500 r / min, for example, 300, 350, 400, 450 or 500, and the time is 2~4 hours, for example, 2, 3 or 4 hours.

[0033] In this invention, after mixing, the solution is allowed to stand for 5 to 7 hours (e.g., 5 hours, 6 hours, or 7 hours). When the solution changes from turbid to clear and transparent with no obvious suspended particles, a sulfur deposition inhibitor is obtained.

[0034] The present invention also provides the application of the above-mentioned sulfur deposition inhibitor in the development of high-sulfur gas fields, for the dispersion of sulfur particles during the development of high-sulfur gas fields.

[0035] In this invention, the application conditions of the sulfur deposition inhibitor in the development of high-sulfur gas fields are: temperature of 40~100℃ and pressure of 0.3~30MPa.

[0036] In practical applications, sulfur deposition inhibitors are used in the development of high-sulfur gas fields by continuous injection via a dosing pump. The initial injection dose is 50-500 ppm, which can be adjusted based on the total amount of natural gas produced and the sulfur content.

[0037] The technical solutions provided by the present invention will be described in detail below with reference to the embodiments, but they should not be construed as limiting the scope of protection of the present invention.

[0038] Example 1 The sulfur deposition inhibitor for high-sulfur gas fields, by weight, consists of 0.9 parts hexadecyltrimethylammonium chloride, 0.3 parts octadecyltrimethylammonium chloride, 4 parts cocamidopropyl betaine, 2.5 parts sodium α-alkenyl sulfonate, 1.5 parts sodium palmitate methyl ester sulfonate, 1.2 parts potassium carbonate, 0.6 parts magnesium chloride, and 89 parts distilled water.

[0039] Preparation method of sulfur deposition inhibitor for high-sulfur gas fields: The experiment was conducted in a fume hood at 25°C. Different mass proportions of the main components—hexadecyltrimethylammonium chloride, octadecyltrimethylammonium chloride, cocamidopropyl betaine, sodium α-alkenyl sulfonate, and sodium methyl palmitate sulfonate—were weighed using a precision electronic balance. The auxiliary agents, potassium carbonate, magnesium chloride, and distilled water were added to the reactor in the following order: hexadecyltrimethylammonium chloride, octadecyltrimethylammonium chloride, cocamidopropyl betaine, sodium α-alkenyl sulfonate, and sodium methyl palmitate sulfonate. The mixture was stirred appropriately. Under the same conditions, the weighed distilled water was slowly added to the reactor along the wall. The heating and stirring devices of the reactor were turned on, and the temperature was controlled within 37°C. The stirring speed was adjusted to 400 r / min, and the stirring time was 2 h. During stirring, the weighed potassium carbonate and magnesium chloride were added separately. After stirring, the mixture was allowed to stand for 6 h. When the solution changed from turbid to clear and transparent with no obvious suspended particles, it was considered that a uniformly mixed inhibitor had been obtained.

[0040] Example 2 The only difference from Example 1 is that the sulfur deposition inhibitor for high-sulfur gas fields, by weight, consists of 1.2 parts hexadecyltrimethylammonium chloride, 0.4 parts octadecyltrimethylammonium chloride, 5 parts cocamidopropyl betaine, 3 parts sodium α-alkenyl sulfonate, 2 parts sodium methyl palmitate sulfonate, 1.5 parts potassium carbonate, 0.8 parts magnesium chloride, and 86.1 parts distilled water.

[0041] Example 3 The only difference from Example 1 is that the sulfur deposition inhibitor for high-sulfur gas fields, by weight, consists of 1.5 parts hexadecyltrimethylammonium chloride, 0.6 parts octadecyltrimethylammonium chloride, 6 parts cocamidopropyl betaine, 3.5 parts sodium α-alkenyl sulfonate, 2.2 parts sodium palmitate methyl ester sulfonate, 1.8 parts potassium carbonate, 1 part magnesium chloride, and 83.4 parts distilled water.

[0042] Example 4 The only difference from Example 1 is that the sulfur deposition inhibitor for high-sulfur gas fields, by weight, consists of 0.9 parts hexadecyltrimethylammonium chloride, 0.4 parts octadecyltrimethylammonium chloride, 6 parts cocamidopropyl betaine, 3.5 parts sodium α-alkenyl sulfonate, 1.6 parts sodium palmitate methyl ester sulfonate, 1.3 parts potassium carbonate, 0.7 parts magnesium chloride, and 85.6 parts distilled water.

[0043] Comparative Example 1 The only difference from Example 1 is that hexadecyltrimethylammonium chloride is omitted.

[0044] Comparative Example 2 The only difference from Example 1 is that cocamidopropyl betaine is omitted.

[0045] Comparative Example 3 The only difference from Example 1 is that potassium carbonate and magnesium chloride are omitted.

[0046] Inhibitor performance test 1 This invention uses the contact angle measurement method to evaluate the wettability of the inhibitors for sulfur particles in Examples 1-4, and verifies the synergistic effect among the components of the inhibitors through Comparative Examples 1-3. The method is summarized as follows: Sulfur powder from Chengdu Kelon Company was dried and sieved, selecting sulfur powder with a particle size between 80 and 100 mesh. The selected sample sulfur powder was pressed to 15 MPa using an FW-4A-1 powder press and held for 3 minutes to produce sulfur powder flakes of uniform thickness. The liquid states of the inhibitor solution droplets and the blank group distilled water on the sulfur powder flakes were then photographed. The photographed droplet states on the sulfur powder flakes were projected onto a computer screen, and the computer automatically fitted the angle between the droplet and the gas-solid interface. The measured data is the contact angle. The measurement was repeated three times, and the average value was taken. The contact angles measured for the blank group, Examples 1-4, and Comparative Examples 1-3 are shown in Table 1.

[0047] Table 1. Contact angles measured under different embodiments

[0048] Comparing the experimental results of the blank group with those of Examples 1-4, it can be seen that the contact angles in Examples 1-4 are much smaller than those in the blank group, indicating that the inhibitor has good wettability for sulfur particles, and the technical solution provided by the present invention is effective.

[0049] Further comparison of the experimental results of Examples 1-4 with those of Comparative Examples 1-3 demonstrates a significant synergistic effect among the components in the inhibitor. Specifically, Comparative Example 1, lacking hexadecyltrimethylammonium chloride, Comparative Example 2, lacking cocamidopropyl betaine, and Comparative Example 3, lacking potassium carbonate and magnesium chloride, all exhibited contact angles as high as approximately 50°, significantly higher than those of Examples 1-4, where all components were present. This indicates that the absence of any single component leads to a sharp decline in wetting performance, and only a complete formulation system can achieve optimal wetting effects, fully demonstrating the necessity of the synergistic effect among the components.

[0050] Inhibitor performance test 2 The inhibitors in Examples 1-4 were subjected to performance testing using a commonly used sieving method (see: Li Wenkai et al., "Comparison of Laser Particle Size Analysis and Sieving Method for Particle Size Distribution", China Powder Technology, 2007). The method is summarized below: Standard sieves of 80 mesh, 100 mesh, 150 mesh, and 270 mesh (compliant with GB / T 6003.1-2022) were cleaned and dried in a high-temperature drying oven. After drying, each standard sieve and the base sieve were weighed sequentially, and the initial mass was recorded. Next, sulfur powder was poured into the 80 mesh and 100 mesh standard sieves, and approximately 10g of sulfur powder with a particle size between 150μm and 200μm was weighed. This was then added to the inhibitor solution and the blank group's distilled water, respectively, and stirred with a mechanical stirrer for 20 seconds. Subsequently, the stirred solution and sulfur powder were poured together into the standard sieves with the recorded initial mass, and dried again in the high-temperature drying oven. After drying, the sulfur powder was thoroughly shaken and sieved, and the mass of each standard sieve and the base sieve was weighed sequentially. The initial mass was subtracted to obtain the mass of sulfur powder in the standard sieves of different mesh sizes. To ensure data accuracy, the experiment was repeated three times, and the average value was taken. The arithmetic mean of the initial mass of the standard sieves of different mesh sizes in Examples 1-4 and Comparative Examples 1-3 is shown in Table 2.

[0051] Formula for calculating the mass of sulfur powder in a standard sieve: In the formula, is the initial mass of standard sieves with different mesh sizes, in g; M is the total mass of the standard sieves containing sulfur powder, in g; The mass of sulfur powder in standard sieves of different mesh sizes is expressed in g.

[0052] Then, the average particle size of the sulfur particles was calculated using a weighted average method with equal intervals. The median value of each particle size range was taken as the representative particle size, and then multiplied by the mass fraction of sulfur particles in each range. The average particle size was determined by summing these values. After sieving, the mass of sulfur powder with a particle size >150 μm was assumed to be... The mass of sulfur powder with a particle size of 100μm~150μm is The mass of sulfur powder with a particle size of 53μm to 100μm is The mass of sulfur powder <53μm is The total mass of the dried sulfur powder is The mass statistics of sulfur powder in different particle size ranges under different examples and comparative examples are shown in Table 3.

[0053] Formulas for calculating the mass fraction of sulfur particles in each particle size range: In the formula, The percentage of sulfur powder in different particle size ranges is %. The mass of sulfur powder in different particle size ranges is expressed in g.

[0054] Formula for calculating average sulfur particle size: In the formula, The average particle size of the sulfur particles is μm; For particles with a diameter >150μm, we take 175.0μm; For particle sizes between 100μm and 150μm, 125.0μm is selected; For particle sizes between 53 μm and 100 μm, 76.5 μm is selected; For particles with a diameter <53μm, we take 26.5μm.

[0055] After determining the average particle size of the sulfur particles, the inhibition efficiency of the inhibitors in Examples 1-4 and Comparative Examples 1-3 was calculated, and the results are shown in Table 4.

[0056] Formula for calculating the inhibitory efficiency: In the formula, To suppress efficiency, % and The values ​​are the average particle size of sulfur particles before and after the addition of the inhibitor, in μm.

[0057] Table 2 Initial mass of standard sieves with different mesh sizes in the examples and comparative examples

[0058] Table 3. Mass statistics of sulfur powder in different particle size ranges under different examples and comparative examples.

[0059] Table 4 Performance test results of sulfur deposition inhibitors

[0060] As shown in Table 4, the inhibitors in Examples 1-4 significantly reduced the particle size of sulfur particles and had a good inhibitory effect on the aggregation of sulfur particles. The technical solution provided by the present invention is effective.

[0061] Meanwhile, the performance of Comparative Examples 1-3 was far inferior to that of Examples 1-4, indicating that the absence of any component would lead to a significant decrease in performance. This demonstrates a significant synergistic effect among the components, and only a complete formulation can achieve the best polymerization inhibition effect.

[0062] The above description is only a preferred embodiment of the present invention. It should be noted that for those skilled in the art, several improvements and modifications can be made without departing from the principle of the present invention, and these improvements and modifications should also be considered within the scope of protection of the present invention.

Claims

1. A sulfur deposition inhibitor, characterized in that, It comprises the following components in parts by weight: 0.9-1.5 parts hexadecyltrimethylammonium chloride, 0.3-0.6 parts octadecyltrimethylammonium chloride, 4-6 parts cocamidopropyl betaine, 2.5-3.5 parts sodium α-alkenyl sulfonate, 1.5-2.2 parts sodium palmitate methyl sulfonate, 1.2-1.8 parts potassium carbonate, 0.6-1 part magnesium chloride, and 83.4-89 parts solvent.

2. The sulfur deposition inhibitor according to claim 1, characterized in that, The product comprises the following components in parts by weight: 0.9 parts hexadecyltrimethylammonium chloride, 0.3 parts octadecyltrimethylammonium chloride, 4 parts cocamidopropyl betaine, 2.5 parts sodium α-alkenyl sulfonate, 1.5 parts sodium methyl palmitate sulfonate, 1.2 parts potassium carbonate, 0.6 parts magnesium chloride, and 89 parts water.

3. The sulfur deposition inhibitor according to claim 1, characterized in that, The composition comprises the following components in parts by weight: 1.2 parts hexadecyltrimethylammonium chloride, 0.4 parts octadecyltrimethylammonium chloride, 5 parts cocamidopropyl betaine, 3 parts sodium α-alkenyl sulfonate, 2 parts sodium methyl palmitate sulfonate, 1.5 parts potassium carbonate, 0.8 parts magnesium chloride, and 86.1 parts water.

4. The sulfur deposition inhibitor according to claim 1, characterized in that, The composition comprises the following components in parts by weight: 1.5 parts hexadecyltrimethylammonium chloride, 0.6 parts octadecyltrimethylammonium chloride, 6 parts cocamidopropyl betaine, 3.5 parts sodium α-alkenyl sulfonate, 2.2 parts sodium methyl palmitate sulfonate, 1.8 parts potassium carbonate, 1 part magnesium chloride, and 83.4 parts water.

5. The sulfur deposition inhibitor according to claim 1, characterized in that, The composition comprises the following components in parts by weight: 0.9 parts hexadecyltrimethylammonium chloride, 0.4 parts octadecyltrimethylammonium chloride, 6 parts cocamidopropyl betaine, 3.5 parts sodium α-alkenyl sulfonate, 1.6 parts sodium methyl palmitate sulfonate, 1.3 parts potassium carbonate, 0.7 parts magnesium chloride, and 85.6 parts water.

6. The method for preparing the sulfur deposition inhibitor according to any one of claims 1 to 5, characterized in that, Includes the following steps: A sulfur deposition inhibitor is obtained by mixing hexadecyltrimethylammonium chloride, octadecyltrimethylammonium chloride, cocamidopropyl betaine, sodium α-alkenyl sulfonate, sodium methyl palmitate sulfonate, potassium carbonate, magnesium chloride, and a solvent.

7. The preparation method according to claim 6, characterized in that, The mixing temperature is 30~40℃, the rotation speed is 300~500r / min, and the time is 2~4h.

8. The preparation method according to claim 6, characterized in that, After mixing, let stand for 5-7 hours to obtain a sulfur deposition inhibitor.

9. The application of the sulfur deposition inhibitor according to any one of claims 1 to 5 in the development of high-sulfur gas fields.

10. The application according to claim 9, characterized in that, The application conditions for sulfur deposition inhibitors in the development of high-sulfur gas fields are: temperature 40~100℃ and pressure 0.3~30MPa.

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