A multi-process mask production setting method, system and electronic device

Abstract

The application provides a multi-process mask production setting method, a system and an electronic device. The multi-process mask production setting method comprises the following steps: building a time reference library of a mask multi-process route, storing the standard inherent time consumption of each process; setting the standardized moving time between each process; establishing the association rules of the quantitative parameters and the standard inherent time consumption; forwardly deducing the start time and the end time of the subsequent process; generating and displaying the Gantt chart of the production progress; and arranging the production processes of the mask according to the Gantt chart. The application can accurately deduce the start and end times of the whole process, significantly improves the production progress prediction accuracy, realizes the rapid positioning of abnormal nodes through the highlighted display of the deviation between the predicted and actual times, automatically generates the Gantt chart to replace manual recording, optimizes the process connection, and improves the overall production efficiency.

Description

Technical Field

[0001] This invention belongs to the technical field, specifically relating to a method, system, and electronic equipment for multi-process photomask production. Background Technology

[0002] Currently, in the semiconductor photomask production process, the time for each process to start and stop is generally recorded manually to track progress. This can only achieve basic record of process status. Due to the lack of a unified process time benchmark and a standardized progress prediction system, the progress prediction accuracy is low, abnormal nodes cannot be quickly located, and the adaptability to multiple process routes is poor. At the same time, the time consumption of core processes is not included in the calculation due to quantitative factors such as the number of inspection points, and there is no standardized benchmark for the movement time between processes.

[0003] In existing technologies, in a few scenarios where Gantt charts are used, only a basic time display of a general-purpose Gantt chart is provided. It is not customized to take into account the inherent time consumption and process specification differences in photomask production, and it is impossible to achieve accurate process entry and exit time derivation, which makes it difficult to meet the actual needs of semiconductor photomask production for precise progress control. Summary of the Invention

[0004] This invention is made to solve the above-mentioned problems, and its purpose is to provide a multi-process photomask production setup method, system and electronic equipment.

[0005] This invention provides a method for setting up multi-process photomask production, characterized by the following steps: establishing a time reference library for multiple photomask process routes, the time reference library storing the standard inherent time consumption of each process in the multi-process route; setting the standardized movement time between each process; introducing time differentiation logic of process quantification factors, and establishing association rules between quantification parameters and standard inherent time consumption; obtaining the end time of the exposure process, using the end time of the exposure process as the time reference, and combining the standard inherent time consumption, standardized movement time, and association rules to forward deduce and calculate the start and end times of subsequent processes; generating and displaying a Gantt chart of production progress based on the start and end times of subsequent processes; and arranging the photomask production processes according to the Gantt chart.

[0006] In one embodiment of the present invention, the multi-process route includes an exposure process, a development process, an etching process, a photoresist removal and cleaning process, a critical dimension measurement and inspection process, a position measurement and inspection process, a first pattern inspection process, a manual visual inspection of the appearance process, a final cleaning process, a protective film application process, a second inspection process, and a particle scanning process.

[0007] In one embodiment of the present invention, for the critical dimension measurement and inspection process, a point association rule is established between the number of inspection points and the standard inherent time, including at least: when the number of inspection points is 1 to 50, the corresponding standard inherent time is 10 to 20 minutes; when the number of inspection points is 51 to 100, the corresponding standard inherent time is 20 to 30 minutes; for the first graphic inspection process, a type association rule is established between the inspection type and the standard inherent time, including at least: when the inspection type is the first inspection type, the corresponding standard inherent time is 50 to 60 minutes; when the inspection type is the second inspection type, the corresponding standard inherent time is 60 to 80 minutes; for the position measurement and inspection process, the standard operation quantity of measuring 50 to 52 points is 20 to 30 minutes.

[0008] In one embodiment of the present invention, the standard inherent time consumption in the photoresist removal cleaning process and the final cleaning process is further defined by establishing a correlation between different process condition parameters and standard inherent time consumption in a time reference library based on the changes in process condition parameters.

[0009] In one embodiment of the present invention, the start and end times of all subsequent processes are calculated by forward derivation, and the corresponding standard inherent time is automatically matched and calculated based on the process condition parameters.

[0010] In one embodiment of the present invention, in the step of forward derivation to calculate the start time and end time of the subsequent process, the start time of any process in the subsequent process is set as the end time of the previous process plus the standardized movement time.

[0011] In one embodiment of the present invention, the method further includes: simultaneously marking the estimated start time, estimated end time, actual start time, and actual end time of each process in the multi-process route in the Gantt chart; calculating the time deviation between the estimated time consumption and the actual time consumption of each process; identifying processes whose time deviation exceeds a preset threshold as time-deviation processes; and highlighting the process station where the time-deviation process is located in the Gantt chart.

[0012] In one embodiment of the present invention, the method further includes: receiving deviation cause information marked by the process station where the time-consuming deviation process is located; and optimizing the standard inherent time consumption and / or association rules based on the deviation cause information.

[0013] This invention also provides a multi-process photomask production setup system, characterized by the following features: a time reference library module for building a time reference library for multiple process routes, the time reference library storing the standard inherent time consumption of each process in the multiple process routes; a movement time setting module for setting the standardized movement time between each process; a quantization factor association module for introducing time differentiation logic of process quantization factors and establishing association rules between quantization parameters and standard inherent time consumption; a time derivation calculation module for obtaining the end time of the exposure process, using the end time of the exposure process as the time reference, and combining the standard inherent time consumption, standardized movement time, and association rules to forward deduce and calculate the start and end times of subsequent processes; a Gantt chart generation and display module for generating and displaying a Gantt chart of production progress based on the start and end times of subsequent processes; and a production scheduling module for arranging the photomask production processes according to the Gantt chart.

[0014] The present invention also provides a computing device having the features of including: a processor, a computer-readable storage medium and a communication bus, wherein the computer-readable storage medium stores program instructions, and when the program instructions are executed by the processor, they are capable of implementing the multi-process photomask production setup method described above.

[0015] The role and effect of the invention: According to the multi-process photomask production setup method, system, and electronic equipment of the present invention, based on the end time of the exposure process, combined with the time reference library, standardized movement time, and quantification factor association rules, the start and end times of the entire process can be accurately derived, significantly improving the prediction accuracy of production progress.

[0016] This invention enables rapid location of abnormal nodes by comparing and highlighting the deviation between estimated and actual times, significantly improving anomaly handling efficiency. It establishes customized time benchmarks for multiple process routes, offering strong adaptability; simultaneously, it can automatically generate Gantt charts to replace manual recording, reducing management costs, optimizing process flow, and improving overall production efficiency. This facilitates the transformation of production progress from manual tracking to precise digital control, enhancing the digitalization and intelligence of enterprise production management and strengthening the enterprise's core competitiveness in the semiconductor photomask field. Attached Figure Description

[0017] To more clearly illustrate the technical solutions of the embodiments of the present invention, the accompanying drawings used in the description of the embodiments will be briefly introduced below. Obviously, the drawings described below are only some embodiments of the present invention. For those skilled in the art, other drawings can be obtained based on these drawings without creative effort.

[0018] Figure 1This is a flowchart of a multi-process photomask production setup method in an embodiment of the present invention.

[0019] Figure 2 This is a schematic diagram of a multi-process photomask production setup system in an embodiment of the present invention.

[0020] Explanation of reference numerals in the attached figures: 100-Multi-process photomask production setup system, 101-Time reference library module, 102-Movement time setting module, 103-Quantitative factor association module, 104-Time derivation calculation module, 105-Gantt chart generation and display module, 106-Deviation analysis and optimization module, 107-Production scheduling module. Detailed Implementation

[0021] The technical solutions disclosed in this invention will be described in detail below with reference to specific embodiments.

[0022] The technical solutions of the embodiments of the present invention will be clearly and completely described below with reference to the accompanying drawings. Obviously, the described embodiments are only some embodiments of the present invention, and not all embodiments. Based on the embodiments of the present invention, all other embodiments obtained by those skilled in the art without creative effort are within the scope of protection of the present invention.

[0023] It should be noted that the illustrations provided in this embodiment are only schematic representations of the basic concept of the present invention. Therefore, the drawings only show the components related to the present invention and are not drawn according to the actual number, shape and size of the components in the actual implementation. In the actual implementation, the form, quantity and proportion of each component can be arbitrarily changed, and the layout of the components may also be more complex.

[0024] In this invention, it should be noted that the terms "center," "upper," "lower," "left," "right," "vertical," "horizontal," "inner," and "outer," etc., indicate the orientation or positional relationship based on the orientation or positional relationship shown in the accompanying drawings. They are used only for the convenience of describing the invention and for simplifying the description, and do not indicate or imply that the device or element referred to must have a specific orientation, or be constructed and operated in a specific orientation. Therefore, they should not be construed as limitations on the invention. Furthermore, the terms "first" and "second" are used only for descriptive and distinguishing purposes and should not be construed as indicating or implying relative importance.

[0025] To make the technical means, creative features, objectives and effects of the present invention easy to understand, the following embodiments, in conjunction with the accompanying drawings, provide a detailed description of the multi-process photomask production setup method, system and electronic equipment of the present invention.

[0026] This invention aims to address the problems in existing semiconductor photomask production processes, such as inaccurate production progress prediction, low efficiency in locating abnormal nodes, and poor adaptability of process routes due to the lack of a precise progress prediction system and standardized process time benchmarks. To solve these technical problems, this invention provides a multi-process photomask production setup method. The core of this method lies in using the end time of the exposure process (Writer process) as a unified time benchmark. Combining a multi-process route time benchmark library, standardized movement time, and association rules of process quantification factors, it forward-derives and accurately calculates the start and end times of all subsequent processes, thereby generating a customized Gantt chart that reflects the actual production rhythm and supports rapid anomaly location. Figure 1 As shown, the multi-process photomask production setup method of the present invention specifically includes the following steps: S1: Establish a time reference library for multiple process routes of photomasks. The time reference library stores the standard inherent time consumption of each step in the multiple process routes. Semiconductor photomask production involves various process routes depending on product type and process requirements. This invention first establishes a process time reference library covering multiple core process routes. As one implementation, the semiconductor photomask production process routes involved in this invention can be, for example, but not limited to, the seven core process routes: REBINP1.RA, REBIN1P2.RA, REBIN1N2.RA, REKRFP2.RA, REKRFN2.RA, REREARFP2.RA, and REREARFN2.RA. It is worth noting that this invention does not limit the number and type of specific process routes. The number of process routes can be one or more, specifically based on the ability to cover actual production needs. This invention also does not impose specific restrictions on specific process routes; multiple process routes can adopt any feasible photomask production process route determined by those skilled in the art based on actual production conditions. Step S1 specifically includes the following sub-steps: S1-1: For each type of process route, outline the complete, sequential process flow. As an example, a typical process route might include the following steps in sequence: exposure, development, etching, strip cleaning, critical dimension measurement and inspection (ASI CD), registration, first pattern inspection (INSP1), visual inspection (microscope check), final cleaning, mount pellicle application, second inspection (INSP2), and particle scanning. This process flow clearly defines the sequence of wafer transfer during production.

[0027] S1-2: After clarifying the process chain, collect and analyze actual production data of the process chain to calibrate the standard operating time of each process in the process chain under normal conditions, without abnormal interference. This standard inherent time is used as the standard inherent time for that process. The calibration method for the standard inherent time can be statistical, such as taking the average time of a large number of normal production samples, or set by experienced process engineers based on machine performance and process specifications. After calibration, each process and its corresponding standard inherent time are categorized according to their respective process routes and stored in a specially constructed time benchmark library, providing a unified and standardized data foundation for subsequent time derivation calculations.

[0028] S2: Set standardized movement time between each process. In actual production, after a product completes one process, it typically needs to go through the processes of unloading, handling, waiting, and loading before starting the next process. The time consumed in this process is the movement time between processes. To ensure that the time dimension of the Gantt chart can truly reflect the continuity and rhythm of production and avoid progress prediction deviations due to the uncertainty of movement time, the multi-process photomask production setting method of this invention introduces the concept of standardized movement time. As one implementation method, through on-site measurement and statistical analysis, the time consumed by the product to transfer and move between any two adjacent processes is uniformly calibrated to a fixed value, such as, but not limited to, 2 minutes. This fixed value is the standardized movement time. This means that in the time derivation logic of the Gantt chart, the start time of the next process will be set to the end time of the previous process plus this standardized movement time. By uniformly setting the standardized movement time, the continuity and standardization of the time dimension of the Gantt chart are ensured, and the time statistical deviations that may be caused by manual recording are eliminated.

[0029] S3: Introducing time-differentiation logic for process quantification factors to establish correlation rules between quantification parameters and standard inherent time consumption. For some core processes, their actual time consumption is not a fixed value, but changes significantly with changes in quantification parameters such as product specifications or testing requirements. Ignoring the influence of these quantification factors will lead to a large error in the time estimation of this process, thus affecting the accuracy of the overall progress forecast. Therefore, this method specifically introduces time-differentiation logic for process quantification factors. As one implementation method, this invention specifically establishes correlation rules for the following core processes: S3-1: For critical dimension measurement and inspection processes, since the time consumption is closely related to the number of points to be inspected, this invention adapts to this characteristic by establishing a point-number correlation rule between the number of inspection points and the standard inherent time consumption. The point-number correlation rule can include at least: when the number of inspection points is 1~50, the corresponding standard inherent time consumption is 15 minutes; when the number of inspection points is 51~100, the corresponding standard inherent time consumption is 25 minutes. The multi-process photomask production setup method of this invention can be further subdivided into more levels, such as 101 points to 200 points, depending on the evolution of production processes and the improvement of management precision, specifically to achieve accurate matching of the standard inherent time consumption.

[0030] S3-2: For the first pattern inspection process, its time consumption is strongly correlated with the inspection type and specifications used. This invention dynamically adapts by establishing a type association rule between the inspection type and the standard inherent time consumption. The type association rule can include at least the following: when the inspection type is the first inspection type, the KLA's inspection accuracy is P150 (i.e., operating according to a 150nm inspection accuracy), and the corresponding standard inherent time consumption is 55 minutes; when the inspection type is the second inspection type, the KLA's inspection accuracy is P125 (i.e., operating according to a 125nm inspection accuracy), and the corresponding standard inherent time consumption is 70 minutes. The multi-process photomask production setting method will automatically call the corresponding standard inherent time consumption based on the specific specification information of the product.

[0031] S3-3: For the location measurement and inspection process, a fixed number of points typically need to be measured. As one implementation method, this invention uses the time required to measure 51 points as a fixed calculation basis. The standard inherent time is set at 25 minutes.

[0032] Through the above steps S3-1 to S3-3, the multi-process photomask production setup method of the present invention establishes the correlation rules between quantitative parameters and standard inherent time consumption, so that the time calculation of the Gantt chart has the ability to dynamically adapt to different production tasks.

[0033] S4: Obtain the end time of the exposure process. Using the end time of the exposure process as the time base, and combining the standard inherent time, standardized movement time, and correlation rules, calculate the start and end times of subsequent processes in a forward direction. The exposure process includes laser exposure and electron beam exposure, which are generally considered the starting point and core link of the entire photomask production process. This invention selects the end time of the exposure process as a unified time base point, that is, the time origin, which can be recorded as 00:00. From this point, a forward time derivation is performed for subsequent processes. Step S4 specifically includes the following sub-steps: S4-1: Obtain Input Parameters. First, obtain the basic input information used for calculation as input parameters, including but not limited to: the actual or expected end time of the exposure process, the name of the process route used for the product to be produced, the specific parameters of the product to be produced in each quantization factor-related process, and other relevant process condition parameters (Recipe parameters). Among them, the specific parameters of the product to be produced in each quantization factor-related process include the number of inspection points in the critical dimension measurement and inspection process and the inspection type of the first pattern inspection process.

[0034] S4-2: Perform forward derivation calculation. After receiving the above input parameters, execute the following calculation logic: S4-2-1: Determine the process sequence: Based on the input process route name, retrieve the corresponding complete process link and the initial standard inherent time of each process from the time reference library.

[0035] S4-2-2: Applying Association Rules: Traverse the process sequence. For processes with quantified factor association rules, such as critical dimension measurement and inspection processes, first graphic inspection processes, and position measurement and inspection processes, based on the corresponding input quantified parameters, such as the number of inspection points and inspection type, use the association rules established in S3 to dynamically determine the actual application time of the process in this production task, and replace or cover its initial standard inherent time.

[0036] S4-2-3: Calculate the time for each process: Starting from the time reference point, i.e., the end time of the exposure process, calculate the start and end times of each subsequent process one by one. The start time of the first subsequent process is the end time of the exposure process plus the standardized travel time; the end time of the first subsequent process is the start time of the first subsequent process plus the actual application time of that process; the start time of the second subsequent process is the end time of the first subsequent process plus the standardized travel time, and so on, deriving and calculating the expected start and end times of all processes in the entire process chain in a forward derivation.

[0037] S5: Based on the start and end times of subsequent processes, generate and display a Gantt chart of the production progress. After calculating the estimated time data for all processes, the Gantt chart generation and display module 105 visualizes this data, specifically including the following sub-steps: S5-1: Generate a Gantt chart. Generate a chart with time on the horizontal axis and process name on the vertical axis. Each process is represented by a bar, with the start position of the bar corresponding to the expected start time of the process, the end position corresponding to the expected end time, and the length of the bar visually representing the expected time of the process. This method generates a complete, customized production schedule Gantt chart.

[0038] S5-2: Visualization. It is worth noting that for processes with multiple time branches, such as critical dimension measurement and inspection processes with different time consumption due to different point numbers or specifications, Gantt charts can simultaneously display the time dimensions of multiple branches. For example, the progress arrangements under different production scenarios can be displayed through parallel bar charts or switchable views, thereby adapting to the planning needs of different production tasks.

[0039] S6: The Gantt chart synchronously marks the estimated start time, estimated end time, actual start time, and actual end time of each process in the multi-process route. To achieve real-time monitoring and post-production traceability of the production process, the Gantt chart in this invention not only displays the plan but also the actual execution status. When generating the Gantt chart, an area or data field is reserved for displaying the actual execution time for each process. After production begins, the actual start time and actual end time of each process are collected through integration with the production execution system or machine automation system, or through manual input. These actual times are synchronously marked and compared with the previously calculated estimated times on the Gantt chart. For example, different colored bars can be used on the same process row to represent the planned and actual progress respectively.

[0040] S7: Calculate the time deviation between the estimated and actual time of each process, identify processes whose time deviation exceeds a preset threshold as time-deviation processes, and highlight the process stations where these time-deviation processes are located in the Gantt chart. By establishing a rapid identification mechanism for abnormal nodes, the inefficiency of manual layer-by-layer investigation of delays in existing technologies is solved. Specifically, this includes the following sub-steps: S7-1: Calculate Time Deviation. For each completed process, calculate the difference between its estimated time and actual time. The estimated time is the estimated end time minus the estimated start time, and the actual time is the actual end time minus the actual start time. This difference is the time deviation. The time deviation can be an absolute time difference, such as a delay of 15 minutes, or a relative deviation percentage.

[0041] S7-2: Identify Time-Consuming Deviation Processes. Set one or more preset thresholds for time deviations. These preset thresholds can be configured by production managers based on the sensitivity of the process and its impact on the overall schedule. For example, a smaller threshold, such as 5 minutes, can be set for processes on the critical path, while a larger threshold, such as 15 minutes, can be set for non-critical processes. When the time deviation of a process exceeds the corresponding preset threshold, the process is identified as a time-consuming deviation process.

[0042] S7-3: Highlighting Abnormal Nodes. Once a time-consuming deviation process is identified, immediately highlight the station containing that process on the Gantt chart. Highlighting can be achieved by changing the color of the process's bar chart, adding a flashing border, or displaying a warning icon next to it. This allows production managers to intuitively locate bottleneck stations causing abnormalities in the production process immediately, eliminating the need for time-consuming manual checks of each process, greatly improving anomaly response and handling efficiency.

[0043] S8: Receive the deviation cause information marked at the process station where the time-consuming deviation process is located; based on the deviation cause information, optimize the association rules between the standard inherent time and / or quantification parameters and the standard inherent time. To enable the multi-process photomask production setup method of this invention to have self-learning and continuous optimization capabilities, forming a positive cycle in production management, a deviation cause analysis and benchmark library optimization mechanism is established, specifically including the following sub-steps: S8-1: Receive deviation reason information. When a process is highlighted as a time-consuming deviation process, an information input interface is provided, requiring or prompting the operator or engineer responsible for the process to mark the specific reason for the deviation. The deviation reason can be, but is not limited to: rework due to insufficient data accuracy, waiting after machine malfunction alarm, temporary adjustment of process condition parameters, abnormal incoming materials, excessively long constant temperature waiting time, etc. The operator submits the deviation reason information by selecting from the drop-down menu or manually entering it.

[0044] S8-2: Optimize the time baseline library and association rules. The backend periodically or as needed clusters and analyzes all recorded deviation reasons. If a certain type of deviation occurs frequently—for example, the actual time for the photoresist removal cleaning process consistently exceeds the standard inherent time due to constant temperature waiting—a prompt is issued, suggesting that production management adjust the standard inherent time for that process. Alternatively, if analysis reveals that for a specific inspection type, such as KLA's detection accuracy of P125, the actual time consistently falls between 68-72 minutes instead of the originally planned 55 minutes for the standard accuracy of P150, it is recommended to revise the type association rules established in S3-2, updating the standard inherent time for that inspection type to a more accurate value. Through continuous iterative optimization of the standard inherent time and association rules, the time calculation accuracy of the multi-process photomask production setup method will continuously improve with the accumulation of production data.

[0045] S9: For processes with variable process condition parameters, establish the correlation between different process condition parameters and standard inherent time consumption in the time reference library, and automatically match the corresponding standard inherent time consumption for calculation based on the actually selected process condition parameters. In semiconductor photomask production, the time consumption of some processes is not fixed or only related to the quantization factor, but depends on the specific process condition parameters selected by the operator or automation system. To further improve the accuracy of time calculation, this invention designs a time adaptation logic for process condition parameters, specifically including the following sub-steps: S9-1: Establishing Relationships. Taking the photoresist removal cleaning process and the final cleaning process as examples, these two processes may correspond to various cleaning or desmearing formulations. Different formulations involve different chemical reagents, processing times, and procedures, which are specific process condition parameters. In the time baseline library built in S1, not only is the default standard inherent time of the process stored, but a further relationship table is also established to store the mapping relationship between different process condition parameters and specific standard inherent time.

[0046] S9-2: Automatic Matching Calculation. During the forward derivation calculation in S4, when calculating the photoresist removal cleaning process or the final cleaning process, the process condition parameters input for this production task are checked. Based on the process condition parameters, the correlation established in S9-1 is queried, and the corresponding standard inherent time is automatically matched and obtained. The standard inherent time is used in the calculation of start and end times, ensuring that even when different process conditions are used in the same process, the Gantt chart can provide highly accurate time predictions.

[0047] S10: Based on the Gantt chart obtained from the above steps, arrange the photomask production process.

[0048] As another extended implementation, the multi-process photomask production setup method of the present invention can also be deeply integrated with an enterprise resource planning system or manufacturing execution system. Through an application programming interface, the present invention can acquire order information, material status, and real-time machine utilization data in real time. This external data can serve as supplementary factors to dynamically adjust the standard inherent time or standardized movement time of each process. For example, when the manufacturing execution system reports that a key machine has a large number of currently queued tasks, an offset for waiting time calculated based on historical queuing data is intelligently added to the estimated start time, thereby making the generated Gantt chart more closely resemble the real production environment. It is worth noting that the present invention does not limit the specific implementation architecture and programming language of the Gantt chart generation method. It can be developed based on a browser / server architecture (B / S architecture) or a client / server architecture (C / S architecture). The backend can be implemented using any one or more programming languages ​​such as Java, Python, and C, and the frontend can use frontend technologies such as HTML5, JavaScript, and CSS for Gantt chart visualization rendering, subject to the ability to achieve the various functional logics described in the present invention.

[0049] like Figure 2 As shown, corresponding to the above-mentioned multi-process photomask production setup method, the present invention also provides a multi-process photomask production setup system 100, which includes at least a time reference library module 101, a moving time setting module 102, a quantization factor association module 103, a time derivation calculation module 104, a Gantt chart generation and display module 105, and a production scheduling module 107.

[0050] The time reference library module 101 is used to perform operations such as steps S1, S3-1, S3-2, S3-3 and S9, build and manage the time reference library for multiple process routes, store the standard inherent time of each process, and establish and maintain the association rules between quantitative parameters, process condition parameters and standard inherent time.

[0051] The move-time setting module 102 is used to perform the operation as in step S2, setting and storing the standardized move-time between each process.

[0052] The quantification factor association module 103 is used to perform the operation as in step S3, introduce the time differentiation logic of the process quantification factor, and, with the cooperation of the time base library module 101, establish specific association rules between the quantification parameters and the inherent time consumption of the standard.

[0053] The time derivation calculation module 104 is used to perform operations such as in step S4 and its sub-steps. This module is the calculation core of the multi-process photomask production setting system. It is responsible for obtaining the end time of the exposure process and, based on this time, calling the data and rules provided by the time reference library module 101, the shift time setting module 102, and the quantization factor association module 103 to forward derive and calculate the start and end times of all subsequent processes.

[0054] The Gantt chart generation and display module 105 is used to perform operations such as steps S5, S6, and S7. It is responsible for receiving the time data output by the time derivation and calculation module 104, generating a visual Gantt chart, marking the expected time and actual time on the Gantt chart, comparing and displaying the time deviation, and highlighting the identified time-consuming deviation processes.

[0055] The production scheduling module 107 is used to perform the operations in step S10, and to arrange the production process of the photomask according to the Gantt chart therein.

[0056] In one embodiment, the multi-process photomask production setup system may further include a deviation analysis and optimization module 106, which performs the operations as in step S8, provides an input interface for deviation cause information, analyzes the collected deviation data, generates optimization suggestions, and iteratively updates the standard inherent time consumption and association rules in the time reference library module 101.

[0057] The present invention also provides a computing device comprising a processor, a computer-readable storage medium, and a communication bus. The processor is connected to the computer-readable storage medium via the communication bus and can read and execute program instructions from the computer-readable storage medium. The computer-readable storage medium stores program instructions that, when executed by the processor, can implement all or part of the steps of the multi-process photomask production setup method of any of the above-described embodiments of the present invention. The computing device can be a standalone server, workstation, personal computer, or a virtual machine or container instance deployed in the cloud. As one embodiment, the computer-readable storage medium can be a volatile or non-volatile storage medium, such as, but not limited to, random access memory (RAM), read-only memory (ROM), electrically erasable programmable read-only memory (EEPROM), flash memory, hard disk, solid-state drive (SSD), optical disk, etc. The present invention does not limit the specific type of computer-readable storage medium.

[0058] This invention significantly improves the accuracy of semiconductor photomask production progress prediction. Using the end time of the exposure process as a unified time benchmark, and combining a multi-process route time benchmark library, standardized movement times, and quantified parameter correlation rules, it can forward derive and accurately calculate the expected start and end times of each subsequent process. Compared to traditional solutions relying on rough manual estimations or generic Gantt charts, this invention controls the progress prediction error within a very small and reasonable range, providing highly reliable data support for production planning, machine resource scheduling, and order delivery cycle assessment.

[0059] This invention enables rapid identification and location of production anomalies. By simultaneously marking the estimated and actual times of each process in the Gantt chart and automatically calculating the time deviation, when the actual time of a process deviates from the estimated time by more than a preset threshold, the multi-process photomask production setup system can immediately highlight the process station. Production managers no longer need to manually check layer by layer, and can immediately identify the bottleneck process. The efficiency of anomaly location is greatly improved, effectively reducing the production capacity loss caused by process delays.

[0060] This invention possesses excellent multi-process route adaptability. It establishes customized process time benchmark libraries for various core process routes in semiconductor photomask production. At the same time, it introduces quantitative factor association rules for critical dimension measurement and inspection processes, first pattern inspection processes, and position measurement and inspection processes. This allows a single Gantt chart to be compatible with the progress tracking needs of different process routes and product specifications, thus unifying the standardization level of production progress management.

[0061] It will be apparent to those skilled in the art that the present invention is not limited to the details of the exemplary embodiments described above, and that the invention can be implemented in other specific forms without departing from its spirit or essential characteristics. Therefore, the embodiments should be considered in all respects as exemplary and non-limiting, and the scope of the invention is defined by the appended claims rather than the foregoing description. Thus, all variations falling within the meaning and scope of equivalents of the claims are intended to be included within the present invention. No reference numerals in the claims should be construed as limiting the scope of the claims.

[0062] Furthermore, it should be understood that although this specification describes embodiments, not every embodiment contains only one independent technical solution. This narrative style is merely for clarity. Those skilled in the art should consider the specification as a whole, and the technical solutions in each embodiment can also be appropriately combined to form other embodiments that can be understood by those skilled in the art.

Claims

1. A method for setting up a multi-process photomask production system, characterized in that, Includes the following steps: A time reference library for multiple process routes of photomasks is established, and the time reference library stores the standard inherent time consumption of each process in the multiple process routes. Set standardized travel times between each process step; A time-differentiation logic for process quantification factors is introduced to establish a correlation rule between quantification parameters and the inherent time consumption of the standard. The end time of the exposure process is obtained. Using the end time of the exposure process as the time base, the start and end times of subsequent processes are calculated in a forward derivation, in combination with the standard inherent time, the standardized movement time, and the association rules. Based on the start and end times of the subsequent processes, a Gantt chart of the production progress is generated and displayed; The production process of the photomask is arranged according to the Gantt chart.

2. The multi-process photomask production setup method according to claim 1, characterized in that: The multi-process route includes an exposure process, a development process, an etching process, a photoresist removal and cleaning process, a critical dimension measurement and inspection process, a position measurement and inspection process, a first pattern inspection process, a manual visual inspection of the appearance process, a final cleaning process, a protective film application process, a second inspection process, and a particle scanning process.

3. The multi-process photomask production setup method according to claim 2, characterized in that, The time-distinguishing logic for introducing process quantification factors and establishing association rules specifically includes: For the critical dimension measurement and inspection process, establish a correlation rule between the number of inspection points and the inherent time consumption of the standard, including at least: when the number of inspection points is 1 to 50, the corresponding inherent time consumption of the standard is 10 to 20 minutes; when the number of inspection points is 51 to 100, the corresponding inherent time consumption of the standard is 20 to 30 minutes. For the first graphic inspection process, a type association rule is established between the inspection type and the inherent standard time, including at least: when the inspection type is the first detection type, the corresponding inherent standard time is 50~60min; when the inspection type is the second detection type, the corresponding inherent standard time is 60~80min. For the aforementioned location measurement and inspection process, 50 to 52 standard work points are measured, and the inherent time for the standard is 20 to 30 minutes.

4. The multi-process photomask production setup method according to claim 2, characterized in that, The method further includes: The standard inherent time consumption in the photoresist removal cleaning process and the final cleaning process is established in the time reference library according to the changes in process condition parameters, and different correlations between the process condition parameters and the standard inherent time consumption are established.

5. The multi-process photomask production setup method according to claim 4, characterized in that: The forward derivation calculates the start and end times of all subsequent processes, and automatically matches the corresponding standard inherent time consumption based on the process condition parameters.

6. The multi-process photomask production setup method according to claim 1, characterized in that, In the step of forward derivation to calculate the start and end times of subsequent processes, the start time of any process in the subsequent processes is set as the end time of the previous process plus the standardized movement time.

7. The multi-process photomask production setup method according to claim 1, characterized in that, The method further includes: The estimated start time, estimated end time, actual start time, and actual end time of each process in the multi-process route are simultaneously marked in the Gantt chart. Calculate the time deviation between the estimated time and the actual time of each process, identify the process whose time deviation exceeds a preset threshold as the time deviation process, and highlight the process station where the time deviation process is located in the Gantt chart.

8. The multi-process photomask production setup method according to claim 7, characterized in that, The method further includes: Receive the deviation cause information marked at the process station where the time-consuming deviation process is located; Based on the deviation cause information, the inherent time consumption of the standard and / or the association rules are optimized.

9. A multi-process photomask production setup system, characterized in that, include: The time reference library module is used to build a time reference library for multiple process routes. The time reference library stores the standard inherent time consumption of each process in the multiple process routes. The move-time setting module is used to set the standardized move-time between each process. The quantification factor association module is used to introduce the time differentiation logic of the process quantification factor and establish the association rule between the quantification parameter and the inherent time consumption of the standard. The time derivation and calculation module is used to obtain the end time of the exposure process, and using the end time of the exposure process as the time base, combined with the standard inherent time, the standardized movement time and the association rule, to forward deduce and calculate the start time and end time of the subsequent processes. The Gantt chart generation and display module is used to generate and display a Gantt chart of the production progress based on the start and end times of the subsequent processes. The production scheduling module arranges the production process of the photomask according to the Gantt chart.

10. A computing device, characterized in that, include: Processor, computer-readable storage medium, and communication bus, The computer-readable storage medium stores program instructions, which, when executed by the processor, enable the implementation of the multi-process photomask production setup method according to any one of claims 1-8.

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