A sample surface processing apparatus

Abstract

The application discloses a sample surface treatment equipment and relates to the technical field of semiconductor material surface treatment equipment. The sample surface treatment equipment comprises a process chamber, a movement chamber and a movement mechanism. The process chamber is used for surface treatment of a sample fixed on a carrier disc. The movement chamber can rotate relative to the process chamber. At least one of the process chamber and the movement chamber has an independent vacuum system. The movement mechanism is arranged in the movement chamber and is used for driving the carrier disc to move in a plane parallel to the surface of the sample and driving the carrier disc to rotate. The movement mechanism comprises a first driving assembly, a second driving assembly and a rotation driving assembly. A first rotating shaft is connected with and drives a first swing arm to swing around a first axis. A second rotating shaft is connected with and drives a second swing arm to rotate around a second axis. The first axis and the second axis are parallel and are arranged at intervals. The first swing arm and the second swing arm are linked. The rotation driving assembly is connected with the carrier disc and is used for driving the carrier disc to rotate around its own axis.

Description

Technical Field

[0001] This invention relates to the field of semiconductor material surface treatment equipment technology, and more particularly to a sample surface treatment device. Background Technology

[0002] With the rapid development of the precision manufacturing industry, the surface treatment processes of precision devices, such as plasma and superatom beam polishing, have increasingly stringent requirements for ultra-high vacuum environment, motion accuracy, operating speed and cleanliness. In order to obtain atomic-level surface quality and avoid oxidation or contamination, the above processes usually need to be carried out in a vacuum environment, and require the sample to move at high speed and high precision relative to the treatment source (such as ion beam or superatom beam).

[0003] Currently, vacuum motion mechanisms employ multiple rotary drive devices in conjunction with multi-link and hinge systems to convert the rotational motion of the rotary drive devices into the planar motion of the end-loaded disk. However, existing multi-link and hinge mechanisms contain numerous exposed kinematic pairs. On one hand, the grease required for these kinematic pairs is highly volatile under vacuum, becoming a major source of venting and making it difficult for the system to stably maintain the ultimate vacuum level. On the other hand, the tiny debris generated by friction during high-speed operation of the kinematic pairs lacks effective isolation, easily escaping and directly contaminating the sample surface, severely restricting product yield. Moreover, to achieve the planar motion of the end-loaded disk, the multi-link and hinge system relies on the linkage of multiple arms and hinges. Its long links and large moment of inertia easily induce vibration and elastic deformation during high-speed start-up, shutdown, or scanning, resulting in lag in dynamic response and decreased trajectory accuracy, making it difficult to meet the requirements of ultra-high speed and ultra-high precision in parallel. Summary of the Invention

[0004] The purpose of this invention is to provide a sample surface treatment device to solve the problems of poor ultra-high vacuum adaptability, serious particulate contamination, inability to balance high speed and high precision, insufficient multi-axis linkage capability, and poor reliability of vacuum built-in components in existing vacuum motion mechanisms, thereby improving the stability of precision device surface treatment processes, sample yield, and production efficiency.

[0005] To achieve this objective, the present invention adopts the following technical solution: A sample surface treatment device, comprising: A process chamber for surface treatment of samples, wherein the samples are fixed to a support plate; A motion chamber that can rotate relative to the process chamber, wherein at least one of the process chamber and the motion chamber has an independent vacuum system; A motion mechanism, located within the motion chamber, is used to drive the carrier disk to move in a plane parallel to the sample surface and to drive the carrier disk to rotate. The motion mechanism includes: A first drive assembly and a second drive assembly, the first drive assembly including a first rotating shaft and a first swing arm, the second drive assembly including a second rotating shaft and a second swing arm, the first rotating shaft connecting to and driving the first swing arm to swing around a first axis, the second rotating shaft connecting to and driving the second swing arm to rotate around a second axis, the first axis and the second axis being parallel and spaced apart; the first swing arm and the second swing arm are linked to convert the rotational motion of the first rotating shaft and the second rotating shaft into two-dimensional planar movement of the bearing disk; The self-rotation drive component is connected to the carrier disk and is used to drive the carrier disk to rotate about its own axis.

[0006] As an optional embodiment of the sample surface treatment device, the first rotating shaft and the second rotating shaft are coaxially sleeved and can rotate independently. The second rotating shaft is rotatably sleeved inside the first rotating shaft. The first rotating shaft is rotatably sealed to the cavity wall of the motion chamber through a first magnetohydrodynamic seal. The axes of the first rotating shaft and the second rotating shaft constitute the first axis.

[0007] As an optional solution for the sample surface treatment device, the first drive assembly further includes a first motor, and the second drive assembly further includes a second motor. Both the first motor and the second motor are located outside the motion chamber. The first motor is connected to the end of the first rotating shaft located outside the motion chamber through a first transmission assembly, and the second motor is connected to the end of the second rotating shaft located outside the motion chamber through a second transmission assembly.

[0008] As an optional embodiment of the sample surface treatment device, the second drive assembly further includes a connecting shaft and a third transmission assembly. The second rotating shaft is connected to the connecting shaft through the third transmission assembly, and the second swing arm is fixed to the connecting shaft. The axis of the connecting shaft constitutes the second axis.

[0009] As an optional solution for the sample surface treatment equipment, the rotation drive assembly includes a rotation motor, a rotation shaft, and a fourth transmission assembly. The rotation motor is located in the motion chamber, the rotation shaft is coaxially sleeved in the connecting shaft and can rotate relative to the connecting shaft, and both ends of the rotation shaft extend out of the connecting shaft, one end is connected to the rotation motor, and the other end is connected to the fourth transmission assembly. The end of the first swing arm away from the first rotating shaft is rotatably connected to the connecting shaft or the self-rotating shaft.

[0010] As an optional embodiment of the sample surface treatment device, the motion chamber and the process chamber are connected by a rotating through-piece, and a second magnetohydrodynamic seal is provided between the rotating through-piece and the wall of the process chamber.

[0011] As an optional solution for the sample surface treatment equipment, a rotary drive mechanism is also included. The rotary drive mechanism is located outside the motion chamber and connected to the rotary through member, and is used to drive the rotary through member to rotate the motion chamber. The rotary drive mechanism includes a rotary motor and a fifth transmission assembly, wherein the rotary motor is connected to the rotary through member via the fifth transmission assembly.

[0012] As an optional embodiment of the sample surface treatment equipment, the rotary drive mechanism further includes a braking element, which is disposed on the fifth transmission assembly and is used to brake the rotary through member.

[0013] As an optional solution for the sample surface treatment device, both the motion mechanism and the rotation drive mechanism are equipped with position detection elements, which are used to detect the motion parameters of each axis.

[0014] As an optional solution for the sample surface treatment device, it also includes a control unit, wherein the motion mechanism and the rotary drive mechanism are both electrically connected to the control unit, and the position detection element is communicatively connected to the control unit; The control unit is configured to have a built-in fixed geometric error compensation algorithm and a dynamic non-geometric error compensation algorithm. Based on the set trajectory parameters of the bearing plate, it controls the motion mechanism and the rotary drive mechanism to work together. Through a motion interpolation algorithm, the set trajectory parameters are converted into motion commands for each axis, driving each axis to move in coordination.

[0015] As an alternative to the sample surface treatment equipment, the process chamber is provided with a flow guide chamber, which is configured to guide and collect debris generated during the surface treatment of the sample.

[0016] The beneficial effects of this invention are: The sample surface treatment equipment provided by this invention has at least one of the process chamber and motion chamber with independent vacuum system control. Friction debris and wear particles generated during the motion mechanism's movement are contained within the motion chamber, ensuring an ultra-clean process environment in the process chamber where the sample is located. This effectively improves the sample's process yield and avoids sample rejection due to particle contamination. Furthermore, the vacuum level of the motion chamber can be finely adjusted according to motion requirements, and the process chamber can maintain a stable ultra-high vacuum, improving the flexibility and stability of vacuum control. In the motion mechanism, a first rotating shaft drives a bearing plate to swing around a first axis via a first swing arm, and a second rotating shaft drives a bearing plate to rotate around a second axis via a second swing arm. A self-rotation drive assembly drives the bearing plate to rotate around its own axis. This allows the drive motors of the first and second drive assemblies to be arranged outside the motion chamber, reducing the number of dynamic seals and exposed moving parts inside the motion chamber, reducing grease evaporation and the generation of wear debris from moving parts, thereby stably maintaining an ultra-high vacuum and reducing particle contamination. Meanwhile, the first and second swing arms work together to directly convert the rotational motion into the two-dimensional planar motion of the bearing plate. This eliminates the lengthy motion chain of multiple series arms and multiple intermediate hinges in the existing technology, reduces the system inertia and elastic deformation, and improves the dynamic response speed and rigid body motion accuracy of the motion mechanism during high-speed start and stop, achieving a balance between ultra-high speed and ultra-high precision. Attached Figure Description

[0017] Figure 1 This is a schematic diagram of the sample surface treatment equipment provided in the embodiments of the present invention; Figure 2 This is a schematic diagram of the sample surface treatment device provided in an embodiment of the present invention; Figure 3 This is a schematic diagram of the internal structure of the sample surface treatment device provided in an embodiment of the present invention; Figure 4 This is a schematic diagram of the internal structure of the motion chamber of the sample surface treatment device provided in this embodiment of the invention after it has rotated 90° relative to the process chamber.

[0018] In the picture: 100. Sample; 1. Process chamber; 11. Flow guide chamber; 2. Motion chamber; 3. First magnetohydrodynamic seal; 4. Motion mechanism; 41. First drive assembly; 411. First rotating shaft; 412. First swing arm; 413. First motor; 414. First transmission assembly; 4141. First driving pulley; 4142. First synchronous belt; 4143. First driven pulley; 42. Second drive assembly; 421. Second rotating shaft; 422. Second swing arm; 423. Second motor; 424. Second transmission assembly; 4241. Second driving pulley; 4242. Second synchronous belt; 4243. Second driven pulley; 425. Connecting shaft; 426. Third transmission assembly; 4261. Third driving pulley; 4262. Third synchronous belt; 4263. Third driven pulley; 43. Rotation drive assembly; 431. Rotation motor; 432. Fourth transmission assembly; 4321. Fourth driving pulley; 4322. Fourth synchronous belt; 4323. Fourth driven pulley; 5. Rotating through-type component; 6. Rotary drive mechanism; 61. Rotary motor; 62. Fifth transmission assembly; 621. Fifth driving pulley; 622. Fifth synchronous belt; 623. Fifth driven pulley; 63. Braking component. Detailed Implementation

[0019] Embodiments of the present invention are described in detail below. Examples of these embodiments are illustrated in the accompanying drawings, wherein the same or similar reference numerals denote the same or similar elements or elements having the same or similar functions throughout. The embodiments described below with reference to the accompanying drawings are exemplary and intended to explain the present invention, and should not be construed as limiting the present invention.

[0020] In the description of this invention, it should be noted that the terms "center," "upper," "lower," "left," "right," "vertical," "horizontal," "inner," and "outer," etc., indicate the orientation or positional relationship based on the orientation or positional relationship shown in the accompanying drawings. They are used only for the convenience of describing the invention and for simplifying the description, and do not indicate or imply that the device or element referred to must have a specific orientation, or be constructed and operated in a specific orientation. Therefore, they should not be construed as limitations on the invention. Furthermore, the terms "first" and "second" are used for descriptive purposes only and should not be construed as indicating or implying relative importance. The terms "first position" and "second position" refer to two different positions.

[0021] Unless otherwise explicitly specified and limited, the terms "installation," "connection," "linking," and "fixing" should be interpreted broadly. For example, they can refer to fixed connections or detachable connections; mechanical connections or electrical connections; direct connections or indirect connections through an intermediate medium; and connections within two components or interactions between two components. Those skilled in the art can understand the specific meaning of these terms in this invention based on the specific circumstances.

[0022] Unless otherwise expressly specified and limited, "above" or "below" a second feature can include direct contact between the first and second features, or contact between the first and second features through another feature between them. Furthermore, "above," "over," and "on top" of a second feature includes the first feature directly above or diagonally above the second feature, or simply indicates that the first feature is at a higher horizontal level than the second feature. "Below," "below," and "under" of a second feature includes the first feature directly below or diagonally below the second feature, or simply indicates that the first feature is at a lower horizontal level than the second feature.

[0023] The technical solution of the present invention will be further described below with reference to the accompanying drawings and specific embodiments.

[0024] like Figures 1-4 As shown, this embodiment provides a sample surface treatment device, including a process chamber 1, a motion chamber 2, and a motion mechanism 4. The process chamber 1 is used to perform surface treatment on a sample 100, which is fixed to a support plate. The motion chamber 2 can rotate relative to the process chamber 1. The motion mechanism 4 is located inside the motion chamber 2 and is used to drive the support plate to move in a plane parallel to the surface of the sample 100 and to drive the support plate to rotate. The process chamber 1 is adaptable to surface treatment processes for precision devices such as plasma and superatom beam polishing. The sample 100 can be a wafer or an optical component to be processed.

[0025] At least one of the process chamber 1 and the motion chamber 2 has an independent vacuum system to achieve independent control of the vacuum level in either the process chamber 1 or the motion chamber 2. Friction debris and wear particles generated during the movement of the motion mechanism 4 remain in the motion chamber 2, ensuring an ultra-clean process environment in the process chamber 1 where the sample 100 is located, effectively improving the process yield of the sample 100, and avoiding the scrapping of the sample 100 due to particulate contamination.

[0026] In this embodiment, both the process chamber 1 and the motion chamber 2 have independent vacuum systems. This not only maintains the process chamber 1 in an ultra-high vacuum clean environment, but also allows the vacuum level of the motion chamber 2 to be finely adjusted according to motion requirements. The process chamber 1 can maintain a stable ultra-high vacuum, improving the flexibility and stability of vacuum control.

[0027] In other embodiments, only the process chamber 1 may have an independent vacuum system, while the motion chamber 2 may share the vacuum system with the process chamber 1 through an isolation valve; or, only the motion chamber 2 may have an independent vacuum system, and the vacuum of the process chamber 1 may be provided by the motion chamber 2.

[0028] Furthermore, a flow guide chamber 11 is provided within the process chamber 1. The flow guide chamber 11 is configured to guide and collect debris generated during the surface treatment of the sample 100. Specifically, the flow guide chamber 11 is vertically continuous and gradually narrows from the top opening to the bottom opening, guiding the debris generated during the surface treatment of the sample 100 within the process chamber 1 downwards and collecting it in a recovery space. The recovery space is connected to the vacuum system of the process chamber 1, allowing debris entering the recovery space to be extracted from the process chamber 1 by airflow.

[0029] The motion mechanism 4 includes a first drive assembly 41, a second drive assembly 42, and a rotation drive assembly 43. The first drive assembly 41 includes a first rotating shaft 411 and a first swing arm 412. The second drive assembly 42 includes a second rotating shaft 421 and a second swing arm 422. The first rotating shaft 411 is connected to and drives the first swing arm 412 to swing around a first axis. The second rotating shaft 421 is connected to and drives the second swing arm 422 to rotate around a second axis. The first axis and the second axis are parallel and spaced apart. The first swing arm 412 and the second swing arm 422 are linked to convert the rotational motion of the first rotating shaft 411 and the second rotating shaft 421 into two-dimensional planar movement of the carrier disk. The rotation drive assembly 43 is connected to the carrier disk and is used to drive the carrier disk to rotate around its own axis. The first rotating shaft 411 drives the bearing plate to swing around the first axis via the first swing arm 412, and the second rotating shaft 421 drives the bearing plate to rotate around the second axis via the second swing arm 422. The self-rotation drive assembly 43 drives the bearing plate to rotate around its own axis, so that the drive motors of the first drive assembly 41 and the second drive assembly 42 can be arranged outside the motion chamber 2, reducing the number of dynamic seals and exposed moving parts inside the motion chamber 2, reducing grease evaporation and the generation of wear debris from moving parts, thereby stably maintaining a value less than 1e. -5 Pa-level ultra-high vacuum reduces particulate contamination. Simultaneously, the first swing arm 412 and the second swing arm 422 are linked, directly converting the rotational motion into the two-dimensional planar motion of the bearing plate. This eliminates the lengthy motion chain of multiple series arms and intermediate hinges in existing technologies, reduces system inertia and elastic deformation, and improves the dynamic response speed and rigid body motion accuracy of the motion mechanism 4 during high-speed start and stop, achieving a balance between ultra-high speed and ultra-high precision.

[0030] The motion chamber 2 and the process chamber 1 are connected by a rotating through-piece 5. A second magnetohydrodynamic seal is installed between the rotating through-piece 5 and the wall of the process chamber 1, enabling the motion chamber 2 and the process chamber 1 to rotate relative to each other while maintaining their own independent vacuum environments. This ensures ultra-high vacuum cleanliness while providing the sample 100 with a wide range of tilt angle adjustment capabilities. The rotating through-piece 5 serves as both a mechanical load-bearing and rotational support component, as well as a vacuum isolation channel between the two chambers. The second magnetohydrodynamic seal is a purchased finished product, and its working principle and specific structure will not be described in detail here. The second magnetohydrodynamic seal restricts the backflow and migration of gas molecules and particles from the motion chamber 2 to the process chamber 1. Even if the first swing arm 412, the second swing arm 422, and other moving pairs in the motion chamber 2 generate a small amount of wear particles due to long-term operation, the second magnetohydrodynamic seal can effectively prevent these particles from diffusing into the process chamber 1, ensuring the ultra-high cleanliness of the support plate and the sample 100.

[0031] Specifically, the rotating through-hole 5 is designed as a flange-type or cylindrical hollow rotating body, with through holes inside for the second swing arm 422 and the self-rotating drive assembly 43 to pass through. The cross-sectional dimensions of the through holes should be larger than the maximum two-dimensional travel of the bearing plate to ensure that the bearing plate does not interfere with the inner wall of the rotating through-hole 5 throughout its planar movement range. One end of the rotating through-hole 5 is rigidly fixed to the wall of the connecting hole of the motion chamber 2 by bolts, clamps, or welding, and a static seal can be used to form a vacuum seal between the two. The other end of the rotating through-hole 5 is rotatably connected to the wall of the process chamber 1 through a second magnetohydrodynamic seal to ensure that the vacuum degree of the process chamber 1 is not disrupted during the rotation of the motion chamber 2, thus ensuring the continuity and stability of the process.

[0032] In one embodiment, the sample surface treatment device further includes a rotary drive mechanism 6, which is located outside the motion chamber 2 and connected to the rotary through member 5. The rotary drive mechanism 6 is used to drive the rotary through member 5 to rotate the motion chamber 2 so as to adjust the tilt angle of the sample 100 and meet the requirements of different processes for the posture of the sample 100.

[0033] The rotary drive mechanism 6 includes a rotary motor 61 and a fifth transmission assembly 62. The rotary motor 61 is connected to the rotary through member 5 via the fifth transmission assembly 62. Specifically, the rotary motor 61 is fixed to the top of the process chamber 1. The main shaft of the rotary motor 61 is connected to the first reducer via a first coupling. The fifth transmission assembly 62 includes a fifth driving wheel 621, a fifth synchronous belt 622, and a fifth driven wheel 623. The output shaft of the first reducer is connected to the fifth driving wheel 621. The fifth driven wheel 623 is connected to the fifth driving wheel 621 via the fifth synchronous belt 622. The fifth driven wheel 623 is sleeved and fixed to the outer wall of the rotary through member 5. The rotary motor 61 drives the fifth driving wheel 621 to rotate, which in turn drives the fifth driven wheel 623 and the rotary through member 5 to rotate synchronously via the fifth synchronous belt 622, thereby driving the motion chamber 2 to rotate and achieving the adjustment of the tilt angle of the sample 100 relative to the processing source.

[0034] Furthermore, the rotary drive mechanism 6 also includes a brake 63, which is located in the fifth transmission assembly 62 and is used to brake the rotary through member 5. The brake 63 is used to automatically clamp when the equipment is powered off, to prevent the moving chamber 2 from drifting due to inertia and to avoid collision damage to the sample 100.

[0035] Specifically, the brake element 63 is a synchronous belt clamping brake, which is located on the fifth synchronous belt 622.

[0036] In one embodiment, the first rotating shaft 411 and the second rotating shaft 421 are coaxially fitted and can rotate independently. The second rotating shaft 421 is rotatably fitted inside the first rotating shaft 411. The first rotating shaft 411 is rotatably sealed to the cavity wall of the motion chamber 2 through a first magnetohydrodynamic seal 3. The axes of the first rotating shaft 411 and the second rotating shaft 421 constitute a first axis. The first rotating shaft 411 and the second rotating shaft 421 adopt an inner and outer coaxial nested layout. The first magnetohydrodynamic seal 3 is only set between the outer side of the first rotating shaft 411 and the cavity wall of the motion chamber 2, so as to ensure the vacuum degree inside the motion chamber 2 while allowing the second rotating shaft 421 to rotate relative to the motion chamber 2. At the same time, the inner and outer coaxial layout makes the rotation centers of the first rotating shaft 411 and the second rotating shaft 421 coincide, and their central axes are the first axis. The structure is compact, reducing the space occupation of the boom linkage system and improving the overall transmission stiffness and dynamic response performance.

[0037] The first rotating shaft 411 is a hollow shaft, and its inner hole serves as the support and rotation space for the second rotating shaft 421. A first magnetohydrodynamic seal 3 is provided between the outer circumferential surface of the first rotating shaft 411 and the assembly hole in the cavity wall of the motion chamber 2. This first magnetohydrodynamic seal 3 is a purchased finished product and can achieve rotational sealing. The second rotating shaft 421 is supported in the inner hole of the first rotating shaft 411 by a precision bearing. A small gap is left between the two shafts, which extends along the axial direction, forming a tortuous labyrinthine path. Due to the pressure difference between the inside and outside of the motion chamber 2, the ultra-high vacuum inside the motion chamber 2 has a suction effect on this gap. In addition, the first magnetohydrodynamic seal 3 has blocked atmospheric leakage, and there is very little residual gas in this gap, which can be regarded as a quasi-vacuum environment, requiring no additional sealing components.

[0038] In one embodiment, the first drive assembly 41 further includes a first motor 413, and the second drive assembly 42 further includes a second motor 423. Both the first motor 413 and the second motor 423 are located outside the motion chamber 2. The first motor 413 is connected to the end of the first rotating shaft 411 located outside the motion chamber 2 via a first transmission assembly 414, and the second motor 423 is connected to the end of the second rotating shaft 421 located outside the motion chamber 2 via a second transmission assembly 424. The first motor 413 and the second motor 423 are located outside the motion chamber 2 and on both sides of the first rotating shaft 411, respectively. They transmit torque to the first swing arm 412 and the second swing arm 422 inside the motion chamber 2 only through the coaxially sleeved first rotating shaft 411 and second rotating shaft 421, respectively. This cuts off the main sources of venting, such as motor windings and bearing grease, as well as the diffusion path of particles from the motor windings to the process chamber 1, ensuring the ultra-high cleanliness of the working area of ​​the bearing plate.

[0039] Specifically, the main shaft of the first motor 413 is connected to the second reducer via a second coupling. The first transmission assembly 414 includes a first driving wheel 4141, a first synchronous belt 4142, and a first driven wheel 4143. The output shaft of the second reducer is connected to the first driving wheel 4141. The first driven wheel 4143 and the first driving wheel 4141 are connected by the first synchronous belt 4142. The first driven wheel 4143 is sleeved on the outer peripheral wall of the first rotating shaft 411 and fixedly connected to the first rotating shaft 411. When the first motor 413 rotates, it drives the first driving wheel 4141 to rotate via the second reducer. This rotation, via the first synchronous belt 4142, drives the first driven wheel 4143 and the first rotating shaft 411 to rotate synchronously, thereby driving the first swing arm 412 to swing. The swing angle range of the first swing arm 412 can be set with a safety threshold according to process requirements. Within the set safety threshold range, the first swing arm 412 swings left and right, thereby driving the bearing plate to swing left and right.

[0040] The main shaft of the second motor 423 is connected to the third reducer via the third connecting shaft 425. The second transmission assembly 424 includes a second driving wheel 4241, a second synchronous belt 4242, and a second driven wheel 4243. The output shaft of the third reducer is connected to the second driving wheel 4241. The second driven wheel 4243 and the second driving wheel 4241 are connected by the second synchronous belt 4242. The second driven wheel 4243 is sleeved and fixed on the outer peripheral wall of the second rotating shaft 421. When the second motor 423 rotates, it drives the second driving wheel 4241 to rotate via the third reducer, and drives the second driven wheel 4243 and the second rotating shaft 421 to rotate synchronously via the second synchronous belt 4242.

[0041] In one embodiment, the second drive assembly 42 further includes a connecting shaft 425 and a third transmission assembly 426. The second rotating shaft 421 is connected to the connecting shaft 425 through the third transmission assembly 426, and the second swing arm 422 is fixed to the connecting shaft 425. The axis of the connecting shaft 425 constitutes the second axis.

[0042] Specifically, the connecting shaft 425 is positioned above the second rotating shaft 421 and the first rotating shaft 411, and its height is substantially the same as that of the rotating through member 5. This allows the other end of the second swing arm 422 to enter the process chamber 1 through the through hole of the rotating through member 5 and connect to the mounting shaft of the carrier plate. This arrangement ensures that the motion plane of the second swing arm 422 is approximately perpendicular to the axis of the through hole of the rotating through member 5. When the rotating through member 5 drives the motion chamber 2 to rotate to adjust the tilt angle, the relative gap between the second swing arm 422 and the inner wall of the through hole remains constant or changes very little. This avoids motion interference between the second swing arm 422 and the inner wall of the through hole of the rotating through member 5, ensuring that the two-dimensional planar motion stroke under large-angle tilt is unrestricted. The third transmission assembly 426 includes a third driving wheel 4261, a third synchronous belt 4262, and a third driven wheel 4263. The third driving wheel 4261 is sleeved and fixed to the second rotating shaft 421, and the third driven wheel 4263 is sleeved and fixed to the connecting shaft 425 and connected to the third driving wheel 4261 through the third synchronous belt 4262, thereby driving the connecting shaft 425 and the second swing arm 422 to rotate, transmitting the rotational motion of the second rotating shaft 421 to the connecting shaft 425 and the second swing arm 422. The swing angle range of the second swing arm 422 can be independently set with a safety threshold.

[0043] In one embodiment, the rotation drive assembly 43 includes a rotation motor 431, a rotation shaft, and a fourth transmission assembly 432. The rotation motor 431 is located inside the motion chamber 2. The rotation shaft is coaxially sleeved inside the connecting shaft 425 and can rotate relative to the connecting shaft 425. Both ends of the rotation shaft extend out of the connecting shaft 425, with one end connected to the rotation motor 431 and the other end connected to the fourth transmission assembly 432. The end of the first swing arm 412 away from the first rotating shaft 411 is rotatably connected to the connecting shaft 425 or the rotation shaft. The rotation motor 431 requires relatively low power and speed. The trace particles or volatiles it generates are not easily diffused into the process chamber 1 under the vacuum system of the motion chamber 2. With the blocking effect of the rotating through-piece 5 and the second magnetohydrodynamic seal, the ultra-high cleanliness of the sample 100 area is effectively guaranteed.

[0044] The connecting shaft 425 is a hollow shaft, and its inner hole serves as the support and rotation space for the rotating shaft. The rotating shaft is supported in the inner hole of the connecting shaft 425 by precision bearings, and both ends extend to the outside of the connecting shaft 425. One end is connected to the self-rotating motor 431, and the other end is connected to the fourth transmission assembly 432. The fourth transmission assembly 432 includes a fourth driving wheel 4321, a fourth synchronous belt 4322, and a fourth driven wheel 4323. The fourth driving wheel 4321 is sleeved and fixed to the outer wall of the rotating shaft, and the fourth driven wheel 4323 is sleeved on the mounting shaft of the bearing plate. The fourth synchronous belt 4322 drives and connects the fourth driving wheel 4321 and the fourth driven wheel 4323, and enters the process chamber 1 through the through hole of the rotating through member 5 to connect with the fourth driven wheel 4323. This layout concentrates the rotation transmission chain of the bearing disk on the connecting shaft 425 and its two extended areas, resulting in a short transmission path, fewer transmission components, reduced transmission clearance and elastic deformation, and improved response speed and angle control accuracy of the bearing disk's rotation.

[0045] The end of the first swing arm 412 furthest from the first rotating shaft 411 is rotatably connected to the rotation shaft via a precision bearing, so that the swinging motion of the first swing arm 412 is independent of the rotation motion of the rotation shaft. In other embodiments, the end of the first swing arm 412 furthest from the first rotating shaft 411 is rotatably connected to the connecting shaft 425 via a precision bearing.

[0046] In this embodiment, the outer circumferential surfaces of the driving and driven wheels of the first transmission assembly 414, the second transmission assembly 424, the third transmission assembly 426, and the fourth transmission assembly 432 are all provided with toothed structures. The synchronous belt is made of steel belt or metal toothed chain to improve transmission rigidity, reduce elastic deformation and backlash, thereby reducing transmission error.

[0047] Furthermore, both the motion mechanism 4 and the rotary drive mechanism 6 are equipped with position detection elements, which are used to detect the motion parameters of each axis.

[0048] In one specific embodiment, the position detection component is a high-precision grating ruler, which can detect the real-time position of each axis in real time, thereby ensuring that the swing accuracy of the first swing arm 412 and the second swing arm 422 is ≤1 arc minute, providing a basis for the overall positioning accuracy.

[0049] In one embodiment, the self-rotating motor 431 is a vacuum motor. The vacuum motor is fixed to the inner wall of the motion chamber 2, which can fundamentally solve the problems of gas release pollution, heat dissipation difficulties and poor operational reliability caused by ordinary motors in a vacuum environment.

[0050] In one embodiment, a cooling assembly is provided circumferentially on the self-rotating motor 431. The cooling assembly includes a cooling seat and cooling pipes. The cooling seat includes a through cavity and an annular cooling cavity surrounding the through cavity. The cooling seat is positioned around the coil of the self-rotating motor 431 through the through cavity. The cooling pipes are connected to the annular cooling cavity to provide circulating coolant within the annular cooling cavity, thereby achieving heat dissipation of the self-rotating motor 431 and solving the problem that the heat generated by the self-rotating motor 431 in the vacuum environment of the motion chamber 2 cannot be dissipated by convection.

[0051] Furthermore, all components in the motion mechanism 4 are made of materials with low outgassing rates, including 304 stainless steel, 316 stainless steel, aluminum alloy, polytetrafluoroethylene (PTFE), or polyetheretherketone (PEEK). By selecting these materials, the gas load in the ultra-high vacuum environment is reduced, enabling the motion chamber 2 and process chamber 1 to quickly reach and maintain the target vacuum level, with minimal vacuum fluctuations during prolonged operation. All bearings are lubricated with silicone-based grease. Silicone-based grease replaces conventional mineral-based grease, reducing its volatility in a vacuum environment while ensuring smooth operation of the moving parts, allowing process chamber 1 and motion chamber 2 to stably maintain a vacuum level of 1°C. -5 The ultra-high vacuum environment at the Pa level meets the vacuum requirements of high-end plasma processing, superatom beam polishing and other processes; at the same time, the use of silicone-based grease not only reduces volatile pollution, but also improves the lubrication effect of moving parts, reduces wear and extends the service life of moving parts.

[0052] In one embodiment, the sample surface treatment device further includes a control unit. The motion mechanism 4 and the rotary drive mechanism 6 are both electrically connected to the control unit, and the position detection component is communicatively connected to the control unit. The control unit is configured to have a built-in geometric error fixed compensation algorithm and a non-geometric error dynamic compensation algorithm. Based on the set trajectory parameters of the carrier plate, it controls the motion mechanism 4 and the rotary drive mechanism 6 to work together. Through the motion interpolation algorithm, the set trajectory parameters are converted into motion commands for each axis, driving each axis to move together.

[0053] The first rotating shaft 411 and the second rotating shaft 421 are coaxially nested, the first swing arm 412 and the second swing arm 422 are linked, and the driving wheels and driven wheels of each transmission component are connected by synchronous belts. Inevitably, geometric errors such as shaft misalignment, arm length deviation, and transmission wheel eccentricity exist in these components during processing and assembly. The geometric error fixed compensation algorithm establishes a geometric error mapping model by performing full-field calibration of the motion range of each axis during system initialization, and then performs feedforward correction of motion commands during actual motion, fundamentally eliminating the impact of fixed geometric deviations on end-positioning accuracy.

[0054] The non-geometric error dynamic compensation algorithm provides real-time compensation for time-varying error sources during operation. Examples include elastic deformation of shafts and swing arms due to inertial forces during high-speed start-stop, slight stretching of the synchronous belt when transmitting large torques, micro-structural deformation caused by pressure differences inside and outside the motion chamber 2, and mechanical wear and increased clearance due to long-term operation. This algorithm collects position feedback signals from each shaft in real time and, combined with a pre-defined dynamic error model, calculates the compensation amount online and adds it to the motion command, achieving closed-loop error suppression and ensuring the stability of accuracy during long-term operation.

[0055] The motion interpolation algorithm converts the set trajectory parameters into motion commands for each axis, driving the axes to move in tandem. In this scheme, the arbitrary trajectory of the carrier disk in a plane parallel to the wafer surface is generated by the rotation of the first rotating shaft 411 and the second rotating shaft 421 through the linkage of the first swing arm 412 and the second swing arm 422, while the tilt angle is independently adjusted by the rotation drive mechanism 6. The interpolation algorithm can automatically calculate the rotation angle sequence of the two rotating shafts according to the set trajectory parameters, generate synchronous motion commands, and coordinate the movement of the self-rotation drive component 43 and the rotation drive mechanism 6, realizing multi-degree-of-freedom coordination of two-dimensional scanning, self-rotation, and tilting, ensuring that all parts of the sample 100 surface are uniformly exposed to the processing beam.

[0056] The algorithms for fixed geometric error compensation, dynamic non-geometric error compensation, and motion interpolation are all existing technologies and will not be elaborated upon here. This embodiment applies these algorithms to a sample surface treatment device to meet the requirements of ultra-high speed and ultra-high precision under different operating conditions.

[0057] The sample surface treatment equipment provided in this embodiment solves the problems of insufficient multi-axis linkage capability, low trajectory interpolation accuracy, and inability to compensate for errors in existing technologies. The four-axis linkage interpolation can flexibly realize complex process trajectories such as serpentine and circular patterns, adapting to various process requirements such as plasma and superatom beam polishing. The fully closed-loop feedback system compensates for reducer backlash and transmission errors in real time. Combined with a two-stage error compensation algorithm, it effectively eliminates the influence of geometric and non-geometric errors. For a sample 100 with a diameter of 300mm, the positioning accuracy can be stably achieved within ±0.1mm, meeting the requirements of ultra-high precision processes. At the same time, the error compensation algorithm can be dynamically adjusted according to changes in stroke and load to ensure accuracy stability under different working conditions.

[0058] The above description is only a preferred embodiment of the present invention. For those skilled in the art, there will be changes in the specific implementation and application scope based on the ideas of the present invention. The content of this specification should not be construed as a limitation of the present invention.

Claims

1. A sample surface treatment device, characterized in that, include: A process chamber (1) is used to perform surface treatment on a sample (100), the sample (100) being fixed to a carrier plate; The motion chamber (2) is rotatable relative to the process chamber (1), and at least one of the process chamber (1) and the motion chamber (2) has an independent vacuum system; The motion mechanism (4) is located in the motion chamber (2) and is used to drive the carrier disk to move in a plane parallel to the surface of the sample (100) and to drive the carrier disk to rotate. The motion mechanism (4) includes: A first drive assembly (41) and a second drive assembly (42). The first drive assembly (41) includes a first rotating shaft (411) and a first swing arm (412). The second drive assembly (42) includes a second rotating shaft (421) and a second swing arm (422). The first rotating shaft (411) is connected to and drives the first swing arm (412) to swing around a first axis. The second rotating shaft (421) is connected to and drives the second swing arm (422) to rotate around a second axis. The first axis and the second axis are parallel and spaced apart. The first swing arm (412) and the second swing arm (422) are linked to convert the rotational motion of the first rotating shaft (411) and the second rotating shaft (421) into two-dimensional planar movement of the bearing disk. The self-rotation drive assembly (43) is connected to the carrier disk and is used to drive the carrier disk to rotate about its own axis.

2. The sample surface treatment equipment according to claim 1, characterized in that, The first rotating shaft (411) and the second rotating shaft (421) are coaxially fitted and can rotate independently. The second rotating shaft (421) is rotatably fitted inside the first rotating shaft (411). The first rotating shaft (411) is rotatably sealed to the cavity wall of the motion chamber (2) through the first magnetic fluid seal (3). The axes of the first rotating shaft (411) and the second rotating shaft (421) constitute the first axis.

3. The sample surface treatment equipment according to claim 1, characterized in that, The first drive assembly (41) further includes a first motor (413), and the second drive assembly (42) further includes a second motor (423). The first motor (413) and the second motor (423) are both located outside the motion chamber (2). The first motor (413) is connected to one end of the first rotating shaft (411) located outside the motion chamber (2) through a first transmission assembly (414). The second motor (423) is connected to one end of the second rotating shaft (421) located outside the motion chamber (2) through a second transmission assembly (424).

4. The sample surface treatment equipment according to claim 3, characterized in that, The second drive assembly (42) further includes a connecting shaft (425) and a third transmission assembly (426). The second rotating shaft (421) is connected to the connecting shaft (425) through the third transmission assembly (426). The second swing arm (422) is fixed to the connecting shaft (425). The axis of the connecting shaft (425) constitutes the second axis.

5. The sample surface treatment equipment according to claim 4, characterized in that, The self-rotation drive assembly (43) includes a self-rotation motor (431), a self-rotation shaft, and a fourth transmission assembly (432). The self-rotation motor (431) is located in the motion chamber (2). The self-rotation shaft is coaxially sleeved in the connecting shaft (425) and can rotate relative to the connecting shaft (425). Both ends of the self-rotation shaft extend out of the connecting shaft (425), one end is connected to the self-rotation motor (431), and the other end is connected to the fourth transmission assembly (432). The end of the first swing arm (412) away from the first rotating shaft (411) is rotatably connected to the connecting shaft (425) or the self-rotating shaft.

6. The sample surface treatment apparatus according to any one of claims 1-5, characterized in that, The motion chamber (2) and the process chamber (1) are connected by a rotating through member (5), and a second magnetohydrodynamic seal is provided between the rotating through member (5) and the cavity wall of the process chamber (1).

7. The sample surface treatment equipment according to claim 6, characterized in that, It also includes a rotary drive mechanism (6), which is located outside the motion chamber (2) and connected to the rotary through member (5) for driving the rotary through member (5) to rotate the motion chamber (2); The rotary drive mechanism (6) includes a rotary motor (61) and a fifth transmission assembly (62), wherein the rotary motor (61) is connected to the rotary through member (5) via the fifth transmission assembly (62).

8. The sample surface treatment equipment according to claim 7, characterized in that, The rotary drive mechanism (6) further includes a brake (63), which is disposed on the fifth transmission assembly (62) and is used to brake the rotary through member (5).

9. The sample surface treatment equipment according to claim 7, characterized in that, Both the motion mechanism (4) and the rotary drive mechanism (6) are equipped with position detection components, which are used to detect the motion parameters of each axis.

10. The sample surface treatment equipment according to claim 9, characterized in that, It also includes a control unit, wherein the motion mechanism (4) and the rotation drive mechanism (6) are both electrically connected to the control unit, and the position detection element is communicatively connected to the control unit; The control unit is configured to have a built-in geometric error fixed compensation algorithm and a non-geometric error dynamic compensation algorithm. Based on the set trajectory parameters of the bearing disk, it controls the motion mechanism (4) and the rotary drive mechanism (6) to work together. Through the motion interpolation algorithm, the set trajectory parameters are converted into motion commands for each axis, driving each axis to move together.

11. The sample surface treatment apparatus according to any one of claims 1-5, characterized in that, The process chamber (1) is provided with a flow guide chamber (11), which is configured to guide and collect debris generated during the surface treatment of the sample (100).

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