Energy-saving low-emissivity glass and method for manufacturing the same
By optimizing the composite double silver coating structure of Low-E glass, the balance between visible light transmittance and infrared reflectance was solved, achieving a balance between high light transmittance and thermal insulation performance, simplifying the production process and improving the overall performance of the glass.
Patent Information
- Authority / Receiving Office
- CN · China
- Patent Type
- Applications(China)
- Current Assignee / Owner
- 江门市俊发安全玻璃有限公司
- Filing Date
- 2026-05-06
- Publication Date
- 2026-06-26
Smart Images
Figure CN122277129A_ABST
Abstract
Description
Technical Field
[0001] This invention relates to the technical field of special glass, and in particular to an energy-saving, low-emissivity glass and its preparation method. Background Technology
[0002] Low-emissivity glass, or Low-E glass for short, is an energy-saving glass with multiple layers of metal or other composite films coated on its surface. Most of these coatings or films use metallic silver as the core functional layer and have the characteristics of high visible light transmittance and high infrared reflectivity, which can effectively reduce the emissivity of the glass and achieve the effect of heat insulation.
[0003] In practical applications, Low-E glass, due to the fragility of its coating, is generally made into structures such as insulated glass or vacuum glass. However, whether it is insulated glass or vacuum glass, existing technologies still generally have the problem of balancing light transmittance and infrared reflection blocking. Taking single-silver Low-E insulated glass as an example, although its manufacturing process is simple, if it is to ensure that it can achieve a visible light transmittance of more than 70% to meet the indoor natural lighting needs, its coating needs to be thin. As a result, the infrared reflectance and ultraviolet blocking rate will be significantly reduced, and the shading coefficient will be too high. Similarly, if the shading coefficient is reduced and the heat insulation effect is enhanced by optimizing the coating structure, this will lead to the sacrifice of visible light transmittance, and the overall glass will be darker and grayer, which will directly affect the indoor light transmission effect. While double-silver and triple-silver Low-E insulated glass or vacuum glass can partially alleviate this contradiction, the requirements for coating precision, matching between coating layers, and overall glass production process stability increase exponentially with the increase in the number of coating layers. This not only raises production costs but also complicates the production process, easily leading to a lower yield of the final product and making it difficult to achieve large-scale mass production.
[0004] It is evident that, limited by the shortcomings of existing technologies and production processes, the current application of Low-E glass is difficult to adapt to increasingly stringent building energy efficiency standards and indoor lighting requirements. Therefore, developing a Low-E glass and its products that can balance the relationship between visible light transmittance and reflectance, achieve a balance between light transmission and heat insulation performance, and has a simple production process has become one of the technical challenges that urgently need to be solved in this industry. Summary of the Invention
[0005] To further balance the relationship between visible light transmittance and reflectance in Low-E glass, and to achieve a balance between light transmission and heat insulation performance, this application provides an energy-saving low-emissivity glass and its preparation method.
[0006] Firstly, the energy-saving, low-emissivity glass provided in this application adopts the following technical solution: An energy-saving, low-emissivity glass includes a first glass, which comprises a first glass substrate and a composite double-silver coating. The composite double-silver coating is disposed on one side surface of the first glass substrate, and the composite double-silver coating, from the inside to the outside of the surface of the first glass substrate, consists of the following: The substrate layer is composed of TiSiOx; A first dielectric layer, wherein the first dielectric layer is composed of ZnAlOx; The first functional layer is composed of pure silver or a silver-based alloy. The first protective layer is composed of NiCrNx; The second functional layer is composed of TiNbOx; The second dielectric layer is composed of ZnAlOx; The third functional layer is composed of pure silver or a silver-based alloy. The second protective layer is composed of NiCrNx; The third dielectric layer is composed of NbSiN; The third protective layer is composed of a composite coating formed by the co-deposition of MgF2 and ZrO2.
[0007] By adopting the above technical solution, a TiNbOx coating is added as a second functional layer in the first and third functional layers. This not only allows the characteristics of the TiNbOx coating to work synergistically with the dielectric layer to block the interdiffusion of silver atoms between the two silver layers, ensuring the independent infrared reflection performance of each silver layer and achieving the superposition of infrared reflection blocking effects, but also optimizes the refractive index gradient between the two silver layers. This further offsets the absorption and reflection consumption of visible light by the two silver layers, improving the visible light transmittance of the prepared double-silver Low-E glass. Consequently, it effectively balances the relationship between visible light transmittance and reflection blocking rate in Low-E glass, and enables the final Low-E insulated glass or Low-E vacuum glass to achieve a balance between light transmission and heat insulation performance.
[0008] Optionally, the thickness of the first functional layer is 6-10 nm, the thickness of the second functional layer is 8-20 nm, and the thickness of the third functional layer is 10-16 nm.
[0009] By adopting the above technical solution, the infrared reflectivity of the composite double silver coating can be maximized to ensure the excellent thermal insulation performance of the glass, while the second functional layer can work together to maintain a high visible light transmittance, achieving a balance between light transmission and thermal insulation performance. In addition, the internal stress of the inner film layer at this thickness is small, and the resulting coating adheres firmly, which is conducive to adapting to the high-temperature environment of subsequent glass tempering treatment and is less likely to cause film damage or performance degradation.
[0010] Optionally, the second functional layer is formed by sputter deposition of a niobium-doped titanium dioxide ceramic target, wherein the niobium doping amount of the niobium-doped titanium dioxide ceramic target is 5-20 at.
[0011] By employing the above technical solution, the structural integrity, refractive index, and optical properties of the second functional layer can be precisely controlled through niobium atom doping. This optimizes the compactness and flatness of the second functional layer, not only enhancing its UV blocking ability but also improving the adhesion between the second functional layer and adjacent coatings, reducing interface defects. Furthermore, niobium atom doping improves the temperature and weather resistance of the second functional layer, enabling it to withstand the high-temperature environment of subsequent glass tempering and ensuring the consistency of the coating's performance before and after tempering.
[0012] Optionally, the first functional layer is formed by sputtering deposition of a pure silver target; the third functional layer is formed by sputtering deposition of a silver-based alloy, wherein the silver-based alloy is doped with at least one of palladium, copper, and platinum, and the doping amount of the dopant element is 0.1-1 at.
[0013] By adopting the above technical solution, maintaining the first functional layer as a pure silver target for sputtering deposition helps ensure that the first functional layer has good conductivity and stable optical constants, providing a pure and predictable color-matching substrate for subsequent coatings, thus enabling precise optical interference control. Secondly, using a silver-based alloy for deposition can improve the heat resistance, oxidation resistance, and sulfidation resistance of the third functional layer while maintaining its excellent optical performance. Furthermore, because the third functional layer is relatively thick and close to the outer layer, it can work synergistically with the outermost coatings to improve the overall reliability and weather resistance of the coating.
[0014] Optionally, the thickness of the first protective layer and the second protective layer is 0.5-4 nm.
[0015] By adopting the above technical solution, within this thickness range, the first protective layer and the second protective layer can form a continuous and dense protective layer, which can effectively prevent the silver layer in the lower first and third functional layers from being oxidized during the next plating layer. At the same time, it can also reduce the absorption and blocking of visible light by the first and second protective layers, avoiding adverse effects on the visible light transmittance and color of the glass.
[0016] Optionally, both the first protective layer and the second protective layer are formed by sputtering deposition of a nickel-chromium alloy target under an argon-nitrogen atmosphere, wherein the nickel content in the nickel-chromium alloy target is 78-90% and the chromium content is 10-22%.
[0017] By adopting the above technical solution, the formed NiCrNx coating has moderate hardness, strong chemical inertness, and excellent high temperature resistance, corrosion resistance, and abrasion resistance. It can effectively protect the first and second functional layers in all aspects, not only preventing the first and second functional layers from being oxidized when the next coating layer is applied, but also not affecting the overall light transmittance and appearance of the subsequent glass.
[0018] Optionally, it also includes a second glass, with the first glass and the second glass arranged side by side, the composite double silver plating layer located on the side of the first glass facing the second glass, and a sealed cavity layer formed between the first glass and the second glass.
[0019] By adopting the above technical solution and using the finished structure of double glass combined with a cavity layer, the composite double silver coating can be well protected, achieving the long-term use effect of Low-E glass. Moreover, whether it is subsequently made into insulated glass or vacuum glass, it has good heat insulation and sound insulation effects, meeting the multiple needs of building energy conservation and safety protection.
[0020] Optionally, the thickness of the cavity layer is 6-16 mm, and the cavity layer is filled with argon or a mixture of argon and krypton, with a gas filling rate of ≥95%.
[0021] Optionally, the thickness of the cavity layer is 0.5-2mm, the cavity layer is vacuum-sealed, and a support is provided on the side of the second glass facing the first glass.
[0022] By adopting the above technical solutions, it is possible to enable energy-saving and low-emissivity glass to meet the needs of different application scenarios.
[0023] Secondly, the method for preparing energy-saving, low-emissivity glass provided in this application adopts the following technical solution: A method for preparing energy-saving, low-emissivity glass includes the following steps: S1. The first glass substrate is cleaned and dried, and placed offline in a vacuum magnetron sputtering chamber. A base layer, a first dielectric layer, a first functional layer, a first protective layer, a second functional layer, a second dielectric layer, a third functional layer, a second protective layer, a third dielectric layer, and a third protective layer are sequentially deposited on one side surface of the first glass substrate by magnetron sputtering. After cleaning and drying again, the substrate is tempered to obtain the first glass. S2. The second glass is cleaned, dried and tempered as required. Then, the first and second glass are joined together using spacers, butyl rubber, structural adhesive, etc. Then, depending on whether the finished product is insulated glass or vacuum glass, it is treated and sealed accordingly to obtain the energy-saving low-emissivity glass.
[0024] By adopting the above technical solution, the overall preparation process can be carried out by continuous sputtering deposition in a vacuum magnetron sputtering chamber. The process is relatively simple, avoiding the need to constantly transfer equipment due to different processes when multilayer coating is used. This reduces the complexity of multilayer coating technology, which is conducive to improving the production yield and realizing large-scale mass production.
[0025] In summary, the technical solution of this application has at least one of the following beneficial effects: 1. By optimizing the coating structure and material selection, the relationship between visible light transmittance and infrared reflectance can be effectively balanced, enabling the glass to maintain high light transmittance while possessing excellent heat insulation performance.
[0026] 2. By introducing TiNbOx as a second functional layer, not only is the independence between the two silver layers enhanced, but the overall weather resistance and optical performance of the coating are also improved, providing greater stability for subsequent processes.
[0027] 3. By using NiCrNx deposited under an argon-nitrogen atmosphere as the first and second protective layers, the oxidation resistance of the first and second functional layers during high-temperature processing and long-term use is ensured, while the impact on visible light transmittance is minimized. Attached Figure Description
[0028] Figure 1 This is a cross-sectional view of an energy-saving, low-emissivity glass according to Embodiment 1 of this application.
[0029] Figure 2 This is a cross-sectional view of the first glass in Embodiment 1 of this application, which is an energy-saving, low-emissivity glass.
[0030] Explanation of reference numerals in the attached figures: 1. First glass; 11. First glass substrate; 12. Composite double silver plating layer; 120. Base layer; 121. First dielectric layer; 122. First functional layer; 123. First protective layer; 124. Second functional layer; 125. Second dielectric layer; 126. Third functional layer; 127. Second protective layer; 128. Third dielectric layer; 129. Third protective layer; 2. Second glass; 3. Cavity layer. Detailed Implementation
[0031] The present application will be further described in detail below with reference to the accompanying drawings, embodiments and comparative examples. Example
[0032]
Example 1
[0033] In this embodiment, both the first glass substrate 11 and the second glass substrate 2 are made of ultra-clear glass with a thickness of 6 mm. The cavity layer 3 has a thickness of 12 mm and is filled with argon gas with a filling rate of ≥95%.
[0034] In this embodiment, the composite double silver plating layer 12, from the inside to the outside of the surface of the first glass substrate 11, consists of a base layer 120, a first dielectric layer 121, a first functional layer 122, a first protective layer 123, a second functional layer 124, a second dielectric layer 125, a third functional layer 126, a second protective layer 127, a third dielectric layer 128, and a third protective layer 129. Specifically, the material, thickness, and formation process of each layer are as follows: The substrate 120 is a 20nm TiSiOx coating, which is formed by mid-frequency reactive sputtering deposition of a titanium-silicon alloy target in an argon-oxygen atmosphere. The titanium-silicon alloy target contains 85% titanium and 15% silicon, and the flow ratio of argon to oxygen in the argon-oxygen atmosphere is 75:25.
[0035] The first dielectric layer 121 is an 18nm ZnAlOx coating, specifically formed by mid-frequency reactive sputtering deposition of a zinc-aluminum alloy target in an argon-oxygen atmosphere. The zinc-aluminum alloy target has an aluminum content of 98% and a zinc content of 2%, and the flow ratio of argon to oxygen in the argon-oxygen atmosphere is 82:18.
[0036] The first functional layer 122 is an 8nm silver plating layer, which is specifically formed by DC sputtering of a pure silver target in a pure argon atmosphere.
[0037] The first protective layer 123 is a 2nm NiCrNx coating, specifically formed by mid-frequency reactive sputtering deposition of a nickel-chromium alloy target in an argon-nitrogen atmosphere. The nickel-chromium alloy target contains 80% nickel and 20% chromium, and the flow ratio of argon to nitrogen in the argon-nitrogen atmosphere is 65:35.
[0038] The second functional layer 124 is an 18nm TiNbOx coating, specifically formed by mid-frequency reactive sputtering deposition of a titanium dioxide-doped niobium ceramic target in an argon-oxygen atmosphere. The titanium dioxide-doped niobium ceramic target contains 92% titanium dioxide and 8% niobium, and the flow ratio of argon to oxygen in the argon-oxygen atmosphere is 90:10.
[0039] The second dielectric layer 125 is a 20nm ZnAlOx coating, and the specific deposition process is the same as that of the first dielectric layer 121.
[0040] The third functional layer 126 is a 12nm silver plating layer, and the specific deposition process is the same as that of the first functional layer 122.
[0041] The second protective layer 127 is a 2nm NiCrNx coating, and the specific deposition process is the same as that of the first protective layer 123.
[0042] The third dielectric layer 128 is a 25nm NbSiNx coating, specifically formed by mid-frequency reactive sputtering deposition of a niobium-silicon alloy target in an argon-nitrogen atmosphere. The niobium content in the nickel-chromium alloy target is 85%, the silicon content is 15%, and the flow ratio of argon to nitrogen in the argon-nitrogen atmosphere is 75:25.
[0043] The third protective layer 129 is a 30nm MgF2 and ZrO2 composite coating, specifically formed by sequentially stacking and sputtering magnesium fluoride target and zirconium oxide target in a pure argon atmosphere, with each sublayer having a sputtering thickness of 2nm.
[0044] A method for preparing energy-saving, low-emissivity glass includes the following steps: S1. The first glass substrate 11 is cleaned and dried, and placed offline in a vacuum magnetron sputtering chamber. A base layer 120, a first dielectric layer 121, a first functional layer 122, a first protective layer 123, a second functional layer 124, a second dielectric layer 125, a third functional layer 126, a second protective layer 127, a third dielectric layer 128, and a third protective layer 129 are sequentially deposited on one side surface of the first glass substrate 11 by magnetron sputtering. After cleaning and drying again, the substrate is tempered to obtain the first glass 1. S2. Clean, dry and temper the second glass 2 as required. Use aluminum spacers, butyl rubber, structural adhesive and other materials to join the first glass 1 and the second glass 2 together, inflate and seal to obtain the energy-saving low-emissivity glass.
[0045]
Example 2
[0046] In this embodiment, the cavity layer 3 has a thickness of 1 mm and is set under vacuum. A support, specifically a 1 mm thick high borosilicate glass microsphere, is fixedly disposed on the side of the second glass 2 facing the first glass 1.
[0047] In this embodiment, the composite double silver plating layer 12 of the first glass 1, from the inside to the outside of the surface of the first glass substrate 11, consists of a base layer 120, a first dielectric layer 121, a first functional layer 122, a first protective layer 123, a second functional layer 124, a second dielectric layer 125, a third functional layer 126, a second protective layer 127, a third dielectric layer 128, and a third protective layer 129. Specifically, the material, thickness, and formation process of each layer are as follows: The substrate 120 is a 20nm TiSiOx coating, which is formed by mid-frequency reactive sputtering deposition of a titanium-silicon alloy target in an argon-oxygen atmosphere. The titanium-silicon alloy target contains 85% titanium and 15% silicon, and the flow ratio of argon to oxygen in the argon-oxygen atmosphere is 75:25.
[0048] The first dielectric layer 121 is a 15nm ZnAlOx coating, specifically formed by medium-frequency reactive sputtering deposition of a zinc-aluminum alloy target in an argon-oxygen atmosphere. The zinc-aluminum alloy target has an aluminum content of 98% and a zinc content of 2%, and the flow ratio of argon to oxygen in the argon-oxygen atmosphere is 82:18.
[0049] The first functional layer 122 is a 10nm silver plating layer, which is specifically formed by DC sputtering of a pure silver target in a pure argon atmosphere.
[0050] The first protective layer 123 is a 2nm NiCrNx coating, specifically formed by mid-frequency reactive sputtering deposition of a nickel-chromium alloy target in an argon-nitrogen atmosphere. The nickel-chromium alloy target contains 90% nickel and 10% chromium, and the flow ratio of argon to nitrogen in the argon-nitrogen atmosphere is 75:25.
[0051] The second functional layer 124 is a 25nm TiNbOx coating, specifically formed by mid-frequency reactive sputtering deposition of a titanium dioxide-doped niobium ceramic target in an argon-oxygen atmosphere. The titanium dioxide-doped niobium ceramic target contains 88% titanium dioxide and 12% niobium, and the flow ratio of argon to oxygen in the argon-oxygen atmosphere is 90:10.
[0052] The second dielectric layer 125 is a 16nm ZnAlOx coating, and the specific deposition process is the same as that of the first dielectric layer 121.
[0053] The third functional layer 126 is a 14nm silver-based alloy coating, which is specifically formed by DC sputtering of a silver-palladium target in a pure argon atmosphere, wherein the palladium content in the silver-palladium target is 0.5%.
[0054] The second protective layer 127 is a 3nm NiCrNx coating, and the specific deposition process is the same as that of the first protective layer 123.
[0055] The third dielectric layer 128 is a 25nm NbSiNx coating, specifically formed by mid-frequency reactive sputtering deposition of a niobium-silicon alloy target in an argon-nitrogen atmosphere. The niobium content in the nickel-chromium alloy target is 85%, the silicon content is 15%, and the flow ratio of argon to nitrogen in the argon-nitrogen atmosphere is 75:25.
[0056] The third protective layer 129 is a 24nm MgF2 and ZrO2 composite coating, specifically formed by sequentially stacking and sputtering magnesium fluoride target and zirconium oxide target in a pure argon atmosphere, with each sublayer having a sputtering thickness of 2nm.
[0057] A method for preparing energy-saving, low-emissivity glass includes the following steps: S1. The first glass substrate 11 is cleaned and dried, and placed offline in a vacuum magnetron sputtering chamber. A base layer 120, a first dielectric layer 121, a first functional layer 122, a first protective layer 123, a second functional layer 124, a second dielectric layer 125, a third functional layer 126, a second protective layer 127, a third dielectric layer 128, and a third protective layer 129 are sequentially deposited on one side surface of the first glass substrate 11 by magnetron sputtering. After cleaning and drying again, the substrate is tempered to obtain the first glass 1. S2. Clean, dry and temper the second glass 2 as required. Use aluminum spacers, butyl rubber, structural adhesive and other materials to join the first glass 1 and the second glass 2 together. Before joining, place high borosilicate glass microspheres on the side of the second glass 2 facing the first glass 1 as a support. After joining, vacuum and seal to obtain the energy-saving low-emissivity glass.
[0058]
Example 3
[0059] In this embodiment, the third functional layer 126 is a 12nm silver-based alloy coating, specifically formed by DC sputtering of a silver-palladium target in a pure argon atmosphere, wherein the palladium content in the silver-palladium target is 0.5%.
[0060]
Example 4
[0061] In this embodiment, the first functional layer 122 is an 8nm silver-based alloy coating, specifically formed by DC sputtering of a silver-palladium target in a pure argon atmosphere, wherein the palladium content in the silver-palladium target is 0.5%.
[0062] The third functional layer 126 is a 12nm silver-based alloy coating, which is specifically formed by DC sputtering of a silver-palladium target in a pure argon atmosphere, wherein the palladium content in the silver-palladium target is 0.5%. Comparative Example
[0063] Comparative Example 1 An insulating glass unit, which differs from [Example 1] in that the first glass 1 is different.
[0064] In this comparative example, commercially available 6mm single-silver Low-E glass was used as the first glass 1. Specifically, the single-silver Low-E glass was purchased from Hainan Huabo.
[0065] Comparative Example 2 An insulating glass unit, which differs from [Example 1] in that the first glass 1 is different.
[0066] In this comparative example, commercially available 6mm double-silver Low-E glass was used as the first glass 1. Specifically, the double-silver Low-E glass was purchased from Hainan Huabo.
[0067] Comparative Example 3 An energy-saving, low-emissivity glass differs from [Example 1] in that the first glass 1 is different; specifically, the composite double silver plating layer 12 of the first glass 1 does not have a second functional layer 124.
[0068] In this comparative example, a second dielectric layer 125 is directly deposited on the surface of the first protective layer 123, wherein the thickness of the second dielectric layer 125 is 38 nm, and the remaining coatings and their deposition processes remain unchanged. Performance testing
[0069] Visible light transmittance and ultraviolet transmittance: The tests were conducted in accordance with GB / T 2680-2021 Determination of visible light transmittance, direct solar transmittance, total solar transmittance, ultraviolet transmittance and related window glass parameters of architectural glass, and the visible light transmittance (%) and ultraviolet transmittance (%) of each example and comparative example were recorded.
[0070] Thermal conductivity: The test shall be conducted in accordance with GB / T 22476-2008 Calculation and determination of steady-state U-value (heat transfer coefficient) of insulating glass or JC / T 2708-2022 Test method for heat transfer coefficient of vacuum glass. The corresponding standard shall be selected for testing according to the state of the final product, and the thermal conductivity of each embodiment and comparative example shall be recorded.
[0071] Table 1. Partial performance test data of finished glass
[0072] Based on Example 1 and Comparative Examples 1-3, and the data in Table 1, it can be seen that the single-piece double-silver Low-E glass prepared by the coating scheme of this application, under the same insulated glass manufacturing process, can significantly improve the visible light transmittance of the final insulated glass product compared with single-silver or double-silver Low-E glass on the market. At the same time, it can further reduce the ultraviolet transmittance and thermal conductivity of the overall insulated glass, achieving the effect of energy saving and low radiation.
[0073] As can be seen from Example 1 and Comparative Example 3, by adding a TiNbOx coating as a second functional layer 124 to the first functional layer 122 and the third functional layer 126 of the composite double silver coating 12, it is equivalent to adding an additional coating to the two silver coatings of conventional double silver Low-E glass. While keeping the distance between the two silver coatings unchanged, the visible light transmittance of the glass can be further improved, the ultraviolet transmittance and the heat transfer coefficient can be reduced, thus achieving coating optimization for double silver Low-E glass. This may be because the added TiNbOx coating is an amorphous dense oxide layer, which can form an atomic diffusion barrier. It works in conjunction with the ZnAlOx dielectric layer to block the mutual diffusion of silver atoms in the first functional layer 122 and the third functional layer 126, ensuring the independent infrared reflection performance of the double silver layer and achieving the superposition of reflection blocking effects. Secondly, the refractive index of the TiNbOx coating is between that of the silver coating and the ZnAlOx dielectric layer. Compared with the ZnAlOx dielectric layer of equal thickness, the added TiNbOx coating can further optimize the refractive index gradient between the double silver layers. The interference effect generated by the refractive index change can offset the absorption and reflection loss of visible light by the double silver layer, thereby improving the visible light transmittance of the entire coating and achieving a balanced synergy of high light transmittance and high heat insulation performance.
[0074] Based on the data from Examples 1 and 2 and Table 1, it can be seen that the single-piece double-silver Low-E glass prepared by the coating scheme of this application can be made into insulated glass or vacuum glass through subsequent processing, and has little impact on the overall light transmittance.
[0075] Based on the data from Examples 1 and 3-4 and Table 1, it can be seen that adding a very small amount of palladium to the target material of the first functional layer 122 or the third functional layer 126 does not affect the overall transmittance and reflectance of the glass. However, since the alloy coating can effectively suppress the migration of silver atoms and resist sulfidation, it can slow down the migration and sulfidation of the silver layer in the continuous coating process. This is beneficial to optimizing the production process of double silver Low-E glass, improving the fault tolerance of the production process, and also to improving the durability and reliability of the first functional layer 122 and the third functional layer 126, achieving a stable silver coating and stable performance of the optical effect of the double silver layer.
[0076] This specific embodiment is merely an explanation of this application and is not intended to limit it. After reading this specification, those skilled in the art can make modifications to this specific embodiment without contributing any inventive step, but such modifications are protected by patent law as long as they fall within the scope of the claims of this application.
Claims
1. An energy-saving, low-emissivity glass, characterized in that: The first glass (1) includes a first glass substrate (11) and a composite double silver plating layer (12). The composite double silver plating layer (12) is disposed on one side surface of the first glass substrate (11), and the composite double silver plating layer (12) is arranged from the inside to the outside of the surface of the first glass substrate (11) as follows: A substrate layer (120) is composed of TiSiOx; The first dielectric layer (121) is composed of ZnAlOx; The first functional layer (122) is made of pure silver or a silver-based alloy; The first protective layer (123) is composed of NiCrNx; The second functional layer (124) is composed of TiNbOx; The second dielectric layer (125) is composed of ZnAlOx; The third functional layer (126) is composed of pure silver or a silver-based alloy; The second protective layer (127) is composed of NiCrNx; The third dielectric layer (128) is composed of NbSiN; The third protective layer (129) is composed of a composite coating formed by the co-deposition of MgF2 and ZrO2.
2. The energy-saving, low-emissivity glass according to claim 1, characterized in that: The thickness of the first functional layer (122) is 6-10 nm, the thickness of the second functional layer (124) is 8-20 nm, and the thickness of the third functional layer (126) is 10-16 nm.
3. The energy-saving, low-emissivity glass according to claim 2, characterized in that: The second functional layer (124) is formed by sputter deposition of a titanium dioxide-doped niobium ceramic target, wherein the titanium dioxide content in the titanium dioxide-doped niobium ceramic target is 80-95% and the niobium content is 5-20%.
4. The energy-saving, low-emissivity glass according to claim 2, characterized in that: The first functional layer (122) is formed by sputtering deposition of pure silver target material; the third functional layer (126) is formed by sputtering deposition of silver-based alloy, wherein the silver-based alloy is doped with at least one of palladium, copper and platinum, and the content of the doping element is 0.1-1%.
5. The energy-saving, low-emissivity glass according to claim 1, characterized in that: The thickness of the first protective layer (123) and the second protective layer (127) is 0.5-4nm.
6. The energy-saving, low-emissivity glass according to claim 5, characterized in that: Both the first protective layer (123) and the second protective layer (127) are formed by sputtering deposition of nickel-chromium alloy target material under an argon-nitrogen atmosphere, wherein the nickel content in the nickel-chromium alloy target is 78-90% and the chromium content is 10-22%.
7. An energy-saving, low-emissivity glass according to any one of claims 1-6, characterized in that: It also includes a second glass (2), the first glass (1) and the second glass (2) are arranged side by side, the composite double silver plating layer (12) is located on the side of the first glass (1) facing the second glass (2), and a sealed cavity layer (3) is formed between the first glass (1) and the second glass (2).
8. The energy-saving, low-emissivity glass according to claim 7, characterized in that: The cavity layer (3) has a thickness of 6-16 mm and is filled with argon or a mixture of argon and krypton, with a gas filling rate of ≥95%.
9. The energy-saving, low-emissivity glass according to claim 7, characterized in that: The cavity layer (3) has a thickness of 0.5-2 mm. The cavity layer (3) is vacuum-set, and the second glass (2) has a support on the side facing the first glass (1).
10. A method for preparing energy-saving low-emissivity glass, used to prepare the energy-saving low-emissivity glass as described in any one of claims 7-9, characterized in that: Includes the following steps: S1. The first glass substrate (11) is cleaned and dried, and placed offline in a vacuum magnetron sputtering chamber. A base layer (120), a first dielectric layer (121), a first functional layer (122), a first protective layer (123), a second functional layer (124), a second dielectric layer (125), a third functional layer (126), a second protective layer (127), a third dielectric layer (128), and a third protective layer (129) are sequentially deposited on one side surface of the first glass substrate (11) by magnetron sputtering. After cleaning and drying again, the substrate is tempered to obtain the first glass (1). S2. The second glass (2) is washed, dried and tempered as required. Then, the first glass (1) and the second glass (2) are joined together using spacers, butyl rubber, structural adhesive and the like. Then, depending on whether the finished product is insulated glass or vacuum glass, it is treated accordingly and sealed to obtain the energy-saving low-radiation glass.