Capacitor appearance defect detection method and device, and electronic equipment
By acquiring multiple images of the capacitor's side, extracting edges, and constructing a depth information map, the problems of high data processing burden and low detection accuracy in existing capacitor appearance inspection are solved, achieving efficient and accurate defect detection.
CN122415550APending Publication Date: 2026-07-17SHENZHEN XINYICHANG TECH CO LTD
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Patent Information
- Authority / Receiving Office
- CN · China
- Patent Type
- Applications(China)
- Current Assignee / Owner
- SHENZHEN XINYICHANG TECH CO LTD
- Filing Date
- 2026-04-24
- Publication Date
- 2026-07-17
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Figure CN122415550A_ABST
Abstract
本申请适用于电容检测技术领域,提供了一种电容外观缺陷检测方法、装置及电子设备,所述方法包括:获取电容在不同周向位置下的多张侧面图像,各所述侧面图像沿轴向覆盖所述电容侧壁的检测高度,沿周向覆盖所述电容侧面的部分弧面;提取各所述侧面图像中电容侧壁的目标边缘;基于各所述侧面图像中的目标边缘相对于拟合基准线的偏差数据,确定各所述周向位置对应的轮廓数据;根据各所述周向位置对应的轮廓数据构建所述电容侧面的深度信息图;基于所述深度信息图对所述电容侧面进行缺陷检测,得到缺陷检测结果。上述方案能够在降低检测数据量的同时,提高电容外观缺陷检测的准确性和效率。
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