A method for improving snow cover fraction in Noah-MP land surface process model considering terrain effect

Abstract

This invention discloses a method for improving snow cover in the Noah-MP land surface process model considering topographic effects. The method includes: calculating topographic factors within the study area based on digital elevation model data, including a slope-aspect composite factor, a topographic shading factor, and an altitude correction factor; calculating a comprehensive topographic influence factor and a topographic enhancement factor based on the topographic factors; dynamically calculating the critical snow depth using the comprehensive topographic influence factor to obtain a dynamic critical snow depth; calculating a baseline snow cover using the dynamic critical snow depth; and then enhancing and correcting the baseline snow cover using the topographic enhancement factor to obtain a topographically sensitive snow cover. This invention significantly improves the model's simulation performance in complex terrain areas by coupling multi-source topographic factors, dynamically adjusting the critical snow depth, and correcting the snow cover, while simultaneously feeding the improved snow cover back into albedo and radiation calculations.

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