Color film substrate, display panel and projector

Abstract

The utility model discloses a color film substrate, a display panel and a projector, and relates to the technical field of display. The color film substrate is provided with a light incident surface, the color film substrate comprises a substrate body, a shielding layer and a light filtering layer, the shielding layer and the light filtering layer are arranged on the substrate body in a stacked mode, the shielding layer is located on the side, close to the light incident surface, of the light filtering layer, and the shielding layer is used for forming a plurality of light transmitting areas; orthographic projections of the light filtering layer and the light transmitting area on the substrate body are overlapped; wherein the shielding layer can reflect visible light incident on the shielding layer, and the main body material of the shielding layer is metal.

Description

Technical Field

[0001] The present disclosure relates to the field of display technology, and in particular to a color film substrate, a display panel and a projector. Background Art

[0002] Liquid Crystal Display (LCD) projectors are widely used due to their high cost-effectiveness. In existing single-chip LCD projectors, the light emitted by the light source is reflected by the reflective cup, converted into parallel light by the rear Fresnel mirror, irradiates the LCD display, and then is focused by the front Fresnel mirror and irradiates the screen through the lens to form an image.

[0003] With the development of technology, users have higher and higher demands on projector performance, especially for display effects and product life. Improving product performance is imminent. Utility Model Content

[0004] The present disclosure provides a color film substrate having a light incident surface, the color film substrate comprising:

[0005] A base substrate, and a shielding layer and a filter layer stacked on the base substrate, wherein the shielding layer is located on a side of the filter layer close to the light incident surface, the shielding layer is used to form a plurality of light-transmitting areas, and the filter layer overlaps with the orthographic projection of the light-transmitting area on the base substrate;

[0006] The shielding layer can reflect visible light incident on the shielding layer, and the main material of the shielding layer is metal.

[0007] In some embodiments, the shielding layer and the filter layer are located on the same side of the base substrate, and the shielding layer is located between the base substrate and the filter layer.

[0008] In some embodiments, the shielding layer and the filter layer are located on different sides of the base substrate.

[0009] In some embodiments, the color filter substrate further includes:

[0010] The transparent electrode layer is located on a side of the shielding layer away from the base substrate, and the orthographic projection of the transparent electrode layer on the base substrate overlaps with the orthographic projection of the shielding layer on the base substrate.

[0011] In some embodiments, the shielding layer includes a plurality of first shielding strips extending along a first direction and separated from each other, and a plurality of second shielding strips extending along a second direction and separated from each other, and the first shielding strips and the second shielding strips intersect with each other to form the light-transmitting area;

[0012] The filter layer includes a plurality of first filter patterns located in different light-transmitting areas, and the orthographic projections of the first filter patterns on the base substrate cover the orthographic projections of the light-transmitting areas on the base substrate.

[0013] In some embodiments, the shielding layer includes a plurality of third shielding strips extending along the first direction and separated from each other, a gap between two adjacent third shielding strips forms the light-transmitting area, and the light-transmitting area includes a plurality of sub-pixels arranged along the first direction;

[0014] The filter layer includes a plurality of second filter patterns located at different sub-pixels, wherein the orthographic projections of the second filter patterns on the base substrate cover the orthographic projections of the sub-pixels on the base substrate, and the orthographic projections of the edges of two filter patterns adjacent to each other in the first direction on the base substrate overlap with each other.

[0015] In some embodiments, the shielding layer includes: a metal layer, and at least one of the following:

[0016] a buffer layer, stacked between the metal layer and the base substrate, wherein the thickness of the buffer layer is less than or equal to the thickness of the metal layer; and

[0017] The protective layer is stacked on a side of the metal layer away from the base substrate, and the thickness of the protective layer is less than the thickness of the metal layer.

[0018] In some embodiments, the reflectivity of the shielding layer to visible light is greater than or equal to 90%.

[0019] The present disclosure provides a display panel, comprising:

[0020] A color film substrate as described in any embodiment;

[0021] an array substrate, arranged opposite to the color filter substrate, wherein the filter layer is located on a side of the base substrate close to the array substrate; and

[0022] The liquid crystal layer is filled between the color filter substrate and the array substrate.

[0023] The present disclosure provides a projector, comprising:

[0024] The display panel as described in any one of the embodiments; and

[0025] A light source is located on a side of the color filter substrate away from the array substrate, and a light incident surface of the color filter substrate faces the light source, and the light source is used to provide incident light to the display panel.

[0026] The above description is only an overview of the technical solution of the present disclosure. In order to more clearly understand the technical means of the present disclosure, it can be implemented according to the contents of the specification. In order to make the above and other purposes, features and advantages of the present disclosure more obvious and easy to understand, the specific implementation methods of the present disclosure are listed below. BRIEF DESCRIPTION OF THE DRAWINGS

[0027] In order to more clearly illustrate the technical solutions in the embodiments of the present disclosure or related technologies, the following is a brief introduction to the drawings required for use in the embodiments or related technical descriptions. Obviously, the drawings described below are some embodiments of the present disclosure. For ordinary technicians in this field, other drawings can be obtained based on these drawings without creative work. It should be noted that the proportions in the drawings are only for illustration and do not represent the actual proportions.

[0028] Figure 1 The cross-sectional structure diagram of the first color filter substrate provided by the present disclosure is exemplarily shown;

[0029] Figure 2 The cross-sectional structure diagram of the second color filter substrate provided by the present disclosure is exemplarily shown;

[0030] Figure 3 The schematic diagram of the planar structure of the first shielding layer is shown exemplarily;

[0031] Figure 4a A schematic diagram of the planar structure of the second shielding layer is shown exemplarily;

[0032] Figure 4b The schematic cross-sectional structure diagram of the color filter substrate including the second shielding layer along AA' is exemplarily shown;

[0033] Figure 5 A schematic diagram of a cross-sectional structure of a shielding layer is exemplarily shown;

[0034] Figure 6 The cross-sectional structure diagram of the first display panel is exemplarily shown;

[0035] Figure 7 The cross-sectional structure diagram of the second display panel is exemplarily shown;

[0036] Figure 8 A structural schematic diagram of a projector is exemplarily shown. DETAILED DESCRIPTION

[0037] In order to make the purpose, technical solution and advantages of the embodiments of the present disclosure clearer, the technical solution in the embodiments of the present disclosure will be clearly and completely described below in conjunction with the drawings in the embodiments of the present disclosure. Obviously, the described embodiments are part of the embodiments of the present disclosure, not all of the embodiments. Based on the embodiments in the present disclosure, all other embodiments obtained by ordinary technicians in this field without creative work are within the scope of protection of the present disclosure.

[0038] The LCD display panel includes an array substrate and a color film substrate that are arranged relatively to each other. Considering that the switching characteristics of the thin film transistors in the array substrate are easily affected by light, in a projector, the color film substrate is generally arranged to face the light source to avoid strong light on the array substrate. Therefore, the color film substrate becomes the directly heated surface.

[0039] In the related art, the black matrix (BM) in the color film substrate that plays a shading role is generally made of carbon black polypropylene resin materials. Carbon black polypropylene resin materials absorb nearly 100% of light, and the heat absorption causes the display panel to accumulate heat quickly, resulting in a significant shortening of the life of the display panel.

[0040] In order to solve the above problems, the present disclosure provides a color filter substrate having a light incident surface S0. Figure 1 or Figure 2 As shown, the color filter substrate includes: a base substrate 10, and a shielding layer 11 and a filter layer 12 stacked on the base substrate 10, the shielding layer 11 is located on the side of the filter layer 12 close to the light incident surface S0, the shielding layer 11 is used to form a plurality of light transmission areas TRA, and the filter layer 12 overlaps with the light transmission area TRA in the orthographic projection on the base substrate 10. The shielding layer 11 can reflect the visible light incident on the shielding layer 11, and the main material of the shielding layer 11 is metal, such as Ag, Al and other metal materials.

[0041] like Figure 1 and Figure 2 As shown, the incident light enters the color filter substrate from the light incident surface S0, part of the light reaches the shielding layer 11, and the other part reaches the light transmission area TRA. The light reaching the shielding layer 11 is reflected back by the shielding layer 11, thereby reducing the light absorption of the filter layer 12.

[0042] The color filter substrate provided by the present disclosure provides a shielding layer 11 on the side of the filter layer 12 close to the light incident surface S0. The shielding layer 11 can reflect the incident light, thereby reducing the light absorption of the filter layer 12, thereby reducing the heat absorption of the color filter substrate, and improving the heat dissipation performance, stability and life of the color filter substrate.

[0043] On the one hand, the shielding layer 11 can actively reflect the light incident from the external light source, play a good role in heat insulation, so that the color film substrate itself has the ability to dissipate heat, reduce the operating temperature, and extend the service life. At the same time, it can also improve the uneven picture caused by the poor temperature uniformity of the display panel and improve the display picture quality. On the other hand, the shielding layer 11 can also play a role in shielding the light leakage area inside the display panel to prevent crosstalk between sub-pixels.

[0044] Tests have found that by using the color film substrate provided by the present disclosure, the temperature difference at different positions of the display panel can be less than or equal to 5°C.

[0045] In addition, since the shielding layer 11 is provided, it is no longer necessary to provide a BM in the color filter substrate, so the angular step difference problem caused by the BM can be improved, thereby reducing dark state light leakage and improving display contrast. Moreover, the shielding layer 11 can be prepared using a mask of the BM, so this solution does not increase the mask process, process complexity and cost, and the process is simple and feasible.

[0046] By arranging the light-transmitting area TRA on the shielding layer 11 , the light-transmitting area TRA can ensure that the incident light can normally pass through the color filter substrate, thereby avoiding affecting the display effect.

[0047] like Figure 1 and Figure 2 As shown, the filter layer 12 is located on a side of the base substrate 10 away from the light incident surface S0 .

[0048] For example, the shielding layer 11 may be located on a side of the substrate 10 that is away from the light incident surface S0 (eg, Figure 1 ), or may be located on a side of the base substrate 10 close to the light incident surface S0 (as shown in Figure 2 shown).

[0049] In some embodiments, the reflectivity of the shielding layer 11 to visible light is greater than or equal to 90%. In this way, the shielding layer 11 can reflect most of the incident light, further reducing the light absorption of the filter layer 12, thereby reducing the heat absorption of the color filter substrate.

[0050] For example, Figure 1 and Figure 2 As shown, the color filter substrate provided by the present disclosure further includes: a flat layer PL, which is arranged on the side of the filter layer 12 away from the base substrate 10.

[0051] It should be noted that, since the color filter substrate provided in the present disclosure does not need to be provided with a BM, and the surface step difference of the filter layer 12 away from the base substrate 10 is small, the flat layer PL may not be provided to simplify the process and reduce the cost.

[0052] For example, Figure 1 and Figure 2As shown, the color filter substrate provided by the present disclosure further includes: an isolation column PS, which is arranged on a side of the flat layer PL away from the base substrate 10.

[0053] In some embodiments, Figure 1 As shown, the shielding layer 11 and the filter layer 12 are located on the same side of the base substrate 10 , and the shielding layer 11 is located between the base substrate 10 and the filter layer 12 .

[0054] For example, Figure 1 As shown, the shielding layer 11 and the filter layer 12 are both located on a side of the base substrate 10 away from the light incident surface S0 .

[0055] For example, Figure 1 As shown, the color filter substrate further includes a transparent electrode layer 13, which can be disposed on a side of the base substrate 10 close to the light incident surface S0. The transparent electrode layer 13 can also be disposed on a side of the base substrate 10 away from the light incident surface S0, such as between the flat layer PL and the isolation column PS, which is not limited in the present disclosure.

[0056] In some embodiments, Figure 2 As shown, the shielding layer 11 and the filter layer 12 are located on different sides of the base substrate 10 .

[0057] For example, Figure 2 As shown, the shielding layer 11 is located on a side of the base substrate 10 close to the light incident surface S0 , and the filter layer 12 is located on a side of the base substrate 10 away from the light incident surface S0 .

[0058] For example, Figure 2 As shown, the color filter substrate provided by the present disclosure further includes: a transparent electrode layer 13, which is located on the side of the shielding layer 11 away from the base substrate 10, and the orthographic projection of the transparent electrode layer 13 on the base substrate 10 overlaps with the orthographic projection of the shielding layer 11 on the base substrate 10.

[0059] On one hand, the transparent electrode layer 13 is located outside the shielding layer 11 and can protect the shielding layer 11. On the other hand, the antistatic performance of the color film substrate can be improved by stacking the shielding layer 11 and the transparent electrode layer 13.

[0060] It should be noted that the transparent electrode layer 13 may also be disposed on a side of the base substrate 10 away from the light incident surface S0 , such as between the planar layer PL and the isolation pillars PS, which is not limited in the present disclosure.

[0061] In some embodiments, Figure 3As shown, the shielding layer 11 includes a plurality of first shielding strips 31 extending along a first direction f1 and separated from each other, and a plurality of second shielding strips 32 extending along a second direction f2 and separated from each other, and the first shielding strips 31 and the second shielding strips 32 intersect with each other to form a light-transmitting area TRA. The second direction f2 intersects with the first direction f1, such as being perpendicular to each other.

[0062] like Figure 3 As shown, a plurality of light-transmitting areas TRA are arranged in an array along a first direction f1 and a second direction f2.

[0063] For example, Figure 3 As shown, the filter layer 12 includes: a plurality of first filter patterns C1 located in different light transmission areas TRA, and the orthographic projection of the first filter pattern C1 on the base substrate 10 covers the orthographic projection of the light transmission area TRA on the base substrate 10. In the orthographic projection on the base substrate 10, different first filter patterns C1 cover different light transmission areas TRA.

[0064] For example, Figure 3 As shown, the plurality of first filter patterns C1 include a first red filter pattern R1, a first green filter pattern G1 and a first blue filter pattern B1. The first red filter pattern R1 is used to transmit red light, the first green filter pattern G1 is used to transmit green light, and the first blue filter pattern B1 is used to transmit blue light.

[0065] In some embodiments, Figure 4a As shown, the shielding layer 11 includes a plurality of third shielding bars 41 extending along the first direction f1 and spaced apart from each other, a gap between two adjacent third shielding bars 41 forms a light-transmitting area TRA, and the light-transmitting area TRA includes a plurality of sub-pixels PX arranged along the first direction f1.

[0066] like Figure 4a As shown, the plurality of light-transmitting areas TRA are arranged in an array along a second direction f2, and the second direction f2 and the first direction f1 intersect with each other, such as being perpendicular to each other.

[0067] and Figure 3 compared to, Figure 4a The shielding layer 11 shown removes the shielding strips extending along the second direction f2, which is beneficial to improving the aperture ratio and light transmittance of the color filter substrate.

[0068] For example, Figure 4a As shown, the filter layer 12 includes: a plurality of second filter patterns C2 located at different sub-pixels PX, and the orthographic projection of the second filter pattern C2 on the base substrate 10 covers the orthographic projection of the sub-pixel PX on the base substrate 10. In the orthographic projection on the base substrate 10, different second filter patterns C2 cover different sub-pixels PX. Figure 4bAs shown, the orthographic projections of the mutually adjacent edges of two second filter patterns C2 adjacent to each other in the first direction f1 on the base substrate 10 overlap each other.

[0069] like Figure 4b As shown, at the boundary of two adjacent sub-pixels PX arranged in the first direction f1, two second filter patterns C2 are overlapped to block light leakage at this position and prevent crosstalk between the sub-pixels PX.

[0070] For example, Figure 4a As shown, the plurality of second filter patterns C2 include a second red filter pattern R2, a second green filter pattern G2 and a second blue filter pattern B2, wherein the second red filter pattern R2 is used to transmit red light, the second green filter pattern G2 is used to transmit green light, and the second blue filter pattern B2 is used to transmit blue light.

[0071] For example, the ratio of the orthographic projection area of ​​the shielding layer 11 on the base substrate 10 to the area of ​​the base substrate 10 is, for example, greater than or equal to 40% or 50%. The ratio of the orthographic projection area of ​​the shielding layer 11 on the base substrate 10 in the display area to the area of ​​the display area is, for example, greater than or equal to 30% or 40%.

[0072] For example, in Figure 3 In the figure, the ratio of the sum of the orthographic projection areas of the first shielding strip 31 and the second shielding strip 32 on the base substrate 10 to the area of ​​the base substrate 10 is 53.3%, and the corresponding aperture ratio of the color filter substrate is 46.7%.

[0073] For example, in Figure 4a In the embodiment, the ratio of the orthographic projection area of ​​the third shielding strip 41 on the base substrate 10 to the area of ​​the base substrate 10 is 44%, and the corresponding aperture ratio of the color filter substrate is 56%.

[0074] Exemplarily, the material of the shielding layer 11 may also include at least one of the following: metal oxide, insulating material and organic material.

[0075] like Figure 5 As shown, the shielding layer 11 includes a metal layer 51. The main material of the metal layer 51 is a metal such as Ag or Al.

[0076] In some embodiments, Figure 5 As shown, the shielding layer 11 further includes: a buffer layer 52 stacked between the metal layer 51 and the base substrate 10 , and the thickness of the buffer layer 52 is less than or equal to the thickness of the metal layer 51 .

[0077] Exemplarily, the material of the buffer layer 52 includes at least one of the following: metal, metal oxide and insulating material. The metal is, for example, Al, and the metal oxide is, for example, ITO. The buffer layer 52 is used to improve the adhesion of the shielding layer 11.

[0078] In some embodiments, Figure 5 As shown, the shielding layer 11 further includes: a protective layer 53 stacked on a side of the metal layer 51 away from the base substrate 10 , and the thickness of the protective layer 53 is less than the thickness of the metal layer 51 .

[0079] Exemplarily, the main material of the protection layer 53 is a metal oxide such as ITO, or a metal such as Mo, and the protection layer 53 is used to protect the metal layer 51 .

[0080] Exemplarily, the main material of the metal layer 51 is Ag, and the main material of the protection layer 53 is ITO.

[0081] Exemplarily, the main materials of the metal layer 51 and the protective layer 53 are different metals. For example, the main material of the metal layer 51 is Al, and the main material of the protective layer 53 is Mo.

[0082] For example, Figure 5 As shown, the main materials of the protective layer 53 and the buffer layer 52 are both metal oxides, and the thickness of the protective layer 53 is less than or equal to the thickness of the buffer layer 52. By providing a protective layer 53 with a smaller thickness, it is beneficial to improve the transmittance of the color filter substrate.

[0083] Exemplarily, the main materials of the protection layer 53 and the buffer layer 52 are both ITO.

[0084] For example, when the main material of the protective layer 53 is a metal oxide (such as ITO), its thickness is greater than or equal to 30 angstroms and less than or equal to 60 angstroms, such as 30 angstroms, 50 angstroms, and 60 angstroms. In this way, the problem of yellowing of the base substrate 10 caused by extreme ultraviolet irradiation after coating the polyimide film in the preparation of the color filter substrate can be avoided, the metal layer 51 is protected from oxidation in the subsequent process, and the color filter substrate can be ensured to have a high transmittance.

[0085] For example, when the main material of the buffer layer 52 is a metal oxide (e.g., ITO), its thickness is greater than or equal to 30 angstroms and less than or equal to 60 angstroms, such as 30 angstroms and 60 angstroms. When the main material of the buffer layer 52 is a metal (e.g., Al), its thickness is greater than or equal to 30 angstroms and less than or equal to 60 angstroms, such as 50 angstroms. When the main material of the buffer layer 52 is an insulating material, its thickness is greater than or equal to 200 angstroms and less than or equal to 1000 angstroms, such as 200 angstroms, 500 angstroms, and 1000 angstroms.

[0086] Exemplarily, the thickness of the metal layer 51 is about 1000 angstroms.

[0087] Exemplarily, Table 1 shows the reflectivity test results of shielding layers 11 with different structures and thicknesses.

[0088] Table 1

[0089]

[0090] As shown in Table 1, in verification scheme 1, the buffer layer 52 is made of ITO with a thickness of 60 angstroms, the metal layer 51 is made of Ag with a thickness of 1000 angstroms, and the protective layer 53 is made of ITO. In the first sub-scheme of verification scheme 1, the protective layer 53 is made of ITO with a thickness of 50 angstroms, and in the second sub-scheme of verification scheme 1, the protective layer 53 is made of ITO with a thickness of 60 angstroms. In verification scheme 2, the buffer layer 52 is made of an insulating material with a thickness of 60 angstroms, the metal layer 51 is made of Ag with a thickness of 1000 angstroms, and the protective layer 53 is made of ITO. In the first sub-scheme of verification scheme 2, the protective layer 53 is made of ITO with a thickness of 200 angstroms, in the second sub-scheme of verification scheme 2, the protective layer 53 is made of ITO with a thickness of 500 angstroms, and in the third sub-scheme of verification scheme 2, the protective layer 53 is made of ITO with a thickness of 1000 angstroms. In verification scheme 3, the metal layer 51 is made of Ag with a thickness of 1000 angstroms, the protective layer 53 is made of ITO with a thickness of 60 angstroms, and the buffer layer 52 is not provided. In verification scheme 4, the metal layer 51 is made of Ag with a thickness of 1000 angstroms, and no protective layer 53 and buffer layer 52 are provided. In verification scheme 5, the buffer layer 52 is made of Al with a thickness of 60 angstroms, the metal layer 51 is made of Ag with a thickness of 1000 angstroms, and the protective layer 53 is made of ITO with a thickness of 50 angstroms. In verification scheme 6, the buffer layer 52 is made of ITO with a thickness of 30 angstroms, the metal layer 51 is made of Ag with a thickness of 1000 angstroms, and the protective layer 53 is made of ITO with a thickness of 30 angstroms.

[0091] By comparing the reflectivity of multiple verification schemes, it can be found that the shielding layer 11 adopts the structure of verification scheme 6, which can achieve a good reflection effect, with an average reflectivity of 97% for visible light, and can also protect the metal layer 51 from oxidation.

[0092] Exemplarily, the shielding layer 11 can be prepared by a magnetron sputtering film forming method. When preparing the shielding layer 11, a magnetron sputtering film forming method is used to form a shielding layer 11 thin film, and then the shielding layer 11 thin film is processed by exposure, development, etching and other processes to form the shielding layer 11.

[0093] Exemplarily, the following steps may be followed: providing a base substrate 10 → forming a transparent electrode layer 13 on one side of the base substrate 10 → forming a shielding layer 11 on a side of the base substrate 10 away from the transparent electrode layer 13 → forming a filter layer 12 on a side of the shielding layer 11 away from the base substrate 10 → forming a planar layer PL on a side of the filter layer 12 away from the base substrate 10 → forming a spacer PS on a side of the planar layer PL away from the base substrate 10, to obtain the following: Figure 1 The color film substrate shown.

[0094] For example, the following steps may be followed: providing a base substrate 10 → forming a shielding layer 11 on one side of the base substrate 10 → forming a transparent electrode layer 13 on the side of the shielding layer 11 facing away from the base substrate 10 → forming a filter layer 12 on the side of the base substrate 10 facing away from the shielding layer 11 → forming a planar layer PL on the side of the filter layer 12 facing away from the base substrate 10 → forming an isolation column PS on the side of the planar layer PL facing away from the base substrate 10, to obtain the following: Figure 2 The color film substrate shown.

[0095] In the case where the filter layer 12 includes the first red filter pattern R1, the first green filter pattern G1 and the first blue filter pattern B1, the first red filter pattern R1, the first green filter pattern G1 and the first blue filter pattern B1 may be sequentially formed. In the case where the filter layer 12 includes the second red filter pattern R2, the second green filter pattern G2 and the second blue filter pattern B2, the second red filter pattern R2, the second green filter pattern G2 and the second blue filter pattern B2 may be sequentially formed.

[0096] like Figure 6 to Figure 7 As shown, the present disclosure provides a display panel 60, including: a color filter substrate 61 as provided in any of the above embodiments; an array substrate 62, which is arranged opposite to the color filter substrate 61, and the filter layer 12 is located on the side of the base substrate 10 close to the array substrate 62; and a liquid crystal layer 63, which is filled between the color filter substrate 61 and the array substrate 62.

[0097] Those skilled in the art can understand that the display panel 60 provided in the present disclosure has the advantages of the color filter substrate 61 in any of the above-mentioned embodiments.

[0098] For example, Figure 6 or Figure 7 As shown, the display panel 60 further includes: a first polarizer POL1 located on the light incident side of the color filter substrate 61 , and a second polarizer POL2 located on the light emitting side of the array substrate 62 .

[0099] like Figure 8As shown, the present disclosure provides a projector, comprising: a display panel 60 as provided in any of the above embodiments; and a light source 81, located on the side of the color film substrate 61 away from the array substrate 62, and the light incident surface S0 of the color film substrate 61 faces the light source 81, and the light source 81 is used to provide incident light to the display panel 60.

[0100] Exemplarily, the light source 81 includes a light emitting diode (LED).

[0101] For example, Figure 8 As shown, the projector also includes a reflective cup 82, which is located between the light source 81 and the display panel 60 and is arranged on the light incident side of the display panel 60; a rear Fresnel mirror 83, which is arranged between the reflective cup 82 and the display panel 60; a front Fresnel mirror 84, which is arranged on the light emitting side of the display panel 60; a reflector 85, which is arranged on the side of the front Fresnel mirror 84 away from the display panel 60; and a lens 86, which is arranged on the reflected light path of the reflector 85.

[0102] Those skilled in the art can understand that the projector provided by the present disclosure has the advantages of the display panel 60 of any of the above-mentioned embodiments.

[0103] Exemplarily, the combined light efficiency range of the reflective cup 82 and the rear Fresnel mirror 83 is 52% to 65%, for example, 56%; the light efficiency range of the display panel 60 is 4% to 7%, for example, 6.1%; the light efficiency range of the front Fresnel mirror 84 is 89% to 92%, for example, 89%; the light efficiency range of the reflector 85 is 92% to 97%, for example, 96%; the light efficiency range of the lens 86 is 60% to 85%, for example, 85%; the light efficiency of the first polarizer POL1 is, for example, 42.5%.

[0104] According to the above light effect, the light effect of the projector can be calculated as: η 投影仪

[0105] =56%×6.1%×89%×96%×85%=2.48%; light efficiency η on the light-incident side of the color filter substrate 61 CF

[0106] =56%×42.5%=23.8%. The display area is 87.6672×49.3128mm 2 In the case of , the brightness conversion formula is as follows:

[0107]

[0108] Table 2 below shows the power of the light source 81 (i.e., light source power) and the brightness irradiated to the color film substrate 61 (i.e., CF surface brightness) when the brightness of the projector is 100lm, 200lm, and 300lm respectively. The brightness of small-sized display products such as wearable devices and mobile devices is about 1000nit, and the light source power of small-sized display products is at the milliwatt level. By comparison, it can be seen that the brightness and light source power of the projector are more than 100 times that of the small-sized display products. Therefore, the use of the color film substrate 61 with self-heating function provided by the present disclosure in the projector can significantly improve the display effect of the display panel 60 and the projector, and extend the service life.

[0109] Table 2

[0110]

[0111] In the present disclosure, “plurality” means two or more, and “at least one” means one or more, unless otherwise clearly and specifically defined.

[0112] In the present disclosure, the orientation or positional relationship indicated by the terms "upper" and "lower" are based on the orientation or positional relationship shown in the accompanying drawings and are only for the convenience of describing the present disclosure and simplifying the description, rather than indicating or implying that the device or element referred to must have a specific orientation, be constructed and operated in a specific orientation, and therefore cannot be understood as a limitation on the present disclosure.

[0113] As used herein, the terms "comprises," "includes," or any other variation thereof are intended to encompass non-exclusive inclusion, such that a process, method, commodity, or device that includes a series of elements includes not only those elements, but also other elements not explicitly listed, or elements inherent to such process, method, product, or device. In the absence of further limitations, an element defined by the phrase "includes a ..." does not exclude the presence of additional identical elements in the process, method, commodity, or device that includes the element.

[0114] References herein to "one embodiment," "some embodiments," "exemplary embodiments," "one or more embodiments," "example," "an example," "some examples," etc., are intended to indicate that a particular feature, structure, material, or characteristic associated with the embodiment or example is included in at least one embodiment or example of the present disclosure. Schematic representations of the above terms do not necessarily refer to the same embodiment or example. Furthermore, the particular features, structures, materials, or characteristics may be included in any one or more embodiments or examples in any appropriate manner.

[0115] In this document, relational terms such as first and second, etc. are used merely to distinguish one entity or operation from another entity or operation, but do not necessarily require or imply any such actual relationship or order between these entities or operations.

[0116] When describing some embodiments, the expressions "coupled" and "connected" may be used. For example, when describing some embodiments, the term "connected" may be used to indicate that two or more components are in direct physical or electrical contact with each other. As another example, when describing some embodiments, the term "coupled" may be used to indicate that two or more components are in direct physical or electrical contact. However, the term "coupled" or "communicatively coupled" may also refer to two or more components that are not in direct contact with each other, but still cooperate or interact with each other. The embodiments disclosed herein are not necessarily limited to the contents of this document.

[0117] “At least one of A, B, and C” has the same meaning as “at least one of A, B, or C” and both include the following combinations of A, B, and C: A only, B only, C only, the combination of A and B, the combination of A and C, the combination of B and C, and the combination of A, B, and C.

[0118] “A and / or B” includes the following three combinations: A only, B only, and a combination of A and B.

[0119] As used herein, the term "if" is optionally interpreted to mean "when" or "upon" or "in response to determining" or "in response to detecting," depending on the context. Similarly, the phrases "if it is determined that" or "if [a stated condition or event] is detected" are optionally interpreted to mean "upon determining that" or "in response to determining that" or "upon detecting [a stated condition or event]" or "in response to detecting [a stated condition or event]," depending on the context.

[0120] The use of "for" or "configured to" herein is meant to be open and inclusive language that does not exclude devices adapted or configured to perform additional tasks or steps.

[0121] The use of "based on" or "according to" herein is meant to be open and inclusive. A process, step, calculation or other action based on one or more of the conditions or values ​​may, in practice, be based on other conditions or exceed the values ​​described. A process, step, calculation or other action based on one or more of the conditions or values ​​may, in practice, be based on other conditions or exceed the values ​​described.

[0122] As used herein, "about," "substantially," or "approximately" includes the stated value and an average value that is within an acceptable range of variation from the particular value as determined by one of ordinary skill in the art taking into account the measurements in question and the errors associated with the measurement of the particular quantity (i.e., the limitations of the measurement system).

[0123] As used herein, "parallel", "perpendicular", "equal", and "flush" include the situations described and situations similar to the situations described, the range of which is within an acceptable deviation range, wherein the acceptable deviation range is as determined by a person of ordinary skill in the art taking into account the measurement in question and the errors associated with the measurement of a particular quantity (i.e., the limitations of the measurement system). For example, "parallel" includes absolute parallelism and approximate parallelism, wherein the acceptable deviation range for approximate parallelism may be, for example, a deviation within 5°; "perpendicular" includes absolute perpendicularity and approximate perpendicularity, wherein the acceptable deviation range for approximate perpendicularity may also be, for example, a deviation within 5°. "Equal" includes absolute equality and approximate equality, wherein the acceptable deviation range for approximate equality may be, for example, that the difference between the two being equal is less than or equal to 5% of either one. "Flush" includes absolute flushness and approximate flushness, wherein the acceptable deviation range for approximate flushness may be, for example, that the distance between the two being flush is less than or equal to 5% of the size of either one.

[0124] It will be understood that when a layer or an element is referred to as being on another layer or substrate, it can be directly on the other layer or substrate, or intervening layers may be present between the layer or element and the other layer or substrate.

[0125] Exemplary embodiments are described herein with reference to cross-sectional views and / or plan views that are idealized exemplary drawings. In the drawings, the thickness of layers and regions is exaggerated for clarity. Therefore, variations in shape relative to the drawings due to, for example, manufacturing techniques and / or tolerances are conceivable. Therefore, the exemplary embodiments should not be interpreted as being limited to the shapes of the regions shown herein, but include shape deviations due to, for example, manufacturing. For example, an etched region shown as a rectangle will typically have curved features. Therefore, the regions shown in the drawings are schematic in nature, and their shapes are not intended to illustrate the actual shape of the regions of the device, and are not intended to limit the scope of the exemplary embodiments. Unless otherwise specified, the thickness of a film layer refers to the size of the film layer in the direction of its normal.

[0126] Finally, it should be noted that the above embodiments are only used to illustrate the technical solutions of the present disclosure, rather than to limit them. Although the present disclosure has been described in detail with reference to the aforementioned embodiments, those skilled in the art should understand that they can still modify the technical solutions described in the aforementioned embodiments, or make equivalent replacements for some of the technical features therein. However, these modifications or replacements do not deviate the essence of the corresponding technical solutions from the spirit and scope of the technical solutions of the embodiments of the present disclosure.

Claims

1. A color filter substrate having a light incident surface, the color filter substrate comprising: A base substrate, and a shielding layer and a filter layer stacked on the base substrate, wherein the shielding layer is located on a side of the filter layer close to the light incident surface, the shielding layer is used to form a plurality of light-transmitting areas, and the filter layer overlaps with the orthographic projection of the light-transmitting area on the base substrate; The shielding layer can reflect visible light incident on the shielding layer, and the main material of the shielding layer is metal.

2. The color film substrate according to claim 1, wherein: The shielding layer and the filter layer are located on the same side of the base substrate, and the shielding layer is located between the base substrate and the filter layer.

3. The color film substrate according to claim 1, wherein: The shielding layer and the filter layer are located on different sides of the base substrate.

4. The color film substrate according to claim 3, wherein: The color film substrate also includes: The transparent electrode layer is located on a side of the shielding layer away from the base substrate, and the orthographic projection of the transparent electrode layer on the base substrate overlaps with the orthographic projection of the shielding layer on the base substrate.

5. The color film substrate according to claim 1, wherein: The shielding layer includes a plurality of first shielding strips extending along a first direction and separated from each other, and a plurality of second shielding strips extending along a second direction and separated from each other, wherein the first shielding strips and the second shielding strips intersect with each other to form the light-transmitting area; The filter layer includes a plurality of first filter patterns located in different light-transmitting areas, and the orthographic projections of the first filter patterns on the base substrate cover the orthographic projections of the light-transmitting areas on the base substrate.

6. The color film substrate according to claim 1, wherein: The shielding layer includes a plurality of third shielding strips extending along a first direction and separated from each other, a gap between two adjacent third shielding strips forms the light-transmitting area, and the light-transmitting area includes a plurality of sub-pixels arranged along the first direction; The filter layer includes a plurality of second filter patterns located at different sub-pixels, wherein the orthographic projections of the second filter patterns on the base substrate cover the orthographic projections of the sub-pixels on the base substrate, and the orthographic projections of the edges of two filter patterns adjacent to each other in the first direction on the base substrate overlap with each other.

7. The color film substrate according to claim 1, wherein: The shielding layer includes: a metal layer, and at least one of the following: a buffer layer, stacked between the metal layer and the base substrate, wherein the thickness of the buffer layer is less than or equal to the thickness of the metal layer; and The protective layer is stacked on a side of the metal layer away from the base substrate, and the thickness of the protective layer is less than the thickness of the metal layer.

8. The color film substrate according to any one of claims 1 to 7, wherein: The reflectivity of the shielding layer to visible light is greater than or equal to 90%.

9. A display panel, comprising: The color film substrate according to any one of claims 1 to 8; An array substrate is arranged opposite to the color filter substrate, and the filter layer is located on a side of the base substrate close to the array substrate; as well as The liquid crystal layer is filled between the color filter substrate and the array substrate.

10. A projector, comprising: The display panel according to claim 9; as well as A light source is located on a side of the color filter substrate away from the array substrate, and a light incident surface of the color filter substrate faces the light source, and the light source is used to provide incident light to the display panel.

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