Chin support for electroencephalogram cap

Abstract

The utility model relates to a chin support for an electroencephalogram cap, which aims to solve the technical problems that the current chin support is narrow, cannot effectively support the chin, is easy to slide, has poor air permeability and is uncomfortable to wear for a long time, and comprises a bottom layer, a lower jaw support layer, a hair surface layer and a hook surface layer, the lower jaw supporting layer is sewn on the middle section of the bottom layer; wherein the lower jaw supporting layer is consistent with the hollow structure of the middle section of the bottom layer; the two hair surface layers are sewn at the two ends of the bottom layer; the novel chin pad has the advantages that the bonding position can be adjusted according to the size of the chin, the novel chin pad is suitable for different chins, the chin can be effectively supported, and the novel chin pad is not prone to sliding, good in air permeability and comfortable to wear.

Description

Technical Field

[0001] The utility model relates to the technical field of electroencephalogram cap accessories, in particular to a chin support for use with an electroencephalogram cap. Background Art

[0002] As an accessory used in conjunction with an electroencephalogram cap, the chin support is used to help fix the electrode cap.

[0003] There are mainly two types of electroencephalogram cap chin supports, one is to support the lower jaw, and the other is to support the lower part of the jaw. The existing chin support for the lower jaw is relatively narrow, unable to effectively support the chin, prone to sliding, and has poor air permeability, resulting in discomfort after long-term wearing.

[0004] In view of this, we propose a chin support for use with an electroencephalogram cap. Content of the Utility Model

[0005] The purpose of the utility model is to overcome the deficiencies of the prior art, meet the actual needs, and provide a chin support for use with an electroencephalogram cap to solve the technical problems that the existing chin support for the lower jaw is relatively narrow, unable to effectively support the chin, prone to sliding, has poor air permeability, and causes discomfort after long-term wearing.

[0006] To achieve the purpose of the utility model, the technical solution adopted by the utility model is: designing a chin support for use with an electroencephalogram cap, including a bottom layer, a mandibular support layer, a fluff layer, and a hook layer;

[0007] The bottom layer;

[0008] The mandibular support layer is sewn to the middle section of the bottom layer;

[0009] Wherein, the mandibular support layer has the same hollow structure as the middle section of the bottom layer;

[0010] Two fluff layers are sewn to both ends of the bottom layer;

[0011] Two hook layers are sewn to the outer ends of the two fluff layers, and the hook layer is 2 - 15 mm away from the front end of the fluff layer.

[0012] Preferably, the mandibular support layer is a symmetric structure in the middle, with a width of 30 - 65 mm. The mandibular support layer is divided into a three-section hollow design. The two ends of the mandibular support layer are breathable hollow sections, and the middle section of the mandibular support layer is a hollow stress section.

[0013] Preferably, the hook layer is a non-stretchable fabric, and the fluff layer is a non-stretchable fabric.

[0014] Preferably, the fluff layer is 2 - 10 mm wider than the hook layer.

[0015] Preferably, both the mandibular support layer and the bottom layer are elastic fabrics.

[0016] Compared with the prior art, the beneficial effects of the present utility model are as follows:

[0017] By providing a bottom layer, a mandibular support layer, a fluff layer, and a hook layer, the present utility model has the advantages of adjusting the bonding position according to the size of the chin, being applicable to different chins, effectively supporting the chin, not being prone to sliding, having good air permeability, and being comfortable to wear, solving the problems of the lower jaw chin support being relatively narrow, unable to effectively support the chin, being prone to sliding, having poor air permeability, and being uncomfortable to wear for a long time. BRIEF DESCRIPTION OF THE DRAWINGS

[0018] Figure 1 is a schematic exploded view of the present utility model;

[0019] Figure 2 is a schematic front view structure diagram of the present utility model;

[0020] In the figure: 1, bottom layer; 2, mandibular support layer; 3, fluff layer; 4, hook layer. DETAILED DESCRIPTION OF THE EMBODIMENTS

[0021] The present utility model will be further described below with reference to the drawings and embodiments:

[0022] Embodiment 1: A chin support for an electroencephalogram cap, see Figures 1 to 2 , including a bottom layer 1, a mandibular support layer 2, a fluff layer 3, and a hook layer 4; the entire chin support is a symmetric structure in the middle, with a thickness of 1 - 5 mm;

[0023] The mandibular support layer 2 is sewn to the middle section of the bottom layer 1; wherein, the hollow structure of the mandibular support layer 2 is the same as that of the middle section of the bottom layer 1; two fluff layers 3 are sewn to both ends of the bottom layer 1; two hook layers 4 are sewn to the outer ends of the two fluff layers 3, and the hook layer 4 is 2 - 15 mm away from the front end of the fluff layer 3, facilitating the hand-held operation of the fitting and separation of the hook and fluff surfaces.

[0024] By providing a bottom layer 1, a mandibular support layer 2, a fluff layer 3, and a hook layer 4, the present utility model has the advantages of adjusting the bonding position according to the size of the chin, being applicable to different chins, effectively supporting the chin, not being prone to sliding, having good air permeability, and being comfortable to wear, solving the problems of the lower jaw chin support being relatively narrow, unable to effectively support the chin, being prone to sliding, having poor air permeability, and being uncomfortable to wear for a long time.

[0025] Specifically, the mandibular support layer 2 is a symmetric structure in the middle, with a width of 30 - 65 mm. The mandibular support layer 2 is divided into a three-section hollow design. The two ends of the mandibular support layer 2 are breathable hollow sections, and the middle section of the mandibular support layer 2 is a hollow stress section. This ensures sufficient strength while having a large area of hollowing, and at the same time has a better wrapping effect on the chin, ensuring that the chin support is not prone to sliding.

[0026] Further, the hook layer 4 is made of non-stretchable fabric, the fluff layer 3 is made of non-stretchable fabric, and both the lower jaw support layer 2 and the bottom layer 1 are elastic fabrics. When the hook layer 4 and the fluff layer 3 are attached through the upper pull ring on the electrode cap, by adjusting the bonding area of the hook layer 4, the pulling force of the chin support on the cap body can be adjusted, effectively conducting the pulling force and tightening the electrode cap.

[0027] Furthermore, the fluff layer 3 is 2 - 10 mm wider than the hook layer 4. When bonding, the hook layer 4 can better adhere to the fluff layer 3, and the hook layer 4 will not contact the skin, avoiding discomfort during wearing.

[0028] Working principle: When using the device of the present utility model, when holding the chin, the lower jaw support layer 2 and the bottom layer 1 are stretched and attached to the chin, the hook layer 4 and the fluff layer 3 are attached through the upper pull ring on the electrode cap, and the hook layer 4 and the fluff layer 3 are bonded in the case of adhering to the chin, and the electrode cap is tightened for wearing.

[0029] The embodiments disclosed in the present utility model are preferred embodiments, but not limited thereto. Those of ordinary skill in the art can easily understand the spirit of the present utility model based on the above embodiments and make different extensions and changes. However, as long as they do not depart from the spirit of the present utility model, they are within the protection scope of the present utility model.

Claims

1. An electroencephalogram cap using a chin rest, characterized in that: include: Bottom layer (1); A mandibular support layer (2) sewn to the middle section of the bottom layer (1); Wherein, the mandibular support layer (2) is consistent with the hollow structure of the middle section of the bottom layer (1); Two fleece layers (3) are sewn to two ends of the bottom layer (1); Two hook surface layers (4) are sewn on the outer ends of the two fleece surface layers (3), and the hook surface layer (4) is 2-15 mm away from the front end of the fleece surface layer (3).

2. The electroencephalogram cap using a chin rest as claimed in claim 1, characterized in that: The mandibular support layer (2) is a middle symmetrical structure with a width of 30-65 mm. The mandibular support layer (2) is divided into three sections of hollow design. The two ends of the mandibular support layer (2) are air-permeable hollow sections, and the middle section of the mandibular support layer (2) is a hollow stress-bearing section.

3. The electroencephalogram cap using a chin rest as claimed in claim 1, characterized in that: The hook surface layer (4) is a non-stretchable fabric, and the fleece surface layer (3) is a non-stretchable fabric.

4. The chin rest used for the electroencephalogram cap as claimed in claim 1, characterized in that: The fleece layer (3) is 2-10 mm wider than the hook layer (4).

5. The chin rest used for the electroencephalogram cap as claimed in claim 1, characterized in that: The mandibular support layer (2) and the bottom layer (1) are both made of elastic fabrics.

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