Color film substrate and display panel

Abstract

The utility model provides a color film substrate and a display panel. The color film substrate comprises a display area, a frame area and a first substrate layer, the color film layer comprises a plurality of color resistance structures of different colors located in the display area, and the light shielding layer comprises a first light shielding structure arranged between every two adjacent color resistance structures and a second light shielding structure covering the frame area; the first heightening layer is located on one side of the second shading structure and located in the frame area, and the first heightening layer comprises a plurality of heightening structures arranged at intervals; the flat layer covers one side of the color film layer and one side of the first heightening layer and fills the gap, and the thickness of the flat layer covering the heightening structure is smaller than that of the flat layer covering the color resistance structure; the spacer is located on one side of the flat layer of the display area; the supporting object is located on one side of the flat layer of the frame area, and the distance between the supporting object and the first substrate layer is basically the same as the distance between the spacer and the first substrate layer.

Description

Technical Field

[0001] The present disclosure relates to the field of display technologies, and particularly to a color filter substrate and a display panel. Background Art

[0002] LCD (Liquid Crystal Display) products are one of the most common display technologies at present. Particularly in large-size display technologies, LCD display products are widely used.

[0003] LCD display products include a display area (AA area, Active Area) and a border area. In current LCD display products, the support force of the border area is insufficient. After the border area is pressed and deformed by force, the cell thickness of the area near the edge of the AA area in the AA area will be too high, resulting in a problem of yellowish display in this area and causing poor display. Summary of the Utility Model

[0004] A first aspect of an embodiment of the present disclosure provides a color filter substrate, including: a display area and a border area disposed around the display area. The color filter substrate further includes:

[0005] A first substrate layer;

[0006] A color filter layer and a light-shielding layer, located on one side of the first substrate layer. The color filter layer includes a plurality of color resist structures of different colors located in the display area. The light-shielding layer includes a first light-shielding structure disposed between two adjacent color resist structures and a second light-shielding structure covering the border area;

[0007] A first spacer layer, located on the side of the second light-shielding structure away from the first substrate layer and in the border area. The first spacer layer includes a plurality of spaced-apart spacer structures;

[0008] A planarization layer, covering the color filter layer and the side of the first spacer layer away from the first substrate layer, and filling the gaps between two adjacent color resist structures and the gaps between two adjacent spacer structures. In the direction perpendicular to the first substrate layer, the thickness of the planarization layer covering the spacer structure is less than the thickness of the planarization layer covering the color resist structure;

[0009] Spacers, located on the side of the planarization layer in the display area away from the first substrate layer;

[0010] Supports, located on the side of the planarization layer in the border area away from the first substrate layer. The distance from the end face of the support away from the first substrate layer to the first substrate layer is substantially the same as the distance from the end face of the spacer away from the first substrate layer to the first substrate layer.

[0011] Optionally, in the direction of the border area towards the display area, the ratio of the width of the heightening structure to the width of the gap between two adjacent heightening structures ranges from 1.5 to 4.

[0012] Optionally, in the direction perpendicular to the first substrate layer, the total thickness of the second light-shielding structure, the heightening structure, and the planar layer covering the heightening structure is substantially the same as the total thickness of the color resist structure and the planar layer covering the color resist structure.

[0013] Optionally, the planar layer covering the side of the first heightening layer away from the first substrate layer includes: a convex portion covering the heightening structure and a concave portion filling the gap between two adjacent heightening structures;

[0014] The end face of the concave portion away from the first substrate layer is closer to the first substrate layer than the end face of the convex portion away from the first substrate layer, and the difference between the two ranges from 0.1 μm to 0.2 μm.

[0015] Optionally, the planar layer covering the side of the first heightening layer away from the first substrate layer includes: a convex portion covering the heightening structure and a concave portion filling the gap between two adjacent heightening structures;

[0016] The support includes support columns, the support columns are located on the side of the convex portion away from the first substrate layer, and the orthographic projection of the support columns on the first substrate layer is within the orthographic projection of the heightening structure on the first substrate layer; and / or

[0017] The support columns are located on the side of the concave portion away from the first substrate layer, and the orthographic projection of the support columns on the first substrate layer is between the orthographic projections of two adjacent heightening structures on the first substrate layer.

[0018] Optionally, the planar layer covering the side of the first heightening layer away from the first substrate layer includes: a convex portion covering the heightening structure and a concave portion filling the gap between two adjacent heightening structures;

[0019] The support includes support dams, the support dams are located on the side of the convex portion away from the first substrate layer, and / or, the support dams are located on the side of the concave portion away from the first substrate layer;

[0020] The longest side of the orthographic projection of the support dams on the first substrate layer is greater than or equal to the shortest side of the orthographic projection of the heightening structure on the first substrate.

[0021] Optionally, the flat layer covering the side of the first pad layer away from the first substrate layer includes: a convex portion covering the raised structure and a concave portion filling the gap between two adjacent raised structures;

[0022] The support includes: support columns and support dams. In a direction perpendicular to the first substrate layer, the thickness of the support columns is greater than the thickness of the support dams, and the end face of the support away from the first substrate layer is the end face of the support columns away from the first substrate layer;

[0023] The support columns are located on the side of the convex portion away from the first substrate layer, and the orthographic projection of the support columns on the first substrate layer is within the orthographic projection of the raised structure on the first substrate layer;

[0024] The support dams are located on the side of the concave portion away from the first substrate layer, and the longest side of the orthographic projection of the support dams on the first substrate layer is greater than or equal to the shortest side of the orthographic projection of the raised structure on the first substrate;

[0025] Optionally, the flat layer covering the side of the first pad layer away from the first substrate layer includes: a convex portion covering the raised structure and a concave portion filling the gap between two adjacent raised structures;

[0026] The support includes: support columns and support dams. In a direction perpendicular to the first substrate layer, the thickness of the support columns is greater than the thickness of the support dams, and the end face of the support away from the first substrate layer is the end face of the support columns away from the first substrate layer;

[0027] The support columns and the support dams are located on the side of the convex portion away from the first substrate layer, and the orthographic projection of the support columns on the first substrate layer is within the orthographic projection of the raised structure on the first substrate layer; and / or

[0028] The support columns and the support dams are located on the side of the concave portion away from the first substrate layer, and the orthographic projection of the support columns on the first substrate layer is between the orthographic projections of two adjacent raised structures on the first substrate layer;

[0029] Wherein, the longest side of the orthographic projection of the support dams on the first substrate layer is greater than or equal to the shortest side of the orthographic projection of the raised structure on the first substrate;

[0030] Optionally, the multiple spaced-apart raised structures of the first pad layer are of the same layer and the same material as the color resist structure of at least one color.

[0031] Optionally, the support and the spacer are of the same layer and the same material.

[0032] The spacer includes a main spacer and a secondary spacer. The main spacer and the secondary spacer are located on the side of the planar layer filling the gap between two adjacent color-resist structures and away from the first substrate layer. In the direction perpendicular to the first substrate layer, the thickness of the main spacer is greater than that of the secondary spacer, and the end face of the spacer away from the first substrate layer is the end face of the main spacer away from the first substrate layer.

[0033] The support includes a support column and a support dam. In the direction perpendicular to the first substrate layer, the thickness of the support column is greater than that of the support dam, and the end face of the support away from the first substrate layer is the end face of the support column away from the first substrate layer. The support column has the same size as the main spacer.

[0034] A second aspect of the embodiments of the present disclosure provides a display panel, which includes a color filter substrate as described in any one of the first aspects, an array substrate disposed opposite to the color filter substrate, and a liquid crystal layer located between the color filter substrate and the array substrate.

[0035] Optionally, the array substrate includes:

[0036] A second substrate layer;

[0037] A spacer occupation part, which is located on the side of the second substrate layer close to the first substrate layer and in the display area;

[0038] The orthographic projection of the spacer on the second substrate layer and the orthographic projection of the spacer occupation part on the second substrate layer at least partially overlap.

[0039] Optionally, the array substrate further includes:

[0040] A passivation layer, which is located on the side of the second substrate layer close to the first substrate layer and in the display area and the border area;

[0041] In the direction perpendicular to the second substrate layer, the distance between the end face of the support away from the first substrate layer and the surface of the passivation layer in the border area away from the second substrate layer is 0.1 μm - 0.3 μm.

[0042] Optionally, the array substrate further includes:

[0043] Sealant, which is located above the passivation layer away from the second substrate layer and in the border area. The orthographic projection of the support on the second substrate layer and the orthographic projection of the border sealant on the second substrate layer do not overlap with each other.

[0044] Optionally, the array substrate further includes:

[0045] The first metal layer is located on one side of the second substrate layer close to the first substrate layer, and is located in the display area and the border area, and a gate driving integration area is provided in the border area;

[0046] The second metal layer is located on one side of the first metal layer away from the second substrate layer, and is located in the display area and the gate driving integration area;

[0047] The orthographic projection of the support on the second substrate layer does not overlap with the orthographic projection of the second metal layer located in the gate driving integration area on the second substrate layer.

[0048] The technical solution provided in the embodiments of the present disclosure has at least the following technical effects or advantages:

[0049] The color filter substrate provided in the embodiments of the present disclosure is provided with a first pad height layer in the border area. The first pad height layer includes a plurality of spaced-apart pad height structures. When the planarization layer covers the color filter layer and the first pad height layer, the step difference between the planarization layer covering the color filter layer and the planarization layer covering the first pad height layer can be adjusted through the gap between two adjacent pad height structures. It can be understood that the larger the gap, the more planarization layer material is used to fill the gap, and the smaller the thickness of the planarization layer covering the pad height structure. On the contrary, the smaller the gap, the less planarization layer material is used to fill the gap, and the larger the thickness of the planarization layer covering the pad height structure. Thus, by reasonably setting the gap size, it is possible to make the thickness of the planarization layer covering the pad height structure less than the thickness of the planarization layer covering the color resist structure, and further make the distance between the end surface of the support away from the first substrate layer and the first substrate layer and the distance between the end surface of the spacer away from the first substrate layer and the first substrate layer substantially the same. Then, after the color filter substrate and the array substrate are aligned, the distance from the end surface of the support to the surface of the array substrate can be substantially the same as the distance from the spacer to the surface of the array substrate. Since the spacer usually contacts the surface of the array substrate, the support can play a good supporting role. By improving the cell thickness uniformity between the color filter substrate and the array substrate, it is possible to avoid the problem that the area near the edge of the display area warps upward and the cell thickness is too high, and the problem of yellowish display appears in this area, improving the display effect; at the same time, by improving the cell thickness uniformity between the color filter substrate and the array substrate, it is possible to avoid the problem of light leakage caused by the twisting of the liquid crystal in the display area.

[0050] The above description is only an overview of the technical solution provided in the embodiments of the present disclosure. In order to be able to understand the technical means of the embodiments of the present disclosure more clearly, it can be implemented according to the content of the specification. And in order to make the above and other purposes, features and advantages of the embodiments of the present disclosure more obvious and understandable, the following specifically describes the specific embodiments of the present disclosure. Description of the Drawings

[0051] Various other advantages and benefits will become apparent to those of ordinary skill in the art by reading the following detailed description of the preferred embodiments. The drawings are only for the purpose of showing the preferred embodiments and are not considered to be a limitation of the present utility model. Moreover, throughout the drawings, the same reference numerals are used to represent the same components. In the drawings:

[0052] Figure 1 A schematic diagram of the regional distribution of a display panel is shown;

[0053] Figure 2 A partial cross-sectional view of the lower border of the display panel to the AA area in the related art is shown;

[0054] Figure 3 A partial cross-sectional view of the upper border of the display panel to the AA area in the related art is shown;

[0055] Figure 4 A partial cross-sectional view of the left border or right border of the display panel to the AA area in the related art is shown;

[0056] Figure 5 A graph showing the cell thickness difference between the border area and the AA area in the related art is shown;

[0057] Figure 6 A schematic diagram of display defects of the display panel in the related art is shown;

[0058] Figure 7 A regional distribution diagram of the color filter substrate according to an embodiment of the present disclosure is shown;

[0059] Figure 8 Shown is Figure 7 A partial cross-sectional view along the A-A section line in;

[0060] Figure 9 Shown is Figure 7 A partial top view along the A-A section line in;

[0061] Figure 10 Shown is Figure 7 A partial cross-sectional view along the B-B section line in;

[0062] Figure 11 Shown Figure 7 A partial top view along the B-B section line in;

[0063] Figure 12 Shown is Figure 8 A partial enlarged view of the dashed box in;

[0064] Figure 13 Shown is Figure 12 A partial enlarged view of the dashed box in;

[0065] Figure 14 Shows a cross-sectional schematic view of the upper and lower border sides of the display panel according to an embodiment of the present disclosure;

[0066] Figure 15 Shows a cross-sectional schematic view of the left and right border sides of the display panel according to an embodiment of the present disclosure;

[0067] Figure 16 Shows a schematic layout diagram of the cross-section of a support column according to an embodiment of the present disclosure;

[0068] Figure 17 Shows Figure 16 The corresponding top-view layout diagram of the support column;

[0069] Figure 18 Shows a schematic layout diagram of the cross-section of a support dam according to an embodiment of the present disclosure;

[0070] Figure 19 Shows Figure 18 The corresponding top-view layout diagram of the support dam;

[0071] Figure 20 Shows a schematic layout diagram of the cross-section of a support column and a support dam according to an embodiment of the present disclosure;

[0072] Figure 21 Shows Figure 20 The corresponding top-view layout diagram of the support column and the support dam;

[0073] Figure 22 Shows Figure 15 The corresponding top-view layout diagram of the support column and the support dam. Detailed implementation manners

[0074] Hereinafter, exemplary embodiments of the present disclosure will be described in more detail with reference to the accompanying drawings. Although the exemplary embodiments of the present disclosure are shown in the drawings, it should be understood that the present disclosure can be implemented in various forms and should not be limited by the embodiments set forth herein. On the contrary, these embodiments are provided so that the present disclosure can be more thoroughly understood and the scope of the present disclosure can be fully conveyed to those skilled in the art. It should be noted that the term "a plurality" as used herein includes two or more.

[0075] As used herein, "about", "substantially", "approximately" or "essentially" includes the stated value and the average value within an acceptable deviation range of the specific value, where the acceptable deviation range is determined by those of ordinary skill in the art considering the measurement being discussed and the error associated with the measurement of the specific quantity (i.e., the limitations of the measurement system).

[0076] As used herein, "parallel", "perpendicular", and "equal" include the stated cases and cases similar to the stated cases, where the similar cases are within an acceptable deviation range, and the acceptable deviation range is determined by a person of ordinary skill in the art considering the measurements being discussed and the errors associated with the measurements of specific quantities (i.e., the limitations of the measurement system). For example, "parallel" includes absolute parallelism and approximate parallelism, where the acceptable deviation range for approximate parallelism can be, for example, within 5° deviation; "perpendicular" includes absolute perpendicularity and approximate perpendicularity, where the acceptable deviation range for approximate perpendicularity can also be, for example, within 5° deviation. "Equal" includes absolute equality and approximate equality, where the acceptable deviation range for approximate equality can be, for example, that the difference between the two equal values is less than or equal to 5% of either one of them.

[0077] It should be understood that when a layer or element is referred to as being on another layer or substrate, it can be that the layer or element is directly on the other layer or substrate, or there can be an intermediate layer between the layer or element and the other layer or substrate.

[0078] LCD (Liquid Crystal Display) products are one of the most common display technologies currently, with a wide range of application fields, including but not limited to handheld LCD products, in-vehicle LCD products, large-size LCD products (such as TV (Television) products), etc. In the following embodiments of the present disclosure, TV products are taken as an example for illustration.

[0079] See Figure 1 , which shows a schematic diagram of the regional distribution of a display panel.

[0080] As Figure 1 shown, LCD products can be divided into a display area 11 (AA area, Active area) and a border area 12 according to regions. The border area 12 is divided into an upper border 121, a lower border 122, a left border 123, and a right border 124. Among them, the lower border 122 is provided with a DP (Date Pad, data trace side), including a glass electrode side for bonding external electronic devices (such as a driving IC and a flexible circuit board); the upper border 121 is provided with a DPO (Date Pad Opposite, data trace opposite side), including a Gate (gate) metal trace area; the left border 123 and / or the right border 124 are provided with a GOA (Gate on Array, gate driver integration area 143), and this area is provided with a Gate (gate metal layer), an SD (source-drain metal layer), an Active (active layer), and a passivation layer.

[0081] See Figures 2 to 4 , Figure 2Shows a partial cross-sectional schematic diagram of the lower border 122 to the AA area of the display panel in the related art; Figure 3 Shows a partial cross-sectional schematic diagram of the upper border 121 to the AA area of the display panel in the related art; Figure 4 Shows a partial cross-sectional schematic diagram of the left border 123 or the right border 124 to the AA area of the display panel in the related art.

[0082] In the related art, the display panel includes a color filter substrate 13 and an array substrate 14, and a liquid crystal layer (not shown) disposed between the color filter substrate 13 and the array substrate 14. The display panel includes a display area 11 (AA area) and a border area 12, and the border area 12 is disposed around the display area 11;

[0083] The color filter substrate 13 includes:

[0084] A first substrate layer 131;

[0085] A light-shielding layer 132 (e.g., BM, Black Matrix) located on one side of the first substrate layer 131. The light-shielding layer 132 is located in the AA area and the border area 12. The light-shielding layer 132 in the AA area includes a plurality of spaced light-shielding structures 1321;

[0086] A plurality of color-resist structures 133 are disposed above the light-shielding layer 132 in the AA area at intervals;

[0087] A planarization layer 134 (OC layer, Overcoating) covering the color-resist structures 133 and the light-shielding layer 132 in the border area 12;

[0088] A plurality of spacers are located above the planarization layer 134 in the AA area. In the direction perpendicular to the first substrate layer 131, the positions of the spacers correspond to the light-shielding structures 1321. The spacers include main spacers 1351 and sub-spacers 1352. The thickness of the main spacers 1351 is greater than that of the sub-spacers 1352. The main spacers 1351 are usually smaller in size, and the sub-spacers 1352 are usually larger in size than the main spacers 1351;

[0089] A plurality of support pillars 136 are located above the planarization layer 134 in the border area 12. The support pillars 136 are usually of the same layer, material, and size as the main spacers 1351;

[0090] The array substrate 14 includes:

[0091] A second substrate layer 141;

[0092] The spacer occupation part 142 located above the second substrate layer 141, in the direction perpendicular to the second substrate layer 141, the positions of the spacers correspond to those of the spacer occupation part 142. As can be seen from the figure, the surface height of the array substrate 14 at the position of the spacer occupation part 142 is greater than that at other positions (except the GOA, Gate On Array, gate driving integration area 143) of the surface of the array substrate 14.

[0093] During the alignment process of the color filter substrate 13 and the array substrate 14, the movement and contact of the color filter substrate 13 and the array substrate 14 may cause deformation of the substrates, and the generated stress cannot be released internally. Therefore, it is necessary to set the main spacers 1351, and utilize the free flow of the liquid crystal layer between the main spacers 1351 to release the stress to restore the deformation. Usually, the size of the main spacers 1351 is small and just contacts the surface of the array substrate 14, playing a certain supporting role for the AA area. When the display panel is deformed more due to force, since the size of the main spacers 1351 is small and the supporting force is limited, when the display panel is stressed and the cell gap in the AA area between the color filter substrate 13 and the array substrate 14 becomes smaller, the auxiliary spacers 1352 can be used to provide the supporting force. Therefore, usually the size of the auxiliary spacers 1352 is large.

[0094] In the AA area, each pixel unit usually includes three color resist structures 133, namely the R (red) color resist structure 133, the G (green) color resist structure 133, and the B (blue) color resist structure 133. In order to improve the color gamut of the color resist structure 133, the thickness of the color resist structure 133 is usually prepared relatively thick, and in order to save costs, the thickness of the BM is usually prepared relatively thin. For example, the thickness of the color resist structure 133 is 2μm and the thickness of the BM is 0.7μm. Thus, the thickness difference between the color resist structure 133 and the BM is large. Then, when the support pillars 136 in the border area 12 are prepared on the BM in the border area 12, the distance (L1) from the support pillars 136 in the border area 12 to the first substrate layer 131 is much smaller than the distance (L2) from the main spacers 1351 in the display area 11 to the first substrate layer 131, that is, the step difference between the two is large, so that the support pillars 136 are actually difficult to effectively contact the surface of the opposite array substrate 14, and thus it is difficult to play a supporting role.

[0095] See Figure 5 and Figure 6 , Figure 5 shows the cell gap difference curve graph from the border area 12 to the AA area in the related art; Figure 6 shows the schematic diagram of display defects of the display panel in the related art.

[0096] Such as Figure 5As shown above, based on the above, the distance (L1) from the support pillar 136 in the border area 12 to the first substrate layer 131 is much smaller than the distance (L2) from the main spacer 1351 in the display area 11 to the first substrate layer 131. That is, when the step difference between the two is large, during the cell formation process or during the use of the display panel after cell formation, if the border area 12 is subjected to a large pressure, since the support pillar 136 in the border area 12 is difficult to provide effective support, the cell thickness in the border area 12 is too low, and even affects the cell thickness at the AA edge position to be too low. Due to the transmission of force, further in the area near the edge position in the AA area (such as Figure 5 the area a) corresponding to the dashed line frame Figure 6 warped up and the cell thickness is too high. When the cell thickness is too high, due to the different increasing ratios of the transmittance of the color resist structures 133 of the three colors RGB, it is shown that the increasing ratios of the transmittance of red and green are relatively small, and the increasing ratio of the transmittance of blue is relatively large, resulting in a problem of yellowish display in this area (such as

[0097] the area a) corresponding to the dashed line frame in

[0098] ), causing poor display. In addition, at the edge position where the border area 12 and the AA area meet, it may also cause the transmittance of the RGB color resist structure 133 to be too low due to the low cell thickness, resulting in a problem of dimmer brightness at the edge position of the AA area, further affecting the display effect. In addition, when the cell thickness in the AA area is too high or too low, the liquid crystal layer in the AA area will be distorted, affecting the propagation of light (the light cannot be deflected in the established direction), and then causing a problem of light leakage.

[0099] In view of this, the embodiments of the present disclosure provide a color filter substrate, so as to at least improve the cell thickness uniformity between the color filter substrate and the array substrate, avoid the area near the edge position of the display area from warping up and having a too high cell thickness, and avoid the problem of yellowish display in this area, and improve the display effect. Figures 7 - 10 , Figure 7 shows the area distribution diagram of the color filter substrate according to the embodiments of the present disclosure, Figure 8 shows Figure 7 the partial cross-sectional schematic diagram along the A-A section line in Figure 9 shows Figure 7 the partial top view along the A-A section line in Figure 10 shows Figure 7 the partial cross-sectional schematic diagram along the B-B section line in Figure 11 shows Figure 7 the partial top view along the B-B section line in Figure 12 shows Figure 8 the partial enlarged view in the dashed line frame of Figure 13 shows Figure 12A partial enlarged view within the dashed box.

[0100] In the first aspect of the embodiments of the present disclosure, a color filter substrate 21 is provided, including: a display area 211 and a border area 212 surrounding the display area 21. The color filter substrate 21 further includes:

[0101] A first substrate layer 213;

[0102] A color filter layer 214 and a light-shielding layer, located on one side of the first substrate layer 213. The color filter layer 214 includes a plurality of color-resist structures of different colors located in the display area 211. The light-shielding layer includes a first light-shielding structure 2151 disposed between two adjacent color-resist structures and a second light-shielding structure 2152 covering the border area 212;

[0103] Among them, the light-shielding layer is, for example, a BM layer, which is arranged at intervals in the display area 211 and integrally arranged in the border area 212. The plurality of color-resist structures of different colors in the color filter layer 214 may include color-resist structures of three colors, namely RGB. The BM in the display area 211 is located between two adjacent color-resist structures.

[0104] In some embodiments, in the direction perpendicular to the first substrate layer 213, the value range of the average thickness of the plurality of color-resist structures may be 1.83 - 2.00 μm. For example: the average thickness of the plurality of color-resists may be 1.83 μm, or 2.00 μm, or 1.90 μm, etc.

[0105] A first spacer layer 216, located on the side of the second light-shielding structure 2152 away from the first substrate layer 213 and in the border area 212. The first spacer layer 216 includes a plurality of spaced-apart spacer structures 2161;

[0106] Among them, the plurality of spaced-apart spacer structures 2161 in the first spacer layer 216 may be prepared with the same layer and the same material as at least one color of the color-resist structure. For example: a plurality of spacer structures 2161 are all of the same layer and the same material as the R color-resist structure, a plurality of spacer structures 2161 are all of the same layer and the same material as the G color-resist structure, a plurality of spacer structures 2161 are all of the same layer and the same material as the B color-resist structure, a plurality of spacer structures 2161 are of the same layer and the same material as at least two colors of the color-resist structures, or a plurality of spacer structures 2161 are of the same layer and the same material as the color-resist structures of the three colors RGB. Specifically, it can be prepared according to requirements and is not limited herein.

[0107] Since the B color filter structure is usually the first to be fabricated among the RGB color filter structures and the human eye is the least sensitive to the B color filter structure, generally, the B color filter structure has the smallest thickness among the color filter structures of the three colors (it can be understood that the thickness difference between the color filter structures of the three colors is also relatively small). Therefore, when the elevation structure 2161 in the border area 212 is fabricated on the same layer as the B color filter structure, the color difference from the BM is not obvious and the thickness difference from the BM is the smallest. Thus, in some embodiments, the elevation structure 2161 and the B color filter structure are of the same layer and the same material.

[0108] During the fabrication process, three different mask plates can be used to separately fabricate the color filter structures of different colors. In the mask plate for fabricating the red sub-pixel color filter, a pattern corresponding to the elevation structure 2161 is provided within the border area 212. Based on the same principle, patterns of the elevation structure 2161 can be provided in the mask plates for fabricating the color filter structures of blue and green, so that the elevation structure 2161 in the border area 212 is fabricated while fabricating the color filter structures in the display area 211.

[0109] In some embodiments, the elevation structure 2161 can also be of the same layer and the same material as other film layers. For example, it can be of the same layer and the same material as the light-shielding layer or the planarization layer 217. Or, the elevation structure 2161 can be separately fabricated in the border area 212 using a patterning process, which is not limited herein.

[0110] In some embodiments, in the direction of the border area 212 facing the display area 211, the ratio range of the width of the elevation structure 2161 to the width of the gap 2162 between two adjacent elevation structures 2161 is: 1.5 - 4. For example, the ratio of the width of the elevation structure 2161 to the width of the gap 2162 between two adjacent elevation structures 2161 is 1.5, or the ratio of the width of the elevation structure 2161 to the width of the gap 2162 between two adjacent elevation structures 2161 is 4, the ratio of the width of the elevation structure 2161 to the width of the gap 2162 between two adjacent elevation structures 2161 is 2, or the ratio of the width of the elevation structure 2161 to the width of the gap 2162 between two adjacent elevation structures 2161 is 3.

[0111] The planarization layer 217 covers the side of the color filter layer 214 and the first elevation layer 216 away from the first substrate layer 213, and fills the gaps between two adjacent color filter structures and the gap 2162 between two adjacent elevation structures 2161. In the direction perpendicular to the first substrate layer 213, the thickness of the planarization layer 217 covering the elevation structure 2161 is less than the thickness of the planarization layer 217 covering the color filter structure, as Figure 12As shown, the thickness (L1) of the planarization layer 217 covering the elevation structure 2161 is less than the thickness (L2) of the planarization layer 217 covering the color resist structure.

[0112] As Figure 12 shown, when the elevation structure 2161 and the color resist structure are of the same layer and the same material, due to the presence of the BM in the border area 212, in the direction perpendicular to the first substrate layer 213, the distance (D1) between the side of the elevation structure 2161 away from the first substrate layer 213 and the first substrate layer 213 is greater than the distance (D2) between the side of the color resist structure away from the first substrate layer 213 and the first substrate layer 213. Thus, the distance between the planarization layer 217 on the elevation structure 2161 and the first substrate layer 213 is theoretically greater than the distance between the planarization layer 217 on the color resist structure and the first substrate layer 213. In the embodiment of the present application, the thickness of the planarization layer 217 in the border area 212 is adjusted through the gap 2162 between the elevation structures 2161, so that the thickness (L1) of the planarization layer 217 covering the elevation structure 2161 is less than the thickness (L2) of the planarization layer 217 covering the color resist structure, thereby making the distance (L1 + D1) between the planarization layer 217 on the elevation structure 2161 and the first substrate layer 213 substantially the same as the distance (L2 + D2) between the planarization layer 217 on the color resist structure and the first substrate layer 213, providing a basis for subsequent adjustment of the cell thickness uniformity between the color filter substrate 21 and the array substrate 22.

[0113] During the manufacturing process, by adjusting the size of the gap 2162 between two adjacent elevation structures 2161, for example, the ratio range of the width of the elevation structure 2161 to the width of the gap 2162 between two adjacent elevation structures 2161 is 1.5 - 4, the step difference between the planarization layer 217 covering the color filter layer 214 and the planarization layer 217 covering the first elevation layer 216 can be adjusted. It can be understood that the larger the gap 2162, the more material of the planarization layer 217 is used to fill the gap 2162, and the smaller the thickness of the planarization layer 217 covering the elevation structure 2161. Conversely, the smaller the gap 2162, the less material of the planarization layer 217 is used to fill the gap 2162, and the larger the thickness of the planarization layer 217 covering the elevation structure 2161. Thus, by reasonably setting the size of the gap 2162, the thickness of the planarization layer 217 covering the elevation structure 2161 can be made less than the thickness of the planarization layer 217 covering the color resist structure.

[0114] In some embodiments, in a direction perpendicular to the first substrate layer 213, the total thickness of the second light-shielding structure 2152, the heightening structure 2161, and the planar layer 217 covering the heightening structure 2161 is substantially the same as the total thickness of the color resist structure and the planar layer 217 covering the color resist structure.

[0115] As Figure 12 shown, after the thickness (L1) of the planar layer 217 covering the heightening structure 2161 is less than the thickness (L2) of the planar layer 217 covering the color resist structure, it can be ensured that in a direction perpendicular to the first substrate layer 213, the total thickness (L1 + D1) of the second light-shielding structure 2152, the heightening structure 2161, and the planar layer 217 covering the heightening structure 2161 is substantially the same as the total thickness (L2 + D2) of the color resist structure and the planar layer 217 covering the color resist structure, thereby providing a basis for subsequent adjustment of the cell thickness uniformity between the color film substrate 21 and the array substrate 22.

[0116] In some embodiments, the planar layer 217 covering the side of the first heightening layer 216 away from the first substrate layer 213 includes: a convex portion 217A covering the heightening structure 2161 and a concave portion 217B filling the gap 2162 between two adjacent heightening structures 2161; the distance between the end face of the concave portion 217B away from the first substrate layer 213 and the first substrate layer 213 is less than the distance between the end face of the convex portion 217A away from the first substrate layer 213 and the first substrate layer 213, and the difference range therebetween is: 0.1 μm - 0.2 μm. For example, the difference therebetween is 0.1 μm, 0.2 μm, or 0.15 μm.

[0117] As Figure 13 shown, during the manufacturing process, after the material of the planar layer 217 fills the gap 2162 between two adjacent heightening structures 2161, the planar layer 217 at the position of the gap 2162 is in a concave shape, and the planar layer 217 at the position of the heightening structure 2161 is in a convex shape. The size of the gap 2162 between two adjacent heightening structures 2161 can adjust the amount of the material of the planar layer 217 filled at the position of the gap 2162, and further adjust the step difference between the concave portion 217B and the convex portion 217A, for example, adjust it to: 0.1 μm - 0.2 μm. Within this difference range, it can better provide a basis for subsequent adjustment of the cell thickness uniformity between the color film substrate 21 and the array substrate 22.

[0118] Spacers 218 are located on the side of the planar layer 217 in the display area 211 away from the first substrate layer 213;

[0119] The spacer 218 includes a main spacer 2181 and a sub-spacer 2182. The main spacer 2181 and the sub-spacer 2182 are located on the side of the flat layer 217 that fills the gap 2162 between two adjacent color resist structures and is away from the first substrate layer 213. In the direction perpendicular to the first substrate layer 213, the thickness of the main spacer 2181 is greater than that of the sub-spacer 2182. Generally, the size of the main spacer 2181 is small and just contacts the surface of the array substrate 22, so as not to affect the free flow of the liquid crystal layer in the AA area to release stress. The sub-spacer 2182 usually has a larger size and provides a supporting force after the color filter substrate 21 in the AA area is pressed and deformed.

[0120] Exemplarily, in the direction perpendicular to the first substrate layer 213, the thickness range of the main spacer 2181 is 2.43 - 2.93 μm, and the thickness difference between the main spacer 2181 and the sub-spacer 2182 is about 0.50 μm.

[0121] In some embodiments, in the direction of the border area 212 towards the display area 211, the diameter range of the end face of the main spacer 2181 away from the first substrate layer 213 is 15 μm to 25 μm, such as 15 μm, 25 μm, or 20 μm. Thus, when the main spacer 2181 contacts the array substrate 22, due to the small diameter of the end face, the contact area with the array substrate 22 is also small, and further does not affect the free flow of the liquid crystal layer in the AA area to release stress.

[0122] The support 219 is located on the side of the flat layer 217 in the border area 212 that is away from the first substrate layer 213. The distance between the end face of the support 219 away from the first substrate layer 213 and the first substrate layer 213 is basically the same as the distance between the end face of the spacer 218 away from the first substrate layer 213 and the first substrate layer 213.

[0123] The support 219 and the spacer 218 are of the same layer and the same material. For example, in the manufacturing process, the spacer 218 and the support 219 are prepared by negative photoresist exposure, and the exposed areas will remain on the color filter substrate 21. By setting different opening shapes, different shapes and sizes of the spacer 218 and different shapes and sizes of the support 219 can be obtained.

[0124] The support 219 may include support columns 2191 and / or support dams 2192.

[0125] The support pillar 2191 can be of the same layer, same material, and same size as the main spacer 2181. During the manufacturing process, the main support pillar 2191 and the main spacer 2181 can be fabricated using the same lithography process, thereby saving process steps and reducing manufacturing costs. The size of the support pillar 2191 is small, and its contact area with the array substrate 22 is also small. Therefore, in order to ensure that the border region 212 has sufficient supporting force, when the support 219 includes the support pillar 2191, a relatively large number of support pillars 2191 can be provided in the border region 212. For example, at least one support pillar 2191 can be correspondingly provided at the position of every three heightening structures 2161, or, among every three heightening structures 2161, at least one support pillar 2191 can be correspondingly provided at the position of a gap 2162 between two adjacent heightening structures 2161, or, one support pillar 2191 can be correspondingly provided at the position of each heightening structure 2161, or, one support pillar 2191 can be correspondingly provided at the position of each gap 2162, etc. No limitation is made here.

[0126] In some embodiments, the support pillar 2191 is located on the side of the convex portion 217A away from the first substrate layer 213, and the orthographic projection of the support pillar 2191 on the first substrate layer 213 is located within the orthographic projection of the heightening structure 2161 on the first substrate layer 213, and / or

[0127] The support pillar 2191 is located on the side of the concave portion 217B away from the first substrate layer 213, and the orthographic projection of the support pillar 2191 on the first substrate layer 213 is located between the orthographic projections of two adjacent heightening structures 2161 on the first substrate layer 213.

[0128] It can be understood that the size of the support pillar 2191 is small. Therefore, when the support pillar 2191 is located on the side of the concave portion 217B away from the first substrate layer 213, the orthographic projection of the support pillar 2191 on the first substrate layer 213 is located within the orthographic projection of the heightening structure 2161 on the first substrate layer 213. When the support pillar 2191 is located on the side of the concave portion 217B away from the first substrate layer 213, the orthographic projection of the support pillar 2191 on the first substrate layer 213 is located between the orthographic projections of two adjacent heightening structures 2161 on the first substrate layer 213.

[0129] Exemplarily, the shape of the orthographic projection of the support pillar 2191 on the first substrate layer 213 is circular, square, or elliptical, which is specifically set according to application requirements and no limitation is made here.

[0130] The support dam 2192 can be of the same layer and the same material as the spacer 218 but with different sizes. During the manufacturing process, the support dam 2192 can be prepared by exposure and development using a separate opening shape, so as to obtain a support dam 2192 with a larger size, and thus can have a larger contact area with the surface of the array substrate 22, providing stronger support force in the border area 212.

[0131] In some embodiments, the support 219 includes a support dam 2192, and the support dam 2192 is located on a side of the convex portion 217A away from the first substrate layer 213, and / or, the support dam 2192 is located on a side of the concave portion 217B away from the first substrate layer 213;

[0132] Wherein, the longest side of the orthographic projection of the support dam 2192 on the first substrate layer 213 is greater than or equal to the shortest side of the orthographic projection of the heightening structure 2161 on the first substrate.

[0133] As Figure 9 or Figure 11 shown, the longest side of the orthographic projection of the support dam 2192 on the first substrate layer 213 is S1, and the shortest side of the orthographic projection of the heightening structure 2161 on the first substrate is S2. It can be understood that this longest side S1 can to a certain extent represent the support range of the support dam 2192. When the longest side of the orthographic projection of the support dam 2192 on the first substrate layer 213 is greater than or equal to the shortest side of the orthographic projection of the heightening structure 2161 on the first substrate, it indicates that the support range of the support dam 2192 is larger, can have a larger contact area with the array substrate 22, and thus provides stronger support force.

[0134] Exemplarily, the ratio range between the longest side of the orthographic projection of the support dam 2192 on the first substrate layer 213 and the shortest side of the orthographic projection of the heightening structure 2161 on the first substrate layer 213 is: 1 - 3. Thus, the support dam 2192 can provide good support force within this ratio range.

[0135] Exemplarily, the ratio range between the shortest side of the orthographic projection of the support dam 2192 on the first substrate layer 213 and the longest side of the orthographic projection of the heightening structure 2161 on the first substrate layer 213 is: 1 / 10 - 1 / 3, for example, 1 / 5. Wherein, the value range of the shortest side of the orthographic projection of the support dam 2192 on the first substrate layer 213 can be 25 - 50 μm. Thus, the support dam 2192 can provide good support force within this ratio range.

[0136] It should be noted that when the support 219 only includes the support dam 2192, only the border area 212 provides support force through the support dam 2192 only. Then, in the direction perpendicular to the first substrate layer 213, the distance between the end face of the support dam 2192 away from the first substrate layer 213 and the first substrate layer 213 is substantially the same as the distance between the end face of the main spacer 2181 away from the first substrate layer 213 and the first substrate layer 213.

[0137] In some embodiments, the support 219 includes a support column 2191 and a support dam 2192. In the direction perpendicular to the first substrate layer 213, the thickness of the support column 2191 is greater than the thickness of the support dam 2192. The end face of the support 219 away from the first substrate layer 213 is the end face of the support column 2191 away from the first substrate layer 213, and the support column 2191 has the same size as the main spacer 2181; the end face of the spacer 218 away from the first substrate layer 213 is the end face of the main spacer 2181 away from the first substrate layer 213.

[0138] As Figure 12 shown, the distance (D3) between the end face of the support 219 away from the first substrate layer 213 and the first substrate layer 213 and the distance (D3) between the end face of the spacer 218 away from the first substrate layer 213 and the first substrate layer 213 being substantially the same can be: D3 is equal to D4, or, D3 is less than D4, D3 is greater than D4, etc. At this time, the difference between D3 and D4 is within an acceptable deviation range, where the acceptable deviation range can be determined by those of ordinary skill in the art considering the measurements under discussion and the errors associated with the measurements of specific quantities (i.e., the limitations of the measurement system).

[0139] In specific implementation, the heightening structure 2161 and the support 219 can be provided in the border area 212 on at least one side of the display area 211 according to the light leakage situation and yellowing situation of the display area 211. For example, if the display area 211 has a light leakage phenomenon only at the edge of one side, the heightening structure 2161 and the support 219 can be provided only in the border area 212 on that side. Another example is that if the display area 211 has a display yellowing phenomenon only in the area near the edge of one side, the heightening structure 2161 and the support 219 can be provided only in the border area 212 on that side. In some cases, the heightening structure 2161 and the support 219 are provided in the border area 212 on each side of the display area 211.

[0140] Based on the above - disclosed content, the color - filter substrate 21 provided by the embodiments of the present disclosure is provided with a first cushion layer 216 in the border area 212. The first cushion layer 216 includes a plurality of spaced - apart cushion structures 2161. When the planar layer 217 covers the color - filter layer 214 and the first cushion layer 216, the step difference between the planar layer 217 covering the color - filter layer 214 and the planar layer 217 covering the first cushion layer 216 can be adjusted through the gap 2162 between two adjacent cushion structures 2161. It can be understood that the larger the gap 2162, the more material of the planar layer 217 is used to fill the gap 2162, and the smaller the thickness of the planar layer 217 covering the cushion structure 2161. On the contrary, the smaller the gap 2162, the less material of the planar layer 217 is used to fill the gap 2162, and the larger the thickness of the planar layer 217 covering the cushion structure 2161. Thus, by reasonably setting the size of the gap 2162, the thickness of the planar layer 217 covering the cushion structure 2161 can be made smaller than the thickness of the planar layer 217 covering the color - resist structure, and further, the distance between the end face of the support 219 away from the first substrate layer 213 and the first substrate layer 213 is basically the same as the distance between the end face of the spacer 218 away from the first substrate layer 213 and the first substrate layer 213. Then, after the color - filter substrate 21 and the array substrate 22 are aligned, the distance from the end face of the support 219 to the surface of the array substrate 22 can be basically the same as the distance from the end face of the spacer 218 to the surface of the array substrate 22. Since the spacer 218 usually contacts the surface of the array substrate 22, the support 219 can play a good supporting role. By improving the cell - thickness uniformity between the color - filter substrate 21 and the array substrate 22, it is possible to avoid the problem that the area near the edge of the display area 211 warps upward and the cell thickness is too high, and the problem of yellowish display in this area, thereby improving the display effect. At the same time, by improving the cell - thickness uniformity between the color - filter substrate 21 and the array substrate 22, it is possible to avoid the problem of light leakage caused by the twisting of the liquid crystal in the display area 211.

[0141] Figure 14 FIG. 4 shows a cross - sectional schematic view of the upper and lower border sides of the display panel according to the embodiments of the present disclosure; Figure 15 FIG. 6 shows a cross - sectional schematic view of the left and right border sides of the display panel according to the embodiments of the present disclosure.

[0142] According to the second aspect of the embodiments of the present disclosure, a display panel is provided, which includes any one of the color - filter substrates 21, and further includes an array substrate 22 disposed opposite to the color - filter substrate 21, and a liquid - crystal layer (not shown) located between the color - filter substrate 21 and the array substrate 22. Among them, the structures and principles of the array substrate 22 and the liquid - crystal layer can refer to the related art and will not be elaborated here.

[0143] Optionally, the array substrate 22 includes:

[0144] The second buffer layer 221;

[0145] The spacer occupation part 222 is located on one side of the second buffer layer 221 close to the first buffer layer 213 and in the display area 211;

[0146] The orthographic projection of the spacer 218 on the second buffer layer 221 and the orthographic projection of the spacer occupation part 222 on the second buffer layer 221 at least partially overlap.

[0147] It can be understood that, as Figure 15 shown, due to the existence of the spacer occupation part 222, the surface height of the array substrate 22 at the position of the spacer occupation part 222 is greater than that at other positions of the surface of the array substrate 22 (except for the GOA, Gate On Array, gate driving integration area 227). Then, when the distance between the end face of the spacer 218 and the first buffer layer 213 is basically the same as the distance between the support 219 and the first buffer layer 213, if the end face of the spacer 218 just contacts the surface of the spacer occupation part 222, there is still a certain reserved distance between the end face of the support 219 and the surface of the array substrate 22 in the border area 212, that is, close to but not contacting the surface of the array substrate 22. Thus, on the one hand, it can ensure that the support 219 in the border area 212 plays a supporting role. On the other hand, the reserved distance enables the liquid crystal to flow freely more easily to recover the elastic deformation when the border area 212 is stressed and deformed slightly. On the third hand, it is to prevent the force transmission after contacting and compressing with the array substrate 22 and affecting the release of the internal force.

[0148] To facilitate understanding of the differences brought about by different layouts of the support columns 2191 and / or support dams 2192 between the color filter substrate 21 and the array substrate 22, hereinafter, taking the border area 212 provided with the GOA area as an example, the layouts of the support columns 2191 and / or support dams 2192 in multiple situations shown in multiple attached drawings will be described.

[0149] See Figure 16 , which shows a schematic cross-sectional layout diagram of a support column 2191 according to an embodiment of the present disclosure; see Figure 17 , which shows Figure 16 the corresponding schematic top view layout of the support column 2191.

[0150] In some embodiments, the planar layer 217 covering the side of the first cushion layer 216 away from the first buffer layer 213 includes: a convex portion 217A covering the convex portion 2161 of the cushioning structure 2161 and a concave portion 217B filling the gap 2162 between two adjacent cushioning structures 2161;

[0151] The support 219 includes a support column 2191, the support column 2191 is located on a side of the convex portion 217A away from the first substrate layer 213, and a positive projection of the support column 2191 on the first substrate layer 213 is located within a positive projection of the heightening structure 2161 on the first substrate layer 213; and / or

[0152] The support column 2191 is located on a side of the concave portion 217B away from the first substrate layer 213, and a positive projection of the support column 2191 on the first substrate layer 213 is located between positive projections of two adjacent heightening structures 2161 on the first substrate layer 213.

[0153] It can be seen from Figure 15 and 16 that when only the support column 2191 is used for the support 219 in the border area 212, in order to ensure that the border area 212 has sufficient supporting force, support columns 2191 are provided at positions corresponding to at least one of the three color resistor structures; in addition, when the heightening structures 2161 are all of the same layer and the same material as the B color resistor structure, since the thickness of the B color resistor structure is small, when the gap 2162 between the heightening structures 2161 is small, the thickness difference between the convex portion 217A on the heightening structure 2161 and the concave portion 217B located on the gap 2162 is small. Therefore, support columns 2191 can also be provided at the position of the concave portion 217B, or support columns 2191 can be provided at the positions of both the convex portion 217A and the concave portion 217B, which can be specifically set according to requirements and are not limited herein.

[0154] Referring to Figure 18 , a schematic cross-sectional layout diagram of a support dam 2192 according to an embodiment of the present disclosure is shown; referring to Figure 19 , it shows Figure 18 a corresponding top view layout diagram of the support dam 2192.

[0155] In some embodiments, the flat layer 217 covering a side of the first heightening layer 216 away from the first substrate layer 213 includes: a convex portion 217A covering the heightening structure 2161 and a concave portion 217B filling the gap 2162 between two adjacent heightening structures 2161;

[0156] The support 219 includes a support dam 2192, the support dam 2192 is located on a side of the convex portion 217A away from the first substrate layer 213, and / or, the support dam 2192 is located on a side of the concave portion 217B away from the first substrate layer 213;

[0157] The longest side of the orthographic projection of the support dam 2192 on the first liner layer 213 is greater than or equal to the shortest side of the orthographic projection of the heightening structure 2161 on the first substrate.

[0158] In specific implementation, the support 219 includes a plurality of support dams 2192. When the longest side of the orthographic projection of the support dam 2192 on the first liner layer 213 is greater than the short side of the orthographic projection of the heightening structure 2161 on the first liner layer 213, the plurality of support dams 2192 are simultaneously located on the side of the convex portion 217A and the concave portion 217B away from the first liner layer 213. Since the support dam 2192 has strong supporting force, when only the support dam 2192 is provided, a smaller number of support dams 2192 can be provided; when the longest side of the orthographic projection of some of the support dams 2192 on the first liner layer 213 is equal to the short side of the orthographic projection of the heightening structure 2161 on the first liner layer 213, and the longest side of the orthographic projection of the other support dams 2192 on the first liner layer 213 is greater than the short side of the orthographic projection of the heightening structure 2161 on the first liner layer 213, this part of the support dams 2192 is located on the side of the convex portion 217A, and the other support dams 2192 are simultaneously located on the side of the convex portion 217A and the concave portion 217B away from the first liner layer 213. Since the support dam 2192 has strong supporting force, when only the support dam 2192 is provided, a smaller number of support dams 2192 can be provided.

[0159] See Figure 20 , Figure 20 shows a schematic cross-sectional layout diagram of a support column 2191 and a support dam 2192 according to an embodiment of the present disclosure; see Figure 21 shows Figure 20 the corresponding schematic top view layout diagram of the support column 2191 and the support dam 2192.

[0160] In some embodiments, the flat layer 217 covering the side of the first heightening layer 216 away from the first liner layer 213 includes: covering the convex portion 217A of the heightening structure 2161 and filling the concave portion 217B in the gap 2162 between two adjacent heightening structures 2161;

[0161] The support 219 includes: a support column 2191 and a support dam 2192. In the direction perpendicular to the first liner layer 213, the thickness of the support column 2191 is greater than the thickness of the support dam 2192, and the end face of the support 219 away from the first liner layer 213 is the end face of the support column 2191 away from the first liner layer 213;

[0162] The support pillar 2191 is located on a side of the convex portion 217A away from the first substrate layer 213, and a positive projection of the support pillar 2191 on the first substrate layer 213 is located within a positive projection of the heightening structure 2161 on the first substrate layer 213;

[0163] The support dam 2192 is located on a side of the concave portion 217B away from the first substrate layer 213, and the longest side of a positive projection of the support dam 2192 on the first substrate layer 213 is greater than or equal to the shortest side of a positive projection of the heightening structure 2161 on the first substrate.

[0164] See Figure 22 , which shows Figure 15 a schematic top view layout of the corresponding support pillar 2191 and support dam 2192.

[0165] In some embodiments, the flat layer 217 covering a side of the first heightening layer 216 away from the first substrate layer 213 includes: a convex portion 217A covering the heightening structure 2161 and a concave portion 217B filling a gap 2162 between two adjacent heightening structures 2161;

[0166] The support 219 includes: a support pillar 2191 and a support dam 2192. In a direction perpendicular to the first substrate layer 213, a thickness of the support pillar 2191 is greater than a thickness of the support dam 2192, and an end face of the support 219 away from the first substrate layer 213 is an end face of the support pillar 2191 away from the first substrate layer 213;

[0167] The support pillar 2191 and the support dam 2192 are located on a side of the convex portion 217A away from the first substrate layer 213, and a positive projection of the support pillar 2191 on the first substrate layer 213 is located within a positive projection of the heightening structure 2161 on the first substrate layer 213; and / or

[0168] The support pillar 2191 and the support dam 2192 are located on a side of the concave portion 217B away from the first substrate layer 213, and a positive projection of the support pillar 2191 on the first substrate layer 213 is located between positive projections of two adjacent heightening structures 2161 on the first substrate layer 213;

[0169] Wherein, the longest side of a positive projection of the support dam 2192 on the first substrate layer 213 is greater than or equal to the shortest side of a positive projection of the heightening structure 2161 on the first substrate.

[0170] Optionally, the array substrate 22 further includes:

[0171] The passivation layer 223 is located on the side of the second substrate layer 221 close to the first substrate layer 213, and is located in the display area 211 and the border area 212;

[0172] In the direction perpendicular to the second substrate layer 221, the distance between the end face of the support 219 away from the first substrate layer 213 and the surface of the passivation layer 223 in the border area 212 away from the second substrate layer 221 is: 0.1 μm - 0.3 μm, such as 0.1 μm, 0.3 μm, 0.2 μm, 0.25 μm, etc.

[0173] Thus, when the main support 219 in the display area 211 contacts the surface of the passivation layer 223, there is still a certain distance between the support 219 in the border area 212 and the surface of the passivation layer 223, so as to avoid the force at this place being transmitted to other positions after the support 219 directly contacts and compresses the surface of the passivation layer 223, which affects the release of internal stress.

[0174] Optionally, the array substrate 22 further includes:

[0175] The sealant 224 is located above the passivation layer 223 away from the second substrate layer 221, and is located in the border area 212. The orthographic projection of the support 219 on the second substrate layer 221 and the orthographic projection of the border sealant on the second substrate layer 221 do not overlap.

[0176] It can be understood that since the sealant 224 itself contains more doped components, there will be large particle impurities or a small amount of polymerized particles, and the relative size is relatively large. Therefore, the orthographic projection of the support 219 on the second substrate layer 221 and the orthographic projection of the border sealant on the second substrate layer 221 do not overlap, which can prevent excessive foreign objects in the sealant from causing excessive support and yellowing, and does not affect the diffusion of the sealant.

[0177] In addition, the orthographic projection of the support 219 on the second substrate layer 221 and the orthographic projection of the boundary between the display area 211 and the border area 212 on the second substrate layer 221 do not overlap, so as not to affect the diffusion of the alignment film, not to affect the diffusion of liquid crystal, and avoid yellowing caused by excessive support at the edge of the AA area.

[0178] Optionally, the array substrate 22 further includes:

[0179] The first metal layer 225 is located on the side of the second substrate layer 221 close to the first substrate layer 213, and is located in the display area 211 and the border area 212. The border area 212 is provided with a gate driving integration area 227. Among them, the first metal layer 225 can be a gate metal layer;

[0180] The second metal layer 226 is located on a side of the first metal layer 225 away from the second substrate layer 221 and is located in the display area 211 and the gate driver integration area 227 (GOA area). Among them, the second metal layer 226 can be a source-drain metal layer.

[0181] A positive projection of the support 219 on the second substrate layer 221 does not overlap with a positive projection of the second metal layer 226 located in the gate driver integration area 227 on the second substrate layer 221.

[0182] It can be understood that the GOA area is usually arranged in the border area 212 on one side or opposite sides of the display panel. The GOA area is used to arrange the gate metal layer driving circuit, etc. Therefore, the surface of the array substrate 22 at the position of the gate driver integration area 227 will bulge, and the cell thickness is relatively low. If the support 219 is arranged at the position corresponding to the GOA, it may cause the support 219 to be compacted with the surface of the GOA area, and then cause the force at this position to be transmitted to other positions, affecting the release of internal stress.

[0183] Therefore, based on the display panel provided by the embodiments of the present disclosure, between the color filter substrate 21 and the array substrate 22 provided with the cell, the distance from the end face of the support 219 to the surface of the array substrate 22 can be basically the same as the distance from the spacer 218 to the surface of the array substrate 22. Since the spacer 218 usually contacts the surface of the array substrate 22, the support 219 can play a good supporting role. By improving the cell thickness uniformity between the color filter substrate 21 and the array substrate 22, it is possible to avoid the problem that the area near the edge of the display area 211 warps upward and the cell thickness is too high, and the problem of yellowish display appears in this area, improving the display effect; at the same time, by improving the cell thickness uniformity between the color filter substrate 21 and the array substrate 22, it is possible to avoid the problem of light leakage caused by the twisting of the liquid crystal in the display area 211.

[0184] According to a third aspect of the embodiments of the present disclosure, a display device is provided. The display device includes the display panel provided in any of the above embodiments. Therefore, the display device has technical effects corresponding to the beneficial technical effects of the above display panel.

[0185] For example, the display device can be any electronic product or component with a display function such as a display screen, a mobile phone, a laptop computer, a tablet computer, a wearable display device (such as a smart watch, smart glasses, etc.), a television, a digital photo frame, etc.

[0186] In the above description, technical details such as the composition of each layer of the product are not elaborated in detail. However, those skilled in the art should understand that various technical means can be used to form layers, regions, etc. of the desired shape. Additionally, in order to form the same structure, those skilled in the art can also design methods that are not exactly the same as the methods described above. Although the embodiments are described separately above, this does not mean that the measures in each embodiment cannot be used advantageously in combination.

[0187] Furthermore, those of ordinary skill in the art should understand that: the discussion of any of the above embodiments is merely exemplary and is not intended to imply that the scope of the disclosure is limited to these examples; within the concept of the present disclosure, the technical features in the above embodiments or different embodiments can also be combined, the steps can be implemented in any order, and there are many other variations in different aspects of one or more embodiments of the present disclosure as described above, and for the sake of brevity, they are not provided in detail.

[0188] Although the preferred embodiments of the present disclosure have been described, those skilled in the art can make additional changes and modifications once they learn the basic creative concept. Therefore, the appended claims are intended to be construed to include the preferred embodiments as well as all changes and modifications that fall within the scope of the present disclosure.

Claims

1. A color film substrate, characterized in that: include: A display area and a frame area arranged around the display area, the color film substrate further comprising: a first substrate layer; A color filter layer and a light shielding layer, located on one side of the first substrate layer, the color filter layer includes a plurality of color blocking structures of different colors located in the display area, and the light shielding layer includes a first light shielding structure arranged between two adjacent color blocking structures and a second light shielding structure covering the frame area; A first cushioning layer is located at a side of the second light-shielding structure away from the first substrate layer and located in the frame area, and the first cushioning layer includes a plurality of cushioning structures arranged at intervals; a flat layer, covering the color filter layer and a side of the first padding layer away from the first substrate layer, and filling a gap between two adjacent color-resistance structures and a gap between two adjacent padding structures, wherein in a direction perpendicular to the first substrate layer, a thickness of the flat layer covered on the padding structure is less than a thickness of the flat layer covered on the color-resistance structure; A spacer, located at a side of the planar layer in the display area away from the first substrate layer; The support is located on a side of the flat layer in the border area away from the first substrate layer, and the distance between the end surface of the support away from the first substrate layer and the first substrate layer is substantially the same as the distance between the end surface of the spacer away from the first substrate layer and the first substrate layer.

2. The color film substrate according to claim 1, characterized in that: In the direction from the frame area to the display area, the ratio of the width of the padding structure to the width of the gap between two adjacent padding structures is in the range of 1.5-4.

3. The color film substrate according to claim 1, characterized in that: In a direction perpendicular to the first substrate layer, the total thickness of the second light-shielding structure, the padding structure and the flat layer covering the padding structure is substantially the same as the total thickness of the color-resistance structure and the flat layer covering the color-resistance structure.

4. The color film substrate according to claim 1, characterized in that: The flat layer covering the side of the first raising layer away from the first substrate layer comprises: a convex portion covering the raising structure and a concave portion filling a gap between two adjacent raising structures; The distance between the end surface of the concave portion away from the first substrate layer and the first substrate layer is smaller than the distance between the end surface of the convex portion away from the first substrate layer and the first substrate layer, and the difference between the two ranges from 0.1 μm to 0.2 μm.

5. The color film substrate according to claim 1, characterized in that: The flat layer covering the side of the first raising layer away from the first substrate layer comprises: a convex portion covering the raising structure and a concave portion filling a gap between two adjacent raising structures; The support comprises a support column, the support column is located on a side of the protrusion away from the first substrate layer, and the orthographic projection of the support column on the first substrate layer is located within the orthographic projection of the cushioning structure on the first substrate layer; and / or The support column is located at a side of the recessed portion away from the first substrate layer, and an orthographic projection of the support column on the first substrate layer is located between orthographic projections of two adjacent padding structures on the first substrate layer.

6. The color film substrate according to claim 1, characterized in that: The flat layer covering the side of the first raising layer away from the first substrate layer comprises: a convex portion covering the raising structure and a concave portion filling a gap between two adjacent raising structures; The support includes a support dam, the support dam is located on a side of the convex portion away from the first substrate layer, and / or the support dam is located on a side of the concave portion away from the first substrate layer; The longest side of the orthographic projection of the support dam on the first substrate layer is greater than or equal to the shortest side of the orthographic projection of the padding structure on the first substrate.

7. The color film substrate according to claim 1, characterized in that: The flat layer covering the side of the first raising layer away from the first substrate layer comprises: a convex portion covering the raising structure and a concave portion filling a gap between two adjacent raising structures; The support comprises: a support column and a support dam, in a direction perpendicular to the first substrate layer, the thickness of the support column is greater than the thickness of the support dam, and the end surface of the support away from the first substrate layer is the end surface of the support column away from the first substrate layer; The support column is located at a side of the protrusion away from the first substrate layer, and the orthographic projection of the support column on the first substrate layer is located within the orthographic projection of the padding structure on the first substrate layer; The support dam is located on a side of the recess away from the first substrate layer, and the longest side of the orthographic projection of the support dam on the first substrate layer is greater than or equal to the shortest side of the orthographic projection of the padding structure on the first substrate.

8. The color film substrate according to claim 1, characterized in that: The flat layer covering the side of the first raising layer away from the first substrate layer comprises: a convex portion covering the raising structure and a concave portion filling a gap between two adjacent raising structures; The support comprises: a support column and a support dam, in a direction perpendicular to the first substrate layer, the thickness of the support column is greater than the thickness of the support dam, and the end surface of the support away from the first substrate layer is the end surface of the support column away from the first substrate layer; The support column and the support dam are located on a side of the protrusion away from the first substrate layer, and the orthographic projection of the support column on the first substrate layer is located within the orthographic projection of the cushioning structure on the first substrate layer; and / or The support column and the support dam are located on a side of the recessed portion away from the first substrate layer, and an orthographic projection of the support column on the first substrate layer is located between orthographic projections of two adjacent padding structures on the first substrate layer; The longest side of the orthographic projection of the support dam on the first substrate layer is greater than or equal to the shortest side of the orthographic projection of the cushioning structure on the first substrate.

9. The color film substrate according to claim 1, characterized in that: The plurality of spaced-apart raising structures of the first raising layer are in the same layer and made of the same material as the color-blocking structure of at least one color.

10. The color film substrate according to claim 1, characterized in that: The support and the spacer are of the same layer and material; The spacer comprises: a main spacer and a sub-spacer, the main spacer and the sub-spacer are located on a side of the flat layer filling the gap between two adjacent color-resist structures away from the first substrate layer, in a direction perpendicular to the first substrate layer, the thickness of the main spacer is greater than the thickness of the sub-spacer, and the end surface of the spacer away from the first substrate layer is the end surface of the main spacer away from the first substrate layer; The support includes: a support column and a support dam. In the direction perpendicular to the first substrate layer, the thickness of the support column is greater than the thickness of the support dam. The end face of the support away from the first substrate layer is the end face of the support column away from the first substrate layer. The support column is the same size as the main spacer.

11. A display panel, characterized in that: It comprises the color filter substrate as described in any one of claims 1 to 10, further comprising an array substrate arranged in a box with the color filter substrate, and a liquid crystal layer located between the color filter substrate and the array substrate.

12. The display panel according to claim 11, characterized in that: The array substrate comprises: a second substrate layer; A spacer occupying portion is located on a side of the second substrate layer close to the first substrate layer and is located in the display area; The orthographic projection of the spacer on the second substrate layer at least partially overlaps with the orthographic projection of the spacer placeholder on the second substrate layer.

13. The display panel according to claim 12, characterized in that: The array substrate further includes: a passivation layer, located on a side of the second substrate layer close to the first substrate layer, and located in the display area and the frame area; In a direction perpendicular to the second substrate layer, a distance between an end surface of the support away from the first substrate layer and a surface of the passivation layer located in the frame area away from the second substrate layer is 0.1 μm-0.3 μm.

14. The display panel according to claim 13, characterized in that: The array substrate further includes: The frame-sealing glue is located on the passivation layer away from the second substrate layer and located in the frame area, and the orthographic projection of the support on the second substrate layer does not overlap with the orthographic projection of the frame-sealing glue on the second substrate layer.

15. The display panel according to claim 12, characterized in that: The array substrate further includes: A first metal layer is located on a side of the second substrate layer close to the first substrate layer and is located in the display area and the frame area, wherein the frame area is provided with a gate driver integration area; A second metal layer is located on a side of the first metal layer away from the second substrate layer and is located in the display area and the gate driver integration area; The orthographic projection of the support on the second substrate layer does not overlap with the orthographic projection of the second metal layer located in the gate driver integrated region on the second substrate layer.

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