Photoresist material intermediate wastewater treatment device

Abstract

The utility model discloses a photoresist material intermediate wastewater treatment device, which belongs to the technical field of photoresist wastewater treatment and comprises a treatment box body, a liquid inlet pipe is embedded at the upper end of the left side of the treatment box body, and a liquid outlet pipe is embedded at the lower end of the right side of the treatment box body. Glass windows are installed at the four center side ends of the treatment box in an embedded mode, an anti-blocking leakage assembly is installed between the inner walls of the treatment box, and the photoresist collecting assembly capable of recycling photoresist in a classified mode and the anti-blocking leakage assembly are additionally arranged in the treatment box, so that the photoresist is prevented from being blocked in the filtering period of the photoresist. The waste water can penetrate through the photoresist collecting assembly to leak downwards, the photoresist material is retained on the surface of the photoresist collecting assembly, and classified collection operation is carried out, so that subsequent classified treatment is facilitated, the workload of personnel is reduced, the waste water can leak downwards through the surface of the leakage assembly, and continuous permeation and filtration operation of the waste water is kept.

Description

Technical Field

[0001] The utility model relates to the technical field of photoresist wastewater treatment, and more specifically to a device for treating photoresist material intermediate wastewater. Background Art

[0002] Photoresist, also known as photoresist, refers to an etching-resistant thin film material whose solubility changes when exposed to ultraviolet light, electron beam, ion beam, X-ray, etc. It is a light-sensitive mixed liquid composed of three main components: photosensitive resin, sensitizer and solvent. It is used as an anti-corrosion coating material in the photolithography process.

[0003] In the existing photoresist material intermediate wastewater treatment device, during use, the filtering device in the wastewater treatment process is easily clogged by the photoresist in the wastewater, and the photoresist recovery efficiency in the wastewater is low, which reduces the practicality of the wastewater treatment device. Therefore, this scheme proposes a photoresist material intermediate wastewater treatment device. Utility Model Content

[0004] 1. Technical problems to be solved:

[0005] In response to the problems existing in the prior art, the purpose of the utility model is to provide a photoresist material intermediate wastewater treatment device. By adding a glue collection component that can classify and recover photoresists and a leakage component to prevent blockage inside the treatment box, during the filtration of the photoresist, its wastewater can seep downward through the glue collection component, while the photoresist material is retained on the surface of the glue collection component and collected and classified for subsequent classification processing, reducing the workload of personnel. The wastewater can seep downward through the surface of the leakage component, maintaining the continuous infiltration and filtration operation of the wastewater.

[0006] 2. Technical solution:

[0007] In order to solve the above problems, the present invention adopts the following technical solutions.

[0008] A device for treating wastewater from a photoresist material intermediate comprises a treatment box, a liquid inlet pipe being embedded and installed at the upper left end of the treatment box, a liquid outlet pipe being embedded and installed at the lower right end of the treatment box, glass windows being embedded and installed at the four central side ends of the treatment box, an anti-clogging leakage component being installed between the inner walls of the treatment box, a slide groove being provided at the front end of the treatment box, a glue collection component for classifying and recovering photoresist being inserted between the inner walls of the slide groove, and the glue collection component being located on the lower side of the leakage component.

[0009] A further improvement is that the leakage component includes brackets fixedly connected to the four inner walls of the treatment box, the central ends of the four brackets are fixedly connected to filter cartridges, and the top ends of the filter cartridges are fixedly connected to protective covers.

[0010] A further improvement is that the filter cartridge is funnel-shaped with a hollow bottom, and the protective cover is frustum-shaped.

[0011] A further improvement is that the rubber collection component includes a sliding frame inserted between the inner walls of the slide groove 1, and two slide grooves 2 distributed up and down are opened on the inner wall of the sliding frame. A filter screen 1 is inserted between the inner walls of the upper slide groove 2, and a filter screen 2 is inserted between the inner walls of the lower slide groove 2. A built-in groove is opened at the front end of the sliding frame.

[0012] A further improvement is that: a filter frame is fixedly connected to the upper end of the second filter screen, the filter frame corresponds to the position of the leakage component, and the aperture of the second filter screen is smaller than the aperture of the first filter screen.

[0013] A further improvement is that: the front end of the processing box is rotatably connected to two symmetrically distributed limiting plates, and the limiting plates are located on the upper side of the glue collecting assembly.

[0014] 3. Beneficial effects:

[0015] Compared with the prior art, the technical solution provided by this utility model has the following beneficial effects:

[0016] The utility model has a reasonable design. By adding a glue collecting component capable of classifying and recycling photoresist inside the processing box, waste water of the photoresist can be allowed to seep downward through the glue collecting component during filtration, while the photoresist material is retained on the surface of the glue collecting component and classified and collected for subsequent classification processing, thereby reducing the workload of personnel.

[0017] At the same time, in order to prevent the existing photoresist from accumulating too much on the filtering equipment, this solution adds a leakage component to encourage the wastewater to leak downward through the surface of the leakage component, maintaining continuous infiltration and filtration of the wastewater, and making it less likely to clog.

[0018] It should be noted that the structures not introduced in the present invention do not involve the design points and improvement directions of the present invention, and are the same as the existing technology or can be implemented by using the existing technology, so they are not described in detail here. BRIEF DESCRIPTION OF THE DRAWINGS

[0019] Figure 1 It is a schematic diagram of the overall structure of the utility model;

[0020] Figure 2 This is a schematic structural diagram of the leakage component of the utility model;

[0021] Figure 3 This is a structural diagram of the glue collection component of the utility model.

[0022] Description of the numbers in the figure:

[0023] 1. Processing box; 11. Chute 1; 2. Liquid inlet pipe; 3. Liquid outlet pipe; 4. Glass window;

[0024] 5. Leakage component; 51. Bracket; 52. Filter cartridge; 53. Protective cover;

[0025] 6. Glue collecting assembly; 61. Sliding frame; 62. Second chute; 63. First filter screen; 64. Second filter screen; 65. Filter frame; 66. Built-in groove;

[0026] 7. Limit plate. DETAILED DESCRIPTION

[0027] To facilitate understanding of the present invention, the present invention will be described more comprehensively below with reference to the relevant drawings. Several embodiments of the present invention are given in the drawings. However, the present invention can be implemented in many different forms and is not limited to the embodiments described herein. On the contrary, the purpose of providing these embodiments is to make the disclosure of the present invention more thorough and comprehensive.

[0028] In the description of the present invention, it should be understood that the terms "center", "longitudinal", "lateral", "length", "width", "thickness", "up", "down", "front", "back", "left", "right", "vertical", "horizontal", "page", "bottom", "inside", "outside", "clockwise", "counterclockwise", etc., indicating the orientation or position relationship, are based on the orientation or position relationship shown in the accompanying drawings, and are only for the convenience of describing the present invention and simplifying the description, and do not indicate or imply that the device or element referred to must have a specific orientation, be constructed and operate in a specific orientation, and therefore cannot be understood as a limitation on the present invention.

[0029] Furthermore, the terms "first" and "second" are used for descriptive purposes only and should not be construed as indicating or implying relative importance or implicitly specifying the number of the technical features being referred to. Thus, a feature specified as "first" or "second" may explicitly or implicitly include one or more of such features. In the description of this utility model, "plurality" means two or more, unless otherwise specifically defined.

[0030] In this utility model, unless otherwise expressly specified or limited, the terms "installed," "connected," "connected," "fixed," "provided with," "provided on," etc. should be understood in a broad sense. For example, they may refer to fixed connection, detachable connection, or integral connection; mechanical connection or electrical connection; direct connection or indirect connection through an intermediate medium; or internal communication between two components. Those skilled in the art will be able to understand the specific meanings of the above terms in this utility model based on specific circumstances. Example

[0031] See also Figure 1-3 A device for treating wastewater from a photoresist material intermediate comprises a treatment box 1, a liquid inlet pipe 2 is embedded in the upper left end of the treatment box 1, a liquid outlet pipe 3 is embedded in the lower right end of the treatment box 1, glass windows 4 are embedded in the four central side ends of the treatment box 1, an anti-blocking leakage component 5 is installed between the inner walls of the treatment box 1, a slide groove 11 is opened at the front side end of the treatment box 1, and a glue collection component 6 for classifying and recovering photoresist is inserted between the inner walls of the slide groove 11, and the glue collection component 6 is located on the lower side of the leakage component 5.

[0032] During use, the present solution avoids the clogging of the filter device in the existing photoresist intermediate wastewater treatment device due to the photoresist material in the wastewater, and the phenomenon of slow recovery efficiency. In this embodiment, a glue collecting assembly 6 capable of classifying and recovering the photoresist is firstly provided inside the processing box 1. This promotes that during the filtration of the photoresist, the wastewater can seep downward through the glue collecting assembly 6, while the photoresist material is retained on the surface of the glue collecting assembly 6 and is collected and classified for subsequent classification processing, thereby reducing the workload of the personnel.

[0033] At the same time, in order to prevent the existing photoresist from accumulating excessively on the filtering device, this embodiment adds a leakage component 5, which can promote the wastewater to leak downward through the surface of the leakage component 5, thereby maintaining the continuous infiltration and filtration operation of the wastewater;

[0034] Finally, the staff can observe the inside of the processing box 1 through the glass window 4 and carry out centralized processing according to the recovery amount of the rubber collection component 6, which is conducive to subsequent continued use.

[0035] See also Figure 1-2 The leakage component 5 includes a bracket 51 fixedly connected to the four inner walls of the treatment box 1, the center ends of the four brackets 51 are fixedly connected to the filter cartridge 52, and the top end of the filter cartridge 52 is fixedly connected to the protective cover 53.

[0036] More specifically, the filter cartridge 52 is funnel-shaped with a hollow bottom, and the protective cover 53 is truncated cone-shaped.

[0037] During use of this solution, as the photoresist intermediate wastewater is continuously filtered, when the photoresist is accumulated on the surface of the glue collecting component 6, the wastewater can also be filtered on the outside of the filter cartridge 52 and leaked, thereby ensuring the fluidity of the wastewater filtration. At the same time, since the filter cartridge 52 is funnel-shaped and the top protective cover 53 is frustum-shaped, the photoresist wastewater residue transported above it is not easy to adhere to the surface of the filter cartridge 52, thereby avoiding the filter cartridge 52 being adhered to the photoresist material and causing blockage and the need for subsequent cleaning steps.

[0038] See also Figure 1-3 The glue collection component 6 includes a sliding frame 61 inserted between the inner walls of the slide groove 11, and two slide grooves 62 distributed up and down are provided on the inner wall of the sliding frame 61. A filter screen 63 is inserted between the inner walls of the upper slide groove 62, and a filter screen 64 is inserted between the inner walls of the lower slide groove 62. A built-in groove 66 is provided at the front end of the sliding frame 61.

[0039] More specifically, the upper end of the second filter screen 64 is fixedly connected with a filter frame 65 , the filter frame 65 corresponds to the position of the leakage component 5 , and the aperture of the second filter screen 64 is smaller than the aperture of the first filter screen 63 .

[0040] During use of this solution, when the photoresist material intermediate is discharged along with the wastewater, the small-diameter photoresist first passes through the filter 1 63 and accumulates on the upper surface of the filter 2 64, while the large-diameter photoresist is retained in the filter 1 63. This allows the photoresist to be classified and layered. While the photoresist is leaking and layered, it can also avoid the phenomenon of blockage caused by the accumulation of photoresist on the filter surface, thereby increasing the leakage rate of the wastewater. Subsequently, the personnel can also remove the sliding frame 61 from the inside of the processing box 1 and extract the filter 1 63 and the filter 2 64 respectively, thereby facilitating the recycling of the classified photoresist.

[0041] At the same time, the filter frame 65 is located at the center above the filter screen 2 64, and this position is opposite to the hollow part at the bottom of the leakage component 5, so that this position always remains clean, the photoresist material cannot accumulate therein, and only wastewater can pass through, thereby ensuring that the overall wastewater treatment device is not prone to clogging.

[0042] See also Figure 1-2 The front end of the processing box 1 is rotatably connected to two symmetrically distributed limiting plates 7, and the limiting plates 7 are located on the upper side of the glue collecting assembly 6.

[0043] During use of this solution, after the glue collection component 6 is inserted into the slide groove 11, the personnel rotates the limit plate 7 to the surface of the glue collection component 6 to limit the glue collection component 6, thereby ensuring the stability of the glue collection component 6 when placed inside the processing box 1.

[0044] The above-mentioned embodiments only express a certain implementation method of the utility model, and the description thereof is relatively specific and detailed, but it cannot be understood as limiting the scope of the patent of the utility model. It should be pointed out that for ordinary technicians in this field, several variations and improvements can be made without departing from the concept of the utility model, which all fall within the scope of protection of the utility model. Therefore, the scope of protection of the utility model patent shall be based on the attached claims.

Claims

1. A device for treating wastewater from a photoresist material intermediate, comprising a treatment box (1), characterized in that: A liquid inlet pipe (2) is embedded and installed at the upper left end of the processing box (1), a liquid outlet pipe (3) is embedded and installed at the lower right end of the processing box (1), and glass windows (4) are embedded and installed at the four central side ends of the processing box (1). An anti-blocking leakage component (5) is installed between the inner walls of the processing box (1), a slide groove (11) is opened at the front side end of the processing box (1), and a glue collection component (6) for classifying and recovering photoresist is inserted between the inner walls of the slide groove (11), and the glue collection component (6) is located on the lower side of the leakage component (5).

2. The device for treating wastewater from a photoresist material intermediate according to claim 1, wherein: The leakage assembly (5) comprises brackets (51) fixedly connected to four inner walls of the treatment box (1), the central ends of the four brackets (51) are fixedly connected to filter cartridges (52), and the top ends of the filter cartridges (52) are fixedly connected to a protective cover (53).

3. The device for treating wastewater from a photoresist material intermediate according to claim 2, wherein: The filter cartridge (52) is funnel-shaped and has a hollow bottom, and the protective cover (53) is truncated cone-shaped.

4. The device for treating wastewater from a photoresist material intermediate according to claim 1, wherein: The glue collecting assembly (6) includes a sliding frame (61) inserted between the inner walls of the first slide groove (11), and two second slide grooves (62) distributed up and down are provided on the inner wall of the sliding frame (61). A filter screen (63) is inserted between the inner walls of the second slide groove (62) on the upper side, and a filter screen (64) is inserted between the inner walls of the second slide groove (62) on the lower side. A built-in groove (66) is provided at the front end of the sliding frame (61).

5. The device for treating wastewater from a photoresist material intermediate according to claim 4, characterized in that: The upper end of the second filter screen (64) is fixedly connected to a filter frame (65), and the position of the filter frame (65) corresponds to the position of the leakage component (5). The aperture of the second filter screen (64) is smaller than the aperture of the first filter screen (63).

6. The device for treating wastewater from a photoresist material intermediate according to claim 1, wherein: The front end of the processing box (1) is rotatably connected to two symmetrically distributed limiting plates (7), and the limiting plates (7) are located on the upper side of the glue collecting assembly (6).

Images