TCS centralized liquid supply device in semiconductor silicon epitaxial wafer growth

Abstract

The utility model discloses a TCS concentrated liquid supply device in semiconductor silicon epitaxial wafer growth, which comprises a liquid storage tank, the bottom surface of the liquid storage tank is communicated with a liquid discharge pipe, the bottom end of the liquid discharge pipe is communicated with a liquid separation tank, the bottom surface of the liquid separation tank is fixedly communicated with a group of equidistantly arranged liquid supply pipes, the outer surface of each liquid supply pipe is provided with an electromagnetic valve, and the electromagnetic valve is communicated with the liquid storage tank. And a flow meter is arranged in each liquid supply pipe. According to the device, the liquid distribution box, the liquid supply pipes, the electronic valve, the control panel and the flow meter are matched, so that the liquid supply stability in the growth process of the epitaxial wafer is ensured by utilizing the plurality of liquid supply pipes, and the problems of non-uniform liquid supply, insufficient liquid supply and the like possibly occurring in a traditional liquid supply device are avoided; and the liquid supply amount can be automatically adjusted according to actual requirements through the electromagnetic valve, manual operation intervention is reduced, the production efficiency is improved, the flow meter can be used for monitoring the flowing liquid amount in the liquid supply pipe, and the accuracy of the liquid supply amount is further guaranteed.

Description

TECHNICAL FIELD

[0001] The application relates to the technical field of semiconductor material growth, in particular to a TCS centralized liquid supply device in semiconductor silicon epitaxial wafer growth. BACKGROUND

[0002] The growth of semiconductor silicon epitaxial wafer is indeed a highly precise process, which usually needs to control the supply conditions of gas and liquid extremely accurately, and the liquid, especially the solution as the silicon source, plays a crucial role in the growth process. These liquids usually need to be accurately metered, heated and delivered to ensure the formation of stable and uniform vapor pressure in the reaction chamber, thereby facilitating the growth of high-quality epitaxial layers.

[0003] The existing TCS liquid supply device usually adopts a single liquid supply source, which leads to unstable liquid supply and difficult flow control, and even in the long-time running process, liquid supply may be uneven or failure, thereby affecting the growth quality and production efficiency of the epitaxial wafer. Therefore, the application provides a TCS centralized liquid supply device in semiconductor silicon epitaxial wafer growth to solve the above problems. CONTENT OF THE UTILITY MODEL

[0004] The application aims to provide a TCS centralized liquid supply device in semiconductor silicon epitaxial wafer growth, which solves the problem that the single liquid supply source leads to unstable liquid supply and difficult flow control, and even in the long-time running process, liquid supply may be uneven or failure, thereby affecting the growth quality and production efficiency of the epitaxial wafer.

[0005] To achieve the above-mentioned purpose, the application provides the following technical scheme.

[0006] A TCS centralized liquid supply device in semiconductor silicon epitaxial wafer growth, comprising a liquid storage tank, the bottom surface of the liquid storage tank is communicated with a liquid discharge pipe, the bottom end of the liquid discharge pipe is communicated with a liquid distribution tank, the bottom surface of the liquid distribution tank is fixedly communicated with a group of liquid supply pipes arranged at equal distances, the outer surface of each liquid supply pipe is provided with an electromagnetic valve, and the inside of each liquid supply pipe is provided with a flow meter.

[0007] In a further embodiment, the left and right sides of the liquid storage tank are fixedly connected with mounting plates, and a group of mounting holes are formed in the right side of each mounting plate.

[0008] In a further embodiment, the upper part of the liquid storage tank is provided with a sealing cover, and the front surface of the liquid storage tank is provided with a perspective window.

[0009] In further embodiments, the upper surface of the distribution tank is fixedly connected with two connecting columns, and the top end of each connecting column is connected with the bottom surface of the liquid storage tank.

[0010] In further embodiments, the outer surface of each liquid supply pipe is fixedly connected with a suspender, and the top end of each suspender is connected with the bottom surface of the liquid storage tank.

[0011] In further embodiments, the output end of each liquid supply pipe is provided with a connecting disc.

[0012] Compared with the prior art, the utility model has the beneficial effects that:

[0013] The present application cooperates the distribution tank, the liquid supply pipe, the electronic valve, the control panel and the flowmeter, uses multiple liquid supply pipes to ensure the stability of liquid supply in the epitaxial wafer growth process, avoids the problems of uneven liquid supply and insufficient liquid supply of the traditional liquid supply device, and uses the electromagnetic valve to automatically adjust the liquid supply amount according to the actual demand, reduces manual operation intervention, improves the production efficiency, uses the flowmeter to monitor the amount of flowing liquid in the liquid supply pipe, and further ensures the accuracy of the liquid supply amount.

[0014] The temperature sensor and the heating wire are cooperated, the temperature sensor can monitor the liquid temperature, and the heating wire can heat the liquid, so that the liquid temperature can be ensured to be suitable, and the growth quality of the silicon epitaxial wafer is beneficial. BRIEF DESCRIPTION OF DRAWINGS

[0015] Fig. 1 It is a three-dimensional structure schematic view of the TCS centralized liquid supply device for semiconductor silicon epitaxial wafer growth.

[0016] Fig. 2 It is a three-dimensional structure schematic view of the distribution tank of the TCS centralized liquid supply device for semiconductor silicon epitaxial wafer growth.

[0017] Fig. 3 It is a three-dimensional structure schematic view of the liquid supply pipe of the TCS centralized liquid supply device for semiconductor silicon epitaxial wafer growth.

[0018] In the figure: 1, liquid storage tank; 2, mounting plate; 3, mounting hole; 4, perspective window; 5, connecting column; 6, electromagnetic valve; 7, liquid supply pipe; 8, connecting disc; 9, suspender; 10, distribution tank; 11, liquid discharge pipe; 12, control panel; 13, sealing cover; 14, support column; 15, heating wire; 16, temperature sensor; 17, flowmeter. DETAILED DESCRIPTION

[0019] In the description of the utility model, it is necessary to explain that, unless there are definite provisions and limitations, the terms "mounting", "connection", "connection" should be understood broadly, for example, it can be fixed connection, can be detachable connection, or integrally connected, can be mechanical connection, can be electrical connection, can be directly connected, can be indirectly connected through intermediate medium, can be the communication inside two elements. For ordinary skilled in the art, the specific meaning of the above terms in the utility model can be understood by specific circumstances.

[0020] The technical scheme in the embodiments of the utility model will be clearly and completely described below in conjunction with the drawings in the embodiments of the utility model. Obviously, the described embodiments are only part of the embodiments of the utility model, not all. Based on the embodiments in the utility model, all other embodiments obtained by ordinary skilled in the art without creative labor belong to the scope of protection of the utility model.

[0021] Please refer to Figs. 1-3 In the utility model, a kind of TCS centralized liquid supply device in semiconductor silicon epitaxial wafer growth, including liquid storage tank 1, the left and right two side surfaces of liquid storage tank 1 are all fixedly connected with mounting plate 2, a group of mounting holes 3 are set in the right side surface of each mounting plate 2, the cooperation of mounting plate 2 and mounting hole 3 is used, to facilitate staff to install and fix liquid storage tank 1.

[0022] The upper portion of liquid storage tank 1 is provided with sealing cover 13, the front of liquid storage tank 1 is provided with perspective window 4, the liquid position inside liquid storage tank 1 can be observed using perspective window 4, staff can add liquid to the inside of liquid storage tank 1 from sealing cover 13.

[0023] The bottom surface of liquid storage tank 1 is communicated with drain pipe 11, the bottom end of drain pipe 11 is communicated with distribution tank 10, drain pipe 11 can drain the liquid inside liquid storage tank 1 to the inside of distribution tank 10, and distribution tank 10 can further distribute the liquid.

[0024] The upper surface of distribution tank 10 is fixedly connected with two connecting columns 5, the top end of each connecting column 5 is connected with the bottom surface of liquid storage tank 1, connecting column 5 is used to connect distribution tank 10 and liquid storage tank 1, to form the holding of distribution tank 10, to ensure the stability of distribution tank 10.

[0025] The bottom surface of the liquid distribution tank 10 is fixedly connected with a group of liquid supply pipes 7 arranged at equal distances, the outer surface of each liquid supply pipe 7 is provided with an electromagnetic valve 6, and the inside of each liquid supply pipe 7 is provided with a flow meter 17; the front surface of the liquid storage tank 1 is provided with a control panel 12, the opening and closing degree of the electromagnetic valve 6 can be controlled by the control panel 12, the liquid flow amount in the liquid supply pipe 7 can be adjusted according to actual needs, the production efficiency can be further improved, and the liquid flow amount can be monitored by the flow meter 17, so as to further ensure the accuracy of the liquid supply amount.

[0026] The outer surface of each liquid supply pipe 7 is fixedly connected with a boom 9, and the top end of each boom 9 is connected with the bottom surface of the liquid storage tank 1; the boom 9 can be used to hold the liquid supply pipe 7, so as to ensure the stability of the liquid discharge of the liquid supply pipe 7.

[0027] The output end of each liquid supply pipe 7 is provided with a connecting disc 8, which facilitates the connection between the liquid supply pipe 7 and the silicon epitaxial wafer growth container, so as to ensure the stability of the liquid supply.

[0028] Two temperature sensors 16 are installed on the inner bottom wall of the liquid distribution tank 10, and a support column 14 is fixedly connected to the inner wall of the liquid distribution tank 10, and a heating wire 15 is arranged on the outside of the support column 14; the temperature sensor 16 can be used to monitor the temperature of the liquid in the liquid distribution tank 10, and the heating wire 15 can heat the liquid once the temperature of the liquid is low, so as to ensure that the temperature of the liquid is appropriate.

[0029] The working principle of the present application is that when in use, the liquid in the liquid storage tank 1 will enter the inside of the liquid distribution tank 10 through the liquid discharge pipe 11, the electromagnetic valve 6 is controlled by the control panel 12, the liquid in the liquid distribution tank 10 will enter the plurality of liquid supply pipes 7, the plurality of liquid supply pipes 7 will supply liquid to the silicon epitaxial wafer, which can ensure sufficient liquid supply, and the liquid supply amount can be adjusted, at the same time, the temperature sensor 16 will detect the temperature in the liquid distribution tank 10, and the heating wire 15 will heat the liquid once the temperature is low, which can ensure the growth quality of the silicon epitaxial wafer.

[0030] In addition, it should be understood that although the present specification is described in terms of embodiments, each embodiment does not contain only one independent technical solution, and the description manner of the specification is only for the sake of clarity, and those skilled in the art should consider the specification as a whole, and the technical solutions in each embodiment can be combined appropriately to form other embodiments which can be understood by those skilled in the art.

Claims

1. A TCS centralized liquid supply device in the growth of a semiconductor silicon epitaxial wafer, characterized by: The utility model provides a liquid storage tank, the bottom surface of the liquid storage tank is communicated with a liquid discharge pipe, the bottom end of the liquid discharge pipe is communicated with a liquid distribution tank, the bottom surface of the liquid distribution tank is fixedly communicated with a group of liquid supply pipes arranged at equal distances, the outer surface of each liquid supply pipe is provided with an electromagnetic valve, the inside of each liquid supply pipe is provided with a flowmeter, the front surface of the liquid storage tank is mounted with a control panel, the inner bottom wall of the liquid distribution tank is mounted with two temperature sensors, the inner wall of the liquid distribution tank is fixedly connected with a support, the outside of the support is provided with a heating wire.

2. The TCS centralized liquid supply device for growing a semiconductor silicon epitaxial wafer according to claim 1, characterized in that: The left and right sides of the liquid storage tank are fixedly connected with mounting plates, the right side of each mounting plate is provided with a group of mounting holes.

3. The TCS centralized liquid supply device for growing a semiconductor silicon epitaxial wafer according to claim 1, characterized in that: The top of the liquid storage tank is provided with a sealing cover, the front surface of the liquid storage tank is provided with a perspective window.

4. The TCS centralized liquid supply device for growing a semiconductor silicon epitaxial wafer according to claim 1, characterized in that: The upper surface of the liquid distribution tank is fixedly connected with two connecting columns, the top end of each connecting column is connected with the bottom surface of the liquid storage tank.

5. The TCS centralized liquid supply device for growing a semiconductor silicon epitaxial wafer according to claim 1, characterized in that: The outer surface of each liquid supply pipe is fixedly connected with a suspender, the top end of each suspender is connected with the bottom surface of the liquid storage tank.

6. The TCS centralized liquid supply device for growing a semiconductor silicon epitaxial wafer according to claim 1, characterized in that: The output end of each liquid supply pipe is provided with a connecting disc.

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