Electromagnetic force adjusting device

By using an electromagnetic force adjustment device during the wafer thinning process, the electromagnetic force is increased by generating a superimposed magnetic field using coils and magnets. This solves the problem of insufficient adjustment capability of the adjustment device for processing pressure, achieves spindle balance and stability, and improves wafer thinning quality.

CN223798624UActive Publication Date: 2026-01-13SOUTHERN UNIVERSITY OF SCIENCE AND TECHNOLOGY
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Patent Information

Application Number
CN202423056657.8
Authority / Receiving Office
CN · China
Patent Type
Utility models(China)
Current Assignee / Owner
Filing Date
2024-12-11
Publication Date
2026-01-13
Estimated Expiration
2034-12-11

AI Technical Summary

Technical Problem

In the existing technology, the adjustment device has limited ability to adjust the processing pressure during the wafer thinning process, which makes it impossible for the spindle to maintain balance, making it difficult to control the wafer thickness change and resulting in poor thinning quality.

Method used

An electromagnetic force adjustment device is adopted. Two electromagnetic force modules are arranged opposite each other along the first direction. The electromagnetic force is increased by the superimposed magnetic field generated by the coil and the magnet, so as to realize flexible adjustment of the processing pressure and ensure the balance and stability of the spindle during the wafer thinning process.

Benefits of technology

The processing pressure adjustment range of the electromagnetic force adjustment device has been increased, which has improved the spindle balance and stability during the wafer thinning process and enhanced the wafer thinning quality.

✦ Generated by Eureka AI based on patent content.

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Abstract

The utility model discloses an electromagnetic force adjusting device, which comprises two electromagnetic force modules arranged at an interval along a first direction, the two electromagnetic force modules are symmetrically arranged along a middle plane, each electromagnetic force module comprises a coil and a magnet, the coil can generate a magnetic field after being electrified, and the magnet can generate a magnetic field after being electrified. The magnetic field direction of at least part of the magnet acting on the coil is the same as the magnetic field direction of the coil. After the coils in the two electromagnetic force modules are powered on, the two opposite coils are both located in the magnetic field range of the opposite coil and generate mutual electromagnetic force, due to the fact that the magnetic pole of the magnet is opposite to the magnetic pole of the adjacent coil after being powered on, the magnetic field generated by the magnet and the magnetic field generated by the adjacent coil are overlapped, and the electromagnetic force between the coils is increased. According to the electromagnetic force adjusting device, the machining pressure range capable of being adjusted by the electromagnetic force adjusting device is increased, the main shaft is kept in a balanced and stable state in the wafer thinning process, the thinning thickness of a wafer can be adjusted conveniently, and the wafer thinning quality is improved.
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Description

Technical Field

[0001] This utility model relates to the field of wafer processing technology, and in particular to an electromagnetic force adjustment device. Background Technology

[0002] In the chip manufacturing process, the thickness of the wafer needs to be maintained within a certain range. The larger the wafer diameter, the greater its thickness. Therefore, the wafer needs to be thinned. Related technologies use a method of grinding followed by polishing to thin the wafer. During the processing, an adjustment device is used to apply force to the spindle to counteract the up-and-down movement of the spindle during the processing, so that the spindle maintains a balanced and stable processing state. However, the adjustment device has limited ability to adjust the processing pressure, which makes it impossible for the spindle to maintain a balanced state. The change in wafer thickness is not easy to control, resulting in poor wafer thinning quality. Summary of the Invention

[0003] The present invention aims to solve at least one of the technical problems existing in the prior art. To this end, the present invention proposes an electromagnetic force adjustment device that can improve the adjustment range of processing pressure.

[0004] The electromagnetic force regulating device according to the embodiments of this utility model includes:

[0005] Two electromagnetic force modules are arranged opposite each other along a first direction. Each electromagnetic force module includes a coil and a magnet. When the coil is energized, it can generate a magnetic field. At least part of the magnet acts on the magnetic field of the coil in the same direction as the magnetic field of the coil itself.

[0006] According to some embodiments of the present invention, the electromagnetic force module further includes an iron core, and the coil is sleeved on the outside of the iron core.

[0007] According to some embodiments of the present invention, in the two electromagnetic force modules, the magnetic poles at the opposite ends of the two magnets arranged opposite each other along the first direction are the same;

[0008] Alternatively, the magnetic poles of the two magnets arranged opposite each other along the first direction are opposite at their opposite ends.

[0009] The electromagnetic force regulating device according to the embodiments of the present invention has at least the following beneficial effects:

[0010] In this invention, after the coils in the two electromagnetic force modules are energized, the two coils facing each other are located within each other's magnetic field range and generate mutual electromagnetic forces. Since the magnetic poles of the magnet are opposite to the magnetic poles of the adjacent coils after they are energized, the magnetic field generated by the magnet is superimposed on the magnetic field generated by the adjacent coils, increasing the magnitude of the electromagnetic force between the coils. Furthermore, the electromagnetic force on the magnet and the electromagnetic force on the coil are in the same direction and can be superimposed, increasing the range of processing pressure that the electromagnetic force adjustment device can adjust. During the wafer thinning process, the spindle is kept in a balanced and stable state, so as to more conveniently adjust the wafer thinning thickness and improve the wafer thinning quality.

[0011] According to some embodiments of the present invention, the electromagnetic force module includes a coil and a plurality of magnets, the plurality of magnets being arranged around the outer periphery of the coil, and the magnetic poles of each magnet being the same at the same end along the first direction.

[0012] According to some embodiments of this utility model, within the same electromagnetic force module, the coil located at the center of the electromagnetic force module is the first coil, and the remaining coils are the second coils. The second coils are arranged around the first coil circumferentially at least once, and the magnets are arranged around the first coil circumferentially at least once. The coils and the magnets are arranged alternately along the radial direction of the first coil. The magnetic field generated by all the coils is in the same direction, and the magnetic poles of all the magnets at the same end along the first direction are the same.

[0013] According to some embodiments of the present invention, the second coil, which is radially adjacent to the first coil, is offset from the magnet circumferentially from the first coil.

[0014] According to some embodiments of the present invention, the second coil and the magnet are arranged alternately around the circumference of the first coil to form at least one loop.

[0015] According to some embodiments of the present invention, the electromagnetic force module includes multiple magnetic force units, which are arranged along a second direction. Each magnetic force unit includes at least one magnet and multiple coils surrounding the magnet. Within each magnetic force unit, the direction of the magnetic field exerted by the magnet on the coil is the same as the direction of the magnetic field of the coil itself. The magnetic poles of the magnets in adjacent magnetic force units along the second direction are opposite at the same end along the first direction.

[0016] And / or, the electromagnetic force module includes a plurality of magnetic force units, the magnetic force units are arranged along a third direction, each magnetic force unit includes at least one magnet and a plurality of coils surrounding the magnet, in each magnetic force unit, the direction of the magnetic field of the magnet acting on the coil is the same as the direction of the magnetic field of the coil itself, and the magnetic poles of the magnets in adjacent magnetic force units along the third direction are opposite at the same end along the first direction;

[0017] Wherein, the first direction, the second direction, and the third direction are perpendicular to each other.

[0018] According to some embodiments of the present invention, the electromagnetic force module further includes a housing, the housing having a first mounting cavity and a second mounting cavity, the magnet being fixed in the first mounting cavity, and the coil being fixed in the second mounting cavity.

[0019] According to some embodiments of the present invention, the electromagnetic force module further includes a cooling plate, which is attached to at least one surface of the housing in the first direction.

[0020] Additional aspects and advantages of this invention will be set forth in part in the description which follows, and in part will be obvious from the description, or may be learned by practice of the invention. Attached Figure Description

[0021] The present invention will be further described below with reference to the accompanying drawings and embodiments, wherein:

[0022] Figure 1 These are schematic diagrams illustrating the principles of different embodiments of the electromagnetic force regulating device of this utility model;

[0023] Figure 2 This is a schematic diagram showing the arrangement of coils and magnets in some embodiments;

[0024] Figure 3 This is a schematic diagram showing the arrangement of coils and magnets in other embodiments;

[0025] Figure 4 This is a schematic diagram showing the arrangement of coils and magnets in other embodiments;

[0026] Figure 5 This is a schematic diagram of one embodiment of the electromagnetic force regulating device of this utility model;

[0027] Figure 6 for Figure 5 A schematic diagram showing the hidden structure of the electromagnetic force module in the image;

[0028] Figure 7 for Figure 5 A cross-sectional view of an embodiment of the electromagnetic force module.

[0029] Figure label:

[0030] Electromagnetic force module 100, coil 110, magnet 120, magnetic force unit 130, housing 140, first mounting cavity 141, second mounting cavity 142, outer shell 143, mounting plate 144, iron core 150, fixing frame 160, cover plate 170, cooling plate 180, base plate 190. Detailed Implementation

[0031] The embodiments of this utility model are described in detail below. Examples of these embodiments are shown in the accompanying drawings, wherein the same or similar reference numerals denote the same or similar elements or elements having the same or similar functions throughout. The embodiments described below with reference to the accompanying drawings are exemplary and are only used to explain this utility model, and should not be construed as limiting this utility model.

[0032] In the description of this utility model, it should be understood that the directional descriptions, such as up, down, front, back, left, right, etc., indicate the directional or positional relationship based on the directional or positional relationship shown in the accompanying drawings. They are only for the convenience of describing this utility model and simplifying the description, and do not indicate or imply that the device or element referred to must have a specific orientation, or be constructed and operated in a specific orientation. Therefore, they should not be construed as limitations on this utility model.

[0033] In the description of this utility model, "several" means one or more, "multiple" means two or more, "greater than," "less than," and "exceeding" are understood to exclude the stated number, while "above," "below," and "within" are understood to include the stated number. The use of "first" and "second" in the description is merely for distinguishing technical features and should not be construed as indicating or implying relative importance, or implicitly indicating the number of indicated technical features, or implicitly indicating the order of the indicated technical features.

[0034] In the description of this utility model, unless otherwise explicitly defined, terms such as "setting," "installation," and "connection" should be interpreted broadly, and those skilled in the art can reasonably determine the specific meaning of the above terms in this utility model in conjunction with the specific content of the technical solution.

[0035] In the description of this utility model, the terms "one embodiment," "some embodiments," "illustrative embodiment," "example," "specific example," or "some examples," etc., refer to specific features, structures, materials, or characteristics described in connection with that embodiment or example, which are included in at least one embodiment or example of this utility model. In this specification, the illustrative expressions of the above terms do not necessarily refer to the same embodiment or example. Furthermore, the specific features, structures, materials, or characteristics described may be combined in any suitable manner in one or more embodiments or examples.

[0036] This invention provides an electromagnetic force adjustment device that generates electromagnetic force to adjust the processing pressure required during wafer thinning. Understandably, a processing head is typically mounted on the spindle of a wafer thinning apparatus. The processing head grinds and polishes the wafer surface, and the processing pressure between the processing head and the wafer mainly comes from the combined force of the spindle's gravity, electromagnetic force, and other forces.

[0037] Reference Figure 1 The electromagnetic force adjustment device includes two electromagnetic force modules 100 arranged opposite each other along a first direction. The two electromagnetic force modules 100 can generate electromagnetic attraction or repulsion. The electromagnetic attraction or repulsion can be combined with forces such as spindle gravity to provide the processing pressure required for wafer thinning.

[0038] Specifically, the electromagnetic force module 100 includes a coil 110 and a magnet 120. The magnet 120 itself is magnetic and has two magnetic poles with opposite polarities, such as N pole and S pole. Based on the magnetic effect of current, the coil 110 generates a magnetic field after being energized. According to Ampere's right-hand rule and the direction of current, the direction of the magnetic field generated by the coil 110 and the magnetic poles of the coil 110 can be determined.

[0039] Understandably, in at least a portion of the electromagnetic force module 100, when the coil 110 is energized, it shares the same magnetic pole with at least a portion of the magnet 120 at the same end in the first direction. The magnet 120 generates a magnetic field around itself, and the coil 110 located around the magnet 120 is within the range of the magnetic field generated by the magnet 120. The direction in which the magnetic field generated by the magnet 120 acts on the coil 110 is the same as the direction in which the magnetic field generated by the coil 110 itself is generated. The magnetic field generated by the magnet 120 and the magnetic field generated by the coil 110 are superimposed. The superimposed magnetic field acts on another coil 110 in another electromagnetic force module 100, which can increase the electromagnetic force received by the coil 110 in another electromagnetic force module 100 after it is energized, thereby increasing the range of processing pressure that the electromagnetic force adjustment device can control. In addition, the two magnets 120 facing each other in the two electromagnetic force modules 100 attract or repel each other, and there is a constant electromagnetic force between them. In the same electromagnetic force module 100, the electromagnetic force on the magnet 120 is in the same direction as the electromagnetic force on the coil 110 and is superimposed, which can increase the magnitude of the electromagnetic force between the two electromagnetic force modules 100.

[0040] Therefore, when the coils 110 in the two electromagnetic force modules 100 are energized, the two coils 110 facing each other are located within each other's magnetic field range and generate mutual electromagnetic forces. Since the magnetic field generated by the magnet 120 is superimposed on the magnetic field generated by the adjacent coil 110, the magnitude of the electromagnetic force between the coils 110 is increased. Furthermore, the electromagnetic force on the magnet 120 is in the same direction as the electromagnetic force on the coil 110 and can be superimposed, which increases the processing pressure range that the electromagnetic force adjustment device can adjust. During the wafer thinning process, the spindle is kept in a balanced and stable state, so as to more conveniently adjust the wafer thinning thickness and improve the wafer thinning quality.

[0041] It should be noted that the coils 110 and magnets 210 in the two electromagnetic force modules 100 are arranged in the same way. One coil 110 in one electromagnetic force module 100 is always directly opposite to one coil 110 in the other electromagnetic force module 100 along the first direction and is located within the magnetic field range of the opposite coil 110. Similarly, one magnet 120 in one electromagnetic force module 100 is always directly opposite to one magnet 120 in the other electromagnetic force module 100 and is located within the magnetic field range of the opposite magnet 120.

[0042] In one embodiment, two electromagnetic force modules 100 may be symmetrically arranged relative to the middle plane, with the first direction perpendicular to the middle plane, so that the distance between the two coils 110 of the two electromagnetic force modules 100 and the distance between the two magnets 120 are as close as possible, and the two coils 110 of the two electromagnetic force modules 100 can be located in the strong magnetic field region of each other, so as to increase the electromagnetic force between the two electromagnetic force modules 100.

[0043] Understandably, one electromagnetic force module 100 can be connected to the spindle, while the other electromagnetic force module 100 is fixed. The electromagnetic force between the two electromagnetic force modules 100 is applied to the spindle, which can change the processing pressure between the processing head and the wafer. In addition, the repulsive or attractive force generated between the electromagnetic force modules 100 can be selected according to the position of the electromagnetic force modules 100 connected to the spindle and the specific processing pressure requirements. For example, both electromagnetic force modules 100 are located above the spindle, and the electromagnetic force modules 100 can generate an attractive electromagnetic force, so that the spindle is subjected to an upward force from the electromagnetic force adjustment device, which, together with the weight of the spindle, provides the processing pressure on the wafer. Alternatively, both electromagnetic force modules are located below the spindle, and the electromagnetic force modules 100 can generate a repulsive electromagnetic force, so that the spindle is subjected to an upward force from the electromagnetic force adjustment device, which, together with the weight of the spindle, provides the processing pressure on the wafer.

[0044] The electromagnetic force adjustment device can regulate the processing pressure by changing the current flowing through coil 110 or by changing the number of coils 110 that generate a magnetic field. Specifically, decreasing the current flowing through coil 110 reduces the magnetic field and thus the electromagnetic force applied to the spindle; increasing the current increases the magnetic field and thus the electromagnetic force. Alternatively, cutting off the current in some coils 110 reduces the number of coils 110 that generate a magnetic field, thus reducing the electromagnetic force applied to the spindle; restoring the current to some coils 110 increases the number of coils 110 that generate a magnetic field, thus increasing the electromagnetic force applied to the spindle. Furthermore, because the magnetic field generated by magnet 120 and the magnetic field generated by energized coil 110 are superimposed, the range of adjustment for processing pressure by the electromagnetic force adjustment device is expanded. During wafer thinning, the processing pressure can be adjusted over a wider range by changing the current.

[0045] It should be noted that the above-mentioned "two electromagnetic force modules 100 are symmetrically arranged with respect to the middle plane" simply refers to the symmetrical arrangement of the electromagnetic force modules 100. Under the premise that the direction of the magnetic field of the magnet 120 in the same electromagnetic force module 100 acting on the coil 110 is the same as the direction of the magnetic field of the coil 110 itself, the magnetic pole arrangement of the magnet 120 in different electromagnetic force modules 100 and the direction of the current flowing through the coil 110 can be flexibly set according to the actual situation.

[0046] In one embodiment, in the two electromagnetic force modules 100, the magnetic poles at the opposite ends of the two magnets 120 arranged opposite each other along the first direction are the same, thus generating a repulsive electromagnetic force between the two magnets 120. Since the direction of the magnetic field generated by the coil 110 after it is energized is the same as the direction of the magnetic field acting on the coil 110 by the magnetic pole, a repulsive electromagnetic force is also generated between the two coils 110 arranged opposite each other along the first direction. In this case, the two electromagnetic force modules 100 have a repulsive electromagnetic force. Alternatively, in another embodiment, in the two electromagnetic force modules 100, the magnetic poles at the opposite ends of the two magnets 120 arranged opposite each other along the first direction are opposite, thus generating an attractive electromagnetic force between the two magnets 120. Since the direction of the magnetic field generated by the coil 110 after it is energized is the same as the direction of the magnetic field acting on the coil 110 by the magnetic pole, a attracting electromagnetic force is also generated between the two coils 110 arranged opposite each other along the first direction. In this case, the two electromagnetic force modules 100 have an attractive electromagnetic force.

[0047] For example, in Figure 1In the illustrated embodiment, electromagnetic force module A and electromagnetic force module B are distributed along a first direction and are symmetrical with respect to the intermediate plane. Electromagnetic force module A is located in the positive direction of electromagnetic force module B along the first direction, and electromagnetic force module B is located in the negative direction of electromagnetic force module A along the first direction. Electromagnetic force module A includes a magnet A and a coil A, and electromagnetic force module B includes a magnet B and a coil B. Figure 1 As shown in Figure (a), in electromagnetic force module A, the magnetic field inside magnet A has its component along the first direction pointing in the positive direction, while the magnetic field outside magnet A acting on coil A has its component along the first direction pointing in the negative direction. When coil A is energized, the magnetic field generated inside it also has its component along the first direction pointing in the negative direction. Therefore, the magnetic field generated by coil A after energization is in the same direction as the magnetic field outside magnet A and can be superimposed. Coil B is located within the superimposed magnetic field and experiences the electromagnetic force exerted by the superimposed magnetic field. In electromagnetic force module B, the magnetic field inside magnet B has its component along the first direction pointing in the negative direction, while the magnetic field outside magnet B acting on coil B has its component along the first direction pointing in the positive direction. When coil B is energized, the magnetic field generated inside it also has its component along the first direction pointing in the positive direction. Therefore, the magnetic field generated by coil B after energization is in the same direction as the magnetic field outside magnet B and can be superimposed. Coil A is located within the superimposed magnetic field and experiences the electromagnetic force exerted by the superimposed magnetic field. In this scenario, the opposing magnetic poles of magnets A and B are the same, and they repel each other. Similarly, the opposing magnetic poles of coils A and B are the same, and they repel each other. Therefore, electromagnetic force modules A and B generate a repulsive electromagnetic force.

[0048] like Figure 1As shown in Figure (b), in electromagnetic force module A, the magnetic field inside magnet A has its component along the first direction pointing in the positive direction, while the magnetic field outside magnet A and acting on coil A has its component along the first direction pointing in the negative direction. When coil A is energized, the magnetic field generated inside it has its component along the first direction pointing in the negative direction. Therefore, the magnetic field generated by coil A after energization is in the same direction as the magnetic field outside magnet A and can be superimposed. Coil B is located within the superimposed magnetic field and experiences the electromagnetic force exerted by the superimposed magnetic field. (The second paragraph is a repetition of the first paragraph.) In this situation, the magnetic poles at the opposite ends of magnets A and B are opposite, and they attract each other. Similarly, the magnetic poles at the opposite ends of coils A and B are opposite, and they attract each other. Thus, an attractive electromagnetic force is generated between electromagnetic force modules A and B.

[0049] Understandably, each electromagnetic force module 100 may include multiple coils 110 and / or multiple magnets 120. The multiple magnets 120 in different electromagnetic force modules 100 interact with each other, increasing the electromagnetic force between the magnets 120 in different electromagnetic force modules 100. Furthermore, the magnetic field generated by the multiple magnets 120 can act on the same coil 110, increasing the electromagnetic force between the coils 110 in different electromagnetic force modules 100, thus increasing the electromagnetic force between the electromagnetic force modules 100. Alternatively, the magnetic field generated by the magnets 120 can act on different coils 110, synchronously generating electromagnetic forces between the multiple coils 110 in different electromagnetic force modules 100, thus increasing the electromagnetic force between the coils 110 in different electromagnetic force modules 100.

[0050] In addition, the arrangement of coil 110 and magnet 120 is parallel to the middle plane, so that the component of the magnetic field generated by magnet 120 along the first direction can be superimposed with the component of the magnetic field generated by coil 110 itself along the first direction. Since the two electromagnetic force modules 100 are distributed along the first direction, the magnetic field generated by the two electromagnetic force modules 100 can make the two electromagnetic force modules 100 generate an electromagnetic force that interacts along the first direction, so that the electromagnetic force adjustment device can provide and adjust the electromagnetic force along the first direction. Since the direction of the electromagnetic force is stable, it is beneficial to keep the spindle balanced and stable during the wafer thinning process.

[0051] It should be noted that the aforementioned "arrangement direction of coil 110 and magnet 120" includes the arrangement direction of multiple coils 110, the arrangement direction of multiple magnets 120, and the arrangement direction of a mixture of coils 110 and magnets 120. Furthermore, the closer the coil is to the magnet 120, the denser the magnetic field lines; the farther away the coil is from the magnet 120, the sparser the magnetic field lines. Therefore, coil 110 is significantly affected by the magnetic field generated by the nearest magnet 120. The direction of the magnetic field generated by coil 110 after being energized is the same as the direction of the magnetic field generated by its closest magnet 120, ensuring that as many magnetic field lines as possible are located in the area where coil 110 is located. This increases the magnetic field strength after the magnetic fields are superimposed and increases the distance between coil 110 and other magnets 120 with different magnetic properties, reducing the influence of other magnets 120 on coil 110. In addition, among the two electromagnetic force modules 100, the distance between the coils 110 and the magnets 120 is the shortest. The coils 110 and the magnets 120 have mutual electromagnetic forces and are less affected by the other coils 110 and magnets 120.

[0052] In addition, the cross-sections of the coil 110 and the magnet 120 parallel to the intermediate plane are not limited to being circular or polygonal. In order to facilitate the arrangement of the coil 110 and the magnet 120 along the intermediate plane and to effectively utilize the space of the electromagnetic force module 100 on the intermediate plane, the cross-sectional diameters of the coil 110 and the magnet 120 can be set to be approximately equal.

[0053] For example, such as Figure 2 In Figure (c), the electromagnetic force module 100 includes a coil 110 and multiple magnets 120. The multiple magnets 120 surround the outer periphery of the coil 110. The magnetic poles of each magnet 120 are the same at the same end in the first direction. The coil 110 is located in the intersection area of ​​the magnetic fields generated by the multiple magnets 120, that is, the coil 110 is located within the magnetic field range generated by each magnet 120. The magnetic field of the coil 110 itself can be superimposed with the magnetic field generated by the multiple magnets 120, which can effectively increase the adjustment range of the electromagnetic force adjustment device for the processing pressure.

[0054] like Figure 2As shown in Figure (d), the electromagnetic force module 100 includes a magnet 120 and multiple coils 110. The multiple coils 110 are arranged around the outer periphery of the magnet 120. When each coil 110 is energized, the magnetic poles at the same end along the first direction are the same, that is, the magnetic field generated by each coil 110 is in the same direction. Each coil 110 is within the magnetic field range generated by the magnet 120. The magnetic field generated by the magnet 120 can be superimposed with the magnetic field generated by each coil 110, which can effectively increase the adjustment range of the electromagnetic force adjustment device for processing pressure. It should be noted that in this embodiment, there is a preset distance between adjacent coils 110 to avoid the coils 110 being too close and weakening the magnetic field.

[0055] In addition, for Figure 2 As shown in Figures (c) and (d), the coil 110 or magnet 120 can be wound with multiple turns to increase the number of coils 110, or to place the coil 110 within the magnetic field range generated by more magnets 120, thereby increasing the magnetic field strength after the magnetic field generated by the coil 110 and the magnetic field generated by the magnet 120 are superimposed.

[0056] For example, such as Figure 3 In Figure (e), within the same electromagnetic force module 100, the coil 110 located at the center of the electromagnetic force module 100 is the first coil 110a, and the remaining coils 110 are the second coils 110b. The second coils 110b are arranged around the first coil 110a circumferentially at least once, and the magnet 120 is arranged around the first coil 110a circumferentially at least once. The second coils 110b and the magnet 120 are arranged alternately along the radial direction of the first coil 110a. After all the coils 110 are energized, the magnetic poles at the same end along the first direction are the same, that is, the magnetic field generated by all the coils 110 is in the same direction, and the magnetic poles at the same end of all the magnets 120 are the same along the first direction.

[0057] Each ring of components surrounding the first coil 110a constitutes an electromagnetic body. Along the radial direction of the first coil 110a and gradually moving away from it, each ring of electromagnetic bodies is named the first ring electromagnetic body, the second ring electromagnetic body, the third ring electromagnetic body, and so on. With this arrangement, the first ring electromagnetic body consists only of multiple magnets 120, which surround the first coil 110a. The first coil 110a is located within the magnetic field range generated by the magnets 120 of each first ring electromagnetic body and can superimpose the magnetic field generated by the magnets 120 within the first ring electromagnetic body. The second ring electromagnetic body consists only of multiple... The second coil 110b and the third electromagnetic body consist of only multiple magnets 120. The second coil 110b in the second electromagnetic body is radially adjacent to the two magnets 120 and is located within the magnetic field range generated by the two magnets 120. That is, both the first coil 110a and the second coil 110b can be located within the magnetic field range generated by the magnets 120 in the first electromagnetic body. Furthermore, the magnetic field generated by the second coil 110b can be superimposed with the magnetic field generated by the magnets 120 in the two adjacent coils. This can greatly increase the electromagnetic force between the two electromagnetic force modules 100 and expand the adjustment range of the electromagnetic force adjustment device for the processing pressure.

[0058] Furthermore, by placing the first coil 110a at the center of the electromagnetic force module 100, and including only magnets 120 within the first coil, the coils 110a are arranged more closely around the first coil 110a. The magnets 120 in the first coil are also close to the first coil 110a, ensuring that a large number of magnets 120 surround the first coil 110a. The first coil 110a is located within the magnetic field range generated by the multiple magnets 120, and the distance between the first coil 110a and the magnets 120 is reduced, placing the first coil 110a in an area with a high magnetic field strength of the magnets 120, thus increasing the electromagnetic force between the electromagnetic force modules 100. On the other hand, compared to placing the magnets 120 at the center of the electromagnetic force module 100 and arranging the coils 110 around the magnets 120, this avoids the coils 110 being too close together and interfering with each other, and weakens the magnetic field.

[0059] Furthermore, the magnets 120 and the second coil 110b of adjacent coils are staggered along the circumference of the first coil 110a. On the one hand, this increases the distance between adjacent second coils 110b within the same coil, preventing the second coils 110b from affecting each other and weakening the magnetic field. On the other hand, it places the second coils 110b between the magnets 120 of adjacent coils in the circumference, allowing the second coils 110b to be within the magnetic field range generated by multiple magnets 120, thereby increasing the magnetic field strength after the magnetic field generated by the second coils 110b is superimposed with the magnetic field generated by the magnets 120.

[0060] Alternatively, the second coil 110b and the magnet 120 can be arranged alternately around the circumference of the first coil 110a for at least one turn, that is, the electromagnetic body simultaneously includes the coil 110 and the magnet 120. Figure 3 In Figure (f), the first electromagnetic body consists of multiple magnets 120a, which surround the outer periphery of the first coil 110a. The second electromagnetic body consists of multiple magnets 120b and multiple second coils 110b. The multiple magnets 120a and multiple second coils 110b are arranged alternately around the circumference of the first coil 110a. The second coils 110b in the first electromagnetic body and the magnets 120b in the second electromagnetic body are staggered along the circumference of the first coil 110a, so that the magnets 120a in the first electromagnetic body and the magnets 120b in the second electromagnetic body can jointly surround the second coil 110b in the second electromagnetic body. The magnetic field generated by the larger number of magnets 120 can act on the second coil 110b and superimpose with the magnetic field generated by the second coil 110b, thereby increasing the electromagnetic force between the electromagnetic force modules 100. Furthermore, the first coil 110a and the second coil 110b are spaced far apart, which can avoid mutual influence between the coils 110 and weaken the magnetic field.

[0061] It should be noted that, for Figure 2 Figure (c) in the middle Figure 2 (d) diagram in the middle Figure 3 Figure (e) in the middle and Figure 3 In the embodiment shown in Figure (f), each ring of electromagnetic bodies is not limited to being arranged in a circle or a polygon. For example, some rings of electromagnetic bodies are arranged in a circle, some rings are arranged in a hexagon, some rings are arranged in a pentagon, etc.

[0062] In one embodiment, such as Figure 4 The electromagnetic force module 100 includes multiple magnetic force units 130, which are arranged along a second direction parallel to the intermediate plane. Each magnetic force unit 130 includes at least one magnet 120 and multiple coils 110 surrounding the magnet 120. In each magnetic force unit 130, after the coil 110 is energized, its magnetic poles are the same as those of the magnet 120 at the same end along the first direction. The direction of the magnetic field exerted by the magnet 120 on the coil 110 is the same as the direction of the magnetic field of the coil 110 itself. The magnetic poles of the magnets 120 at the same end along the first direction in adjacent magnetic force units 130 along the second direction are opposite.

[0063] On the one hand, the coil 110 is surrounded by multiple magnets 120. The magnetic field generated by the coil 110 in each magnetic force unit 130 can be superimposed with the magnetic field of the multiple magnets 120 acting on the coil 110. Moreover, the multiple magnetic force units 130 provide magnetic fields simultaneously, which can increase the electromagnetic force between the two electromagnetic force modules 100. On the other hand, increasing the distance between coils 110 with the same magnetic field direction avoids mutual influence between coils 110 and weakens the magnetic field. Furthermore, the magnets 120 surround the outer periphery of the coil 110. There are magnets 120 between the coils 110 in adjacent magnetic force units 130. The magnetic poles of adjacent magnets 120 in adjacent magnetic force units 130 are opposite along the first direction. The magnetic field direction of one magnet 120 acting on another magnet 120 is the same as the magnetic field direction of the other magnet 120 itself. Thus, the magnetic fields generated by adjacent magnets 120 can be superimposed, which can further increase the electromagnetic force between the electromagnetic force modules 100.

[0064] In addition, multiple magnetic units 130 can be arranged along a third direction, which is parallel to the middle plane. The first direction, the second direction, and the third direction are perpendicular to each other, so that the magnetic units 130 are arranged in a rectangular shape. The magnets 120 in adjacent magnetic units 130 along the third direction have opposite magnetic poles at the same end along the first direction, so that the magnetic units 130 have a larger arrangement area, increasing the electromagnetic force between the two electromagnetic force modules 100, and at the same time, effectively utilizing the space of the electromagnetic force module 100 in the middle plane.

[0065] It should be noted that the magnetic pole of each coil 110 along the first direction is opposite to the magnetic pole of the nearest coil 110 or magnet 120 along the first direction, and the magnetic pole of each magnet 120 along the first direction is opposite to the magnetic pole of the nearest coil 110 or magnet 120 along the first direction, so that the magnetic field generated by the coil 110 can be superimposed with the magnetic field generated by the multiple magnets 120, so as to maximize the enhancement of the electromagnetic force between the electromagnetic force modules 100.

[0066] Furthermore, the number of magnets 120 within each magnetic unit 130 is unlimited, such as... Figure 4 In diagram (g), each magnetic unit 130 includes four magnets 120, such as... Figure 4 In diagram (h), each magnetic unit 130 includes five magnets 120.

[0067] It should be noted that, Figures 2-4 The “S” and “N” in the text are only used to indicate whether the magnetic poles at the same end along the first direction are consistent between coil 110 and coil 110, between coil 110 and magnet 120, or between magnet 120 and magnet 120. The magnetic poles of coil 110 and magnet 120 can be reasonably adjusted according to the actual processing situation.

[0068] In one embodiment, such as Figure 7The electromagnetic force module 100 also includes an iron core 150, and a coil 110 is sleeved on the outside of the iron core 150. When the coil 110 is energized, the iron core 150 is magnetized in the magnetic field generated by the coil 110, which can strengthen the magnetic induction intensity of the magnetic field generated by the coil 110, thereby enhancing the electromagnetic force between the electromagnetic force modules 100.

[0069] Reference Figure 5 and Figure 6 The electromagnetic force module 100 also includes a housing 140, which has a first mounting cavity 141 and a second mounting cavity 142. The magnet 120 is fixed in the first mounting cavity 141 and the coil 110 is fixed in the second mounting cavity 142. The magnet 120 and the coil 110 are assembled in the housing 140, so that the electromagnetic force module 100 is a whole structure and can be used in wafer thinning equipment, which is more convenient to use.

[0070] like Figure 7 As shown, the housing 140 includes an outer shell 143 and a mounting plate 144. The outer shell 143 is fastened to one side of the mounting plate 144 along a first direction. The inner cavity of the housing 140 is defined between the outer shell 143 and the mounting plate 144. The mounting plate 144 is embedded in the interior of the outer shell 143. Threaded fasteners are inserted into the outer shell 143 and the mounting plate 144 along the periphery of the outer shell 143 and lock the outer shell 143 and the mounting plate 144.

[0071] The electromagnetic force module 100 also includes a mounting bracket 160, which is installed on the side of the mounting plate 144 facing the outer shell 143. The interior of the mounting bracket 160 defines a first mounting cavity 141 and a second mounting cavity 142, which extend through in a first direction. Threaded fasteners are inserted into the mounting plate 144 on the side facing away from the outer shell 143, fixing the iron core 150 to the mounting plate 144. The coil 110 is sleeved on the outer periphery of the iron core 150. The electromagnetic force module 100 also includes multiple cover plates 170, at least some of which are located within the first mounting cavity 141. The cover plates 170 are located on the side of the magnet 120 facing away from the mounting plate 144. The periphery of the magnet 120 is limited by the cavity wall of the first mounting cavity 141, and both ends of the magnet 120 are limited by the mounting plate 144 and the cover plates 170, respectively, thus securing it within the first mounting cavity 141.

[0072] The installation method of the cover plate 170 into the first mounting cavity 141 is not limited to snap-fit, plug-in, etc.; for example, the inner wall of the first mounting cavity 141 and the cover plate 170 are provided with mutually cooperating buckles, the cover plate 170 is snapped into the inside of the first mounting cavity 141, and the magnet 120 is limited.

[0073] In addition, the electromagnetic force module 100 also includes a cooling plate 180, which is attached to at least one surface of the housing 140 in the first direction. The cooling plate 180 is not limited to being a liquid cooling plate, a cooling chip, etc., and can provide cooling. The coil 110 generates heat during operation, and the heat is easily accumulated inside the housing 140, causing the electromagnetic force module 100 to reach high temperatures and affecting the working efficiency of the electromagnetic force regulating device. The cooling plate 180 is used to cool the housing 140 and keep the electromagnetic force module 100 within a suitable temperature range.

[0074] The electromagnetic force module 100 also includes a base plate 190, a mounting plate 144, a cooling plate 180, and a base plate 190, which can be locked and fixed with threaded fasteners. The cooling plate 180 is located between the base plate 190 and the mounting plate 144, which can reduce the impact of the external environment on the cooling plate 180 and strengthen the overall structural strength of the electromagnetic force module 100.

[0075] In one embodiment, the cooling plate 180 is located between the base plate 190 and the mounting plate 144, and the base plates 190 of the two electromagnetic force modules 100 are arranged opposite each other so that the two electromagnetic force modules 100 are closer together, thereby increasing the electromagnetic force between the electromagnetic force adjustment devices.

[0076] The embodiments of the present invention have been described in detail above with reference to the accompanying drawings. However, the present invention is not limited to the above embodiments. Within the scope of knowledge possessed by those skilled in the art, various changes can be made without departing from the spirit of the present invention. Furthermore, the embodiments of the present invention and the features thereof can be combined with each other unless otherwise specified.

Claims

1. Electromagnetic force adjustment device, characterized in that The electromagnetic force module comprises two coils and multiple magnets, and the multiple magnets are arranged around the outer periphery of the coil. The electromagnetic force module further comprises an iron core, and the coil is sleeved on the outside of the iron core.

2. The electromagnetic force adjustment device according to claim 1, characterized in that The magnetic poles of the two magnets facing each other at one end of the two magnets arranged opposite to each other in the first direction are the same.

3. The electromagnetic force adjustment device of claim 1, wherein, Alternatively, the magnetic poles of the two magnets facing each other at one end of the two magnets arranged opposite to each other in the first direction are opposite. The electromagnetic force module comprises one coil and multiple magnets, and the multiple magnets are arranged around the outer periphery of the coil.

4. The electromagnetic force adjustment device of claim 3, wherein In the same electromagnetic force module, the coil located at the center of the electromagnetic force module is a first coil, and the remaining coils are second coils.

5. The electromagnetic force adjustment device of claim 3, wherein The second coils and the magnets are alternately arranged in at least one circle along the circumference of the first coil.

6. The electromagnetic force adjustment device of claim 5, wherein, The second coils and the magnets are alternately arranged in at least one circle along the circumference of the first coil.

7. The electromagnetic force adjustment device of claim 5, wherein, The electromagnetic force module comprises multiple magnetic force units, and the magnetic force units are arranged in a second direction.

8. The electromagnetic force adjustment device of claim 3, wherein, Each magnetic force unit comprises at least one magnet and multiple coils arranged around the outer periphery of the magnet. In each magnetic force unit, the magnetic field direction of the magnet acting on the coil is the same as the magnetic field direction of the coil itself. The magnetic poles of the magnets in the magnetic force units adjacent in the third direction are opposite along the same end in the first direction.

9. The electromagnetic force adjustment device of claim 1, wherein, The first direction, the second direction and the third direction are perpendicular to each other.

10. The electromagnetic force adjustment device of claim 9, wherein, The electromagnetic force module further comprises a shell, and the shell is provided with a first mounting cavity and a second mounting cavity. The magnets are fixed in the first mounting cavity, and the coils are fixed in the second mounting cavity. The electromagnetic force module further comprises a cooling plate, and the cooling plate is attached to at least one surface of the shell in the first direction.