Purification table of edge passivation equipment
By rationally arranging the gas holder and electrical cabinet in the purification station of the edge passivation equipment, and using a robotic arm for carrier handling, the problem of low space utilization of traditional equipment is solved, and the compact design and efficient production of the equipment are achieved.
Patent Information
- Application Number
- CN202520105397.4
- Authority / Receiving Office
- CN · China
- Patent Type
- Utility models(China)
- Current Assignee / Owner
- Filing Date
- 2025-01-16
- Publication Date
- 2026-02-10
- Estimated Expiration
- 2035-01-16
AI Technical Summary
The cleanrooms of existing traditional coating equipment cannot meet the space utilization requirements of edge passivation equipment, especially with the rapid development of silicon wafer half-wafers. The unreasonable layout of traditional equipment leads to low space utilization.
Design an edge passivation equipment purification table. Through reasonable layout, gas holder and electrical cabinet are integrated into the frame. Line mechanism runs through the frame, and robot arm is used to transport the carrier, realizing efficient transfer of the carrier between the reaction chamber and the purification table.
The space utilization rate of the edge passivation equipment clean bench has been improved. The compact structure shortens the pipeline distance of electrical components, reduces installation difficulty and cost, and improves production efficiency and rational use of space.
Smart Images

Figure CN223899592U_ABST
Abstract
Description
Technical Field
[0001] This utility model relates to the field of semiconductor device technology, and in particular to a clean bench for edge passivation equipment. Background Technology
[0002] The primary function of the cleanroom in traditional photovoltaic coating equipment is to transport silicon wafer carriers, mainly moving them back and forth between automated equipment and the furnace cabinet. Due to the rapid development of half-wafer production, the passivation of silicon wafer sidewalls (or edges) is receiving increasing attention. This has led to the development of edge passivation equipment and supporting silicon wafer transport devices. The rational spatial layout, transport structure, and transport logic of the cleanroom in edge passivation equipment have a significant impact on the edge passivation process and production efficiency.
[0003] Currently, the cleanroom units for atomic layer deposition (ALD) or plasma-enhanced chemical vapor deposition (PECVD) equipment mainly consist of inlet / outlet boat components, robotic arm components, and boat pushing mechanisms. Furthermore, the necessary electrical cabinets and gas cabinets for coating equipment are housed in separate modules or cabinets. Due to the unique nature of the spatial ALD process used for edge passivation, a single chamber can simultaneously hold multiple wafer carriers, and silicon wafers can be stacked. This necessitates miniaturization of wafer loading tools or cassettes, and requires extremely high cleanliness of the reaction chamber, rendering the cleanroom units of traditional coating equipment inadequate.
[0004] Therefore, how to provide a layout scheme for the edge passivation equipment clean bench to improve the space utilization rate of the edge passivation equipment clean bench is an urgent technical problem to be solved. Utility Model Content
[0005] In view of this, the present invention provides an edge passivation equipment purification table to solve the problem of low space utilization caused by unreasonable layout of the edge passivation equipment purification table in the prior art.
[0006] The technical solution of this utility model is a purification table for edge passivation equipment, including a frame, and a line mechanism for transferring a carrier is provided inside the frame. The line mechanism passes through the frame, and the two ends of the line mechanism are respectively used to connect to a feeding mechanism and a discharging mechanism.
[0007] The frame is equipped with a gas holder and an electrical cabinet on each side.
[0008] The line mechanism is also provided with a transport mechanism in the middle, which is used to transport the carrier on the line mechanism to the reaction chamber, or to transport the carrier in the reaction chamber to the line mechanism.
[0009] Furthermore, the line mechanism includes a first line and a second line;
[0010] One end of the first line is used to connect to the output end of the feeding mechanism, and the other end of the first line is used to connect to the input end of the unloading mechanism; one end of the second line is used to connect to the input end of the feeding mechanism, and the other end of the second line is used to connect to the output end of the unloading mechanism.
[0011] Furthermore, the first and second lines within the frame are arranged vertically, with the first line positioned above the second line.
[0012] Furthermore, a transfer position is provided in the middle of the first line body, and a conveying mechanism is provided in the frame corresponding to the transfer position.
[0013] Furthermore, an industrial control computer is also provided on the side of the frame facing the electrical cabinet, and the industrial control computer is electrically connected to the production line mechanism, the gas cabinet, the electrical cabinet and the handling mechanism respectively.
[0014] Furthermore, the industrial control computer and the electrical cabinet are arranged vertically.
[0015] Furthermore, the frame is also provided with a protective cover, and the protective cover is provided with at least one openable door corresponding to the line mechanism.
[0016] Furthermore, the transport mechanism is a robotic arm.
[0017] Compared with the prior art, the present invention has at least the following beneficial effects:
[0018] This invention integrates the gas cabinet and electrical cabinet into the edge passivation equipment purification table without affecting its function. The production line mechanism runs across the frame of the edge passivation equipment purification table, making the structure of the edge passivation equipment purification table compact. The size of the edge passivation equipment purification table is reduced through reasonable layout, and the distance from the wires, gas pipes and other pipelines of electrical components to the production line mechanism is shortened. This makes reasonable use of the space of the edge passivation equipment purification table and improves the space utilization rate. Attached Figure Description
[0019] Unless otherwise defined, all technical and scientific terms used herein have the same meaning as commonly understood by one of ordinary skill in the art to which this invention pertains; the terminology used herein in the specification is for the purpose of describing particular embodiments only and is not intended to be limiting of the invention; the terms "comprising" and "having," and any variations thereof, in the specification, claims, and accompanying drawings of this invention are intended to cover non-exclusive inclusion. The terms "first," "second," etc., in the specification, claims, or accompanying drawings of this invention are used to distinguish different objects and not to describe a particular order.
[0020] To more clearly illustrate the technical solutions in the embodiments of this utility model, the drawings used in the description of the embodiments or the prior art will be briefly introduced below. Obviously, the drawings described below are only some embodiments of this utility model. For those skilled in the art, other drawings can be obtained based on these drawings without creative effort.
[0021] Figure 1 This is a front view of the closed state of the purification table of the edge passivation device proposed in this utility model;
[0022] Figure 2 This is a rear view of the clean bench of the edge passivation device proposed in this utility model in the open state.
[0023] Figure 3 This is a partial block diagram of the edge passivation device purification table proposed in this utility model.
[0024] Figure label:
[0025] 1. Feeding mechanism; 2. Discharging mechanism; 3. Reaction chamber;
[0026] 10. Rack;
[0027] 20. Line mechanism; 201. First line; 202. Second line; 203. Adapter position;
[0028] 30. Gas holder;
[0029] 40. Electrical cabinet;
[0030] 50. Handling mechanism;
[0031] 60. Industrial control computer;
[0032] 70. Protective cover; 701. Door body. Detailed Implementation
[0033] To make the technical problem to be solved, the technical solution, and the beneficial effects of this utility model clearer, the present utility model will be further described in detail below with reference to the accompanying drawings and embodiments. It should be understood that the specific embodiments described herein are merely illustrative of the present utility model and are not intended to limit the present utility model. Therefore, a feature pointed out in this specification is used to describe one feature of one embodiment of the present utility model, and does not imply that every embodiment of the present utility model must have the described feature. Furthermore, it should be noted that this specification describes many features. Although certain features may be combined to illustrate possible system designs, these features may also be used in other combinations not explicitly stated. Therefore, unless otherwise stated, the described combinations are not intended to be limiting.
[0034] The principle and structure of this utility model will be described in detail below with reference to the accompanying drawings and embodiments.
[0035] In one embodiment, refer to Appendix Figure 1-3 This utility model proposes an edge passivation equipment purification table with a reasonable layout and improved overall space utilization. It includes a frame 10, and a line mechanism 20 for transferring the carrier is provided in the frame 10. The line mechanism 20 passes through the frame 10, and the two ends of the line mechanism 20 are respectively used to connect to the feeding mechanism 1 and the unloading mechanism 2.
[0036] The frame 10 is provided with a gas holder 30 and an electrical cabinet 40 on both sides respectively;
[0037] The line mechanism 20 is also provided with a transport mechanism 50 in the middle. The transport mechanism 50 is used to transport the carrier on the line mechanism 20 to the reaction chamber 3, or to transport the carrier in the reaction chamber 3 to the line mechanism 20.
[0038] It should be noted that the gas holder 30 is a device specifically used for storing and managing industrial gases (such as nitrogen, oxygen, argon, carbon dioxide, etc.) to provide a stable gas supply for the production process; the electrical cabinet 40 is an enclosed cabinet used for installing and protecting electrical equipment and control systems.
[0039] The loading mechanism 1 is used to transport the carrier containing the silicon wafers to be passivated to the line mechanism 20. The carrier stops at the middle of the line mechanism 20, waiting for the transport mechanism 50 to transport the carrier to the reaction chamber 3 for edge passivation treatment. Then, the transport mechanism 50 transports the carrier with the passivated silicon wafers back to the middle of the line mechanism 20. At this time, the line mechanism 20 starts transporting again, and then the next carrier containing the silicon wafers to be passivated is transported to the middle of the line mechanism 20, so that the transport mechanism 50 transports the next carrier to the reaction chamber 3. This process is repeated. The unloading mechanism 2 removes the passivated silicon wafers from the carrier, and then transports the empty carrier to the line mechanism 20. The line mechanism 20 then returns to the loading mechanism 1, fills the empty carrier with the silicon wafers to be passivated, and then transports it to the line mechanism 20.
[0040] Therefore, compared with the traditional atomic layer deposition (ALD) equipment that sets up the electrical cabinet and gas cabinet separately from the clean bench, this embodiment integrates the gas cabinet 30 and electrical cabinet 40 into the edge passivation equipment clean bench without affecting its function. The line mechanism 20 runs across the frame 10 of the edge passivation equipment clean bench, making the structure of the edge passivation equipment clean bench compact. The size of the edge passivation equipment clean bench is reduced through reasonable layout, and the distance from the wires, gas pipes and other pipelines of electrical components to the line mechanism 20 is shortened. This makes reasonable use of the space of the edge passivation equipment clean bench, thereby improving space utilization.
[0041] Specifically, refer to the appendix Figure 2-3 The line mechanism 20 includes a first line 201 and a second line 202;
[0042] One end of the first line 201 is used to connect to the output end of the feeding mechanism 1, and the other end of the first line 201 is used to connect to the input end of the unloading mechanism 2; one end of the second line 202 is used to connect to the input end of the feeding mechanism 1, and the other end of the second line 202 is used to connect to the output end of the unloading mechanism 2.
[0043] In order to ensure that the transport mechanism 50 can better transport the carrier filled with silicon wafers to be passivated to the reaction chamber 3, the first line body 201 is provided with a transfer position 203 in the middle, the transfer position 203 is matched and corresponds to the feed port of the reaction chamber 3, and the frame 10 is provided with a transport mechanism 50 corresponding to the transfer position 203.
[0044] It should be noted that the conveying method of the first line 201 and the second line 202 in this embodiment is illustrated by conveyor belt transmission.
[0045] In this way, the first line 201 is used to transport the carrier filled with silicon wafers to be edge passivated. When the carrier filled with silicon wafers to be edge passivated is transported to the transfer position 203, the first line 201 will stop transporting. At this time, the first line 201 will play a temporary storage function. Then the transport mechanism 50 will transport the carrier filled with silicon wafers to be edge passivated on the transfer position 203 to the reaction chamber 3 for edge passivation. After the edge passivation is completed, the transport mechanism 50 will transport the carrier in the reaction chamber 3 back to the transfer position 203. Then the first line 201 will start transporting again until the next carrier filled with silicon wafers to be edge passivated is transported to the transfer position 203, and the above process will be repeated.
[0046] The empty carriers conveyed by the unloading mechanism 2 are transported back to the loading mechanism 1 via the second line 202. When the first line 201 stops conveying, the second line 202 can choose to continue or stop conveying according to the actual situation, thus completing the transfer work of the edge passivation equipment purification table.
[0047] To ensure that the transport mechanism 50 can transport the vehicle to the reaction chamber 3 or the transfer position 203 more quickly and efficiently, please refer to the appendix. Figure 2 The first line 201 and the second line 202 within the frame 10 are arranged vertically, with the first line 201 located above the second line 202.
[0048] Among them, refer to the appendix Figure 1 The frame 10 is also provided with an industrial control computer 60 on the side facing the electrical cabinet 40. The industrial control computer 60 is electrically connected to the line mechanism 20, the gas cabinet 30, the electrical cabinet 40 and the handling mechanism 50 respectively.
[0049] It should be noted that when the edge passivation equipment purification station needs to be started, press the start button on the interface or control panel of the industrial control computer 60. Then, the industrial control computer 60 will control the edge passivation equipment purification station to run according to the pre-stored program to complete the work of the line mechanism 20 and the reaction chamber 3, so as to achieve highly automated control, reduce manual intervention, and improve production efficiency and product quality.
[0050] Therefore, without affecting the function of the edge passivation equipment clean bench, the gas cabinet 30, electrical cabinet 40, and industrial control computer 60 are reasonably integrated into the edge passivation equipment clean bench, and the production line mechanism 20 runs across the frame 10 of the edge passivation equipment clean bench. This makes the structure of the edge passivation equipment clean bench compact. The size of the edge passivation equipment clean bench is reduced through reasonable layout, and the distance from the wires, gas pipes, and other pipelines of electrical components to the production line mechanism 20 is shortened. This makes reasonable use of the space of the edge passivation equipment clean bench, thereby improving space utilization. Moreover, because the production line mechanism 20, gas cabinet 30, electrical cabinet 40, and industrial control computer 60 are concentrated on one frame 10, the components of each mechanism or module are more concentrated, and the corresponding pipeline installation is more convenient, reducing installation difficulty and cost. Furthermore, the industrial control computer 60 and electrical cabinet 40 are on the same side, which facilitates installation and subsequent operation by commissioning personnel, so that the edge passivation equipment clean bench can work better and more efficiently.
[0051] The industrial control computer 60 and the electrical cabinet 40 are arranged vertically, which makes the structure of the edge passivation equipment purification table compact, the layout reasonable, and the space of the edge passivation equipment purification table reasonable.
[0052] During operation, the linear mechanism 20 may generate belt dust due to friction, and there may be issues such as lubricant contamination of the lead screw or guide rail, and silicon wafer breakage causing debris. To prevent these cleaning problems from affecting the operation of other mechanisms, please refer to the appendix. Figure 1-2 The frame 10 is also provided with a protective cover 70.
[0053] Furthermore, the outer shell or cabinet of the gas holder 30, electrical cabinet 40, and industrial control computer 60 are not part of the protective cover 70.
[0054] The protective cover 70 is provided with at least one openable door 701 corresponding to the linear mechanism 20.
[0055] It should be noted that the protective cover 70 proposed in this embodiment is provided with a door 701 on both the front and back of the corresponding transfer position 203 and the conveying mechanism 50, and the protective cover 70 is provided with a door 701 on the back of the line mechanism 20 facing the feeding mechanism 1 and the line mechanism 20 facing the unloading mechanism 2.
[0056] The front of this embodiment is the side of the edge passivation equipment purification table where the electrical cabinet 40 is located, and the back is the other side of the edge passivation equipment purification table facing away from the electrical cabinet 40.
[0057] In this way, when the line mechanism 20 or the conveying mechanism 50 in the edge passivation equipment purification station malfunctions, maintenance personnel can open the door 701 for maintenance; and in special circumstances, simply opening the door 701 allows for observation and inspection of each structure or module.
[0058] Furthermore, in order to better observe the operation of the edge passivation equipment inside the purification station, the door 701 is made of transparent material or an observation window is set on the door 701.
[0059] The transport mechanism 50 is preferably a robotic arm.
[0060] Obviously, the embodiments described above are only some embodiments of this utility model, not all embodiments. The accompanying drawings show preferred embodiments of this utility model, but do not limit the patent scope of this utility model. This utility model can be implemented in many different forms; rather, the purpose of providing these embodiments is to provide a more thorough and comprehensive understanding of the disclosure of this utility model. Although this utility model has been described in detail with reference to the foregoing embodiments, those skilled in the art can still modify the technical solutions described in the foregoing specific embodiments, or make equivalent substitutions for some of the technical features. Any equivalent structures made using the content of this utility model specification and drawings, directly or indirectly applied to other related technical fields, are similarly within the patent protection scope of this utility model.
Claims
1. A purification table for edge passivation equipment, characterized in that, Includes a frame (10), the frame (10) is provided with a line mechanism (20) for transferring the carrier, the line mechanism (20) passes through the frame (10), and the two ends of the line mechanism (20) are respectively used to connect to the loading mechanism (1) and the unloading mechanism (2); The frame (10) is provided with a gas holder (30) and an electrical cabinet (40) on both sides respectively; The line mechanism (20) is also provided with a transport mechanism (50) in the middle. The transport mechanism (50) is used to transport the carrier on the line mechanism (20) to the reaction chamber (3), or to transport the carrier in the reaction chamber (3) to the line mechanism (20).
2. The edge passivation equipment purification table according to claim 1, characterized in that, The line mechanism (20) includes a first line (201) and a second line (202); One end of the first line (201) is used to connect to the output end of the feeding mechanism (1), and the other end of the first line (201) is used to connect to the input end of the unloading mechanism (2); one end of the second line (202) is used to connect to the input end of the feeding mechanism (1), and the other end of the second line (202) is used to connect to the output end of the unloading mechanism (2).
3. The edge passivation equipment purification table according to claim 2, characterized in that, The first line body (201) and the second line body (202) in the frame (10) are arranged vertically, and the first line body (201) is located above the second line body (202).
4. The edge passivation equipment purification table according to claim 2 or 3, characterized in that, The first line body (201) has a transfer position (203) in the middle, and the frame (10) has a conveying mechanism (50) corresponding to the transfer position (203).
5. The edge passivation equipment purification table according to claim 1, characterized in that, An industrial control computer (60) is also provided on the side of the frame (10) facing the electrical cabinet (40). The industrial control computer (60) is electrically connected to the line mechanism (20), the gas cabinet (30), the electrical cabinet (40) and the handling mechanism (50).
6. The edge passivation equipment purification table according to claim 5, characterized in that, The industrial control computer (60) and the electrical cabinet (40) are arranged vertically.
7. The edge passivation equipment purification table according to claim 1, characterized in that, The frame (10) is also provided with a protective cover (70), and the protective cover (70) is provided with at least one openable door (701) corresponding to the line mechanism (20).
8. The edge passivation equipment purification table according to claim 1, characterized in that, The handling mechanism (50) is a robotic arm.