Atomizing core, atomizer and electronic atomizing equipment

Abstract

The utility model provides an atomizing core, an atomizer and electronic atomizing equipment. The atomizing core comprises a porous resin matrix, a heating body and an electrode, wherein the porous resin matrix comprises resin particles and a plurality of pores; the air holes are clearance holes formed by stacking resin particles; the heating body is arranged on the surface of the porous resin matrix, and the electrode is arranged in a target area of the heating body. The air holes in the porous resin matrix can store the atomization matrix, the porous resin matrix has good wettability on the atomization matrix, the speed of guiding the atomization matrix stored in the air holes to the heating body by the porous resin matrix can be increased by combining the air holes formed by stacking the resin particles in the porous resin matrix, and the heating effect of the heating body is improved. Therefore, the liquid guiding capacity of the atomizing core and the distribution uniformity of the atomizing matrix on the surface of the heating body are improved, the atomizing matrix can be atomized by heating the heating body, and the atomizing effect of the atomizing core on the atomizing matrix is improved.

Description

Technical Field

[0001] This application relates to the field of atomizer technology, and more particularly to an atomizing core, atomizer, and electronic atomization device. Background Technology

[0002] An atomizing device is a device that heats an atomizing substrate with an atomizing core and atomizes the substrate to produce an aerosol for user use.

[0003] In related technologies, atomizing devices generally include porous ceramic atomizing cores. However, the wettability between porous ceramic atomizing cores and atomizing substrates is poor, resulting in poor liquid conduction capacity of porous ceramic atomizing cores. This leads to uneven distribution of the atomizing substrate on the surface of porous ceramic atomizing cores, which in turn affects the atomization effect of porous ceramic atomizing cores on atomizing substrates. Utility Model Content

[0004] This application provides an atomizing core, an atomizer, and an electronic atomization device to solve the problems of poor liquid conduction capacity and poor atomization effect on the atomization matrix of porous ceramic atomizing cores in related technologies.

[0005] To solve the above problems, this application provides the following technical solution:

[0006] This application proposes an atomizing core, comprising a porous resin matrix, a heating element, and electrodes;

[0007] The porous resin matrix includes resin particles and multiple pores; the pores are interstitial pores formed by the accumulation of the resin particles.

[0008] The heating element is disposed on the surface of the porous resin matrix, and the electrode is disposed in the target area of ​​the heating element.

[0009] Furthermore, in the atomizing core, the porosity of the porous resin matrix is ​​30% to 70%.

[0010] Furthermore, in the atomizing core, the pore size of the porous resin matrix is ​​10μm to 200μm.

[0011] Furthermore, in the atomizing core, the thermal conductivity of the porous resin matrix is ​​lower than that of the heating element.

[0012] Furthermore, in the atomizing core, the thermal conductivity of the porous resin matrix is ​​0.1 W / (m·K) to 10 W / (m·K).

[0013] Furthermore, in the atomizing core, the thickness of the porous resin matrix is ​​0.05 mm to 3 mm.

[0014] Furthermore, in the atomizing core, the liquid conduction velocity of the porous resin matrix is ​​greater than that of the heating element.

[0015] Furthermore, in the atomizing core, the liquid conduction velocity of the porous resin matrix is ​​4s / drop to 8s / drop.

[0016] Furthermore, in the atomizing core, the heat resistance temperature of the porous resin matrix is ​​greater than 350°C.

[0017] Furthermore, in the atomizing core, the thermal shrinkage rate of the porous resin matrix is ​​less than 0.3%.

[0018] Furthermore, in the atomizing core, the heating element is a porous carbonized layer; the porous carbonized layer is stacked on the surface of the porous resin matrix, and the electrode is disposed in the target area of ​​the porous carbonized layer.

[0019] Furthermore, the atomizing core further includes a transition layer; the transition layer is disposed between the porous resin matrix and the porous carbonized layer.

[0020] Furthermore, in the atomizing core, the carbonization rate of the transition layer is 20% to 60%.

[0021] Furthermore, in the atomizing core, the thickness of the transition layer is 2μm to 20μm.

[0022] Furthermore, in the atomizing core, the porous carbonized layer and the porous resin matrix are integrally formed.

[0023] Furthermore, in the atomizing core, the thickness of the porous carbonized layer is 20μm to 200μm.

[0024] Furthermore, in the atomizing core, the resistance of the heating element is greater than the resistance of the electrode.

[0025] Furthermore, in the atomizing core, the resistance of the heating element is 2Ω to 200Ω.

[0026] Furthermore, in the atomizing core, the resistance of the electrode is less than 2Ω.

[0027] Furthermore, in the atomizing core, the thickness of the electrode is 10μm to 200μm.

[0028] Furthermore, in the atomizing core, the curing temperature of the electrode is 50℃~300℃.

[0029] Furthermore, in the atomizing core, the heat resistance temperature of the electrode is greater than the operating temperature of the heating element.

[0030] Furthermore, in the atomizing core, the porous resin matrix is ​​a polyimide matrix.

[0031] This application also provides an atomizer comprising the atomizing core as described above.

[0032] This application also provides an electronic atomizing device, which includes the atomizer described above.

[0033] Compared with related technologies, this application has the following advantages:

[0034] The atomizing core provided in this application includes a porous resin matrix, a heating element, and an electrode. The porous resin matrix includes resin particles and multiple pores, and the pores are interstitial pores formed by the accumulation of resin particles. The pores in the porous resin matrix can not only store the atomizing matrix, but also have good wettability to the atomizing matrix. Combined with the pores formed by the accumulation of resin particles in the porous resin matrix, the speed at which the atomizing matrix stored in the pores is brought out to the heating element can be improved, thereby improving the liquid guiding capacity of the atomizing core and the uniformity of the atomizing matrix distribution on the surface of the heating element. By heating the heating element, the atomizing matrix brought out by the porous resin matrix to the heating element can be atomized, thus improving the atomization effect of the atomizing core on the atomizing matrix.

[0035] It should be understood that the above general description and the following detailed description are exemplary and explanatory only, and do not limit this application. Attached Figure Description

[0036] The above and / or additional aspects and advantages of this application will become apparent and readily understood from the description of the embodiments taken in conjunction with the following drawings, in which:

[0037] Figure 1 A schematic diagram of the structure of an atomizing core provided in this application embodiment. Figure 1 ;

[0038] Figure 2 A schematic diagram of the exploded structure of an atomizing core provided in this application embodiment. Figure 1 ;

[0039] Figure 3 A schematic diagram of the structure of an atomizing core provided in this application embodiment. Figure 2 ;

[0040] Figure 4 A schematic diagram of the exploded structure of an atomizing core provided in this application embodiment. Figure 2 ;

[0041] Figure 5 A schematic diagram of the structure of an atomizing core provided in this application embodiment. Figure 3 ;

[0042] Figure 6 A schematic diagram of the structure of an atomizing core provided in this application embodiment. Figure 4 ;

[0043] Figure 7 A schematic diagram of the structure of an atomizing core provided in this application embodiment. Figure 5 .

[0044] Figure label:

[0045] 100-Atomizing core; 110-Porous resin matrix; 120-Heating element; 130-Electrode; 140-Transition layer; 01-Pore; 02-Sub-circuit. Detailed Implementation

[0046] The embodiments of this application will now be described in detail. Examples of these embodiments are illustrated in the accompanying drawings, wherein the same or similar reference numerals denote the same or similar elements or elements having the same or similar functions throughout. The embodiments described below with reference to the accompanying drawings are exemplary and are only used to explain this application, and should not be construed as limiting this application. All other embodiments obtained by those skilled in the art based on the embodiments of this application without inventive effort are within the scope of protection of this application.

[0047] The terms "first" and "second" in the specification and claims of this application may explicitly or implicitly include one or more of the features. In the description of this application, unless otherwise stated, "multiple" means two or more. Furthermore, "and / or" in the specification and claims indicates at least one of the connected objects, and the character " / " generally indicates that the preceding and following objects are in an "or" relationship.

[0048] In the description of this application, it should be understood that the terms "center", "longitudinal", "lateral", "length", "width", "thickness", "upper", "lower", "front", "rear", "left", "right", "vertical", "horizontal", "top", "bottom", "inner", "outer", "clockwise", "counterclockwise", "axial", "radial", "circumferential", etc., indicating the orientation or positional relationship based on the orientation or positional relationship shown in the accompanying drawings, are only for the convenience of describing this application and simplifying the description, and do not indicate or imply that the device or element referred to must have a specific orientation, or be constructed and operated in a specific orientation, and therefore should not be construed as a limitation of this application.

[0049] In the description of this application, it should be noted that, unless otherwise expressly specified and limited, the terms "installation," "connection," and "linking" should be interpreted broadly. For example, they can refer to a fixed connection, a detachable connection, or an integral connection; they can refer to a mechanical connection or an electrical connection; they can refer to a direct connection or an indirect connection through an intermediate medium; and they can refer to the internal connection between two components. Those skilled in the art can understand the specific meaning of the above terms in this application based on the specific circumstances.

[0050] The following description, in conjunction with the accompanying drawings, details the atomizing core, atomizer, and electronic atomization device provided in this application through specific embodiments and application scenarios.

[0051] Reference Figure 1 and Figure 2 The present application provides an atomizing core 100, which includes a porous resin matrix 110, a heating element 120 and an electrode 130.

[0052] The porous resin matrix 110 includes resin particles and multiple pores 01. It should be noted that the pores 01 in the porous resin matrix 110 are interstitial pores formed by the accumulation of resin particles, and the shapes of the pores 01 are irregular. Figure 2 The enlarged view in the figure is used to show that the porous resin matrix 110 includes pores 01, and does not limit the shape of the pores 01 to circular.

[0053] The pores 01 in the porous resin matrix 110 can not only store the atomizing matrix, but also have good wettability to the atomizing matrix. Combined with the pores 01 formed by the accumulation of resin particles in the porous resin matrix 110, the speed at which the porous resin matrix 110 conducts the atomizing matrix stored in the pores 01 to the heating element 120 can be improved, thereby improving the liquid guiding ability of the atomizing core and the uniformity of the atomizing matrix distribution on the surface of the heating element.

[0054] In the embodiments of this application, the porous resin matrix 110 can be prepared by foaming or by using a pore-forming agent.

[0055] The foaming method specifically involves: first, mixing the resin adhesive and the foaming agent; then, foaming and drying at a temperature between 30°C and 100°C; heating causes the foaming agent to undergo thermal decomposition to generate gas, thereby expanding; controlling the size of the pores by controlling the foaming temperature and the amount of foaming agent; and finally, curing after drying to obtain a porous resin matrix 110.

[0056] The pore-forming agent method is as follows: First, resin powder and pore-forming agent are mixed; then, dry pressing is performed to obtain a molded part; finally, the molded part is sintered at 260℃~350℃, so that the pore-forming agent decomposes to generate pores during the sintering process, or forms pores through subsequent dissolution, thereby obtaining a porous resin matrix 110.

[0057] In this embodiment, the material used to prepare the porous resin matrix 110 is a resin material with a heat resistance temperature greater than the working temperature of the atomizing core 100 and a thermal conductivity less than that of the heating element 120. This embodiment does not specifically limit the type of material used for the porous resin matrix 110.

[0058] In some embodiments, the heating element 120 is a heating circuit or heating surface printed on the surface of the porous resin substrate 110 using printing techniques known to those skilled in the art. By heating the heating element 120, the porous resin substrate can be guided to the atomizing matrix of the heating element 120 for atomization, thereby improving the atomization effect of the atomizing core on the atomizing matrix. As an example, the heating element 120 is a nickel-chromium alloy heating circuit.

[0059] It is understood that the heating element 120 may be disposed on at least one surface of the porous resin matrix 110.

[0060] Figure 1 and Figure 2 This paper only shows the arrangement of the heating element 120 as a heating surface stacked on one surface of the porous resin matrix 110. In actual application scenarios, those skilled in the art can reasonably determine the shape of the heating element 120 and the bonding method between the heating element and the porous resin matrix 110 according to the design requirements of the atomizing core 100. This application embodiment does not make specific limitations in this regard.

[0061] In this embodiment, the electrode 130 is disposed in the target area of ​​the heating element 120. The electrode 130 includes a positive electrode and a negative electrode, and the target area of ​​the heating element 120 includes any two sub-regions disposed at intervals on the heating element 120. The positive electrode and the negative electrode in the electrode 130 are respectively disposed in the sub-regions disposed at intervals in the target area of ​​the heating element 120.

[0062] Electrode 130 can establish an electrical connection with the control component and battery component of the electronic atomization device to enable the control component to control the atomizing core 100 and the battery component to supply power to the atomizing core 100; specifically, the control component can control the heating power of the heating element 120 based on the electrical connection with electrode 130.

[0063] In some embodiments, the target area of ​​the heating element 120 can be as follows: Figure 1 and Figure 2 The target region is the two end regions of the first surface of the heating element 120 shown; in other embodiments, the target region may be the side region of the heating element 120.

[0064] The shape of electrode 130 may include, but is not limited to: electrode wire, electrode rod, and others. Figure 1 and Figure 2 The electrode layer shown.

[0065] In electrode 130 as follows Figure 1 and Figure 2 In the case of the electrode layer shown, the electrode 130 is stacked on the target area of ​​the first surface of the heating element 120. The first surface is the surface away from the porous resin matrix 110, and the target area includes the two end areas of the first surface. In the embodiments of this application, the electrode 130 can be printed in the target area of ​​the heating element 120 using electrode printing techniques known to those skilled in the art.

[0066] In related technologies, the poor wettability between the porous ceramic atomizing core and the atomizing matrix results in poor liquid conductivity of the porous ceramic atomizing core, leading to uneven distribution of the atomizing matrix on the surface of the porous ceramic atomizing core, and thus affecting the atomization effect of the porous ceramic atomizing core on the atomizing matrix. The atomizing core provided in this application includes a porous resin matrix, a heating element, and an electrode; wherein the porous resin matrix includes resin particles and multiple pores, and the pores are interstitial pores formed by the accumulation of resin particles. The pores in the porous resin matrix can not only store the atomizing matrix, but also have good wettability to the atomizing matrix. Combined with the pores formed by the accumulation of resin particles in the porous resin matrix, the speed at which the porous resin matrix exports the atomizing matrix stored in the pores to the heating element can be improved, thereby improving the liquid conductivity of the atomizing core and the uniformity of the atomizing matrix distribution on the surface of the heating element. By heating the heating element, the atomizing matrix exported from the porous resin matrix to the heating element can be atomized, improving the atomization effect of the atomizing core on the atomizing matrix.

[0067] Optionally, in some embodiments, the porosity of the porous resin matrix 110 is 30% to 70%. Specifically, the porosity of the porous resin matrix 110 can be a range of one or any two of 30%, 35%, 40%, 45%, 50%, 55%, 60%, 65%, and 70%.

[0068] The porosity of the porous resin matrix 110 refers to the proportion of the volume of the pores 01 in the porous resin matrix 110 to the total volume of the porous resin matrix 110.

[0069] If the porosity of the porous resin matrix 110 is too small, the liquid storage capacity will be too small and the liquid conduction speed will be too slow. This slow conduction speed can further lead to the problem of the atomizing core 100 clogging. If the porosity of the porous resin matrix 110 is too large, the liquid conduction speed will be too fast, requiring an increase in the heating power of the heating element 120 to completely atomize the atomizing matrix delivered to it. Furthermore, if the heating power of the heating element 120 is too high, the operating temperature of the atomizing core 100 will rise sharply, leading to a decrease in the strength of the porous resin matrix 110. In this embodiment, the porosity of the porous resin matrix 110 is controlled within the range of 30% to 70%, which helps to control the liquid storage capacity and liquid conduction speed within a reasonable range, allowing the atomizing matrix stored in the pores 01 of the porous resin matrix 110 to be smoothly delivered and atomized.

[0070] The liquid storage capacity refers to the volume or mass of the atomizing matrix that can be stored in the porous resin matrix 110; the liquid conduction speed refers to the speed at which the porous resin matrix 110 conducts the atomizing matrix stored in the pores 01 to the heating element 120.

[0071] Optionally, in some embodiments, the pore size of the pores 01 in the porous resin matrix 110 is 10 μm to 200 μm; specifically, the pore size of the pores 01 can be one or any two of the following: 10 μm, 30 μm, 60 μm, 90 μm, 120 μm, 150 μm, 180 μm and 200 μm.

[0072] Among them, the pore diameter of pore 01 refers to the maximum value of the diameter of pore 01.

[0073] Too small a pore size will limit the outflow rate of the atomized matrix in the pore 01, while too large a pore size will cause leakage of the atomized matrix in the porous resin matrix 110. In this embodiment, the pore size of the pore 01 is controlled within the range of 10μm to 200μm, which can improve the liquid conduction rate of the porous resin matrix 110 while avoiding leakage of the atomized matrix in the porous resin matrix 110.

[0074] Optionally, in some embodiments, the thermal conductivity of the porous resin matrix 110 is less than that of the heating element 120. Specifically, when the thermal conductivity of the porous resin matrix 110 is less than that of the heating element 120, the heat dissipated by the porous resin matrix 110 can be reduced, which is beneficial to concentrate the heat in the heating element 120, thereby improving the efficiency of the heating element 120 in atomizing the atomizing matrix.

[0075] Optionally, in some embodiments, the thermal conductivity of the porous resin matrix 110 is 0.1 W / (m·K) to 10 W / (m·K); specifically, the thermal conductivity of the porous resin matrix 110 can be a value within the range of one or any two of 0.1 W / (m·K), 2 W / (m·K), 4 W / (m·K), 6 W / (m·K), 8 W / (m·K) and 10 W / (m·K).

[0076] With the thermal conductivity of the porous resin matrix 110 ranging from 0.1 W / (m·K) to 10 W / (m·K), the thermal conductivity of the heating element 120 is greater than 10 W / (m·K).

[0077] Optionally, in some embodiments, the thickness of the porous resin matrix 110 is 0.05 mm to 3 mm; specifically, the thickness of the porous resin matrix 110 can be one or any two of the following: 0.05 mm, 0.5 mm, 1 mm, 1.5 mm, 2 mm, 2.5 mm and 3 mm.

[0078] In this embodiment, the thickness of the porous resin matrix 110 is controlled within the range of 0.05 mm to 3 mm, which is beneficial to improving the strength and liquid storage capacity of the porous resin matrix 110.

[0079] Optionally, in some embodiments, the liquid conduction velocity of the porous resin matrix 110 is greater than that of the heating element 120. Specifically, when the liquid conduction velocity of the porous resin matrix 110 is greater than that of the heating element 120, the porous resin matrix 110 can more quickly export the atomizing matrix stored in the pores 01 to the heating element 120, so that the heating element 120 always has a sufficient supply of atomizing matrix during the atomization process. This not only improves the efficiency of the atomizing core 100 in atomizing the atomizing matrix, but also helps to reduce the risk of the heating element 120 burning out due to insufficient supply of atomizing matrix.

[0080] Optionally, in some embodiments, the liquid conduction rate of the porous resin matrix 110 is 4 s / drop to 8 s / drop; specifically, the liquid conduction rate of the porous resin matrix 110 can be one or any two of the following: 4 s / drop, 5 s / drop, 6 s / drop, 7 s / drop and 8 s / drop.

[0081] Optionally, in some embodiments, the heat resistance temperature of the porous resin matrix 110 is greater than the operating temperature of the heating element 120. This ensures that the porous resin matrix 110 will not soften or melt during the normal operation of the atomizing core 100, which helps to ensure the strength of the porous resin matrix 110 and improve the reliability of the atomizing core 100 structure.

[0082] Optionally, in some embodiments, the heat resistance temperature of the porous resin matrix 110 is greater than 350°C.

[0083] Optionally, in some embodiments, the thermal shrinkage rate of the porous resin matrix 110 is less than 0.3%. During the normal operation of the atomizing core 100, the deformation of the porous resin matrix 110 can be reduced, the thermal stability of the porous resin matrix 110 can be improved, and thus the structural stability of the atomizing core 100 can be improved.

[0084] Optionally, in some embodiments, the heating element is a porous carbonized layer; the porous carbonized layer is stacked on the surface of a porous resin matrix, and the electrode is disposed in the target area of ​​the porous carbonized layer.

[0085] Specifically, the porous carbonized layer is formed by carbonizing the upper surface of the porous resin matrix 110. It can be understood that the constituent element of the porous carbonized layer is carbon, which has excellent thermal conductivity. By heating the porous carbonized layer, the atomized matrix that is led out to the porous carbonized layer can be atomized.

[0086] Since the porous carbonized layer is formed by carbonizing the upper surface of the porous resin matrix 110, the porous carbonized layer also includes multiple pores 01, and the porosity of the porous carbonized layer is the same as or similar to the porosity of the porous resin matrix 110. The pore size of the pores 01 in the porous carbonized layer is the same as or similar to the pore size of the pores 01 in the porous resin matrix 110.

[0087] In this embodiment, the entire porous carbonized layer is used as the heating surface of the atomizing core 100 to atomize the atomizing matrix, which can improve the uniformity of the temperature field of the heating surface in the atomizing core 100, thereby improving the atomizing effect of the atomizing core 100 on the atomizing matrix and making it less prone to clogging.

[0088] In related technologies, atomizing devices generally include a porous ceramic atomizing core, which comprises a porous ceramic substrate and nickel-chromium alloy heating circuitry printed on the surface of the porous ceramic substrate. Heating the nickel-chromium alloy heating circuitry atomizes the atomizing matrix within the porous ceramic substrate. However, nickel-chromium alloys have poor acid resistance; acidic atomizing matrices can dissolve nickel-chromium alloy elements into the atomizing matrix. During the atomization process, the nickel-chromium alloy dissolved in the atomizing matrix can enter the user's body along with the aerosol formed by the atomizing matrix, posing certain health risks. Furthermore, porous ceramic atomizing cores also suffer from high manufacturing costs and long manufacturing cycles.

[0089] The atomizing core provided in this application embodiment has a heating element 120 that is a porous carbonized layer, which is stacked on the surface of a porous resin matrix. The electrode is disposed in the target area of ​​the porous carbonized layer. Heating the porous carbonized layer can improve the atomization effect of the atomizing core 100 on the atomization matrix. This application embodiment uses a healthy and environmentally friendly porous carbonized layer as the heating element 120 to atomize the atomization matrix. The porous carbonized layer has high chemical stability and is not easily corroded and dissolved by the atomization matrix, which reduces the health damage to users caused by the dissolution of elements in the heating element 120 into the atomization matrix and improves the safety of the atomizing core 100 provided in this application embodiment.

[0090] Furthermore, in this embodiment, the entire porous carbonized layer is used as the heating surface of the atomizing core 100 to atomize the atomizing matrix. This improves the uniformity of the temperature field in the atomizing core 100 and expands the atomization area of ​​the atomizing core 100 on the atomizing matrix, which is beneficial to improving the atomization effect of the atomizing core 100 on the atomizing matrix and reducing the likelihood of core clogging. In addition, the porous carbonized layer is formed by carbonizing the upper surface of the porous resin matrix 110, which improves the bonding strength between the porous carbonized layer and the porous resin matrix 110, which is beneficial to improving the reliability of the atomizing core 100 structure. Moreover, by forming the porous carbonized layer by carbonizing the upper surface of the porous resin matrix 110, the preparation process of the atomizing core 100 is simplified, which is beneficial to reducing the preparation cost of the atomizing core 100 and shortening the preparation cycle of the atomizing core 100.

[0091] Optionally, in some embodiments, reference is made to Figure 3 and Figure 4 The atomizing core 100 also includes a transition layer 140, which is disposed between the porous resin matrix 110 and the porous carbonized layer.

[0092] The transition layer 140 disposed between the porous resin matrix 110 and the porous carbonized layer can further improve the bonding strength between the porous resin matrix 110 and the porous carbonized layer, which is beneficial to improving the stability and reliability of the atomizing core 100 structure and extending the service life of the atomizing core 100.

[0093] Optionally, in some embodiments, the carbonization rate of the transition layer 140 is 20% to 60%; specifically, the carbonization rate of the transition layer 140 can be a range of one or any two of 20%, 25%, 30%, 35%, 40%, 45%, 50%, 55% and 60%.

[0094] The transition layer 140 also includes multiple pores 01, and the porosity of the transition layer 140 is the same as or similar to the porosity of the porous resin matrix 110. The pore size of the pores 01 in the transition layer 140 is the same as or similar to the pore size of the pores 01 in the porous resin matrix 110.

[0095] In the embodiments of this application, the carbonization rate of the transition layer 140 is greater than the carbonization rate of the porous resin matrix 110 (0%) and less than the carbonization rate of the porous carbonized layer (100%), which can improve the effectiveness of the transition layer 140 in improving the bonding strength between the porous resin matrix 110 and the porous carbonized layer.

[0096] Optionally, in some embodiments, the thickness of the transition layer 140 is 2 μm to 20 μm; specifically, the thickness of the transition layer 140 can be one or any two of the following: 2 μm, 4 μm, 6 μm, 8 μm, 10 μm, 12 μm, 14 μm, 16 μm, 18 μm, and 20 μm. In the embodiments of this application, controlling the thickness of the transition layer 140 within the range of 2 μm to 20 μm can improve the effectiveness of the transition layer 140 in enhancing the bonding strength between the porous resin matrix 110 and the porous carbonized layer.

[0097] Optionally, in some embodiments, the porous carbonized layer and the porous resin matrix 110 are integrally formed.

[0098] Specifically, the porous carbonized layer is formed by carbonizing the surface of the porous resin matrix 110 according to a preset laser carbonization line.

[0099] The laser carbonization circuit can be the same as or similar to the nickel-chromium alloy heating circuit printed on the surface of the porous ceramic atomizing core substrate in related technologies. The laser carbonization circuit can also be designed according to the actual needs of carbonizing the surface of the porous resin substrate 110. This application embodiment does not specifically limit this.

[0100] Carbonization is performed on the surface of the porous resin matrix 110. Specifically, a laser is used to perform laser treatment on the surface of the porous resin matrix 110 according to a preset laser carbonization line, so as to completely carbonize the resin matrix on the surface of the porous resin matrix 110 and obtain a porous carbonized layer integrally formed with the porous resin matrix 110.

[0101] The laser power for laser processing ranges from 1W to 100W, and the laser spot diameter ranges from 10nm to 1mm.

[0102] In this embodiment, carbonization is performed on the surface of the porous resin matrix 110 according to a preset laser carbonization circuit to completely carbonize the resin matrix on the surface of the porous resin matrix 110, resulting in a porous carbonized layer integrally formed with the porous resin matrix 110. This allows the entire porous carbonized layer covering the surface of the porous resin matrix 110 to be used as the heating element 120 of the atomizing core 100 to atomize the atomizing matrix, improving the uniformity of the temperature field in the atomizing core 100, thereby enhancing the atomization effect of the atomizing core 100 and reducing the likelihood of core clogging. Furthermore, the porous carbonized layer and the porous resin matrix 110 are integrally formed, increasing the bonding strength between them and improving the reliability of the atomizing core 100 structure.

[0103] Optionally, in some embodiments, reference is made to Figure 5 The preset laser carbonization circuit includes at least three parallel sub-circuits 02, and the spacing between adjacent sub-circuits 02 is 10nm to 200μm.

[0104] Specifically, the spacing between adjacent sub-lines 02 can be a range of one or any two of the following: 10nm, 40μm, 60μm, 80μm, 100μm, 120μm, 140μm, 160μm, 180μm, and 200μm.

[0105] In this embodiment, the spacing between adjacent sub-circuits 02 is controlled between 10nm and 200μm, which can achieve carbonization of the entire surface of the porous resin matrix 110. This not only improves the effect of carbonization treatment on the second surface of the porous resin matrix 110, but also improves the efficiency of carbonization treatment.

[0106] Optionally, in some embodiments, reference is made to Figure 6 and Figure 7 The shape of sub-circuit 02 can be as follows: Figure 6 The straight line shown can also be as follows: Figure 7 The curve shown in this application embodiment does not specifically limit the shape of sub-circuit 02.

[0107] Optionally, in some embodiments, the thickness of the porous carbonized layer is 20 μm to 200 μm; specifically, the thickness of the porous carbonized layer can be one or any two of the following: 20 μm, 50 μm, 80 μm, 110 μm, 140 μm, 170 μm and 200 μm.

[0108] Specifically, if the porous carbonized layer is too thin, it will cause some carbonized areas to be missing or broken, which will lead to uneven temperature of the porous carbonized layer during the heating process and reduce the uniformity of atomization of the atomizing matrix. If the porous carbonized layer is too thick, it will cause the atomizing matrix to burn in the porous carbonized layer, which will lead to the problem of burnt core of atomizing core 100.

[0109] In this embodiment, the thickness of the porous carbonized layer is controlled within the range of 20μm to 200μm, which can improve the temperature uniformity of the porous carbonized layer and the atomization effect of the porous carbonized layer on the atomization matrix, while avoiding the problem of the atomization core 100 burning.

[0110] Optionally, in some embodiments, the resistance of the heating element 120 is greater than the resistance of the electrode 130. Specifically, under the same voltage conditions, the greater resistance of the heating element 120 means that, according to Joule's law, the heating element 120 will generate more heat when energized, which is beneficial for improving the atomization effect of the heating element 120 on the atomizing matrix. At the same time, the greater resistance of the heating element 120 than the resistance of the electrode 130 can also reduce the heat generation of the electrode 130, thereby reducing the damage to the electrode 130 caused by high-temperature heating and improving the service life of the electrode 130.

[0111] Optionally, in some embodiments, the resistance of the heating element 120 is 2Ω to 200Ω; specifically, the resistance of the heating element 120 is one or any two of the following: 2Ω, 30Ω, 60Ω, 90Ω, 120Ω, 150Ω, 180Ω and 200Ω.

[0112] Optionally, in some embodiments, the resistance of the electrode is less than 2Ω.

[0113] Optionally, in some embodiments, when the heating element 120 is a porous carbonized layer and the electrode 130 is an electrode layer, the sheet resistance of the porous carbonized layer is greater than the sheet resistance of the electrode layer.

[0114] Optionally, in some embodiments, the sheet resistance of the porous carbonized layer is 2Ω / □ to 200Ω / □; specifically, the sheet resistance of the porous carbonized layer is a range of one or any two of 2Ω / □, 30Ω / □, 60Ω / □, 90Ω / □, 120Ω / □, 150Ω / □, 180Ω / □ and 200Ω / □.

[0115] The sheet resistance of the porous carbonized layer refers to the resistance value per unit area of ​​the porous carbonized layer with a fixed thickness, and "□" represents the unit area.

[0116] Optionally, in some embodiments, the sheet resistance of the electrode layer is less than 2Ω / □.

[0117] The sheet resistance of the electrode layer refers to the resistance value per unit area of ​​the electrode layer when the thickness is fixed.

[0118] Optionally, in some embodiments, the thickness of electrode 130 is 10 μm to 200 μm; specifically, the thickness of electrode 130 can be one or any two of the following: 10 μm, 40 μm, 70 μm, 100 μm, 130 μm, 160 μm and 200 μm.

[0119] In this embodiment, the thickness of electrode 130 is controlled within the range of 10μm to 200μm, which helps to reduce the resistance of electrode 130, reduce the heat generation of electrode 130, and improve the heat generation of heating element 120.

[0120] Optionally, in some embodiments, the curing temperature of electrode 130 is 50°C to 300°C; specifically, the curing temperature of electrode 130 can be a range of one or any two of 50°C, 100°C, 150°C, 200°C, 250°C and 300°C.

[0121] In this embodiment, the curing temperature of electrode 130 is controlled within the range of 50°C to 300°C. When curing electrode 130, damage to porous resin matrix 110 due to excessively high curing temperature of electrode 130 can be avoided, thereby improving the structural stability of atomizing core 100.

[0122] Optionally, in some embodiments, the heat resistance temperature of electrode 130 is greater than the operating temperature of heating element 120. For example, when the operating temperature of heating element 120 is 350°C, the heat resistance temperature of electrode 130 is greater than 350°C.

[0123] In this embodiment, the heat resistance temperature of electrode 130 is greater than the operating temperature of heating element 120, which can improve the reliability and stability of the atomizing core 100 in terms of structure and performance during operation.

[0124] Optionally, in some embodiments, the porous resin matrix 110 is a polyimide (PI) matrix.

[0125] This application embodiment also provides an atomizer, which includes the atomizing core 100 as described above; specifically, the atomizer further includes:

[0126] The housing has a liquid storage chamber and an atomizing chamber, and an air inlet and an air outlet respectively communicating with the atomizing chamber; the atomizing core 100 is disposed inside the housing, and the atomizing core 100 is used to atomize the atomizing matrix in the liquid storage chamber, and the side of the atomizing core 100 facing the atomizing chamber is the surface where the heating element 120 is located.

[0127] A conductive element, which is connected to the electrode 130 in the atomizing core 100.

[0128] This application embodiment also provides an electronic atomization device, which includes an atomizer as described above; specifically, the electronic atomization device further includes a control component and a battery component, wherein the control component is electrically connected to the conductive component in the atomizer and is used to control the atomizer to operate; the battery component is electrically connected to the conductive component in the atomizer and is used to supply power to the atomizer.

[0129] The present application will be described in detail below through embodiments.

[0130] Example 1

[0131] (1) Preparation of porous resin matrix:

[0132] First, PI powder and 100-mesh sodium chloride (NaCl) pore-forming agent are mixed at a mass ratio of 5:5 to obtain a mixed powder. Then, the mixed powder is dry-pressed at 50 MPa to obtain a molded part. Finally, the molded part is sintered at 300℃ for 120 min to obtain a porous resin matrix. The porous resin matrix includes PI powder particles and pores formed by the accumulation of PI powder particles. The porosity of the porous resin matrix is ​​60%, the pore size is 100 μm, and the thickness of the porous resin matrix is ​​1 mm.

[0133] (2) Preparation of porous carbonized layer:

[0134] Laser carbonization is performed on the upper surface of the porous resin matrix prepared in step (1) according to the preset laser carbonization circuit to obtain a transition layer and a porous carbonization layer that are sequentially stacked on the upper surface of the porous resin matrix.

[0135] The preset laser carbonization circuit has a spacing of 40 μm between adjacent sub-circuits and the sub-circuits are straight lines; the laser power for laser carbonization is 10 W and the laser spot diameter for laser carbonization is 0.2 mm; the carbonization rate of the transition layer is 40%; the thickness of the transition layer is 10 μm; the thickness of the porous carbonization layer is 100 μm; and the sheet resistance of the porous carbonization layer is 100 Ω / □.

[0136] (3) Preparation of electrode layer:

[0137] First, titanium carbide slurry is printed on both ends of the porous carbonized layer away from the porous resin matrix in step (2); then, the titanium carbide slurry is cured at 200°C to form an electrode layer; finally, an atomizing core is made according to the atomizing core preparation method known in the art; wherein, the thickness of the electrode layer is 100 μm and the sheet resistance of the electrode layer is 0.5 Ω / □.

[0138] (4) Preparation of electronic atomization equipment

[0139] The atomizing core prepared in step (3) is used to manufacture an electronic atomizing device according to the preparation methods of electronic atomizing devices known in the art.

[0140] Examples 2-3

[0141] The difference between Examples 2 and 3 and Example 1 is that in step (1), the mass ratio between PI powder and sodium chloride is 6:4 and 4:6, respectively.

[0142] Examples 4-5

[0143] The difference between Examples 4 and 5 and Example 1 is that, in step (1), the particle size of sodium chloride is 1000 mesh and 50 mesh, respectively.

[0144] Examples 6-7

[0145] The difference between Examples 6 and 7 and Example 1 is that, in step (1), the thickness of the porous resin matrix is ​​0.05 mm and 3 mm, respectively.

[0146] Example 8

[0147] The difference between Example 8 and Example 1 is that in step (2), the laser power of the laser carbonization process is 5W and the laser spot diameter of the laser carbonization process is 0.5mm.

[0148] Example 9

[0149] The difference between Example 9 and Example 1 is that, in step (2), the spacing between adjacent sub-circuits in the preset laser carbonization circuit is 60 μm; and the laser power of the laser carbonization process is 15 W.

[0150] Example 10

[0151] The difference between Example 10 and Example 1 is that in step (2), the shape of the sub-circuit is a curve.

[0152] Examples 11-12

[0153] The difference between Examples 11 and 12 and Example 1 is that, in step (3), the thickness of the electrode layer is 10 μm and 200 μm, respectively.

[0154] Comparative Example 1

[0155] The difference between Comparative Example 1 and Example 1 is as follows:

[0156] In steps (1) to (2), firstly, “S”-shaped nickel-chromium heating lines are printed on the upper surface of a porous ceramic substrate with a porosity of 60%; then, it is sintered at 1200°C under a protective atmosphere.

[0157] In step (3), titanium carbide paste is printed on both ends of the nickel-chromium heating circuit prepared in step (2).

[0158] Performance testing:

[0159] (1) Aerosol quantity test: The aerosol generated by the electronic atomization device 1 to 10 is collected using a smoke tester, and the average weight of the aerosol is obtained as the amount of aerosol generated by the electronic atomization device.

[0160] (2) Energy consumption test: The energy consumption of the battery component in the electronic atomizing device was tested after the electronic atomizing device took 5 puffs using a power consumption tester.

[0161] The aerosol quantity and energy consumption of the electronic atomization devices prepared in each embodiment and Comparative Example 1 were tested, and the test data are shown in Table 1.

[0162] Table 1

[0163]

[0164] According to the test data shown in Table 1, compared with Comparative Example 1, the amount of aerosol generated by the electronic atomizing device prepared in Example 1 during operation increased from 7.1 mg in Comparative Example 1 to 7.9 mg, and the atomization effect of the electronic atomizing device prepared in Example 1 on the atomizing matrix was improved by 11%. The energy consumption of the electronic atomizing device prepared in Example 1 during operation decreased from 1949 J in Comparative Example 1 to 1845 J, and the energy consumption of the electronic atomizing device prepared in Example 1 was reduced by 5%. It can be seen that the electronic atomizing device prepared based on the atomizing core provided in the embodiments of this application not only significantly improves the atomization effect on the atomizing matrix, but also reduces the energy consumption of the electronic atomizing device.

[0165] In summary, the atomizing core provided in this application includes a porous resin matrix, a heating element, and an electrode. The porous resin matrix comprises resin particles and multiple pores, with the pores being interstitial pores formed by the accumulation of resin particles. These pores not only store the atomizing matrix but also provide good wettability to it. Combined with the pores formed by the accumulation of resin particles in the porous resin matrix, the speed at which the atomizing matrix stored in the pores is exported to the heating element can be increased. This improves the liquid guiding capacity of the atomizing core and the uniformity of the atomizing matrix distribution on the heating element surface. Heating the heating element allows the atomizing matrix exported from the porous resin matrix to the heating element to be atomized, thus improving the atomization effect of the atomizing core on the atomizing matrix.

[0166] Although preferred embodiments of the present application have been described, those skilled in the art, upon learning the basic inventive concept, can make other changes and modifications to these embodiments. Therefore, the claims are intended to be interpreted as including the preferred embodiments as well as all changes and modifications falling within the scope of the embodiments of the present application.

[0167] The above provides a detailed description of the atomizing core, atomizer, and electronic atomization device provided in this application. Specific examples have been used to illustrate the principles and implementation methods of this application. The descriptions of the above embodiments are only for the purpose of helping to understand the method and core ideas of this application. At the same time, for those skilled in the art, there will be changes in the specific implementation methods and application scope based on the ideas of this application. Therefore, the content of this specification should not be construed as a limitation of this application.

Claims

1. An atomizing core, characterized in that, The heating body and the electrode are arranged on the surface of the porous resin base. The porous resin base comprises resin particles and a plurality of air holes. The heating body is arranged on the surface of the porous resin base, and the electrode is arranged on a target region of the heating body.

2. The atomizer core of claim 1, wherein, The porosity of the porous resin base is 30% to 70%.

3. The atomizer core of claim 1, wherein, The air holes in the porous resin base have a pore size of 10 μm to 200 μm.

4. The atomizer core of claim 1, wherein, The thermal conductivity of the porous resin base is less than that of the heating body.

5. The atomizer core of claim 1, wherein, The thermal conductivity of the porous resin base is 0.1 W / (m·K) to 10 W / (m·K).

6. The atomizer core of claim 1, wherein, The thickness of the porous resin base is 0.05 mm to 3 mm.

7. The atomizer core of claim 1, wherein, The liquid conducting speed of the porous resin base is greater than that of the heating body.

8. The atomizer core of claim 1, wherein, The liquid conducting speed of the porous resin base is 4 s / drop to 8 s / drop.

9. The atomizer core of claim 1, wherein, The heat resistance of the porous resin base is greater than 350℃.

10. The atomizer core of claim 1, wherein, The thermal shrinkage of the porous resin base is less than 0.3%.

11. The atomizer core of claim 1, wherein, The heating body is a porous carbonized layer. The porous carbonized layer is laminated on the surface of the porous resin base, and the electrode is arranged on a target region of the porous carbonized layer.

12. The atomizer core of claim 11, wherein, The atomizing core further comprises a transition layer. The transition layer is arranged between the porous resin base and the porous carbonized layer.

13. The atomizer core of claim 12, wherein, The carbonization rate of the transition layer is 20% to 60%.

14. The atomizer core of claim 12, wherein, The thickness of the transition layer is 2 μm to 20 μm.

15. The atomizer core of claim 11, wherein, The porous carbonized layer and the porous resin base are integrally formed.

16. The atomizer core of claim 11, wherein, The thickness of the porous carbonized layer is 20 μm to 200 μm.

17. The atomizer core of claim 1, wherein, The resistance of the heating body is greater than that of the electrode.

18. The atomizer core of claim 1, wherein, The resistance of the heating body is 2 Ω to 200 Ω.

19. The atomizer core of claim 1, wherein, The resistance of the electrode is less than 2 Ω.

20. The atomizer core of claim 1, wherein, The thickness of the electrode is 10 μm to 200 μm.

21. The atomizer core of claim 1, wherein, The curing temperature of the electrode is 50℃ to 300℃.

22. The atomizer core of claim 1, wherein, The heat resistance of the electrode is greater than the working temperature of the heating body.

23. The atomizer core of claim 1, wherein, The porous resin base is a polyimide base.

24. An atomiser characterised in that, The atomizer comprises the atomizing core according to any one of claims 1 to 23.

25. An electronic atomizing device, comprising: The electronic atomizing device comprises the atomizer according to claim 24.

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