High-purity water purification system

Abstract

The utility model discloses a high-purity water purification system which comprises a raw water tank, a pre-filtering device, a first-stage reverse osmosis device, a second-stage reverse osmosis device, an EDI device, a first-stage ultrafiltration device, a polishing device and a second-stage ultrafiltration device, the raw water tank is connected with the pre-filtering device, the pre-filtering device is connected with the first-stage reverse osmosis device, and the second-stage reverse osmosis device is connected with the polishing device. The first-stage reverse osmosis device is connected with the second-stage reverse osmosis device, the second-stage reverse osmosis device is connected with the EDI device, the EDI device is connected with the first-stage ultrafiltration device, the first-stage ultrafiltration device is connected with the polishing device, the polishing device is connected with the second-stage ultrafiltration device, and the EDI device comprises an EDI water pump, a first-stage TOC module, EDI, an anion bed resin module, a first-stage degassing membrane module and a nitrogen-sealed water tank. And the EDI water pump is connected with the primary TOC module. According to the high-purity water purification system, chloride ions, sulfate ions and bicarbonate ions in water can be removed through the anion bed resin module, and boron ions in the water can be removed through the boron removal resin module, so that the purity of the water is improved.

Description

Technical Field

[0001] This utility model relates to a water purification system, specifically a high-purity water purification system. Background Technology

[0002] Water used in semiconductor chip manufacturing is primarily used for cooling silicon wafers at the front end, cleaning and inspecting substrate wafers, cleaning during mid-stage processes such as sputtering, exposure, electroplating, photolithography, and etching, and cleaning during back-end inspection and packaging. LED chip manufacturing mainly involves water used in the front end for MOCVD epitaxial wafer growth, water used in the mid-stage for exposure, development, and photoresist removal cleaning, and water used in the back-end for inspection and packaging. Furthermore, the semiconductor industry has high TOC (Total Organic Carbon) requirements, necessitating high-purity water purification systems. A high-purity water purification system is specifically designed to produce high-purity water; its core purpose is to remove almost all impurities and microorganisms from the water, ensuring extremely high water quality standards.

[0003] Existing high-purity water purification systems typically lack equipment to remove anions (including chloride, sulfate, and bicarbonate ions) and boron ions from the water, resulting in residual anions and boron ions that affect the water's purity. Utility Model Content

[0004] The purpose of this invention is to provide a high-purity water purification system that can remove anions such as chloride ions, sulfate ions, and bicarbonate ions from water through an anion bed resin module and remove boron ions from water through a boron removal resin module, thereby improving the purity of water compared to existing technologies.

[0005] To achieve the above objectives, this utility model provides the following technical solution: a high-purity water purification system, comprising a raw water tank, a pre-filtration device, a primary reverse osmosis device, a secondary reverse osmosis device, an EDI device, a primary ultrafiltration device, a polishing device, and a secondary ultrafiltration device. The raw water tank is connected to the pre-filtration device, the pre-filtration device is connected to the primary reverse osmosis device, the primary reverse osmosis device is connected to the secondary reverse osmosis device, the secondary reverse osmosis device is connected to the EDI device, the EDI device is connected to the primary ultrafiltration device, the primary ultrafiltration device is connected to the polishing device, and the polishing device is connected to the secondary ultrafiltration device.

[0006] The EDI device includes an EDI water pump, a primary TOC module, an EDI, an anion exchange bed resin module, a primary degassing membrane module, and a nitrogen-sealed water tank. The EDI water pump is connected to the primary TOC module, the primary TOC module is connected to the EDI, the EDI is connected to the anion exchange bed resin module, the anion exchange bed resin module is connected to the primary degassing membrane module, and the primary degassing membrane module is connected to the nitrogen-sealed water tank.

[0007] The primary ultrafiltration unit includes an external ultrapure water supply pump, a second plate heat exchanger, and a secondary TOC module. The nitrogen-sealed water tank is connected to the external ultrapure water supply pump, the external ultrapure water supply pump is connected to the second plate heat exchanger, and the second plate heat exchanger is connected to the secondary TOC module.

[0008] The secondary ultrafiltration unit includes a boron removal resin module, a secondary degassing membrane module, and a terminal ultrafiltration module. The boron removal resin module is connected to the secondary degassing membrane module, and the secondary degassing membrane module is connected to the terminal ultrafiltration module.

[0009] Preferably, the pre-filtration device includes a raw water pump, a multi-media module, an activated carbon module, a first plate heat exchanger, and an intermediate water tank. The raw water tank is connected to the raw water pump, the raw water pump is connected to the multi-media module, the multi-media module is connected to the activated carbon module, the activated carbon module is connected to the first plate heat exchanger, and the first plate heat exchanger is connected to the intermediate water tank.

[0010] Preferably, the primary reverse osmosis unit includes a primary high-pressure pump, a primary reverse osmosis module, and a primary water tank. The intermediate water tank is connected to the primary high-pressure pump, the primary high-pressure pump is connected to the primary reverse osmosis module, and the primary reverse osmosis module is connected to the primary water tank.

[0011] Preferably, the secondary reverse osmosis device includes a secondary high-pressure pump, a secondary reverse osmosis module, and a secondary water tank. The primary water tank is connected to the secondary high-pressure pump, the secondary high-pressure pump is connected to the secondary reverse osmosis module, the secondary reverse osmosis module is connected to the secondary water tank, and the secondary water tank is connected to the EDI pump.

[0012] Preferably, the polishing device includes a primary polishing system and a secondary polishing system. The secondary TOC module is connected to the primary polishing system, the primary polishing system is connected to the secondary polishing system, and the secondary polishing system is connected to the boron removal resin module.

[0013] Preferably, it also includes a PLC controller and an industrial computer. The PLC controller is connected to the pre-filtration device, the first-stage reverse osmosis device, the second-stage reverse osmosis device, the EDI device, the first-stage ultrafiltration device, the polishing device, and the second-stage ultrafiltration device, respectively. The industrial computer is connected to the PLC controller.

[0014] Compared with the prior art, the beneficial effects of this utility model are as follows:

[0015] 1. This utility model, by setting an anion bed resin module in the EDI device, removes anions in water, such as chloride ions, sulfate ions, bicarbonate ions, etc., through ion exchange. The hydroxide ions in the anion bed resin will exchange with the anions in the water, thereby removing these anions and achieving the purpose of purifying water.

[0016] 2. This utility model sets up a primary TOC module and a secondary TOC module, both of which are used to remove organic carbon (TOC) and inorganic carbon (IC) from water. The TOC-UV decarbonizer uses high-dose ultraviolet light technology with dual wavelengths of 254nm and 185nm. By destroying residual ozone molecules in the water and stimulating water molecules to generate hydroxyl radicals with strong oxidizing power, the organic matter in the water is oxidized and decomposed into carbon dioxide and water, thereby reducing the TOC content in ultrapure water.

[0017] 3. By setting up a boron removal resin module, the boron removal resin module exchanges boron ions with the water through the active groups on its surface, thereby selectively removing boron ions. This resin usually has high selectivity and can exhibit excellent adsorption performance over a wide pH range, with a boron removal capacity of up to 8 mg / g resin.

[0018] 4. Through the primary degassing membrane module 55 and the secondary degassing membrane module 82, dissolved oxygen in the water is removed by vacuum and high-purity nitrogen purging. Through the two-stage MDG treatment, the dissolved oxygen in the water can be reduced to below 1 μg / L. Attached Figure Description

[0019] Figure 1 This is a schematic diagram of the structure of this utility model;

[0020] Figure 2 This is a structural block diagram of the present utility model.

[0021] The reference numerals and names in the diagram are as follows: 1. Raw water tank; 2. Pre-filtration device; 21. Raw water pump; 22. Multi-media module; 23. Activated carbon module; 24. First plate heat exchanger; 25. Intermediate water tank; 3. First-stage reverse osmosis unit; 31. First-stage high-pressure pump; 32. First-stage reverse osmosis module; 33. First-stage water tank; 4. Second-stage reverse osmosis unit; 41. Second-stage high-pressure pump; 42. Second-stage reverse osmosis module; 43. Second-stage water tank; 5. EDI unit; 51. EDI pump; 52. 53. Primary TOC Module; 54. EDI; 55. Anion Bed Resin Module; 56. Primary Degassing Membrane Module; 6. Nitrogen Sealing Water Tank; 77. Primary Ultrafiltration Unit; 88. Ultrapure Water External Supply Pump; 9. Secondary Plate Heat Exchanger; 10. Secondary TOC Module; 11. Polishing Unit; 22. Primary Polishing System; 13. Secondary Polishing System; 14. Secondary Ultrafiltration Unit; 15. Boron Removal Resin Module; 16. Secondary Degassing Membrane Module; 17. Terminal Ultrafiltration Module; 18. PLC Controller; 19. Industrial PC. Detailed Implementation

[0022] The technical solutions of the present utility model will be clearly and completely described below with reference to the accompanying drawings of the embodiments. Obviously, the described embodiments are only some embodiments of the present utility model, and not all embodiments. Based on the embodiments of the present utility model, all other embodiments obtained by those of ordinary skill in the art without creative effort are within the protection scope of the present utility model.

[0023] In the description of the embodiments of this utility model, it should be understood that the terms "length," "width," "upper," "lower," "front," "rear," "left," "right," "vertical," "horizontal," "top," "bottom," "inner," and "outer," etc., indicating the orientation or positional relationship, are based on the orientation or positional relationship shown in the accompanying drawings and are only for the convenience of describing the embodiments of this utility model and simplifying the description. They do not indicate or imply that the device or element referred to must have a specific orientation, or be constructed and operated in a specific orientation, and therefore should not be construed as a limitation of this utility model. Furthermore, the terms "first" and "second" are used for descriptive purposes only and should not be construed as indicating or implying relative importance or implicitly specifying the number of indicated technical features. Thus, a feature defined with "first" or "second" may explicitly or implicitly include one or more of that feature. In the description of the embodiments of this utility model, "multiple" means two or more, unless otherwise explicitly specified.

[0024] In this embodiment of the invention, unless otherwise explicitly specified and limited, the terms "installation," "connection," "linking," and "fixing," etc., should be interpreted broadly. For example, they can refer to a fixed connection, a detachable connection, or an integral part; they can refer to a mechanical connection or an electrical connection; they can refer to a direct connection or an indirect connection through an intermediate medium; they can refer to the internal communication of two components or the interaction between two components. Those skilled in the art can understand the specific meaning of the above terms in this embodiment of the invention according to the specific circumstances.

[0025] Please see Figure 1 The present invention provides an embodiment of a high-purity water purification system, comprising a raw water tank 1, a pre-filtration device 2, a primary reverse osmosis device 3, a secondary reverse osmosis device 4, an EDI device 5, a primary ultrafiltration device 6, a polishing device 7, and a secondary ultrafiltration device 8. The raw water tank 1 is connected to the pre-filtration device 2, the pre-filtration device 2 is connected to the primary reverse osmosis device 3, the primary reverse osmosis device 3 is connected to the secondary reverse osmosis device 4, the secondary reverse osmosis device 4 is connected to the EDI device 5, the EDI device 5 is connected to the primary ultrafiltration device 6, the primary ultrafiltration device 6 is connected to the polishing device 7, and the polishing device 7 is connected to the secondary ultrafiltration device 8.

[0026] The pre-filtration device 2 includes a raw water pump 21, a multi-media module 22, an activated carbon module 23, a first plate heat exchanger 24, and an intermediate water tank 25. The raw water pump 21 is used to pressurize the raw water and provide a power source for the pretreatment system. This pump is characterized by its small size, high efficiency, and low noise. The raw water tank 1 is connected to the raw water pump 21, the raw water pump 21 is connected to the multi-media module 22, the multi-media module 22 is connected to the activated carbon module 23, the activated carbon module 23 is connected to the first plate heat exchanger 24, and the first plate heat exchanger 24 is connected to the intermediate water tank 25. Water tank 25 is connected, and through the operation of pre-filtration device 2, it can remove suspended solids, colloids, color, turbidity, organic matter and other impurities in the raw water that hinder the subsequent reverse osmosis operation; raw water tank 1 plays a buffer role in the supply of raw water, and coordinates the supply of raw water with the input of raw water pump 21. When the supply of raw water exceeds the output of raw water pump 21, raw water tank 1 is full and the supply of raw water stops. When the supply of raw water is less than the output of raw water pump 21, raw water tank 1 is empty and raw water pump 21 stops running, which plays a role in protecting raw water pump 21.

[0027] The multi-media module 22 can remove suspended solids, particulate matter, and colloids from the raw water, while also reducing turbidity and color. It can completely filter out visible particles, algae, and other contaminants from the raw water. The multi-media module 22 is described as follows: It employs a multi-media filter with a multi-layer quartz sand filtration structure. Multi-media filtration is an advanced micro-flocculation filtration method. The multi-media filter provided by Pure Water No. 1 contains multiple layers of filter media of various materials, effectively removing impurities insoluble in water and ensuring an SDI value of no more than 3. It acts as a powerful protective barrier for RO systems, better removing suspended solids or non-dissolved particles (oxides, turbidity, particulate matter, etc.) from the water, and has low... It features low cost, easy operation and maintenance, and convenient management, and is particularly effective in reducing turbidity and pollution index in raw water. The backwashing cycle of the multi-media filter is 16-24 hours. The backwashing cycle is controlled by pressure parameter equipment. When the pressure difference between the inlet and outlet water headers reaches 0.5 kg / cm2, the operation is stopped for backwashing. The backwash water can be supplied and the backwash water flow rate can be controlled and adjusted by a separately set backwash water pump. The backwash water intensity should expand the filter layer by 15-25%. Compressed air is introduced during backwashing to scrub the filter media, with an intensity of 30-50 liters / second·m2. The backwash water can be the concentrated water from reverse osmosis (the structure of the backwash water pump is existing technology and will not be described in detail here).

[0028] The activated carbon module 23 has the characteristics of strong adsorption capacity and large adsorption capacity. It has a porous structure with a specific surface area of ​​up to 500-700 m2 / g. It is precisely because activated carbon has a well-developed fine pore structure and a huge specific surface area that it can completely adsorb residual chlorine in water and adsorb some organic matter. It also has a good removal effect on color and odor.

[0029] The first-stage reverse osmosis device 3 includes a first-stage high-pressure pump 31, a first-stage reverse osmosis module 32, and a first-stage water tank 33. The intermediate water tank 25 is connected to the first-stage high-pressure pump 31, the first-stage high-pressure pump 31 is connected to the first-stage reverse osmosis module 32, and the first-stage reverse osmosis module 32 is connected to the first-stage water tank 33.

[0030] The secondary reverse osmosis unit 4 includes a secondary high-pressure pump 41, a secondary reverse osmosis module 42, and a secondary water tank 43. Both the primary reverse osmosis module 32 and the secondary reverse osmosis module 42 use RO reverse osmosis membranes. The primary water tank 33 is connected to the secondary high-pressure pump 41, the secondary high-pressure pump 41 is connected to the secondary reverse osmosis module 42, and the secondary reverse osmosis module 42 is connected to the secondary water tank 43. The primary and secondary reverse osmosis modules 32 and 42 are mainly used for desalination. In actual operation, an antiscalant is added to the reverse osmosis feed water to prevent the precipitation and scaling of sparingly soluble salts such as calcium carbonate, magnesium carbonate, and calcium sulfate in the reverse osmosis concentrate, which could clog the reverse osmosis membrane and damage its performance. Therefore, the antiscalant is added before entering the membrane element. The antiscalant is an organic compound that, in addition to operating at a Langerile index (LSI) of 2.6, can also prevent SO42-. 2- The scaling agent primarily increases the solubility of scaling substances in the water to prevent calcium carbonate, calcium sulfate, and other substances from hindering the membrane. It also reduces the blockage of membrane micropores by iron ions. This system uses imported PTP-0100 composite scale inhibitor, which has the following properties: 1) inhibiting precipitation; 2) dispersing; 3) lattice distortion; 4) complexing. The primary high-pressure pump 31 and the secondary high-pressure pump 41 are the main power equipment of the reverse osmosis system. Both primary and secondary high-pressure pumps 31 and 41 are equipped with overheat protection. Low-pressure and high-pressure protection switches are installed before and after the pumps, respectively. When the inlet pressure of primary high-pressure pump 31 and secondary high-pressure pump 41 is lower than the set value, they stop operating (thus protecting them). When the outlet pressure of primary high-pressure pump 31 and secondary high-pressure pump 41 is higher than the set value, they stop operating to protect the primary reverse osmosis module 32 and the secondary reverse osmosis module 4. 2. The primary reverse osmosis module 32 and the secondary reverse osmosis module 42 mainly remove dissolved salts from the water, while also removing some large organic molecules and small particles that were not removed in the previous stage. After water enters the primary reverse osmosis module 32 or the secondary reverse osmosis module 42, under pressure, most water molecules and trace amounts of other ions pass through the primary reverse osmosis module 32 or the secondary reverse osmosis module 42, and are collected as product water, which enters subsequent equipment through the product water pipeline. Most of the salts, colloids, organic matter, etc. in the water cannot pass through the primary reverse osmosis module 32 or the secondary reverse osmosis module 42, and remain in a small amount of concentrate, which is discharged through the concentrate pipeline. When the primary reverse osmosis module 32 or the secondary reverse osmosis module 42 is shut down, it is automatically flushed for 3 to 5 minutes to remove dirt deposited on the membrane surface, so that the device and the primary reverse osmosis module 32 or the secondary reverse osmosis module 42 are effectively maintained.

[0031] The EDI unit 5 includes an EDI water pump 51, a primary TOC module 52, an EDI unit 53, an anion exchange resin module 54, a primary degassing membrane module 55, and a nitrogen-sealed water tank 56. The main function of the EDI unit 5 is to remove salts and ions from the water at a deeper level, increasing the water purity (resistivity ≥ 15.0 MΩ·cm). The produced water is of stable quality, with a resistivity of approximately 16.0 MΩ. The secondary water tank 43 is connected to the EDI water pump 51, and the anion exchange resin module 54... The main component is an anion exchange resin, whose primary function is to remove anions from water, such as chloride ions, sulfate ions, and bicarbonate ions, through ion exchange. Hydroxide ions in the anion exchange resin exchange with the anions in the water, thereby removing these anions and purifying the water. The EDI pump 51 is connected to the primary TOC module 52, the primary TOC module 52 is connected to EDI 53, EDI 53 is connected to the anion exchange resin module 54, the anion exchange resin module 54 is connected to the primary degassing membrane module 55, and the primary degassing membrane module 55 is connected to the nitrogen-sealed water tank 56. The following are the minimum conditions for ensuring the normal operation of EDI 53. To improve system performance, these conditions should be appropriately increased during system design: 1) Feed water: RO pure water, generally with a conductivity of 4–30 μS / cm; 2) pH: 5.0–8.0 (under these pH conditions, water hardness should not be too high); 3) Temperature: 5–35℃; 4) Inlet water pressure: maximum 4 kg / cm² (60 psi), minimum... The standard configuration of EDI53 is 1.5 kg / cm2 (25 psi). In addition, the standard configuration of EDI53 is as follows: 1) Outlet water pressure: The outlet pressure of concentrate and electrode water must be lower than the outlet pressure of the product; 2) Hardness (calculated as CaCO3): Maximum 1.0 ppm, 0.1 ppm is used in this embodiment; 3) Organic matter: Maximum 0.05 ppm; 4) Oxidant: Maximum 0.05 ppm (Cl2), 0.02 ppm (O3); 5) Variable valence metal: Maximum 0.01 ppm Fe; 6) Silica: 50~150 ppb; 7) Total amount of carbon dioxide (CO2): The carbon dioxide content and pH value will significantly affect the water resistivity of the product. When it is greater than 10 ppm, a degassing device should generally be installed before EDI53.

[0032] The primary ultrafiltration unit 6 includes an ultrapure water external supply pump 61, a second plate heat exchanger 62, and a secondary TOC module 63. A nitrogen-sealed water tank 56 is connected to the ultrapure water external supply pump 61, which is connected to the second plate heat exchanger 62. The second plate heat exchanger 62 is connected to the secondary TOC module 63. Both the primary TOC module 52 and the secondary TOC module 63 employ TOC-UV decarbonization devices to remove organic carbon (TOC) and inorganic carbon (IC) from the water. The TOC-UV decarbonization devices use dual wavelengths of 254nm and 185nm. Ultraviolet light technology breaks down residual ozone molecules in the water and stimulates water molecules to generate highly oxidizing hydroxyl radicals, oxidizing and decomposing organic matter in the water into carbon dioxide and water, thereby reducing the TOC content in ultrapure water; the primary TOC module 52 and the secondary TOC module 63 contain ultraviolet germicidal lamps to kill the small amount of bacteria remaining in the water, ensuring that the bacterial index entering the EDI system meets the influent water requirements. The ultraviolet wavelength is 254nm, the irradiation intensity is 30000μws / cm2, the service life is greater than 8000h, and the sterilization rate is >99%;

[0033] The polishing device 7 includes a primary polishing system 71 and a secondary polishing system 72. The secondary TOC module 63 is connected to the primary polishing system 71, and the primary polishing system 71 is connected to the secondary polishing system 72. Both the primary polishing system 71 and the secondary polishing system 72 adopt a polishing mixed bed (SMB) system. The polishing device 7 is set up to better reduce the cations and anions that are not completely removed during the EDI process, prevent secondary pollution of the pipeline system, meet the needs of production water supply, and ensure that the effluent resistivity is ≥17.5~18.0MΩ·cm. The resin filled in the polishing mixed bed is nuclear grade resin, which does not need to be regenerated after it becomes ineffective and can be directly replaced. The polishing mixed ion exchange system is used in the subsequent water treatment process. This way, on the one hand, the advantages of the resin, such as large exchange capacity and no need for regeneration, are utilized, and on the other hand, it helps to ensure the quality of the effluent (effluent resistivity ≥17.5~18.0MΩ) and reduce equipment operating costs.

[0034] The secondary ultrafiltration unit 8 includes a boron removal resin module 81, a secondary degassing membrane module 82, and a terminal ultrafiltration module 83. A secondary polishing system 72 is connected to the boron removal resin module 81, which is connected to the secondary degassing membrane module 82. The secondary degassing membrane module 82 is connected to the terminal ultrafiltration module 83. The boron removal resin module 81 selectively removes boron ions by exchanging their active groups with boron ions in the water. This resin typically exhibits high selectivity and excellent adsorption performance over a wide pH range, particularly for boron. With a resin removal capacity of up to 8 mg / g, the primary degassing membrane module 55 and the secondary degassing membrane module 82 mainly remove dissolved oxygen from the water through vacuum and high-purity nitrogen purging. Through two-stage MDG treatment, the dissolved oxygen in the water can be reduced to below 1 μg / L. The terminal ultrafiltration module 83 adopts a terminal filtration device with a filtration accuracy of 0.1 microns to intercept fine particles and bacterial remains in the water, ensuring that the particulate matter content of the effluent meets the requirements. The filter element of this device is a 0.1 μm absolute filter element, and the filter tank is made of stainless steel.

[0035] Please see Figure 2 The high-purity water purification system also includes a PLC controller 9 and an industrial computer 10. The PLC controller 9 is connected to the pre-filtration device 2, the first-stage reverse osmosis device 3, the second-stage reverse osmosis device 4, the EDI device 5, the first-stage ultrafiltration device 6, the polishing device 7, and the second-stage ultrafiltration device 8, respectively. The industrial computer 10 is connected to the PLC controller 9.

[0036] Please refer to the following: Figures 1 to 2 In this invention, municipal tap water (i.e., raw water) is input into the raw water tank 1, and flocculant is added to the raw water. The flocculant forms flocs with the colloids and particles in the raw water, which are beneficial for being filtered out in the multi-media filter, improving the filtration effect, further reducing the turbidity of the effluent, and ensuring that the SDI of the RO influent is ≤2. The addition of the chemical is automatic with the start and stop of the first-stage high-pressure pump 31, and the amount of chemical added is adjustable. Subsequently, the water flows through the pre-filtration device 2, the first-stage reverse osmosis device 3, the second-stage reverse osmosis device 4, the EDI device 5, the first-stage ultrafiltration device 6, and the polishing device. The process of the pre-filtration device 7 and the secondary ultrafiltration device 8 is used to treat the water to a high purity. After the system is debugged and normal, it can run automatically. The entire system starts from the input of tap water in the raw water tank 1 and ends at the terminal ultrafiltration module 83. The pre-filtration device 2, the primary reverse osmosis device 3, the secondary reverse osmosis device 4, the EDI device 5, the primary ultrafiltration device 6, the polishing device 7, and the secondary ultrafiltration device 8 are all controlled by the PLC controller 9, which is controlled by the industrial computer 10. Under normal system conditions, it can run automatically, and it can also be operated and controlled manually.

[0037] It will be apparent to those skilled in the art that this invention is not limited to the details of the exemplary embodiments described above, and that it can be implemented in other specific forms without departing from the spirit or essential characteristics of this invention. Therefore, the embodiments should be considered illustrative and non-limiting in all respects, and the scope of this invention is defined by the appended claims rather than the foregoing description. Thus, it is intended that all variations falling within the meaning and scope of equivalents of the claims be included within this invention. No reference numerals in the claims should be construed as limiting the scope of the claims.

Claims

1. A high-purity water purification system, characterized in that: It includes a raw water tank (1), a pre-filtration device (2), a primary reverse osmosis device (3), a secondary reverse osmosis device (4), an EDI device (5), a primary ultrafiltration device (6), a polishing device (7), and a secondary ultrafiltration device (8). The raw water tank (1) is connected to the pre-filtration device (2), the pre-filtration device (2) is connected to the primary reverse osmosis device (3), the primary reverse osmosis device (3) is connected to the secondary reverse osmosis device (4), the secondary reverse osmosis device (4) is connected to the EDI device (5), the EDI device (5) is connected to the primary ultrafiltration device (6), the primary ultrafiltration device (6) is connected to the polishing device (7), and the polishing device (7) is connected to the secondary ultrafiltration device (8). The EDI device (5) includes an EDI water pump (51), a primary TOC module (52), an EDI (53), an anion exchange bed resin module (54), a primary degassing membrane module (55), and a nitrogen-sealed water tank (56). The EDI water pump (51) is connected to the primary TOC module (52), the primary TOC module (52) is connected to the EDI (53), the EDI (53) is connected to the anion exchange bed resin module (54), the anion exchange bed resin module (54) is connected to the primary degassing membrane module (55), and the primary degassing membrane module (55) is connected to the nitrogen-sealed water tank (56). The primary ultrafiltration unit (6) includes an external ultrapure water pump (61), a second plate heat exchanger (62), and a secondary TOC module (63). The nitrogen-sealed water tank (56) is connected to the external ultrapure water pump (61), the external ultrapure water pump (61) is connected to the second plate heat exchanger (62), and the second plate heat exchanger (62) is connected to the secondary TOC module (63). The secondary ultrafiltration device (8) includes a boron removal resin module (81), a secondary degassing membrane module (82), and a terminal ultrafiltration module (83). The boron removal resin module (81) is connected to the secondary degassing membrane module (82), and the secondary degassing membrane module (82) is connected to the terminal ultrafiltration module (83).

2. The high-purity water purification system according to claim 1, characterized in that: The pre-filtration device (2) includes a raw water pump (21), a multi-media module (22), an activated carbon module (23), a first plate heat exchanger (24), and an intermediate water tank (25). The raw water tank (1) is connected to the raw water pump (21), the raw water pump (21) is connected to the multi-media module (22), the multi-media module (22) is connected to the activated carbon module (23), the activated carbon module (23) is connected to the first plate heat exchanger (24), and the first plate heat exchanger (24) is connected to the intermediate water tank (25).

3. The high-purity water purification system according to claim 2, characterized in that: The first-stage reverse osmosis device (3) includes a first-stage high-pressure pump (31), a first-stage reverse osmosis module (32), and a first-stage water tank (33). The intermediate water tank (25) is connected to the first-stage high-pressure pump (31), the first-stage high-pressure pump (31) is connected to the first-stage reverse osmosis module (32), and the first-stage reverse osmosis module (32) is connected to the first-stage water tank (33).

4. The high-purity water purification system according to claim 3, characterized in that: The secondary reverse osmosis device (4) includes a secondary high-pressure pump (41), a secondary reverse osmosis module (42), and a secondary water tank (43). The primary water tank (33) is connected to the secondary high-pressure pump (41), the secondary high-pressure pump (41) is connected to the secondary reverse osmosis module (42), the secondary reverse osmosis module (42) is connected to the secondary water tank (43), and the secondary water tank (43) is connected to the EDI water pump (51).

5. The high-purity water purification system according to claim 1, characterized in that: The polishing device (7) includes a primary polishing system (71) and a secondary polishing system (72). The secondary TOC module (63) is connected to the primary polishing system (71), the primary polishing system (71) is connected to the secondary polishing system (72), and the secondary polishing system (72) is connected to the boron removal resin module (81).

6. A high-purity water purification system according to any one of claims 1-5, characterized in that: It also includes a PLC controller (9) and an industrial computer (10). The PLC controller (9) is connected to the pre-filtration device (2), the first-stage reverse osmosis device (3), the second-stage reverse osmosis device (4), the EDI device (5), the first-stage ultrafiltration device (6), the polishing device (7), and the second-stage ultrafiltration device (8), respectively. The industrial computer (10) is connected to the PLC controller (9).

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