Brush plating type electroplating device
By using a brush plating device to create an electric field in the plating bath, and utilizing conductive wire mesh and material strip to form the electric field, and using baffles to prevent short circuits, the problem of traditional electroplating being difficult to plate both sides of USB shell pins is solved, achieving a highly efficient and safe double-sided electroplating effect.
Patent Information
- Authority / Receiving Office
- CN · China
- Patent Type
- Utility models(China)
- Current Assignee / Owner
- DONGGUAN PREXON SURFACE TREATMENT TECHNOLOGY CO LTD
- Filing Date
- 2025-04-25
- Publication Date
- 2026-05-05
AI Technical Summary
Traditional electroplating processes make it difficult to effectively plate both sides of the pins on a USB casing simultaneously, especially since the pin area is perpendicular to the direction of the material strip's movement, making it impossible for the electroplating wheel to precisely control the fit.
A brush plating electroplating device is used, which uses an electroplating solution loaded in an inner tank of an electroplating bath. An electric field is formed between the conductive wire mesh and the material strip, and a baffle is used to prevent short circuits, so as to achieve electroplating on both sides of the terminal pins.
This technology efficiently completes electroplating on both sides of the terminal pins, improving the accuracy and safety of the electroplating operation and reducing the risk of electric shock to workers.
Smart Images

Figure CN224199512U_ABST
Abstract
Description
Technical Field
[0001] This utility model relates to the field of electroplating technology, and in particular to a brush-plating electroplating device. Background Technology
[0002] In traditional electroplating processes, surface plating of terminal leads typically employs a wheel-type plating structure. This involves a rotating plating wheel contacting the surface of the material strip to plate the terminal leads. However, for some terminals with special structures, such as USB housings, both sides of the USB housing leads need to be plated (usually with tin plating). In this case, because the plane containing the area to be plated on the lead is perpendicular to the plane of the material strip's forward direction, traditional plating wheels cannot precisely control the contact degree with both sides of the USB housing leads, making it difficult to effectively plate both sides of the USB housing leads simultaneously. Utility Model Content
[0003] Based on this, the present invention provides a brush plating electroplating device, which uses the inner tank of the electroplating bath to load the electroplating solution, forming an electric field between the conductive wire mesh and the pins of the material strip terminals, and uses baffles to prevent direct contact between the conductive wire mesh and the material strip terminals to prevent short circuits, thereby efficiently completing the electroplating treatment on both sides of the terminal pins by brush plating.
[0004] A brush plating electroplating apparatus, comprising:
[0005] An electroplating solution tank; the electroplating solution tank includes: an outer tank and an inner tank located within the outer tank; the inner tank is used to hold the electroplating solution;
[0006] A conductive wire mesh installed on an electroplating bath; the conductive wire mesh is located in the inner tank and is used for electrical connection to the positive terminal of the power supply;
[0007] A baffle strip laid on a conductive wire mesh; the baffle strip is set along a preset forward direction of the material strip; the baffle strip has electrical insulating properties and is permeable to the electroplating solution; the baffle strip is immersed in the electroplating solution in the inner tank; and
[0008] A conductive seat is installed on the electroplating bath; the conductive seat is arranged adjacent to the inner tank; the conductive seat is used to electrically connect the negative terminal of the power supply and contact the material strip to realize the electrical connection between the material strip and the negative terminal of the power supply.
[0009] In the aforementioned brush plating apparatus, during operation, the feed strip advances along a preset direction at the surface of the plating solution in the inner tank of the plating bath, and the leads of the terminals on the feed strip are inserted into the plating solution to a preset depth. The feed strip is connected to the negative terminal of the power supply via a conductive base to form the cathode required for plating, while the conductive mesh is electrically connected to the positive terminal of the power supply to form the anode required for plating. A baffle is used to prevent direct contact between the terminal leads and the conductive mesh to prevent short circuits. Therefore, an electric field is formed between the conductive mesh and the leads of the terminals on the feed strip, causing metal ions in the plating solution to accumulate and precipitate on the surface of the terminal leads under the influence of the electric field, thereby efficiently completing the simultaneous plating treatment of both sides of the terminal leads. Through this design, the inner tank of the plating bath is filled with the plating solution, an electric field is formed between the conductive mesh and the leads of the terminals on the feed strip, and a baffle is used to prevent direct contact between the conductive mesh and the terminals of the feed strip to prevent short circuits, thereby efficiently completing the plating treatment of both sides of the terminal leads in a brush plating manner.
[0010] In one embodiment, both the outer and inner tanks are electrically insulated, which can reduce the risk of electric shock to workers and improve operational safety.
[0011] In one embodiment, the conductive mesh is a platinum-titanium mesh. Platinum-titanium mesh has good corrosion resistance, structural stability, and electrical conductivity.
[0012] In one embodiment, the baffle is a non-woven fabric strip. The non-woven fabric strip has good electrical insulation, solution permeability, and abrasion resistance.
[0013] In one embodiment, the two ends of the baffle are detachably connected to the outside of the inner groove. When the baffle wears down due to long-term friction of the terminal pins, it can be disassembled and replaced.
[0014] In one embodiment, the conductive base includes: a bracket connected to the outside of the inner groove, a first cathode post mounted on the bracket, and a second cathode post mounted on the bracket; the bracket is used for electrical connection to the negative terminal of the power supply; the first and second cathode posts are parallel to each other; the first cathode post is used to abut the top surface of the edge of the strip, and the second cathode post is used to abut the bottom surface of the edge of the strip. The use of the first and second cathode posts not only achieves electrical connection between the terminal and the negative terminal of the power supply, but also stabilizes and corrects the posture of the strip, improving the accuracy of the electroplating operation.
[0015] In one embodiment, the support is provided with an angle-adjustable first swing arm and a second swing arm; the first swing arm is used to mount a first cathode post, and the second swing arm is used to mount a second cathode post. By adjusting the angle of the first and second swing arms, the height positions of the first and second cathode posts can be adjusted to accommodate material strips of different thicknesses.
[0016] In one embodiment, there are two conductive seats, located on the outer sides of both ends of the inner tank. The paired conductive seats improve the stability of the strip's posture as it passes through the electroplating bath, thus increasing the precision of the electroplating operation. Attached Figure Description
[0017] Figure 1 This is a perspective view of a brush-plating electroplating apparatus according to an embodiment of the present invention;
[0018] Figure 2 for Figure 1 An exploded view of the brush plating apparatus shown.
[0019] Figure 3 for Figure 1 The diagram shows the operational status of the brush plating electroplating apparatus.
[0020] Figure 4 for Figure 3 A magnified view of part A in the brush plating apparatus shown.
[0021] Figure 5 for Figure 3 A top view of the brush plating apparatus shown.
[0022] Figure 6 for Figure 5 A half-sectional view of the brush plating apparatus shown in the diagram.
[0023] Figure 7 for Figure 6 A magnified view of part C in the brush plating apparatus shown.
[0024] The meanings of the labels in the attached diagram are as follows:
[0025] 100-Brush plating electroplating equipment;
[0026] 10-Electroplating solution tank, 11-Outer tank, 12-Inner tank;
[0027] 20-Conductive wire mesh;
[0028] 30-stop bar;
[0029] 40-Conductive base, 41-Bracket, 42-First cathode post, 43-Second cathode post, 44-First swing arm, 45-Second swing arm;
[0030] 200 - Material strip, 201 - Terminal, 2011 - Pin. Detailed Implementation
[0031] To make the above-mentioned objects, features, and advantages of this utility model more apparent and understandable, the specific embodiments of this utility model will be described in detail below with reference to the accompanying drawings. Many specific details are set forth in the following description to provide a full understanding of this utility model. However, this utility model can be implemented in many other ways different from those described herein, and those skilled in the art can make similar modifications without departing from the spirit of this utility model. Therefore, this utility model is not limited to the specific embodiments disclosed below.
[0032] In the description of this utility model, it should be understood that the terms "center", "longitudinal", "transverse", "length", "width", "thickness", "upper", "lower", "front", "rear", "left", "right", "vertical", "horizontal", "top", "bottom", "inner", "outer", "clockwise", "counterclockwise", "axial", "radial", "circumferential", etc., indicating the orientation or positional relationship are based on the orientation or positional relationship shown in the accompanying drawings, and are only for the convenience of describing this utility model and simplifying the description, and are not intended to indicate or imply that the device or element referred to must have a specific orientation, or be constructed and operated in a specific orientation, and therefore should not be construed as a limitation of this utility model.
[0033] Furthermore, the terms "first" and "second" are used for descriptive purposes only and should not be construed as indicating or implying relative importance or implicitly specifying the number of indicated technical features. Thus, a feature defined as "first" or "second" may explicitly or implicitly include at least one of that feature. In the description of this utility model, "a plurality of" means at least two, such as two, three, etc., unless otherwise explicitly specified.
[0034] In this utility model, unless otherwise explicitly specified and limited, the terms "installation," "connection," "joining," and "fixing," etc., should be interpreted broadly. For example, they can refer to a fixed connection, a detachable connection, or an integral part; they can refer to a mechanical connection or an electrical connection; they can refer to a direct connection or an indirect connection through an intermediate medium; they can refer to the internal communication of two components or the interaction between two components, unless otherwise explicitly limited. Those skilled in the art can understand the specific meaning of the above terms in this utility model according to the specific circumstances.
[0035] In this utility model, unless otherwise explicitly specified and limited, "above" or "below" the second feature can mean that the first feature is in direct contact with the second feature, or that the first feature is in indirect contact with the second feature through an intermediate medium. Furthermore, "above," "on top of," and "over" the second feature can mean that the first feature is directly above or diagonally above the second feature, or simply that the first feature is at a higher horizontal level than the second feature. "Below," "below," and "under" the second feature can mean that the first feature is directly below or diagonally below the second feature, or simply that the first feature is at a lower horizontal level than the second feature.
[0036] It should be noted that when an element is referred to as being "fixed to" or "set on" another element, it can be directly on the other element or there may be an intervening element. When an element is considered to be "connected to" another element, it can be directly connected to the other element or there may be an intervening element. The terms "vertical," "horizontal," "upper," "lower," "left," "right," and similar expressions used herein are for illustrative purposes only and do not represent the only possible implementation.
[0037] like Figures 1 to 7 As shown, it is a brush plating electroplating device 100 according to an embodiment of the present invention.
[0038] like Figure 1 and Figure 2 As shown, the brush-plating electroplating apparatus 100 includes: an electroplating bath 10, a conductive mesh 20 mounted on the electroplating bath 10, baffles 30 laid on the conductive mesh 20, and a conductive base 40 mounted on the electroplating bath 10. This solution takes the tin plating of USB shell pins as an example, which can be combined with... Figure 3 During operation, the electroplating bath 10 is used to hold the electroplating solution. The conductive mesh 20 is used to connect to the positive terminal of the power supply to form the anode required for electroplating. The conductive seat 40 is used to contact the material strip 200 to achieve an electrical connection between the material strip 200 and the negative terminal of the power supply, thereby allowing the pins 2011 of the terminal 201 (i.e., the USB shell referred to in this embodiment) to form the cathode required for electroplating. The baffle 30 allows the electroplating solution to penetrate and forms an electrically insulating layer between the pins 2011 of the terminal 201 and the conductive mesh 20.
[0039] The following text, combined with Figures 1 to 7 The brush plating electroplating apparatus 100 described above will be further explained.
[0040] like Figure 1 and Figure 2 As shown, the electroplating solution tank 10 includes an outer tank 11 and an inner tank 12 located within the outer tank 11. The inner tank 12 is used to hold the electroplating solution. The outer tank 11 is used to hold the electroplating solution that overflows from the inner tank 12.
[0041] In this embodiment, both the outer tank 11 and the inner tank 12 are electrically insulated, which can reduce the risk of electric shock to workers and improve operational safety. For example, in this embodiment, both the outer tank 11 and the inner tank 12 are made of PVC material.
[0042] like Figure 1 and Figure 2 As shown, the conductive mesh 20 is located in the inner groove 12 and is used for electrical connection to the positive terminal of the power supply.
[0043] In this design, the conductive mesh 20 is used not only for electrically connecting the positive terminal of the power supply but also for supporting the baffle 30. Simultaneously, the corrosiveness of the electroplating solution must be considered; therefore, in this embodiment, the conductive mesh 20 is a platinum-titanium mesh. Platinum-titanium mesh possesses excellent corrosion resistance, structural stability, and conductivity.
[0044] Combination Figure 1 , Figure 3 ,as well as Figure 7 As shown, the baffle 30 is arranged along the preset forward direction of the conveyor belt 200. The baffle 30 has electrical insulating properties and is permeable to the electroplating solution, and the baffle 30 is immersed in the electroplating solution in the inner tank 12.
[0045] like Figure 1 and Figure 2 As shown, the conductive seat 40 is disposed adjacent to the inner groove 12. The conductive seat 40 is used to electrically connect to the negative terminal of the power supply and to contact the material strip 200 to realize the electrical connection between the material strip 200 and the negative terminal of the power supply.
[0046] In this design, the main function of the conductive base 40 is to achieve electrical connection between the strip 200 and the negative terminal of the power supply. Therefore, the conductive base 40 can be implemented in various ways. For example, using... Figure 2 and Figure 4 For example, in this embodiment, the conductive base 40 includes: a bracket 41 connected to the outside of the inner groove 12, a first cathode post 42 mounted on the bracket 41, and a second cathode post 43 mounted on the bracket 41. The bracket 41 is used to electrically connect to the negative terminal of the power supply. The first cathode post 42 and the second cathode post 43 are parallel to each other. The first cathode post 42 is used to abut the top surface at the edge of the strip 200, and the second cathode post 43 is used to abut the bottom surface at the edge of the strip 200. By using the first cathode post 42 and the second cathode post 43, not only is the electrical connection between the terminal 201 and the negative terminal of the power supply realized, but the posture of the strip 200 can also be stabilized and corrected, improving the accuracy of the electroplating operation.
[0047] Furthermore, such as Figure 2 and Figure 4As shown, in this embodiment, the bracket 41 is provided with an angle-adjustable first swing arm 44 and a second swing arm 45. The first swing arm 44 is used to install the first cathode post 42, and the second swing arm 45 is used to install the second cathode post 43. By adjusting the angle of the first swing arm 44 and the second swing arm 45, the height position of the first cathode post 42 and the second cathode post 43 can be adjusted, thereby adapting to material strips 200 of different thicknesses (specifically referring to the thickness at the edge of the material strip 200).
[0048] In addition, such as Figure 2 and Figure 3 As shown, in this embodiment, there are two conductive seats 40, located on the outer sides of both ends of the inner tank 12. The paired conductive seats 40 can improve the stability of the material strip 200's posture during its passage through the electroplating bath 10, thereby improving the accuracy of the electroplating operation.
[0049] It should be further explained that even if the conductive seat 40 does not have the function of stabilizing and correcting the posture of the strip 200, the strip 200 itself is in a taut state during its advance in the inner groove 12, which can still meet the feeding posture requirements of this scheme. That is, the function of the conductive seat 40 in stabilizing and correcting the posture of the strip 200 is not necessary.
[0050] Working principle diagram:
[0051] like Figures 3 to 7 As shown, during operation, the material strip 200 advances along a preset direction at the surface of the electroplating solution in the inner tank 12 of the electroplating bath 10, and the pins 2011 of the terminals 201 on the material strip 200 are inserted into the electroplating solution to a preset depth (by adjusting the relative height between the material strip 200 and the surface of the electroplating solution, the size of the electroplating area of the pins 2011 can be controlled; for example, by controlling the liquid level of the electroplating solution in the inner tank 12 or adjusting the height at which the material strip 200 advances). The material strip 200 is connected to the negative terminal of the power supply via the conductive base 40 to form the cathode required for electroplating, while the conductive mesh 20 is electrically connected to the positive terminal of the power supply to form the anode required for electroplating. The baffle 30 is used to prevent the pins 2011 of the terminals 201 from directly contacting the conductive mesh 20 to prevent short circuits. Therefore, an electric field is formed between the conductive wire mesh 20 and the pins 2011 of the terminal 201 on the material strip 200, causing metal ions in the electroplating solution to accumulate and precipitate on the surface of the pins 2011 of the terminal 201 under the action of the electric field, thereby efficiently completing the electroplating treatment on both sides of the pins 2011 of the terminal 201.
[0052] Considering that during actual operation, the pins 2011 of terminal 201 need to be inserted into the electroplating solution to a preset depth, and that terminal 201 moves with the conveyor belt 200, it is difficult to avoid scratching between the pins 2011 of terminal 201 and the baffle 30. Therefore, preferably, in this embodiment, the baffle 30 is a non-woven fabric strip. Non-woven fabric strips have good electrical insulation, solution permeability, and abrasion resistance.
[0053] Considering the need for replacement of the retaining strip 30, in some embodiments, both ends of the retaining strip 30 are detachably connected to the outside of the inner groove 12. When the retaining strip 30 wears due to long-term friction of the pins 2011 of the terminal 201, the retaining strip 30 can be disassembled and replaced. For example, the two ends of the retaining strip 30 can be detachably connected to the outside of the inner groove 12 by screws.
[0054] The above-mentioned brush plating electroplating apparatus 100 uses the inner tank 12 of the electroplating solution tank 10 to load the electroplating solution, forming an electric field between the conductive wire mesh 20 and the pins 2011 of the terminal 201 of the material strip 200, and uses the baffle 30 to prevent direct contact between the conductive wire mesh 20 and the terminal 201 of the material strip 200 to prevent short circuit, thereby efficiently completing the electroplating treatment of both sides of the pins 2011 of the terminal 201 by brush plating.
[0055] The technical features of the above embodiments can be combined in any way. For the sake of brevity, not all possible combinations of the technical features in the above embodiments are described. However, as long as there is no contradiction in the combination of these technical features, they should be considered to be within the scope of this specification.
[0056] The above embodiments only illustrate preferred implementations of this utility model, and their descriptions are relatively specific and detailed, but they should not be construed as limiting the scope of the utility model patent. It should be noted that those skilled in the art can make various modifications and improvements without departing from the concept of this utility model, and these all fall within the protection scope of this utility model. Therefore, the protection scope of this utility model patent should be determined by the appended claims.
Claims
1. A brush-plating electroplating apparatus, characterized in that, include: Electroplating bath; The electroplating solution tank includes an outer tank and an inner tank located within the outer tank; the inner tank is used to hold the electroplating solution. A conductive wire mesh is installed on the electroplating bath; the conductive wire mesh is located in the inner tank and is used for electrical connection to the positive terminal of the power supply; A baffle strip laid on the conductive wire mesh; the baffle strip is arranged along a predetermined forward direction of the material strip; the baffle strip has electrical insulating properties and is permeable to the electroplating solution; the baffle strip is immersed in the electroplating solution in the inner tank; and A conductive seat is installed on the electroplating bath; the conductive seat is disposed adjacent to the inner tank; the conductive seat is used to electrically connect to the negative terminal of the power supply and to contact the material strip to realize the electrical connection between the material strip and the negative terminal of the power supply.
2. The brush plating electroplating apparatus according to claim 1, characterized in that, Both the outer groove and the inner groove are electrically insulated grooves.
3. The brush plating electroplating apparatus according to claim 1, characterized in that, The conductive mesh is a platinum-titanium mesh.
4. The brush plating electroplating apparatus according to claim 1, characterized in that, The baffle strip is a non-woven fabric strip.
5. The brush plating electroplating apparatus according to claim 1, characterized in that, The two ends of the baffle are detachably connected to the outside of the inner groove.
6. The brush plating electroplating apparatus according to claim 1, characterized in that, The conductive base includes: a bracket connected to the outside of the inner groove, a first cathode post mounted on the bracket, and a second cathode post mounted on the bracket; the bracket is used to electrically connect to the negative terminal of the power supply; the first cathode post and the second cathode post are parallel to each other; the first cathode post is used to abut the top surface at the edge of the material strip, and the second cathode post is used to abut the bottom surface at the edge of the material strip.
7. The brush plating electroplating apparatus according to claim 6, characterized in that, The bracket is provided with an angle-adjustable first swing arm and a second swing arm; the first swing arm is used to install the first cathode column, and the second swing arm is used to install the second cathode column.
8. The brush plating electroplating apparatus according to claim 6, characterized in that, The number of conductive seats is two, and they are located on the outer sides of both ends of the inner groove.