A nitrogen curtain cleaning machine

Abstract

The utility model relates to wafer cleaning technical field, especially a nitrogen curtain cleaning machine, including organic body, be equipped with a receiving groove in the bottom of machine body, be equipped with pickling tank, cleaning tank from left to right in the receiving groove, be fixed with a cooling coil in the inside of pickling tank, and be equipped with a plurality of nitrogen curtain in the bottom of pickling tank, the nitrogen curtain evenly distributes in the middle of cooling coil, be equipped with first baffle in the inside of cleaning tank, be equipped with second baffle in the right side of first baffle, first baffle, second baffle divide cleaning tank into first cleaning tank, communication tank and second cleaning tank. The utility model relates to a nitrogen curtain cleaning machine, has better cleaning effect.

Description

Technical Field

[0001] This utility model relates to the field of wafer cleaning technology, and in particular to a nitrogen curtain cleaning machine. Background Technology

[0002] Nitrogen curtain cleaning machines can be used to clean organic contaminants from the surfaces of wafers and PCBs, improving photoresist adhesion. Nitrogen is chemically stable and does not react chemically with most materials during the cleaning process, avoiding the introduction of oxides or impurities. It is particularly suitable for processing precision electronic components, offering superior environmental friendliness and economy. However, existing nitrogen curtain cleaning machines have limited functionality and their cleaning effects are often unsatisfactory. Utility Model Content

[0003] The purpose of this utility model is to provide a nitrogen curtain cleaning machine with better cleaning effect.

[0004] To achieve the above objectives, the technical solution of this utility model is as follows:

[0005] A nitrogen curtain cleaning machine includes a body, a receiving groove at the bottom of the body, an acid pickling tank and a cleaning tank arranged sequentially from left to right in the receiving groove, a cooling coil fixed inside the acid pickling tank, and several nitrogen curtains arranged at the bottom of the acid pickling tank, the nitrogen curtains being evenly distributed in the middle of the cooling coil.

[0006] A first partition plate is provided inside the cleaning tank, and a second partition plate is provided on the right side of the first partition plate. The first partition plate and the second partition plate divide the cleaning tank into a first cleaning tank, a connecting tank and a second cleaning tank.

[0007] An overflow trough is fixed at the top rear side of the first cleaning tank. Several overflow holes are provided on the cleaning tank at a position opposite to the overflow trough. The overflow holes extend rearward and penetrate the side wall of the overflow trough.

[0008] A first exhaust plate is fixed at the bottom of the first cleaning tank, and a number of first exhaust holes are provided on the first exhaust plate. A first aeration coil is provided below the first exhaust plate.

[0009] A second exhaust plate is fixed at the bottom of the second cleaning tank, and a number of second exhaust holes are provided on the second exhaust plate. A second aeration coil is provided below the second exhaust plate.

[0010] A plurality of first connecting holes are provided at the bottom of the first partition plate, and a plurality of second connecting holes are provided at the top of the second partition plate.

[0011] As an improvement, the height of the second connecting hole is less than the height of the overflow hole.

[0012] As an improvement, a first discharge pipe, a second discharge pipe, and a third discharge pipe are respectively provided at the bottom of the pickling tank, the bottom of the first cleaning tank, and the bottom of the second cleaning tank.

[0013] As an improvement, a fourth discharge pipe is provided at the bottom of the overflow trough.

[0014] As an improvement: a first liquid inlet is provided on the front side of the pickling tank, a second liquid inlet is provided on the front side of the second cleaning tank, and an overflow pipe is provided on the top of the rear side of the pickling tank.

[0015] As an improvement: a drain trough is provided on the right side of the second cleaning tank. The drain trough is separated from the second cleaning tank by a baffle. A filter funnel is provided inside the second cleaning tank. A filter screen is provided above the filter funnel. A drain baffle is provided on the rear side of the filter screen in an inclined manner.

[0016] As an improvement, a first exhaust pipe is provided on the top of the fuselage, and a second exhaust pipe is provided on its rear side.

[0017] In summary, this utility model has the following beneficial effects:

[0018] 1. A cooling coil is installed in the pickling tank to reduce the temperature of the liquid in the pickling tank. Combined with a nitrogen curtain, it can improve the cleaning effect of the wafer. The first cleaning tank and the second cleaning tank are equipped with a first aeration coil and a second aeration coil, which can further improve the cleaning effect.

[0019] 2. After cleaning, the wafers can be drained in the drainage tank. Attached Figure Description

[0020] To more clearly illustrate the technical solutions in this utility model, the accompanying drawings used in the description of the embodiments or prior art will be briefly introduced below.

[0021] Figure 1 This is a schematic diagram of the overall structure of a nitrogen curtain cleaning machine;

[0022] Figure 2 This is a front view of a nitrogen curtain cleaning machine;

[0023] Figure 3 A cross-sectional view of a nitrogen curtain cleaning machine Figure 1 ;

[0024] Figure 4 A cross-sectional view of a nitrogen curtain cleaning machine Figure 2 ;

[0025] The components are as follows: 1. Body; 2. Receiving tank; 3. Pickling tank; 4. Cooling coil; 5. Nitrogen curtain; 6. First partition plate; 7. Second partition plate; 8. First cleaning tank; 9. Connecting tank; 10. Second cleaning tank; 11. Overflow tank; 12. Overflow hole; 13. First exhaust plate; 14. Second exhaust plate; 15. First exhaust hole; 16. Second exhaust hole; 17. First aeration coil; 18. Second aeration coil; 19. First connecting hole; 20. Second connecting hole; 21. First discharge pipe; 22. Second discharge pipe; 23. Third discharge pipe; 24. First liquid inlet hole; 25. Second liquid inlet hole; 26. Overflow pipe; 27. Drainage tank; 28. Baffle; 29. ​​Filter funnel; 30. Filter screen plate; 31. Drainage baffle; 32. First exhaust pipe; 33. Second exhaust pipe. Detailed Implementation

[0026] The present invention will now be described in further detail with reference to the accompanying drawings.

[0027] Please refer to Figures 1-4 A nitrogen curtain cleaning machine includes a body 1, a receiving groove 2 at the bottom of the body 1, an acid pickling tank 3 and a cleaning tank arranged sequentially from left to right in the receiving groove 2, a cooling coil 4 fixed inside the acid pickling tank 3, and several nitrogen curtains 5 arranged at the bottom of the acid pickling tank 3, with the nitrogen curtains 5 evenly distributed in the middle of the cooling coil 4.

[0028] A first partition plate 6 is provided inside the cleaning tank, and a second partition plate 7 is provided on the right side of the first partition plate 6. The first partition plate 6 and the second partition plate 7 divide the cleaning tank into a first cleaning tank 8, a connecting tank 9 and a second cleaning tank 10.

[0029] An overflow trough 11 is fixed at the top rear side of the first cleaning tank 8. Several overflow holes 12 are provided on the cleaning tank at a position opposite to the overflow trough 11. The overflow holes 12 extend rearward and penetrate the side wall of the overflow trough 11.

[0030] A first exhaust plate 13 is fixed at the bottom of the first cleaning tank 8. Several first exhaust holes 15 are opened on the first exhaust plate 13. A first aeration coil 17 is provided below the first exhaust plate 13.

[0031] A second exhaust plate 14 is fixed at the bottom of the second cleaning tank 10. Several second exhaust holes 16 are provided on the second exhaust plate 14. A second aeration coil 18 is provided below the second exhaust plate 14.

[0032] Several first connecting holes 19 are provided at the bottom of the first partition plate 6, and several second connecting holes 20 are provided at the top of the second partition plate 7.

[0033] In this embodiment, a cooling coil 4 is provided in the pickling tank 3, which can be used to reduce the liquid temperature in the pickling tank 3. Combined with the nitrogen curtain 5, it can improve the cleaning effect of the wafer. The first cleaning tank 8 and the second cleaning tank 10 are provided with a first aeration coil 17 and a second aeration coil 18, which can further improve the cleaning effect.

[0034] The height of the second connecting hole 20 is less than the height of the overflow hole 12.

[0035] A first discharge pipe 21, a second discharge pipe 22, and a third discharge pipe 23 are respectively provided at the bottom of the pickling tank 3, the bottom of the first cleaning tank 8, and the bottom of the second cleaning tank 10. A fourth discharge pipe is provided at the bottom of the overflow tank 11.

[0036] A first liquid inlet 24 is provided on the front side of the pickling tank 3, a second liquid inlet 25 is provided on the front side of the second cleaning tank 10, and an overflow pipe 26 is provided on the top of the rear side of the pickling tank 3.

[0037] A drain trough 27 is provided on the right side of the second cleaning tank 10. The drain trough 27 is separated from the second cleaning tank 10 by a baffle 28. A filter funnel 29 is provided inside the second cleaning tank 10, and a filter screen 30 is provided above the filter funnel 29. A drain baffle 31 is provided at an angle behind the filter screen 30. In this embodiment, the wafer can be drained in the drain trough 27 after cleaning.

[0038] A first exhaust pipe 32 is provided on the top of the machine body 1, and a second exhaust pipe 33 is provided on its rear side. In this embodiment, the first exhaust pipe 32 and the second exhaust pipe 33 can quickly discharge waste gas and other pollutants generated during the cleaning process from inside the machine body 1, and both are connected to an external negative pressure suction pipe.

[0039] Working principle: A certain amount of acid solution is injected into the pickling tank 3 through the first inlet hole 24, and purified water is injected into the first cleaning tank through the second inlet hole 25. The purified water overflows into the connecting tank 9 through the second connecting hole 20 and is injected into the second cleaning tank through the first connecting hole 19.

[0040] The wafers to be cleaned are placed in an external basket, cooling water is supplied to the cooling coil 4, and nitrogen gas is supplied to the pickling tank 3 through the nitrogen curtain 5 for cleaning. After cleaning, the basket is moved to the first cleaning tank 8, and clean air is supplied to the first cleaning tank through the first aeration coil 17 to clean the wafers in the basket to remove the acid on their surface. After cleaning for a period of time, the basket is then transferred to the second cleaning tank, and clean air is supplied to the second cleaning tank through the second aeration coil 18 to perform a second cleaning of the wafers in the basket to completely remove the acid on their surface.

[0041] After cleaning, transfer the basket to the top of the filter screen 30 and let it stand to drain.

[0042] Finally, it should be noted that the above embodiments are only used to illustrate the technical solution of this utility model and not to limit it; although the utility model has been described in detail with reference to preferred embodiments, those skilled in the art should understand that modifications can still be made to the specific implementation of this utility model or equivalent substitutions can be made to some technical features without departing from the spirit of the technical solution of this utility model, and all such modifications and substitutions should be covered within the scope of the technical solution claimed by this utility model.

Claims

1. A nitrogen curtain cleaning machine, characterized in that, The device includes a body, a receiving groove at the bottom of the body, an acid pickling tank and a cleaning tank arranged sequentially from left to right in the receiving groove, a cooling coil fixed inside the acid pickling tank, and several nitrogen curtains evenly distributed in the middle of the cooling coil at the bottom of the acid pickling tank. A first partition plate is provided inside the cleaning tank, and a second partition plate is provided on the right side of the first partition plate. The first partition plate and the second partition plate divide the cleaning tank into a first cleaning tank, a connecting tank and a second cleaning tank. An overflow trough is fixed at the top rear side of the first cleaning tank. Several overflow holes are provided on the cleaning tank at a position opposite to the overflow trough. The overflow holes extend rearward and penetrate the side wall of the overflow trough. A first exhaust plate is fixed at the bottom of the first cleaning tank, and a number of first exhaust holes are provided on the first exhaust plate. A first aeration coil is provided below the first exhaust plate. A second exhaust plate is fixed at the bottom of the second cleaning tank, and a number of second exhaust holes are provided on the second exhaust plate. A second aeration coil is provided below the second exhaust plate. A plurality of first connecting holes are provided at the bottom of the first partition plate, and a plurality of second connecting holes are provided at the top of the second partition plate.

2. The nitrogen curtain cleaning machine according to claim 1, characterized in that, The height of the second connecting hole is less than the height of the overflow hole.

3. The nitrogen curtain cleaning machine according to claim 1, characterized in that, A first discharge pipe, a second discharge pipe, and a third discharge pipe are respectively provided at the bottom of the pickling tank, the bottom of the first cleaning tank, and the bottom of the second cleaning tank.

4. The nitrogen curtain cleaning machine according to claim 1, characterized in that, A fourth discharge pipe is provided at the bottom of the overflow trough.

5. The nitrogen curtain cleaning machine according to claim 1, characterized in that, A first liquid inlet is provided on the front side of the pickling tank, a second liquid inlet is provided on the front side of the second cleaning tank, and an overflow pipe is provided on the top of the rear side of the pickling tank.

6. The nitrogen curtain cleaning machine according to claim 1, characterized in that, A drain trough is provided on the right side of the second cleaning tank. The drain trough is separated from the second cleaning tank by a baffle. A filter funnel is provided inside the second cleaning tank. A filter screen is provided above the filter funnel. A drain baffle is provided on the rear side of the filter screen in an inclined manner.

7. The nitrogen curtain cleaning machine according to claim 1, characterized in that, A first exhaust pipe is provided on the top of the fuselage, and a second exhaust pipe is provided on its rear side.

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