Silica gel adsorber for krypton-xenon rare gas purification

By designing a dual-chamber structure and flow control components, precise regulation of gas flow rate and velocity is achieved, solving the problems of incomplete impurity removal and resource waste in existing silica gel adsors, and improving the purification effect of krypton and xenon rare gases.

CN224331830UActive Publication Date: 2026-06-09XINYI ENERGY (PUYANG) CO LTD

Patent Information

Authority / Receiving Office
CN · China
Patent Type
Utility models(China)
Current Assignee / Owner
XINYI ENERGY (PUYANG) CO LTD
Filing Date
2025-07-15
Publication Date
2026-06-09

AI Technical Summary

Technical Problem

Existing silica gel adsorbers have a single-chamber structure, which makes it difficult to efficiently remove impurities from complex raw material gases. Furthermore, the gas flow rate and velocity cannot be flexibly adjusted, resulting in poor purification effects and resource waste.

Method used

The design incorporates a dual-chamber structure, combined with flow control components and a motor-driven regulating disc, to achieve precise regulation of gas flow rate and velocity. It utilizes adsorption materials with different functions for graded adsorption and forms a closed-loop control system through flow sensors and controllers.

Benefits of technology

It improves the comprehensiveness of impurity removal and adsorption efficiency, enhances purification accuracy and equipment operational flexibility, and reduces resource waste.

✦ Generated by Eureka AI based on patent content.

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Abstract

The utility model discloses a kind of silica gel adsorbers for krypton xenon rare gas purification, belong to krypton xenon rare gas purification field, including adsorber shell, the adsorber shell is composed of upper chamber and lower chamber, material plate is equipped in the upper chamber, the material plate is set, flow control assembly is equipped between the upper chamber and lower chamber;Through the material plate of upper chamber and adjusting plate abut, and the aperture, perforation one-to-one correspondence of both, cooperate flow control assembly can accurately adjust ventilation area, upper chamber and lower chamber can be filled with different function adsorption material respectively, realize staged adsorption to complex impurity in raw gas, improve the comprehensiveness of impurity removal, simultaneously, by the aperture overlap degree adjustment of adjusting plate and material plate, can optimize the flow path of gas in chamber, ensure that gas and adsorbent contact fully, solve the problem of low utilization rate of adsorbent in traditional structure, improve overall adsorption efficiency and final purification precision.
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Description

Technical Field

[0001] This utility model belongs to the field of krypton-xenon rare gas purification technology, specifically relating to a silica gel adsorber for krypton-xenon rare gas purification. Background Technology

[0002] Xenon rare gas has important applications in electronics, lighting, medical and other fields, but its natural content is extremely low, so it needs to be purified from raw materials (such as air separation tail gas and nuclear reactor exhaust gas). The silica gel adsorber for purifying krypton xenon rare gas is a key piece of equipment specifically designed for this purification process. Its core function is to separate impurities and enrich krypton xenon gas through the adsorption of silica gel.

[0003] In existing technologies, traditional silica gel adsorbers are mostly single-chamber structures filled with a single type of silica gel adsorbent. However, this structure has certain limitations. On the one hand, due to the complex composition of impurities in the raw gas, a single adsorbent is difficult to efficiently and comprehensively remove all impurities, resulting in poor purification effects and difficulty in achieving high-precision product purity. On the other hand, the gas flow rate and velocity inside the adsorber cannot be flexibly adjusted. When the composition, flow rate, and other parameters of the raw gas change, the residence time of the gas in the adsorber cannot be adjusted in time, affecting the adsorption efficiency and easily leading to uneven gas distribution, resulting in some adsorbent not being fully utilized and causing resource waste. Utility Model Content

[0004] The purpose of this invention is to provide a silica gel adsorber for the purification of krypton and xenon rare gases, so as to solve the problems mentioned in the background art.

[0005] To achieve the above objectives, this utility model provides the following technical solution: a silica gel adsorber for the purification of krypton and xenon rare gases, comprising an adsorber housing, wherein the adsorber housing is composed of an upper chamber and a lower chamber;

[0006] The upper chamber is provided with a material plate, and the material plate is provided with openings;

[0007] A flow control assembly is provided between the upper chamber and the lower chamber;

[0008] The flow control component includes an adjustment disc, an adjustment plate on the adjustment disc, and through holes adapted to the material plate on the adjustment plate. The adjustment disc has a toothed groove on its periphery, which meshes with a transmission tooth on one side. The transmission tooth is connected to the output end of the control motor.

[0009] In a preferred embodiment, an annular rotating groove is designed between the lower end of the upper chamber and the upper end of the lower chamber, and matching protruding rings extend from the upper and lower end faces of the adjusting disk, with the protruding rings embedded in the rotating groove to form a rotary pair structure.

[0010] In a preferred embodiment, the material plate in the upper chamber abuts against the adjusting plate, and the openings in the material plate correspond one-to-one with the through holes in the adjusting plate.

[0011] In a preferred embodiment, the control motor is mounted on the side wall of the lower chamber via a protective sleeve.

[0012] In a preferred embodiment, the upper end of the upper chamber is connected to the air inlet pipe, the lower end of the lower chamber is connected to the exhaust pipe, and flow sensors are respectively provided at the air inlet of the upper chamber and the exhaust outlet of the lower chamber.

[0013] In a preferred embodiment, both the upper chamber and the lower chamber have material inlets on their side walls, and a sealing cover is provided at each material inlet. An auxiliary handle is integrally formed on the end side of the sealing cover.

[0014] In a preferred embodiment, a controller is provided on the side wall of the upper chamber, and the controller is electrically connected to the control motor and the flow sensor.

[0015] Compared with the prior art, the beneficial effects of this utility model are:

[0016] This silica gel adsorber for the purification of krypton and xenon rare gases features a material plate in the upper chamber that abuts against an adjustment plate, with corresponding openings and perforations on both. Combined with a flow control component, the ventilation area can be precisely adjusted. The upper and lower chambers can be filled with adsorbent materials with different functions, enabling staged adsorption of complex impurities in the raw gas and improving the comprehensiveness of impurity removal. At the same time, by adjusting the overlap of the apertures of the adjustment plate and the material plate, the flow path of the gas in the chamber can be optimized, ensuring full contact between the gas and the adsorbent. This solves the problem of low adsorbent utilization in traditional structures and improves the overall adsorption efficiency and final purification accuracy.

[0017] This silica gel adsorber for krypton-xenon rare gas purification uses a flow control component that drives a motor to rotate a transmission gear, which in turn rotates the toothed grooves of the regulating plate. This allows for precise rotation of the regulating plate. Combined with flow sensors at the inlet and outlet of the upper and lower chambers and a controller, it forms a closed-loop control system. When the raw gas parameters change or the gas enters different purification stages, the controller can drive the regulating plate to adjust the overlap of the ventilation orifices in real time based on the feedback signals from the flow sensors, thereby changing the gas velocity and flow rate. This breaks through the limitations of traditional fixed structures and can adapt to dynamic purification needs without interrupting the process, significantly improving the operational flexibility and adaptability of the equipment. Attached Figure Description

[0018] Figure 1 This is a schematic diagram of the overall structure of this utility model;

[0019] Figure 2 This is a schematic diagram of the installation structure of the flow control component of this utility model;

[0020] Figure 3 This is a schematic diagram of the flow control component structure of this utility model;

[0021] Figure 4 This is a schematic diagram of the sealing cover plate installation structure of this utility model.

[0022] In the diagram: 1. Adsorber housing; 2. Upper chamber; 21. Material plate; 22. Inlet pipe; 3. Lower chamber; 31. Exhaust pipe; 4. Annular rotating groove; 5. Flow control assembly; 51. Adjusting disc; 52. Adjusting plate; 53. Protruding ring; 531. Gear; 54. Transmission gear; 55. Control motor; 56. Protective sleeve; 6. Flow sensor; 7. Controller; 8. Sealing cover; 81. Auxiliary handle. Detailed Implementation

[0023] The present invention will be further described below with reference to the embodiments.

[0024] The following embodiments are used to illustrate the present invention, but should not be used to limit the scope of protection of the present invention. The conditions in the embodiments can be further adjusted according to specific conditions, and simple improvements to the method of the present invention under the premise of the concept of the present invention are all within the scope of protection claimed by the present invention.

[0025] Please see Figure 1-4 This utility model provides a silica gel adsorber for the purification of krypton and xenon rare gases, including an adsorber housing 1. The adsorber housing 1 is composed of an upper chamber 2 and a lower chamber 3. A material plate 21 is provided in the upper chamber 2, and the material plate 21 has openings. A flow control component 5 is provided between the upper chamber 2 and the lower chamber 3. An annular rotating groove 4 is designed between the lower end of the upper chamber 2 and the upper end of the lower chamber 3. The upper and lower end faces of the adjusting plate 51 extend into matching protruding rings 53, which are embedded in the annular rotating groove 4 to form a rotary pair structure. The nested structure of the annular rotating groove 4 and the protruding ring 53 naturally forms a sealing path, which can effectively block gas leakage. The flow control component 5 includes an adjusting plate 51, an adjusting plate 52 on the adjusting plate 51, and a through hole adapted to the material plate 21 on the adjusting plate 52. The outer periphery of the adjusting plate 51 is provided with a toothed groove 531, which meshes with a transmission tooth 54 on one side. The transmission tooth 54 is connected to the output end of the control motor 55. The control motor 55 is installed on the side wall of the lower chamber 3 through a protective sleeve 56.

[0026] The material plate 21 and the adjusting plate 52 are made of silicone. Since silicone has a certain elasticity, when the material plate 21 and the adjusting plate 52 come into contact, they can fill the tiny gaps on the contact surface through slight deformation, thereby enhancing the sealing of the two and reducing gas leakage at the gaps.

[0027] In this embodiment, the material plate 21 of the upper chamber 2 abuts against the regulating plate 52, and the openings and perforations of the two correspond one-to-one. With the help of the flow control component 5, the ventilation area can be precisely adjusted. The upper chamber 2 and the lower chamber 3 can be filled with adsorbent materials with different functions (such as the first filler and the second filler), respectively, to achieve graded adsorption of complex impurities in the raw material gas, thereby improving the comprehensiveness of impurity removal. At the same time, by adjusting the overlap of the apertures of the regulating plate 52 and the material plate 21, the flow path of the gas in the chamber can be optimized, ensuring that the gas and the adsorbent are in full contact. This solves the problem of low adsorbent utilization in traditional structures and improves the overall adsorption efficiency and final purification accuracy.

[0028] The first filler can be activated carbon, and the second filler can be modified silica gel.

[0029] Please see Figure 1 , Figure 2 The upper chamber 2 is connected to the air inlet pipe 22 at its upper end, and the lower chamber 3 is connected to the exhaust pipe 31 at its lower end. Flow sensors 6 are respectively installed at the air inlet of the upper chamber 2 and the exhaust outlet of the lower chamber 3.

[0030] In this embodiment, the flow sensor 6 at the air inlet can detect the initial flow rate of the raw material gas entering the upper chamber 2 in real time, and the flow sensor 6 at the exhaust outlet can monitor the flow rate of the gas discharged from the lower chamber 3 after adsorption treatment in real time. Through the flow data at these two locations, the flow of gas in the adsorber can be intuitively understood, providing basic data support for subsequent flow adjustment.

[0031] It should be noted that the MFC series mass flow sensor used in this application is a mature existing product, and its specific structure and working principle are all publicly available technologies, which will not be described in detail here.

[0032] Please see Figure 2 , Figure 4 Both the upper chamber 2 and the lower chamber 3 have material inlets on their side walls. A sealing cover plate 8 is provided at the material inlet. An auxiliary handle 81 is integrally formed on the end side of the sealing cover plate 8.

[0033] In this embodiment, the material chamber opening provides a direct operating channel for the first and second fillers in the upper chamber 2 and lower chamber 3. When the adsorbent reaches saturation due to long-term use, or when different types of fillers need to be replaced according to purification requirements, the operator can quickly open the sealing cover 8 through the auxiliary handle 81 and directly remove, replace, or replenish the filler from the material chamber opening without disassembling the entire adsorber housing 1. This greatly simplifies the maintenance operation process, saves replacement time, and improves the maintenance efficiency of the equipment.

[0034] Please see Figure 1 , Figure 3 , Figure 4 A controller 7 is provided on the side wall of the upper chamber 2. The controller 7 is electrically connected to the control motor 55 and the flow sensor 6.

[0035] It should be noted that the controller 7 in this application adopts PLC programming control technology to achieve coordinated control with the control motor 55 and the flow sensor 6. The specific control process is a common technology disclosed in this field and will not be described in detail here.

[0036] Working principle and usage process of this utility model:

[0037] First, the first filler and the second filler are filled into the upper chamber 2 and the lower chamber 3 respectively through the material cavity openings on the side walls of the upper chamber 2 and the lower chamber 3. After filling, the sealing cover plate 8 is closed at the material cavity opening using the auxiliary handle 81 to ensure the chamber is sealed. Then, a mixed gas containing target rare gases such as krypton and xenon, as well as various impurities, is introduced into the upper chamber 2 through the air inlet pipe 22 at the upper end of the upper chamber 2. The flow sensor 6 at the air inlet of the upper chamber 2 detects the initial flow rate of the raw material gas in real time and transmits the data to the controller 7. The raw material gas passes through the opening of the material plate 21 in the upper chamber 2 and comes into contact with the first filler for preliminary adsorption and purification.

[0038] Then, the gas that has undergone preliminary adsorption enters the flow control component 5 between the upper chamber 2 and the lower chamber 3. The controller 7 sends a command to the control motor 55 through PLC programming control technology based on the data transmitted by the inlet flow sensor 6 and the preset process parameters. The control motor 55 drives the transmission gear 54 to rotate. The transmission gear 54 meshes with the tooth groove 531 on the periphery of the regulating disk 51, thereby driving the regulating disk 51 to rotate. The protruding rings 53 on the upper and lower end faces of the regulating disk 51 form a rotary pair structure in the annular rotating groove 4 to ensure the stable rotation of the regulating disk 51, which in turn drives the regulating plate 52 to rotate. The overlap between the perforations on the regulating plate 52 and the openings of the material plate 21 changes, thereby achieving precise adjustment of the gas flow rate. The adjusted gas enters the lower chamber 3 and comes into full contact with the second filler material for deep adsorption and purification.

[0039] Secondly, the gas after deep adsorption in the lower chamber 3 is discharged through the exhaust pipe 31. The flow sensor 6 at the exhaust port of the lower chamber 3 monitors the flow rate of the discharged gas in real time and feeds the data back to the controller 7. The controller 7 compares the flow data of the inlet and the outlet. If there is a deviation, it will readjust the control motor 55 to ensure that the gas flow rate is stable within a suitable range.

[0040] Finally, after the gas comes into full contact with the first and second fillers, it is discharged from the exhaust pipe 31 at the bottom of the lower chamber 3.

[0041] In the above scheme, it should be noted that the process parameters of the flow sensor 6 are set using common technical means, and the signal transmission and processing methods between the flow sensor 6 and the controller 7, as well as the signal transmission methods between the controller 7 and the control motor 55, are all existing publicly available technologies, and will not be described in detail here.

[0042] Although embodiments of the present invention have been shown and described, it will be understood by those skilled in the art that various changes, modifications, substitutions and alterations can be made to these embodiments without departing from the principles of the present invention, the scope of which is defined by the appended claims and their equivalents.

Claims

1. A silica gel adsorber for purifying krypton-xenon rare gases, comprising an adsorber housing (1), characterized in that: The adsorber housing (1) is composed of an upper chamber (2) and a lower chamber (3); Both the upper chamber (2) and the lower chamber (3) are used to purify krypton-xenon rare gas; The upper chamber (2) is provided with a material plate (21), and the material plate (21) is provided with openings; A flow control component (5) is provided between the upper chamber (2) and the lower chamber (3); The flow control component (5) includes an adjustment disc (51), an adjustment plate (52) on the adjustment disc (51), a through hole adapted to the material plate (21) on the adjustment plate (52), a toothed groove (531) on the periphery of the adjustment disc (51), the toothed groove (531) meshing with a transmission tooth (54) on one side, and the transmission tooth (54) connected to the output end of the control motor (55).

2. The silica gel adsorber for purifying krypton-xenon rare gases according to claim 1, characterized in that: An annular rotating groove (4) is designed between the lower end of the upper chamber (2) and the upper end of the lower chamber (3). The upper and lower end faces of the adjusting plate (51) extend out matching protruding rings (53), and the protruding rings (53) are embedded in the annular rotating groove (4) to form a rotary pair structure.

3. The silica gel adsorber for purifying krypton-xenon rare gases according to claim 2, characterized in that: The material plate (21) provided in the upper chamber (2) abuts against the adjustment plate (52), and the opening of the material plate (21) corresponds one-to-one with the through hole on the adjustment plate (52).

4. The silica gel adsorber for purifying krypton-xenon rare gases according to claim 1, characterized in that: The control motor (55) is mounted on the side wall of the lower chamber (3) via a protective sleeve (56).

5. A silica gel adsorber for purifying krypton-xenon rare gases according to claim 3, characterized in that: The upper end of the upper chamber (2) is connected to the air inlet pipe (22), and the lower end of the lower chamber (3) is connected to the exhaust pipe (31). Flow sensors (6) are respectively provided at the air inlet of the upper chamber (2) and the exhaust outlet of the lower chamber (3).

6. The silica gel adsorber for purifying krypton-xenon rare gases according to claim 5, characterized in that: Both the upper chamber (2) and the lower chamber (3) have material inlets on their side walls. A sealing cover (8) is provided at the material inlet. An auxiliary handle (81) is integrally formed on the end side of the sealing cover (8).

7. A silica gel adsorber for purifying krypton-xenon rare gases according to claim 5, characterized in that: The upper chamber (2) is provided with a controller (7) on its side wall. The controller (7) is electrically connected to the control motor (55) and the flow sensor (6).