Mass spectrometer and ion manipulation device

Abstract

The utility model discloses a mass spectrometer and ion processing apparatus, this mass spectrometer includes ion source, ion processing apparatus, transmission device and detection device, and ion source is used to produce charged ion, and ion processing apparatus sets up in the output of ion source, and ion processing apparatus includes first base body, second base body, connecting piece and heating assembly, and first base body is close to ion source and forms ion entrance, and second base body forms ion export, and with first base body interval arrangement to form the accommodation space, and, first base body and second base body are connected power supply respectively to make first base body and second base body form electromagnetic field between, and electromagnetic field can be used to provide kinetic energy for the charged ion in the accommodation space to make the charged ion can be transmitted through ion transmission channel, heating assembly is used for heating the medium in the accommodation space, transmission channel is used for transmitting the charged ion after ion processing apparatus processing, detection device is used for analyzing the charged ion of transmission device transmission.

Description

Technical Field

[0001] This utility model relates to an ion detection device, and more particularly to a mass spectrometer and an ion processing device. Background Technology

[0002] In related technologies, mass spectrometers are used to decompose substances to be detected into ions, and to separate and detect them based on the mass differences between various ions, generating corresponding mass spectra. During the process of generating ion clusters and transmitting them to the detection device, solvent molecules and cluster ions may attach to the ion clusters. Therefore, an ion processing device is needed to remove solvent molecules and cluster ions from the ion clusters to improve the stability of mass spectrometer analysis. Utility Model Content

[0003] This invention aims to solve at least one of the technical problems existing in the prior art. To this end, this invention proposes a mass spectrometer to improve the stability of mass spectrometry analysis.

[0004] The mass spectrometer according to a first aspect of the present invention includes an ion source, an ion processing device, a transmission device, and a detection device.

[0005] An ion source is used to generate charged ions;

[0006] An ion processing device is disposed at the output end of an ion source. The ion processing device includes a first substrate, a second substrate, a connector, and a heating assembly. The first substrate is close to the ion source and has an ion inlet. The second substrate has an ion outlet and is spaced apart from the first substrate to form a accommodating space. At least one of the first and second substrates has a ventilation structure. The first and second substrates are respectively connected to a power source to generate an electromagnetic field between them. The connector connects the first substrate and / or the second substrate and has an ion transmission port. The ion transmission port communicates with the accommodating space through the ion outlet, forming an ion transmission channel between the ion inlet and the ion transmission port. The electromagnetic field can provide kinetic energy to the charged ions within the accommodating space, allowing the charged ions to be transmitted through the ion transmission channel. The heating assembly is used to heat the medium within the accommodating space.

[0007] A transmission device is disposed on the side of the ion processing device near the connector. The transmission device has at least one transmission channel. The transmission channel is connected to the ion channel through the ion transmission port. The transmission channel is used to transmit the charged ions after being processed by the ion processing device.

[0008] A detection device for analyzing the charged ions transmitted by the transmission device.

[0009] According to some embodiments of the present invention, a ventilation channel is formed between the ventilation structure and the ion inlet, and the ion treatment device further includes a wind resistance component, which is disposed in the ventilation channel between the ventilation structure and the ventilation structure.

[0010] Alternatively, the ventilation structure includes a first ventilation opening and a second ventilation opening, with a ventilation channel formed between the first ventilation opening and the second ventilation opening. The ion treatment device also includes a wind resistance component, which is disposed within the ventilation channel between the ventilation structure and the ventilation structure.

[0011] According to some embodiments of the present invention, the wind resistance component is located on the first base and protrudes towards one side of the second base; and / or,

[0012] The wind resistance component is located on the second base and protrudes towards one side of the first base; and / or,

[0013] The wind resistance component is located on the heating assembly, and the portion of the wind resistance component within the accommodating space protrudes toward the side facing the first substrate.

[0014] According to some embodiments of the present invention, the ventilation channel includes a first channel and a second channel, the wind resistance component is located between the first channel and the second channel, the first channel is connected to the ventilation structure, and the second channel is connected to the ion inlet;

[0015] The charged ions are transported in the ion transport channel in a first direction, and the extension direction of the second channel is a second direction. There is an angle between the first direction and the second direction, and the angle is less than 90°.

[0016] According to some embodiments of the present invention, the first substrate includes a first sidewall, the second substrate includes a second sidewall, and the first sidewall near the ion inlet and the second sidewall near the ion outlet together form the second channel;

[0017] The distance between the first sidewall and the second sidewall forming the second channel gradually decreases toward the ion inlet.

[0018] According to some embodiments of the present invention, the connector is provided with a first adapter and a second adapter, and the second base is provided with a third adapter;

[0019] The first adapter protrudes from the connector on the side facing the first base, and the connector is detachably connected to the first base through the first adapter, and the first adapter has a ring structure.

[0020] The second adapter protrudes from the connector on the side facing the second base. The second adapter is located inside the first adapter and there is a gap between the first adapter and the second adapter. The third adapter protrudes from the second base on the side facing the connector. The third adapter is adapted to fit into the gap so that the connector and the second base are engaged in the first direction.

[0021] According to some embodiments of the present invention, the ventilation structure is formed on the second substrate and located on the outer periphery of the third adapter. The connector has an air hole that penetrates the connector in the first direction. The ventilation structure, the first channel, the second channel, and the ion inlet are sequentially connected and combined to form the ventilation channel. The air hole connects to the ventilation channel to connect the ventilation channel and the air supply device.

[0022] According to some embodiments of the present invention, a heating component is introduced, which is disposed on the second substrate near the first substrate, and the heating component has at least two heating surfaces exposed in the second channel, the heating surfaces being used to provide heat to the second channel.

[0023] According to some embodiments of the present invention, the aperture of the ion inlet is larger than the aperture of the ion outlet.

[0024] The second aspect of this utility model provides an ion processing device applied to a mass spectrometer and used to process charged ions output from the ion source of the mass spectrometer. The ion processing device includes: a first substrate, a second substrate, a connector, and a heating assembly.

[0025] The first substrate is close to the ion source and has an ion inlet, the second substrate has an ion outlet and is spaced apart from the first substrate to form an accommodating space, and at least one of the first substrate and the second substrate has a ventilation structure; and the first substrate and the second substrate are respectively connected to a power source to form an electromagnetic field between the first substrate and the second substrate.

[0026] The connector connects the first substrate and / or the second substrate and forms an ion transmission port. The ion transmission port is connected to the accommodating space through the ion outlet, so that an ion transmission channel is formed between the ion inlet and the ion transmission port. The electromagnetic field can be used to provide kinetic energy to the charged ions in the accommodating space so that the charged ions can be transmitted through the ion transmission channel.

[0027] The heating component is at least partially disposed within the accommodating space and is used to heat the medium within the accommodating space.

[0028] According to some embodiments of the present invention, a ventilation channel is formed between the ventilation structure and the ion inlet, and the ion treatment device further includes a wind resistance component, which is disposed in the ventilation channel between the ventilation structure and the ventilation structure.

[0029] Alternatively, the ventilation structure includes a first ventilation opening and a second ventilation opening, with a ventilation channel formed between the first ventilation opening and the second ventilation opening. The ion treatment device also includes a wind resistance component, which is disposed within the ventilation channel between the ventilation structure and the ventilation structure.

[0030] According to some embodiments of the present invention, the wind resistance component protrudes from the side of the first base facing the second base; and / or,

[0031] The wind resistance component protrudes from the second base on the side facing the first base; and / or...

[0032] The wind resistance component protrudes from the portion of the heating assembly located within the accommodating space and extends toward one side of the first substrate.

[0033] According to some embodiments of the present invention, the aperture of the ion inlet is larger than the aperture of the ion outlet.

[0034] Additional aspects and advantages of this invention will be set forth in part in the description which follows, and in part will be obvious from the description, or may be learned by practice of the invention. Attached Figure Description

[0035] The present invention will be further described below with reference to the accompanying drawings and embodiments, wherein:

[0036] Figure 1 This is a three-dimensional structural diagram of the mass spectrometer in an embodiment of the present invention;

[0037] Figure 2 This is a schematic diagram of the planar structure of the mass spectrometer in an embodiment of this utility model;

[0038] Figure 3 for Figure 2 A schematic diagram of the cross-sectional structure at mark AA of the mass spectrometer in the image;

[0039] Figure 4 for Figure 2 A schematic cross-sectional view of the mass spectrometer at point AA after the first matrix has been removed;

[0040] Figure 5 This is a schematic diagram of the exploded structure of the mass spectrometer in an embodiment of this utility model.

[0041] Reference numerals: 100, Ion treatment device; 110, First substrate; 111, First sidewall; 112, Connecting wall; 113, Snap-fit ​​groove; 114, Ion inlet; 115, Wind resistance component; 120, Ventilation channel; 121, First channel; 122, Second channel; 130, Second substrate; 131, Second sidewall; 132, Ion outlet; 133, Ventilation structure; 134, Third adapter; 135, Fourth adapter; 140, Connector; 141, Ion transmission port; 142, First adapter; 143, Snap-fit; 144, Second adapter; 145, Vent; 146, Sealing ring; 147, Settling tank; 148, Positioning column; 150, Heating assembly; 151, Heating ring; 152, Heating wire; 153, Heating connector; 154, Fixing component. Detailed Implementation

[0042] The embodiments of this utility model are described in detail below. Examples of these embodiments are shown in the accompanying drawings, wherein the same or similar reference numerals denote the same or similar elements or elements having the same or similar functions throughout. The embodiments described below with reference to the accompanying drawings are exemplary and are only used to explain this utility model, and should not be construed as limiting this utility model.

[0043] In the description of this utility model, it should be understood that the directional descriptions, such as up, down, front, back, left, right, etc., indicate the directional or positional relationship based on the directional or positional relationship shown in the accompanying drawings. They are only for the convenience of describing this utility model and simplifying the description, and do not indicate or imply that the device or element referred to must have a specific orientation, or be constructed and operated in a specific orientation. Therefore, they should not be construed as limitations on this utility model.

[0044] In the description of this utility model, "several" means one or more, "multiple" means two or more, "greater than," "less than," and "exceeding" are understood to exclude the stated number, while "above," "below," and "within" are understood to include the stated number. The use of "first" and "second" in the description is merely for distinguishing technical features and should not be construed as indicating or implying relative importance, or implicitly indicating the number of indicated technical features, or implicitly indicating the order of the indicated technical features.

[0045] In the description of this utility model, unless otherwise explicitly defined, terms such as "setting," "installation," and "connection" should be interpreted broadly, and those skilled in the art can reasonably determine the specific meaning of the above terms in this utility model in conjunction with the specific content of the technical solution.

[0046] In the description of this utility model, the terms "one embodiment," "some embodiments," "illustrative embodiment," "example," "specific example," or "some examples," etc., refer to specific features, structures, materials, or characteristics described in connection with that embodiment or example, which are included in at least one embodiment or example of this utility model. In this specification, the illustrative expressions of the above terms do not necessarily refer to the same embodiment or example. Furthermore, the specific features, structures, materials, or characteristics described may be combined in any suitable manner in one or more embodiments or examples.

[0047] Please see Figure 3 , Figure 4 The first aspect of this invention provides a mass spectrometer, which includes an ion source, an ion processing device 100, a transmission device, and a detection device. The ion processing device 100 is disposed at the output end of the ion source, and the transmission device is disposed at the output end of the ion transmission device. The transmission device forms at least one transmission channel for transmitting charged ions processed by the ion processing device 100. The ion source decomposes the sample to be detected into charged ion clusters. These charged ion clusters are prone to adhering to solvents or other media, and may contain cluster ions that affect detection stability. The ion processing device 100 removes the media from the generated charged ion clusters before transmitting them to the transmission device. After transmission, the charged ion clusters are analyzed by the detection device to generate a mass spectrum. The ion processing device 100 improves the stability of the detection device's analysis of charged ion clusters within the mass spectrometer.

[0048] Ion sources are used to generate charged ions. These ion sources can be electrospray ion sources, electron bombardment ion sources, or chemical ion sources, etc.

[0049] The ion processing device 100 includes a first substrate 110, a second substrate 130, a connector 140, and a heating assembly 150. The first substrate 110 is close to the ion source and has an ion inlet 114. The second substrate 130 has an ion outlet 132. The first substrate 110 and the second substrate 130 are respectively connected to a power source to form an electromagnetic field between the first substrate 110 and the second substrate 130. The connector 140 connects the first substrate 110 and / or the second substrate 130 and has an ion transmission port 141. The ion transmission port 141 is connected to the accommodating space through the ion outlet 132 to form an ion transmission channel between the ion inlet 114 and the ion transmission port 141. The electromagnetic field can be used to provide kinetic energy to the charged ions in the accommodating space so that the charged ions can be transmitted through the ion transmission channel. The heating assembly 150 is at least partially disposed in the accommodating space and is used to heat the medium in the accommodating space to evaporate the medium to facilitate the separation of charged ions from the medium.

[0050] The charged ion clusters generated by the ion source contain cluster ions that can affect the analysis of the detection device. Since the cluster ions move relatively slowly in the electromagnetic field compared to other charged ions, the charged ion clusters are separated from the cluster ions under the influence of the electromagnetic field during their movement within the ion transport channel, thereby reducing the impact of the cluster ions on the analysis of the detection device.

[0051] The voltage applied to the first substrate 110 can be between 520V and 540V, and the voltage applied to the second substrate 130 can be between 190V and 210V. The voltage can also be set according to actual needs.

[0052] The first substrate 110 and the second substrate 130 are spaced apart to form a accommodating space. At least one of the first substrate 110 and the second substrate 130 has a ventilation structure 133. Gas is introduced into the accommodating space through the ventilation structure 133 to generate an airflow, so as to blow the solution attached to the charged ion clusters to the outside of the accommodating space, thereby reducing the solution attached to the charged ion clusters.

[0053] In some embodiments of this application, the aperture of the ion inlet 114 is larger than the aperture of the ion outlet 132. Since the detection device inside the mass spectrometer needs to operate in a high vacuum environment, reducing the aperture of the ion outlet 132 prevents or reduces the passage of a large amount of gas, thereby improving the stability of the mass spectrometer operation.

[0054] In some embodiments, a ventilation channel 120 is formed between the ventilation structure 133 and the ion inlet 114. Through this ventilation channel 120, the solution adhering to the charged ion clusters is blown to the ion inlet 114 and discharged outside the containment space. The ion treatment device 100 also includes a wind resistance component 115, which is disposed within the ventilation channel 120 between the ventilation structure 133 and the ion inlet 114. The wind resistance component 115 reduces the wind force generated within the ventilation channel 120, thereby reducing the impact of the wind force on the charged ion clusters.

[0055] Alternatively, the ventilation structure 133 includes a first ventilation opening and a second ventilation opening, forming a ventilation channel 120 between them. One of the first and second ventilation openings may be located on the second substrate 130, and the other on the first substrate 110. The second and first ventilation openings form the ventilation channel 120. After the charged ion clusters enter the containing space from the ion inlet 114, the airflow generated within the ventilation channel 120 discharges the solution adhering to the charged ion clusters from one of the second and first ventilation openings to the outside of the containing space. The ion treatment device 100 also includes a wind resistance component 115, which is disposed within the ventilation channel 120 between the ventilation structure 133 and the ventilation structure 133. The wind resistance component 115 reduces the airflow generated within the ventilation channel 120, thereby reducing the impact of the airflow on the charged ion clusters.

[0056] In the specific embodiments of this application, the following explanations are based on the premise that the ion inlet 114 and the ventilation structure 133 form a ventilation channel 120.

[0057] The wind resistance component 115 may be located on the first base 110 and protrude toward the side of the second base 130; or the wind resistance component 115 may also be located on the second base 130 and protrude toward the side of the first base 110; the wind resistance component 115 may also be located on the heating assembly 150, and the portion of the wind resistance component 115 located in the accommodating space protrudes toward the side of the first base 110.

[0058] The wind resistance component 115 can be installed on different structural components according to the processing conditions. It is used to block part of the wind force in the ventilation channel 120 to reduce the influence of the wind force on charged ions. In a specific embodiment of this application, the wind resistance component 115 is formed on the side of the first substrate 110 facing the second substrate 130.

[0059] Specifically, the wind resistance component 115 is a ring-shaped structure and is arranged around the outer periphery of the ion inlet 114. After the first substrate 110, the second substrate 130 and the connector 140 are assembled, there is a gap between the wind resistance component 115 and the second substrate 130 to facilitate the passage of wind through the ventilation channel 120.

[0060] In some embodiments of this application, the ventilation channel 120 includes a first channel 121 and a second channel 122. A wind resistance component 115 is located between the first channel and the second channel 122. The first channel 121 is connected to the ventilation structure 133, and the second channel 122 is connected to the ion inlet 114. The ventilation channel 120 is divided into the first channel 121 and the second channel 122 by the wind resistance component 115, so that the wind force blows the solution attached to the charged ion clusters in the second channel 122 and the wind force is reduced after entering the first channel 121, thereby reducing the impact on the charged ion clusters.

[0061] The direction of charge ion transport in the ion transport channel is the first direction, and the direction of extension of the second channel 122 is the second direction. There is an angle between the first direction and the second direction, which is less than 90°. The second channel 122 extends at an angle away from the second substrate 130, so that the airflow can be more easily blown towards the ion inlet 114 within the second channel 122, so that the solution attached to the charged ion clusters can be easily discharged from the ion inlet 114.

[0062] The first substrate 110 includes a first sidewall 111, and the second substrate 130 includes a second sidewall 131. The first sidewall 111 near the ion inlet 114 and the second sidewall 131 near the ion outlet 132 form a second channel 122. The distance between the first sidewall 111 and the second sidewall 131 forming the second channel 122 gradually decreases towards the ion inlet 114, so that wind can flow more easily towards the ion inlet 114.

[0063] In some embodiments of this application, the connector 140 is provided with a first adapter 142 and a second adapter 144, and the second base 130 is provided with a third adapter 134. The first adapter 142 protrudes from the connector 140 on the side facing the first base 110. The connector 140 is detachably connected to the first base 110 through the first adapter 142, and the first adapter 142 has a ring structure. The first base 110 includes components for connecting the first adapter 142 to the first base 110. The first adapter 142 is fitted with a connecting wall 112. The first adapter 142 is provided with a snap-fit ​​member 143. The snap-fit ​​member 143 has a spherical structure and at least a portion of the snap-fit ​​member 143 is exposed outside the first adapter 142. The connecting wall 112 has an annular structure. The inner side of the connecting wall 112 is provided with a snap-fit ​​groove 113 corresponding to the snap-fit ​​member 143. The first base 110 and the connector 140 are fitted and assembled through the snap-fit ​​member 143 and the snap-fit ​​groove 113.

[0064] The second adapter 144 protrudes from the connector 140 towards the second base 130. The second adapter 144 is located inside the first adapter 142, and a gap exists between the first adapter 142 and the second adapter 144. The third adapter 134 protrudes from the second base 130 towards the connector 140 and is adapted to fit into the gap, allowing the connector 140 and the second base 130 to engage in a first direction. The arrangement of the first adapter 142, the second adapter 144, and the third adapter 134 facilitates the mutual assembly of the first base 110, the second base 130, and the connector 140. The second base 130 and the connector 140 are also fixedly assembled using bolts.

[0065] A fourth adapter 135 is also formed on the second substrate 130. The fourth adapter 135 is formed on the side of the second substrate 130 facing the first substrate 110. The fourth adapter 135 is a ring-shaped structure and is located in the first channel 121. The fourth adapter 135 can block part of the wind force in the first channel 121 and reduce the influence of the wind force on the charged ion cluster itself.

[0066] Please see Figure 1 , Figure 2 On the side of the connector 140 away from the second substrate 130, there are also positioning posts 148 spaced apart. The positioning posts 148 are used to form a positioning connection with the main body of the mass spectrometer when the ion processing device 100 is assembled in the mass spectrometer.

[0067] In a specific embodiment of this application, a ventilation structure 133 is formed on the second substrate 130 and located on the outer periphery of the third adapter 134. A vent 145 is formed on the connector 140, penetrating the connector 140 in a first direction. The ventilation structure 133, the first channel 121, the second channel 122, and the ion inlet 114 are sequentially connected and combined to form a ventilation channel 120. The vent 145 connects to the ventilation channel 120 to connect the ventilation channel 120 and the gas supply device. A sealing ring 146 is also provided on the side of the vent 145 away from the second substrate 130. The vent 145 is used to connect to the gas supply device. The gas supply device is used to inject gas into the vent 145 to generate an airflow. The airflow blows the solution attached to the charged ion clusters out of the ion treatment device 100 along the sequence of the first channel 121, the second channel 122, and the ion inlet 114, so as to separate the charged ion clusters from the solution or other media attached to them.

[0068] Please see Figure 4 , Figure 5 In a specific embodiment of this application, the heating component 150 is disposed on the second substrate 130 near the first substrate 110, and the heating component 150 has at least two heating surfaces exposed within the second channel 122, which are used to provide heat to the second channel 122. The heating component 150 specifically includes a heating ring 151, a heating wire 152, and a fixing member 154. The heating ring 151 is a ring-shaped structure, and most of the structure of the heating ring 151 is located within the first channel 121. The heating ring 151 provides heat to the accommodating space to evaporate the solution attached to the charged ion clusters, facilitating better wind blowing away the solution or other media. The heating ring 151 also has a certain effect of blocking wind within the first channel 121.

[0069] The fixing member 154 is specifically a ring structure and is sleeved on the second base 130. The fixing member 154 is located on the side of the heating ring 151 away from the second base 130 and is used to fix and press the heating ring 151. The fixing member 154 is located at the connection between the first channel 121 and the second channel 122 to reduce the channel size at this point, reduce the wind force in the first channel 121, and thus reduce the impact on the charged ion clusters themselves.

[0070] Multiple recesses 147 are provided on the side of the connector 140 near the second substrate 130. The heating wire 152 is disposed in the recesses 147. One end of the heating wire 152 is exposed on the side of the connector 140 away from the second substrate 130, forming a heating connector 153, which is used to connect to a power source or other energy source to transfer heat. The other end of the heating wire 152 is connected to the heating ring 151 and the first substrate 110, so that the heating ring 151 and the first substrate 110 have the function of heating. Since the heating wire 152 is disposed inside the ion processing device 100 as a whole, the heating wire 152 is not prone to damage. And since the first substrate 110, the second substrate 130 and the connector 140 can be detached and connected, it is also convenient to maintain or replace the heating wire 152.

[0071] The second aspect of this application also provides an ion processing device 100, which is understood to be the same as the ion processing device 100 in the mass spectrometer of the first aspect of this application, and will not be described again here.

[0072] The embodiments of the present invention have been described in detail above with reference to the accompanying drawings. However, the present invention is not limited to the above embodiments. Within the scope of knowledge possessed by those skilled in the art, various changes can be made without departing from the spirit of the present invention. Furthermore, the embodiments of the present invention and the features thereof can be combined with each other unless otherwise specified.

Claims

1. A mass spectrometer, characterized in that, include: An ion source is used to generate charged ions; An ion processing device is disposed at the output end of an ion source. The ion processing device includes a first substrate, a second substrate, a connector, and a heating assembly. The first substrate is close to the ion source and has an ion inlet. The second substrate has an ion outlet and is spaced apart from the first substrate to form a accommodating space. At least one of the first and second substrates has a ventilation structure. The first and second substrates are respectively connected to a power source to generate an electromagnetic field between them. The connector connects the first substrate and / or the second substrate and has an ion transmission port. The ion transmission port communicates with the accommodating space through the ion outlet, forming an ion transmission channel between the ion inlet and the ion transmission port. The electromagnetic field can provide kinetic energy to the charged ions within the accommodating space, allowing the charged ions to be transmitted through the ion transmission channel. The heating assembly is used to heat the medium within the accommodating space. A transmission device is disposed on the side of the ion processing device near the connector. The transmission device has at least one transmission channel. The transmission channel is connected to the ion channel through the ion transmission port. The transmission channel is used to transmit the charged ions after being processed by the ion processing device. A detection device for analyzing the charged ions transmitted by the transmission device.

2. The mass spectrometer according to claim 1, characterized in that, A ventilation channel is formed between the ventilation structure and the ion inlet. The ion treatment device also includes a wind resistance component, which is disposed within the ventilation channel between the ventilation structure and the ion inlet. Alternatively, the ventilation structure includes a first ventilation opening and a second ventilation opening, with a ventilation channel formed between the first ventilation opening and the second ventilation opening. The ion processing device also includes a wind resistance component, which is disposed within the ventilation channel between the first ventilation opening and the second ventilation opening.

3. The mass spectrometer according to claim 2, characterized in that, The wind resistance component is located on the first base and protrudes towards one side of the second base; and / or, The wind resistance component is located on the second base and protrudes towards one side of the first base; And / or, The wind resistance component is located on the heating assembly, and the portion of the wind resistance component within the accommodating space protrudes toward the side facing the first substrate.

4. The mass spectrometer according to claim 2, characterized in that, The ventilation channel includes a first channel and a second channel, and the wind resistance component is located between the first channel and the second channel. The first channel is connected to the ventilation structure, and the second channel is connected to the ion inlet. The charged ions are transported in the ion transport channel in a first direction, and the extension direction of the second channel is a second direction. There is an angle between the first direction and the second direction, and the angle is less than 90°.

5. The mass spectrometer according to claim 4, characterized in that, The first substrate includes a first sidewall, and the second substrate includes a second sidewall. The first sidewall near the ion inlet and the second sidewall near the ion outlet together form the second channel. The distance between the first sidewall and the second sidewall forming the second channel gradually decreases toward the ion inlet.

6. The mass spectrometer according to claim 4, characterized in that, The connector is provided with a first adapter and a second adapter, and the second base is provided with a third adapter; The first adapter protrudes from the connector on the side facing the first base, and the connector is detachably connected to the first base through the first adapter, and the first adapter has a ring structure. The second adapter protrudes from the connector on the side facing the second base. The second adapter is located inside the first adapter and there is a gap between the first adapter and the second adapter. The third adapter protrudes from the second base on the side facing the connector. The third adapter is adapted to fit into the gap so that the connector and the second base are engaged in the first direction.

7. The mass spectrometer according to claim 6, characterized in that, The ventilation structure is formed on the second substrate and located on the outer periphery of the third adapter. The connector has an air hole that penetrates the connector in the first direction. The ventilation structure, the first channel, the second channel, and the ion inlet are sequentially connected and combined to form the ventilation channel. The air hole connects to the ventilation channel to connect the ventilation channel and the air supply device.

8. The mass spectrometer according to claim 6, characterized in that, A heating component is introduced, which is disposed on the second substrate near the first substrate, and the heating component has at least two heating surfaces exposed in the second channel, the heating surfaces being used to provide heat to the second channel.

9. The mass spectrometer according to any one of claims 1-8, characterized in that, The aperture of the ion inlet is larger than the aperture of the ion outlet.

10. An ion processing device, characterized in that, An ion processing device is used in a mass spectrometer to process charged ions output from the ion source of the mass spectrometer. The ion processing device includes: a first substrate, a second substrate, a connector, and a heating assembly. The first substrate is close to the ion source and has an ion inlet, the second substrate has an ion outlet and is spaced apart from the first substrate to form an accommodating space, and at least one of the first substrate and the second substrate has a ventilation structure; and the first substrate and the second substrate are respectively connected to a power source to form an electromagnetic field between the first substrate and the second substrate. The connector connects the first substrate and / or the second substrate and forms an ion transmission port. The ion transmission port is connected to the accommodating space through the ion outlet, so that an ion transmission channel is formed between the ion inlet and the ion transmission port. The electromagnetic field can be used to provide kinetic energy to the charged ions in the accommodating space so that the charged ions can be transmitted through the ion transmission channel. The heating component is at least partially disposed within the accommodating space and is used to heat the medium within the accommodating space.

11. The ion processing apparatus according to claim 10, characterized in that, A ventilation channel is formed between the ventilation structure and the ion inlet. The ion treatment device also includes a wind resistance component, which is disposed within the ventilation channel between the ventilation structure and the ventilation structure. Alternatively, the ventilation structure includes a first ventilation opening and a second ventilation opening, with a ventilation channel formed between the first ventilation opening and the second ventilation opening. The ion treatment device also includes a wind resistance component, which is disposed within the ventilation channel between the ventilation structure and the ventilation structure.

12. The ion processing apparatus according to claim 11, characterized in that, The wind resistance component protrudes from the side of the first base facing the second base; and / or... The wind resistance component protrudes from the second base on the side facing the first base; and / or... The wind resistance component protrudes from the portion of the heating assembly located within the accommodating space and extends toward one side of the first substrate.

13. The ion processing apparatus according to claim 10, characterized in that, The aperture of the ion inlet is larger than the aperture of the ion outlet.

Images