A pushing mechanism of a microwave plasma cleaning machine

Abstract

The utility model discloses a kind of pushing mechanism of microwave plasma cleaning machine, including mounting bracket, the bottom of mounting bracket is equipped with the fixed connection of material carrier, mounting bracket surface is equipped with the fixed connection of cylinder frame, cylinder frame is equipped with lifting cylinder, the piston rod of lifting cylinder is equipped with the fixed connection of lifting block, lifting block and mounting bracket surface are equipped with sliding component, lifting block side wall is equipped with the fixed connection of rack, rack one side is equipped with the meshing connection of driven gear, driven gear center is equipped with the fixed connection of rotating shaft, rotating shaft bottom is equipped with the rotation connection of first bearing seat, first bearing seat is fixed on mounting bracket surface, rotating shaft surface is also equipped with the fixed connection of swing rod, swing rod end is equipped with electric telescopic rod, the output shaft end of electric telescopic rod is equipped with grabbing clamping component.

Description

Technical Field

[0001] This utility model belongs to the field of microwave plasma cleaning machine technology, and more specifically, it relates to a material pushing mechanism for a microwave plasma cleaning machine. Background Technology

[0002] With the increasing integration of electronic circuits, the shrinking of chip feature sizes, and the research and application of new materials, the requirements for surface treatment and cleaning are becoming increasingly stringent. Plasma surface cleaning technology has become an important means to improve product reliability and yield, and is an indispensable step in the production process. In a vacuum chamber, high-energy, disordered plasma is generated under certain pressure using a radio frequency power supply. This plasma bombards the surface of the product being cleaned, achieving the cleaning purpose.

[0003] Plasma cleaning is a novel high-tech technology that utilizes plasma to clean electronic products that are difficult to clean using conventional methods, while also meeting the new process requirements of non-destructive cleaning and corrosion inhibition. Currently, plasma cleaning equipment is classified into three types based on excitation frequency: low-frequency, radio-frequency (medium-frequency), and microwave plasma cleaners. Among these, microwaves have the highest discharge frequency, the greatest gas ionization degree, extremely low self-bias voltage, low ion impact, minimal damage to devices, and do not produce ultraviolet radiation. Due to these advantages, microwave plasma is irreplaceable in certain processes.

[0004] The existing automatic feeding device of plasma cleaners has the following drawbacks: Before use, the plasma cleaner needs to be fed into the machine. Most plasma cleaners require the sealed door to be opened during feeding, and the material needs to be manually moved to the designated cleaning station. This makes the feeding process of the plasma cleaner complicated and labor-intensive, and requires improvement by the staff. Utility Model Content

[0005] To address the shortcomings of existing technologies, this invention provides a feeding mechanism for a microwave plasma cleaner, thereby resolving the problems mentioned in the background section.

[0006] To achieve the above objectives, this utility model provides the following technical solution: a feeding mechanism for a microwave plasma cleaner, comprising a mounting bracket, a fixedly connected material carrier at the bottom of the mounting bracket, a fixedly connected cylinder frame on the surface of the mounting bracket, a lifting cylinder on the cylinder frame, a fixedly connected lifting block on the piston rod of the lifting cylinder, a sliding assembly between the lifting block and the surface of the mounting bracket, a fixedly connected rack on the side wall of the lifting block, a meshing driven gear on one side of the rack, a fixedly connected rotating shaft at the center of the driven gear, a rotatably connected first bearing seat at the bottom of the rotating shaft, the first bearing seat being fixed to the surface of the mounting bracket, a fixedly connected swing rod on the surface of the rotating shaft, an electric telescopic rod at the end of the swing rod, and a gripping clamping assembly at the output shaft end of the electric telescopic rod.

[0007] Preferably, the gripping and clamping assembly includes a telescopic plate located at the end of the output shaft of the electric telescopic rod, and a first rotary clamping cylinder and a second rotary clamping cylinder located on the surface of the telescopic plate.

[0008] Preferably, the end of the rotating shaft away from the mounting bracket is provided with a second bearing seat that is rotatably connected, and the second bearing seat is fixed to the surface of the mounting bracket by a stabilizing bracket.

[0009] Preferably, the sliding assembly includes a slide rail located on the surface of the mounting bracket and a sliding block fixedly connected to the bottom of the lifting block, the sliding block being slidably connected to the slide rail.

[0010] Preferably, the rack has fixedly connected limiting blocks at both ends.

[0011] Preferably, the surface of the telescopic plate is provided with a first support rod and a second support rod that are fixedly connected, and the other end of the first support rod and the second support rod are slidably connected to the surface of the swing rod.

[0012] Preferably, the first rotary clamping cylinder and the second rotary clamping cylinder are synchronously controlled and driven, and the gripper surfaces of the first rotary clamping cylinder and the second rotary clamping cylinder are provided with anti-slip pads.

[0013] This utility model provides a feeding mechanism for a microwave plasma cleaner, which has the following advantages:

[0014] 1. The system uses a cylinder to drive a rack and pinion gear for meshing and rotation, thereby enabling bottom-up clamping and transport of the wafer loading tray. The entire process is highly automated, replacing manual handling, simplifying the feeding process, and greatly improving cleaning efficiency.

[0015] 2. It adopts an electric telescopic rod combined with a double rotary clamping cylinder structure, which can quickly and stably clamp the wafer carrier tray. It can be flexibly adjusted to different distances and angles, ensuring the safety and stability of feeding and greatly improving cleaning efficiency. Attached Figure Description

[0016] Figure 1 This is a front structural diagram of the present invention.

[0017] Figure 2 This is a side view of the structure of this utility model.

[0018] Figure 3 This is a schematic diagram of the overall structure of this utility model.

[0019] In the diagram, 1. Mounting bracket; 2. Material carrier; 3. Cylinder frame; 4. Lifting cylinder; 5. Lifting block; 6. Sliding assembly; 61. Slide rail; 62. Sliding block; 7. Rack; 8. Limiting block; 9. Driven gear; 10. Rotating shaft; 11. First bearing seat; 12. Second bearing seat; 13. Stabilizing bracket; 14. Swing rod; 15. Electric telescopic rod; 16. Gripping and clamping assembly; 1601. Telescopic plate; 1602. First rotary clamping cylinder; 1603. Second rotary clamping cylinder; 17. Anti-slip pad; 18. First support rod; 19. Second support rod. Detailed Implementation

[0020] The embodiments of this utility model will be described in further detail below with reference to the accompanying drawings and examples. The following examples are for illustrative purposes only and should not be construed as limiting the scope of this utility model.

[0021] In the description of this utility model, unless otherwise stated, "a plurality of" means two or more; the terms "upper," "lower," "left," "right," "inner," "outer," "front end," "rear end," "head," "tail," etc., indicate the orientation or positional relationship based on the orientation or positional relationship shown in the accompanying drawings, and are only for the convenience of describing this utility model and simplifying the description, and do not indicate or imply that the device or element referred to must have a specific orientation, or be constructed and operated in a specific orientation, and therefore should not be construed as a limitation of this utility model. In addition, the terms "first," "second," "third," etc., are used for descriptive purposes only and should not be construed as indicating or implying relative importance.

[0022] In the description of this utility model, it should be noted that, unless otherwise explicitly specified and limited, the terms "connected" and "linked" should be interpreted broadly. For example, they can refer to a fixed connection, a detachable connection, or an integral connection; they can refer to a mechanical connection or an electrical connection; they can refer to a direct connection or an indirect connection through an intermediate medium. Those skilled in the art can understand the specific meaning of the above terms in this utility model based on the specific circumstances.

[0023] Please see Figures 1 to 3 This utility model provides a technical solution: a feeding mechanism for a microwave plasma cleaner, including a mounting bracket 1, a material carrier 2 fixedly connected to the bottom of the mounting bracket 1, a cylinder frame 3 fixedly connected to the surface of the mounting bracket 1, a lifting cylinder 4 on the cylinder frame 3, a lifting block 5 fixedly connected to the piston rod of the lifting cylinder 4, a sliding assembly 6 between the lifting block 5 and the surface of the mounting bracket 1, the sliding assembly 6 including a slide rail 61 located on the surface of the mounting bracket 1, and a sliding block 62 fixedly connected to the bottom of the lifting block 5, the sliding block 62 being slidably connected to the slide rail 61. A rack 7 fixedly connected to the side wall of the lifting block 5, limiting blocks 8 fixedly connected to both ends of the rack 7, a driven gear 9 meshing with one side of the rack 7, a rotating shaft 10 fixedly connected to the center of the driven gear 9, a first bearing seat 11 rotatably connected to the bottom of the rotating shaft 10, the first bearing seat 11 being fixed to the surface of the mounting bracket 1, and a second bearing seat 12 rotatably connected to the end of the rotating shaft 10 away from the mounting bracket 1, the second bearing seat 12 being fixed to the surface of the mounting bracket 1 by a stabilizing bracket 13.

[0024] The rotating shaft 10 is also provided with a fixedly connected swing rod 14. An electric telescopic rod 15 is provided at the end of the swing rod 14, and a gripping clamping assembly 16 is provided at the end of the output shaft of the electric telescopic rod 15. The gripping clamping assembly 16 includes a telescopic plate 1601 located at the end of the output shaft of the electric telescopic rod 15, a first rotary clamping cylinder 1602 and a second rotary clamping cylinder 1603 located on the surface of the telescopic plate 1601. The first rotary clamping cylinder 1602 and the second rotary clamping cylinder 1603 are synchronously controlled and driven, and the gripper surfaces of the first rotary clamping cylinder 1602 and the second rotary clamping cylinder 1603 are provided with anti-slip pads 17. A first support rod 18 and a second support rod 19 are fixedly connected to the surface of the telescopic plate 1601, and the other ends of the first support rod 18 and the second support rod 19 are slidably connected to the surface of the swing rod 14.

[0025] The specific usage and function of this embodiment: The wafer products that need to be cleaned are placed on the carrier rack 2. Then, the lifting cylinder 4 drives the lifting block 5 and the rack 7 on its surface to move upward. Since the surface of the rack 7 is meshed with the driven gear 9 on one side, the driven gear 9 rotates counterclockwise, thereby driving the fixedly connected rotating shaft 10 to rotate. The swing rod 14 located on the rotating shaft 10 rotates together. After the swing rod 14 drives the gripping and clamping assembly 16 at the head to the designated surface of the carrier rack 2, the gripping position of the gripping and clamping assembly 16 is flexibly adjusted by the electric telescopic rod 15 according to the actual gripping requirements. The first and second rotary clamping cylinders 1602 and 1603 on the surface of the telescopic plate 1601 operate, adjusting the angle. Pneumatic grippers on both sides clamp the wafer tray on the surface of the carrier rack 2. Then, the lifting cylinder 4 retracts its piston rod, causing the rack 7 to move downwards, resulting in the clockwise rotation of the driven gear 9. This causes the swing rod 14, the gripping and clamping assembly 16, and the wafer tray to rotate upwards. After reaching the designated cleaning station, the first and second rotary clamping cylinders 1602 and 1603 release the pneumatic grippers, completing the feeding process at the cleaning station. The entire process is simple to operate and convenient to use, enabling rapid and stable transport of large batches of wafers. It boasts a high degree of automation, reduces manual handling, and significantly improves cleaning efficiency.

[0026] The above description is only a preferred embodiment of the present utility model, but the protection scope of the present utility model is not limited thereto. Any equivalent substitutions or changes made by those skilled in the art within the technical scope disclosed in the present utility model, based on the technical solution and the inventive concept of the present utility model, should be included within the protection scope of the present utility model.

Claims

1. A pushing mechanism of a microwave plasma cleaning machine, comprising a mounting bracket (1), characterized in that: The bottom of the mounting bracket (1) is provided with a fixedly connected material rack (2), the surface of the mounting bracket (1) is provided with a fixedly connected cylinder frame (3), the cylinder frame (3) is provided with a lifting cylinder (4), the piston rod of the lifting cylinder (4) is provided with a fixedly connected lifting block (5), the lifting block (5) and the surface of the mounting bracket (1) are provided with a sliding assembly (6), the side wall of the lifting block (5) is provided with a fixedly connected rack (7), one side of the rack (7) is provided with a meshing driven gear (9), the center of the driven gear (9) is provided with a fixedly connected rotating shaft (10), the bottom of the rotating shaft (10) is provided with a rotatingly connected first bearing seat (11), the first bearing seat (11) is fixed to the surface of the mounting bracket (1), the surface of the rotating shaft (10) is also provided with a fixedly connected swing rod (14), the end of the swing rod (14) is provided with an electric telescopic rod (15), the end of the output shaft of the electric telescopic rod (15) is provided with a gripping clamping assembly (16).

2. The pusher mechanism of a microwave plasma cleaning machine according to claim 1, wherein: The gripping and clamping assembly (16) includes a telescopic plate (1601) located at the end of the output shaft of the electric telescopic rod (15), a first rotary clamping cylinder (1602) and a second rotary clamping cylinder (1603) located on the surface of the telescopic plate (1601).

3. The feeding mechanism of a microwave plasma cleaner according to claim 1, characterized in that: The rotating shaft (10) has a second bearing seat (12) rotatably connected at the end away from the mounting bracket (1). The second bearing seat (12) is fixed to the surface of the mounting bracket (1) by a stabilizing bracket (13).

4. The feeding mechanism of a microwave plasma cleaner according to claim 1, characterized in that: The sliding assembly (6) includes a slide rail (61) located on the surface of the mounting bracket (1) and a sliding block (62) fixedly connected to the bottom of the lifting block (5), wherein the sliding block (62) is slidably connected to the slide rail (61).

5. The feeding mechanism of a microwave plasma cleaner according to claim 1, characterized in that: The rack (7) is provided with fixedly connected limiting blocks (8) at both ends.

6. The feeding mechanism of a microwave plasma cleaner according to claim 1, characterized in that: The surface of the telescopic plate (1601) is provided with a first support rod (18) and a second support rod (19) that are fixedly connected. The other ends of the first support rod (18) and the second support rod (19) are slidably connected to the surface of the swing rod (14).

7. The feeding mechanism of a microwave plasma cleaner according to claim 2, characterized in that: The first rotary clamping cylinder (1602) and the second rotary clamping cylinder (1603) are synchronously controlled and driven, and the gripper surfaces of the first rotary clamping cylinder (1602) and the second rotary clamping cylinder (1603) are provided with anti-slip pads (17).

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