Vacuum coating machine for increasing deposition rate

By employing a complex oscillating evaporation source and a rotatable substrate design, combined with a gas distributor, the problems of low deposition rate and uneven deposition in vacuum coating machines have been solved, achieving efficient and uniform coating results and improving production efficiency and product quality.

CN224378174UActive Publication Date: 2026-06-19DONGGUAN TIANCHUANG NANO TECHNOLOGY CO LTD
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Patent Information

Authority / Receiving Office
CN · China
Patent Type
Utility models(China)
Current Assignee / Owner
DONGGUAN TIANCHUANG NANO TECHNOLOGY CO LTD
Filing Date
2025-07-09
Publication Date
2026-06-19

AI Technical Summary

Technical Problem

Existing vacuum coating machines have a low deposition rate during the coating process, resulting in low production efficiency and increased production costs. Furthermore, the coating material is deposited unevenly on the substrate surface, making it difficult to meet the requirements of high-efficiency and high-quality production.

Method used

By employing a complex oscillating evaporation source and a rotatable substrate stage design, combined with a gas distributor and uniform gas injection holes, the coating environment is optimized to achieve complex oscillation of the evaporation source and uniform gas distribution, ensuring uniform deposition of coating materials on the substrate surface.

Benefits of technology

It improves the deposition rate and quality of coating materials, reduces the number of coating cycles, increases production efficiency, reduces production costs, and enhances product competitiveness.

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Abstract

This application relates to the field of vacuum coating technology and discloses a vacuum coating machine for improving deposition rate. The machine includes a body, a vacuum tank mounted on the outer wall of the body, a top cover hinged to the top edge of the vacuum tank, a swaying disk inside the vacuum tank, an evaporation source mounted on the bottom outer wall of the swaying disk, and a swaying mechanism mounted on the bottom outer wall of the top cover to drive the swaying disk to perform complex swaying. The swaying mechanism includes a connecting frame fixedly connected to the bottom outer wall of the top cover. In this invention, the swaying mechanism allows the evaporation source to sway in a complex manner. Combined with a rotatable substrate, this changes the traditional equipment's fixed or single-movement evaporation source. The complex swaying of the evaporation source makes the coating material more evenly distributed, ensuring full contact between all parts of the substrate and the material, avoiding uneven deposition, reducing the number of coating passes, and improving production efficiency. Compared to traditional equipment, this method can improve production efficiency and reduce costs.
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