Cylindrical magnetron sputtering cathode for vacuum coating equipment

Abstract

The utility model relates to vacuum coating equipment technical field discloses a kind of cylindrical magnetron coating sputtering cathode for vacuum coating equipment, including mounting disc, the mounting disc top is provided with connecting mechanism, the connecting mechanism top is fixedly connected with fixed frame, the fixed frame inside is equipped with driving assembly, and the mounting disc bottom is equipped with target material;The connecting mechanism includes insulation component and sealing assembly, the insulation component includes mounting ring, the mounting ring is fixedly connected in the fixed frame bottom, and the mounting ring outside is fixedly connected with insulation ring three.The utility model in, by setting multilevel insulation structure, significantly improve the electrical safety and stability under high pressure working environment, avoid the phenomenon of spark and arc due to insulation failure, sealing assembly ensures still can maintain reliable electrical isolation performance under the coexistence of high voltage and high vacuum working condition, prolongs equipment service life and improves operating reliability.

Description

Technical Field

[0001] This utility model relates to the field of vacuum coating equipment technology, and in particular to a cylindrical magnetron sputtering cathode for vacuum coating equipment. Background Technology

[0002] Vacuum coating equipment, as a core piece of equipment in high-end manufacturing, uses physical and chemical vapor deposition technology to prepare nanoscale thin films in a vacuum environment. Its applications have penetrated strategic industries such as semiconductors (chip metallization), new energy (photovoltaic cell electrodes), and consumer electronics (mobile phone lens coating).

[0003] Cylindrical magnetron sputtering cathodes are core components of vacuum coating equipment, widely used in optics, electronics, and decorative industries. In a high-vacuum environment, a high-voltage electric field is applied to ionize the working gas (usually argon) to form plasma. Under the influence of the electric field, positively charged argon ions are accelerated and bombard the cylindrical target (cathode), sputtering target atoms or molecules from the surface through momentum exchange. These sputtered target particles travel with a certain energy towards the product and deposit on its surface to form the desired functional thin film.

[0004] However, the insulation of traditional cylindrical magnetron sputtering cathodes fails under high-voltage conditions, leading to arcing and leakage, which poses safety hazards. Furthermore, the vacuum sealing structure is simple and prone to micro-leakage, affecting the purity of the coating. The target material and structural components have poor surface wear resistance and short service life, requiring frequent replacement and increasing costs. Therefore, a cylindrical magnetron sputtering cathode for vacuum coating equipment is proposed to solve the above problems. Utility Model Content

[0005] To overcome the above shortcomings, this utility model provides a cylindrical magnetron sputtering cathode for vacuum coating equipment, aiming to improve the problems of poor insulation and sealing, low stability, poor surface wear resistance and short service life in the prior art.

[0006] To achieve the above objectives, the present invention adopts the following technical solution:

[0007] A cylindrical magnetron sputtering cathode for vacuum coating equipment includes a mounting disk, a connecting mechanism on the top of the mounting disk, a fixed frame fixedly connected to the top of the connecting mechanism, a driving component installed inside the fixed frame, and a target material installed at the bottom of the mounting disk.

[0008] The connecting mechanism includes an insulating component and a sealing component. The insulating component includes a mounting ring, which is fixedly connected to the bottom of the fixed frame. An insulating ring three is fixedly connected to the outside of the mounting ring and is located between the mounting ring and the fixed frame. An insulating ring four is fixedly connected to the outside of the mounting ring and is located between the mounting plate and the mounting ring. A fixed ring block is fixedly connected to the top of the mounting plate, and an insulating block five is fixedly connected between the fixed ring block and the mounting ring.

[0009] As a further description of the above technical solution:

[0010] The sealing assembly includes a fixing tube fixedly connected to the top of the mounting ring, the target material located inside the fixing tube, two bearings installed between the fixing tube and the target material, a sealing block provided between the two bearings, and a double-layer sealing ring fixedly connected inside the mounting ring, the double-layer sealing ring located between the target material and the mounting ring;

[0011] As a further description of the above technical solution:

[0012] The drive assembly includes a motor, which is fixedly connected to the top of the fixed frame. A gear one is fixedly connected to the output end of the motor. A connecting pipe is fixedly connected inside the fixed frame and is located inside the target material. A gear two is fixedly connected to the top of the target material and meshes with the gear one.

[0013] As a further description of the above technical solution:

[0014] A water inlet pipe is fixedly connected to the top of the connecting pipe, and a water outlet pipe is fixedly connected to one side of the connecting pipe.

[0015] As a further description of the above technical solution:

[0016] An insulating ring two is fixedly connected to the outside of the target material, and the gear two is fixedly connected to the outside of the insulating ring two;

[0017] As a further description of the above technical solution:

[0018] A sealing ring is provided at the bottom of the fourth insulating ring, and the sealing ring is located between the mounting plate and the fourth insulating ring;

[0019] As a further description of the above technical solution:

[0020] A sealing ring 2 is provided between the mounting ring and the insulating ring 4;

[0021] As a further description of the above technical solution:

[0022] The mounting plate has multiple mounting holes in the middle, and an insulating ring is fixedly connected between the fixing frame and the connecting pipe.

[0023] This utility model has the following beneficial effects:

[0024] 1. In this utility model, by setting up a multi-level insulation structure, the electrical safety and stability under high-voltage working environment are significantly improved; insulating ring three and insulating ring four are respectively set between the mounting ring and the fixed frame and mounting plate, and in conjunction with the insulating block five and the coordinated layout of insulating ring one and insulating ring two, a comprehensive and three-dimensional insulation barrier is formed, which effectively blocks the leakage path of high-voltage current along the surface of the structural components and avoids arcing and electric arcing caused by insulation failure.

[0025] 2. In this utility model, the sealing component design ensures reliable electrical isolation performance under conditions of high voltage and high vacuum, extending the service life of the equipment and improving operational reliability. The fixed tube and the target material are dynamically sealed through a double-layer sealing ring and a sealing block located between the bearings, effectively preventing leakage of cooling medium and intrusion of external gas into the vacuum chamber. This not only enhances the overall sealing reliability of the structure but also ensures the stability of the vacuum environment during long-term operation, thereby improving the purity and uniformity of the coating and meeting the stringent requirements of high-end coating processes for a clean vacuum environment. Attached Figure Description

[0026] Figure 1 This is a three-dimensional schematic diagram of a cylindrical magnetron sputtering cathode for vacuum coating equipment proposed in this utility model;

[0027] Figure 2 A cross-sectional view of the driving assembly for a cylindrical magnetron sputtering cathode used in a vacuum coating equipment according to this utility model;

[0028] Figure 3 This is a schematic diagram of the structure of the fixing tube for a cylindrical magnetron sputtering cathode in a vacuum coating equipment according to the present invention.

[0029] Figure 4 This is a cross-sectional view of the connection mechanism for a cylindrical magnetron sputtering cathode used in a vacuum coating equipment according to the present invention.

[0030] Legend:

[0031] 1. Mounting plate; 2. Fixing frame; 3. Target material; 4. Mounting hole; 5. Connecting pipe; 6. Motor; 7. Inlet pipe; 8. Outlet pipe; 9. Gear 1; 10. Gear 2; 11. Insulating ring 1; 12. Insulating ring 2; 13. Mounting ring; 14. Insulating ring 3; 15. Insulating ring 4; 16. Fixing pipe; 17. Sealing block; 18. Double sealing ring; 19. Bearing; 20. Insulating block 5; 21. Fixing ring block; 22. Sealing ring 1; 23. Sealing ring 2. Detailed Implementation

[0032] The technical solutions of the present utility model will be clearly and completely described below with reference to the accompanying drawings of the embodiments. Obviously, the described embodiments are only some embodiments of the present utility model, and not all embodiments. Based on the embodiments of the present utility model, all other embodiments obtained by those of ordinary skill in the art without creative effort are within the protection scope of the present utility model.

[0033] Reference Figure 1 , Figure 3 and Figure 4 An embodiment of this utility model is provided: a cylindrical magnetron sputtering cathode for vacuum coating equipment, including a mounting disk 1, a connecting mechanism on the top of the mounting disk 1, a fixed frame 2 fixedly connected to the top of the connecting mechanism, a driving component installed inside the fixed frame 2, and a target material 3 installed at the bottom of the mounting disk 1. The mounting disk 1 serves as the load-bearing and connecting base of the entire cathode structure, not only for fixing the target material 3, but also for achieving a stable assembly with the fixed frame 2 through the connecting mechanism on its top, ensuring the structural stability of the equipment when it is running in the vacuum chamber;

[0034] The connection mechanism includes an insulating component and a sealing component. The insulating component includes a mounting ring 13, which is fixedly connected to the bottom of the fixed frame 2. An insulating ring 3 14 is fixedly connected to the outside of the mounting ring 13. The insulating ring 3 14 is located between the mounting ring 13 and the fixed frame 2 and prevents electrical conduction between the fixed frame 2 and the mounting ring 13. An insulating ring 4 15 is fixedly connected to the outside of the mounting ring 13 and is located between the mounting plate 1 and the mounting ring 13. The insulating ring 4 15 isolates the mounting plate 1 from the mounting ring 13. A fixed ring block 21 is fixedly connected to the top of the mounting plate 1. An insulating block 5 20 is fixedly connected between the fixed ring block 21 and the mounting ring 13 and provides an additional insulating barrier in the radial direction. The three insulating rings work together to significantly improve the insulation reliability under high voltage conditions and avoid arcing and leakage. An insulating ring 12 is fixedly connected to the outside of the target material 3. Gear 10 is fixedly connected to the outside of the insulating ring 12. The insulating ring 12 ensures electrical isolation between the drive transmission system and the high-voltage target material 3. The insulation component adopts a multi-point, multi-faceted composite insulation design. By setting multiple insulating components at key electrical paths and structural connections, the conduction path of the high-voltage electric field along the metal structure is effectively blocked. Multiple mounting holes 4 are opened in the middle of the mounting plate 1. The multiple mounting holes 4 are evenly distributed in the middle of the mounting plate 1, which facilitates the use of bolts or other fasteners to firmly install it on the vacuum chamber wall or support structure, improving the overall assembly accuracy and seismic performance. An insulating ring 11 is fixedly connected between the fixed frame 2 and the connecting pipe 5. The fixed frame 2 provides installation space and support for the drive component, and at the same time works with the connecting mechanism to realize the transmission and distribution of force.

[0035] Reference Figure 1 and Figure 4The sealing assembly includes a fixed tube 16, which is fixedly connected to the top of the mounting ring 13. The target material 3 is located inside the fixed tube 16. Two bearings 19 are installed between the fixed tube 16 and the target material 3. A sealing block 17 is provided between the two bearings 19. In order to support the rotation of the target material 3 and maintain a seal during rotation, two bearings 19 are configured between the fixed tube 16 and the target material 3, and the sealing block 17 between the bearings 19 effectively prevents the leakage of cooling medium or other substances along the axial direction of the target material 3, ensuring reliable isolation between the rotating part and the static part. A double-layer sealing ring 18 is fixedly connected inside the mounting ring 13, and the double-layer sealing ring 18 is located between the target material 3 and the mounting ring 13. The double-layer sealing ring 18 provides additional sealing protection, ensuring good airtightness even in high vacuum environments. A sealing ring 22 is provided at the bottom of the insulating ring 15. The sealing ring 22 is located between the mounting plate 1 and the insulating ring 15 and is used to seal the contact surface between the two to prevent external air from seeping into the vacuum chamber. A sealing ring 23 is provided between the mounting ring 13 and the insulating ring 15. At the same time, the sealing ring 23 further enhances the sealing of the connection, ensuring that all possible leakage paths are effectively sealed, thereby ensuring the vacuum level of the entire system, improving the coating quality and the stability of equipment operation.

[0036] Reference Figures 1-4 The drive assembly includes a motor 6, which is fixedly connected to the top of the fixed frame 2. A gear 9 is fixedly connected to the output end of the motor 6. A connecting pipe 5 is fixedly connected inside the fixed frame 2, located within the target material 3. A gear 10 is fixedly connected to the top of the target material 3, meshing with gear 9. The drive structure achieves the rotation of the target material 3 through gear transmission. The motor 6 drives gear 9, which in turn drives gear 10 and the target material 3 fixed thereto, resulting in uniform etching of the target material 3 and improved utilization. A water inlet pipe 7 is fixedly connected to the top of the connecting pipe 5, and a water outlet pipe 8 is fixedly connected to one side of the connecting pipe 5. The connecting pipe 5 serves as a cooling medium channel. Cooling water enters through the water inlet pipe 7, flows through the interior of the connecting pipe 5, absorbs the heat generated by the target material 3 during operation, and is discharged through the water outlet pipe 8, achieving efficient cooling, preventing overheating, deformation, or damage to the target material 3, and ensuring stable sputtering process.

[0037] Working Principle: First, the entire cathode device is fixed to the cavity wall of the vacuum coating equipment through multiple mounting holes 4 in the middle of the mounting plate 1, ensuring structural stability. After the vacuum environment is established and the process requirements are met, the drive assembly is started. The motor 6 located at the top of the fixed frame 2 is powered on and runs. The output end of the motor 6 drives the gear 9 to rotate. The gear 9 meshes with the gear 10 fixed outside the target 3, thereby transmitting power to the target 3 and driving the target 3 to rotate continuously around its central axis. This makes the etching of the target 3 surface by the plasma more uniform, improving the utilization rate of the target 3 and the uniformity of the coating. At the same time, cooling water is injected from the water inlet pipe 7 at the top of the connecting pipe 5, flows through the inside of the connecting pipe 5, absorbs a large amount of heat generated by the ion bombardment of the target 3 during sputtering, and then is discharged from the water outlet pipe 8 on the side wall of the connecting pipe 5, achieving efficient forced cooling of the target 3.

[0038] Secondly, to ensure the safe, stable, and efficient operation of this process, the insulation and sealing components in the connection mechanism play a crucial role. The insulation components, by incorporating insulating parts at multiple key locations—including insulating ring three 14 between the fixed frame 2 and the mounting ring 13, insulating ring four 15 between the mounting plate 1 and the mounting ring 13, insulating block five 20 between the fixed ring block 21 and the mounting ring 13, insulating ring two 12 outside the target material 3, and insulating ring one 11 between the fixed frame 2 and the connecting pipe 5—create a comprehensive insulation barrier. This blocks the leakage path of high-voltage electricity to non-working components such as the motor 6 and the fixed frame 2, preventing sparking, arcing, and leakage, thus ensuring the safety of the equipment and operators.

[0039] The sealing assembly ensures the integrity of the vacuum environment. The fixed tube 16 and the rotating target 3 are supported by two bearings 19, and a sealing block 17 is placed between the bearings 19 to form a reliable dynamic seal, preventing cooling water leakage into the vacuum chamber. The double-layer sealing ring 18 is located between the target 3 and the mounting ring 13, providing a static seal to further prevent gas leakage. The sealing ring 22 between the mounting plate 1 and the insulating ring 15, and the sealing ring 23 between the mounting ring 13 and the insulating ring 15, together constitute a multi-stage sealing system, effectively eliminating possible micro-leakage at the joint surfaces of various structures, maintaining a high vacuum in the cavity, and ensuring the purity and quality of the coating.

[0040] Finally, it should be noted that the above description is only a preferred embodiment of the present utility model and is not intended to limit the present utility model. Although the present utility model has been described in detail with reference to the foregoing embodiments, those skilled in the art can still modify the technical solutions described in the foregoing embodiments or make equivalent substitutions for some of the technical features. Any modifications, equivalent substitutions, improvements, etc., made within the spirit and principles of the present utility model should be included within the protection scope of the present utility model.

Claims

1. A cylindrical magnetron sputtering cathode for vacuum coating equipment, comprising a mounting disk (1), characterized in that: The mounting plate (1) is provided with a connecting mechanism at the top, and a fixed frame (2) is fixedly connected to the top of the connecting mechanism. A driving component is installed inside the fixed frame (2), and a target material (3) is installed at the bottom of the mounting plate (1). The connecting mechanism includes an insulating component and a sealing component. The insulating component includes a mounting ring (13), which is fixedly connected to the bottom of the fixed frame (2). An insulating ring three (14) is fixedly connected to the outside of the mounting ring (13). The insulating ring three (14) is located between the mounting ring (13) and the fixed frame (2). An insulating ring four (15) is fixedly connected to the outside of the mounting ring (13). The insulating ring four (15) is located between the mounting plate (1) and the mounting ring (13). A fixed ring block (21) is fixedly connected to the top of the mounting plate (1). An insulating block five (20) is fixedly connected between the fixed ring block (21) and the mounting ring (13).

2. The cylindrical magnetron sputtering cathode for vacuum coating equipment according to claim 1, characterized in that: The sealing assembly includes a fixing tube (16) which is fixedly connected to the top of the mounting ring (13). The target material (3) is located inside the fixing tube (16). Two bearings (19) are installed between the fixing tube (16) and the target material (3). A sealing block (17) is provided between the two bearings (19). A double-layer sealing ring (18) is fixedly connected inside the mounting ring (13). The double-layer sealing ring (18) is located between the target material (3) and the mounting ring (13).

3. The cylindrical magnetron sputtering cathode for vacuum coating equipment according to claim 1, characterized in that: The drive assembly includes a motor (6), which is fixedly connected to the top of the fixed frame (2). A gear (9) is fixedly connected to the output end of the motor (6). A connecting pipe (5) is fixedly connected inside the fixed frame (2). The connecting pipe (5) is located inside the target material (3). A gear (10) is fixedly connected to the top of the target material (3). The gear (10) meshes with the gear (9).

4. A cylindrical magnetron sputtering cathode for vacuum coating equipment according to claim 3, characterized in that: The top of the connecting pipe (5) is fixedly connected to a water inlet pipe (7), and the side of the connecting pipe (5) is fixedly connected to a water outlet pipe (8).

5. A cylindrical magnetron sputtering cathode for vacuum coating equipment according to claim 3, characterized in that: An insulating ring (12) is fixedly connected to the outside of the target material (3), and the gear (10) is fixedly connected to the outside of the insulating ring (12).

6. A cylindrical magnetron sputtering cathode for vacuum coating equipment according to claim 2, characterized in that: A sealing ring (22) is provided at the bottom of the insulating ring four (15), and the sealing ring one (22) is located between the mounting plate (1) and the insulating ring four (15).

7. A cylindrical magnetron sputtering cathode for vacuum coating equipment according to claim 1, characterized in that: A sealing ring 23 is provided between the mounting ring (13) and the insulating ring 4 (15).

8. A cylindrical magnetron sputtering cathode for vacuum coating equipment according to claim 3, characterized in that: The mounting plate (1) has multiple mounting holes (4) in the middle, and an insulating ring (11) is fixedly connected between the fixing frame (2) and the connecting pipe (5).

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