An annular flow equalizing gas ring for an ald-cvd apparatus

Abstract

The utility model relates to a kind of annular current-sharing gas distribution rings for ALD-CVD equipment, including ring body, gas passage is formed in ring body, gas passage is formed with multiple interval settings gas outlet hole towards ring body inner circumferential surface, ring body outer circumferential surface is formed with gas inlet, gas inlet and gas passage are interconnected, gas outlet hole is farther from gas inlet aperture is larger, the aperture of multiple gas outlet holes changes with the change of distance from gas inlet, the aperture of gas outlet hole is farther from gas inlet, its aperture is larger, ensure that the gas output of each gas outlet hole is consistent after a period of time after gas inlet gas inlet, ensure that the gas injected is distributed uniformly along cavity 360 ° annular, the design can effectively avoid the local concentration of gas in cavity too high or too low phenomenon, so that the generation and chemical reaction of plasma are more consistent, significantly improve the film uniformity of 8 inch and above large area substrate.

Description

Technical Field

[0001] This utility model belongs to the technical field of thin film deposition equipment, specifically relating to an annular flow equalization gas distribution ring for ALD-CVD equipment. Background Technology

[0002] Atomic Layer Deposition (ALD) and Chemical Vapor Deposition (CVD) are both thin film deposition techniques based on gas-phase reactions, widely used in semiconductors, optoelectronic devices, solar cells, and display technologies. ALD achieves atomically precise thin film thickness control through alternating and self-limiting surface reaction processes, while CVD grows thin films through chemical reactions of gaseous precursors on the substrate surface. With the rapid development of the semiconductor and optoelectronic industries, higher demands are being placed on the uniformity and process efficiency of high-quality thin film deposition on large-size substrates.

[0003] In existing thin film deposition equipment, the gas distribution ring (gas inlet device) is used to uniformly inject the reactant gas or precursor gas into the resonant cavity through annularly distributed micropores or slits. Microwave energy excites the reactant gas to form plasma. However, the existing gas distribution ring (gas inlet device) results in uneven plasma distribution due to the uneven injection of reactant gas into the chamber from the gas pores, which leads to poor thin film deposition or failure. In view of this, this solution was developed. Utility Model Content

[0004] In view of the shortcomings of the prior art, the technical problem to be solved by this utility model is to provide an annular flow equalization gas distribution ring for ALD-CVD equipment, which can uniformly inject gas into the resonant waveguide cavity.

[0005] To solve the above-mentioned technical problems, the technical solution adopted by this utility model is: an annular flow equalization and gas distribution ring for ALD-CVD equipment, including a ring body, an air channel extending circumferentially within the ring body, a plurality of spaced air outlets opening in the air channel toward the inner circumferential surface of the ring body, and at least one air inlet on the outer circumferential surface of the ring body communicating with the air channel, wherein the diameter of the air outlet gradually increases with the arc distance to the nearest air inlet.

[0006] Furthermore, the diameter of the air outlet is 0.2mm-5mm.

[0007] Furthermore, the diameter of the air outlet is 0.5mm-3mm.

[0008] Furthermore, the number of air outlets is 10–200 and they are arranged at equal intervals or angles along the circumference.

[0009] Furthermore, the diameter of adjacent air outlets increases by 0.1mm-1mm.

[0010] Furthermore, the width of the airway is 2mm-20mm.

[0011] Furthermore, the width of the airway is 4mm-12mm.

[0012] Furthermore, the total area of ​​the plurality of air outlets accounts for 3%-40% of the total circumferential area of ​​the airway inner diameter.

[0013] Furthermore, the axis of each vent has an inclination angle of 0–30° relative to the radial direction of the ring.

[0014] Furthermore, the ring body is coaxially provided with two or more annular air passages, each of which is connected through an independent air intake interface or is connected together through the same air intake interface.

[0015] Compared with the prior art, the present invention has the following beneficial effects:

[0016] In this invention, an air passage is set inside the ring body, and multiple air outlets are formed on the inward side of the air passage. The diameter of the multiple air outlets varies with the distance from the air inlet. The larger the diameter of the air outlet, the farther away from the air inlet. This ensures that after air is introduced into the air inlet for a period of time, the air output of each air outlet is consistent, and the injected gas is evenly distributed in the 360° circumferential direction of the cavity. This design can effectively avoid the phenomenon of excessively high or low local concentration of gas in the cavity, thereby making the generation of plasma and chemical reaction more consistent and significantly improving the film uniformity of 8-inch and larger large-area substrates. Attached Figure Description

[0017] Figure 1 This is a cross-sectional view of a ring-shaped gas distribution ring for ALD-CVD equipment installed in a thin film deposition device according to the present invention.

[0018] Figure 2 This is a three-dimensional structural diagram of an annular flow equalization and gas distribution ring for ALD-CVD equipment according to the present invention;

[0019] Figure 3 This is a cross-sectional view of an annular flow equalization and gas distribution ring for an ALD-CVD equipment according to the present invention.

[0020] The markings in the diagram are: 1. Ring body; 11. Air passage; 12. Air outlet; 13. Air inlet; 14. Air outlet; 15. First annular sealing groove. Detailed Implementation

[0021] To make the above-mentioned features and advantages of this utility model more apparent and understandable, specific embodiments are described below in conjunction with the accompanying drawings for detailed explanation.

[0022] like Figures 1-3 As shown, this embodiment provides an annular flow equalization and gas distribution ring for an ALD-CVD equipment, including a ring body 1.

[0023] In this embodiment, the ring body 1 is made of aluminum (aluminum alloy / 304 / 316L, electropolished Ra≤0.8 μm, anodized or nickel plated, etc.). An air passage 11 is formed inside the ring body 1. The air passage 11 is an annular air passage. The width of the air passage 11 is 2mm-20mm, and a more preferred range is 4mm-12mm. In this embodiment, the width of the air passage 11 is 4mm.

[0024] The air passage 11 has multiple spaced air outlets 12 forming on its inner circumferential surface facing the ring body 1. The axis of each air outlet has an inclination angle of 0–30° relative to the radial direction of the ring body, which can be adjusted adaptively according to actual conditions. The total area of ​​the multiple air outlets 12 accounts for 3%–40% of the total area of ​​the inner circumferential surface of the air passage 11, and is adjusted adaptively according to the number and diameter of the outlets. Specifically, the number of air outlets ranges from 10 to 200; in this embodiment, there are 10 air outlets 12. The diameter of the air outlets 12 is 0.2 mm–5 mm, with a preferred range of 0.5 mm–3 mm. The diameter of adjacent air outlets 12 increases by 0.1 mm–1 mm.

[0025] An air inlet 13 and an air outlet 14 are formed on the outer circumferential surface of the ring body 1. In this embodiment, there are 10 air outlets 12, one of which is directly opposite the air inlet 13. The diameter of this air outlet 12 is 0.5 mm, the diameter of the farthest air outlet 12 is 3 mm, and the diameter of adjacent air outlets 12 differs by 0.5 mm. Other equivalent linear or piecewise linearly increasing combinations can also achieve flow equalization.

[0026] A first annular sealing groove 15 is formed on the upper surface of the ring body 1. Specifically, the first annular sealing groove 15 is an O-shaped sealing groove. Preferably, a second annular sealing groove can also be provided on the lower surface of the ring body 1. The second annular sealing groove is an O-shaped sealing groove. The first annular sealing groove 15 and the second annular sealing groove are used to seal and connect with the upper and lower connecting parts.

[0027] Another implementation: There are two air intake ports 13, which are arranged opposite each other. Taking the number of air outlets 12 as an example, the two opposite air outlets 12 are respectively facing the two air intake ports 13. The diameter of the two air outlets 12 facing the air intake ports 13 is 0.5mm, and the diameter of the farthest air outlet 12 (the one farthest from the air intake port 13) is 1.5mm. The diameter of adjacent air outlets 12 differs by 0.5mm.

[0028] It is worth mentioning that the number of air passages 11 in this solution can also be set according to the actual situation. When there are multiple air passages 11, each air passage 11 can be independently injected with air through an independent air inlet 13, or multiple air passages 11 can be jointly injected with air through the same air inlet 13.

[0029] The foregoing has shown and described the basic principles and main features of this invention, as well as its advantages. Those skilled in the art should understand that this invention is not limited to the above embodiments. The embodiments and descriptions in the specification are merely illustrative of the principles of this invention. Various changes and modifications can be made to this invention without departing from its spirit and scope. All such changes and modifications fall within the scope of this invention as defined by the appended claims and their equivalents.

Claims

1. A ring-shaped gas equalization ring for ALD-CVD equipment, characterized in that, The device includes a ring body, within which an air passage extends circumferentially. The air passage has multiple spaced air outlets on its inner circumferential surface. The outer circumferential surface of the ring body has at least one air inlet that communicates with the air passage. The diameter of the air outlet gradually increases with the arc length distance from the nearest air inlet.

2. The annular flow equalization and gas distribution ring for ALD-CVD equipment according to claim 1, characterized in that, The diameter of the air outlet is 0.2mm-5mm.

3. The annular flow equalization and gas distribution ring for ALD-CVD equipment according to claim 2, characterized in that, The diameter of the air outlet is 0.5mm-3mm.

4. The annular flow equalization and gas distribution ring for ALD-CVD equipment according to claim 1, characterized in that, The number of air vents is 10–200, and they are arranged at equal intervals or angles along the circumference.

5. A ring-shaped gas equalization ring for an ALD-CVD equipment according to claim 2 or 3, characterized in that, The diameter of adjacent air outlets increases by 0.1mm-1mm.

6. The annular flow equalization and gas distribution ring for ALD-CVD equipment according to claim 1, characterized in that, The width of the airway is 2mm-20mm.

7. The annular flow equalization and gas distribution ring for ALD-CVD equipment according to claim 6, characterized in that, The width of the airway is 4mm-12mm.

8. The annular flow equalization and gas distribution ring for ALD-CVD equipment according to claim 1, characterized in that, The total area of ​​the multiple air outlets accounts for 3%-40% of the total circumferential area of ​​the airway inner diameter.

9. A ring-shaped gas equalization ring for an ALD-CVD equipment according to claim 1, characterized in that, The axis of each of the air outlets has an inclination angle of 0–30° relative to the radial direction of the ring body.

10. A ring-shaped gas equalization ring for an ALD-CVD equipment according to claim 1, characterized in that, The ring body is provided with two or more annular air passages on the same axis, and each air passage is connected through an independent air intake interface or is connected through the same air intake interface.

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