A device for removing hydrogen peroxide in ultrapure water and an ultrapure water purification system

Abstract

This application relates to the field of hydrogen peroxide removal technology, and particularly to an apparatus for removing hydrogen peroxide from ultrapure water and an ultrapure water purification system. The apparatus includes a tank and a gas guide, a catalyst resin layer, and an inert resin layer disposed within the tank. The tank includes an inlet and an outlet, with the inlet located at the bottom and the outlet at the top. The outlet of the gas guide is connected to the outlet, and the gas guide is used to filter solid particles in the ultrapure water while allowing gas to pass through. The inert resin layer fills the upper space within the tank, and the gas guide is embedded within the inert resin layer. The catalyst resin layer catalyzes the decomposition of hydrogen peroxide; the catalyst resin layer is located below the inert resin layer, and the density of the catalyst resin in the catalyst resin layer is greater than the density of the inert resin in the inert resin layer. This apparatus adopts an upflow operation mode, which can effectively improve the catalytic effect and reaction rate of the catalyst resin, thereby increasing the hydrogen peroxide removal efficiency.

Description

Technical Field

[0001] This application relates to the field of hydrogen peroxide removal technology, and in particular to an apparatus for removing hydrogen peroxide from ultrapure water and an ultrapure water purification system. Background Technology

[0002] With the development of the electronics and semiconductor industries, ultrapure water plays an increasingly important role in the manufacturing process. The quality of ultrapure water directly affects the manufacturing yield of semiconductor devices. Especially after semiconductors have entered advanced processes, as process linewidths shrink, some trace components that were previously thought not to affect manufacturing yield, such as reactive oxides, have become key factors affecting manufacturing yield.

[0003] Among reactive oxides, hydrogen peroxide (H2O2) is one of the most representative substances. In the preparation of ultrapure water, hydrogen peroxide, as a secondary contaminant, has a particularly significant impact on the degradation and damage of materials in downstream ultrapure water processing units. Especially in the back-end processes of semiconductor manufacturing, scanning probe microscopy has revealed the channel corrosion phenomenon caused by this secondary oxide on the wafer surface. In view of this, the 2021 edition of the International Roadmap for Devices and Systems (IRDS) specifies that the concentration of H2O2 in cleaning water used in 300mm wafer manufacturing should not exceed 3 ppb.

[0004] Effectively removing hydrogen peroxide from ultrapure water is a challenging technical problem. This is mainly due to two difficulties: first, hydrogen peroxide has a long half-life and does not readily decompose; second, while removing trace amounts (ppb level) of hydrogen peroxide from ultrapure water, it is crucial to avoid introducing new, difficult-to-remove, or excessively costly trace contaminants. Only technical solutions that meet these conditions can be considered suitable and practical. Utility Model Content

[0005] This application discloses an apparatus for removing hydrogen peroxide from ultrapure water and an ultrapure water purification system, which can effectively remove hydrogen peroxide from ultrapure water without introducing other contaminants.

[0006] To achieve the above objectives, this application provides the following technical solution:

[0007] In a first aspect, this application provides an apparatus for removing hydrogen peroxide from ultrapure water. The apparatus includes a tank and a gas guide, a catalyst resin layer, and an inert resin layer disposed within the tank. The tank includes an inlet and an outlet, with the inlet located at the bottom and the outlet at the top. The outlet of the gas guide is connected to the outlet, and the gas guide is used to filter solid particles in the ultrapure water while allowing gas to pass through. The inert resin layer fills the upper space within the tank, and the gas guide is embedded within the inert resin layer. The catalyst resin layer catalyzes the decomposition of hydrogen peroxide. The catalyst resin layer is located below the inert resin layer, and the density of the catalyst resin in the catalyst resin layer is greater than the density of the inert resin in the inert resin layer.

[0008] In this application, the removal of hydrogen peroxide from ultrapure water adopts an upflow operation mode, with the inlet located at the bottom of the tank and the outlet at the top, allowing pure water to flow from bottom to top. Since the catalyst resin layer is located below the inert resin layer, and the density of the catalyst resin is greater than that of the inert resin, the catalyst resin layer is lifted by the water flow as the pure water flows upward, squeezing the inert resin layer into the upper space of the tank. Simultaneously, the catalyst resin layer is in a free-floating state under the pressure of the inert resin layer, ensuring a uniform flow distribution. This effectively avoids flow deviation and short-circuiting of the catalyst resin layer, thereby reducing the risk of violent reactions in localized areas of the catalyst resin layer and minimizing the concentrated release and escape of oxygen in these areas.

[0009] Hydrogen peroxide in pure water is catalytically decomposed by the catalyst resin, and the resulting oxygen rises and is discharged through the gas guide. Because the direction of oxygen accumulation and escape is the same as the direction of water flow, the oxygen is carried out by the water flow in the same direction and along the same path to the outside of the tank. Compared with the downward flow of pure water, the device in this application avoids the disadvantage of oxygen being partially retained in the tank due to the reverse impact of the water flow. Moreover, after the inert resin is lifted by the water flow, it fills the upper space of the tank, thereby squeezing the space for oxygen accumulation and storage, thus promoting the oxygen to be discharged from the tank through the gas guide. In addition, after being blocked by the inert resin, the catalyst resin cannot come into contact with the oxygen gathered near the gas guide, effectively reducing the inhibitory effect of oxygen on the catalyst in the catalyst resin layer.

[0010] Furthermore, the gas guide is located at the top of the tank and fits against the inner top wall of the tank. The gas guide includes multiple filter holes, and the top of the side wall of the gas guide is provided with filter holes.

[0011] Furthermore, the pore size of the filter is smaller than the particle size of the inert resin and the catalyst resin.

[0012] Furthermore, the gas guide includes at least one of a screen tube and a water cap plate.

[0013] Furthermore, the catalyst resin layer includes an anion resin and a noble metal catalyst supported on the anion resin.

[0014] Furthermore, the inert resin layer comprises inert resin particles with oxidation resistance.

[0015] Furthermore, the device for removing hydrogen peroxide from ultrapure water also includes a lower water distributor, the inlet of which is connected to the water inlet.

[0016] Furthermore, the device for removing hydrogen peroxide from ultrapure water also includes an inlet pipe and an inlet valve. The inlet pipe is connected to the inlet, and the inlet valve is located on the inlet pipe or between the inlet pipe and the inlet. A lower water distributor evenly distributes the incoming water flow to prevent intense localized catalytic reactions in the catalytic resin layer from causing concentrated oxygen release and escape.

[0017] Furthermore, the device for removing hydrogen peroxide from ultrapure water also includes an outlet pipe and an outlet valve. The outlet pipe is connected to the outlet, and the outlet valve is located on the outlet pipe or between the outlet pipe and the outlet.

[0018] Secondly, this application provides an ultrapure water purification system, which includes the apparatus for removing hydrogen peroxide from ultrapure water as described in the first aspect. Attached Figure Description

[0019] Figure 1 This is a schematic diagram of the structure of an apparatus for removing hydrogen peroxide from ultrapure water according to an embodiment of this application;

[0020] Figure 2 This is a schematic diagram of the structure of a gas guide device according to an embodiment of this application.

[0021] Reference numerals: 100-Tank body; 200-Gas guide; 300-Catalyst resin layer; 400-Inert resin layer; 500-Lower water distributor; 600-Inlet pipe; 700-Inlet valve; 800-Outlet pipe; 900-Outlet valve;

[0022] 01-Inlet; 02-Outlet; 03-Filter hole. Detailed Implementation

[0023] To make the objectives, technical solutions, and advantages of this application clearer, the application will be further described in detail below with reference to the accompanying drawings. Obviously, the described embodiments are only some embodiments of this application, and not all embodiments. Based on the embodiments in this application, all other embodiments obtained by those skilled in the art without creative effort are within the scope of protection of this application.

[0024] The application scenarios described in this application are for the purpose of more clearly illustrating the technical solutions of this application, and do not constitute a limitation on the technical solutions provided in this application. Those skilled in the art will understand that with the emergence of new application scenarios, the technical solutions provided in this application are also applicable to similar technical problems. In the description of this application, unless otherwise stated, "multiple" means two or more.

[0025] With the development of the electronics and semiconductor industries, ultrapure water plays an increasingly important role in the manufacturing process. The quality of ultrapure water directly affects the manufacturing yield of semiconductor devices. Especially after semiconductors have entered advanced processes, as process linewidths shrink, some trace components that were previously thought not to affect manufacturing yield, such as reactive oxides, have become key factors affecting manufacturing yield.

[0026] Among reactive oxides, hydrogen peroxide (H2O2) is one of the most representative substances. In the preparation of ultrapure water, hydrogen peroxide, as a secondary contaminant, has a particularly significant impact on the degradation and damage of materials in downstream ultrapure water processing units. Especially in the back-end processes of semiconductor manufacturing, scanning probe microscopy has revealed the channel corrosion phenomenon caused by this secondary oxide on the wafer surface. In view of this, the 2021 edition of the International Roadmap for Devices and Systems (IRDS) specifies that the concentration of H2O2 in cleaning water used in 300mm wafer manufacturing should not exceed 3 ppb.

[0027] Effectively removing hydrogen peroxide from ultrapure water is a challenging technical problem. This is mainly due to two difficulties: first, hydrogen peroxide has a long half-life and does not readily decompose; second, while removing trace amounts (ppb level) of hydrogen peroxide from ultrapure water, it is crucial to avoid introducing new, difficult-to-remove, or excessively costly trace contaminants. Only technical solutions that meet these conditions can be considered suitable and practical.

[0028] Currently, there are many technical solutions for removing trace amounts of hydrogen peroxide from ultrapure water, but the main technical solution that has been proven effective in practice is the catalytic decomposition of hydrogen peroxide using an anion exchange resin loaded with noble metals (platinum, palladium, zirconium, etc.).

[0029] The reason why noble metal catalyst anion exchange resins (hereinafter referred to as catalyst resins) have become the mainstream technology in the industry is mainly due to the following two reasons: First, the alkaline conditions formed by anion exchange resins can effectively promote the decomposition of hydrogen peroxide. Second, noble metal catalysts can effectively catalyze the decomposition of hydrogen peroxide without introducing new pollutants.

[0030] However, with the continuous promotion and application of catalyst resins in practice, some drawbacks have gradually emerged, mainly in the following aspects:

[0031] 1. Noble metal catalysts are easily contaminated by organic matter, which can lead to premature degradation of their catalytic ability. Primary organic matter and secondary organic matter produced by ultraviolet (UV) decomposition, such as organic acids, can both cause contamination and degradation of the catalytic ability of noble metal catalysts.

[0032] 2. Noble metal catalysts are prone to surface oxidation, which can lead to premature degradation of their catalytic activity. Ozone, hydroxyl radicals, hydrogen peroxide, and oxygen can all cause surface oxidation and deterioration of the catalytic activity of noble metal catalysts.

[0033] 3. Advanced semiconductor manufacturing processes are highly sensitive to H2O2, with stringent requirements. The standard for cleaning water used in 300mm wafer manufacturing is an H2O2 concentration of less than or equal to 3 ppb. In many ultrapure water systems, catalyst resins exhibit H2O2 exceeding the limit after only two or three months of use.

[0034] 3. If the precious metal catalyst deteriorates prematurely, or if the H2O2 level in the ultrapure water exceeds the standard prematurely, the replacement frequency of the precious metal catalyst increases. Because precious metal catalysts are expensive, the cost of producing ultrapure water also increases accordingly.

[0035] 4. Catalytic resins whose catalytic performance has deteriorated usually require offline performance restoration. This process is time-consuming, labor-intensive, and costly.

[0036] In view of this, this application provides an apparatus for removing hydrogen peroxide from ultrapure water. Figure 1 This is a schematic diagram of a device for removing hydrogen peroxide from ultrapure water according to an embodiment of this application. Please refer to... Figure 1 The device for removing hydrogen peroxide from ultrapure water includes a tank 100 and a gas guide 200, a catalyst resin layer 300, and an inert resin layer 400 disposed within the tank 100. The tank 100 includes an inlet 01 and an outlet 02, with the inlet 01 located at the bottom and the outlet 02 at the top. The outlet of the gas guide 200 is connected to the outlet 02, and the gas guide 200 is used to filter solid particles in the ultrapure water while allowing gas to pass through. The inert resin layer 400 fills the upper space within the tank 100, and the gas guide 200 is embedded within the inert resin layer 400. The catalyst resin layer 300 catalyzes the decomposition of hydrogen peroxide. The catalyst resin layer 300 is located below the inert resin layer 400, and the density of the catalyst resin in the catalyst resin layer 300 is greater than the density of the inert resin in the inert resin layer 400.

[0037] In some embodiments of this application, the catalyst resin layer 300 includes an anion resin and a noble metal catalyst supported on the anion resin. The noble metal catalyst includes palladium (Pd), platinum (Pt), rhodium (Rh), gold (Au), etc.

[0038] Understandably, catalytic anion resins loaded with noble metal catalysts are used to accelerate the decomposition of H2O2, and their chemical reaction formula is as follows:

[0039] 2H₂O₂=2H₂O+O₂----------(Chemical Reaction Equation 1)

[0040] Furthermore, the device in this application can also remove other trace oxidizing substances from ultrapure water, such as ozone (O3) and hydroxyl radicals (·OH). Specific details are as follows:

[0041] ·OH is extremely unstable and will rapidly transform into H₂O₂. The specific chemical reaction formula is as follows:

[0042] 2·OH=H₂O₂----------(Chemical Reaction Equation 2)

[0043] O3 decomposes rapidly in water. This decomposition process is autocatalytic and includes the following steps:

[0044] B1. Adsorption and dissociation: O3 adsorbs in water and dissociates into ozone ions (O3+). - );

[0045] B2. Ionic reaction: Ozone ions (O3) - It reacts with water molecules (H2O) to produce ·OH and oxygen molecules (O2);

[0046] B3. Autocatalytic reaction: ·OH reacts with O3 to produce O2 and ·OH. This autocatalytic reaction is the key step in the entire process, enabling the continuous generation and consumption of ·OH in ozone water;

[0047] B4. Taking into account the autocatalytic reaction of O3 in water and the conversion reaction of ·OH (see reaction formula 2), the decomposition reaction of ozone in high-purity water is mainly as follows.

[0048] O3 + H2O = H2O2 + O2 ----------(Chemical reaction equation 3)

[0049] In summary, the device in this application can remove not only H2O2, but also O3 and ·OH. However, the device in this application focuses on removing hydrogen peroxide because O3 and ·OH in ultrapure water are also converted into H2O2. Therefore, it is relatively reasonable to focus on removing H2O2 to remove trace oxidizing substances in ultrapure water.

[0050] The tank 100 includes an inlet 01 and an outlet 02. The inlet 01 is located at the bottom of the tank 100, and the outlet 02 is located at the top of the tank 100, so that pure water flows from bottom to top. The direction of water flow is consistent with the direction of O2 escape and accumulation D1, which allows O2 to be quickly and timely discharged from the gas guide 200 to the outside of the tank 100 with the water flow, avoiding O2 accumulation in the upper area inside the tank 100.

[0051] Furthermore, the inlet 01 is located at the bottom of the tank 100. Inlet 01 is the area with the highest H2O2 concentration and the lowest O2 concentration within the tank 100. As the water flows upwards, the H2O2 concentration gradually decreases while the O2 concentration gradually increases under the catalytic action of the catalyst. In the initial stage of water flow, the extremely low O2 concentration does not inhibit the H2O2 decomposition reaction, and the oxidation effect of O2 on the catalyst surface is also weak. The unoxidized catalyst promotes the rapid decomposition of H2O2; therefore, the risk of H2O2 oxidizing the catalyst surface is extremely low.

[0052] In existing hydrogen peroxide removal devices, water flows from top to bottom, with the water inlet at the top of tank 100. The generated oxygen will rise and accumulate, resulting in the highest hydrogen peroxide concentration at the water inlet. After being catalyzed by the catalyst resin, the H2O2 concentration gradually decreases until the H2O2 concentration at the bottom outlet of tank 100 reaches its lowest point.

[0053] The O2 produced by catalysis (see chemical reaction formula 3) flows downwards with the water until it exits the tank at 100°C. However, as the catalytic reaction proceeds, the produced O2 gradually accumulates and increases along the downward direction of the water flow. According to Henry's Law, the tendency for O2 to escape also gradually strengthens. The higher the concentration of H2O2 in the influent, the higher the concentration of O2 produced, and the stronger the tendency for O2 to escape. According to chemical reaction formula 3, H2O2 with a concentration of 34 ppb decomposes to produce O2 with a concentration of 16 ppb, meaning that the amount of O2 produced is close to half that of H2O2. Under the alkaline conditions formed by the anion resin, H2O2 is rapidly decomposed by the strong catalysis of the catalyst resin. The extremely fast reaction rate also strengthens the tendency for O2 to escape.

[0054] Due to the extremely rapid catalytic reaction, high flow rates are typically used in catalyst resin beds. In a downflow mode, high flow rates easily lead to flow deviation and short-circuiting, resulting in uneven water distribution and causing intense reactions in localized catalyst resin areas, leading to concentrated release of localized O2. This occasional localized O2 escape is unavoidable. The escaped O2 may be micrometer-sized or millimeter-sized, generally consisting of extremely fine bubbles. Some of the escaped O2 bubbles are carried away by the downward-flowing water and exit the tank 100 through the outlet. The remaining escaped O2 bubbles inevitably rise against the water flow, gradually accumulating at the top of the tank 100 near the inlet. This upward movement of O2 bubbles against the water flow is particularly likely to occur in areas with low Reynolds numbers, such as near the tank wall, or in areas with slow water flow and vortex zones caused by flow deviation and short-circuiting. Furthermore, since the outlet is at the bottom of the tank 100, the O2 accumulated near the water inlet cannot be released from the top and gradually accumulates there, extending downwards into the space it occupies. Overall, the aggregation of O2 bubbles gradually increases from bottom to top, exactly in the opposite direction of water flow.

[0055] The high O2 concentration near the top water inlet inhibits the decomposition of H2O2, shifting the chemical equilibrium of chemical reaction 3 to the left. This results in a decreased effectiveness of H2O2 removal near the water inlet. Accumulated O2 causes catalyst surface oxidation and catalytic degradation, gradually leading to a loss of catalytic activity. This phenomenon gradually spreads from the top to the bottom of tank 100. The oxidation and degradation of the catalyst surface prevent the effective and rapid decomposition and removal of H2O2 near the top water inlet, further contributing to catalyst surface oxidation and catalytic degradation. Since H2O2 is a stronger oxidizing agent than O2, the oxidation and degradation of catalyst performance caused by H2O2 are more severe.

[0056] In the device for removing hydrogen peroxide from ultrapure water according to this application, the upper space of the tank 100 is filled with inert resin and covers the top outflow space. One function of this is to form a top pressure layer, preventing the catalyst resin layer 300 from becoming disordered and helping the floating bed achieve automatic adjustment, avoiding flow deviation and short-circuiting. Another function is to maximize the space within the tank 100 near and above the gas guide 200, minimizing the space for O2 accumulation in this area, thereby forcing O2 to flow upwards from the gas guide 200 with the water flow, preventing O2 accumulation in the upper space of the tank 100. Even if a very small amount of O2 accumulates in the gaps of the inert resin, it will not have an adverse effect because it is in contact with the inert resin rather than the catalyst resin.

[0057] In some embodiments of this application, the gas guide 200 is disposed on the top of the tank 100 and fits against the inner top wall of the tank 100, thereby occupying as much of the upper space inside the tank 100 as possible, thereby reducing the space for O2 to accumulate in this area.

[0058] The gas guide 200 includes multiple filter holes 03, which allow gas to pass through. The top of the side wall of the gas guide 200 is provided with filter holes 03, so that O2 rising to the top area inside the tank 100 can be discharged in time through the filter holes 03, reducing or avoiding the probability of O2 accumulating in this area.

[0059] In some embodiments of this application, the pore size of the filter hole 03 is smaller than the particle size of the inert resin and the catalyst resin, so that the inert resin and the catalyst resin cannot pass through the filter hole 03, thereby avoiding waste caused by the inert resin or the catalyst resin being discharged from the tank 100 with the water flow.

[0060] It is understood that the shape of the filter hole 03 is not limited in this application; the shape of the filter hole 03 can be circular, triangular, or strip-shaped, etc. For example, the filter hole 03 can be a slit. Figure 2 This is a schematic diagram of the structure of a gas guide device according to an embodiment of this application, as shown below. Figure 2 The gas guide 200 has multiple filter holes 03 arranged along the height direction of the tank 100 on its side wall. The filter holes 03 are slits. The height of the slits is smaller than the particle size of the inert resin and the catalyst resin, so that the inert resin and the catalyst resin cannot be discharged from the tank 100 through the slits.

[0061] In some embodiments of this application, the gas guide 200 includes at least one of a screen tube and a water cap plate. For example, Figure 1 and Figure 2 As shown, the gas guide 200 can be a screen tube, and the side wall of the screen tube is provided with a plurality of slits arranged along the height direction of the tank 100.

[0062] In addition, in large-volume water systems, the gas guide 200 can be used as a water cap plate, resulting in more even water distribution, better performance, and fewer dead zones.

[0063] In some embodiments of this application, the inert resin layer 400 comprises inert resin particles with oxidation resistance. Oxidation-resistant resin particles are stable in oxidizing environments and are not easily oxidized, thereby extending their service life.

[0064] In some embodiments of this application, the device for removing hydrogen peroxide from ultrapure water further includes a lower water distributor 500, the inlet of which is connected to the water inlet 01. The function of the lower water distributor 500 is to ensure that the incoming water flows more evenly into the tank 100, preventing the concentrated release of oxygen caused by the violent local catalytic reaction of the catalyst resin layer 300.

[0065] Among them, the lower water distributor 500 can be a lower screen pipe, etc.

[0066] In some embodiments of this application, the apparatus for removing hydrogen peroxide from ultrapure water further includes an inlet pipe 600 and an inlet valve 700. The inlet pipe 600 is connected to the inlet port 01, and the inlet valve 700 is disposed on the inlet pipe 600 or between the inlet pipe 600 and the inlet port 01. The inlet valve 700 can be fully opened or closed to allow or prevent water from flowing into the tank 100, thereby controlling the operation and shutdown of the entire system.

[0067] In some embodiments of this application, the apparatus for removing hydrogen peroxide from ultrapure water further includes an outlet pipe 800 and an outlet valve 900. The outlet pipe 800 is connected to the outlet 02, and the outlet valve 900 is disposed on the outlet pipe 800 or between the outlet pipe 800 and the outlet 02. The outlet valve 900 can be fully opened or closed to allow or prevent water from flowing out of the tank 100.

[0068] Based on the same technical concept, this application also provides an ultrapure water purification system, which includes the apparatus for removing hydrogen peroxide from ultrapure water in various possible embodiments of this application.

[0069] Because the ultrapure water purification system includes the apparatus for removing hydrogen peroxide from ultrapure water as described in this application, it also has the following beneficial effects:

[0070] 1) By adopting an upflow process, the direction of water flow is aligned with the direction of O2 escape and accumulation, which allows O2 to be quickly and timely discharged from the gas guide to the outside of the tank with the water flow, thereby avoiding the accumulation of O2 in the top area of ​​the tank and causing adverse effects.

[0071] 2) It can avoid and mitigate reaction inhibition and catalytic performance degradation. Using an upflow process, the inlet is located at the bottom of the tank, a point where H2O2 concentration is high and O2 concentration is low. As the water flows upward, the H2O2 concentration decreases while the O2 concentration increases. In the initial stage of water entry, the extremely low O2 concentration will not inhibit the H2O2 decomposition reaction, and the oxidation effect of O2 on the catalyst surface is also extremely low. The unoxidized catalyst promotes the rapid decomposition of H2O2; therefore, the risk of H2O2 surface oxidation on the catalyst is also extremely low. As explained above, conventional technical routes experience a vicious cycle of catalyst surface oxidation and catalytic performance degradation at the water inlet, but the upflow process avoids this vicious cycle due to the lack of such conditions. This significantly mitigates the inhibition of the H2O2 decomposition reaction at the water inlet from the source and avoids the rapid occurrence of catalyst surface oxidation and catalytic performance degradation at the water inlet location.

[0072] 3) It can increase the contact area between the catalyst and H2O2 on the surface of the catalyst resin, thereby improving the catalytic effect. In the prior art, the catalyst resins are compressed and crowded together due to gravity and the downward flow of water, and the contact surfaces between the catalyst resins encroach on each other, eroding the contact area between the catalyst and H2O2. The upflow process used in this application allows the catalyst resin to be in a free-floating state, similar to a fluidized state, so that the catalyst and H2O2 can come into more complete contact, thereby better improving the catalytic effect and reaction rate;

[0073] 4) It can improve and reduce operating head loss and energy consumption. In the upflow process, the catalyst resin is in a free-floating state in the water, resulting in lower resistance as the water flows through the free-floating resin layer. This is significantly different from the downflow process, where the water encounters greater resistance as it flows through a compacted resin layer. According to engineering experience, under the same conditions, the pressure loss in the upflow process is approximately 30% lower than that in the downflow process. For example, with DuPont's AmberTec UP4000Pd OH resin at 22 degrees Celsius, the pressure loss of the resin bed is approximately 2 bar / m in the downflow process at a flow rate of 150 m / h, while the pressure loss in the upflow process is less than 1.4 bar / m, demonstrating a significant energy-saving effect.

[0074] 5) It can increase the operating flow rate, reduce the size of the resin tank, and reduce the amount of catalyst resin used. Using an upflow process, a higher operating flow rate can be achieved under the same pressure loss. According to engineering experience, under the same pressure loss, the flow rate of the upflow process is approximately twice that of the downflow process. Based on this, the cross-sectional area of ​​the resin tank in the upflow process can be reduced by about 50%, the tank diameter by about 30%, and the resin loading amount by about 50%. Since catalyst resins carrying precious metal catalysts are expensive, reducing the resin tank diameter and the amount of catalyst resin significantly reduces the equipment cost.

[0075] The above are merely specific embodiments of this application, but the scope of protection of this application is not limited thereto. Any variations or substitutions that can be easily conceived by those skilled in the art within the scope of the technology disclosed in this application should be included within the scope of protection of this application. Therefore, the scope of protection of this application should be determined by the scope of the claims.

Claims

1. An apparatus for removing hydrogen peroxide from ultrapure water, characterized in that, It includes a tank body and a gas guide, a catalyst resin layer, and an inert resin layer disposed within the tank body; The tank includes an inlet and an outlet, with the inlet located at the bottom of the tank and the outlet located at the top of the tank. The outlet of the gas guide is connected to the water outlet, and the gas guide is used to filter solid particles in ultrapure water while allowing gas to pass through; The inert resin layer fills the upper space of the tank, and the gas guide is embedded in the inert resin layer. The catalyst resin layer is used to catalyze the decomposition of hydrogen peroxide. The catalyst resin layer is located below the inert resin layer, and the density of the catalyst resin in the catalyst resin layer is greater than the density of the inert resin in the inert resin layer.

2. The apparatus for removing hydrogen peroxide from ultrapure water according to claim 1, characterized in that, The gas guide is located at the top of the tank and fits against the inner top wall of the tank. The gas guide includes multiple filter holes, and the filter holes are provided at the top of the side wall of the gas guide.

3. The apparatus for removing hydrogen peroxide from ultrapure water according to claim 2, characterized in that, The pore size of the filter is smaller than the particle size of the inert resin and the catalyst resin.

4. The apparatus for removing hydrogen peroxide from ultrapure water according to claim 3, characterized in that, The gas guide includes at least one of a screen tube and a water cap plate.

5. The apparatus for removing hydrogen peroxide from ultrapure water according to any one of claims 1-4, characterized in that, The catalyst resin layer includes an anion resin and a noble metal catalyst supported on the anion resin.

6. The apparatus for removing hydrogen peroxide from ultrapure water according to any one of claims 1-4, characterized in that, The inert resin layer comprises inert resin particles with oxidation resistance.

7. The apparatus for removing hydrogen peroxide from ultrapure water according to any one of claims 1-4, characterized in that, The device for removing hydrogen peroxide from ultrapure water also includes a lower water distributor, the inlet of which is connected to the water inlet.

8. The apparatus for removing hydrogen peroxide from ultrapure water according to claim 7, characterized in that, The device for removing hydrogen peroxide from ultrapure water further includes an inlet pipe and an inlet valve. The inlet pipe is connected to the inlet, and the inlet valve is located on the inlet pipe or between the inlet pipe and the inlet.

9. The apparatus for removing hydrogen peroxide from ultrapure water according to claim 7, characterized in that, The device for removing hydrogen peroxide from ultrapure water further includes an outlet pipe and an outlet valve. The outlet pipe is connected to the outlet, and the outlet valve is located on the outlet pipe or between the outlet pipe and the outlet.

10. A purification system for ultrapure water, characterized in that, Includes the apparatus for removing hydrogen peroxide from ultrapure water as described in any one of claims 1-9.

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