Magnetron sputtering machine table convenient to disassemble

Abstract

This utility model proposes a magnetron sputtering machine that is easy to assemble and disassemble, including a sputtering process chamber, a gate valve device, a water cooling device, and a support device. First mounting columns are provided at both ends below the sputtering process chamber. A gate valve device is located between the sputtering process chamber and the water cooling device. A second mounting column is located at the midpoint below the gate valve device, ensuring uniform stress distribution. The triangular support layout formed by the two first and second mounting columns balances the stress on the equipment, facilitating transportation of the magnetron sputtering machine while reducing the risk of stress concentration and improving structural stability. The integrated gate plate reinforcing rib and L-shaped support rod design improve deformation resistance and effectively absorb operational vibrations. A buffer section is also provided in the middle of the first support platform near the sputtering process chamber to prevent collisions between the sputtering process chamber and the first support platform. The buffer section is also equipped with a flexible anti-collision material to further prevent hard damage caused by collisions between the sputtering process chamber and the first support platform.

Description

Technical Field

[0001] This utility model relates to the field of sputtering coating technology, and more specifically, to a magnetron sputtering machine that is easy to assemble and disassemble. Background Technology

[0002] High vacuum technology studies the techniques for creating and maintaining a vacuum environment, and it is of great significance to scientific experiments, materials preparation, and electronic device manufacturing. Improving the installation efficiency of metal vacuum chambers and external piping helps achieve higher levels of vacuum. The manufacture of metal vacuum chambers involves various metal material processing techniques, such as casting, forging, and machining. Improving these processes can enhance the processing efficiency and quality of metal vacuum chambers, and ensuring the vacuum level of the metal vacuum chamber requires reliable vacuum sealing technology.

[0003] The patent closest to the existing technology, patent application number: 202422397907.8, discloses a short-pommel support for a sputtering coating machine. It includes a support body, at least three short-pommel support rods are provided on the upper side of one side of the support body, and a support screw is provided on the upper part of the short-pommel support rods. The top of the support screw is detachably connected to the vacuum cavity to be connected. The at least three short-pommel support rods ensure the stability of the connection to the vacuum cavity. The top of the short-pommel support rod is provided with an oblong groove, and the support screw is provided in the oblong groove. The support screw is detachably connected to the oblong groove through an adjusting component. By adjusting the adjusting component, the support screw can slide or rise and fall in the oblong groove to adapt to vacuum cavities of different specifications and heights to be connected.

[0004] However, the aforementioned support structure is unstable in use and cannot provide adequate support, causing the gate valve device to tip over and posing a safety hazard.

[0005] In view of this, the present invention proposes a magnetron sputtering machine that is stable in transportation, simple in structure, and easy to assemble and disassemble. Utility Model Content

[0006] In view of this, in order to solve the above problems, this utility model proposes a magnetron sputtering machine that is easy to assemble and disassemble, including a sputtering process chamber 1, a gate valve device 2, a water cooling device 3, and a support device 4. The machine is characterized in that: first mounting posts 5 are provided at both ends below the sputtering process chamber 1; a gate valve device 2 is provided between the sputtering process chamber 1 and the water cooling device 3; a second mounting post 6 is provided at the midpoint below the gate valve device 2 to ensure uniform force distribution; both the first mounting posts 5 and the second mounting posts 6 have internal threaded holes; one end of the support device 4 is connected to the first mounting post 5 of the sputtering process chamber 1 via a first fixing member; and the other end of the support device 4 is connected to the second mounting post of the gate valve device 2. 6. The support device 4 is installed and connected via a second fastener. The support device 4 includes a machine base 9, an auxiliary support assembly 10, a caster wheel transport assembly 11, a first fixed support assembly 12, and a second fixed support assembly 13. The auxiliary support devices 4 are provided around the bottom of the machine base 9. Each auxiliary support device 4 has a caster wheel transport assembly 11 inside. The first fixed support assembly 12 is provided at one end above the machine base 9. The first fixed support assembly 12 is installed and connected to two first mounting columns 5 via a first fastener. The second fixed support assembly 13 is provided at the other end above the machine base 9. The second fixed support assembly 13 is installed and connected to the second mounting column 6 via a second fastener.

[0007] In some embodiments, the gate valve device 2 includes a lifting cylinder 21, a gate 22, a first connecting valve 24, and a second connecting valve 25. The first connecting valve 24 is provided on one side of the gate 22, and is connected to the process chamber 1 through the first connecting valve 24. The second connecting valve 25 is provided on the other side of the gate 22, and is connected to the water cooling device 3 through the second connecting valve 25. The lifting cylinder 21 is provided at the bottom of the gate 22.

[0008] Furthermore, multiple reinforcing plates 221 are provided on both sides of the gate plate 22. The reinforcing plates 221 are integrally formed with the gate plate 22 to enhance the structural strength of the gate plate 22.

[0009] In some embodiments, the first fixed support assembly 12 includes a first support rod 121, a first support platform 122, and a first connecting rod 123. Two first support rods 121 are spaced apart at one end of the machine base 9. A first support platform 122 is provided above the two first support rods 121. A first mounting port is provided at both ends of the first support platform 122. A first fixing member is threadedly fixed to two first mounting posts 5 through the first mounting port. A first connecting rod 123 is provided between the two first support rods 121. The first connecting rod 123 serves to strengthen the structural strength.

[0010] In some embodiments, the center point between the two first mounting columns 5 and the second mounting column 6 are on the same straight line, and the two first mounting columns 5 and one second mounting column 6 form a triangle, which makes the force more uniform and improves the structural strength.

[0011] In some embodiments, the first support platform 122 is further provided with a clearance portion 124 in the middle of the side near the sputtering process cavity 1 to prevent the sputtering process cavity 1 from colliding with the first support platform 122.

[0012] In some embodiments, the avoidance part 124 is also provided with a collision-resistant flexible material to prevent hard damage caused by the collision between the sputtering process cavity 1 and the first support platform 122.

[0013] In some embodiments, the second fixed support assembly 13 includes a second support rod 131 and a second support platform 132. Two second support rods 131 are provided at the other end above the machine base 9. A second support platform 132 is provided above the two second support rods 131. A second mounting port is provided in the middle of the second support platform 132. The second fixing member is threadedly fixed to the second mounting column 6 through the second mounting port.

[0014] Furthermore, one of the two second support rods 131 is a one-piece molded vertical rod structure, and the other is a one-piece molded L-shaped rod structure.

[0015] Furthermore, when the second support rod 131 is an integrally formed L-shaped rod structure, the second support rod 131 includes a first L-shaped rod 1311 and a second L-shaped rod 1312. Two first L-shaped rods 1311 are provided at the other end above the machine base 9. The second L-shaped rod 1312 is vertically connected to the side of the first L-shaped rod 1311. A second support platform 132 is provided above the second L-shaped rod 1312.

[0016] Furthermore, both sides of the connection between the two first support rods 121 and the first support platform 122 and the machine base 9 are provided with first trapezoidal reinforcing ribs 14, which serve to strengthen the structural strength; the L-shaped bends of the first L-shaped rod 1311 and the second L-shaped rod 1312, both sides of the connection between the first L-shaped rod 1311 and the machine base 9, and the connection between the second L-shaped rod 1312 and the second support platform 132 are also provided with second trapezoidal reinforcing ribs 15, which serve to strengthen the structural strength.

[0017] In some embodiments, both the first and second fasteners are quick-release hand-tightening bolts, and the heads of the hand-tightening bolts are provided with anti-slip textures.

[0018] In some embodiments, the caster wheel transport assembly 11 has a spring brake pad inside the wheel frame, and the spring brake pad is controlled to lock with the wheel axle by a push-button switch.

[0019] Furthermore, the contact surface of the spring brake pad is provided with a rubber friction layer, the thickness of which is 2-3mm.

[0020] The beneficial effects of this utility model are as follows: This utility model proposes a magnetron sputtering machine that is easy to assemble and disassemble, including a sputtering process chamber 1, a gate valve device 2, a water cooling device 3, and a support device 4. First mounting columns 5 are provided at both ends below the sputtering process chamber 1. A gate valve device 2 is provided between the sputtering process chamber 1 and the water cooling device 3. A second mounting column 6 is provided at the midpoint below the gate valve device 2, ensuring uniform force distribution. The triangular support layout formed by the two first mounting columns 5 and the second mounting column 6 balances the force on the equipment, facilitating the transport of the magnetron sputtering machine while reducing the risk of stress concentration and improving structural stability. The integrated gate plate reinforcing rib and L-shaped support rod design improve deformation resistance and effectively absorb operational vibrations. An avoidance part 124 is also provided in the middle of the first support platform 122 near the sputtering process chamber 1 to prevent collisions between the sputtering process chamber 1 and the first support platform 122. Furthermore, the avoidance part 124 is provided with a flexible anti-collision material to further prevent hard damage caused by collisions between the sputtering process chamber 1 and the first support platform 122. Attached Figure Description

[0021] Figure 1 This is a schematic diagram of the structure of the magnetron sputtering machine that is easy to disassemble and assemble according to this application.

[0022] Figure 2 This is a side view of the magnetron sputtering machine that is easy to disassemble and assemble according to this application.

[0023] Figure 3 This is a schematic diagram of the gate valve device of the magnetron sputtering machine that is easy to disassemble and assemble according to this application.

[0024] Figure 4 This is a structural schematic diagram of the support device for the magnetron sputtering machine that is easy to assemble and disassemble according to this application.

[0025] Figure 5 This is a structural schematic diagram of the support device for the magnetron sputtering machine that is easy to assemble and disassemble according to this application.

[0026] Explanation of main component symbols

[0027] Sputtering process chamber 1, gate valve device 2, lifting cylinder 21, gate plate 22, reinforcing plate 221, first connecting valve 24, second connecting valve 25, water cooling device 3, support device 4, first mounting column 5, second mounting column 6, machine base 9, auxiliary support assembly 10, universal wheel transport assembly 11, first fixed support assembly 12, first support rod 121, first support platform 122, first connecting rod 123, clearance part 124, second fixed support assembly 13, second support rod 131, first L-shaped rod 1311, second L-shaped rod 1312, second support platform 132, first trapezoidal reinforcing rib 14, second trapezoidal reinforcing rib 15.

[0028] The following detailed description, in conjunction with the accompanying drawings, will further illustrate this utility model. Detailed Implementation Example 1:

[0029] like Figure 1 The diagram shown is a structural schematic of the easily disassembled magnetron sputtering machine of this application. Figure 2 The image shown is a side view of the easily detachable magnetron sputtering machine of this application. The easily detachable magnetron sputtering machine includes a sputtering process chamber 1, a gate valve device 2, a water cooling device 3, and a support device 4. Its features include: first mounting posts 5 at both ends below the sputtering process chamber 1; a gate valve device 2 between the sputtering process chamber 1 and the water cooling device 3; and a second mounting post 6 at the midpoint below the gate valve device 2 to ensure uniform force distribution. Both the first mounting posts 5 and the second mounting post 6 have internal threaded holes. One end of the support device 4 is connected to the first mounting post 5 of the sputtering process chamber 1 via a first fixing member, and the other end of the support device 4 is connected to the second mounting post 6 of the gate valve device 2. The mounting column 6 is installed and connected by a second fastener. The support device 4 includes a machine base 9, an auxiliary support assembly 10, a caster wheel transport assembly 11, a first fixed support assembly 12, and a second fixed support assembly 13. The auxiliary support devices 4 are provided around the machine base 9. Each auxiliary support device 4 has a caster wheel transport assembly 11 inside. The first fixed support assembly 12 is provided at one end of the machine base 9. The first fixed support assembly 12 is installed and connected to two first mounting columns 5 by a first fastener. The second fixed support assembly 13 is provided at the other end of the machine base 9. The second fixed support assembly 13 is installed and connected to the second mounting column 6 by a second fastener.

[0030] like Figure 3 The diagram shows a structural schematic of the gate valve device of the magnetron sputtering machine that is easy to disassemble and assemble according to this application. The gate valve device 2 includes a lifting cylinder 21, a gate plate 22, a first connecting valve 24, and a second connecting valve 25. The first connecting valve 24 is provided on one side of the gate plate 22, and is connected to the process chamber 1 through the first connecting valve 24. The second connecting valve 25 is provided on the other side of the gate plate 22, and is connected to the water cooling device 3 through the second connecting valve 25. The lifting cylinder 21 is provided at the bottom of the gate plate 22.

[0031] Multiple reinforcing plates 221 are provided on both sides of the gate plate 22. The reinforcing plates 221 are integrally formed with the gate plate 22 to enhance the structural strength of the gate plate 22.

[0032] like Figure 4 , Figure 5The diagram shows a structural schematic of the support device for the magnetron sputtering machine that is easy to assemble and disassemble according to this application. The first fixed support assembly 12 includes a first support rod 121, a first support platform 122, and a first connecting rod 123. Two first support rods 121 are spaced apart at one end of the machine base 9. A first support platform 122 is provided above the two first support rods 121. A first mounting port is provided at both ends of the first support platform 122. A first fixing member is threadedly fixed to two first mounting posts 5 through the first mounting port. A first connecting rod 123 is provided between the two first support rods 121. The first connecting rod 123 serves to strengthen the structural strength.

[0033] The center point between the two first mounting columns 5 and the second mounting column 6 are on the same straight line. The two first mounting columns 5 and the one second mounting column 6 form a triangle, which makes the force more uniform and improves the structural strength.

[0034] The first support platform 122 is also provided with a clearance part 124 in the middle of the side near the sputtering process cavity 1 to prevent the sputtering process cavity 1 from colliding with the first support platform 122.

[0035] The avoidance part 124 is also provided with a collision-resistant flexible material to prevent hard damage caused by the collision between the sputtering process cavity 1 and the first support platform 122.

[0036] The second fixed support assembly 13 includes a second support rod 131 and a second support platform 132. Two second support rods 131 are provided at the other end above the machine base 9. A second support platform 132 is provided above the two second support rods 131. A second mounting port is provided in the middle of the second support platform 132. The second fixing member is threadedly fixed to the second mounting column 6 through the second mounting port.

[0037] Of the two second support rods 131, one is a one-piece molded vertical rod structure, and the other is a one-piece molded L-shaped rod structure.

[0038] When the second support rod 131 is an integrally formed L-shaped rod structure, the second support rod 131 includes a first L-shaped rod 1311 and a second L-shaped rod 1312. Two first L-shaped rods 1311 are provided at the other end above the machine base 9. The second L-shaped rod 1312 is vertically connected to the side of the first L-shaped rod 1311. A second support platform 132 is provided above the second L-shaped rod 1312.

[0039] Both sides of the connection between the two first support rods 121 and the first support platform 122 and the machine base 9 are provided with first trapezoidal reinforcing ribs 14, which serve to strengthen the structural strength; the L-shaped bends of the first L-shaped rod 1311 and the second L-shaped rod 1312, both sides of the connection between the first L-shaped rod 1311 and the machine base 9, and the connection between the second L-shaped rod 1312 and the second support platform 132 are also provided with second trapezoidal reinforcing ribs 15, which serve to strengthen the structural strength.

[0040] Both the first and second fasteners are quick-release hand-tightening bolts, and the heads of the hand-tightening bolts are provided with anti-slip texture.

[0041] The universal wheel transport assembly 11 has a spring brake pad inside the wheel frame, and the spring brake pad is controlled to lock with the wheel axle by a push-button switch.

[0042] The contact surface of the spring brake pad is provided with a rubber friction layer, the thickness of which is 2-3mm.

[0043] The beneficial effects of this utility model are as follows: This utility model proposes a magnetron sputtering machine that is easy to assemble and disassemble, including a sputtering process chamber 1, a gate valve device 2, a water cooling device 3, and a support device 4. First mounting columns 5 are provided at both ends below the sputtering process chamber 1. A gate valve device 2 is provided between the sputtering process chamber 1 and the water cooling device 3. A second mounting column 6 is provided at the midpoint below the gate valve device 2, ensuring uniform force distribution. The triangular support layout formed by the two first mounting columns 5 and the second mounting column 6 balances the force on the equipment, facilitating the transport of the magnetron sputtering machine while reducing the risk of stress concentration and improving structural stability. The integrated gate plate reinforcing rib and L-shaped support rod design improve deformation resistance and effectively absorb operational vibrations. An avoidance part 124 is also provided in the middle of the first support platform 122 near the sputtering process chamber 1 to prevent collisions between the sputtering process chamber 1 and the first support platform 122. Furthermore, the avoidance part 124 is provided with a flexible anti-collision material to further prevent hard damage caused by collisions between the sputtering process chamber 1 and the first support platform 122.

[0044] The embodiments described above are merely illustrative of several implementations of this utility model, and while the descriptions are relatively specific and detailed, they should not be construed as limiting the scope of this utility model patent. It should be noted that those skilled in the art can make various modifications and improvements without departing from the concept of this utility model, and these all fall within the protection scope of this utility model. Therefore, the protection scope of this utility model patent should be determined by the appended claims.

Claims

1. A magnetron sputtering machine that is easy to assemble and disassemble, comprising a sputtering process chamber (1), a gate valve device (2), a water cooling device (3), and a support device (4), characterized in that: The sputtering process chamber (1) has first mounting posts (5) at both ends below it. A gate valve device (2) is provided between the sputtering process chamber (1) and the water cooling device (3). A second mounting post (6) is provided at the midpoint below the gate valve device (2). Both the first mounting post (5) and the second mounting post (6) have internal threaded holes. One end of the support device (4) is connected to the first mounting post (5) of the sputtering process chamber (1) through a first fixing member. The other end of the support device (4) is connected to the second mounting post (6) of the gate valve device (2) through a second fixing member. The support device (4) includes a machine base (9) and an auxiliary support assembly (10). The machine platform (9) is equipped with a universal wheel transport assembly (11), a first fixed support assembly (12), and a second fixed support assembly (13). The machine platform (9) is provided with auxiliary support devices (4) around its perimeter. Each auxiliary support device (4) has a universal wheel transport assembly (11) inside its inner side. The machine platform (9) is provided with a first fixed support assembly (12) at one end above the machine platform (9). The first fixed support assembly (12) is connected to two first mounting columns (5) by a first fastener. The machine platform (9) is provided with a second fixed support assembly (13) at the other end above the machine platform (9). The second fixed support assembly (13) is connected to a second mounting column (6) by a second fastener.

2. The magnetron sputtering machine base that is easy to assemble and disassemble as described in claim 1, characterized in that: The gate valve device (2) includes a lifting cylinder (21), a gate (22), a first connecting valve (24), and a second connecting valve (25). The first connecting valve (24) is provided on one side of the gate (22), which is connected to the process chamber 1 through the first connecting valve (24). The second connecting valve (25) is provided on the other side of the gate (22), which is connected to the water cooling device (3) through the second connecting valve (25). The lifting cylinder (21) is provided at the bottom of the gate (22).

3. The magnetron sputtering machine base that is easy to assemble and disassemble as described in claim 2, characterized in that: The gate (22) is provided with multiple reinforcing plates (221) on both sides, and the reinforcing plates (221) are integrally formed with the gate (22).

4. The magnetron sputtering machine base that is easy to assemble and disassemble as described in claim 1, characterized in that: The center point between the two first mounting posts (5) and the second mounting post (6) are on the same straight line, and the two first mounting posts (5) and the one second mounting post (6) form a triangle.

5. The easily detachable magnetron sputtering machine as described in claim 1, characterized in that: The first fixed support assembly (12) includes a first support rod (121), a first support platform (122), and a first connecting rod (123). Two first support rods (121) are spaced apart at one end of the machine base (9). A first support platform (122) is provided above the two first support rods (121). A first mounting port is provided at both ends of the first support platform (122). The first fixing member is threadedly fixed to two first mounting columns (5) through the first mounting port. A first connecting rod (123) is provided between the two first support rods (121).

6. The magnetron sputtering machine base for easy assembly and disassembly as described in claim 5, characterized in that: The first support platform (122) is also provided with a clearance part (124) in the middle of the side near the sputtering process cavity (1) to prevent the sputtering process cavity (1) from colliding with the first support platform (122).

7. The easily detachable magnetron sputtering machine as described in claim 6, characterized in that: The avoidance part (124) is also provided with a collision-resistant flexible material to prevent the sputtering process cavity (1) from colliding with the first support platform (122) and causing hard damage.

8. The easily disassembled magnetron sputtering machine as described in claim 5, characterized in that: The second fixed support assembly (13) includes a second support rod (131) and a second support platform (132). Two second support rods (131) are provided at the other end above the machine base (9). A second support platform (132) is provided above the two second support rods (131). A second mounting port is provided in the middle of the second support platform (132). The second fixing member is threadedly fixed to the second mounting column (6) through the second mounting port.

9. The easily detachable magnetron sputtering machine as described in claim 8, characterized in that: One of the two second support rods (131) is an integrally formed vertical rod structure, and the other is an integrally formed L-shaped rod structure. When the second support rod (131) is an integrally formed L-shaped rod structure, the second support rod (131) includes a first L-shaped rod (1311) and a second L-shaped rod (1312). Two first L-shaped rods (1311) are provided at the other end above the machine platform (9). The second L-shaped rod (1312) is vertically connected to the side of the first L-shaped rod (1311). A second support platform (132) is provided above the second L-shaped rod (1312). The second support rod (131) includes a first L-shaped rod (1311) and a second L-shaped rod (1312). Two first L-shaped rods (1311) are provided at the other end above the machine platform (9). The second L-shaped rod (1312) is vertically connected to the side of the first L-shaped rod (1311). A second support platform (132) is provided above the second L-shaped rod (1312).

10. The easily disassembled magnetron sputtering machine as described in claim 9, characterized in that: The first two support rods (121) are provided with first trapezoidal reinforcing ribs (14) on both sides of the connection between the first support rod (121) and the first support platform (122) and the machine base (9); the first L-shaped rod (1311) and the second L-shaped rod (1312) are provided with second trapezoidal reinforcing ribs (15) on both sides of the connection between the first L-shaped rod (1311) and the machine base (9) and the connection between the second L-shaped rod (1312) and the second support platform (132).

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