A cleaning apparatus and cleaning system

Abstract

The application provides a cleaning device and a cleaning system, and relates to the technical field of semiconductor processing. The cleaning device comprises: a cleaning table, which is used for placing a product to be cleaned; a megahertz ultrasonic cleaning nozzle, which is used for cleaning the front surface of the product to be cleaned; a back surface cleaning nozzle, which is used for cleaning the back surface of the product to be cleaned; a cleaning liquid storage tank, which is used for storing cleaning liquid, and is in communication with the megahertz ultrasonic cleaning nozzle and the back surface cleaning nozzle through a pipeline; and a heating device, which is used for heating the cleaning liquid in the cleaning liquid storage tank. The cleaning device is provided with the heating device for heating the cleaning liquid, so that the cleaning liquid sprayed on the front surface and the back surface of the product to be cleaned is heated cleaning liquid, and the megahertz ultrasonic cleaning of the megahertz ultrasonic cleaning nozzle is used, so that the dirt removal capacity of the cleaning device is obviously improved.

Description

Technical Field

[0001] This application relates to the field of semiconductor processing technology, and more specifically, to a cleaning device and a cleaning system. Background Technology

[0002] Photomask cleaning machines are primarily responsible for cleaning during the photomask manufacturing process and for final cleaning before protective film application. Their main purpose is to remove dirt and chemical residues that may be introduced during photomask production. If the cleaning process is inadequate and the dirt removal capacity is insufficient, abnormal dirt may be detected on the photomask after protective film application, requiring film removal. This significantly prolongs photomask production time, wastes manpower and machine time, and may lead to product delivery delays. Therefore, continuously improving the cleaning capacity of photomask cleaning machines is a challenging and ongoing task.

[0003] To improve the dirt removal capabilities of photomask cleaning machines, existing technologies typically employ various chemical cleaning solutions, combined with physical forces such as megasonic cleaning. However, there is still room for improvement in the dirt removal capabilities of photomask cleaning machines. Utility Model Content

[0004] The purpose of this application is to address the shortcomings of the prior art by providing a cleaning device and cleaning system that significantly improves the ability to remove dirt compared to the prior art.

[0005] To achieve the above objectives, the technical solutions adopted in the embodiments of this application are as follows:

[0006] One aspect of this application provides a cleaning device, comprising: a cleaning table for placing a product to be cleaned; a mega-frequency ultrasonic cleaning nozzle for cleaning the front side of the product; a back cleaning nozzle for cleaning the back side of the product; a cleaning fluid storage tank for storing cleaning fluid, the cleaning fluid storage tank being connected to the mega-frequency ultrasonic cleaning nozzle and the back cleaning nozzle via pipelines; and a heating device for heating the cleaning fluid in the cleaning fluid storage tank.

[0007] Optionally, the cleaning fluid storage tank is provided with a first chamber and a second chamber. The first chamber is used to hold the first cleaning fluid, and the second chamber is used to store the second cleaning fluid. The first chamber is connected to the mega-frequency ultrasonic cleaning nozzle through a first pipe, and the second chamber is connected to the rear cleaning nozzle through a second pipe.

[0008] Optionally, the second chamber is also connected to a mega-frequency ultrasonic cleaning nozzle via a third conduit.

[0009] Optionally, the heating device includes a first heating component and a second heating component, wherein the first heating component is used to heat the first cleaning fluid and the second heating component is used to heat the second cleaning fluid.

[0010] Optionally, the spray range of the back cleaning nozzles can completely cover the back of the product to be cleaned.

[0011] Optionally, it also includes a robotic arm, on which the mega-frequency ultrasonic cleaning nozzle is fixed, and the robotic arm is used to drive the mega-frequency ultrasonic cleaning nozzle to move.

[0012] Optionally, it also includes an ultrasonic generator controller for controlling the operating frequency of the mega-frequency ultrasonic cleaning nozzle.

[0013] Optionally, the spray range of the mega-frequency ultrasonic cleaning nozzle partially covers the front of the product to be cleaned.

[0014] Optionally, the heating temperature of the heating device is adjustable.

[0015] In another aspect of the embodiments of this application, a cleaning system is provided, including the cleaning equipment as described in any of the above.

[0016] The beneficial effects of this application include:

[0017] This application provides a cleaning device, including: a cleaning table for placing a product to be cleaned; a mega-frequency ultrasonic cleaning nozzle for cleaning the front side of the product; a back cleaning nozzle for cleaning the back side of the product; a cleaning fluid storage tank for storing cleaning fluid, which is connected to the mega-frequency ultrasonic cleaning nozzle and the back cleaning nozzle via pipelines; and a heating device for heating the cleaning fluid in the storage tank. This cleaning device adds a heating device to heat the cleaning fluid, ensuring that the cleaning fluid sprayed onto both the front and back sides of the product is heated. Combined with the mega-frequency ultrasonic cleaning from the nozzles, this significantly improves the cleaning device's ability to remove dirt. Attached Figure Description

[0018] To more clearly illustrate the technical solutions of the embodiments of this application, the accompanying drawings used in the embodiments will be briefly introduced below. It should be understood that the following drawings only show some embodiments of this application and should not be regarded as a limitation of the scope. For those skilled in the art, other related drawings can be obtained based on these drawings without creative effort.

[0019] Figure 1 This is one of the structural schematic diagrams of the cleaning equipment provided in the embodiments of this application;

[0020] Figure 2 This is a second schematic diagram of the cleaning equipment provided in the embodiments of this application.

[0021] Icons: 100 - Cleaning equipment; 110 - Mega-frequency ultrasonic cleaning nozzle; 120 - Back cleaning nozzle; 130 - Cleaning fluid storage tank; 131 - First chamber; 132 - Second chamber; 140 - Heating device; 141 - First heating component; 142 - Second heating component; 150 - Piping; 151 - First piping; 152 - Second piping; 153 - Third piping; 160 - Robotic arm; 200 - Product to be cleaned; 300 - Cleaning fluid. Detailed Implementation

[0022] To make the objectives, technical solutions, and advantages of the embodiments of this application clearer, the technical solutions of the embodiments of this application will be clearly and completely described below with reference to the accompanying drawings. Obviously, the described embodiments are only some embodiments of this application, and not all embodiments. The components of the embodiments of this application described and shown in the accompanying drawings can generally be arranged and designed in various different configurations.

[0023] Therefore, the following detailed description of the embodiments of this application provided in the accompanying drawings is not intended to limit the scope of the claimed application, but merely to illustrate selected embodiments of the application. It should be noted that, unless otherwise specified, the various features in the embodiments of this application can be combined with each other, and the combined embodiments are still within the protection scope of this application.

[0024] It should be noted that similar labels and letters in the following figures indicate similar items. Therefore, once an item is defined in one figure, it does not need to be further defined and explained in subsequent figures.

[0025] In the description of this application, it should be noted that the terms "center," "upper," "lower," "left," "right," "vertical," "horizontal," "inner," and "outer," etc., indicate the orientation or positional relationship based on the orientation or positional relationship shown in the accompanying drawings, or the orientation or positional relationship commonly used when the product of this application is in use. They are only for the convenience of describing this application and simplifying the description, and do not indicate or imply that the device or element referred to must have a specific orientation, or be constructed and operated in a specific orientation, and therefore should not be construed as a limitation on this application. In addition, the terms "first," "second," and "third," etc., are only used to distinguish descriptions and should not be construed as indicating or implying relative importance.

[0026] In the description of this application, it should also be noted that, unless otherwise expressly specified and limited, the terms "set up," "install," "connect," and "link" should be interpreted broadly. For example, they can refer to a fixed connection, a detachable connection, or an integral connection; they can refer to a mechanical connection or an electrical connection; they can refer to a direct connection or an indirect connection through an intermediate medium; and they can refer to the internal connection of two components. Those skilled in the art can understand the specific meaning of the above terms in this application based on the specific circumstances.

[0027] Regarding one aspect of the embodiments of this application, please refer to Figure 1 and Figure 2 A cleaning device 100 is provided for cleaning products such as photomasks and wafers. The cleaning device 100 includes: a cleaning table, a mega-frequency ultrasonic cleaning nozzle 110, a back-side cleaning nozzle 120, a cleaning solution storage tank 130, and a heating device 140. Wherein:

[0028] The cleaning table is used to place the product 200 to be cleaned. After the product 200 is placed on the cleaning table, its front side faces the mega-frequency ultrasonic cleaning nozzle 110 and its back side faces the back cleaning nozzle 120. Generally, the product 200 is placed on the cleaning table with its front side facing up and its back side facing down. It is understood that the cleaning table needs to be able to expose the areas to be cleaned on the front and back sides of the product 200. For example, the cleaning table includes a base and multiple grippers spaced apart on the base. The multiple grippers simultaneously clamp the edges of the product 200 to fix the product 200 and expose the front and back sides of the product 200 for cleaning.

[0029] The cleaning fluid storage tank 130 is used to store the cleaning fluid 300. The cleaning fluid storage tank 130 is connected to the mega-frequency ultrasonic cleaning nozzle 110 and the back cleaning nozzle 120 through the pipeline 150, so that the cleaning fluid 300 in it is delivered to the mega-frequency ultrasonic cleaning nozzle 110 and the back cleaning nozzle 120 respectively. The cleaning fluid 300 sprayed by the mega-frequency ultrasonic cleaning nozzle 110 is sprayed on the front of the product 200 to be cleaned, and the cleaning fluid 300 sprayed by the back cleaning nozzle 120 is sprayed on the back of the product 200 to be cleaned, and the back is cleaned.

[0030] It is understood that the cleaning fluid 300 in the cleaning fluid storage tank 130 can be of one, two, or more types. When there are two or more types of cleaning fluid 300, the two or more types of cleaning fluid 300 are stored independently. The cleaning fluid storage tank 130 can provide the same type of cleaning fluid 300 to the mega-frequency ultrasonic cleaning nozzle 110 and the back cleaning nozzle 120, or it can provide different types of cleaning fluid 300 to the mega-frequency ultrasonic cleaning nozzle 110 and the back cleaning nozzle 120. Moreover, the cleaning fluid storage tank 130 can also provide a mixed cleaning fluid 300 to the mega-frequency ultrasonic cleaning nozzle 110 and the back cleaning nozzle 120 during the cleaning process, or it can provide one type of cleaning fluid 300 first and then another type of cleaning fluid 300. This embodiment does not limit these possibilities.

[0031] The heating device 140 is used to heat the cleaning fluid 300 in the cleaning fluid storage tank 130, so that the cleaning fluid 300 has a certain temperature. Generally speaking, the temperature of the heated cleaning fluid 300 is above 60°C. If there is more than one type of cleaning fluid 300 in the cleaning fluid storage tank 130, all cleaning fluids 300 are heated, but the heating temperature can be the same or different. It should be noted that in this embodiment, the structure of the heating device 140 is not limited, as long as it can heat the cleaning fluid 300 in the cleaning fluid storage tank 130.

[0032] The cleaning equipment 100 is equipped with a heating device 140 to heat the cleaning fluid 300, so that the cleaning fluid 300 sprayed onto the front and back of the product 200 to be cleaned is heated. Combined with the mega-frequency ultrasonic cleaning of the mega-frequency ultrasonic cleaning nozzle 110, the cleaning equipment 100's ability to remove dirt is significantly improved.

[0033] Optionally, the heating temperature of the heating device 140 is adjustable. That is, the heating device 140 can heat the cleaning solution 300 to different temperatures, allowing the operator to select the optimal temperature of the cleaning solution 300 for the product 200 to be cleaned based on its actual condition. The structure of the heating device 140 is prior art and will not be described in detail here.

[0034] Since the front and back structures of the product 200 to be cleaned are generally different, the cleaning fluid 300 used for cleaning the front and the cleaning fluid 300 used for cleaning the back may also be different. To further enhance the dirt removal capability of the cleaning equipment 100 and achieve targeted cleaning of the front and back, optionally, the cleaning fluid storage tank 130 is provided with a first chamber 131 and a second chamber 132. The first chamber 131 is used to hold the first cleaning fluid, and the second chamber 132 is used to store the second cleaning fluid. The first chamber 131 is connected to the mega-frequency ultrasonic cleaning nozzle 110 through a first pipe 151, and the second chamber 132 is connected to the back cleaning nozzle 120 through a second pipe 152. The first and second cleaning fluids are of different types. The heated first cleaning fluid enters the mega-frequency ultrasonic cleaning nozzle 110 through the first pipe 151, and the heated second cleaning fluid enters the back cleaning nozzle 120 through the second pipe 152.

[0035] Optionally, the second chamber 132 is also connected to the mega-frequency ultrasonic cleaning nozzle 110 via a third conduit 153. In this way, the heated second cleaning fluid can also enter the mega-frequency ultrasonic cleaning nozzle 110 through the third conduit 153, thus providing more cleaning options for the front of the product 200 to be cleaned. For example, the first and second cleaning fluids can be mixed for cleaning, or the first cleaning fluid can be used first, followed by the second cleaning fluid.

[0036] Similarly, the first chamber 131 can also be connected to the back cleaning nozzle 120 via the fourth pipe. In this way, the heated first cleaning fluid can also enter the back cleaning nozzle 120 through the fourth pipe, thereby providing more cleaning options for the back of the product 200 to be cleaned.

[0037] Optionally, the heating device 140 includes a first heating component 141 and a second heating component 142, wherein the first heating component 141 is used to heat the first cleaning fluid, and the second heating component 142 is used to heat the second cleaning fluid.

[0038] The first and second cleaning solutions are heated by independent heating components, which allows them to have different temperatures. This enables the operator to select the optimal heating temperature for the first and second cleaning solutions based on the actual condition of the product 200 to be cleaned, thereby further enhancing the dirt removal capability of the cleaning equipment 100.

[0039] Optionally, the spray range of the back cleaning nozzle 120 completely covers the back of the product 200 to be cleaned.

[0040] In other words, the back cleaning nozzle 120 simultaneously sprays cleaning fluid 300 onto the entire back of the product 200 to be cleaned. Using heated cleaning fluid 300 to clean and heat the entire back of the product 200 can further enhance the dirt removal capability of the cleaning equipment 100.

[0041] Optionally, the cleaning device 100 also includes a robotic arm 160, on which a mega-frequency ultrasonic cleaning nozzle 110 is fixed, and the robotic arm 160 is used to drive the mega-frequency ultrasonic cleaning nozzle 110 to move.

[0042] When picking up or placing the product 200 to be cleaned, the robotic arm 160 can be used to move the mega-frequency ultrasonic cleaning nozzle 110 away to avoid affecting the picking up or placing of the product 200. During cleaning, the robotic arm 160 can also be used to move the mega-frequency ultrasonic cleaning nozzle 110, so that the mega-frequency ultrasonic cleaning nozzle 110 can clean the entire front side.

[0043] Optionally, the spray range of the mega-frequency ultrasonic cleaning nozzle 110 partially covers the front side of the product 200 to be cleaned.

[0044] In other words, the mega-frequency ultrasonic cleaning nozzle 110 cannot clean the entire front of the product 200 at the same time, but when moved in conjunction with the robotic arm 160, the mega-frequency ultrasonic cleaning nozzle 110 can still clean the entire front and can also perform targeted cleaning of local areas.

[0045] Optionally, the cleaning equipment 100 also includes an ultrasonic generator controller for controlling the operating frequency of the mega-frequency ultrasonic cleaning nozzle 110.

[0046] In this way, depending on the actual condition of the product 200 to be cleaned, the staff can adjust the working frequency of the mega-frequency ultrasonic cleaning nozzle 110 through the ultrasonic generator controller, and can also use different combinations of frequencies to clean the product 200 to achieve better cleaning results.

[0047] This embodiment also provides a cleaning system, including the cleaning device 100 as described above.

[0048] This cleaning system has the same structure and beneficial effects as the cleaning device 100 in the foregoing embodiments. The structure and beneficial effects of the cleaning device 100 have been described in detail in the foregoing embodiments and will not be repeated here.

[0049] The above description is merely a preferred embodiment of this application and is not intended to limit this application. Various modifications and variations can be made to this application by those skilled in the art. Any modifications, equivalent substitutions, improvements, etc., made within the spirit and principles of this application should be included within the protection scope of this application.

Claims

1. A cleaning device, characterized in that, include: A cleaning station, used for placing products to be cleaned; A mega-frequency ultrasonic cleaning nozzle, the mega-frequency ultrasonic cleaning nozzle being used to clean the front side of the product to be cleaned; A back cleaning nozzle, used to clean the back side of the product to be cleaned; A cleaning fluid storage tank is used to store cleaning fluid, and the cleaning fluid storage tank is connected to the mega-frequency ultrasonic cleaning nozzle and the back cleaning nozzle through a pipeline; A heating device is provided for heating the cleaning fluid in the cleaning fluid storage tank.

2. The cleaning equipment as described in claim 1, characterized in that, The cleaning fluid storage tank has a first chamber and a second chamber. The first chamber is used to hold the first cleaning fluid, and the second chamber is used to store the second cleaning fluid. The first chamber is connected to the mega-frequency ultrasonic cleaning nozzle through a first pipe, and the second chamber is connected to the back cleaning nozzle through a second pipe.

3. The cleaning equipment as described in claim 2, characterized in that, The second chamber is also connected to the mega-frequency ultrasonic cleaning nozzle via a third conduit.

4. The cleaning equipment as described in claim 2, characterized in that, The heating device includes a first heating component and a second heating component, wherein the first heating component is used to heat the first cleaning liquid and the second heating component is used to heat the second cleaning liquid.

5. The cleaning equipment as described in claim 1, characterized in that, The spray range of the back cleaning nozzle completely covers the back of the product to be cleaned.

6. The cleaning equipment as described in claim 1, characterized in that, It also includes a robotic arm, on which the mega-frequency ultrasonic cleaning nozzle is fixed, and the robotic arm is used to drive the mega-frequency ultrasonic cleaning nozzle to move.

7. The cleaning equipment as described in claim 1, characterized in that, It also includes an ultrasonic generator controller, which is used to control the operating frequency of the mega-frequency ultrasonic cleaning nozzle.

8. The cleaning equipment as described in claim 6, characterized in that, The spray range of the mega-frequency ultrasonic cleaning nozzle partially covers the front of the product to be cleaned.

9. The cleaning equipment as described in claim 1, characterized in that, The heating temperature of the heating device is adjustable.

10. A cleaning system, characterized in that, Includes the cleaning equipment as described in any one of claims 1 to 9.

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