A protection gas gas path structure of a wafer aging test clamp

By designing the protective gas path structure of the wafer aging test fixture, the problems of air not being able to be replaced and gas unevenness in the containment ventilation cavity were solved, thus achieving uniform filling of protective gas and stability of the test environment.

CN224471799UActive Publication Date: 2026-07-07SANHAI INTELLIGENT EQUIPMENT (GUANGZHOU) CO LTD

Patent Information

Authority / Receiving Office
CN · China
Patent Type
Utility models(China)
Current Assignee / Owner
SANHAI INTELLIGENT EQUIPMENT (GUANGZHOU) CO LTD
Filing Date
2025-06-16
Publication Date
2026-07-07

AI Technical Summary

Technical Problem

In existing wafer aging test fixtures, the air in the venting chamber cannot be reliably replaced, and the protective gas cannot be uniformly filled, affecting the stability of the test environment.

Method used

A protective gas path structure for a wafer aging test fixture was designed, including an inlet channel and an outlet channel. The inlet channel is connected to the venting cavity through an inlet connecting groove, and a sealing gasket is used to improve the sealing performance and ensure uniform filling of the protective gas.

Benefits of technology

It achieves complete replacement of air in the ventilation chamber, protects the gas from being filled evenly, and ensures the stability and uniformity of the test environment.

✦ Generated by Eureka AI based on patent content.

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Abstract

The utility model discloses a kind of protection gas gas path structure of wafer aging test fixture, including upper needle card holder, chuck and locking device;The chuck is provided with gas inlet passage and gas outlet passage;The gas inlet passage is communicated with containing ventilation cavity, and is used for supplying protection gas into containing ventilation cavity;The gas inlet passage includes gas inlet and gas inlet communication groove, the gas outlet passage is communicated with containing ventilation cavity, and is used for gas discharge;The gas outlet passage is communicated with containing ventilation cavity (50), and is used for gas discharge.The utility model can be realized to the replacement of convection so that the air in containing ventilation cavity can be replaced by protection gas, to make protection gas evenly filled in containing ventilation cavity.
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Description

Technical Field

[0001] This utility model relates to the field of wafer aging test fixtures, specifically to a protective gas path structure for a wafer aging test fixture. Background Technology

[0002] Silicon carbide (SiC), a typical representative of third-generation wide-bandgap semiconductor materials, possesses characteristics such as high critical breakdown field strength, high thermal conductivity, high electron saturation drift velocity, large bandgap, and strong radiation resistance. It has found widespread application in the new energy field. However, the yield of SiC wafers is generally low due to current manufacturing processes. Screening is done solely through traditional wafer probes for electrical performance testing, which is insufficient to effectively eliminate early device failures. SiC wafers must undergo high-temperature, electrical stress aging before they can be effectively rejected; therefore, aging tests must be performed in wafer aging test fixtures.

[0003] During wafer testing, a stable and protected environment is required. Therefore, protective gas needs to be introduced into the venting chamber of the wafer aging test fixture. However, it is easy for the air in the venting chamber to be unreliably replaced and for the protective gas to be not evenly filled in the venting chamber, which affects the wafer testing. Utility Model Content

[0004] In order to overcome the shortcomings of the prior art, the purpose of this utility model is to provide a protective gas path structure for a wafer aging test fixture, which can realize convection displacement so that the air in the venting cavity can be replaced by the protective gas, so that the protective gas is uniformly filled in the venting cavity.

[0005] The objective of this utility model is achieved through the following technical solution:

[0006] A protective gas path structure for a wafer aging test fixture is characterized by comprising an upper needle holder, a lower chuck, and a locking device; the lower chuck is fixed to the upper needle holder by the locking device, and the upper needle holder and the lower chuck form a venting cavity for introducing protective gas; the lower chuck is provided with an inlet channel and an outlet channel; the inlet channel communicates with the venting cavity and is used to allow protective gas to enter the venting cavity; the inlet channel includes an inlet port and an inlet connecting groove, one end of the inlet connecting groove is formed as a first end, and the other end is formed as a second end; the first end of the inlet connecting groove communicates with the inlet port, and the second end is used to communicate with the venting cavity; the outlet channel communicates with the venting cavity and is used to allow gas to exit.

[0007] The air intake channel also includes an air intake communication hole, and the second end of the air intake communication slot is connected to the accommodating ventilation cavity through the air intake communication hole.

[0008] The extension trajectory line of the air inlet connecting groove is perpendicular to the central axis of the venting cavity.

[0009] The lower chuck is provided with a first sealing gasket, and the first sealing gasket is provided with a first sealing inlet that communicates with the air inlet.

[0010] The lower chuck is provided with a first mounting groove, and the first sealing gasket is located in the first mounting groove and is fixed to the lower chuck in a detachable manner.

[0011] Compared with the prior art, the beneficial effects of this utility model are as follows:

[0012] This utility model provides a protective gas path structure for a wafer aging test fixture. By reasonably setting the inlet and outlet channels, the air in the venting cavity can be replaced by protective gas, so that the protective gas is evenly filled in the venting cavity, ensuring that the test environment is full of protective gas. Attached Figure Description

[0013] Figure 1 This is a schematic diagram of the structure of this utility model.

[0014] Figure 2 This is a front view of the present invention.

[0015] Figure 3 for Figure 2 Sectional view at point AA.

[0016] Figure 4 for Figure 3 Enlarged view of point D.

[0017] Figure 5 for Figure 2 Sectional view at BB.

[0018] Figure 6 This is an exploded view of the present invention.

[0019] Figure 7 This is an exploded view of the locking device.

[0020] Among them, 10 is the upper needle holder; 20 is the lower chuck; 30 is the locking device; 31 is the locking nut; 40 is the locking component; 41 is the mounting base; 42 is the connecting component; 43 is the spring; 44 is the non-removable screw; 45 is the gasket; 50 is the venting chamber; 60 is the air inlet channel; 61 is the air inlet; 62 is the air inlet connecting groove; 63 is the air inlet connecting hole; 64 is the first sealing gasket; 65 is the first sealing inlet; and 66 is the first mounting groove. Detailed Implementation

[0021] The present invention will be further described below with reference to the accompanying drawings and specific embodiments. It should be noted that, without conflict, the various embodiments or technical features described below can be arbitrarily combined to form new embodiments.

[0022] like Figure 1-7 As shown, a protective gas path structure for a wafer aging test fixture includes an upper needle holder 10, a lower chuck 20, and a locking device 30. The lower chuck 20 is fixed to the upper needle holder 10 by the locking device 30, and the upper needle holder 10 and the lower chuck 20 form a venting cavity 50 for introducing protective gas. The lower chuck 20 is provided with an inlet channel 60 and an outlet channel 70. The inlet channel 60 communicates with the venting cavity 50 and is used to allow protective gas to enter the venting cavity 50. The inlet channel 60 includes an inlet port 61 and an inlet connecting groove 62. One end of the inlet connecting groove 62 is formed as a first end, and the other end is formed as a second end. The first end of the inlet connecting groove 62 communicates with the inlet port 61, and the second end communicates with the venting cavity 50. The outlet channel 70 communicates with the venting cavity 50 and is used to discharge gas.

[0023] When in use, the wafer is placed in the venting cavity 50 for testing. Protective gas can flow from the air inlet 61 into the air inlet communication groove 62 and then flow through the air inlet communication groove 62 to the venting cavity 50, which can cause the air in the venting cavity 50 to be discharged through the air outlet channel.

[0024] The air intake channel 60 also includes an air intake communication hole 63. The second end of the air intake communication groove 62 is connected to the accommodating ventilation cavity 50 through the air intake communication hole 63, so that the protective gas flowing into the air intake communication groove 62 from the air intake port 61 can flow to the accommodating ventilation cavity 50 through the air intake communication hole 63.

[0025] The lower chuck 20 is provided with a first sealing gasket 64, and the first sealing gasket 64 is provided with a first sealing inlet 65 communicating with the air inlet 61. By using the first sealing gasket 64, the sealing performance can be improved.

[0026] The lower chuck 20 is provided with a first mounting groove 66, and the first sealing gasket 64 is located in the first mounting groove 66 and is detachably fixed to the lower chuck 20. Specifically, the first sealing gasket 64 is fixed to the lower chuck 20 by a first fastening screw to facilitate the replacement of the first sealing gasket 64.

[0027] The locking device 30 can be any type of locking device available on the market, as long as it can fix the lower chuck 20 and the upper pin holder 10 together.

[0028] In a preferred embodiment of this utility model, the locking device 30 includes a locking nut 31 and a locking component 40; the locking nut 31 is disposed on the lower chuck 20; the locking component 40 is disposed on the upper needle holder 10 and includes a mounting base 41, a connecting component 42, and a spring 43; the mounting base 41 is detachably fixed to the upper needle holder 10; the connecting component 42 passes through the mounting base 41, and the spring 43 abuts against the mounting base 41 and the connecting component 42; the connecting component 42 includes a captive screw 44, which passes through the mounting base 41, and the connecting end of the captive screw 44 engages with the locking nut 31, allowing for easy replacement of the captive screw 44 by removing the locking component 40 as a whole from the upper needle holder 10. The connecting component 42 also includes a washer 45 abutting against the captive screw 44, and the other end of the spring 43 abuts against the washer 45.

[0029] The above embodiments are merely preferred embodiments of this utility model and should not be construed as limiting the scope of protection of this utility model. Any non-substantial changes and substitutions made by those skilled in the art based on this utility model shall fall within the scope of protection claimed by this utility model.

Claims

1. A protective gas path structure for a wafer aging test fixture, characterized in that: It includes an upper needle holder (10), a lower chuck (20), and a locking device (30); the lower chuck (20) is fixed to the upper needle holder (10) by the locking device (30), and the upper needle holder (10) and the lower chuck (20) form a venting cavity (50) for introducing protective gas; the lower chuck (20) is provided with an air inlet channel (60) and an air outlet channel; the air inlet channel (60) communicates with the venting cavity (50) and is used for Protective gas is introduced into the venting cavity (50); the air inlet channel (60) includes an air inlet (61) and an air inlet connecting groove (62), one end of the air inlet connecting groove (62) is formed as a first end, and the other end is formed as a second end; the first end of the air inlet connecting groove (62) is connected to the air inlet (61), and the second end is used to connect to the venting cavity (50); the air outlet channel is connected to the venting cavity (50) and is used to discharge gas.

2. The protective gas path structure of the wafer aging test fixture as described in claim 1, characterized in that: The air intake channel (60) also includes an air intake communication hole (63), and the second end of the air intake communication groove (62) is connected to the accommodating ventilation cavity (50) through the air intake communication hole (63).

3. The protective gas path structure of the wafer aging test fixture as described in claim 1, characterized in that: The extension trajectory of the air inlet communication groove (62) is perpendicular to the central axis of the accommodating ventilation cavity (50).

4. The protective gas path structure of the wafer aging test fixture as described in claim 1, characterized in that: The lower chuck (20) is provided with a first sealing gasket (64), and the first sealing gasket (64) is provided with a first sealing inlet (65) that communicates with the air inlet (61).

5. The protective gas path structure of the wafer aging test fixture as described in claim 4, characterized in that: The lower chuck (20) is provided with a first mounting groove (66), and the first sealing gasket (64) is located in the first mounting groove (66) and is fixed to the lower chuck (20) in a detachable manner.