A base station and cleaning system

Abstract

The embodiment of the application relates to the technical field of cleaning, and discloses a base station and a cleaning system, the base station comprising a base station body, a water storage tank and an atomization mechanism, the base station body being provided with a cleaning cavity and a communication port, the communication port being in communication with the cleaning cavity; the water storage tank being arranged on the base station body; the atomization mechanism comprising a heating assembly and an atomization assembly, a water inlet end of the heating assembly being in communication with the water storage tank, a water inlet end of the atomization assembly being in communication with a water outlet end of the heating assembly, and a water outlet end of the atomization assembly being in communication with the communication port; the heating assembly being used for heating water, and the atomization assembly being used for atomizing water. Through the above mode, the base station can improve the sterilization capability of the cleaning robot.

Description

Technical Field

[0001] This application relates to the field of cleaning technology, and in particular to a base station and a cleaning system. Background Technology

[0002] With the increasing popularity of smart homes, smart cleaning robots are used to help users clean floors, greatly reducing the time users spend cleaning. As a result, cleaning robots are becoming more and more popular among families.

[0003] Cleaning robots typically require a base station for cleaning. The base station is used to clean the robot's mop and also to charge the robot.

[0004] During the implementation of this application, the inventors discovered that when the cleaning robot comes into contact with food scraps or other garbage during the sweeping process, bacteria can easily stick to it. Existing base stations usually only have cleaning functions and have weak sterilization capabilities. Utility Model Content

[0005] The main technical problem addressed by the embodiments of this application is to provide a base station and a cleaning system that can enhance the base station's ability to sterilize cleaning robots.

[0006] To solve the above-mentioned technical problems, one technical solution adopted in this application embodiment is: providing a base station, including a base station body, a water storage tank, and an atomizing mechanism. The base station body is provided with a cleaning chamber and a connecting port, and the connecting port is connected to the cleaning chamber. The water storage tank is disposed in the base station body. The atomizing mechanism includes a heating component and an atomizing component. The water inlet of the heating component is connected to the water storage tank, the water inlet of the atomizing component is connected to the water outlet of the heating component, and the water outlet of the atomizing component is connected to the connecting port. The heating component is used to heat the water, and the atomizing component is used to atomize the water.

[0007] In some embodiments, the atomizing mechanism further includes a valve disposed between the heating component and the water tank.

[0008] In some embodiments, the atomizing mechanism further includes a water pump disposed between the valve and the heating assembly.

[0009] In some embodiments, the atomizing mechanism further includes several pipes, with at least one pipe connecting the valve to the water tank, the water pump to the valve, the heating component to the water pump, and the atomizing component to the heating component.

[0010] In some embodiments, the base station body is provided with at least two communication ports, both of which are connected to the cleaning chamber; the atomizing mechanism includes at least two atomizing components, both of which are connected to the heating component, and one atomizing component is connected to a communication port.

[0011] In some embodiments, the atomizing mechanism further includes a three-way tube, the first end of which is connected to a heating component, the second end of which is connected to one of the atomizing components, and the third end of which is connected to another atomizing component.

[0012] In some embodiments, the atomizing assembly includes an atomizing bracket, an atomizing plate, and a retaining ring. The atomizing bracket is disposed at the communication port and has an installation groove and a liquid channel. The installation groove communicates with the liquid channel and the liquid channel communicates with the heating assembly. The atomizing plate is disposed in the installation groove, and the retaining ring is installed at the water inlet end of the atomizing bracket away from the heating assembly. The retaining ring is configured to prevent the atomizing plate from detaching from the installation groove.

[0013] In some embodiments, the atomizing assembly further includes a sealing ring, an atomizing plate being fitted inside the sealing ring, the sealing ring being disposed in a mounting groove, and a retaining ring being at least partially received in the mounting groove, with the retaining ring abutting against the sealing ring.

[0014] In some embodiments, the sealing ring is provided with a groove, and the atomizing sheet is engaged in the groove.

[0015] To solve the above-mentioned technical problems, another technical solution adopted in this application embodiment is: to provide a cleaning system, including a cleaning robot and the above-mentioned base station, wherein the cleaning robot can enter the cleaning chamber, and the base station is configured to sterilize and clean the mop of the cleaning robot.

[0016] The beneficial effects of this application embodiment are as follows: Unlike the prior art, in this application embodiment, by setting a heating component and an atomizing component, the water inlet of the heating component is connected to the water storage tank, the water inlet of the atomizing component is connected to the water outlet of the heating component, and the water outlet of the atomizing component is connected to the heating component. The heating component is used to heat the water, and the atomizing component is used to atomize the water. Therefore, after the water is heated by the heating component, high-temperature water is formed. Then, the high-temperature water is atomized by the atomizing component to form high-temperature water vapor. The high-temperature water vapor diffuses into the cleaning chamber through the connecting port, thereby sterilizing the cleaning robot at high temperature, which is beneficial to improving the sterilization capability of the base station for the mop of the cleaning robot. Attached Figure Description

[0017] To more clearly illustrate the technical solutions in the specific embodiments of this application or the prior art, the accompanying drawings used in the description of the specific embodiments or the prior art will be briefly introduced below. In all the drawings, similar elements or parts are generally identified by similar reference numerals. In the drawings, the elements or parts are not necessarily drawn to scale.

[0018] Figure 1 This is a schematic diagram of the base station structure provided in the embodiments of this application after the hidden portion of the outer casing is concealed;

[0019] Figure 2This is a schematic diagram of the base station structure provided in the embodiments of this application;

[0020] Figure 3 yes Figure 2 A schematic diagram of the structure after being cut along section AA.

[0021] Figure 4 yes Figure 3 An enlarged view of the area shown in section A;

[0022] Figure 5 This is an exploded structural diagram of the atomizing component provided in the embodiments of this application;

[0023] Figure 6 This is a schematic diagram of the structure of the cleaning robot provided in the embodiments of this application. Detailed Implementation

[0024] To facilitate understanding of this application, a more detailed description is provided below with reference to the accompanying drawings and specific embodiments. It should be noted that when an element is described as "fixed to" another element, it can be directly on the other element, or one or more intermediate elements may exist between them. When an element is described as "connected" to another element, it can be directly connected to the other element, or one or more intermediate elements may exist between them. The terms "upper," "lower," "inner," "outer," "vertical," "horizontal," etc., used in this specification indicate the orientation or positional relationship based on the orientation or positional relationship shown in the accompanying drawings, and are only for the convenience of describing this application and simplifying the description, and do not indicate or imply that the device or element referred to must have a specific orientation, or be constructed and operated in a specific orientation, and therefore should not be construed as a limitation of this application. Furthermore, the terms "first," "second," etc., are used for descriptive purposes only and should not be construed as indicating or implying relative importance.

[0025] Unless otherwise defined, all technical and scientific terms used in this specification have the same meaning as commonly understood by one of ordinary skill in the art to which this application belongs. The terminology used in this specification is for the purpose of describing particular embodiments only and is not intended to limit the scope of the application. The term "and / or" as used in this specification includes any and all combinations of one or more of the associated listed items.

[0026] Furthermore, the technical features involved in the different embodiments of this application described below can be combined with each other as long as they do not conflict with each other.

[0027] Please see Figure 1 , Figure 2 and Figure 3The base station 100 includes a base station body 1, a water tank 2, and an atomizing mechanism 3. The base station body 1 is provided with a cleaning chamber 11 and a connecting port 12. The connecting port 12 is connected to the cleaning chamber 11, and the cleaning chamber 11 is connected to the outside. The cleaning chamber 11 is configured to allow a cleaning robot 200 to enter, thereby facilitating the cleaning of the cleaning robot 200 by the base station 100. The water tank 2 is installed on the base station body 1, and the atomizing mechanism 3 is located on the base station body 1. The water inlet of the atomizing mechanism 3 is connected to the water tank 2, and the water outlet of the atomizing mechanism 3 is connected to the connecting port 12. The water tank 2 is used to store cleaning water. The water in the water tank 2 can flow through the atomizing mechanism 3, which heats and atomizes the water to form high-temperature water vapor. The high-temperature water vapor can enter the cleaning chamber 11 through the connecting port 12, thereby sterilizing the cleaning robot 200 in the cleaning chamber 11 at high temperature, which helps to improve the sterilization capability of the base station 100 for the cleaning robot 200.

[0028] The atomizing mechanism 3 mentioned above includes a heating component 31 and an atomizing component 32. The water inlet of the heating component 31 is connected to the water storage tank 2, the water inlet of the atomizing component 32 is connected to the water outlet of the heating component 31, and the water outlet of the atomizing component 32 is connected to the connecting port 12. The heating component 31 is used to heat the water to form high-temperature water, and the atomizing component 32 is used to atomize the heated water to form high-temperature water vapor. The high-temperature water vapor can diffuse from the connecting port 12 into the cleaning chamber 11, thereby sterilizing the cleaning robot 200 in the cleaning chamber 11 at high temperature, thereby improving the sterilization capability of the base station 100 for the cleaning robot 200. In this embodiment, the atomizing component 32 atomizes the high-temperature water to form water vapor, which is then diffused into the cleaning chamber 11 through the connecting port 12. Water vapor has a stronger diffusion ability than liquid. Therefore, when the cleaning robot 200 enters the cleaning chamber 11, the water vapor can diffuse to the surface of the cleaning robot 200, thereby achieving high-temperature sterilization of the cleaning robot 200, which is beneficial to improving the sterilization ability of the base station 100.

[0029] In some embodiments, the atomizing mechanism 3 further includes a valve 33, which is disposed between the heating component 31 and the water storage tank 2. The valve 33 is used to open or close the fluid channel between the heating component 31 and the water storage tank 2, thereby controlling the flow of water in the water storage tank 2. When it is necessary to perform high-temperature sterilization on the cleaning robot 200 in the cleaning chamber 11, the valve 33 can be opened, allowing the water in the water storage tank 2 to flow into the heating component 31 for heating, and then flow into the atomizing component 32 to atomize and form high-temperature water vapor. The water vapor diffuses into the cleaning chamber 11 through the connecting port 12, thereby performing high-temperature sterilization on the cleaning robot 200 in the cleaning chamber 11. When it is not necessary to sterilize the cleaning robot 200 in the cleaning chamber 11, the valve 33 can be closed, thereby reducing the risk of water leakage from the water storage tank 2.

[0030] In some embodiments, the atomizing mechanism 3 further includes a water pump 34, which is disposed between the valve 33 and the heating component 31. The water pump 34 drives the flow of water so that water can flow from the water storage tank 2 to the heating component 31 for heating, and then flow to the atomizing component 32 for atomization. In this embodiment, by providing the water pump 34, the water flow rate can be controlled, thereby controlling the atomization speed of the water by the atomizing component 32. This helps reduce the risk of insufficient sterilization effect due to too low a water flow rate, and also helps reduce the risk of water overflowing directly from the atomizing component 32 due to too high a water flow rate.

[0031] It is understandable that in some implementations, the water pump 34 may not be required. Specifically, the water storage tank 2 is positioned above the atomizing mechanism 3, so that when the valve 33 is opened, the water in the water storage tank 2 can enter the heating component 31 for heating under gravity, and then enter the atomizing component 32 to atomize and form water vapor. In this embodiment, the water pump 34 is not required, which simplifies the structure of the base station 100 and saves costs.

[0032] In some embodiments, the atomizing mechanism 3 further includes several pipes 4, and the valve 33 and the water storage tank 2, the water pump 34 and the valve 33, the heating component 31 and the water pump 34, and the atomizing component 32 and the heating component 31 are respectively connected through at least one pipe 4, so that water can flow from the water storage tank 2 through the valve 33, the water pump 34, and the heating component 31 in sequence into the atomizing component 32 for atomization.

[0033] Please refer to the figure in the relevant technology. Figure 6 The cleaning robot 200 is typically equipped with at least two mops 201. After cleaning the floor, the mops 201 easily become contaminated with bacteria; therefore, the base station 100 needs to sterilize the mops 201. To achieve this objective, in some embodiments, please refer to... Figure 1 , Figure 3 and Figure 4 The base station body 1 is provided with at least two connecting ports 12, one connecting port 12 corresponding to a mop 201 of the cleaning robot 200, that is, the two connecting ports 12 are respectively facing the two mops 201. The atomizing mechanism 3 includes at least two atomizing components 32, both of which are connected to the water outlet of the heating component 31, and one atomizing component 32 is connected to one connecting port 12, so that the high-temperature water vapor produced by the two atomizing components 32 can diffuse into the cleaning chamber 11 through the corresponding connecting port 12, thereby sterilizing the cleaning robot 200 in the cleaning chamber 11. In this embodiment, by setting the connecting port 12 to face the mop 201, the high-temperature water vapor can be directly sprayed onto the mop 201, thereby sterilizing the mop 201 at high temperature, and thus improving the sterilization capability of the base station 100 on the mop 201.

[0034] In some embodiments, please refer to Figure 1 The atomizing mechanism 3 also includes a three-way pipe 5, which has a first end 51, a second end 52 and a third end 53 that are interconnected. The first end 51 is connected to the heating component 31, the second end 52 is connected to one of the atomizing components 32 and the third end 53 is connected to the other atomizing component 32, so that the three-way pipe 5 can allow the high-temperature water generated by the heating component 31 to flow into the two atomizing components 32 for atomization.

[0035] For the atomizing component 32 mentioned above, please refer to... Figure 4 and Figure 5 The atomizing component 32 includes an atomizing bracket 321, an atomizing plate 322, and a retaining ring 323. The atomizing bracket 321 is fixed to the connecting port 12. The atomizing bracket 321 is provided with a mounting groove 3211 and a liquid channel 3212. One end of the liquid channel 3212 is connected to the water outlet of the heating component 31, and the mounting groove 3211 is connected to the other end of the liquid channel 3212, so that the high-temperature water produced by the heating component 31 can enter the liquid channel 3212. The atomizing plate 322 is disposed in the mounting groove 3211 and is used to atomize the water flowing through the mounting groove 3211 to form water vapor. The retaining ring 323 is installed on the atomizing bracket 321 and covers a portion of the mounting groove 3211 so that the retaining ring 323 can prevent the atomizing plate 322 from detaching from the mounting groove 3211.

[0036] In some embodiments, the atomizing plate 322 is provided with atomizing holes 3221, and the water vapor generated by the atomizing plate 322 can diffuse from the atomizing holes 3221 into the cleaning chamber 11.

[0037] In some embodiments, the atomizing assembly 32 further includes a sealing ring 324, which is generally annular, and the atomizing plate 322 is snapped into the sealing ring 324. The sealing ring 324 is disposed in the mounting groove 3211, with one end of the sealing ring 324 abutting against the bottom of the mounting groove 3211. A retaining ring 323 is at least partially received in the mounting groove 3211, and the portion of the retaining ring 323 received in the mounting groove 3211 abuts against the other end of the sealing ring 324, thereby fixing the sealing ring 324 and the atomizing plate 322 within the mounting groove 3211. In this embodiment, by providing the sealing ring 324, the risk of water leakage in the atomizing assembly 32 can be reduced.

[0038] In some embodiments, the inner sidewall of the sealing ring 324 is provided with a groove 3241, and the atomizing plate 322 is engaged in the groove 3241, thereby realizing the engagement and fixation between the sealing ring 324 and the atomizing plate 322.

[0039] In some embodiments, the retaining ring 323 includes an abutment portion 3231 and a stepped portion 3232. The diameter of the stepped portion 3232 is larger than the diameter of the abutment portion 3231. One end of the abutment portion 3231 is connected to the stepped portion 3232. The abutment portion 3231 is received within the mounting groove 3211. The end of the abutment portion 3231 away from the stepped portion 3232 abuts against the sealing ring 324, thereby fixing the sealing ring 324 within the mounting groove 3211. The abutment portion 3231 and the mounting groove 3211 can be bonded and fixed together with an adhesive, or they can be fixed together by an interference fit. This application does not limit the fixing method between the retaining ring 323 and the atomizing bracket 321.

[0040] In some embodiments, the retaining ring 323 is provided with a through hole 3233, which penetrates the abutment portion 3231 and the stepped portion 3232. The through hole 3233 communicates with the mounting groove 3211 so that the water vapor generated by the atomizing plate 322 can diffuse from the through hole 3233 into the cleaning chamber 11.

[0041] In this embodiment, by setting a heating component 31 and an atomizing component 32, the water inlet of the heating component 31 is connected to the water storage tank 2, the water inlet of the atomizing component 32 is connected to the water outlet of the heating component 31, and the water outlet of the atomizing component 32 is connected to the heating component 31. The heating component 31 is used to heat the water, and the atomizing component 32 is used to atomize the water. Therefore, after the water is heated by the heating component 31, high-temperature water is formed. Then, the high-temperature water is atomized by the atomizing component 32 to form high-temperature water vapor. The high-temperature water vapor diffuses into the cleaning chamber 11 through the connecting port 12, thereby sterilizing the cleaning robot 200 at high temperature, which is beneficial to improving the sterilization capability of the base station 100 on the mop 201 of the cleaning robot 200.

[0042] This application also provides an embodiment of a cleaning system, which includes a cleaning robot 200 and the aforementioned base station 100. The cleaning robot 200 is equipped with a mop 201, and can clean the floor by driving the mop 201 to rotate. The cleaning robot 200 can enter the cleaning chamber 11 of the base station 100, where the base station 100 can sterilize and clean the mop 201 of the cleaning robot 200 so that the cleaning robot 200 can continue to perform cleaning tasks.

[0043] The above description is merely an embodiment of this application and does not limit the patent scope of this application. Any equivalent structural or procedural transformations made using the content of this application's specification and drawings, or direct or indirect applications in other related technical fields, are similarly included within the patent protection scope of this application.

Claims

1. A base station, characterized in that, include: The base station body is provided with a cleaning chamber and a connecting port, and the connecting port is connected to the cleaning chamber; The water storage tank is located on the base station itself; The atomizing mechanism includes a heating component and an atomizing component. The water inlet of the heating component is connected to the water storage tank, the water inlet of the atomizing component is connected to the water outlet of the heating component, and the water outlet of the atomizing component is connected to the connecting port. The heating component is used to heat the water, and the atomizing component is used to atomize the water.

2. The base station according to claim 1, characterized in that, The atomizing mechanism also includes a valve, which is disposed between the heating component and the water storage tank.

3. The base station according to claim 2, characterized in that, The atomizing mechanism also includes a water pump, which is disposed between the valve and the heating component.

4. The base station according to claim 3, characterized in that, The atomizing mechanism also includes several pipes, and the valve and the water storage tank, the water pump and the valve, the heating component and the water pump, and the atomizing component and the heating component are respectively connected through at least one of the pipes.

5. The base station according to any one of claims 1-4, characterized in that, The base station body is provided with at least two communication ports, both of which are connected to the cleaning chamber. The atomizing mechanism includes at least two atomizing components, both of which are connected to the heating component, and one atomizing component is connected to a communication port.

6. The base station according to claim 5, characterized in that, The atomizing mechanism also includes a three-way tube, the first end of which is connected to the heating component, the second end of which is connected to one of the atomizing components, and the third end of which is connected to the other atomizing component.

7. The base station according to claim 1, characterized in that, The atomizing assembly includes an atomizing bracket, an atomizing plate, and a retaining ring. The atomizing bracket is disposed at the communication port and has an installation groove and a liquid channel. The installation groove communicates with the liquid channel, and the liquid channel communicates with the heating assembly. The atomizing plate is disposed in the installation groove, and the retaining ring is mounted on the atomizing bracket. The retaining ring is configured to prevent the atomizing plate from detaching from the installation groove.

8. The base station according to claim 7, characterized in that, The atomizing component also includes a sealing ring, the atomizing plate is fitted inside the sealing ring, the sealing ring is disposed in the mounting groove, the fixing ring is at least partially received in the mounting groove, and the fixing ring abuts against the sealing ring.

9. The base station according to claim 8, characterized in that, The sealing ring is provided with a groove, and the atomizing plate is engaged in the groove.

10. A cleaning system, characterized in that, The system includes a cleaning robot and a base station as described in any one of claims 1-9, wherein the cleaning robot can enter the cleaning chamber and the base station is configured to sterilize and clean the mop of the cleaning robot.

Images