A device for protecting a flatness measuring machine stage probe
By designing a protective cover and gas delivery system on the probe of the flatness measurement machine, clean gas is sprayed to protect the probe, solving the problem of environmental pollution affecting the probe, improving the accuracy and stability of data, and enhancing the product quality of wafer manufacturing plants.
Patent Information
- Authority / Receiving Office
- CN · China
- Patent Type
- Utility models(China)
- Current Assignee / Owner
- WAFER WORKS ZHENGZHOU CORP
- Filing Date
- 2025-07-17
- Publication Date
- 2026-07-10
AI Technical Summary
The probes of existing flatness measurement machines are easily corroded by environmental dust and chemical gases, affecting the accuracy and stability of the measurement data.
Design a device that includes a protective cover and a gas delivery system. Clean gas is injected into the protective cover through a nozzle to form a stable protective environment. The protective cover is adapted to the probe, the nozzle is tilted downward to spray, and a filter assembly is used to ensure the cleanliness of the gas.
It effectively protects the probe from dust and chemical gas interference, maintains the normal operation of the equipment, improves the accuracy and stability of measurement data, and enhances the quality of wafer products.
Smart Images

Figure CN224475444U_ABST