A device for protecting a flatness measuring machine stage probe

By designing a protective cover and gas delivery system on the probe of the flatness measurement machine, clean gas is sprayed to protect the probe, solving the problem of environmental pollution affecting the probe, improving the accuracy and stability of data, and enhancing the product quality of wafer manufacturing plants.

CN224475444UActive Publication Date: 2026-07-10WAFER WORKS ZHENGZHOU CORP

Patent Information

Authority / Receiving Office
CN · China
Patent Type
Utility models(China)
Current Assignee / Owner
WAFER WORKS ZHENGZHOU CORP
Filing Date
2025-07-17
Publication Date
2026-07-10

AI Technical Summary

Technical Problem

The probes of existing flatness measurement machines are easily corroded by environmental dust and chemical gases, affecting the accuracy and stability of the measurement data.

Method used

Design a device that includes a protective cover and a gas delivery system. Clean gas is injected into the protective cover through a nozzle to form a stable protective environment. The protective cover is adapted to the probe, the nozzle is tilted downward to spray, and a filter assembly is used to ensure the cleanliness of the gas.

Benefits of technology

It effectively protects the probe from dust and chemical gas interference, maintains the normal operation of the equipment, improves the accuracy and stability of measurement data, and enhances the quality of wafer products.

✦ Generated by Eureka AI based on patent content.

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    Figure CN224475444U_ABST
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Abstract

The utility model discloses a device for flatness measurement machine table measuring head protection, including the protection cover and gas delivery system of lower end opening, the protection cover is used to cover flatness measurement machine table measuring head downwards, gas delivery system includes gas delivery pipeline, the nozzle of being located gas delivery pipeline terminal and the filter component of being located nozzle upstream, the nozzle is used to the clean gas injection of inside protection cover. This application is through setting up the protection cover of covering measuring head and gas delivery system, through the continuous injection of clean gas in the protection cover of gas delivery system, provides clean, stable environment for machine table measuring head, makes measuring head exempt from environmental dust, chemical gas interference, and this mode does not influence the normal operation of measuring head, makes machine table always be in normal working state, improves flatness measurement machine table measurement data accuracy, accuracy and stability, has important technical value to improve wafer product quality in wafer foundry.
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