Micro-hole array etching liquid uniform distribution device

By designing a micropore array etching solution uniform distribution device with a shaking and filtering mechanism, the problems of uneven etching solution distribution and poor fluidity were solved, achieving uniform dispersion and improved fluidity of the etching solution, thereby improving the etching quality of the micropore array.

CN224541577UActive Publication Date: 2026-07-24DONGGUAN FUNA HARDWARE PRODUCTS CO LTD
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Patent Information

Application Number
CN202521855281.9
Authority / Receiving Office
CN · China
Patent Type
Utility models(China)
Current Assignee / Owner
Filing Date
2025-08-29
Publication Date
2026-07-24
Estimated Expiration
2035-08-29

AI Technical Summary

Technical Problem

The uneven distribution and poor fluidity of existing micro-orifice array etching solutions lead to uneven etching, affecting the consistency and function of the micro-orifice array.

Method used

A micropore array etching solution uniform distribution device was designed, which includes a shaking and uniform distribution mechanism and a filtration and diversion mechanism. The flowability and uniformity of the etching solution are improved by shaking and filtration, and the uniform dispersion of the etching solution is achieved by using an electrically controlled telescopic rod and a flow divider.

Benefits of technology

It improves the uniformity and fluidity of the etching solution, enhances the etching effect, avoids problems such as uneven etching and impurity accumulation, and improves the quality and consistency of the micro-hole array.

✦ Generated by Eureka AI based on patent content.

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Abstract

The utility model relates to micro -hole array etching liquid even distribution device technical field, and disclose a kind of micro -hole array etching liquid even distribution device, including etching container, the screw cap of etching container upper side sealing arrangement and the etching piece of etching container inside arrangement, the etching container lower side is provided with shaking even mechanism, the filter drainage mechanism is provided in the etching container, the shaking even mechanism includes base, the base is set in etching container lower side, the base upper surface is fixedly connected with multiple supports, the side of the support similar is all fixedly connected with rotary table, multiple rotary table outer wall is rotatably connected with collar, the filter drainage mechanism is used to filter the impurity in etching container interior and strengthen liquid fluidity, to improve etching uniformity and effectively discharge impurity, the shaking even mechanism is used to shake etching container whole, to make liquid can have better fluidity and uniformity.
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Description

Technical Field

[0001] This utility model relates to the technical field of micropore array etching solution uniform distribution device, specifically a micropore array etching solution uniform distribution device. Background Technology

[0002] Etching techniques in microelectronics or precision machining are mainly divided into wet etching (which utilizes a chemical solution to selectively dissolve the material) and dry etching (such as plasma etching, which uses high-energy particles or active groups to physically bombard or chemically remove the material). In manufacturing scenarios requiring large-area, high-density processing, such as micro-hole arrays, wet etching is widely used due to its relatively simple process, low cost, and suitability for batch processing. The key to achieving high-quality micro-hole arrays lies in ensuring the uniform distribution and good flowability of the etching solution on the workpiece surface (i.e., uniform distribution). This typically involves the formulation design containing specific etchants (such as fluorinated acids) and surfactants. Uneven distribution or poor flowability of the etching solution can easily lead to localized differences in reaction rates, resulting in fatal defects such as inconsistent micro-hole depths, pore diameter deviations, and even pore wall adhesion, severely affecting the consistency and functionality of the array.

[0003] Existing conventional etching processes typically involve coating the workpiece surface with an anti-corrosion film, then etching the pattern to be etched onto the surface, and finally immersing it in a solution bath to etch away the unprotected parts. Although this operation is simple, once the etching solution penetrates deep into the workpiece, the lack of fluidity in the solution reduces the corrosiveness of the etching solution at deeper levels, leading to uneven etching. Furthermore, untreated impurities generated during etching also reduce the etching effect and affect the quality of the etching process. Utility Model Content

[0004] The purpose of this invention is to provide a micropore array etching solution uniform distribution device to solve the problems mentioned in the background art.

[0005] To achieve the above objectives, this utility model provides the following technical solution: a micropore array etching solution uniform distribution device, comprising an etching container, a screw cap sealed on the upper side of the etching container, and an etching component disposed inside the etching container, wherein a shaking uniform distribution mechanism is disposed on the lower side of the etching container, and a filtering and diversion mechanism is disposed inside the etching container.

[0006] The shaking and even-shaking mechanism includes a base disposed on the lower side of the etching container. Multiple supports are fixedly connected to the upper surface of the base. Turntables are fixedly connected to adjacent sides of the supports. A collar is rotatably connected to the outer wall of the multiple turntables. Multiple rotating rods are fixedly connected to the outer wall of the etching container. The rotating rods are rotatably connected inside the collars. An electrically controlled telescopic rod is fixedly connected to the lower side of the etching container. A connecting rod is fixedly connected to the lower surface of the electrically controlled telescopic rod. A shaking motor is fixedly connected to the upper surface of the base. A crank is fixedly connected to the output end of the motor. The crank is rotatably connected to the connecting rod.

[0007] Preferably, the etching container is inclined to the base.

[0008] Preferably, a protective shell is fixedly connected to the outside of the shaking motor.

[0009] Preferably, the filtration and diversion mechanism includes a piston disc, which is slidably and sealed inside the etching container. Multiple rubber supports are slidably connected inside the etching container. Spacers are fixedly connected to both the upper and lower sides of each rubber support. The rubber supports are arranged layer by layer on the upper side of the piston disc. A flow divider is provided between the lower rubber supports and the upper side of the piston disc. The flow divider is slidably connected to the inner wall of the etching container. A filter box is fixedly connected to the lower surface of the piston disc. The lower surface of the filter box is fixedly connected to the output end of the electrically controlled telescopic rod. A positively convex barrier plate is slidably connected to the inner wall of the filter box. A spring is fixedly connected to the lower surface of the convex barrier plate. The spring is fixedly connected to the upper interior of the filter box. A filter element is fixedly connected to the middle of the filter box. Multiple one-way connecting pipes are provided between the lower interior of the filter box and the upper side of the piston disc.

[0010] Preferably, a connecting slot is provided between the upper interior of the filter box and the upper interior of the piston plate, and the convex-shaped barrier plate is slidably connected inside the connecting slot.

[0011] Preferably, an annular cylindrical structure is fixedly connected to the upper side of the filter box, and the outer diameter of the convex barrier plate is smaller than the inner diameter of the cylindrical structure.

[0012] Preferably, each of the unidirectional connecting pipes is equipped with a unidirectional valve structure that allows one-way access into the etching container.

[0013] Compared with the prior art, the present invention provides a micropore array etching solution uniform distribution device, which has the following beneficial effects:

[0014] 1. The filtration and diversion mechanism is used to filter impurities inside the etching container and enhance liquid flow. It consists of two independent chambers: the upper space inside the etching container and the filter box. The mechanism uses the extension and retraction of an electrically controlled telescopic rod to control the extraction and release of liquid inside the filter box, thereby achieving the effect of filtration and mixing of liquid flow. At the same time, it works with a flow divider to evenly disperse the etching solution. This design makes it easier to homogenize the consumed etching solution, maintain a balanced etching solution concentration, thereby improving etching uniformity and effectively removing impurities.

[0015] 2. The shaking and homogenizing mechanism is used to shake the entire etching container. This mechanism helps to improve the fluidity of the liquid and, with the help of the centrifugal force of the liquid and the suction of the filtration and diversion mechanism, forms a multiple mixing effect, thereby enabling the liquid to have better fluidity and homogenization. Attached Figure Description

[0016] To more clearly illustrate the technical solutions in the embodiments of this utility model, the drawings used in the description of the embodiments will be briefly introduced below. Obviously, the drawings described below are only some embodiments of this utility model. For those skilled in the art, other drawings can be obtained based on these drawings without creative effort.

[0017] Figure 1 This is a schematic diagram of the structure of this utility model;

[0018] Figure 2 This is a structural schematic diagram from another perspective of the present invention;

[0019] Figure 3 This is a schematic diagram of a half-section of the present invention;

[0020] Figure 4 This is a schematic diagram of the base structure in this utility model;

[0021] Figure 5 This is a schematic diagram of the structure of the convex character barrier plate in this utility model.

[0022] In the diagram: 1. Etched container; 2. Shaking and homogenizing mechanism; 201. Base; 202. Support; 203. Turntable; 204. Collar; 205. Rotating rod; 206. Electrically controlled telescopic rod; 207. Connecting rod; 208. Shaking motor; 209. Crank; 3. Filter diversion mechanism; 301. Piston disc; 302. Rubber support; 303. Septum; 304. Diverter plate; 305. Filter box; 306. T-shaped barrier plate; 307. Spring; 308. Filter element; 309. One-way connecting pipe; 4. Screw cap; 5. Etched element. Detailed Implementation

[0023] The technical solutions of the present utility model will be clearly and completely described below with reference to the accompanying drawings of the embodiments. Obviously, the described embodiments are only some embodiments of the present utility model, and not all embodiments. Based on the embodiments of the present utility model, all other embodiments obtained by those of ordinary skill in the art without creative effort are within the protection scope of the present utility model.

[0024] In this utility model, unless otherwise explicitly specified and limited, the terms "installation," "connection," "joining," and "fixing," etc., should be interpreted broadly. For example, they can refer to a fixed connection, a detachable connection, or an integral part; they can refer to a mechanical connection or an electrical connection; they can refer to a direct connection or an indirect connection through an intermediate medium; they can refer to the internal communication of two components or the interaction between two components. Those skilled in the art can understand the specific meaning of the above terms in this utility model according to the specific circumstances.

[0025] Example 1:

[0026] Please see Figure 1-5 This utility model provides a technical solution: a micropore array etching solution uniform distribution device, including an etching container 1, a screw cap 4 sealed on the upper side of the etching container 1, and an etching component 5 disposed inside the etching container 1. A shaking uniform distribution mechanism 2 is disposed on the lower side of the etching container 1, and a filtering and diversion mechanism 3 is disposed inside the etching container 1.

[0027] This mechanism is used to shake the etching container 1, which improves the fluidity of the solution. The shaking uniform mechanism 2 includes a base 201, which is located on the lower side of the etching container 1. Multiple supports 202 are fixedly connected to the upper surface of the base 201. Turntables 203 are fixedly connected to the adjacent sides of the supports 202. A collar 204 is rotatably connected to the outer wall of the multiple turntables 203. Multiple rotating rods 205 are fixedly connected to the outer wall of the etching container 1. The rotating rods 205 are rotatably connected inside the collar 204. An electrically controlled telescopic rod 206 is fixedly connected to the lower side of the etching container 1. A connecting rod 207 is fixedly connected to the lower surface of the electrically controlled telescopic rod 206. A shaking motor 208 is fixedly connected to the upper surface of the base 201. A crank 209 is fixedly connected to the output end of the motor. The crank 209 is rotatably connected to the connecting rod 207.

[0028] Furthermore, the etching container 1 and the base 201 are set at an angle.

[0029] Furthermore, a protective shell is fixedly connected to the outside of the rocking motor 208.

[0030] Example 2:

[0031] This mechanism is used for filtering and channeling the etching solution, improving liquid flow and cleaning effect. Please refer to [link / reference needed]. Figure 1-5 Furthermore, in conjunction with Embodiment 1, the filter diversion mechanism 3 includes a piston disc 301, which is slidably and sealingly connected to the inside of the etching container 1. Multiple rubber supports 302 are slidably connected inside the etching container 1. Spacing pads 303 are fixedly connected to both the upper and lower sides of each rubber support 302. The rubber supports 302 are arranged layer by layer on the upper side of the piston disc 301. A flow divider 304 is provided between the lower rubber supports and the upper side of the piston disc 301. The flow divider 304 is slidably connected to the inner wall of the etching container 1. A filter box 305 is fixedly connected to the lower surface of the disc 301. The lower surface of the filter box 305 is fixedly connected to the output end of the electrically controlled telescopic rod 206. A positively oriented convex-shaped baffle plate 306 is slidably connected to the inner wall of the filter box 305. A spring 307 is fixedly connected to the lower surface of the convex-shaped baffle plate 306. The spring 307 is fixedly connected to the upper inside of the filter box 305. A filter element 308 is fixedly connected to the middle of the filter box 305. Multiple one-way connecting pipes 309 are provided in the lower inside of the filter box 305 and communicating with the upper part of the piston plate.

[0032] Furthermore, a connecting slot is provided between the upper interior of the filter box 305 and the upper interior of the piston plate, and the convex-shaped barrier plate 306 is slidably connected inside the connecting slot.

[0033] Furthermore, an annular cylindrical structure is fixedly connected to the upper side of the filter box 305, and the outer diameter of the convex barrier plate 306 is smaller than the inner diameter of the cylindrical structure.

[0034] Furthermore, each of the one-way connecting pipes 309 is equipped with a one-way valve structure that allows one-way access into the etching container 1.

[0035] In actual operation, when this device is used, the user opens the cap 4, then places the diverter plate 304 into the etching container 1 and installs the etching component 5 into the rubber support 302. The user then sequentially places multiple rubber supports 302 and etching components 5 into the etching container 1. Next, the user injects etching fluid into the etching container 1 and starts the shaking motor 208 and the electrically controlled telescopic rod 206. The shaking motor 208 drives the crank 209, causing the outer shell of the electrically controlled telescopic rod 206 to move the etching container 1 around the support 2. 02 The inner side rotates in a circular motion. At the same time, the extension of the electrically controlled telescopic rod 206 drives the piston disk 301 to move. When the piston disk 301 rises, the internal space of the etching container 1 decreases, and the etching solution is pushed into the filter box 305. When the electrically controlled telescopic rod 206 retracts, the internal space of the etching container 1 increases, and a negative pressure is generated inside the etching container 1 to draw the solution inside the filter box 305 back into the etching container 1. The solution is diverted by the flow divider plate 304, so that the solution is uniformly mixed with the shaking effect.

[0036] It should be noted that, in this document, relational terms such as "first" and "second" are used only to distinguish one entity or operation from another, and do not necessarily require or imply any such actual relationship or order between these entities or operations. Furthermore, the terms "comprising," "including," or any other variations thereof are intended to cover non-exclusive inclusion, such that a process, method, article, or apparatus that comprises a list of elements includes not only those elements but also other elements not expressly listed, or elements inherent to such a process, method, article, or apparatus. Without further limitations, an element defined by the phrase "comprising one..." does not exclude the presence of other identical elements in the process, method, article, or apparatus that includes said element.

Claims

1. A micropore array etching solution uniform distribution device, comprising an etching container (1), a screw cap (4) sealed on the upper side of the etching container (1), and an etching element (5) disposed inside the etching container (1), characterized in that: The etching container (1) is provided with a shaking and equalization mechanism (2) on its lower side, and a filter and drainage mechanism (3) is provided inside the etching container (1). The shaking and even mechanism (2) includes a base (201), which is located on the lower side of the etching container (1). Multiple supports (202) are fixedly connected to the upper surface of the base (201). Turntables (203) are fixedly connected to the adjacent sides of the supports (202). A collar (204) is rotatably connected to the outer wall of the multiple turntables (203). Multiple rotating rods (205) are fixedly connected to the outer wall of the etching container (1). The rotating rods (205) are rotatably connected inside the collar (204). An electrically controlled telescopic rod (206) is fixedly connected to the lower side of the etching container (1). A connecting rod (207) is fixedly connected to the lower surface of the electrically controlled telescopic rod (206). A shaking motor (208) is fixedly connected to the upper surface of the base (201). A crank (209) is fixedly connected to the output end of the motor. The crank (209) is rotatably connected to the connecting rod (207).

2. The micropore array etching solution uniform distribution device according to claim 1, characterized in that: The etching container (1) is inclined to the base (201).

3. The micropore array etching solution uniform distribution device according to claim 1, characterized in that: The rocking motor (208) is fixedly connected to a protective shell on the outside.

4. The micropore array etching solution uniform distribution device according to claim 1, characterized in that: The filter diversion mechanism (3) includes a piston disc (301), which is slidably and sealed inside the etching container (1). Multiple rubber supports (302) are slidably connected inside the etching container (1). Spacing pads (303) are fixedly connected to both the upper and lower sides of each rubber support (302). The rubber supports (302) are arranged layer by layer on the upper side of the piston disc (301). A flow divider (304) is provided between the lower rubber supports and the upper side of the piston disc (301). The flow divider (304) is slidably connected to the inner wall of the etching container (1). A filter box (305) is fixedly connected to the lower surface of the filter box (305). The lower surface of the filter box (305) is fixedly connected to the output end of the electrically controlled telescopic rod (206). A positively convex partition plate (306) is slidably connected to the inner wall of the filter box (305). A spring (307) is fixedly connected to the lower surface of the convex partition plate (306). The spring (307) is fixedly connected to the upper side of the filter box (305). A filter element (308) is fixedly connected to the middle of the filter box (305). Multiple one-way connecting pipes (309) are provided in the lower side of the filter box (305) and the upper side of the piston plate.

5. The micropore array etching solution uniform distribution device according to claim 4, characterized in that: A connecting slot is provided between the upper interior of the filter box (305) and the upper interior of the piston plate, and the convex barrier plate (306) is slidably connected inside the connecting slot.

6. The micropore array etching solution uniform distribution device according to claim 4, characterized in that: The filter box (305) is fixedly connected to an annular cylindrical structure on its upper side, and the outer diameter of the convex barrier plate (306) is smaller than the inner diameter of the cylindrical structure.

7. The micropore array etching solution uniform distribution device according to claim 4, characterized in that: Each of the one-way connecting pipes (309) is equipped with a one-way valve structure that allows one-way access into the etching container (1).