Dismountable positioned ion beam polishing sample stage apparatus
By improving the adjustable base and tray structure of the sample stage, precise positioning of the sample surface and the ion beam center was achieved during ion beam polishing, solving the problem of inaccurate positioning in existing technologies and improving polishing effect and efficiency.
Patent Information
- Authority / Receiving Office
- CN · China
- Patent Type
- Utility models(China)
- Current Assignee / Owner
- CHANGZHOU LONGSKEPU ELECTRONIC TECH CO LTD
- Filing Date
- 2025-07-31
- Publication Date
- 2026-07-24
AI Technical Summary
In existing ion beam polishing technology, the positioning of the sample stage is not precise enough, which makes it difficult to align the center of the ion beam with the center of the sample, affecting the polishing effect and efficiency.
An adjustable sample base and tray are used. The precise positioning of the sample surface and the center of the ion beam is achieved through the cooperation of the lifting rod, locking screw and pushing screw. The position of the sample stage is adjusted by the annular convex block and pushing screw of the positioning fixture to ensure that the ion beam emission center is aligned with the center of the sample surface.
This improved the positioning accuracy of the polished sample surface to the micrometer level, thereby enhancing the precision of ion beam polishing and the working efficiency of the equipment.
Smart Images

Figure CN224543998U_ABST