A secondary ion mass spectrometry device

Abstract

The utility model provides a kind of secondary ion mass spectrum analysis device, comprising: entrance slit subassembly, entrance slit subassembly includes: bottom plate, first drive component and second drive component, bottom plate is configured in the first direction along first panel subassembly and second panel subassembly of the activity connection of bottom plate both sides with bottom plate, first panel subassembly and second panel subassembly form the slit extending along vertical direction between it;First drive component is configured as the first panel subassembly and second panel subassembly are driven in the first direction on bottom plate and move towards each other and / or move away, to adjust the width of slit along the first direction;Second drive component is configured as the bottom plate is driven along vertical direction moves.The secondary ion mass spectrum analysis device disclosed in the utility model realizes the standby area of slit to be switched quickly without breaking the vacuum environment, effectively avoids the mass resolution decline caused by slit abrasion, while greatly improves the test efficiency and the continuous operation ability of device.

Description

Technical Field

[0001] This utility model relates to the field of detection equipment technology, and in particular to a secondary ion mass spectrometry analysis device. Background Technology

[0002] The contrast aperture (CA) is one of the core components of the ion optics system in a secondary ion mass spectrometer (SIMS). The contrast aperture uses the geometric confinement of its physical aperture to initially screen secondary ions based on their energy and emission angle. The entrance slit, located after the contrast aperture, uses physical confinement to screen ions, allowing only ions with specific energies and angles to pass through, thus ensuring precise control of mass resolution.

[0003] However, when a certain bombardment area of ​​the entrance slit assembly in the existing dynamic secondary ion mass spectrometry analysis equipment is damaged due to continuous bombardment by secondary ions, it is difficult to quickly switch to other backup areas of the slit. It is necessary to break the vacuum environment and replace the entrance slit assembly, which is not only time-consuming but also interrupts the experimental process.

[0004] It should be noted that the above description of the background technology is only for the purpose of providing a clear and complete explanation of the technical solution of this utility model and facilitating understanding by those skilled in the art. It should not be assumed that the above technical solutions are known to those skilled in the art simply because they have been described in the background technology section of this utility model. Utility Model Content

[0005] The purpose of this invention is to disclose a secondary ion mass spectrometry analysis device to solve many defects in the inlet slit assembly of the prior art, especially to achieve rapid switching of the slit's backup area without breaking the vacuum environment.

[0006] To achieve the above objectives, this utility model provides a secondary ion mass spectrometry analysis device, comprising: an inlet slit assembly, wherein the inlet slit assembly includes:

[0007] A base plate, a first panel assembly and a second panel assembly disposed on both sides of the base plate along a first direction and movably connected to the base plate, wherein a slit extending in a vertical direction is formed between the first panel assembly and the second panel assembly;

[0008] A first drive assembly is configured to drive the first panel assembly and the second panel assembly to move toward each other and / or away from each other on the base plate along the first direction to adjust the width of the slit along the first direction.

[0009] The second drive component is configured to drive the base plate to move in a vertical direction.

[0010] As a further improvement of this utility model, the first panel assembly includes: a first support plate and a first panel, the first support plate being movably connected to the base plate, and the first panel being disposed at the end of the first support plate away from the base plate;

[0011] The second panel assembly includes: a second support plate and a second panel, wherein the second support plate is movably connected to the base plate, and the second panel is disposed at the end of the second support plate away from the base plate;

[0012] The first panel and the second panel are arranged opposite to each other and spaced apart along a first direction, the gap between the first panel and the second panel forms the slit, and the sidewalls of the first panel and the second panel opposite to each other form the boundary of the slit.

[0013] As a further improvement of this utility model, the first driving component includes: a transmission block disposed between the first support plate and the second support plate, a driving unit for driving the transmission block to move in a vertical direction, and a first elastic unit arranged along the first direction and connected at both ends to the first support plate and the second support plate respectively.

[0014] The first elastic unit is in a pre-stretched state, and the sidewalls opposite to the first support plate and the second support plate are constructed with driven inclined surfaces. The transmission block forms guide inclined surfaces that are complementary to the driven inclined surfaces along the two sidewalls of the first direction. The driven inclined surfaces and the guide inclined surfaces are in sliding contact.

[0015] As a further improvement of this utility model, the driven inclined plane forms an acute or obtuse angle with the horizontal plane.

[0016] As a further improvement of this utility model, the entrance slit assembly further includes: a slide rail, a guide plate, and a slider. The guide plate is disposed at one end of the transmission block extending past the driven inclined surface. The slide rail is disposed on the side of the first support plate and the second support plate facing the guide plate. The slider is disposed on both sides of the guide plate and slides in cooperation with the slide rail. The extension direction of the slide rail is the same as the inclination angle of the driven inclined surface.

[0017] As a further improvement of this utility model, the entrance slit assembly further includes a linear guide rail mechanism, wherein the first support plate and the second support plate are slidably connected to the base plate through the linear guide rail mechanism, the first panel is detachably connected to the first support plate, and the second panel is detachably connected to the second support plate.

[0018] As a further improvement of this utility model, the secondary ion mass spectrometry analysis device further includes: a first deflection unit and a second deflection unit disposed on the upstream side of the slit along the transmission path of the secondary ions; the first deflection unit and the second deflection unit are disposed opposite each other in the vertical direction so that the transmission path of the secondary ions is vertically deflected.

[0019] As a further improvement of this utility model, the secondary ion mass spectrometry analysis device further includes: a third deflection unit and a fourth deflection unit disposed on the downstream side of the slit along the transmission path of the secondary ions; the third deflection unit and the fourth deflection unit are disposed opposite each other in the vertical direction so that the transmission path of the secondary ions is recalibrated to the predetermined transmission path.

[0020] As a further improvement of this utility model, the secondary ion mass spectrometry analysis device further includes a contrast aperture assembly, wherein the aperture aperture assembly includes an aperture aperture for screening secondary ions, and the entrance slit assembly is disposed on the emission path of the aperture aperture for screening secondary ions emitted from the aperture aperture.

[0021] As a further improvement of this utility model, the secondary ion mass spectrometry analysis device further includes an ion source, which is used to generate primary ions and direct them toward the sample to be tested to generate the secondary ions; the contrast aperture assembly is disposed on the emission path of the secondary ions emitted from the sample to be tested.

[0022] Compared with the prior art, the beneficial effects of this utility model are as follows: When the local bombardment area of ​​the slit in the secondary ion transmission path is damaged, the second driving component drives the base plate to move vertically upward or downward, causing the slit to shift relative to the secondary ion transmission path, thereby switching the bombardment position from the current bombardment area to the backup area, so that the backup area of ​​the slit is aligned with the secondary ion transmission path, realizing the rapid use of other backup areas on the slit, effectively avoiding the problem of decreased mass resolution due to slit wear, improving the overall utilization rate of the slit, extending the service life of the slit, and eliminating the need to break the vacuum environment. This solves the problem in existing inlet slit components where the performance of the local slit area deteriorates due to secondary ion bombardment wear, requiring the breaking of the vacuum environment for replacement. It does not require interruption of testing, improving testing efficiency and the long-term operational stability and economy of the secondary ion mass spectrometry analysis device. Attached Figure Description

[0023] Figure 1 This is an overall schematic diagram of the secondary ion mass spectrometry analysis device disclosed in this utility model;

[0024] Figure 2 This is a schematic diagram showing the connection between the first panel and the first support plate, and the connection between the second panel and the second support plate.

[0025] Figure 3 Schematic diagram of the driving block disposed between the first support plate and the second support plate, wherein the driven inclined surface forms an acute angle with the horizontal plane;

[0026] Figure 4 Schematic diagram of the slide rail disposed between the first support plate and the second support plate and the connection between the guide plate and the slider;

[0027] Figure 5 Schematic diagram of the change when the driving block moves upward in the vertical direction and the first support plate and the second support plate move away from each other on the bottom plate;

[0028] Figure 6 Schematic diagram of the first deflection unit and the second deflection unit disposed on the upstream side of the slit along the transmission path of the secondary ions, and the third deflection unit and the fourth deflection unit disposed on the downstream side of the slit along the transmission path of the secondary ions;

[0029] Figure 7 Schematic diagram of the driven inclined surface forming an obtuse angle with the horizontal plane. Specific embodiments

[0030] The present invention will be described in detail below in conjunction with the embodiments shown in the drawings. However, it should be noted that these embodiments are not limitations on the present invention, and any equivalent transformation or substitution in function, method, or structure made by those of ordinary skill in the art based on these embodiments shall fall within the protection scope of the present invention.

[0031] The drawings in the present invention are not strictly drawn according to the actual ratio, and the specific dimensions of each structure can be determined according to actual needs. The drawings described in the present invention are only schematic diagrams of the structure.

[0032] Please refer Figures 1 to 7 A specific embodiment of a secondary ion mass spectrometry analysis device disclosed.

[0033] Refer Figure 1 As shown Figure 1 As shown in the overall schematic diagram of the secondary ion mass spectrometry analysis device disclosed by the present invention. In this embodiment, the secondary ion mass spectrometry analysis device 1000 includes: an inlet slit assembly 100.

[0034] The entrance slit assembly 100 includes: a base plate 10, a first drive assembly 50, and a second drive assembly (not shown). The base plate 10 is disposed on both sides of the base plate 10 along a first direction X and is movably connected to the base plate 10 with a first panel assembly 20 and a second panel assembly 30. A slit 40 extending along the vertical direction Z is formed between the first panel assembly 20 and the second panel assembly 30. The first drive assembly 50 is configured to drive the first panel assembly 20 and the second panel assembly 30 to move towards each other and / or away from each other on the base plate 10 along the first direction X, so as to adjust the width of the slit 40 along the first direction X. The second drive assembly is configured to drive the base plate 10 to move along the vertical direction Z.

[0035] The entrance slit assembly 100 can not only achieve precise displacement in the first direction X, but also move in the vertical direction Z. By moving in the first direction X to adjust the width of the slit 40, the entrance slit assembly 100 can adjust the width of the slit 40 according to different detection requirements. By moving in the vertical direction Z, the entrance slit assembly 100 can quickly switch the bombardment position of secondary ions on the slit 40, thereby improving the flexibility and functionality of the entrance slit assembly 100 and enabling it to better adapt to diverse needs.

[0036] Specifically, such as Figure 1 and Figure 2 As shown, the first driving component 50 drives the first panel component 20 and the second panel component 30 to move towards or away from each other along the first direction X, thereby adjusting the width of the slit 40.

[0037] Furthermore, when it is necessary to adjust the width of the slit 40 along the first direction X, the first driving component 50 drives the first panel assembly 20 and the second panel assembly 30 to move towards each other on the base plate 10. The first panel assembly 20 and the second panel assembly 30 move closer to each other along the first direction X to reduce the width of the slit 40 along the first direction X, thereby limiting the divergence angle of secondary ions and improving the mass resolution. Conversely, the first driving component 50 drives the first panel assembly 20 and the second panel assembly 30 to move away from each other on the base plate 10. The first panel assembly 20 and the second panel assembly 30 move further away from each other along the first direction X to increase the width of the slit 40 along the first direction X, thereby increasing the ion flux and improving the signal strength.

[0038] like Figure 1 and Figure 2 As shown, when the local bombardment region of the slit 40 in the secondary ion transport path L (e.g.) Figure 2 When the dashed frame h1 is damaged, the second drive assembly drives the base plate 10 to move upward or downward in the vertical direction Z, causing the slit 40 to shift relative to the secondary ion transport path L, thereby switching the bombardment position from the current bombardment area h1 to the backup area (e.g., h1). Figure 2The dashed boxes (h2 / h3) are used to align the spare areas h2 / h3 of the slit 40 with the secondary ion transport path L, enabling rapid retrieval of other spare areas h2 / h3 on the slit 40. This effectively avoids the problem of decreased mass resolution caused by wear of the slit 40, improves the overall utilization rate of the slit 40, extends the service life of the slit 40, and eliminates the need to break the vacuum environment. This solves the problem in existing inlet slit assemblies where the performance of local slit areas deteriorates due to secondary ion bombardment, requiring replacement by breaking the vacuum environment. This improves testing efficiency and the long-term operational stability and economy of the secondary ion mass spectrometry analyzer 1000.

[0039] Understandably, the second drive assembly drives the base plate 10 to move in the vertical direction Z, with the displacement range matching the total height of the slit 40, so as to achieve the alternating use of different spare areas on the slit 40.

[0040] Furthermore, during the detection process, the bombardment region h1 of the slit 40 in the secondary ion transport path can be observed using a CCD (Charge Coupled Devices) imaging system. When the spot diameter of the bombardment region h1 increases abnormally, it can be determined that the bombardment region h1 is damaged. Alternatively, the damage to the bombardment region h1 can be verified through detection data; specifically, when the signal intensity of the detected element increases abnormally, accompanied by a significant decrease in quality resolution and signal-to-noise ratio, it can be determined that the bombardment region h1 currently in the secondary ion transport path L is damaged.

[0041] In some examples, the parameter Figure 1 and Figure 2 As shown, the first panel assembly 20 includes a first support plate 21 and a first panel 22. The first support plate 21 is movably connected to the base plate 10, and the first panel 22 is disposed at the end of the first support plate 21 away from the base plate 10. The second panel assembly 30 includes a second support plate 31 and a second panel 32. The second support plate 31 is movably connected to the base plate 10, and the second panel 32 is disposed at the end of the second support plate 31 away from the base plate 10. The first panel 22 and the second panel 32 are arranged opposite to each other and spaced apart along a first direction. The gap between the first panel 22 and the second panel 32 forms a slit 40, and the sidewalls of the first panel 22 and the second panel 32 that are opposite to each other form the boundary of the slit 40.

[0042] The first support plate 21 and the second support plate 31 are symmetrically arranged on both sides of the base plate 10 along the first direction X. The first support plate 21 and the second support plate 31 are movably connected to the base plate 10. The first drive assembly 50 drives the first support plate 21 and the second support plate 31 to move towards each other or away from each other on the base plate 10. The first support plate 21 and the second support plate 31 respectively drive the first panel 22 and the second panel 32 to move synchronously, so that the first panel assembly 20 and the second panel assembly 30 move closer or further away from each other along the first direction X, so as to reduce or increase the width of the slit 40 along the first direction X, thereby realizing the adjustment of the width of the slit 40. The first panel 22 and the second panel 32 are positioned opposite each other and spaced apart along the first direction X. The distance between the first panel 22 and the second panel 32 constitutes the actual width of the slit 40. For example, the width of the slit 40 is adjustable in the range of 10-200 μm, such as 10 μm, 40 μm, 70 μm, 100 μm, 120 μm, 140 μm, 160 μm, 180 μm, or 200 μm. The sidewall 221 of the first panel 22 and the sidewall 321 of the second panel 32 form the boundary of the slit 40 to define the passage area of ​​secondary ions.

[0043] Furthermore, when the first panel 22 and the second panel 32 move towards each other along the first direction X, the distance between them decreases, and the width of the slit 40 decreases, which can improve the quality resolution. When the first panel 22 and the second panel 32 move away from each other along the first direction X, the distance between them increases, and the width of the slit 40 increases, which can increase the ion flux and improve the signal strength.

[0044] In some examples, the parameter Figure 2 and Figure 3 As shown, the first drive assembly 50 includes: a transmission block 51 disposed between the first support plate 21 and the second support plate 31; a drive unit 52 that drives the transmission block 51 to move in the vertical direction Z; and a first elastic unit 54 arranged in the first direction X and connected at both ends to the first support plate 21 and the second support plate 31 respectively. The first elastic unit 54 is in a pre-stretched state. The side walls opposite to the first support plate 21 and the second support plate 31 are constructed with driven inclined surfaces (not shown). The two side walls of the transmission block 51 along the first direction X form guide inclined surfaces 511 that are complementary to the driven inclined surfaces. The driven inclined surfaces and the guide inclined surfaces 511 are in sliding contact.

[0045] The sidewalls 211 of the first support plate 21 and 311 of the second support plate 31 are constructed as driven inclined surfaces. The first elastic unit 54 in the pre-stretched state applies a restoring pre-tension force to the first support plate 21 and the second support plate 31.

[0046] In some examples, when it is necessary to adjust the width of the slit 40, the driving unit 52 drives the transmission block 51 to move upward or downward along the vertical direction Z. The transmission block 51 pushes the driven inclined surface through the guiding inclined surface 511 to exert a horizontal force on the first support plate 21 and the second support plate 31. The first support plate 21 and the second support plate 31 move away from each other along the first direction X on the bottom plate 10 to increase the width of the slit 40. After the slit 40 reaches the set width, the transmission block 51 stops moving and maintains its current position. At the same time, the first elastic unit 54 is further stretched, and the first elastic unit 54 further generates a pre-tension force for resetting the first support plate 21 and the second support plate 31. By contacting the driven inclined surface with the guiding inclined surface 511, a reverse frictional force is generated to prevent the first support plate 21 and the second support plate 31 from sliding, so as to maintain the width of the slit 40. When it is necessary to reduce the width of the slit 40, the driving unit 52 drives the transmission block 5 reversed along the vertical direction Z to release the extrusion force on the first support plate 21 and the second support plate 31. During the movement of the transmission block 51, the first elastic unit 54 exerts a pre-tension force on the first support plate 21 and the second support plate 31, pulling the first support plate 21 and the second support plate 31 to move towards each other along the first direction X on the bottom plate 10 to reduce the width of the slit 40. After the slit 40 reaches the set width, the transmission block 51 stops moving, and the pre-tension force exerted by the first elastic unit 54 on the first support plate 21 and the second support plate 31 is used to maintain the width of the slit 40.

[0047] In some examples, the driven inclined surface forms an acute angle a or an obtuse angle a' with the horizontal plane H.

[0048] As shown in Figure 3 When the driven inclined surface forms an acute angle a with the horizontal plane H, the driving unit 52 drives the transmission block 51 to move upward along the Figure 5 direction indicated by the arrow Z1 in the figure. The transmission block 51 pushes the driven inclined surface through the guiding inclined surface 511 to exert a horizontal force on the first support plate 21 and the second support plate 31. The first support plate 21 and the second support plate 31 move along the Figure 5Move in opposite directions to the direction indicated by the bidirectional arrow X1 to increase the width of the slit 40; after the slit 40 reaches the set width, the driving block 51 stops moving and maintains its current position. At the same time, the first elastic unit 54 is further stretched, and a pre-tension force for resetting the first support plate 21 and the second support plate 31 is further generated through the first elastic unit 54 to maintain the width of the slit 40. When it is necessary to reduce the width of the slit 40, the driving unit 52 drives the driving block 51 to move downward along the vertical direction Z to release the extrusion force on the first support plate 21 and the second support plate 31. During the movement of the driving block 51, the first elastic unit 54 applies a pre-tension force to the first support plate 21 and the second support plate 31, pulling the first support plate 21 and the second support plate 31 to move towards each other along the first direction X on the bottom plate 10 to reduce the width of the slit 40; after the slit 40 reaches the set width, the driving block 51 stops moving, and the width of the slit 40 is maintained by the pre-tension force applied by the first elastic unit 54 to the first support plate 21 and the second support plate 31.

[0049] As shown in Figure 7 When the driven inclined plane forms an obtuse angle a' with the horizontal plane H, the driving unit 52 drives the driving block 51 to move downward along the vertical direction Z. The driving block 51 pushes the driven inclined plane through the guiding inclined plane 511 to apply a horizontal force to the first support plate 21 and the second support plate 31. The first support plate 21 and the second support plate 31 move in opposite directions along the first direction X on the bottom plate 10 to increase the width of the slit 40; after the slit 40 reaches the set width, the driving block 51 stops moving and maintains its current position. At the same time, the first elastic unit 54 is further stretched, and a pre-tension force for resetting the first support plate 21 and the second support plate 31 is further generated through the first elastic unit 54 to maintain the width of the slit 40. When it is necessary to reduce the width of the slit 40, the driving unit 52 drives the driving block 51 to move upward along the vertical direction Z to release the extrusion force on the first support plate 21 and the second support plate 31. During the movement of the driving block 51, the first elastic unit 54 applies a pre-tension force to the first support plate 21 and the second support plate 31, pulling the first support plate 21 and the second support plate 31 to move towards each other along the first direction X on the bottom plate 10 to reduce the width of the slit 40; after the slit 40 reaches the set width, the driving block 51 stops moving, and the width of the slit 40 is maintained by the pre-tension force applied by the first elastic unit 54 to the first support plate 21 and the second support plate 31.

[0050] In some examples, as shown in Figure 1 and Figure 2As shown, the first drive assembly 50 further includes a transmission rod 53 and a second elastic unit 55. The transmission rod 53 is disposed on the output shaft 521 of the drive unit 52 and connected to the transmission block 51. The second elastic unit 55 is disposed on both sides of the transmission rod 53, and its two ends along its length are respectively connected to the output shaft 521 of the drive unit 52 and the transmission block 51. The drive unit 52 drives the transmission rod 53 through the output shaft 521, and the transmission rod 53 drives the transmission block 51 to move in the vertical direction Z. The second elastic unit 55 applies a preload to the output shaft 521 of the drive unit 52 and the transmission block 51. The second elastic unit 55 eliminates the mechanical gap between the transmission rod 53 and the output shaft 521 of the drive unit 52 and the transmission block 51 through the preload. Furthermore, when the drive unit 52 starts and stops, the elastic deformation of the second elastic unit 55 absorbs the instantaneous impact and suppresses the vibration amplitude of the transmission block 51, thereby improving the movement control accuracy of the transmission block 51.

[0051] In some examples, during secondary ion mass spectrometry analysis, the center of the slit 40 needs to be aligned with the transmission optical path L of the secondary ions. The secondary ion mass spectrometry analyzer 1000 can drive the base plate 10 to move along the first direction X via a second driving component (not shown), while the first driving component 50 moves synchronously with the base plate 10 along the first direction X via an external driving device (not shown); alternatively, the first driving component 50 and the base plate 10 can be moved along the first direction X by an external driving device (not shown). The base plate 10 can also be moved along the vertical direction Z via the second driving component. The first driving component 50 moves synchronously with the base plate 10 along the vertical direction Z via an external driving device (not shown) to adjust the overall position of the inlet slit assembly 100, ensuring precise alignment of the center of the slit 40 with the transmission optical path L of the secondary ions.

[0052] In some examples, the parameter Figure 1 and Figure 2 As shown, the inlet slit assembly 100 also includes a linear guide mechanism 80 (e.g., a crossed roller guide). The first support plate 21 and the second support plate 31 are slidably connected to the base plate 10 via the linear guide mechanism 80. The first panel 22 is detachably connected to the first support plate 21, and the second panel 32 is detachably connected to the second support plate 31. The linear guide mechanism 80 supports and guides the first support plate 21 and the second support plate 31 to slide precisely along the first direction X, ensuring the straightness of the movement trajectory of the first support plate 21 and the second support plate 31, and improving the width adjustment accuracy of the slit 40. The first panel 22 and / or the second panel 32 can be adjusted or replaced individually. During maintenance, only the first panel 22 and / or the second panel 32 need to be replaced, without disassembling the entire inlet slit assembly 100, thus reducing costs.

[0053] In some examples, the parameter Figure 4 and Figure 5As shown, the entrance slit assembly 100 further includes: a slide rail 71, a guide plate 72, and a slider 73. The guide plate 72 is disposed at one end of the transmission block 51 extending past the driven inclined surface. The slide rail 71 is disposed on the side of the first support plate 21 and the second support plate 31 facing the guide plate 72. The slider 73 is disposed on both sides of the guide plate 72 and slides in cooperation with the slide rail 71. The extension direction of the slide rail 71 is the same as the inclination angle of the driven inclined surface. During the process of the transmission block 51 driving the first support plate 21 and the second support plate 31 to move towards each other and / or away from each other along the first direction X, the transmission block 51 synchronously drives the guide plate 72 to move, thereby causing the guide plate 72 to drive the slider 73 to slide within the slide rail 71, so as to evenly transmit the driving force of the transmission block 51 in the vertical direction Z to the two slide rails 71, so that the first support plate 21 and the second support plate 31 move synchronously and symmetrically, thereby further improving the width adjustment accuracy of the slit 40.

[0054] In some examples, the parameter Figure 6 As shown, the secondary ion mass spectrometry analysis device 1000 further includes: a first deflection unit 91 and a second deflection unit 92 disposed on the upstream side of the slit 40 along the secondary ion transmission path L; the first deflection unit 91 and the second deflection unit 92 are disposed opposite each other in the vertical direction Z so that the secondary ion transmission path L is vertically deflected.

[0055] By applying an electric or magnetic field through the first deflection unit 91 and the second deflection unit 92, the transport path L of the secondary ions is vertically deflected, and the transport path L of the secondary ions is deflected as follows: Figure 6 The transmission path L” shown in the figure changes the bombardment area of ​​the secondary ions on the slit 40, so that the bombardment area h1 is switched to the backup area h3. The bombardment area h1 is located in the original secondary ion transmission path L, and the backup area h3 is located in the secondary ion transmission path L”. This avoids the same position of the slit 40 (such as the bombardment area h1) from being continuously bombarded by secondary ions and worn and damaged, thereby extending the service life of the slit 40 and ensuring the accuracy of analysis.

[0056] In some examples, the parameter Figure 6 As shown, the secondary ion mass spectrometry analysis device 1000 further includes a third deflection unit 93 and a fourth deflection unit 94 disposed downstream of the slit 40 along the secondary ion transport path L; the third deflection unit 93 and the fourth deflection unit 94 are disposed opposite to each other in the vertical direction Z so that the secondary ion transport path L” is recalibrated to the predetermined transport path L. The third deflection unit 93 and the fourth deflection unit 94 apply an electric field or magnetic field force to the secondary ion in the opposite direction to that of the first deflection unit 91 and the second deflection unit 92 to counteract the deflection of the secondary ion in the vertical direction Z, thereby recalibrating the secondary ion transport path L” to the transport path L.

[0057] In some examples, the parameter Figure 6As shown, the secondary ion mass spectrometry analyzer 1000 also includes a contrast aperture assembly 200. The contrast aperture assembly 200 includes an aperture aperture 201 for screening secondary ions. An entrance slit assembly 100 is disposed on the exit path L' of the aperture aperture 201 and is used to screen secondary ions exiting from the aperture aperture 201. By screening secondary ions through the aperture aperture 201, scattered ions and noise particles are eliminated, allowing only ions with a specific divergence angle to pass through, thereby improving the signal-to-noise ratio. The entrance slit assembly 100 further screens secondary ions through the width of the slit 40, allowing only ions that have passed through the aperture aperture 201 to enter the subsequent analysis system (not shown), ensuring precise control of mass resolution.

[0058] In some examples, the parameter Figure 6 As shown, the secondary ion mass spectrometry analysis device 1000 also includes an ion source (not shown), which generates primary ions and directs them toward the sample to be tested (not shown) to generate secondary ions. A contrast aperture assembly 200 is positioned on the emission path L of the secondary ions emitted from the sample to be tested. The ion source generates a high-energy primary ion beam, which bombards the surface of the sample to be tested, sputtering out secondary ions. The contrast aperture assembly 200, positioned on the emission path L of the secondary ions, filters the secondary ions through an aperture stop 201, allowing only ions with a specific divergence angle to pass through, thereby improving the signal-to-noise ratio.

[0059] In summary, the secondary ion mass spectrometry analysis device provided by this utility model includes: an inlet slit assembly, which includes: a base plate, a first driving assembly, and a second driving assembly; the first panel assembly and the second panel assembly are disposed on both sides of the base plate along a first direction and are movably connected to the base plate; a slit extending vertically is formed between the first panel assembly and the second panel assembly; the first driving assembly drives the first panel assembly and the second panel assembly to move towards each other and / or away from each other on the base plate along the first direction to adjust the width of the slit along the first direction; the second driving assembly drives the base plate to move vertically. When damage is detected in the local bombardment area of ​​the slit in the secondary ion transport path, the second drive component moves the base plate vertically upwards or downwards, causing the slit to shift relative to the secondary ion transport path. This switches the bombardment position from the current bombardment area to a backup area, aligning the backup area of ​​the slit with the secondary ion transport path. This allows for the rapid retrieval of other backup areas on the slit, effectively avoiding the problem of decreased mass resolution due to slit wear, improving the overall utilization rate of the slit, extending the slit's service life, and eliminating the need to break the vacuum environment. This solves the problem in existing inlet slit components where performance degradation due to secondary ion bombardment in localized slit areas necessitates replacement after breaking the vacuum environment, thus improving testing efficiency and the long-term operational stability and economy of the secondary ion mass spectrometry analysis device.

[0060] The detailed descriptions listed above are merely specific descriptions of feasible implementations of this utility model, and are not intended to limit the scope of protection of this utility model. All equivalent implementations or modifications made without departing from the spirit of this utility model should be included within the scope of protection of this utility model.

[0061] It will be apparent to those skilled in the art that this invention is not limited to the details of the exemplary embodiments described above, and that it can be implemented in other specific forms without departing from the spirit or essential characteristics of this invention. Therefore, the embodiments should be considered illustrative and non-limiting in all respects, and the scope of this invention is defined by the appended claims rather than the foregoing description. Thus, it is intended that all variations falling within the meaning and scope of equivalents of the claims be included within this invention. No reference numerals in the claims should be construed as limiting the scope of the claims.

[0062] Furthermore, it should be understood that although this specification describes embodiments, not every embodiment contains only one independent technical solution. This narrative style is merely for clarity. Those skilled in the art should consider the specification as a whole, and the technical solutions in each embodiment can also be appropriately combined to form other embodiments that can be understood by those skilled in the art.

Claims

1. A secondary ion mass spectrometry analysis device, characterized in that, include: The inlet slit assembly includes: A base plate, a first panel assembly and a second panel assembly disposed on both sides of the base plate along a first direction and movably connected to the base plate, wherein a slit extending in a vertical direction is formed between the first panel assembly and the second panel assembly; A first drive assembly is configured to drive the first panel assembly and the second panel assembly to move toward each other and / or away from each other on the base plate along the first direction to adjust the width of the slit along the first direction. The second drive component is configured to drive the base plate to move in a vertical direction.

2. The secondary ion mass spectrometry analysis device according to claim 1, characterized in that, The first panel assembly includes: a first support plate and a first panel, wherein the first support plate is movably connected to the base plate, and the first panel is disposed at the end of the first support plate away from the base plate; The second panel assembly includes: a second support plate and a second panel, wherein the second support plate is movably connected to the base plate, and the second panel is disposed at the end of the second support plate away from the base plate; The first panel and the second panel are arranged opposite to each other and spaced apart along a first direction, the gap between the first panel and the second panel forms the slit, and the sidewalls of the first panel and the second panel opposite to each other form the boundary of the slit.

3. The secondary ion mass spectrometry analysis device according to claim 2, characterized in that, The first driving assembly includes: a transmission block disposed between the first support plate and the second support plate, a driving unit for driving the transmission block to move in a vertical direction, and a first elastic unit arranged along the first direction and connected at both ends to the first support plate and the second support plate respectively. The first elastic unit is in a pre-stretched state, and the sidewalls opposite to the first support plate and the second support plate are constructed with driven inclined surfaces. The transmission block forms guide inclined surfaces that are complementary to the driven inclined surfaces along the two sidewalls of the first direction. The driven inclined surfaces and the guide inclined surfaces are in sliding contact.

4. The secondary ion mass spectrometry analysis device according to claim 3, characterized in that, The driven inclined plane forms an acute or obtuse angle with the horizontal plane.

5. The secondary ion mass spectrometry analysis device according to claim 3, characterized in that, The inlet slit assembly further includes: a slide rail, a guide plate, and a slider. The guide plate is disposed at one end of the transmission block extending past the driven inclined surface. The slide rail is disposed on the side of the first support plate and the second support plate facing the guide plate. The slider is disposed on both sides of the guide plate and slides in cooperation with the slide rail. The extension direction of the slide rail is the same as the inclination angle of the driven inclined surface.

6. The secondary ion mass spectrometry analysis device according to claim 2, characterized in that, The entrance slit assembly also includes a linear guide mechanism, wherein the first support plate and the second support plate are slidably connected to the base plate through the linear guide mechanism, the first panel is detachably connected to the first support plate, and the second panel is detachably connected to the second support plate.

7. The secondary ion mass spectrometry analysis device according to claim 1, characterized in that, The secondary ion mass spectrometry analysis device further includes: a first deflection unit and a second deflection unit disposed on the upstream side of the slit along the secondary ion transport path; the first deflection unit and the second deflection unit are disposed opposite each other in the vertical direction so that the secondary ion transport path is vertically deflected.

8. The secondary ion mass spectrometry analysis device according to claim 7, characterized in that, The secondary ion mass spectrometry analysis device further includes: a third deflection unit and a fourth deflection unit disposed downstream of the slit along the transmission path of the secondary ions; the third deflection unit and the fourth deflection unit are disposed opposite each other in the vertical direction so that the transmission path of the secondary ions is recalibrated to the predetermined transmission path.

9. The secondary ion mass spectrometry analysis apparatus according to any one of claims 1-8, characterized in that, The secondary ion mass spectrometry analysis device also includes a contrast aperture assembly, wherein the aperture aperture assembly is used to screen secondary ions, and the entrance slit assembly is disposed on the emission path of the aperture aperture to screen secondary ions emitted from the aperture aperture.

10. The secondary ion mass spectrometry analysis device according to claim 9, characterized in that, The secondary ion mass spectrometry analysis device further includes an ion source, which generates primary ions and directs them toward the sample to be tested to generate the secondary ions; the contrast aperture assembly is disposed on the emission path of the secondary ions emitted from the sample to be tested.

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