A vacuum chamber transport device
By setting a buffer cavity in the vacuum cavity transfer device to cool down the high-temperature mask, the problem of pattern distortion caused by thermal deformation of the high-temperature mask is solved, and stable transmission and high-precision pattern transfer of the mask are achieved.
Patent Information
- Application Number
- CN202521472658.2
- Authority / Receiving Office
- CN · China
- Patent Type
- Utility models(China)
- Current Assignee / Owner
- Filing Date
- 2025-07-15
- Publication Date
- 2026-08-25
- Estimated Expiration
- 2035-07-15
AI Technical Summary
When high-temperature photomasks are taken directly from the process chamber and used for testing or photolithography, they are prone to pattern distortion due to thermal deformation, which affects the pattern accuracy and overlay accuracy.
A vacuum chamber transport device was designed, including a transport chamber, a material chamber, a calibration chamber, a process chamber, and a buffer chamber. The buffer chamber is used to force the high-temperature mask to cool down, and the chamber is connected by an independent vacuum pump system and a gate valve to ensure that the mask is not affected by the external environment during transport.
It effectively avoids pattern distortion caused by thermal deformation, ensures the stability of the mask during transmission, improves pattern accuracy and overlay accuracy, and enhances processing efficiency and mask durability.
Smart Images
Figure CN224682530U_ABST
Abstract
Description
Technical Field
[0001] This utility model relates to the field of semiconductor technology, and in particular to a vacuum cavity transmission device. Background Technology
[0002] The process cavity provides a controllable physical environment, precise optical positioning, and overlay system for the photomask, making it a core component for ensuring pattern transfer accuracy, repeatability, and photomask lifespan. Semiconductor photomasks have minimum linewidths down to the nanometer scale, requiring a vibration-free, constant cavity environment for pattern transfer. This prevents environmental interference from causing linewidth deviations. Placing the photomask in the process cavity isolates it from external physical contact and chemical contamination, reducing surface damage such as light-shielding film peeling or substrate scratches, thereby improving its durability.
[0003] The pattern size on the mask is at the nanometer level. If the high-temperature mask taken directly from the process chamber is immediately used for subsequent steps, such as inspection, photolithography, or measured / recorded in a deformed state, its pattern position and shape will be unstable and distorted. This will directly lead to photolithography alignment error, pattern overlay error, and critical dimension deviation, which will ultimately be reflected as defects on the wafer, making it difficult to maintain pattern accuracy. Utility Model Content
[0004] This invention addresses the shortcomings of existing technologies by providing a vacuum cavity transport device that meets the requirements for mask loading / unloading and processing. By using an independent buffer cavity, the high-temperature mask is forced to cool down, preventing thermal deformation and pattern distortion caused by direct use of the hot mask for inspection or photolithography.
[0005] To solve the above-mentioned technical problems, the present invention adopts the following technical solution:
[0006] This utility model provides a vacuum cavity transfer device, including a transfer cavity and several process cavities connected to the transfer cavity. The several process cavities are respectively arranged around the periphery of the transfer cavity, and the several process cavities are connected to the transfer cavity through a gate valve. A robotic arm for transferring a mask plate is arranged inside the transfer cavity.
[0007] The plurality of process cavities include a material cavity connected to the transfer cavity, at least one process cavity, a calibration cavity, and a buffer cavity;
[0008] The material chamber is used to load and unload the mask plate;
[0009] The calibration chamber is equipped with a calibration mechanism for positioning and calibrating masks of different sizes;
[0010] The buffer cavity is used to store the mask and to cool the mask.
[0011] The mask conveying path consists of the material chamber, calibration chamber, process chamber, buffer chamber, and material chamber in sequence.
[0012] The calibration mechanism includes a support platform installed in the calibration chamber, multiple support points set on the support platform, a first limiting component movably connected to one side of the support platform, a second limiting component movably connected to the support platform and located on the other side corresponding to the first limiting component, a third limiting component movably connected to the support platform and located on the side adjacent to the second limiting component, and a fourth limiting component installed on the support platform and located on the side opposite to the third limiting component.
[0013] The plurality of support points constitute at least two support surfaces with different areas and different heights. The support surfaces are used to support mask plates of different sizes. The fourth limiting component is used to position the first side of the mask plate. When the first limiting component, the second limiting component, or the third limiting component moves into the support platform to the required position, the second side, the third side, or the fourth side of the mask plate is positioned.
[0014] The support platform is connected to at least four rows of support columns located at its corners. Among the adjacent support columns, the outer support column is higher than the inner support column, and the support points are set one-to-one at the top of each support column.
[0015] The first limiting component includes a limiting plate that is horizontally slidably connected to the support platform along a first direction and several first limiting posts installed on the limiting plate. Among adjacent first limiting posts, the outer first limiting post is higher than the inner first limiting post. The first limiting post is used to position the second side of the mask plate.
[0016] The second limiting component includes a limiting seat that is horizontally slidably connected to the support platform along a first direction and several second limiting posts installed on the limiting seat. Among adjacent second limiting posts, the outer second limiting post is higher than the inner second limiting post. The second limiting post is used to position the third side of the mask plate.
[0017] The third limiting component includes a limiting frame that is horizontally slidably connected to the support platform along the second direction and at least two rows of third limiting posts installed on the limiting frame. Each row of the third limiting posts is parallel to a row of support posts at the corresponding corner. Among the adjacent third limiting posts, the outer third limiting post is higher than the inner third limiting post. The third limiting posts are used to position the fourth side of the mask plate.
[0018] The fourth limiting component includes at least two rows of fourth limiting posts installed on the support platform. Each row of fourth limiting posts is parallel to a row of support posts at the corresponding corner. Among adjacent fourth limiting posts, the outer fourth limiting post is higher than the inner fourth limiting post. The fourth limiting posts are used to position the first side of the mask plate.
[0019] The support platform is provided with a driving member that slides along a first direction. The driving member is connected to a limiting frame. When the driving member slides along the first direction, it drives the limiting frame to slide synchronously along a second direction, so that the third limiting post moves closer to or further away from the interior of the support platform.
[0020] The support platform is provided with a sliding groove extending in a first direction, the driving component is equipped with a pulley, the pulley is slidably engaged in the sliding groove, the pulley is connected to an extension rod, the limiting frame is provided with a guide groove, and the extension rod passes through the guide groove.
[0021] When the driving member slides along the first direction, it drives the pulley and the extension rod to move synchronously, and drives the extension rod to slide along the guide groove, so that the limiting frame slides along the second direction.
[0022] The buffer cavity is equipped with a support base, and the support base is provided with at least three support parts for supporting the mask plate;
[0023] The top of the buffer cavity is fitted with a cover plate, and a first cooling pipe is fitted on the cover plate. The first cooling pipe is arranged in a ring on the surface of the cover plate, and a first outlet and a first inlet are provided at both ends of the first cooling pipe.
[0024] The buffer cavity is equipped with a second cooling pipe on its outer side. The two ends of the second cooling pipe are located on the inner and outer sides of the buffer cavity, respectively, and the middle part of the second cooling pipe alternately passes through the left, bottom and right sides of the buffer cavity.
[0025] The beneficial effects of this utility model are:
[0026] In practical applications, the mask transport path consists of the material chamber, calibration chamber, process chamber, buffer chamber, and material chamber again. An independent buffer chamber forces the high-temperature mask to cool down, preventing thermal deformation and pattern distortion during direct use of the hot mask for inspection or photolithography. Each of the material chamber, calibration chamber, process chamber, buffer chamber, and material chamber is equipped with a corresponding vacuum pump, ensuring independent control of the vacuum environment in each chamber. Valves control the connection and isolation between chambers, facilitating smooth mask transport by the robotic arm. A closed-loop vacuum transport path isolates the mask from the external environment throughout, preventing physical contact or chemical contamination that could damage the mask surface. The buffer chamber acts as a buffer station, allowing continuous operation within the process chamber. Attached Figure Description
[0027] Figure 1 This is a top view of the structure of this vacuum cavity transmission device.
[0028] Figure 2 Top view of the structure when the calibration cavity lacks a top plate.
[0029] Figure 3 A three-dimensional structural diagram of the supporting platform and supporting columns.
[0030] Figure 4 This is a schematic diagram of a structure with supporting columns, support points, and support surfaces.
[0031] Figure 5 An exploded view of the three-dimensional structure of the calibration mechanism and support platform.
[0032] Figure 6 This is a schematic diagram of the connection structure between the limit frame and the support platform.
[0033] Figure 7 This is a schematic diagram of the three-dimensional structure of the buffer cavity.
[0034] Figure 8 This is an exploded view of the 3D structure of the buffer cavity.
[0035] Figure 9 This is a schematic diagram of another three-dimensional structure of the buffer cavity.
[0036] 1. Transmission chamber; 2. Valve; 3. Robotic arm;
[0037] h, first direction; s, second direction;
[0038] 101. Material chamber; 102. Process chamber; 103. Calibration chamber; 104. Buffer chamber;
[0039] 4. Calibration mechanism; 401. Support point;
[0040] 41. Support platform;
[0041] 411. Support column; 412. Slide groove;
[0042] 42. First limiting component;
[0043] 421. Limiting plate; 422. First limiting post;
[0044] 43. Second limiting component;
[0045] 431. Limiting seat; 432. Second limiting post;
[0046] 44. Third limiting component;
[0047] 441. Limiting bracket; 4411. Guide groove; 442. Third limiting post;
[0048] 45. Fourth limiting component;
[0049] 451. Fourth limiting post;
[0050] 5. Driving component; 51. Pulley; 52. Extension rod;
[0051] 6. Support base; 61. Support section;
[0052] 7. Cover plate; 71. First cooling pipe; 72. Second cooling pipe. Detailed Implementation
[0053] To facilitate understanding by those skilled in the art, the present invention will be further described below in conjunction with embodiments and accompanying drawings. Specific embodiments of the present invention will be described below. It should be noted that, in order to provide a concise description of these embodiments, this specification cannot provide a detailed description of all features of the actual embodiments.
[0054] refer to Figures 1 to 9 As shown, this utility model provides a vacuum cavity transfer device, including a transfer cavity 1 and several process cavities connected to the transfer cavity 1. The process cavities are respectively arranged around the periphery of the transfer cavity 1 and are connected to the transfer cavity 1 through a gate valve 2. A robot arm 3 for transferring photomasks is provided inside the transfer cavity 1. The process cavities include a material cavity 101, at least one process cavity 102, a calibration cavity 103, and a buffer cavity 104 connected to the transfer cavity 1. The material cavity 101 is used to load and unload photomasks. The calibration cavity 103 is provided with a calibration mechanism 4 for positioning and calibrating photomasks of different sizes. The buffer cavity 104 is used to store photomasks and perform cooling treatment on the photomasks.
[0055] refer to Figure 1 As shown, in practical applications, the mask conveying path is sequentially: material chamber 101, calibration chamber 103, process chamber 102, buffer chamber 104, and material chamber 101, satisfying the requirements for mask loading / unloading and process handling. The independent buffer chamber 104 forces the high-temperature mask to cool down, preventing thermal deformation and pattern distortion during direct use of the hot mask for inspection or photolithography. Each of the material chambers 101, calibration chamber 103, process chamber 102, buffer chamber 104, and material chamber 101 is equipped with a corresponding vacuum pump, ensuring independent control of the vacuum environment in each chamber. The connection and isolation between chambers are controlled by valve 2, facilitating smooth mask conveying by the robot arm 3. The closed-loop vacuum transmission path isolates the external environment throughout, preventing physical contact or chemical contamination from damaging the mask surface. The buffer chamber 104 serves as a buffer station, allowing continuous operation of the process chamber 102. For example, while one mask is placed in the buffer chamber 104 for cooling, the robot arm 3 can process other masks, improving processing efficiency.
[0056] refer to Figure 1 , 2As shown, in this embodiment, the calibration mechanism 4 includes a support platform 41 installed in the calibration cavity 103, a plurality of support points 401 disposed on the support platform 41, a first limiting component 42 movably connected to one side of the support platform 41, a second limiting component 43 movably connected to the support platform 41 and located on the other side corresponding to the first limiting component 42, a third limiting component 44 movably connected to the support platform 41 and located on the side adjacent to the second limiting component 43, and a fourth limiting component 45 installed on the support platform 41 and located on the side opposite to the third limiting component 44; Reference Figure 4 As shown, the plurality of support points 401 constitute at least two support surfaces with different areas and different heights, and the support surfaces correspond to each other. Figure 4 The M in the middle is represented by a dashed line. The support surface is used to support mask plates of different sizes. The fourth limiting component 45 is used to position the first side of the mask plate. When the first limiting component 42, the second limiting component 43 or the third limiting component 44 moves into the support platform 41 to the required position, the second side, the third side or the fourth side of the mask plate is positioned.
[0057] refer to Figure 1 , 2 As shown, in practical applications, the robotic arm 3 places the mask plate inside the calibration chamber 103, supports the mask plate of a specific size through the corresponding support surface, and positions the first side of the mask plate through the first limiting component 42; the second limiting component 43, the third limiting component 44, and the fourth limiting component 45 are respectively connected to the corresponding drive units, such as a lead screw motor module, hydraulic cylinder, or electric cylinder, to facilitate precise control of the movement position of the second limiting component 43, the third limiting component 44, or the fourth limiting component 45, thereby achieving precise positioning of the mask plate and forming an adjustable surrounding structure for the mask plate, which is conducive to compatibility with mask plates of different sizes, such as 6 inches to 9 inches; the support surface is arranged in a stepped manner to ensure that mask plates of different sizes only contact the lower inner support point 401, avoiding interference from the higher outer limiting post, and ensuring precise positioning of the mask plate; the calibration chamber 103 is equipped with a cooling module, and the cooling medium is filled into the cooling pipe to cool the calibration chamber 103, thereby meeting the temperature control requirements of the calibration chamber 103.
[0058] refer to Figure 2 , 3As shown, in this embodiment, the support platform 41 is connected to at least four rows of support columns 411 located at its corners. Among adjacent support columns 411, the outer support column 411 is higher than the inner support column 411. The support points 401 are correspondingly set at the top of each support column 411. In practical applications, the outer, higher support column 411 supports larger mask plates, and the inner, lower support column 411 supports smaller mask plates, allowing for arbitrary switching of mask plate placement. Through the set height difference, it is ensured that when the robot arm 3 picks up and places mask plates, the gripper can penetrate into the lower support area without colliding with the higher support column 411.
[0059] refer to Figure 2 , 5 As shown, in this embodiment, the first limiting component 42 includes a limiting plate 421 horizontally slidably connected to the support platform 41 along the first direction h and a plurality of first limiting posts 422 installed on the limiting plate 421. Among adjacent first limiting posts 422, the outer first limiting post 422 is higher than the inner first limiting post 422. The first limiting post 422 is used to position the second side of the mask plate. The second limiting component 43 includes a limiting seat 431 horizontally slidably connected to the support platform 41 along the first direction h and a plurality of second limiting posts 432 installed on the limiting seat 431. Among adjacent second limiting posts 432, the outer second limiting post 432 is higher than the inner second limiting post 432. The second limiting post 432 is used to position the third side of the mask plate. In actual application, the first limiting post 422 is... The 22 structure adopts an outer-high, inner-low arrangement. The higher first limiting post 422 intercepts the edge of the larger-sized mask, ensuring that the lower first limiting post 422 is not blocked by the higher first limiting post 422 when positioning the smaller-sized mask. The second limiting post 432 also adopts an outer-high, inner-low arrangement. The higher second limiting post 432 intercepts the edge of the larger-sized mask, ensuring that the lower second limiting post 432 is not blocked by the higher second limiting post 432 when positioning the smaller-sized mask. This allows for positioning of the second and third sides of masks of different sizes, facilitating compatibility with masks of different sizes. The first limiting post 422 and the second limiting post 432 are respectively matched with the support post 411 at the corresponding height for the same mask, ensuring horizontal support of the mask and facilitating compatibility with masks of different sizes.
[0060] refer to Figure 2 , 5As shown, in this embodiment, the third limiting component 44 includes a limiting frame 441 that is horizontally slidably connected to the support platform 41 along the second direction s, and at least two rows of third limiting posts 442 installed on the limiting frame 441. Each row of the third limiting posts 442 is parallel to a row of support posts 411 at the corresponding corner. Among adjacent third limiting posts 442, the outer third limiting post 442 is higher than the inner third limiting post 442. The third limiting posts 442 are used to position the fourth side of the mask plate; and to support the corner support post 411. The support column 411 forms a rigid support point 401, dispersing the self-weight stress of the mask plate and preventing sagging deformation in the middle; the higher third limiting column 442 intercepts the edge of the larger-sized mask plate, ensuring that the lower third limiting column 442 is not blocked by the higher third limiting column 442 when positioning the smaller-sized mask plate, thus realizing the fourth-side positioning of masks of different sizes; the third limiting column 442 and the support column 411 at the corresponding height match the same mask plate, ensuring that the mask plate is horizontally supported and compatible with masks of different sizes.
[0061] refer to Figure 5 As shown, in this embodiment, the fourth limiting component 45 includes at least two rows of fourth limiting posts 451 installed on the support platform 41. Each row of fourth limiting posts 451 is parallel to a row of support posts 411 at the corresponding corner. Among adjacent fourth limiting posts 451, the outer fourth limiting post 451 is higher than the inner fourth limiting post 451. The fourth limiting posts 451 are used to position the first side of the mask plate. The fourth limiting component 45 stabilizes and limits the first side of the mask plate, which facilitates the rapid determination of the positioning reference and improves the positioning of the mask plate. In terms of efficiency, specifically, the fourth limiting post 451 is arranged in two rows in a figure-eight shape. By placing the fourth limiting post 451 alongside the support post 411, the space at the corner of the support platform 41 is effectively utilized, making it easier for the support post 411 to form a rigid support point 401, dispersing the self-weight stress of the mask plate, preventing sagging deformation in the middle, and enabling the fourth limiting post 451 at different heights to smoothly position mask plates of different sizes; specifically, the fourth limiting post 451 and the support post 411 at the corresponding height are matched with the same mask plate to ensure horizontal support of the mask plate.
[0062] refer to Figure 2 , 5 As shown, in this embodiment, the support platform 41 is provided with a driving member 5 that slides along the first direction h. The driving member 5 is connected to the limiting frame 441. When the driving member 5 slides along the first direction h, it drives the limiting frame 441 to slide synchronously along the second direction s, so that the third limiting post 442 is close to or away from the interior of the support platform 41.
[0063] In practical applications, the driving component 5 is connected to the driving unit. The driving unit pushes the driving component 5 to slide along the first direction h, thereby smoothly driving the limiting frame 441 to slide along the second direction s. The corresponding size mask is successfully positioned by the third limiting posts 442 of different heights, realizing the rapid positioning of the third side of mask panels of different sizes. Since each row of the third limiting posts 442 is parallel to a row of support posts 411 at the corresponding corner, when the third side of the mask is positioned, the third limiting posts 442 and the support posts 411 are parallel and located at the corner of the support platform 41. This not only ensures the accurate positioning of the mask, but also effectively saves space, has a compact structure, and can smoothly accommodate mask panels of different sizes.
[0064] refer to Figure 2 As shown, in this embodiment, the support platform 41 is provided with a groove 412 extending along the first direction h, and the driving component 5 is equipped with a pulley 51, which slides within the groove 412. Figure 5 , 6 As shown, the pulley 51 is connected to an extension rod 52, the limiting frame 441 is provided with a guide groove 4411, and the extension rod 52 passes through the guide groove 4411.
[0065] refer to Figure 5 , 6As shown, in practical applications, the driving component 5 is connected to the driving unit, which is a linear motor, hydraulic cylinder, or electric cylinder, to facilitate smooth movement of the driving component 5 along the first direction h and precise control of its position. When the driving component 5 slides along the first direction h, it drives the pulley 51 and the extension rod 52 to move synchronously, causing the extension rod 52 to slide along the guide groove 4411, so that the limiting frame 441 slides along the second direction s. The guide groove 4411 improves the accuracy of the movement and repeatability of the third limiting post 442, ensuring the consistency of the mask plate position each time and preventing the limiting frame 441 from swaying or jamming during movement. Specifically, the guide groove 4411 is inclined. When the extension rod 52 is forced to move along the guide groove 4411, the inner wall of the guide groove 4411 applies a normal force perpendicular to the groove wall to the extension rod 52. This normal force can be decomposed into two components: one component along the first direction h and the other component along the second direction s. The component along the second direction s pushes the limiting frame. 441 moves along the second direction s, realizing the horizontal pulling of the driving component 5, which in turn drives the limiting frame 441 to move vertically, causing the third limiting post 442 to move closer to or further away from the center of the support platform 41. Through the provided guide groove 4411, there is a fixed proportional relationship between the moving distance of the limiting frame 441 in the second direction s and the moving distance of the driving component 5 in the first direction h. This proportion is determined by the inclination angle of the guide groove 4411. For example, a 45-degree angle guide groove 4411 moves 1mm horizontally and 1mm vertically; other angles scale proportionally. Therefore, by precisely designing the angle of the guide groove 4411, the relationship between the moving distance of the limiting frame 441 and the moving distance of the driving component 5 can be precisely controlled, meeting the stroke requirements for positioning mask plates of different sizes. The provided pulley 51 reduces the resistance of the driving component 5 moving along the first direction h, and the inclined guide groove 4411 efficiently converts horizontal movement into vertical movement. The combination of these two factors results in high efficiency and low power loss in the entire transmission chain. (Reference) Figure 6 As shown, the end of the extension rod 52 is equipped with a roller adapted to the guide groove 4411. When the extension rod 52 moves, it makes line contact with the guide groove 4411 through the roller, which helps to reduce the moving resistance of the extension rod 52 and facilitates the smooth movement of the extension rod 52. The pulley 51 ensures stable and accurate horizontal movement, and the inclined guide groove 4411 ensures accurate and controlled vertical movement trajectory. The two work together to ensure the high precision and high repeatability of the final positioning of the mask plate by the third limiting post 442. The low friction and low wear also improve the reliability of long-term use. The pulley 51 occupies little space when running in the groove 412. The inclined guide groove 4411 integrates the direction conversion function into the structure of the limiting frame 441 itself, so that the driving component 5 and the third limiting post 442 can achieve linkage in a very compact space, effectively supporting the compact layout of "the third limiting post 442 and the support post 411 side by side at the corner".
[0066] refer to Figure 7 ,8 As shown, in this embodiment, the buffer cavity 104 is equipped with a support base 6, which has at least three support parts 61 for supporting the mask plate. The robot arm 3 places the mask plate on the support parts 61, and the support parts 61 stably support the mask plate, facilitating the storage of the mask plate. The mask plate is supported by three support parts 61, minimizing the heat conduction area and improving the cooling efficiency in conjunction with top cooling. A cover plate 7 is installed at the top of the buffer cavity 104, and a first cooling pipe 71 is installed on the cover plate 7. The first cooling pipe 71 is arranged in a ring on the surface of the cover plate 7. The first cooling pipe 71 has a first outlet and a first inlet at both ends. The annular arrangement of the first cooling pipe 71 covers the entire area of the cover plate 7. The cooling medium circulates from the first inlet to the first outlet to eliminate local thermal stress on the mask plate. The cooling medium is water or liquid nitrogen. By placing the first cooling pipe 71 outside the cover plate 7, leakage of the cooling medium is avoided to prevent contamination of the vacuum environment inside the buffer cavity 104. Specifically, the buffer cavity 104 and the material cavity 101 have the same structure, which facilitates the temporary storage of the mask plate during loading and unloading in the material cavity 101, and enables the cooling treatment of the mask plate.
[0067] refer to Figure 8 , 9 As shown, in this embodiment, a second cooling pipe 72 is installed on the outside of the buffer cavity 104. The two ends of the second cooling pipe 72 are located on the inner and outer sides of the buffer cavity 104, respectively. The middle part of the second cooling pipe 72 alternately passes through the left, bottom and right sides of the buffer cavity 104. Specifically, the second cooling pipe 72 is provided with a water inlet and a water outlet. The cooling medium circulates from the water inlet to the water outlet to eliminate local thermal stress on the mask plate. By wrapping the second cooling pipe 72 around the outer shell of the buffer cavity 104, the heat of the cavity wall of the buffer cavity 104 is carried away, preventing heat radiation from affecting the internal mask plate. By setting a single cooling pipe to connect the two cavities in series, the complexity of the pipeline is reduced. By arranging the serpentine pipe, the heat exchange area is maximized, which facilitates maintaining the low temperature environment of the buffer cavity 104 and ensures that components such as the robot arm 3 operate at a constant temperature, reducing positioning errors caused by thermal drift.
[0068] The above description is merely a preferred embodiment of the present utility model and is not intended to limit the present utility model in any way. Although the present utility model has been disclosed above with reference to a preferred embodiment, it is not intended to limit the present utility model. Any person skilled in the art can make some changes or modifications to the above-disclosed technical content to create equivalent embodiments without departing from the scope of the present utility model. Any simple modifications, equivalent changes, and modifications made to the above embodiments based on the present utility model without departing from the scope of the present utility model shall fall within the scope of the present utility model.
Claims
1. A vacuum cavity transport device, characterized in that, It includes a transfer cavity (1) and several process cavities connected to the transfer cavity (1). The several process cavities are respectively arranged around the transfer cavity (1), and the several process cavities are connected to the transfer cavity (1) through a gate valve (2). A robot arm (3) for conveying a mask plate is provided in the transfer cavity (1). The plurality of process chambers include a material chamber (101) connected to the transfer chamber (1), at least one process chamber (102), a calibration chamber (103) and a buffer chamber (104); The material chamber (101) is used to load and unload the mask plate; The calibration chamber (103) is equipped with a calibration mechanism (4) for positioning and calibrating masks of different sizes; The buffer cavity (104) is used to store the mask and to cool the mask. The mask conveying path is sequentially: material chamber (101), calibration chamber (103), process chamber (102), buffer chamber (104) and material chamber (101).
2. The vacuum cavity transmission device according to claim 1, characterized in that, The calibration mechanism (4) includes a support platform (41) installed in the calibration chamber (103), a plurality of support points (401) provided on the support platform (41), a first limiting component (42) movably connected to one side of the support platform (41), a second limiting component (43) movably connected to the support platform (41) and located on the other side corresponding to the first limiting component (42), a third limiting component (44) movably connected to the support platform (41) and located on the side adjacent to the second limiting component (43), and a fourth limiting component (45) installed on the support platform (41) and located on the side opposite to the third limiting component (44). The plurality of support points (401) constitute at least two support surfaces with different area sizes and different heights. The support surfaces are used to support mask plates of different sizes. The fourth limiting component (45) is used to position the first side of the mask plate. When the first limiting component (42), the second limiting component (43) or the third limiting component (44) moves into the support platform (41) to the required position, the second side, the third side or the fourth side of the mask plate is positioned.
3. The vacuum cavity transmission device according to claim 2, characterized in that, The support platform (41) is connected to at least four rows of support columns (411) located at its corners. Among the adjacent support columns (411), the outer support column (411) is higher than the inner support column (411). The support points (401) are set one by one at the top of each support column (411).
4. The vacuum cavity transmission device according to claim 2, characterized in that, The first limiting component (42) includes a limiting plate (421) that is horizontally slidably connected to the support platform (41) along the first direction (h) and a plurality of first limiting posts (422) installed on the limiting plate (421). Among the adjacent first limiting posts (422), the outer first limiting post (422) is higher than the inner first limiting post (422). The first limiting post (422) is used to position the second side of the mask plate. The second limiting component (43) includes a limiting seat (431) that is horizontally slidably connected to the support platform (41) along the first direction (h) and a plurality of second limiting posts (432) installed on the limiting seat (431). Among the adjacent second limiting posts (432), the outer second limiting post (432) is higher than the inner second limiting post (432). The second limiting post (432) is used to position the third side of the mask plate.
5. The vacuum cavity transmission device according to claim 3, characterized in that, The third limiting component (44) includes a limiting frame (441) that is horizontally slidably connected to the support platform (41) along the second direction (s) and at least two rows of third limiting posts (442) installed on the limiting frame (441). Each row of the third limiting posts (442) is parallel to a row of support posts (411) at the corresponding corner. Among the adjacent third limiting posts (442), the outer third limiting post (442) is higher than the inner third limiting post (442). The third limiting post (442) is used to position the fourth side of the mask plate.
6. The vacuum cavity transmission device according to claim 3, characterized in that, The fourth limiting component (45) includes at least two rows of fourth limiting posts (451) installed on the support platform (41). Each row of fourth limiting posts (451) is parallel to a row of support posts (411) at the corresponding corner. Among the adjacent fourth limiting posts (451), the outer fourth limiting post (451) is higher than the inner fourth limiting post (451). The fourth limiting post (451) is used to position the first side of the mask plate.
7. The vacuum cavity transmission device according to claim 5, characterized in that, The support platform (41) is provided with a drive member (5) that slides along the first direction (h). The drive member (5) is connected to the limiting frame (441). When the drive member (5) slides along the first direction (h), it drives the limiting frame (441) to slide synchronously along the second direction (s), so that the third limiting column (442) moves closer to or further away from the interior of the support platform (41).
8. The vacuum cavity transmission device according to claim 7, characterized in that, The support platform (41) is provided with a slide groove (412) extending along the first direction (h), the drive member (5) is equipped with a pulley (51), the pulley (51) is slidably engaged in the slide groove (412), the pulley (51) is connected to an extension rod (52), the limiting frame (441) is provided with a guide groove (4411), and the extension rod (52) passes through the guide groove (4411); When the drive member (5) slides along the first direction (h), it drives the pulley (51) and the extension rod (52) to move synchronously, and drives the extension rod (52) to slide along the guide groove (4411), so that the limit frame (441) slides along the second direction (s).
9. The vacuum cavity transmission device according to claim 1, characterized in that, The buffer cavity (104) is equipped with a support base (6), and the support base (6) is provided with at least three support parts (61) for supporting the mask plate; The top of the buffer cavity (104) is equipped with a cover plate (7), and the cover plate (7) is equipped with a first cooling pipe (71). The first cooling pipe (71) is arranged in a ring on the surface of the cover plate (7), and the two ends of the first cooling pipe (71) are provided with a first outlet and a first inlet.
10. The vacuum cavity transmission device according to claim 9, characterized in that, A second cooling pipe (72) is installed on the outside of the buffer cavity (104). The two ends of the second cooling pipe (72) are located on the inner and outer sides of the buffer cavity (104) respectively, and the middle part of the second cooling pipe (72) alternately passes through the left side, bottom surface and right side of the buffer cavity (104).