Facial Mask (Cloud)
CN309418934SActive Publication Date: 2025-08-01GUANGZHOU ZHECHENG NON-WOVEN FABRIC CO LTD
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Patent Information
- Application Number
- CN202430765626.6
- Authority / Receiving Office
- CN · China
- Patent Type
- Designs(China)
- Current Assignee / Owner
- Filing Date
- 2024-12-03
- Publication Date
- 2025-08-01
- Estimated Expiration
- 2039-12-03
Smart Images
Figure 000001_ABST
Abstract
1. Name of the design product: Facial mask (cloud). 2. Use of the design product: Applied to the human face for local intensive care of facial skin. 3. Design key points of the design product: Lies in the shape. 4. Picture or photo that best shows the design key points: Front view. 5. Other situations that need to be explained: Other explanations: This design product is a thin product, and the left view, right view, bottom view, top view, and perspective view are omitted.
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