Shielding for plasma chambers used in semiconductor manufacturing equipment
CN309429629SActive Publication Date: 2025-08-08LAM RES CORP
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Patent Information
- Application Number
- CN202430342219.4
- Authority / Receiving Office
- CN · China
- Patent Type
- Designs(China)
- Current Assignee / Owner
- Priority Date
- 2023-12-06
- Filing Date
- 2024-06-05
- Publication Date
- 2025-08-08
- Estimated Expiration
- 2039-06-05
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Figure 000004_ABST
Abstract
1. Name of the product of this design: Shielding components for plasma chambers used in semiconductor manufacturing equipment. 2. Application of this design product: It is used as a shielding component for the plasma chamber used in semiconductor manufacturing equipment. 3. The key point of the design of this product lies in the shape of the product. 4. The picture or photo that best illustrates the design points: three-dimensional picture. 5. Other situations that require explanation Other explanations: This product is a symmetrical figure. The three-dimensional view, pitch view, main view, and cross-sectional view have clearly expressed one side of the product. When in use, the side view is not common, so the rear view, left view, and right view are omitted.
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