Facial mask (Qiaorenya AI)
CN309431612SActive Publication Date: 2025-08-08朱海龙
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Patent Information
- Application Number
- CN202430779834.1
- Authority / Receiving Office
- CN · China
- Patent Type
- Designs(China)
- Current Assignee / Owner
- Filing Date
- 2024-12-09
- Publication Date
- 2025-08-08
- Estimated Expiration
- 2039-12-09
Smart Images
Figure 000001_ABST
Abstract
1. The name of the product of this design: Facial Mask (Qiaorenya AI). 2. Application of this design product: for facial mask. 3. The key design point of this design product lies in the combination of shape and pattern. 4. The picture or photo that best illustrates the key points of the design: main view. 5. This product is a thin product and the left, right, top and bottom views are omitted.
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