Etching equipment (ICP-betaAngel-200)
CN310008694SActive Publication Date: 2026-05-29RUIXINWEI (NANJING) SEMICONDUCTOR TECHNOLOGY CO LTD
Patent Information
- Authority / Receiving Office
- CN · China
- Patent Type
- Designs(China)
- Current Assignee / Owner
- RUIXINWEI (NANJING) SEMICONDUCTOR TECHNOLOGY CO LTD
- Filing Date
- 2025-11-20
- Publication Date
- 2026-05-29
Smart Images
Figure 000001_ABST
Abstract
1. The name of the design product: etching machine (ICP-beta Angel-200). 2. The use of the design product: for wafer etching process. 3. The design points of the design product: in shape. 4. The picture or photo that best indicates the design points: perspective view.
Need to check novelty before this filing date? Find Prior Art