focusing ring
CN310024087SActive Publication Date: 2026-06-09ADVANCED MICRO FAB EQUIP INC CHINA
Patent Information
- Authority / Receiving Office
- CN · China
- Patent Type
- Designs(China)
- Current Assignee / Owner
- ADVANCED MICRO FAB EQUIP INC CHINA
- Filing Date
- 2025-08-08
- Publication Date
- 2026-06-09
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Figure 000005_ABST
Abstract
1. Name of the product in this design: Focusing Ring. 2. Purpose of this design: To be installed around a base within a semiconductor processing cavity to adjust the electric and temperature field distribution around the base. 3. The key design feature of this product is its shape. 4. The picture or photo that best illustrates the key design points: Design 1 3D diagram 1. 5. The rear view, left view, and right view of Design 1 are the same as the front view of Design 1, so the rear view, left view, and right view of Design 1 are omitted; the rear view, left view, and right view of Design 2 are the same as the front view of Design 2, so the rear view, left view, and right view of Design 2 are omitted. 6. Design 1 is designated as the basic design.
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