Flow path of gas supply nozzle for semiconductor manufacturing

CN310080314SActive Publication Date: 2026-07-10NGK INSULATORS LTD

Patent Information

Authority / Receiving Office
CN · China
Patent Type
Designs(China)
Current Assignee / Owner
NGK INSULATORS LTD
Filing Date
2025-12-04
Publication Date
2026-07-10

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Abstract

1. Name of the designed product: flow path of gas supply nozzle for semiconductor manufacturing. 2. Use of the designed product: the gas supply nozzle for semiconductor manufacturing is used as a gas supply nozzle used in a semiconductor manufacturing device, and the designed product is used to spray a gas used in a semiconductor manufacturing process. 3. Design points of the designed product: in shape. 4. Picture or photograph best indicating the design points: design 1 front view. 5. Design 1 is designated as the basic design. 6. Other circumstances that need to be explained: the solid line part is the part to be protected. The product as a whole in each design is transparent.
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