Flow path of gas supply nozzle for semiconductor manufacturing
CN310080314SActive Publication Date: 2026-07-10NGK INSULATORS LTD
Patent Information
- Authority / Receiving Office
- CN · China
- Patent Type
- Designs(China)
- Current Assignee / Owner
- NGK INSULATORS LTD
- Filing Date
- 2025-12-04
- Publication Date
- 2026-07-10
Smart Images

Figure 000001_ABST
Abstract
1. Name of the designed product: flow path of gas supply nozzle for semiconductor manufacturing. 2. Use of the designed product: the gas supply nozzle for semiconductor manufacturing is used as a gas supply nozzle used in a semiconductor manufacturing device, and the designed product is used to spray a gas used in a semiconductor manufacturing process. 3. Design points of the designed product: in shape. 4. Picture or photograph best indicating the design points: design 1 front view. 5. Design 1 is designated as the basic design. 6. Other circumstances that need to be explained: the solid line part is the part to be protected. The product as a whole in each design is transparent.
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