Display substrate and display device

Abstract

A display substrate and a display device are provided. The display substrate comprises subpixels, a pixel definition pattern, and a definition structure. The subpixel comprises a light-emitting functional layer. The pixel definition pattern comprises first apertures and second apertures; a portion of at least one layer in the light-emitting functional layer located in the first aperture is a continuous portion; at least one portion in the light-emitting functional layer located in the second aperture is isolated; and a portion in the definition structure exposed by the second aperture isolates the light-emitting functional layer.The subpixels comprise a first subpixel and a second subpixel; the turn-on voltage of the first subpixel is higher than the turn-on voltage of the second subpixel; the definition structure comprises a first definition structure surrounding a light-emitting area of ​​the first subpixel and a second definition structure surrounding a light-emitting area of ​​the second subpixel; the first definition structure is not exposed by the second aperture; or a proportion of the first definition structure exposed by the second aperture is less than a proportion of the second definition structure exposed by the second aperture.

Description

AREA OF TECHNOLOGY

[0001] Embodiments of the present disclosure relate to a display substrate and a display device. STATE OF THE ART

[0002] Organic light-emitting diode (OLED) display products offer advantages such as vibrant colors, fast response times, and foldability. As display technology advances, users are placing increasingly higher demands on the lifespan and power consumption of display devices. An organic light-emitting tandem display device, by adding at least one light-emitting layer and one charge-generating layer to the organic light-emitting device, increases the lifespan and brightness of the device while reducing power consumption to meet user requirements for both lifespan and power consumption. SUMMARY

[0003] Embodiments of the present disclosure provide a display substrate and a display device.

[0004] At least one embodiment of the present disclosure provides a display substrate comprising: a base substrate and a plurality of subpixels, a pixel definition pattern, and a definition structure located on the base substrate. The base substrate comprises at least one first region; the plurality of subpixels is located in the first region; each subpixel under at least some subpixels comprises a light-emitting functional layer, and the light-emitting functional layer comprises a plurality of film layers; the pixel definition pattern comprises a plurality of first openings to define light-emitting regions of the at least some subpixels.The definition structure is located between the light-emitting functional layer and the base substrate, and the definition structure comprises a section that surrounds a light-emitting region of each subpixel beneath the at least some subpixels. The pixel definition pattern further comprises second apertures; a section of at least one layer in the light-emitting functional layer located in the first aperture is a continuous section; at least one section of the at least one layer in the light-emitting functional layer located in at least one second aperture is isolated; and a section in the definition structure exposed by the second aperture is configured to isolate the at least one layer of the light-emitting functional layer.the multitude of subpixels includes a first subpixel and a second subpixel, the turn-on voltage of the first subpixel is higher than the turn-on voltage of the second subpixel, the definition structure includes a first definition structure and a second definition structure, the first definition structure includes at least one section surrounding a light-emitting area of ​​the first subpixel, and the second definition structure includes at least one section surrounding a light-emitting area of ​​the second subpixel;the first definition structure is not exposed by the second opening, or a fraction of an edge length of a section in the first definition structure that is exposed by the second opening, relative to a perimeter of the first opening corresponding to the first subpixel, is smaller than a fraction of an edge length of a section in the second definition structure that is exposed by the second opening, relative to a perimeter of the first opening corresponding to the second subpixel.

[0005] According to one embodiment of the present disclosure, for example, the turn-on voltage of the first subpixel is 0.1 V to 5 V higher than the turn-on voltage of the second subpixel.

[0006] According to one embodiment of the present disclosure, for example, a section of the second definition structure exposed by the second opening is an open ring structure, and a proportion of the open ring structure on the circumference of the first opening corresponding to the second subpixel is in the range of 10% to 80%.

[0007] According to one embodiment of the present disclosure, the plurality of subpixels further comprises, for example, a third subpixel; the definition structure further comprises a third definition structure; the third definition structure comprises a section surrounding a light-emitting region of the third subpixel; the third definition structure is not exposed by the second opening; or the proportion of the edge length of the section in the first definition structure that is exposed by the second opening to the perimeter of the first opening corresponding to the first subpixel is smaller than a proportion of an edge length of a section in the third definition structure that is exposed by the second opening to a perimeter of the first opening corresponding to the third subpixel.

[0008] According to one embodiment of the present disclosure, for example, the section of the third definition structure exposed by the second opening is an open ring structure, and a proportion of the open ring structure on the circumference of the first opening corresponding to the third subpixel is in the range of 10% to 80%.

[0009] According to one embodiment of the present disclosure, for example, the first subpixel is a blue subpixel, one of the second subpixel and the third subpixel is a red subpixel, and the other of the second subpixel and the third subpixel is a green subpixel.

[0010] According to one embodiment of the present disclosure, for example, each subpixel among the at least some subpixels further comprises a first electrode and a second electrode located on both sides of the light-emitting functional layer along a direction perpendicular to the base substrate, wherein the first electrode is located between the light-emitting functional layer and the base substrate and the pixel definition pattern is located on a side of the first electrode away from the base substrate; the definition structure is located between the first electrode and the base substrate.

[0011] According to one embodiment of the present disclosure, the pixel definition pattern comprises, for example, a pixel definition section surrounding the first opening and the second opening; along a direction perpendicular to the base substrate, at least one section of the pixel definition section does not overlap with the definition structure.

[0012] According to one embodiment of the present disclosure, for example, each subpixel among the at least some subpixels further comprises a first electrode and a second electrode located on both sides of the light-emitting functional layer along a direction perpendicular to the base substrate, wherein the first electrode is located between the light-emitting functional layer and the base substrate, and the pixel definition pattern is located on a side of the first electrode away from the base substrate; the first definition structure is not exposed through the second opening, and the ring width of a ring section of the first definition structure not covered by the first electrode of the first subpixel is less than the ring width of a ring section of the second definition structure not covered by the first electrode of the second subpixel.

[0013] According to one embodiment of the present disclosure, for example, each subpixel among the at least some subpixels further comprises a first electrode and a second electrode located on both sides of the light-emitting functional layer along a direction perpendicular to the base substrate, wherein the first electrode is located between the light-emitting functional layer and the base substrate, and the pixel definition pattern is located on a side of the first electrode away from the base substrate; the proportion of the edge length of the section in the first definition structure exposed by the second opening to the circumference of the first opening corresponding to the first subpixel is smaller than the proportion of the edge length of the section in the second definition structure exposed by the second opening to the circumference of the first opening corresponding to the second subpixel;a ring width of a section that does not have an overlapping section with the second opening in a ring section of the first definition structure not covered by the first electrode of the first subpixel is a first ring width; a ring width of a section that has an overlapping section with the second opening in the ring section of the first definition structure is a second ring width, and the first ring width is smaller than the second ring width.

[0014] According to one embodiment of the present disclosure, for example, each subpixel, among the at least some subpixels, further comprises a first electrode and a second electrode located on both sides of the light-emitting functional layer along a direction perpendicular to the base substrate, wherein the first electrode is located between the light-emitting functional layer and the base substrate, and the pixel definition pattern is located on a side of the first electrode away from the base substrate; the base substrate further comprises a second region, the definition structure comprises at least one loop of a closed annular definition structure surrounding the second region, and the light-emitting functional layer and the second electrode are both separated at an edge position of the annular definition structure.

[0015] According to one embodiment of the present disclosure, the pixel definition pattern comprises, for example, a pixel definition section surrounding the first aperture and the second aperture, and along the direction perpendicular to the base substrate, at least one section of the annular definition structure does not overlap with the pixel definition section.

[0016] According to one embodiment of the present disclosure, the at least one loop of the closed annular definition structure comprises, for example, a plurality of loops of annular definition structures, and an interval between two adjacent loops of annular definition structures is not less than 1 micrometer.

[0017] According to one embodiment of the present disclosure, the defining structure comprises, for example, a first insulating layer and a second insulating layer stacked together, wherein the first insulating layer is located on a side of the second insulating layer furthest from the base substrate and an edge of the first insulating layer projects relative to an edge of the second insulating layer.

[0018] According to one embodiment of the present disclosure, for example, a material of the first insulating layer differs from a material of the second insulating layer, wherein the material of the first insulating layer comprises an inorganic non-metallic material or a metallic material and the material of the second insulating layer comprises an organic material or an inorganic non-metallic material.

[0019] According to one embodiment of the present disclosure, the plurality of subpixels further comprises, for example, a third subpixel; the plurality of subpixels is arranged in a plurality of first subpixel groups and a plurality of second subpixel groups, which are arranged alternately along a first direction; the respective first subpixel groups each comprise first subpixels and second subpixels, which are arranged alternately along a second direction; the respective second subpixel groups each comprise third subpixels, which are arranged along the second direction; and the first direction intersects the second direction.

[0020] According to one embodiment of the present disclosure, the definition structure further comprises, for example, a third definition structure; the first definition structure comprises an open annular first isolation section surrounding the light-emitting area of ​​the first subpixel; the second definition structure comprises an open annular second isolation section surrounding the light-emitting area of ​​the second subpixel; and the third definition structure comprises an open annular third isolation section surrounding the light-emitting area of ​​the third subpixel; the shapes of the light-emitting areas of the first subpixel, the second subpixel, and the third subpixel are all quadrilaterals;the first isolation section surrounds two adjacent edges of the light-emitting area of ​​the first subpixel and a first corner section formed by joining the two adjacent edges, or the first isolation section surrounds a section of two adjacent edges of the light-emitting area of ​​the first subpixel except for a first corner section formed by joining the two adjacent edges, the second isolation section surrounds two adjacent edges of the light-emitting area of ​​the second subpixel and a second corner section formed by joining the two adjacent edges, the third isolation section surrounds two adjacent edges of the light-emitting area of ​​the third subpixel and a third corner section formed by joining the two adjacent edges, and the orientations of the first corner section, the second corner section, and the third corner section are all the same.

[0021] According to one embodiment of the present disclosure, the second defining structure comprises, for example, an open annular second isolation section surrounding the light-emitting area of ​​the second subpixel; the shapes of the light-emitting areas of the first subpixel, the second subpixel and the third subpixel are all quadrilateral, and the second isolation section surrounds four edges of the light-emitting area of ​​the second subpixel.

[0022] According to one embodiment of the present disclosure, the definition structure further comprises, for example, a third definition structure, wherein the third definition structure comprises an open annular third isolation section surrounding the light-emitting area of ​​the third subpixel, and the third isolation section surrounds two edges of the light-emitting area of ​​the third subpixel that are immediately adjacent to the light-emitting area of ​​the first subpixel.

[0023] According to one embodiment of the present disclosure, the second definition structure comprises, for example, an open annular second isolation section surrounding the light-emitting area of ​​the second subpixel; the definition structure further comprises a third definition structure, and the third definition structure comprises an open annular third isolation section surrounding the light-emitting area of ​​the third subpixel; the shapes of the light-emitting areas of the first subpixel, the second subpixel, and the third subpixel are all quadrilaterals; the shapes of the light-emitting areas of the first subpixel, the second subpixel, and the third subpixel are all quadrilaterals;the second isolation section surrounds two adjacent edges of the light-emitting area of ​​the second subpixel and a second corner section formed by joining the two adjacent edges; the third isolation section surrounds two adjacent edges of the light-emitting area of ​​the third subpixel and a third corner section formed by joining the two adjacent edges; and the orientations of the second corner section and the third corner section are both the same.

[0024] According to one embodiment of the present disclosure, for example, at least one film layer of the light-emitting functional layer comprises a charge-generating layer; the light-emitting functional layer comprises a first light-emitting layer, the charge-generating layer, and a second light-emitting layer, which are stacked; the charge-generating layer is located between the first light-emitting layer and the second light-emitting layer, and the charge-generating layer is separated at an edge of the defining structure.

[0025] One embodiment of the present disclosure provides a display substrate comprising a base substrate and a plurality of subpixels, a pixel definition pattern, and a definition structure located on the base substrate. The base substrate comprises at least one first region; the plurality of subpixels are located in the first region, each subpixel under at least some subpixels comprising a light-emitting functional layer, and the light-emitting functional layer comprising a plurality of film layers; the pixel definition pattern is located on the base substrate, the pixel definition pattern comprising a plurality of first openings to define light-emitting regions of the at least some subpixels;The definition structure is located between the light-emitting functional layer and the base substrate, and the definition structure comprises a section that surrounds a light-emitting region of each subpixel beneath the at least some subpixels. The pixel definition pattern further comprises second apertures, wherein a section of at least one layer in the light-emitting functional layer located in the first aperture is a continuous section, wherein at least one section of the at least one layer in the light-emitting functional layer located in at least one second aperture is isolated, and wherein a section in the definition structure exposed by the second aperture is configured to isolate the at least one layer of the light-emitting functional layer.the plurality of subpixels comprises a first subpixel and a second subpixel, wherein the turn-on voltage of the first subpixel is higher than the turn-on voltage of the second subpixel; a distance between an edge of a light-emitting region of the first subpixel and a second aperture that is closest to the edge of the light-emitting region of the first subpixel is a first distance, a distance between an edge of a light-emitting region of the second subpixel and a second aperture that is immediately adjacent to the edge of the light-emitting region of the second subpixel is a second distance, and the first distance is greater than the second distance;or the definition structure comprises a first definition structure and a second definition structure, wherein the first definition structure comprises at least one section surrounding the light-emitting area of ​​the first subpixel, and the second definition structure comprises at least one section surrounding the light-emitting area of ​​the second subpixel; a fraction of an edge length of a section in the first definition structure exposed by the second aperture, relative to a perimeter of the first aperture corresponding to the first subpixel, is smaller than a fraction of an edge length of a section in the second definition structure exposed by the second aperture, relative to a perimeter of the first aperture corresponding to the second subpixel.

[0026] According to one embodiment of the present disclosure, for example, the turn-on voltage of the first subpixel is 0.1 V to 5 V higher than the turn-on voltage of the second subpixel.

[0027] According to one embodiment of the present disclosure, the plurality of subpixels further comprises, for example, a third subpixel, the second opening is provided between the first subpixel and the third subpixel, a distance between the edge of the light-emitting area of ​​the first subpixel and the second opening is a third distance, a distance between the edge of the light-emitting area of ​​the third subpixel and the second opening is a fourth distance, and the third distance is greater than the fourth distance; or the definition structure further comprises a third definition structure, wherein the third definition structure comprises a section surrounding the light-emitting area of ​​the third subpixel;wherein the fraction of the edge length of the section in the first definition structure exposed by the second opening, relative to the perimeter of the first opening corresponding to the first subpixel, is smaller than the fraction of an edge length of a section in the third definition structure exposed by the second opening, relative to the perimeter of the first opening corresponding to the third subpixel.

[0028] According to one embodiment of the present disclosure, for example, a section of the second definition structure exposed by the second opening is an open ring structure, and a proportion of the open ring structure on the circumference of the first opening corresponding to the second subpixel is in the range of 10% to 80%.

[0029] According to one embodiment of the present disclosure, for example, a section of the third defining structure exposed by the second opening is an open ring structure, and a proportion of the open ring structure on the circumference of the first opening corresponding to the third subpixel is in the range of 10% to 80%.

[0030] According to one embodiment of the present disclosure, for example, each subpixel among the at least some subpixels further comprises a first electrode and a second electrode located on both sides of the light-emitting functional layer along a direction perpendicular to the base substrate, wherein the first electrode is located between the light-emitting functional layer and the base substrate and the pixel definition pattern is located on a side of the first electrode away from the base substrate; the base substrate further comprises a second region, the definition structure comprises at least one loop of a closed annular definition structure surrounding the second region, and the light-emitting functional layer and the second electrode are both separated at an edge position of the annular definition structure.

[0031] One embodiment of the present disclosure provides a display device comprising the display substrate in one of the above embodiments. BRIEF DESCRIPTION OF THE FIGURES

[0032] In order to clearly illustrate the technical solution of the embodiments of the present disclosure, the drawings of the embodiments are briefly described below; it is obvious that the described drawings relate only to some embodiments of the present disclosure and are therefore not limiting to the present disclosure. Fig. Figure 1 is a top view of a display substrate provided by an example according to an embodiment of the present disclosure. Fig. 2 is a structure diagram of an A11 area of ​​the in Fig. 1. Display substrate shown in an example. Fig. 3 is a schematic diagram of a partial cross-sectional structure extending along a Fig. The AA' line shown in section 2 is cut. Fig. 4 to Fig. 7 are structure diagrams of the A11 area of ​​the in Fig. 1. Display substrate shown in various examples. Fig. Figure 8 is a schematic diagram of a partial planar structure of a definition structure in which the Fig. 2 and Fig. 4 to Fig. 7. Display substrate shown. Fig. 9 and Fig. Figure 10 are schematic diagrams of a partial planar structure of the display substrate shown in other examples according to the embodiment of the present disclosure. Fig. 11 and Fig. Figure 12 are schematic representations of a partial cross-sectional structure of the definition structure and an insulation layer in various examples according to the embodiment of the present disclosure. Fig. Figure 13 is a schematic diagram of a partial cross-sectional structure extending along a Fig. The EE' line shown in 1 is cut. Fig. Figure 14A is a partial top view of the display substrate provided by another example according to the present disclosure. Fig. 14B is a schematic diagram of a partial cross-sectional structure extending along a Fig. The DD' line shown in 14A is cut. Fig. 15 to Fig. Figure 17 are partial planar structure diagrams of the definition structure shown in other examples according to the embodiment of the present disclosure. Fig. Figure 18 is a schematic diagram of a partial planar structure of the display substrate provided by another example according to the embodiment of the present disclosure. DETAILED DESCRIPTION OF THE REVELATION

[0033] To clarify the objects, technical details, and advantages of the embodiments of this disclosure, the technical solutions of the embodiment are described in a clear and fully understandable manner in conjunction with the drawings relating to the embodiments of this disclosure. It is obvious that the described embodiments represent only one part, but not all, of the embodiments of this disclosure. Based on the embodiments described herein, a person skilled in the art can, without inventive step, derive other embodiments that fall within the scope of this disclosure.

[0034] Unless otherwise defined, all technical and scientific terms used herein have the same meaning as generally understood by a person skilled in the art in the field to which the present disclosure belongs. The terms "first," "second," etc., used in the present application for disclosure are not intended to indicate any order, quantity, or significance, but rather to distinguish different components. The terms "comprise," "containing," "include," "including," etc., are intended to indicate that the elements or objects mentioned before these terms include the elements or objects listed after these terms and their equivalents, but do not exclude other elements or objects.

[0035] Features such as "parallel," "perpendicular," and "identical," etc., used in the embodiments of the present disclosure, include all strictly defined features such as "parallel," "perpendicular," and "identical," as well as cases where certain errors are included, such as "substantially parallel," "substantially perpendicular," and "substantially identical," given that errors related to the measurement of a particular quantity (e.g., limitations of a measuring system) indicate that these features lie within an acceptable range of deviation for a given value, as determined by those skilled in the art. For example, the term "substantially" may mean that the features lie within one or more standard deviations, or within 10% or 5% of a value.If the quantity of a component is not specifically stated in the following text of the embodiments of this disclosure, this means that the quantity of such a component may be one or more, or may be understood as at least one component. The expression "at least one" refers to one or more, and "more" refers to at least two.

[0036] The “integrated structure” according to the present disclosure refers to a structure formed from two (or more) structures that are connected to each other using the same deposition process and the same patterning process, the two structures being made of the same material or of different materials.

[0037] In the study, the inventor of the present application states that a light-emitting functional layer of a light-emitting element can comprise a plurality of stacked light-emitting layers, for example, a tandem device; the tandem device has the characteristics of low power consumption and a long lifetime. However, a charge-generating layer (CGL) is arranged between at least two layers of the plurality of light-emitting layers of the tandem device, and the charge-generating layer has a higher conductivity. If the charge-generating layer is, for example, a continuous film layer, the charge-generating layers of two adjacent light-emitting elements are continuous film layers, and there is a phenomenon of lateral charge transfer that leads to a monochromatic color shift of the display substrate at low grayscale, e.g.Crosstalk between neighboring subpixels is easily caused, resulting in a color cast on the display substrate. For example, at low brightness, the charge generation layer can easily cause crosstalk between subpixels of different colors, leading to a color cast at low grayscale levels.

[0038] The embodiments of the present disclosure provide a display substrate and a display device. The display substrate comprises a base substrate and a plurality of subpixels, a pixel definition pattern, and a definition structure located on the base substrate. The base substrate comprises at least one first region; the plurality of subpixels are located in the first region, each subpixel under at least some subpixels comprises a light-emitting functional layer, and the light-emitting functional layer comprises a plurality of film layers. The pixel definition pattern is located on the base substrate; the pixel definition pattern comprises a plurality of first openings to define light-emitting regions of the at least some subpixels.The definition structure is located between the light-emitting functional layer and the base substrate, and the definition structure comprises a section that surrounds a light-emitting area of ​​each subpixel beneath at least some subpixels. The pixel definition pattern further comprises a second aperture; a section of at least one layer in the light-emitting functional layer located in the first aperture is a continuous section; at least one section of at least one layer in the light-emitting functional layer located in at least a second aperture is isolated.and a section in the definition structure, exposed through the second aperture, is configured to isolate the at least one layer of the light-emitting functional layer. The plurality of subpixels comprises a first subpixel and a second subpixel; the turn-on voltage of the first subpixel is higher than the turn-on voltage of the second subpixel; the definition structure comprises a first definition structure and a second definition structure; the first definition structure includes at least one section surrounding a light-emitting region of the first subpixel; the second definition structure includes at least one section surrounding a light-emitting region of the second subpixel; the first definition structure is not exposed through the second aperture.or a fraction of an edge length in the first definition structure exposed by the second opening, relative to a perimeter of a first opening corresponding to the first subpixel, is smaller than a fraction of an edge length in the second definition structure exposed by the second opening, relative to a perimeter of a first opening corresponding to the second subpixel.

[0039] In the display substrate provided by the present disclosure, the first definition structure in the periphery of the first subpixel with a higher turn-on voltage is set such that it is not exposed by the second opening or has a smaller section exposed by the second opening, so that the second electrode of the first subpixel has a conduction channel with a larger area, which improves the conductivity of the second electrode of the first subpixel and is advantageous to avoid excessive power consumption and brightness uniformity problems of the display substrate.

[0040] The display substrate and display device provided by the embodiments of the present disclosure are described below in conjunction with the accompanying drawings.

[0041] Fig. Figure 1 is a top view of a display substrate provided by an embodiment of the present disclosure. Fig. 2 is a structure diagram of an A11 area of ​​a [system / project / etc.] Fig. 1. Display substrate shown in an example. Fig. 3 is a schematic diagram of a partial cross-sectional structure extending along a Fig. The AA' line shown in section 2 is cut. Fig. Figure 2 shows a first electrode of a light-emitting element, but not a second electrode of the light-emitting element.

[0042] As in Fig. 1 to Fig. As shown in Figure 3, the display substrate comprises a base substrate 01 and a plurality of subpixels 10, a pixel definition pattern 400, and a definition structure 200 located on the base substrate 01. The base substrate 01 comprises at least one first region A1; the plurality of subpixels 10 are located in the first region A1; each subpixel 10 within the at least some subpixels 10 comprises a light-emitting functional layer 130; and the light-emitting functional layer 130 comprises a plurality of film layers.

[0043] For example, subpixel 10 comprises a light-emitting element 100, which in turn comprises a light-emitting functional layer 130, a first electrode 110, and a second electrode 120 located on either side of the light-emitting functional layer 130 in a direction perpendicular to the base substrate 01, with the first electrode 110 situated between the light-emitting functional layer 130 and the base substrate 01. For example, the light-emitting functional layer 130 includes a charge-generating layer 133. The light-emitting element 100 can, for example, be an organic light-emitting element. For example, the display substrate comprises a display area; the first area comprises the display area, and each subpixel located within the display area comprises a light-emitting element.

[0044] As in Fig. As shown in Figure 3, the light-emitting functional layer 130 can, for example, contain a first light-emitting layer (EML) 131, a charge-generating layer (CGL) 133, and a second light-emitting layer (EML) 132, which are stacked, with the charge-generating layer 133 located between the first light-emitting layer 131 and the second light-emitting layer 132. The charge-generating layer has high conductivity and can provide the light-emitting functional layer with the advantages of a long lifetime, low power consumption, and high brightness. Compared to a light-emitting functional layer without a charge-generating layer, the brightness of the light emission of the subpixels can be increased almost twice, for example, by incorporating a charge-generating layer into the light-emitting functional layer.

[0045] For example, the light-emitting element 100 of the same subpixel 10 can be a tandem light-emitting element, for example a tandem OLED.

[0046] The charge generation layer 133 can, for example, include an N-type charge generation layer and a P-type charge generation layer.

[0047] For example, the light-emitting functional layer 130 can further contain a hole injection layer (HIL), a hole transport layer (HTL), an electron transport layer (ETL) and an electron injection layer (EIL) etc. under the respective subpixels 10.

[0048] For example, the hole injection layer, the hole transport layer, the electron transport layer, the electron injection layer, and the charge generation layer 133 are all common film layers of the plurality of subpixels 10 and can be referred to as common layers. For example, the at least one film layer in the light-emitting functional layer 130, which is separated at an edge of the definition structure 200, can be at least one film layer in the common layers described above. At least one film layer in the common layer described above is separated at an edge of the definition structure 200 that lies between adjacent subpixels, which can be advantageous for reducing the probability of crosstalk between adjacent subpixels.For example, the common layers described above and the second electrode can be film layers formed by using an open mask.

[0049] For example, the second light-emitting layer 132 can be arranged between the first light-emitting layer 131 and the second electrode 120, and the hole injection layer can be arranged between the first electrode 110 and the first light-emitting layer 131. The electron transport layer can also be arranged, for example, between the charge-generating layer 133 and the first light-emitting layer 131. The hole transport layer can, for example, be arranged between the second light-emitting layer 132 and the charge-generating layer 133. For example, the electron transport layer and the electron injection layer can be arranged between the second light-emitting layer 132 and the second electrode 120.

[0050] For example, in one and the same subpixel 10, the first light-emitting layer 131 and the second light-emitting layer 132 can be light-emitting layers that emit light of the same color. In subpixels 10 that emit light of different colors, the first light-emitting layers 131, for example, emit light of different colors. For example, in the subpixels 10 that emit light of different colors, the second light-emitting layers 132 emit light of different colors. Of course, the embodiment of the present disclosure is not limited to, for example,In the same subpixel 10, the first light-emitting layer 131 and the second light-emitting layer 132 can be light-emitting layers that emit light of different colors; by setting light-emitting layers that emit light of different colors in the same subpixel 10, light emitted by a variety of light-emitting layers contained in the subpixel 10 can be mixed to white light, and the color of the outgoing light from each subpixel can be set by setting a color filter layer.

[0051] For example, an electron transport layer material may contain aromatic heterocyclic compounds, such as imidazole derivatives like benzimidazole derivatives, imidazolium pyridine derivatives, benzimidazole phenanthridine derivatives, etc.; zine derivatives like pyrimidine derivatives, triazine derivatives, etc.; compounds with nitrogen-containing six-membered ring structures (including compounds with substitution groups of the phosphine oxide series on heterocycles) such as quinoline derivatives, isoquinoline derivatives, phenanthroline derivatives, etc.

[0052] The charge-generating layer 133 can, for example, consist of a material with phosphorus oxide groups or a material with triazine.

[0053] The ratio of the electron mobility of the material of the charge-generating layer 133 to the electron mobility of the electron transport layer is, for example, 10 -2 up to 10 2 .

[0054] For example, the first electrode 110 can be an anode and the second electrode 120 a cathode. For example, the cathode can be made of a material with high conductivity and low power handling; for example, the cathode can be made of a metal. The anode can, for example, be made of a transparent, conductive material with high power handling.

[0055] As in Fig. As shown in Figure 3, for example, an orthographic projection of the second electrode 120 in at least some subpixels 10 on the base substrate 01 is a full-surface structure. For example, the second electrode 120 can be a common electrode shared by the first subpixel 11 and the second subpixel 12. For example, the second electrode 120 can be a common electrode shared by the at least some subpixels 10 described above.

[0056] As in Fig. As shown in Figure 3, for example, an insulation layer 500 is provided between the first electrode 110 and the base substrate 01. Fig. 3. Other structures between the insulation layer 500 and the base substrate 01, e.g. a film layer containing signal lines such as gate lines and data lines, as well as other insulation layers, are not shown.

[0057] As in Fig. 1 to Fig. As shown in Figure 3, the pixel definition pattern 400 is located on a side of the first electrode 110 away from the base substrate 01. The pixel definition pattern 400 comprises a plurality of first apertures 410 to define light-emitting regions 101 of at least some subpixels 10. For example, a subpixel 10 corresponds to at least one first aperture 410, the light-emitting element 100 of the subpixel 10 is located at least partially in the first aperture 410 corresponding to the subpixel 10, and the first aperture 410 is configured to expose the first electrode 110. For example, the first aperture 410 exposes a portion of the first electrode 110. For example, a subpixel 10 can correspond to a first aperture 410.

[0058] For example, as in Fig. 2 and Fig. As shown in Figure 3, when the light-emitting functional layer 130 is formed in the first aperture 410 of the pixel definition pattern 400, the first electrode 110 and the second electrode 120, located on either side of the light-emitting functional layer 130, are able to drive the light-emitting functional layer 130 in the first aperture 410 to emit light. For example, the light-emitting area described above can refer to an area in which subpixels effectively emit light; and a shape of the light-emitting area refers to a two-dimensional shape, for example, the shape of the light-emitting area can be the same as a shape of the first aperture 410 of the pixel definition pattern 400.

[0059] As in Fig. As shown in Figure 3, the pixel definition pattern 400, for example, comprises a pixel definition section 401 that surrounds the first aperture 410; and the material of the pixel definition section 401 can include polyimide, acrylic, or polyethylene terephthalate, etc. For example, the pixel definition section 401 contained in the pixel definition pattern 400 covers a portion of the first electrode 110.

[0060] As in Fig. 2 and Fig. As shown in Figure 3, the definition structure 200 is located between the light-emitting functional layer 130 and the base substrate 01. The definition structure 200 comprises a section that surrounds the light-emitting area 11 of each subpixel 10 under at least some of the subpixels 10. For example, two adjacent subpixels 10 arranged along an X-direction, a Y-direction, or a V-direction form a first color subpixel, respectively.a second color subpixel; the definition structure 200 comprises a section that surrounds a light-emitting area of ​​the first color subpixel; an edge of the section of the definition structure is substantially parallel to a boundary of the light-emitting area of ​​the first color subpixel; and the distances between more than 90% of the positions in the section and the boundary of the light-emitting area of ​​the first color subpixel are all the same, for example, all are first distances; a distance between the edge of the section of the definition structure and the boundary of the light-emitting area of ​​the second color subpixel is a second distance, and the first distance is smaller than the second distance.

[0061] In some examples, such as in Fig. 2 and Fig. As shown in Figure 3, the definition structure 200 is located between the first electrode 110 and the base substrate 01.

[0062] As in Fig. As shown in Figure 3, for example, an orthographic projection of the first aperture 410 on the base substrate 01 is completely within an orthographic projection of the definition structure 200 on the base substrate 01. Similarly, an orthographic projection of the first electrode 110 on the base substrate 01 is completely within the orthographic projection of the definition structure 200 on the base substrate 01.

[0063] As in Fig. 2 to Fig. As shown in Figure 3, the pixel definition pattern 400 further comprises a second aperture 420; a section of the at least one layer in the light-emitting functional layer 130 located in the first aperture 410 is a continuous section; at least one section of the at least one layer in the light-emitting functional layer located in at least one second aperture 420 is isolated; and a section in the definition structure 200 exposed by the second aperture 420 is configured to isolate the at least one layer of the light-emitting functional layer 130. For example, the charge-generating layer 133 in the light-emitting functional layer 130 is arranged continuously in the first aperture 410 and separated in at least one second aperture 420.

[0064] For example, in Fig. 2 to Fig. As shown in Figure 3, the section in the definition structure 200, exposed through the second aperture 420, comprises an isolation section 201. The isolation section 201 is positioned between at least two adjacent subpixels 10, and at least one layer in the light-emitting functional layer 130 is separated at an edge of the isolation section 201. By placing the isolation section between adjacent subpixels to isolate the at least one layer in the light-emitting functional layer, it is advantageous to reduce crosstalk between adjacent subpixels. For example, the isolation section described above refers to a structure in the definition structure exposed through the second aperture.

[0065] In every embodiment of the present disclosure, “adjacent subpixels” refer to two subpixels between which no other subpixel is arranged. The adjacent subpixels may be two subpixels of the same color or two subpixels of different colors.

[0066] As in Fig. As shown in Figure 3, for example, at least one section of the second electrode 120 is separated at the edge of the insulation section 201.

[0067] In some examples, such as in Fig. As shown in Figure 3, the definition structure 200, e.g., the insulation section 201, comprises a first insulation layer 21 and a second insulation layer 22, which are stacked, with the first insulation layer 21 being located on a side of the second insulation layer 22 furthest from the base substrate 01 and an edge of the first insulation layer 21 projecting relative to an edge of the second insulation layer 22. For example, the size by which the edge of the second insulation layer 22 shrinks inward relative to the edge of the first insulation layer 21 is not less than 0.05 micrometers, for example, not less than 0.08 micrometers, for example, not less than 0.1 micrometers, for example, not less than 0.15 micrometers, for example, not less than 0.2 micrometers, for example, not less than 0.5 micrometers.

[0068] The edge of the definition structure is set such that the edge of the first isolation layer protrudes relative to the edge of the second isolation layer in order to isolate at least one layer of the light-emitting functional layer.

[0069] As in Fig. As shown in Figure 3, the thickness of the definition structure 200 can be greater than 100 angstroms. For example, the thickness of the definition structure 200 can range from 150 angstroms to 5,000 angstroms. For example, the thickness of the definition structure 200 can range from 200 to 500 angstroms. The thickness of the definition structure 200 can range from 300 to 1,000 angstroms. The thickness of the definition structure 200 can range from 400 to 2,000 angstroms. For example, the thickness of the definition structure 200 can range from 600 to 1,500 angstroms.

[0070] In some examples, such as in Fig. As shown in Figure 3, the material of the first insulating layer 21 differs from that of the second insulating layer 22. The material of the first insulating layer 21 comprises an inorganic non-metallic material or a metallic material, while the material of the second insulating layer 22 comprises an organic material or an inorganic non-metallic material.

[0071] For example, the etch selectivity of an etching solution towards the material of the second insulating layer 22 is greater than the etch selectivity of an etching solution towards the material of the first insulating layer 21, so that the edge of the second insulating layer 22 formed after etching shrinks inwards relative to the edge of the first insulating layer 21.

[0072] The material of the first insulating layer 21 can, for example, contain silicon nitride or silicon oxide. The material of the second insulating layer 22 can, for example, comprise materials such as polyimide.

[0073] Of course, the embodiment of the present disclosure is not limited to the defining structure comprising two stacked structural layers, but may also comprise three stacked structural layers; wherein a structural layer furthest from the base substrate projects relative to an edge of a middle structural layer to implement the isolation of the light-emitting functional layer; for example, a structural layer closest to the base substrate may also project relative to the edge of the middle structural layer; or the isolation section may comprise only one structural layer, and the edge of the structure has a projecting section for isolating the light-emitting functional layer.

[0074] As in Fig. As shown in Figure 2, for example, along the V-direction the size of a first opening 410 can be larger than the size of a second opening 420, which extends along a direction that intersects the V-direction.

[0075] In some examples, such as in Fig. 2 and Fig. As shown in Figure 3, the pixel definition pattern 400 comprises a pixel definition section 401 that surrounds the first aperture 410 and the second aperture 420; in the direction perpendicular to the base substrate 01, at least one section of the pixel definition section 401 does not overlap with the definition structure 200. In the direction perpendicular to the base substrate 01, the definition structure 200 includes, for example, a section that overlaps with the pixel definition section 401, a section that overlaps with the first aperture 410, and a section that overlaps with the second aperture 420. For example, at least one section of the pixel definition section 401 overlaps with a gap between adjacent definition structures 200 (as shown in Figure 3). Fig. As shown in Figure 2, a white gap between adjacent definition structures is covered by the pixel definition section.

[0076] As in Fig. As shown in Figure 3, for example, along the direction perpendicular to the base substrate 01, the thickness of the definition structure 200 is less than the thickness of the pixel definition section 401.

[0077] As in Fig. 2 and Fig. As shown in Figure 3, the plurality of subpixels 10 comprises a first subpixel 11 and a second subpixel 12, the turn-on voltage of the first subpixel 11 is higher than the turn-on voltage of the second subpixel 12; the definition structure 200 comprises a first definition structure 210 and a second definition structure 220, the first definition structure 210 includes a section surrounding the light-emitting area of ​​the first subpixel 11, and the second definition structure 220 includes a section surrounding the light-emitting area of ​​the second subpixel 12.

[0078] The first definition structure comprises a section that overlaps with the light-emitting area of ​​the first subpixel and a section that surrounds the light-emitting area of ​​the first subpixel; the second definition structure comprises a section that overlaps with the light-emitting area of ​​the second subpixel and a section that surrounds the light-emitting area of ​​the second subpixel. For example, the second aperture that exposes the edge of the definition structure surrounding the light-emitting area of ​​the subpixel can be referred to as the second aperture surrounding the light-emitting area of ​​the subpixel; the distance between the second aperture and the edge of the light-emitting area of ​​the subpixel is closer, and the distance between the second aperture and the edge of the light-emitting area of ​​the other subpixel is farther.

[0079] As in Fig. 2 to Fig. As shown in Figure 3, the first definition structure 210 is not exposed through the second aperture 420, and the second definition structure 220 is exposed through the second aperture 420. For example, neither the light-emitting functional layer 130 nor the second electrode 120 of the first subpixel 11 is separated at the edge of the first definition structure 210, whereas the light-emitting functional layer 130 and the second electrode 120 of the second subpixel 12 are both separated at the edge of the second definition structure 220. For example, the charge-generating layer 133 in the light-emitting functional layer 130, which is shared by the first subpixel 11 and the second subpixel 12, can be separated at the edge of the second definition structure 220 exposed through the second aperture 420 to reduce crosstalk between the first subpixel 11 and the second subpixel 12.For example, the feature described above, that the first definition structure is not exposed by the second aperture, refers to the fact that the first definition structure is completely covered by the pixel definition section surrounding the first aperture and the second aperture.

[0080] In the display substrate provided by the present disclosure, the first subpixel has a high turn-on voltage and high power consumption; a voltage at which the display substrate implements white light (e.g., a VSS voltage) is limited by a voltage difference between the first electrode and the second electrode of the first subpixel; for example, the first subpixel requires a higher cross-voltage between the first electrode and the second electrode.By positioning the first definition structure in the periphery of the first subpixel so that it is not exposed through the second opening, the second electrode of the first subpixel is not separated at an edge of the corresponding first definition structure and thus has a conductive channel with a larger area, which improves the conductive effect of the second electrode of the first subpixel and is advantageous to avoid excessive power consumption and brightness uniformity problems of the display substrate.

[0081] The in Fig. The display substrate shown in Figure 2 adopts a setting mode in which the first definition structure is not exposed through the second opening and the second definition structure is exposed through the second opening, which is advantageous for better balancing of crosstalk and power consumption of the display substrate.

[0082] Fig. Figure 2 schematically shows that the first subpixel 11 and the second subpixel 12 are subpixels configured to emit light of different colors, but it is not limited to this, and the first subpixel and the second subpixel can also be configured as subpixels emitting light of the same color.

[0083] In some examples, such as in Fig. As shown in Figure 2, the multitude of subpixels 10 also includes a third subpixel 13.

[0084] As in Fig. As shown in Figure 2, for example, the area of ​​a light-emitting region of a first subpixel 11 is larger than the area of ​​a light-emitting region of a second subpixel 12, and the area of ​​the light-emitting region of a first subpixel 11 is larger than the area of ​​a light-emitting region of a third subpixel 13. For example, the area of ​​the light-emitting region of a second subpixel 12 is larger than the area of ​​the light-emitting region of a third subpixel 13. For example, the luminous efficacy of the first subpixel 11 is lower than the luminous efficacy of the second subpixel 12 and the luminous efficacy of the third subpixel 13.

[0085] The luminous efficacy of a subpixel refers to the light intensity emitted by a light-emitting device under the same electrical signal conditions. Assuming a high light intensity, the luminous efficacy is considered high. The same electrical signal condition refers, for example, to the voltages written into a data line being the same. The same electrical signal condition also refers, for example, to the currents written into the light-emitting device being the same. For example, the luminous efficacy of a subpixel refers to the current density flowing through the light-emitting device under the same electrical signal conditions.

[0086] In some examples, such as in Fig. As shown in Figure 2, the first subpixel 11 is a blue subpixel, one of the second subpixel 12 and the third subpixel 13 is a red subpixel, and the other of the second subpixel 12 and the third subpixel 13 is a green subpixel. Fig. Figure 2 schematically shows that the second subpixel is a red subpixel and the third subpixel is a green subpixel, but is not limited to this; the second subpixel can also be a green subpixel and the third subpixel is a red subpixel.

[0087] In some examples, such as in Fig. 2 and Fig. As shown in Figure 3, the turn-on voltage of the first subpixel 11 is 0.1 V to 5 V higher than the turn-on voltage of the second subpixel 12. For example, the turn-on voltage of the first subpixel 11 is 0.1 V to 5 V higher than the turn-on voltage of the third subpixel 13. The turn-on voltage can, for example, refer to a voltage applied by a device when the light emission brightness is 1 cd / m², or it can also be referred to as the light emission threshold voltage.

[0088] The turn-on voltage of the first subpixel 11 is, for example, 0.5 V to 4.5 V higher than the turn-on voltage of the second subpixel 12. For example, the turn-on voltage of the first subpixel 11 is 1 V to 4 V higher than the turn-on voltage of the second subpixel 12. For example, the turn-on voltage of the first subpixel 11 is 1.5 V to 3.5 V higher than the turn-on voltage of the second subpixel 12. For example, the turn-on voltage of the first subpixel 11 is 2 V to 3 V higher than the turn-on voltage of the second subpixel 12. The turn-on voltage of the first subpixel 11 is, for example, 0.5 V to 4.5 V higher than the turn-on voltage of the third subpixel 13. For example, the turn-on voltage of the first subpixel 11 is 1 V to 4 V higher than the turn-on voltage of the third subpixel 13. For example, the turn-on voltage of the first subpixel 11 by 1.5 V to 3.5 V higher than the turn-on voltage of the third subpixel 13.For example, the turn-on voltage of the first subpixel 11 is 2 V to 3 V higher than the turn-on voltage of the third subpixel 13. For example, the turn-on voltage of the first subpixel 11 is 1.5 V higher than the turn-on voltage of the second subpixel 12. For example, the turn-on voltage of the first subpixel 11 is 1.5 V higher than the turn-on voltage of the third subpixel 13.

[0089] For example, the power consumption of the first subpixel 11 is greater than the power consumption of the second subpixel 12 and the third subpixel 13.

[0090] In some examples, such as in Fig. Figure 2 shows a section of the second definition structure 220 exposed through the second opening 420, e.g., the isolation section 201, an open ring structure, and the proportion of the open ring structure to the perimeter of the second definition structure 220 is 10% to 80%. The perimeter of the second definition structure here refers to the perimeter of an edge of the second definition structure that loops around the light-emitting area of ​​the second subpixel.

[0091] For example, the proportion of the open ring structure on the circumference of a first opening corresponding to the second subpixel is 10% to 80%, for example 15% to 50%, for example 20% to 75%, for example 25% to 60%, for example 30% to 70%, for example 45% to 55%, for example 50% to 65%.

[0092] For example, the proportion of isolation section 201 to the scope of the second definition structure 220 is 15% to 50%. For example, the proportion of isolation section 201 to the scope of the second definition structure 220 is 20% to 75%. For example, the proportion of isolation section 201 to the scope of the second definition structure 220 is 25% to 60%. For example, the proportion of isolation section 201 to the scope of the second definition structure 220 is 30% to 70%. For example, the proportion of isolation section 201 to the scope of the second definition structure 220 is 45% to 55%. For example, the proportion of isolation section 201 to the scope of the second definition structure 220 is 50% to 65%.

[0093] For example, the proportion of an area of ​​an open ring-shaped insulation section 201 to an area of ​​a closed ring-shaped edge on which the insulation section 201 is located in the second definition structure 220 is 10% to 80% or 15% to 50% or 25% to 60% or 30% to 70%.

[0094] For example, as in Fig. As shown in Figure 2, a section in the second definition structure 220, located between the light-emitting areas of the first subpixel 11 and the second subpixel 12, is exposed through the second aperture 420 to separate at least one film layer shared by the first subpixel 11 and the second subpixel 12; and a section in the second definition structure 220, located between the light-emitting areas of the first subpixel 11 and the second subpixel 12 and not exposed through the second aperture 420, forms a channel for guiding the second electrode 120 of the first subpixel 11 and the second subpixel 12, which is advantageous for improving the conductivity of the second electrode shared by the first subpixel and the second subpixel.

[0095] For example, as in Fig. As shown in Figure 2, the section in the second definition structure 220, located between the light-emitting areas of the first subpixel 11 and the second subpixel 12, comprises a section exposed by the second aperture 420 and a section not exposed by the second aperture 420; an area of ​​the section described above that is exposed by the second aperture 420 is larger than an area of ​​the section not exposed by the second aperture 420 in order to ensure the conductive effect of the second electrodes of the first subpixel and the second subpixel while minimizing the crosstalk caused by the electrical connection of the common layer in the light-emitting functional layers of the first subpixel and the second subpixel.

[0096] For example, as in Fig. As shown in Figure 2, a section in the second definition structure 220, located between the light-emitting areas of the second subpixel 12 and the third subpixel 13, is exposed through the second aperture 420 to separate the common layer between the second subpixel 12 and the third subpixel 13, in order to reduce the crosstalk caused by the electrical connection between the common layer in the light-emitting functional layers of the two.

[0097] For example, as in Fig. As shown in Figure 2, the distance between an edge of the isolation section 201 in the second definition structure 220, which is exposed by the second aperture 420 and is used to separate the light-emitting functional layer 130, and an edge of a first aperture 410 corresponding to the second subpixel 12, is less than the distance between the edge of the isolation section 201 and an edge of the light-emitting area of ​​the third subpixel 13, and the distance between the edge of the isolation section 201 in the second definition structure 220, which is exposed by the second aperture 420 and is used to separate the light-emitting functional layer 130, and an edge of a first aperture 410 corresponding to the second subpixel 12, is less than the distance between the edge of the isolation section 201 and the edge of the light-emitting area of ​​the first subpixel 11.

[0098] In some examples, such as in Fig. 2 and Fig. As shown in Figure 3, the definition structure 200 further comprises a third definition structure 230, wherein the third definition structure 230 includes a section surrounding the light-emitting area of ​​the third subpixel 13; the third definition structure 230 is not exposed by the second aperture 420, or the third definition structure 230 is exposed by the second aperture 420.

[0099] The third definition structure can here include a section that overlaps with the light-emitting area of ​​the third subpixel, and a section that surrounds the light-emitting area of ​​the third subpixel.

[0100] In some examples, such as in Fig. As shown in Figure 2, a section of the third definition structure 230 exposed through the second opening 420, for example the isolation section 201, is an open ring structure; and the proportion of the open ring structure to a circumference of the third definition structure 230 is 10% to 80%. The circumference of the third definition structure here refers to the circumference of an edge of the third definition structure that loops around the light-emitting area of ​​the third subpixel.

[0101] For example, the proportion of the open ring structure to the circumference of a first opening corresponding to the third subpixel is 10% to 80%, for example 15% to 50%, for example 20% to 75%, for example 25% to 60%, for example 30% to 70%, for example 45% to 55%, for example 50% to 65%.

[0102] For example, the proportion of isolation section 201 to the scope of the third definition structure 230 is 15% to 50%. For example, the proportion of isolation section 201 to the scope of the third definition structure 230 is 20% to 75%. For example, the proportion of isolation section 201 to the scope of the third definition structure 230 is 25% to 60%. For example, the proportion of isolation section 201 to the scope of the third definition structure 230 is 30% to 70%. For example, the proportion of isolation section 201 to the scope of the third definition structure 230 is 45% to 55%. For example, the proportion of isolation section 201 to the scope of the third definition structure 230 is 50% to 65%.

[0103] For example, the proportion of an area of ​​the open ring-shaped insulation section 201 to an area of ​​the closed ring-shaped edge where the insulation section is located in the third definition structure 230 is 10% to 80% or 15% to 50% or 25% to 60% or 30% to 70% and so on.

[0104] For example, as in Fig. As shown in Figure 2, a section in the third definition structure 230, located between the light-emitting areas of the first subpixel 11 and the third subpixel 13, is exposed through the second aperture 420 to separate at least one film layer shared by the first subpixel 11 and the third subpixel 13, and a section in the third definition structure 230, located between the light-emitting areas of the first subpixel 11 and the third subpixel 13 and not exposed through the second aperture 420, forms a channel for guiding the second electrode 120 of the first subpixel 11 and the third subpixel 13, which is advantageous for improving the conductivity of the second electrode shared by the first subpixel and the third subpixel.

[0105] For example, in Fig. As shown in Figure 2, a section in the third definition structure 230, located between the light-emitting areas of the second subpixel 12 and the third subpixel 13, is not exposed by the second aperture 420; and the film layer shared by the second subpixel 12 and the third subpixel 13 is isolated only by the isolation section 201 in the second definition structure 220, which is exposed by the second aperture 420.

[0106] For example, in Fig. 2 and Fig. As shown in Figure 3, the second electrode, located at the positions of the section of the second definition structure 220 that is not exposed through the second opening 420, the section of the third definition structure 230 that is not exposed through the second opening 420, and the first definition structure 210, is in a communication state to form the conductive electrode, which is beneficial for improving the conductive effect of the second electrode.

[0107] For example, as in Fig. As shown in Figure 2, the distance between an edge of the isolation section 201 of the third definition structure 230, exposed by the second aperture 420, and an edge of a first aperture 410 corresponding to the third subpixel 13 is less than the distance between the edge of the isolation section 201 and the edge of the light-emitting area of ​​the second subpixel 12, and the distance between the edge of the isolation section 201 of the third definition structure 230, exposed by the second aperture 420, and the edge of the first aperture 410 corresponding to the third subpixel 13 is less than the distance between the edge of the isolation section 201 and the edge of the light-emitting area of ​​the first subpixel 11.

[0108] For example, as in Fig. 2 is shown, only the isolation section 201 of the third definition structure 230, which is exposed through the second opening 420, is provided between the first subpixel 11 and the third subpixel 13, which are adjacent to each other, only the isolation section 201 of the second definition structure 220, which is exposed through the second opening 420, is provided between the first subpixel 11 and the second subpixel 12, which are adjacent to each other, only the isolation section 201 of the second definition structure 220, which is exposed through the second opening 420, or the isolation section 201 of the third definition structure 230, which is exposed through the second opening 420, is provided between the second subpixel 12 and the third subpixel 13, which are adjacent to each other.

[0109] In some examples, such as in Fig. As shown in Figure 2, the plurality of subpixels 10 is arranged in a plurality of first subpixel groups 001 and a plurality of second subpixel groups 002, which are arranged alternately along the first direction; each first subpixel group 001 comprises first subpixels 11 and second subpixels 12, which are arranged alternately along the second direction, each second subpixel group 002 comprises third subpixels 13, which are arranged along the second direction, and the first direction intersects with the second direction.

[0110] For example, the first direction could be one in Fig. The X-direction shown in the second direction can be one in Fig. The Y-direction shown can be 2, and the first and second directions can be reversed. The angle between the first and second directions can be, for example, 80 to 120 degrees. For example, the first direction can be perpendicular to the second direction. For example, one of the first and second directions can be a row direction and the other a column direction. For example, the first direction can be a row direction and the second direction a column direction; the first subpixel group can be the first subpixel column and the second subpixel group can be the second subpixel column; and the first direction can be a column direction and the second direction a row direction; the first subpixel group can be the first subpixel row and the second subpixel group can be the second subpixel row.

[0111] In some examples, such as in Fig. As shown in Figure 2, the first subpixel group 001 and the second subpixel group 002 are shifted relative to each other in the second direction, and the respective first subpixels 11 under at least some first subpixels 11 are surrounded by eight subpixels 10, and the eight subpixels 10 comprise third subpixels 13 and second subpixels 12, which are arranged alternately.

[0112] As in Fig. As shown in Figure 2, for example, the first subpixel 11 and the second subpixel 12 are arranged alternately along the second direction, and the third subpixel 13 are arranged in an array along the first and second directions. For example, the respective second subpixel 12 are surrounded by eight subpixels 10 under at least some of the second subpixels 12, and the eight subpixels 10 comprise third subpixel 13 and first subpixel 11, which are arranged alternately.

[0113] In some examples, such as in Fig. As shown in Figure 2, the second definition structure 220 comprises an open annular second isolation section 2012 that surrounds the second subpixel 12; the shapes of the light-emitting areas of the first subpixel 11, the second subpixel 12, and the third subpixel 13 are all quadrilaterals, and the second isolation section 2012 surrounds only four edges of the light-emitting area of ​​the second subpixel 12. For example, the second isolation section 2012 exposes four corner sections formed by joining four edges of the light-emitting area of ​​the second subpixel 12. For example, a length of the second isolation section 2012 corresponding to an edge of the light-emitting area of ​​the second subpixel 12 can be greater than or less than an edge length of the light-emitting area.

[0114] In some examples, such as in Fig. As shown in Figure 2, the third definition structure 230 comprises an open annular third isolation section 230 that surrounds the light-emitting area of ​​the third subpixel 13, and the third isolation section 230 surrounds two edges of the light-emitting area of ​​the third subpixel 13 that are immediately adjacent to the light-emitting area of ​​the first subpixel 11. For example, two edges of the light-emitting area of ​​the third subpixel 13 that are immediately adjacent to the light-emitting area of ​​the second subpixel 12 are exposed by the third isolation section 230. For example, a length of the third isolation section 230 corresponding to the edge of the light-emitting area of ​​the third subpixel 13 can be greater than or less than the edge length of the light-emitting area.

[0115] As in Fig. As shown in Figure 2, the third isolation section 2013, for example, exposes at least one corner section of four corner sections formed by connecting four edges of the light-emitting area of ​​the third subpixel 13.

[0116] The second isolation section described above is a portion of the second definition structure exposed by the second aperture; for example, the second definition structure surrounding the light-emitting area of ​​the second subpixel comprises a closed annular edge, and a portion of the closed annular edge exposed by the second aperture is the second isolation section. The third isolation section described above is a portion of the third definition structure exposed by the second aperture; for example, the third definition structure surrounding the light-emitting area of ​​the third subpixel comprises a closed annular edge, and a portion of the closed annular edge exposed by the second aperture is the third isolation section.The shapes of the second insulation section and the third insulation section, as described above, are determined by the shape of the second opening.

[0117] In some examples, such as in Fig. As shown in Figure 2, the ring width of a ring segment in the first definition structure 210 that is not covered by the first electrode 110 of the first subpixel 11 is smaller than the ring width of a ring segment in the second definition structure 220 that is not covered by the first electrode 110 of the second subpixel 12. This can prevent the second opening from exposing the first electrode of the second subpixel if the second opening is intended to expose the edge of the second definition structure.

[0118] As in Fig. As shown in Figure 2, for example, the ring width RW1 of the ring segment in the first definition structure 210, which is not covered by the first electrode 110 of the first subpixel 11, is smaller than the ring width RW2 in at least some positions in the ring segment in the second definition structure 220, which is not covered by the first electrode 110 of the second subpixel 12; and the at least some positions include a segment that overlaps with the second aperture 420. The ring width RW1 of the ring segment in the first definition structure 210, which is not covered by the first electrode 110 of the first subpixel 11, is smaller than a ring width RW3 in at least some positions in the ring segment in the third definition structure 220, which is not covered by the first electrode 110 of the third subpixel 13, and the at least some positions include a segment that overlaps with the second aperture 420.This prevents the second opening from exposing an edge of the first definition structure that is immediately adjacent to it, while simultaneously preventing the second opening from exposing the first electrodes of the second and third subpixels if the second opening is intended to expose the edges of the second and third definition structures. The "ring width" described above refers to a minimum distance between the edge of the first electrode and the edge of the definition structure that the first electrode is in. Fig. 2 surrounds, for example, the edges of the two are essentially parallel to each other.

[0119] For example, as in Fig. As shown in Figure 2, the first definition structure 210 is not exposed through the second opening; for example, the edge of the first definition structure 210 is located on an outside of the edge of the first electrode, e.g., it protrudes outwards; and the distance between the edge of the first definition structure 210 and the corresponding edge of the first electrode can be set very small; or the edge of the first definition structure 210 can be flush with the edge of the first electrode; or the edge of the first definition structure 210 can shrink inwards relative to the edge of the first electrode, but the edge of the first definition structure 210 must be located on an outside of the edge of the light-emitting area of ​​the first subpixel.

[0120] As in Fig. As shown in Figure 2, for example, more than 60% of the ring section in the first definition structure 210, which is not covered by the first electrode 110 of the first subpixel 11, has an essentially equal ring width.

[0121] For example, as in Fig. As shown in Figure 2, a ring section in the third definition structure 230, which is not covered by the first electrode 110 of the third subpixel 13, comprises a first section exposed by the second aperture 420 and a second section not exposed by the second aperture 420; a ring width of the first section is larger than a ring width of the second section to prevent the third definition structure from being exposed by the second aperture, which is used to expose a definition structure corresponding to another subpixel, while the second aperture exposes a section of the edge of the third definition structure to improve the continuity of the second electrode of the third subpixel.

[0122] For example, in Fig. As shown in Figure 2, the second definition structure 220 is exposed through the second aperture 420 at positions corresponding to each edge of the light-emitting area of ​​the second subpixel 12, and more than 60% of the ring section in the second definition structure 220 that is not covered by the first electrode 110 of the second subpixel 12 has a substantially equal ring width.

[0123] As in Fig. As shown in Figure 2, for example, a section of the second definition structure 220 corresponding to at least one second subpixel 12, which is exposed through the second aperture 420, is a spaced structure. Similarly, a section of the third definition structure 230 corresponding to at least one third subpixel 13, which is exposed through the second aperture 420, is a spaced structure. The definition structure described above, corresponding to a subpixel, refers to a definition structure that overlaps with a light-emitting area of ​​the subpixel.

[0124] For example, it shows Fig. Figure 2 schematically illustrates a case in which the definition structure corresponding to the subpixel with one color is not exposed through the second aperture, while definition structures corresponding to subpixels with other colors are all exposed through the second apertures. For example, the definition structure corresponding to the blue subpixel is not exposed through the second aperture, and definition structures corresponding to the red and green subpixels are both exposed through the second apertures. However, this is not limited to this; it could also be the case that the definition structure corresponding to the green subpixel is not exposed through the second aperture, or the definition structure corresponding to the red subpixel is not exposed through the second aperture.

[0125] As in Fig. As shown in Figure 2, for example, the proportion of the width of the second opening 420, configured to expose the second definition structure 220, to the width of the second opening 420, configured to expose the third definition structure 230, is 0.5 to 1.5. For example, the proportion of the width of the second opening 420, configured to expose the second definition structure 220, to the width of the second opening 420, configured to expose the third definition structure 230, is 0.6 to 1.2, or 0.7 to 1.4, or 0.8 to 1.1, or 0.9 to 1.3. For example, the width of the second opening 420, configured to expose the second definition structure 220, is equal to the width of the second opening 420, configured to expose the third definition structure 230.

[0126] As in Fig. As shown in Figure 3, for example, along the direction perpendicular to the base substrate 01, the maximum thickness of a section in pixel definition section 401 that overlaps with definition structure 200 is less than the maximum thickness of a section in pixel definition section 401 that does not overlap with definition structure 200. For example, the maximum thickness of the section in pixel definition section 401 that overlaps with definition structure 200 can be 0.4 micrometers, and the maximum thickness of the section in pixel definition section 401 that does not overlap with definition structure 200 can be 0.6 micrometers.

[0127] Fig. 4 is a structure diagram of area A11 of the in Fig. The display substrate shown in another example is shown in section 1. The one in Fig. The display substrate shown in Figure 4 differs from the one in Figure 4. Fig. 2. Display substrate shown by a different positional relationship between the second aperture 420 and the definition structure 200. Features such as the structures contained in the respective subpixels, the arrangement mode of the multitude of subpixels, the first aperture in the pixel definition pattern, and the positional relationship between the first aperture and the definition structure in the Fig. The four display substrates shown can have the same relationship as the features described above in the Fig. The display substrate shown in section 2 is shown, and no details are repeated here.

[0128] As in Fig. As shown in Figure 4, a fraction of an edge length in the first definition structure 210, exposed by the second aperture 420, on the perimeter of the first aperture 410, corresponding to the first subpixel, is smaller than a fraction of an edge length in the second definition structure 220, exposed by the second aperture 420, on the perimeter of the first aperture 410, corresponding to the second subpixel.

[0129] The proportion of the section of the definition structure exposed by the second opening, as described above and later, can refer to a proportion of the length of the section of the definition structure exposed by the second opening to the circumference of a loop of the edge of the definition structure surrounding the light-emitting area of ​​the subpixel, or it can also refer to a proportion of the area of ​​the section of the definition structure exposed by the second opening to the area of ​​a loop of the edge of the definition structure surrounding the light-emitting area of ​​the subpixel.

[0130] In the case where the turn-on voltage of the first subpixel is higher than the turn-on voltage of the second subpixel, and both the first definition structure and the second definition structure are exposed through the second apertures, the proportion of the section of the first definition structure exposed through the second aperture is adjusted to be smaller than the proportion of the section of the second definition structure exposed through the second aperture, so that the second electrode of the first subpixel has a conductive channel of a larger area, which improves the conductivity of the second electrode of the first subpixel and is advantageous for avoiding excessive power consumption and brightness uniformity problems of the display substrate.

[0131] In some examples, such as in Fig. As shown in Figure 4, a fraction of the edge length of the section in the first definition structure 210 exposed by the second opening 420 on a circumference of a ring section in the first definition structure 210 surrounding the first opening is smaller than a fraction of the edge length of the section in the third definition structure 230 exposed by the second opening 420 on a circumference of a ring section in the third definition structure 230 surrounding the first opening.

[0132] In the case where the turn-on voltage of the first subpixel is higher than the turn-on voltage of the second pixel and the turn-on voltage of the third subpixel, and the first definition structure, the second definition structure, and the third definition structure are all exposed through the second apertures, the proportion of the first definition structure exposed through the second aperture is set to be less than the proportion of the second definition structure exposed through the second aperture and the proportion of the third definition structure exposed through the second aperture, so that the second electrode of the first subpixel has the conductive channel of a larger area, which improves the conductive effect of the second electrode of the first subpixel and is advantageous to avoid excessive power consumption and brightness uniformity problems of the display substrate.

[0133] In some examples, such as in Fig. As shown in Figure 4, the first definition structure 210 comprises an open annular first isolation section 2011 surrounding the light-emitting area of ​​the first subpixel 11, the second definition structure 220 comprises an open annular second isolation section 2012 surrounding the light-emitting area of ​​the second subpixel 12, and the third definition structure 230 comprises an open annular third isolation section 2013 surrounding the light-emitting area of ​​the third subpixel 13.

[0134] The first isolation section described above is a portion of the first definition structure exposed by the second aperture; for example, the first definition structure surrounding the light-emitting area of ​​the first subpixel comprises a closed annular edge, and a portion of the closed annular edge exposed by the second aperture is the first isolation section. The second isolation section described above is a portion of the second definition structure exposed by the second aperture; for example, the second definition structure surrounding the light-emitting area of ​​the second subpixel comprises a closed annular edge, and a portion of the closed annular edge exposed by the second aperture is the second isolation section.The third isolation section described above is a portion of the third definition structure exposed by the second aperture. For example, the third definition structure surrounding the light-emitting area of ​​the third subpixel comprises a closed annular edge, and a portion of this closed annular edge exposed by the second aperture constitutes the third isolation section. The shapes of the first, second, and third isolation sections, as described above, are determined by the shape of the second aperture.

[0135] As in Fig. As shown in Figure 4, for example, the proportion of the area of ​​the first isolation section 2011 to the area of ​​the first definition structure 210 is 10% to 80%, for example, 15% to 50%, for example, 20% to 40%, for example, 30% to 70%, for example, 25% to 45%, etc. For example, the proportion of the area of ​​the second isolation section 2012 to the area of ​​the second definition structure 220 is 10% to 80%, for example, 15% to 50%, for example, 20% to 40%, for example, 30% to 70%, for example, 25% to 45%, etc. The proportion between the area of ​​the third isolation section 2013 and the area of ​​the third definition structure 230 is, for example, 10% to 80%, e.g., 15% to 50%, e.g., 20% to 40%, e.g., 30% to 70%, etc. B. 25% to 45% etc.For example, the proportion of the area of ​​the first isolation section 2011 to the area of ​​the first definition structure 210 is smaller than the proportion of the area of ​​the second isolation section 2012 to the area of ​​the second definition structure 220, and the proportion of the area of ​​the first isolation section 2011 to the area of ​​the first definition structure 210 is smaller than the proportion of the area of ​​the third isolation section 2013 to the area of ​​the third definition structure 230. The proportion of each area of ​​each isolation section to the area of ​​each definition structure described above refers to a proportion of the area of ​​the isolation section to the area of ​​a loop of the closed annular edge of the definition structure that encompasses the isolation section.

[0136] In some examples, such as in Fig. As shown in Figure 4, the shapes of the light-emitting areas 101 of the first subpixel 11, the second subpixel 12, and the third subpixel 13 are all quadrilaterals; the first isolation section 2011 surrounds two adjacent edges of the light-emitting area of ​​the first subpixel 11 and a first corner section 1011 formed by joining the two edges; the second isolation section 2012 surrounds two adjacent edges of the light-emitting area of ​​the second subpixel 12 and a second corner section 1012 formed by joining the two edges; the third isolation section 2013 surrounds two adjacent edges of the light-emitting area of ​​the third subpixel 13 and a third corner section 1013 formed by joining the two edges; and the orientations of the first corner section 1011, the second corner section 1012, and the third corner section 1013 are all the same. Fig. Figure 4 schematically shows that the first, second, and third corner sections all point to the left, for example, in a direction opposite to that indicated by an arrow in the X direction. However, the first, second, and third corner sections can also all point to the right, upwards (as indicated by an arrow in the Y direction), or downwards.

[0137] The respective isolation sections are arranged in corner section positions with the same orientation in the respective subpixels, which is advantageous to isolate at least one layer of the light-emitting functional layer in one orientation of the respective corner sections and to prevent crosstalk between adjacent subpixels; and meanwhile, other corner sections are provided without isolation sections, which is advantageous to implement an electrical connection of the second electrode of the respective subpixels in a different position than the isolation section, and is advantageous to reduce power consumption.

[0138] For example, as in Fig. 3 and Fig. As shown in Figure 4, the first electrode 110 of each subpixel 10 is located on a side of the definition structure 200 away from the base substrate 01; each subpixel 10 further comprises a pixel circuit (not shown) which, for example, includes a plurality of transistors and at least one capacitor, the pixel circuit is located on a side of the definition structure 200 away from the first electrode 110, and the first electrode 110 is electrically connected to the pixel circuit by a connecting through-hole that passes through the definition structure 200, such that the position of the second opening corresponding to each subpixel should be determined taking into account a position of the connecting through-hole in the definition structure described above in order to avoid the connecting through-hole described above.For example, if the connecting through holes of the first subpixel 11 and the second subpixel 12 are located on a top side of their light-emitting areas, and the connecting through hole of the third subpixel 13 is located on a left side of its light-emitting area, then the first corner section, the second corner section and the third corner section, as described above, can all point to the left or upwards to avoid the position of the connecting through holes.

[0139] As in Fig. As shown in Figure 4, definition structure 200, for example, includes a connecting section located between the connecting through-holes of the first subpixel 11 and the third subpixel 13, which are closer together, and the connecting section links the first definition structure 210 and the third definition structure 230. For example, the connecting section is an integrated structure with the first definition structure 210 and the third definition structure 230 connected to it.Similarly, the definition structure 200 further comprises a connecting section located between connecting through-holes of the second subpixel 12 and the third subpixel 13, which are closer together, and the connecting section links the second definition structure 220 and the third definition structure 230; for example, the connecting section is an integrated structure with the second definition structure 220 and the third definition structure 230 connected to it.

[0140] As in Fig. As shown in Figure 4, for example, the first isolation section 2011 or the second isolation section 2012 is arranged between the first subpixel 11 and the second subpixel 12 along the X-direction. For example, no second aperture 420 may be provided between the first subpixel 11 and the second subpixel 12, which are arranged along the Y-direction, in order to avoid interfering with an anode connection through-hole. For example, the first isolation section 2011 or the third isolation section 2013 is provided between the first subpixel 11 and the third subpixel 13, and the second isolation section 2012 or the third isolation section 2013 is provided between the second subpixel 12 and the third subpixel 13.

[0141] For example, as in Fig. As shown in Figure 4, a first subpixel 11 is surrounded by four third subpixels 13, a section of the first subpixel 11 facing two third subpixels 13 is not provided with the first isolation section 2011, and the two third subpixels 13 are each provided with the third isolation section 2013 on a side of them facing the first subpixel 11, such that a section in the second electrode of the first subpixel 11, which is close to the two third subpixels 13, is arranged continuously; similarly, a second subpixel 12 is surrounded by four third subpixels 13, and a section in the second electrode of the second subpixel 12, which is close to the two third subpixels 13, is arranged continuously.

[0142] As in Fig. As shown in Figure 4, for example, only one isolation section is provided between two adjacent subpixels arranged along the X direction, only one isolation section is provided between two adjacent subpixels arranged along the U direction, and only one isolation section is provided between two adjacent subpixels arranged along the V direction to facilitate the compensation of crosstalk and power consumption between adjacent subpixels.

[0143] In some examples, such as in Fig. As shown in Figure 4, a portion of the section in the first definition structure 210 exposed by the second aperture 420 is less than a portion of the section in the second definition structure 210 exposed by the second aperture 420 is less than a portion of the ring section of the second definition structure 220 exposed by the second aperture 420 is less than a ring width of the second definition structure 220 surrounding the first aperture; a ring width of a section that does not have an overlapping section with the second aperture 420 in the ring section of the first definition structure 210 not covered by the first electrode 110 of the first subpixel 11 is a first ring width h1; a ring width of a section that has an overlapping section with the second aperture 420 in the ring section is a second ring width h2, and the first ring width h1 is less than the second ring width h2.

[0144] Setting widths in different positions in the ring section of the first definition structure, which is not covered by the first electrode of the first subpixel, can prevent the second opening from exposing the edge of the first electrode of the first subpixel and impairing the display performance, while implementing the isolation of the partial light-emitting functional layer and the continuous arrangement of the partial second electrode.

[0145] As in Fig. As shown in Figure 4, for example, the ring width of a section that does not have an overlapping section with the second aperture 420 in the ring section of the second definition structure 220 not covered by the first electrode 110 of the second subpixel 12 is smaller than the ring width of a section that does have an overlapping section with the second aperture 420 in the ring section. Similarly, the ring width of a section that does not have an overlapping section with the second aperture 420 in the ring section of the third definition structure 230 not covered by the first electrode 110 of the third subpixel 13 is smaller than the ring width of a section that does have an overlapping section with the second aperture 420 in the ring section.Thus, it is advantageous to prevent the second opening, configured to expose the first definition structure, from exposing an edge of the third definition structure immediately adjacent to it, to prevent the second opening, configured to expose the third definition structure, from exposing an edge of the first definition structure immediately adjacent to it, and to prevent the second opening, configured to expose the second definition structure, from exposing an edge of the third definition structure immediately adjacent to it, and to prevent the second opening, configured to expose the third definition structure, from exposing an edge of the second definition structure immediately adjacent to it.

[0146] As in Fig. As shown in Figure 4, for example, a section of the first definition structure 210 exposed through the second aperture 420, corresponding to at least one first subpixel 11, is a continuous structure. Similarly, a section of the second definition structure 220 exposed through the second aperture 420, corresponding to at least one second subpixel 12, is a continuous structure. Finally, a section of the third definition structure 230 exposed through the second aperture 420, corresponding to at least one third subpixel 13, is a continuous structure.

[0147] For example, it shows Fig. Figure 4 schematically shows that the definition structures corresponding to the subpixels of the respective colors are all exposed through the second openings, but the definition structures corresponding to the subpixels of different colors are exposed through the second openings in different proportions. For example, the proportion of the definition structure corresponding to the subpixel of one color exposed through the second opening is smaller than the proportions of the definition structures corresponding to the subpixels of the other two colors exposed through the second openings. For example, the proportion of the definition structure corresponding to the blue subpixel exposed through the second opening is smaller than the proportions of the definition structures corresponding to the red and green subpixels exposed through the second openings.

[0148] As in Fig. As shown in Figure 4, for example, the proportion of the width of the second opening 420, configured to expose the first definition structure 210, to the width of the second opening 420, configured to expose the second definition structure 220, is 0.5 to 1.5. For example, the proportion of the width of the second opening 420, configured to expose the first definition structure 210, to the width of the second opening 420, configured to expose the second definition structure 220, is 0.6 to 1.4, or 0.7 to 1.3, or 0.8 to 1.2, or 1.1 to 0.9. For example, the width of the second opening 420, configured to expose the first definition structure 210, is equal to the width of the second opening 420, configured to expose the second definition structure 220.

[0149] Fig. 5 is a structure diagram of area A11 of the in Fig. The display substrate shown in another example is shown in section 1. The one in Fig. The display substrate shown in Figure 5 differs from the one in Figure 5. Fig. 4 display substrate shown by the fact that the first definition structure 210 is not exposed through the second opening 420.

[0150] In some examples, such as in Fig. As shown in Figure 5, the first definition structure 210 is not exposed through the second opening 420, the second definition structure 220 comprises an open annular second isolation section 2012 surrounding the light-emitting area of ​​the second subpixel 12, and the third definition structure 230 comprises an open annular third isolation section 2013 surrounding the light-emitting area of ​​the third subpixel 13;the shapes of the light-emitting areas of the first subpixel 11, the second subpixel 12 and the third subpixel 13 are all quadrilaterals, the second isolation section 2012 surrounds two adjacent edges of the light-emitting area of ​​the second subpixel 12 and a second corner section 1012 formed by joining the two edges, the third isolation section 2013 surrounds two adjacent edges of the light-emitting area of ​​the third subpixel 13 and a third corner section 1013 formed by joining the two edges, and the second corner section 1012 and the third corner section 1013 have the same orientation.

[0151] The second definition structure, the second isolation section, the third definition structure and the third isolation section, which are in Fig. Figure 5 shows that these structures can have the same features as the second definition structure, the second isolation section, the third definition structure, and the third isolation section shown in Figure 5. Fig. Figure 4 shows that no details are repeated here. The first opening, the structure of the subpixels, and the definition structure, etc., which are shown in Figure 4, are not included. Fig. The 5 shown can exhibit the same features as the first aperture, the subpixel structure, and the definition structure, etc., which are shown in Fig. The numbers 4 are shown, and no details are repeated here.

[0152] As in Fig. As shown in Figure 5, for example, more than 60% of the ring section of the first definition structure 210, which is not covered by the first electrode 110 of the first subpixel 11, has an essentially equal ring width.

[0153] Fig. 6 is a structure diagram of area A11 of the in Fig. The display substrate shown in another example is shown in section 1. The one in Fig. The display substrate shown in Figure 6 differs from the one in Figure 6. Fig. 4 shown display substrate by the fact that the shape of the first definition structure 210, which is exposed through the second opening 420, is different.

[0154] In some examples, such as in Fig. As shown in Figure 6, at least one first isolation section 2011 surrounds only one section of the two adjacent edges of the light-emitting region of the first subpixel 11, with the exception of the first corner section 1011 formed by joining the two adjacent edges. By not providing a second opening on the first definition structure at a position of the first corner section of the first subpixel, it is advantageous to improve the continuity of the second electrode of the first subpixel while isolating at least one layer of the light-emitting functional layers from adjacent subpixels.

[0155] For example, as in Fig. As shown in Figure 6, the sections of the definition structure exposed through the second aperture 420, which correspond to at least one of the first subpixel 11, the second subpixel 12 and the third subpixel 13, are spaced structures; and / or a section of the definition structure exposed through the second aperture 420, which corresponds to at least one of the first subpixel 11, the second subpixel 12 and the third subpixel 13, is a continuously arranged structure.

[0156] As in Fig. As shown in Figure 6, for example, the section of the first definition structure 210 exposed through the second aperture 420, which corresponds to the first subpixel 11, can be a spaced structure, the section of the second definition structure 220 exposed through the second aperture 420, which corresponds to the second subpixel 12, can be a continuously arranged structure, and the section of the third definition structure 230 exposed through the second aperture, which corresponds to the third subpixel 13, can be a continuously arranged structure.

[0157] For example, as in Fig. As shown in Figure 6, at least one second isolation section 2012 surrounds only a section of the two adjacent edges of the light-emitting area of ​​the second subpixel 12, with the exception of the second corner section 1012 formed by joining the two adjacent edges.

[0158] For example, as in Fig. 2 to Fig. As shown in Figure 6, each edge of the light-emitting region of the first subpixel 11, or an extension line thereof, is sequentially connected to form a polygon, and a plurality of vertices of the polygon have areas that do not overlap with a plurality of corner sections of the corresponding light-emitting region. The light-emitting region of the first subpixel includes at least one specific corner section 1014, and an area of ​​a region in which the specific corner section 1014 does not overlap with the vertex of the corresponding polygon is larger than an area of ​​a region in which the respective corner sections, among at least some other corner sections, do not overlap with the vertex of the polygon corresponding to the corner section; and a section in the definition structure 200 corresponding to the specific corner section 1014 is not exposed by the second opening 420.Since the specific corner section of the first subpixel is located at a greater distance from the light-emitting area of ​​the second subpixel than other corner sections, the light-emitting functional layer in a position of the specific corner section has a lower degree of crosstalk with a light-emitting functional layer of an adjacent subpixel; and by positioning the definition structure in the position corresponding to the specific corner section so that it is not exposed by the second aperture, it is advantageous to improve the continuity of the second electrode and reduce power consumption.

[0159] Fig. 7 is a structure diagram of area A11 of the in Fig. The display substrate shown in another example is shown in section 1. The one in Fig. The display substrate shown in Figure 7 differs from the one in Figure 7. Fig. 2 shown display substrate by the fact that the third definition structure 230 is not exposed through the second opening 420.

[0160] The form and distribution of the second definition structure 220, which is passed through the second opening 420 in Fig. 7 is exposed, may be the same as the shape and distribution of the second definition structure 220, which is revealed through the second opening 420 in Fig. 2 is revealed, and no details will be repeated here. As in Fig. As shown in Figure 7, an edge of a definition structure that surrounds only a light-emitting region of a subpixel of one color is exposed through the second aperture, while edges of definition structures that surround light-emitting regions of subpixels of other colors are not exposed through the second aperture. For example, an edge of a definition structure that surrounds only a light-emitting region of a red subpixel is exposed through a second aperture, while edges of definition structures that surround light-emitting regions of a blue subpixel and a green subpixel are not exposed through second apertures.For example, sections in the positions in the edge of the definition structure surrounding the light-emitting area of ​​the subpixel with a color, corresponding to the edge of the light-emitting area, are all exposed through the second aperture, and sections in the positions in the edge corresponding to the corner section of the light-emitting area are not exposed through the second aperture.

[0161] In this example, only the definition structure corresponding to the subpixel with one color is set so that it is exposed through the second opening, which can minimize crosstalk between the subpixel with one color and subpixels with other colors, while greatly improving the continuity of the second electrodes from neighboring subpixels.

[0162] For example, as in Fig. As shown in Figure 7, the ring width of the ring section of the first definition structure 210, which is not covered by the first electrode 110 of the first subpixel 11, and the ring width of the ring section of the second definition structure 220, which is not covered by the first electrode 110 of the second subpixel 12, are both larger than the ring width of the ring section of the third definition structure 230, which is not covered by the first electrode 110 of the third subpixel 13, in order to prevent the second opening, which is configured to expose the second definition structure, from exposing the edge of the third definition structure.

[0163] As in Fig. As shown in Figure 7, for example, the fraction of the ring width of the ring segment of the first definition structure 210 that is not covered by the first electrode 110 of the first subpixel 11, relative to the ring width of the ring segment of the second definition structure 220 that is not covered by the first electrode 110 of the second subpixel 12, is 0.8 to 1.2 or 0.9 to 1.1. For example, the ring width of the ring segment of the first definition structure 210 that is not covered by the first electrode 110 of the first subpixel 11 and the ring width of the ring segment of the second definition structure 220 that is not covered by the first electrode 110 of the second subpixel 12 are equal.

[0164] In the display substrate provided by the respective examples of the present disclosure, the same second opening exposes only the definition structure surrounding the light-emitting area of ​​a subpixel in order to improve the continuity of the second electrodes of neighboring subpixels in order to reduce power consumption while simultaneously decreasing crosstalk between neighboring subpixels.

[0165] Fig. Figure 8 is a schematic diagram of a partial planar structure of a definition structure in which the Fig. 2 and Fig. 4 to Fig. 7. Display substrate shown.

[0166] As in Fig. 2 and Fig. 4 to Fig. As shown in Figure 8, for example, along the direction perpendicular to the base substrate, a section in which the definition structure 220 overlaps with at least two first openings 410 is an integrated structure.

[0167] For example, in Fig. 2 and Fig. 4 to Fig. As shown in Figure 8, the plurality of first openings 410 comprises first openings 410 arranged along the first direction and first openings 410 arranged along the second direction; and the first direction intersects with the second direction. The first direction can be the one shown in Fig. The X-direction shown in 8 can be the first direction, and the second direction can be the one shown in Fig. The Y direction shown in step 8 is possible, but it is not limited to that, and the first direction and the second direction can be interchanged.

[0168] For example, as in Fig. 2 and Fig. 4 to Fig. As shown in Figure 8, the definition structure 200 comprises a plurality of extension definition structures 2100 arranged along the first direction; and a minimum distance between two adjacent extension definition structures 2100 is less than a minimum distance between two adjacent first openings 410 arranged in the first direction.

[0169] For example, as in Fig. 2 and Fig. 4 to Fig. As shown in Figure 8, the plurality of extension definition structures 2100 comprises a first sub-extension definition structure 2101 and a second sub-extension definition structure 2102, which are arranged alternately along the first direction; and one form of the first sub-extension definition structure 2101 is different from one form of the second sub-extension definition structure 2102.

[0170] For example, as in Fig. 2 and Fig. 4 to Fig. As shown in Figure 8, adjacent first sub-extension definition structures have 2101 different shapes. A second sub-extension definition structure is provided between the adjacent first sub-extension definition structures described above. Since the light-emitting region of the first subpixel is provided with a specific corner section, and specific corner sections of light-emitting regions of two first subpixels arranged along the first direction and adjacent have different positions, adjacent first sub-extension definition structures have different shapes. A second subpixel is provided between the two first subpixels described above, which are arranged along the first direction and adjacent.

[0171] For example, as in Fig. 2 and Fig. 4 to Fig. As shown in Figure 8, the plurality of subpixels 100 comprises a plurality of pixel groups arranged along the first direction, subpixels in each pixel group are arranged along the second direction, and the first direction intersects with the second direction. The definition structure 200 comprises a plurality of extension definition structures 2100 arranged along the first direction, an orthographic projection of at least one extension definition structure on the base substrate overlaps with orthographic projections of the first apertures 410 corresponding to two adjacent pixel groups on the base substrate, and the two adjacent extension definition structures 2100 are spaced apart from each other.

[0172] For example, as in Fig. 2 and Fig. 4 to Fig. As shown in Figure 8, the extension definition structure 2100 comprises a first extension definition structure 2110 that overlaps with one of two adjacent pixel groups, and a second extension definition structure 2120 that overlaps with the other of the two adjacent pixel groups, wherein the first extension definition structure 2110 is a continuous structure extending along the second direction, the second extension definition structure 2120 comprises a plurality of substructures spaced apart along the second direction; each substructure overlaps with a first aperture 410 corresponding to a subpixel 10, and each substructure is connected to the first extension definition structure 2110.

[0173] Fig. Figure 8 schematically shows that the section in the definition structure that overlaps with the first electrodes of the respective subpixels and the section in the definition structure that is exposed through the second opening are an integrated structure, but it is not limited to this, and the two can also be spaced apart from each other.

[0174] Fig. 9 and Fig. Figure 10 are schematic diagrams of a partial planar structure of the display substrate shown in other examples according to the embodiment of the present disclosure.

[0175] The in Fig. The display substrate shown in Figure 9 differs from the one in Figure 9. Fig. 4 display substrate shown by the shape of the light-emitting area 101 of the first subpixel 11. As in Fig. As shown in Figure 9, the light-emitting area 101 of the first subpixel 11 comprises four corner sections, each corner section having the same features, i.e., the one shown in Figure 9. Fig. The light-emitting area 101 of the first subpixel 11 shown in Figure 9 does not include the area shown in Figure 9. Fig. 4 specific corner section shown. Apart from the fact that the shape of the light-emitting area of ​​the first subpixel in the Fig. The display substrate shown in 9 has the shape of the light-emitting area of ​​the [unclear text]. Fig. The first subpixel shown in 4 differs from other features in the Fig. The display substrate shown in 9 has the same features as other features in the [document / section]. Fig. The display substrate shown in section 4 is shown, and no details are repeated here.

[0176] The in Fig. The display substrate shown in Figure 10 differs from the one in Figure 10. Fig. 2. Display substrate shown by the shape of the light-emitting area 101 of the first subpixel 11. As in Fig. As shown in Figure 10, the light-emitting area 101 of the first subpixel 11 comprises four corner sections, each corner section having the same features, i.e., the one shown in Figure 10. Fig. The light-emitting area 101 of the first subpixel 11 shown in Figure 10 does not include the area shown in Figure 11. Fig. 2 specific corner section shown. Apart from the fact that the shape of the light-emitting area of ​​the first subpixel in the Fig. 10 shown display substrate of the shape of the light-emitting area of ​​the in Fig. The first subpixel shown in the 2 differs from other features in the in Fig. The 10 displayed display substrates have the same features as other features in the [document / section]. Fig. The display substrate shown in section 2 is shown, and no details are repeated here.

[0177] Fig. 11 and Fig. Figure 12 are schematic diagrams of a partial cross-sectional structure of the definition structure and an insulation layer in various examples according to the embodiment of the present disclosure.

[0178] For example, in Fig. As shown in Figure 11, the insulation layer 500 includes a protruding section 510 on a side away from the base substrate 01, and an orthographic projection of the protruding section 510 on the base substrate 01 overlaps with an orthographic projection of the definition structure 200 on the base substrate 01. For example, the definition structure 200 is in contact with the protruding section 510.

[0179] As in Fig. As shown in Figure 11, the material of the definition structure 200, for example, consists of an inorganic, non-metallic material and the material of the insulation layer 500 consists of an organic material.

[0180] As in Fig. As shown in Figure 11, for example, an edge on at least one side of the definition structure 200 projects relative to an edge of a surface on a side of the preceding section 510 furthest from the base substrate 01 in order to isolate the film layer. For example, the edge of the definition structure 200 can also be flush with the edge of the surface on the side of the preceding section 510 furthest from the base substrate 01. For example, the size by which at least one section of the edge of the definition structure 200 projects relative to the edge of the surface on the side of the preceding section 510 furthest from the base substrate 01 is less than 1 micrometer, for example, less than 0.08 micrometers, for example, less than 0.05 micrometers, for example, less than 0.02 micrometers.

[0181] As in Fig. As shown in Figure 11, the thickness of the preceding section 510 can, for example, be more than 500 angstroms. For example, the thickness of the preceding section 510 can be greater than 1,000 angstroms. For example, the thickness of the preceding section 510 can be from 550 angstroms to 5,000 angstroms. The thickness of the preceding section 510 can, for example, be from 500 angstroms to 3,000 angstroms. For example, the thickness of the preceding section 510 can be from 600 angstroms to 2,000 angstroms.

[0182] For example, as in Fig. Figure 12 shows the definition structure 200 formed between the first electrode 110 of the subpixel and the base substrate 01. For example, before the formation of the first electrode 110 of the subpixel, the definition structure 200 is first formed by deposition on the insulation layer 500, for example, on a planarization layer, and then the first electrode 110 of the subpixel is formed on the definition structure 200. In the display substrate, during the formation of the definition structure 200, including the insulation section 210, the planarization layer 500, located on the underside of the definition structure 200, is etched to form sawtooth patterns. The formation of the first electrode on the definition structure can prevent irregularities in the planarization layer that would cause a sawtooth problem in the first electrode, thus reducing the likelihood of a poor display.For example, an orthographic projection of the first electrode 110 on the base substrate 01 may be entirely within the orthographic projection of the definition structure 200 on the base substrate 01.

[0183] For example, the preceding section of the planarization layer can have the same planar form as the definition structure, for example, the planar form of the definition structure as it appears in Fig. 8, Fig. 15 to Fig. 17; and the edge of the foreground section may shrink inwards by a certain size relative to the edge of the defining structure, for example, the certain size is the size described above by which the edge of the surface on the side of the foreground section 500 furthest from the base substrate 01 protrudes, for example, the certain size may be less than 1 micrometer, for example, less than 0.08 micrometers, for example, less than 0.05 micrometers, for example, less than 0.02 micrometers.

[0184] For example, the planarization layer can be all in positions where no definition structures are provided. Fig. 12 sections shown, which do not include the preceding section 510.

[0185] Fig. Figure 13 is a schematic diagram of a partial cross-sectional structure extending along a Fig. The EE' line shown in 1 is cut.

[0186] In some examples, such as in Fig. 1, Fig. 3 and Fig. As shown in Figure 13, the base substrate 01 also includes a second area A2. For example, the first area A1 is located at the periphery of the second area A2; for example, the first area can completely surround the second area, or can only partially surround the second area, or can only be located on one side of the second area; and the positions of the first area and the second area can be determined according to the product requirements.

[0187] In some examples, such as in Fig. 1, Fig. 3 and Fig. As shown in Figure 13, the definition structure 200 comprises at least one loop of the closed annular definition structure 240 surrounding the second region A2, and the light-emitting functional layer 130 and the second electrode 120 are both separated at an edge position of the annular definition structure 240.

[0188] The second area is not equipped with subpixels for display. By providing at least one loop of the ring-shaped definition structure in the periphery of the second area to separate the light-emitting functional layer and the second electrode, the light-emitting element located in the first area can be separated from the second area to isolate water and oxygen from film layers such as the light-emitting functional layer.

[0189] As in Fig. As shown in Figure 1, the first area A1, for example, surrounds at least one section of the second area A2. For example, the area in Fig. Figure 1 shows the second area A2 in an upper middle position of the base substrate 01; for example, all four sides of the rectangular first area A1 can surround the second area A2, i.e., the second area A2 can be surrounded by the first area A1. For example, the second area A2 can also be in a different position than the one shown in Figure 1. Fig. The first region A1 can, for example, contain a display area, and the second region A2 can be a display area or a non-display area, such as a hole area. The hole area can, for example, contain a required hardware structure such as a light-sensitive sensor. The first region A1 can, for example, include a display area located away from the second region A2 and a non-display area surrounding the second region A2. For example, the first ring-shaped definition structure is located in the display area.

[0190] The second area A2 can, for example, have the shape of a circle, an ellipse, or a path (e.g., with two straight edges and two curved edges connecting the two straight edges). However, the second area A2 is not limited to this; it can also have the shape of a polygon, such as a quadrilateral, hexagon, or octagon. Similarly, the first area A1 can have the shape of a quadrilateral, such as a rectangle, but it is not limited to this; it can also have the shape of a circle or a polygon other than a quadrilateral, such as a hexagon, an octagon, etc.

[0191] In some examples, such as in Fig. 1, Fig. 3 and Fig. As shown in Figure 13, the ring-shaped definition structure 240 does not overlap with the pixel definition section 401 along the direction perpendicular to the base substrate 01.

[0192] In some examples, such as in Fig. 1 and Fig. As shown in Figure 13, at least one loop of the closed annular definition structure 240 comprises a plurality of loops of the annular definition structure 240, wherein the interval between two adjacent loops of the annular definition structure 240 is not less than 1 micrometer. For example, the distance between two adjacent loops of the annular definition structure 240 is not less than 2 micrometers. For example, the distance between two adjacent loops of the annular structure 240 is not less than 5 micrometers. For example, the distance between two adjacent loops of the annular structure 240 is not less than 6 micrometers, for example, not less than 7 micrometers, for example, not less than 8 micrometers, for example, not less than 9 micrometers, and so on.

[0193] As in Fig. As shown in Figure 1, the ring-shaped definition structure 240 is located, for example, in the first area A1 and surrounds the second area A2, or the ring-shaped definition structure 240 is located in the second area A2 and surrounds a central area of ​​the second area A2. The number of ring-shaped definition structures 240 can be, for example, three, but is not limited to this; the number of ring-shaped definition structures 240 can be one, two, four, or more, which can be determined according to the product requirements.

[0194] For example, as in Fig. 1, Fig. 3 and Fig. As shown in Figure 13, a section of the definition structure 200 located in the first region A1, exposed through the second opening 420, forms an open ring isolation section, and a section of the definition structure 200 located in the second region A2, not covered by the pixel definition section 401, forms at least one loop of the closed ring-shaped definition structure 240. For example, the definition structure 200 located in the first region A1 and the definition structure 200 located in the second region A2 can be formed in the same patterning process, and the definition structures 200 located in the two regions can have the same characteristics such as material, thickness, etc., but the definition structures 200 located in the two regions can have different planar shapes and arrangements.

[0195] As in Fig. 3 and Fig. As shown in Figure 13, the insulation layer 500 can, for example, be a planarization layer (PLN). For example, the annular definition structure 240 is located on a side of the insulation layer 500 furthest from the base substrate 01. For example, at least a section of the insulation layer 500 located on a side of the annular definition structure 240 near the second region A2 is removed to insulate water vapor. For example, a minimum distance between an edge of the insulation layer 500 furthest from the annular definition structure 240 and the annular definition structure 240 is greater than 1 micrometer.

[0196] As in Fig. As shown in Figure 13, the annular definition structure 240, for example, does not overlap with the pixel boundary section 401 in the direction perpendicular to the base substrate 01. For example, a minimum distance between the annular definition structure 240 and the pixel definition section 401 is greater than 1 micrometer. Of course, the embodiment of the present disclosure is not limited to this; and in the direction perpendicular to the base substrate, a section of the annular definition structure furthest from the second region may overlap with the pixel definition section, with an overlap size of less than 1 micrometer, for example, less than 0.8 micrometers, for example, less than 0.5 micrometers, etc.

[0197] Fig. Figure 13 shows, for example, schematically that the insulation layer 500 is provided between adjacent ring-shaped definition structures 240, but it is not limited to this, and the insulation layer can also be removed between adjacent ring-shaped definition structures to further improve a water vapor insulation effect.

[0198] Fig. Figure 14A is a partial top view of the display substrate provided by another example according to the present disclosure. Fig. 14B is a schematic diagram of a partial cross-sectional structure extending along a Fig. The DD' line shown in 14A is cut.

[0199] For example, as in Fig. 14A and Fig. As shown in Figure 14B, the base substrate is provided with a buffer layer and a shielding layer 021, an active layer 026 located on the buffer layer and the shielding layer 021, a gate insulation layer 022 located on the active layer 026, a metal layer 028 located on the gate insulation layer 022, a gate insulation layer 023 located on the metal layer 028, a metal layer 027 located on the gate insulation layer 023, an intermediate insulation layer 024 located on the metal layer 027, a metal layer 031 located on the intermediate insulation layer 024, and a planarization layer 500 located on the metal layer 031. Area A1 can be an area that is equipped with subpixels, and area A2 can be an area that is surrounded by a ring-shaped definition structure 240. Fig. Figure 14B schematically shows that the transistor has a top-gate structure, but it is not limited to this; the transistor can also have a bottom-gate structure, a single-gate structure, etc. The metal layer 031 can, for example, be a source-drain metal layer, i.e., a metal layer electrically connected to a source region and a drain region of the active layer 026.

[0200] As in Fig. 14A and Fig. As shown in Figure 14B, for example, definition structures 200, which overlap with the light-emitting area and surround the second area, can be formed simultaneously, thereby merging and integrating masks for forming the definition structures in the two positions, which is advantageous for reducing the number of masks in order to further reduce the cost of manufacturing the display substrate.

[0201] As in Fig. 14A and Fig. As shown in Figure 14B, the ring-shaped definition structure 240 is located, for example, on a side of the planarization layer 500 that is remote from the base substrate 01. For example, an edge of an outermost ring-shaped definition structure 240 that is remote from the center of the second region A2 may be covered by the pixel definition section 401, but an edge of the outermost ring-shaped definition structure 240 that is near the center of the second region A2 may not overlap with the pixel definition section 401 to insulate film layers such as the second electrode.

[0202] As in Fig. 14A and Fig. As shown in Figure 14B, for example, an insulating structure 250 is provided on one side of the annular defining structure 240, located near the center of the second region A2, to further insulate film layers such as the second electrode. The insulating structure 250 can, for example, be a ring structure surrounding the second region A2. The insulating structure 250 can, for example, be a structure located in the same layer as the metal layer 031. The insulating structure 250 can, for example, comprise at least two stacked metal layers, with one metal layer projecting on the side furthest from the base substrate 01 relative to an edge of a metal layer in contact with it, in order to provide an insulating effect. The insulating structure 250 can, for example, comprise three metal layers, such as a titanium / aluminum / titanium structure, to form an I-shaped structure.

[0203] As in Fig. As shown in Figure 14B, the insulation layer 500 does not overlap with the insulation structure 250 in the direction perpendicular to the base substrate 01, and the insulation layer 500 is located on a side of the insulation structure 250 furthest from the second region A2. For example, the distance between the boundaries of the insulation structure 250 and the insulation layer 500 is greater than 1 micrometer. Other insulation layers between the insulation structure 250 and the base substrate 01 are, for example, all inorganic insulation layers to improve the water vapor barrier effect.

[0204] As in Fig. As shown in Figure 14B, the insulating structure 250 can, for example, comprise a multitude of loops of a ring structure, e.g., four loops, six loops, etc.

[0205] As in Fig. 13 and Fig. As shown in Figure 14B, the insulation layer 500 below the ring-shaped definition structure 240 includes, for example, a protruding section 510, such as a planarization layer.

[0206] As in Fig. 1, Fig. 13 and Fig. 14A to Fig. As shown in Figure 14B, the second region A2, for example, has the shape of a circle, and the ring width of the closed annular definition structure 240 is not less than 1 millimeter; for example, the ring width of the annular definition structure 240 can be 3 millimeters. For example, the second region A2 has the shape of a track; for example, the shape of the track includes two long edges and two arc edges connecting the two long edges. The ring width of a section immediately adjacent to the long edge in the annular definition structure 240 is not less than 1 millimeter, and the ring width of a section immediately adjacent to the arc edge in the annular definition structure 240 is not less than 1 millimeter.

[0207] For example, as in Fig. 1, Fig. 13 and Fig. 14A to Fig. As shown in Figure 14B, the minimum distance between the ring-shaped definition structure 240 and the definition structure 200, which overlaps with the first aperture 410, is greater than 1 micrometer. For example, the minimum distance between the definition structure 200, which overlaps with the first aperture 410, and the boundaries of the pixel definition section 401 is greater than 1 micrometer.

[0208] As in Fig. 13 and Fig. As shown in Figure 14B, the ring-shaped definition structure 240 can, for example, comprise only one film layer or several inorganic layers, which can be specified according to the product requirements.

[0209] Fig. 15 to Fig. Figure 17 are partial planar structure diagrams of the definition structure shown in other examples according to the embodiment of the present disclosure. The in Fig. 15 to Fig. The definition structure shown in 17 can be traced back to the one in Fig. 2, Fig. 4 to Fig. The display substrate shown in 10 is applied, whereby the Fig. 15 to Fig. The definition structure shown in 17 refers to the one in Fig. The display substrate shown in section 2 is used as an example.

[0210] For example, in Fig. As shown in Figure 15, the definition structure 200 comprises a first definition structure 210, a second definition structure 220 and a third definition structure 330.

[0211] As in Fig. 2 and Fig. As shown in Figure 15, the plurality of subpixels 10 comprises, for example, subpixels 10 arranged along the first direction and subpixels 10 arranged along the second direction; and the first direction intersects with the second direction. The definition structure 200 comprises a plurality of definition blocks 2200 arranged in an array; along the direction perpendicular to the base substrate, at least one definition block 2200 overlaps with first apertures 410 corresponding to two subpixels of different colors 10, and a line connecting the centers of the orthographic projections of the first apertures 410 corresponding to the two subpixels of different colors 10 on the base substrate intersects both the first and second directions, and adjacent definition blocks 2200 are spaced apart from one another.

[0212] For example, as in Fig. 2 and Fig. As shown in Figure 15, at least one definition block 2200 comprises a first subdefinition block 2201 and a second subdefinition block 2202, which overlap with the first openings 410 corresponding to the two subpixels with different colors 10, and the first subdefinition block 2201 and the second subdefinition block 2202 are an integrated structure.

[0213] For example, as in Fig. 2 and Fig. Figure 15 shows definition blocks 220 arranged either along the first direction or the second direction, first definition blocks 2210 and second definition blocks 2220 arranged alternately; and along the direction perpendicular to the base substrate, a color of light emitted by one of the two different-color subpixels 10 overlapping with the first definition block 2210 is the same as a color of light emitted by one of the two different-color subpixels 10 overlapping with the second definition block 2220.

[0214] For example, as in Fig. 2 and Fig. As shown in Figure 15, the first definition block 2210 overlaps with the light-emitting areas of the first subpixel 11 and the third subpixel 13, and the second definition block 2220 overlaps with the light-emitting areas of the second subpixel 12 and the third subpixel 13.

[0215] As in Fig. As shown in Figure 16, the definition structure 200, for example, includes a first definition structure 210, a second definition structure 220, and a third definition structure 330.

[0216] For example, as in Fig. 2 and Fig. As shown in Figure 16, the definition structure 200 comprises a plurality of first extension definition structures 2310 arranged along the first direction and a plurality of second extension definition structures 2320 arranged along the second direction, wherein the plurality of first extension definition structures 2310 are connected to the plurality of second extension definition structures 2320 to form a lattice-like structure;the first extent definition structure 2310 comprises defined overlapping sections that overlap with light-emitting areas of subpixels 10 arranged along the second direction, the second extent definition structure 2320 comprises defined overlapping sections that overlap with light-emitting areas of subpixels arranged along the first direction, and an orthographic projection of the light-emitting area 101 of subpixel 10 on the base substrate lies completely within an orthographic projection of the defined overlapping section on the base substrate.

[0217] As in Fig. As shown in Figure 16, the first extension definition structure 2310, for example, comprises first definition structures 210 and second definition structures 220 arranged alternately, and a connecting structure is provided between the first definition structure 210 and the second definition structure 220 that are adjacent to each other; the second extension definition structure 2320 comprises a plurality of third definition structures 230 arranged along the first direction, and a connecting structure is provided between adjacent third definition structures 230.

[0218] For example, as in Fig. As shown in Figure 17, the definition structure 200 comprises a first definition structure 210, a second definition structure 220 and a third definition structure 230.

[0219] The in Fig. The definition structure shown in Figure 17 differs, for example, from the one in Fig. The definition structure shown in Figure 16 is achieved by providing a connecting structure 2330 between the first definition structure 210 and the second definition structure 220, which are arranged side by side along the X direction.

[0220] Fig. Figure 18 is a schematic diagram of a partial planar structure of the display substrate provided by another example according to the embodiment of the present disclosure.

[0221] The in Fig. The display substrate shown in Figure 18 differs from the one in Figure 18. Fig. 2 display substrate shown by the fact that the second opening 420 is configured to expose a section of an edge of the first definition structure 210 and a section of an edge of the second definition structure 220; and the third definition structure 230 does not overlap with the second opening 420.

[0222] Another embodiment of the present disclosure provides a display substrate; the display substrate comprises a base substrate and a plurality of subpixels, a pixel definition pattern, and a definition structure located on the base substrate. The base substrate comprises at least one first region; the plurality of subpixels are located in the first region; each subpixel under at least some subpixels comprises a light-emitting functional layer, and the light-emitting functional layer comprises a plurality of film layers. The pixel definition pattern comprises a plurality of first openings for defining light-emitting regions of at least some subpixels.The definition structure is located between the light-emitting functional layer and the base substrate, and the definition structure includes a section that surrounds a light-emitting region of each subpixel beneath the at least some subpixels. The pixel definition pattern further includes secondary apertures; a section of at least one layer in the light-emitting functional layer located in the first aperture is a continuous section; at least one section located in at least one secondary aperture is isolated; a section in the definition structure exposed by the secondary aperture is configured to isolate at least one layer of the light-emitting functional layer. The multiple subpixels comprise a first subpixel and a second subpixel, wherein the turn-on voltage of the first subpixel is higher than the turn-on voltage of the second subpixel.a distance between an edge of a light-emitting region of the first subpixel and a second aperture closest to the edge of the light-emitting region is a first distance; a distance between an edge of a light-emitting region of the second subpixel and a second aperture immediately adjacent to the edge of the light-emitting region is a second distance, the first distance being greater than the second distance; or the definition structure comprises a first definition structure and a second definition structure; the first definition structure comprises a section surrounding the light-emitting region of the first subpixel, and the second definition structure comprises a section surrounding the light-emitting region of the second subpixel;a portion of the section in the first definition structure that is exposed through the second opening, in the first definition structure, is smaller than a portion of the section in the second definition structure that is exposed through the second opening, in the second definition structure.

[0223] In the display substrate provided by the present disclosure, the edge of the light-emitting area of ​​the first subpixel with a higher turn-on voltage is set so that it has a greater distance from the second aperture, or the section of the first definition structure corresponding to the first subpixel exposed by the second aperture is set smaller, so that the second electrode of the first subpixel has a conductive channel with a larger area, which improves the conductive effect of the second electrode of the first subpixel and is advantageous to avoid excessive power consumption and brightness uniformity problems of the display substrate.

[0224] Fig. 1 to Fig. 17 can be applied to the display substrate provided by this embodiment. As in Fig. 1 to Fig. As shown in Figure 3, the display substrate comprises a base substrate 01, a plurality of subpixels 10, a pixel definition pattern 400, and a definition structure 200 located on the base substrate 01. The base substrate 01 comprises at least one first region A1; the plurality of subpixels 10 are located in the first region A1; each subpixel 10, under at least some subpixels 10, comprises a light-emitting functional layer 130, and the light-emitting functional layer 130 comprises a plurality of film layers.

[0225] The subpixels provided by this embodiment have the same features as the subpixels provided by the embodiments described above, for example including the light-emitting functional layer 130 and the first electrode 110 and the second electrode 120, which are located on both sides of the light-emitting functional layer 130 along the direction perpendicular to the base substrate 01, and no details are repeated here.

[0226] As in Fig. 2 to Fig. As shown in Figure 3, the pixel definition pattern 400 is located on a side of the first electrode 110 away from the base substrate 01, and the pixel definition pattern 400 comprises a plurality of first openings 410 to define light-emitting regions 101 of at least some subpixels 10. The pixel definition pattern 400 further comprises second openings 420; a section of at least one layer in the light-emitting functional layer 130 located in the first opening 410 is a continuous section, at least one section located in the at least one second opening 420 is isolated; and a section in the definition structure 200 exposed by the second opening 420 is configured to isolate at least one layer of the light-emitting functional layer 130.

[0227] As in Fig. 2 to Fig. As shown in Figure 3, the definition structure 200 is located between the light-emitting functional layer 130 and the base substrate 01, and the definition structure 200 comprises a section that surrounds a light-emitting area 11 of each subpixel 10 under at least some subpixels 10.

[0228] Features such as structures contained in the definition structure, positional relationships between the definition structure and the first opening and the second opening, etc., according to this embodiment may be the same as the corresponding features according to the embodiments described above, and no details are repeated here.

[0229] As in Fig. 2 to Fig. As shown in Figure 3, the plurality of subpixels 10 comprises a first subpixel 11 and a second subpixel 12, the turn-on voltage of the first subpixel 11 is higher than the turn-on voltage of the second subpixel 12; the distance between an edge of a light-emitting region of the first subpixel 11 (e.g., an edge of a region defined by the first aperture 410) and a second aperture 420 that is closest to the edge of the light-emitting region is a first distance D1, the distance between an edge of a light-emitting region of the second subpixel 12 and a second aperture 420 that is immediately adjacent to the edge of the light-emitting region is a second distance D2, and the first distance D1 is greater than the second distance D2.

[0230] As in Fig. 2 to Fig. As shown in Figure 3, the definition structure 200 comprises a first definition structure 210 and a second definition structure 220; the first definition structure 210 comprises a section surrounding the light-emitting area 101 of the first subpixel 11, the second definition structure 220 comprises a section surrounding the light-emitting area 101 of the second subpixel 12; a second aperture 420, which is closest to the edge of the light-emitting area of ​​the second subpixel 12, is a second aperture 420 that exposes the second definition structure 220, and the second aperture 420 does not expose the first definition structure 11.

[0231] In the display substrate provided by the present disclosure, the edge of the light-emitting area of ​​the first subpixel with a higher turn-on voltage is set to have a greater distance from the second opening, so that the second electrode of the first subpixel has a conductive channel with a larger area, which improves the conductive effect of the second electrode of the first subpixel and is advantageous to avoid excessive power consumption and brightness uniformity problems of the display substrate.

[0232] For example, as in Fig. As shown in Figure 2, the plurality of subpixels 10 further includes a third subpixel 13; the definition structure 200 further includes a third definition structure 230, the third definition structure 230 includes a section surrounding a light-emitting area 101 of the third subpixel 13; and a minimum distance between the second aperture 420, configured to expose the second definition structure 220, and an edge of the light-emitting area of ​​the third subpixel 13 is greater than the second distance D2. For example, the second aperture 420, configured to expose the second definition structure 220, does not expose the third definition structure 230.

[0233] In some examples, such as in Fig. 2 and Fig. As shown in Figure 3, the second aperture 420 is located between the first subpixel 11 and the third subpixel 13; a distance between the edge of the light-emitting area of ​​the first subpixel 11 and the second aperture 420 is a third distance D3, a distance between the edge of the light-emitting area of ​​the third subpixel 13 and the second aperture 420 is a fourth distance D4, and the third distance D3 is greater than the fourth distance D4. For example, the second aperture 420 is a second aperture 420 that exposes the third definition structure 230, and the second aperture 420 does not expose the first definition structure 210.

[0234] In some examples, such as in Fig. As shown in Figure 2, the turn-on voltage of the first subpixel 11 is 0.1 V to 5 V higher than the turn-on voltage of the second subpixel 12. The relationships between the turn-on voltage of the first subpixel, the turn-on voltage of the second subpixel, and the turn-on voltage of the third subpixel according to this embodiment may have the same features as the embodiments described above, and no details are repeated here.

[0235] In some examples, such as in Fig. As shown in Figure 2, a section of the second definition structure 220, exposed through the second opening 420, is an open ring structure, with the proportion of the open ring structure to a circumference of the second definition structure 220 being between 10% and 80%. Fig. As shown in Figure 2, a section of the third definition structure 230, exposed through the second opening 420, is an open ring structure, and the proportion of the open ring structure to a circumference of the third definition structure 230 is 10% to 80%.

[0236] As in Fig. As shown in Figure 4, the proportion of the section in the first definition structure 210 exposed by the second opening 420 in the first definition structure 210 is less than the proportion of the section in the second definition structure 220 exposed by the second opening 420 in the second definition structure 220.

[0237] In some examples, such as in Fig. As shown in Figure 4, the proportion of the section in the first definition structure 210 exposed by the second opening 420 in the first definition structure 210 is less than the proportion of the section in the third definition structure 230 exposed by the second opening 420 in the third definition structure 230.

[0238] The relationship between the first definition structure and the second opening, the relationship between the second definition structure and the second opening, and the relationship between the third definition structure and the second opening according to this embodiment may have the same features as the corresponding relationships in each example according to the embodiments described above, and no details are repeated here.

[0239] In some examples, such as in Fig. 1, Fig. 3 and Fig.As shown in Figure 13, the base substrate 01 further comprises a second region A2, the first region A1 is located in the periphery of the second region A2; the definition structure 200 comprises at least one loop of a closed annular definition structure 240 that surrounds the second region A2; and the light-emitting functional layer 130 and the second electrode 120 are both separated at the edge position of the annular definition structure 240.

[0240] The second area and the ring-shaped definition structure arranged in the second area in this embodiment can have the same features as the second area and the ring-shaped definition structure arranged in the second area according to the embodiment described above, and no details are repeated here.

[0241] Another embodiment of the present disclosure provides a display substrate; the display substrate comprises: a base substrate comprising at least one first region; a plurality of subpixels located in the first region, each subpixel comprising a light-emitting functional layer beneath at least some subpixels, the light-emitting functional layer comprising a plurality of film layers; a pixel definition pattern located on the base substrate, the pixel definition pattern comprising a plurality of first openings to define light-emitting regions of the at least some subpixels; a definition structure located between the light-emitting functional layer and the base substrate, the definition structure comprising a section surrounding a light-emitting region of each subpixel beneath the at least some subpixels.wherein the pixel definition pattern further comprises second apertures, a section of at least one layer in the light-emitting functional layer located in the first aperture is a continuous section, at least one section located in at least one second aperture is isolated, and a section in the definition structure exposed by the second aperture is configured to isolate at least one layer of the light-emitting functional layer; the plurality of subpixels comprises a first subpixel and a second subpixel, wherein an aperture portion of the first subpixel is larger than an aperture portion of the second subpixel; the definition structure comprises a first definition structure and a second definition structure; the first definition structure comprises at least one section surrounding the light-emitting area of ​​the first subpixel, and the second definition structure comprises at least one sectionthat surrounds the light-emitting area of ​​the second subpixel; the first definition structure is not exposed by the second aperture; or a fraction of an edge perimeter of the section in the first definition structure exposed by the second aperture, on a perimeter of the first aperture surrounded by the first definition structure, is smaller than a fraction of an edge perimeter of the section in the second definition structure exposed by the second aperture, on a perimeter of the first aperture surrounded by the second definition structure; or a distance between an edge of the light-emitting area of ​​the first subpixel and the second aperture closest to the edge of the light-emitting area is a first distance; a distance between an edge of the light-emitting area of ​​the second subpixel and a second aperture immediately adjacent to the edge of the light-emitting area.a second distance exists, and the first distance is greater than the second distance.

[0242] For example, the light output of the first subpixel is lower than the light output of the second subpixel.

[0243] For example, the lifespan of the first subpixel is shorter than the lifespan of the second subpixel.

[0244] Since the first subpixel has a lower luminous efficacy and a shorter lifetime, the aperture fraction of the first subpixel is set to a larger value, which is advantageous for reducing the voltage drop of the first subpixel. In the display substrate provided by the present disclosure, the first definition structure in the periphery of the first subpixel is set with a higher aperture fraction such that it is either not exposed by the second aperture or has a smaller portion exposed by the second aperture, so that the second electrode of the first subpixel has a conductive channel with a larger area. This improves the conductivity of the second electrode of the first subpixel and is advantageous for avoiding excessive power consumption and brightness uniformity problems of the display substrate.

[0245] For example, the first subpixel can contain a fluorescent light-emitting device, and the second subpixel can contain a phosphorescent light-emitting device. For example, the first subpixel can be a blue subpixel, and the second subpixel can be a red subpixel or a green subpixel.

[0246] For example, the wavelength of light emitted by the first subpixel is shorter than the wavelength of light emitted by the second subpixel. For example, the first subpixel emits blue light and the second subpixel emits green or red light.

[0247] For example, the power required for the first subpixel to emit light is greater than the power required for the second subpixel to emit light.

[0248] Features of the respective subpixels and features of the definition structure and pixel definition patterns according to this embodiment can be the same as the corresponding features according to one of the embodiments described above, and no details are repeated here.

[0249] Another embodiment of the present disclosure provides a display substrate; the display substrate comprises: a base substrate comprising a first region and a second region, the first region being arranged at the periphery of the second region; a plurality of subpixels arranged in the first region, each subpixel comprising, among at least some subpixels, a light-emitting functional layer, as well as a first electrode and a second electrode located on both sides of the light-emitting functional layer along a direction perpendicular to the base substrate, the first electrode being located between the light-emitting functional layer and the base substrate, and the light-emitting functional layer comprising a plurality of film layers;a pixel definition pattern located on a side of the first electrode remote from the base substrate, wherein the pixel definition pattern comprises a plurality of first apertures to define light-emitting regions of the at least some subpixels; a definition structure located between the light-emitting functional layer and the base substrate, wherein the definition structure comprises a section that surrounds a light-emitting region of each subpixel beneath the at least some subpixels; wherein the pixel definition pattern further comprises second apertures, at least one layer in the light-emitting functional layer located in the first aperture is a continuous section, and at least one section located in at least one second aperture is isolated;a section in the definition structure, exposed through the second opening, is configured to isolate at least one layer of the light-emitting functional layer; the definition structure comprises at least one loop of a closed annular definition structure surrounding the second area, and the light-emitting functional layer and the second electrode are both separated at an edge position of the annular definition structure.

[0250] In the display substrate provided by the present disclosure, the second area is not provided with subpixels for emitting light; and at least one loop of an annular definition structure for separating the light-emitting functional layer and the second electrode is arranged in the periphery of the second area, which can separate the light-emitting element located in the first area from the second area in order to isolate water oxygen from the film layer such as the light-emitting functional layer.

[0251] For example, the pixel definition pattern includes a pixel definition section that surrounds the first aperture and the second aperture; and along a direction perpendicular to the base substrate, the ring-shaped definition structure does not overlap with the pixel definition section.

[0252] For example, the at least one loop of the closed ring-shaped definition structure comprises a plurality of loops of ring-shaped definition structures, and the distance between two adjacent loops of ring-shaped definition structures is not less than 5 micrometers.

[0253] For example, the plurality of subpixels comprises a first subpixel and a second subpixel; the definition structure comprises a first definition structure and a second definition structure; the first definition structure comprises at least one section surrounding the light-emitting area of ​​the first subpixel, the second definition structure comprises at least one section surrounding the light-emitting area of ​​the second subpixel, and the section of the second definition structure exposed through the second opening is an open ring structure.

[0254] For example, the first definition structure is not exposed by the second opening, or the section of the first definition structure that is exposed by the second opening is an open ring structure.

[0255] For example, the turn-on voltage of the first subpixel is higher than the turn-on voltage of the second subpixel.

[0256] For example, a fraction of an edge perimeter of the section in the first definition structure exposed by the second opening, relative to a perimeter of the first opening surrounded by the first definition structure, is smaller than a fraction of an edge perimeter of the section in the second definition structure exposed by the second opening, relative to a perimeter of the first opening surrounded by the second definition structure.

[0257] For example, a minimum distance between a boundary of the definition structure that overlaps with the first opening and a boundary of the ring-shaped definition structure is greater than 1 micrometer.

[0258] For example, a minimum distance between the ring-shaped definition structure and the boundaries of the pixel definition section is greater than 1 micrometer.

[0259] For example, a planarization layer is provided between the pixel definition section and the base substrate, and a minimum distance between the ring-shaped definition structure and the boundaries of the planarization layer is greater than 1 micrometer.

[0260] Features of the respective subpixels and features of the definition structure and pixel definition patterns according to this embodiment can be the same as the corresponding features according to one of the embodiments described above, and no details are repeated here.

[0261] Another embodiment of the present disclosure provides a display device, and the display device comprises one of the display substrates described above.

[0262] For example, the display device also includes a cover plate located on a light-emitting side of the display substrate.

[0263] The display device can be, for example, a display device such as an organic light-emitting diode display device, as well as a television, a digital camera, a mobile phone, a watch, a tablet computer, a laptop, a navigation device and any other product or component with a display function, including the display device, and this embodiment is not limited thereto.

[0264] The following statements should be noted: (1) The accompanying drawings relate only to the structure(s) in connection with the embodiment(s) of the present disclosure, and other structure(s) may relate to the common embodiment(s). (2) If there is no conflict, features may be combined in one embodiment or in different embodiments.

[0265] The above descriptions are only specific implementations of the present disclosure; the scope of protection of the present disclosure is not limited thereto. The scope of protection of the present disclosure should be determined by the scope of protection of the claims.

Claims

[1] Display substrate, comprising: a base substrate comprising at least one first area; a plurality of subpixels located in the first area, each subpixel comprising a light-emitting functional layer beneath at least some subpixels, and the light-emitting functional layer comprising a plurality of film layers; a pixel definition pattern located on the base substrate, wherein the pixel definition pattern comprises a plurality of first apertures to define light-emitting areas of at least some subpixels; a definition structure located between the light-emitting functional layer and the base substrate, wherein the definition structure includes a section that surrounds a light-emitting area of ​​each subpixel under the at least some subpixels, wherein the pixel definition pattern further comprises second apertures, a section of at least one layer in the light-emitting functional layer located in the first aperture is a continuous section, at least one section of the at least one layer in the light-emitting functional layer located in at least one second aperture is isolated, and a section in the definition structure exposed by the second aperture is configured to isolate the at least one layer of the light-emitting functional layer; the multitude of subpixels includes a first subpixel and a second subpixel, the turn-on voltage of the first subpixel is higher than the turn-on voltage of the second subpixel, the definition structure includes a first definition structure and a second definition structure, the first definition structure includes at least one section surrounding a light-emitting area of ​​the first subpixel, and the second definition structure includes at least one section surrounding a light-emitting area of ​​the second subpixel; the first definition structure is not exposed by the second opening, or a fraction of an edge length of a section in the first definition structure exposed by the second opening to a perimeter of the first opening corresponding to the first subpixel is smaller than a fraction of an edge length of a section in the second definition structure exposed by the second opening to a perimeter of the first opening corresponding to the second subpixel. [2] Display substrate according to claim 1, wherein the turn-on voltage of the first subpixel is 0.1 V to 5 V higher than the turn-on voltage of the second subpixel. [3] Display substrate according to claim 1 or 2, wherein a section of the second definition structure exposed by the second opening is an open ring structure, and a proportion of the open ring structure on the circumference of the first opening corresponding to the second subpixel is in the range of 10% to 80%. [4] Display substrate according to any one of claims 1 to 3, wherein the plurality of subpixels further comprises a third subpixel, the definition structure further comprises a third definition structure, the third definition structure comprises a section surrounding a light-emitting area of ​​the third subpixel; the third definition structure is not exposed by the second opening, or the proportion of the edge length of the section in the first definition structure that is exposed by the second opening to the perimeter of the first opening corresponding to the first subpixel is smaller than a proportion of an edge length of a section in the third definition structure that is exposed by the second opening to a perimeter of the first opening corresponding to the third subpixel. [5] Display substrate according to claim 4, wherein the section of the third definition structure exposed by the second opening is an open ring structure, and the proportion of the open ring structure on the circumference of the first opening corresponding to the third subpixel is in the range of 10% to 80%. [6] Display substrate according to claim 4, wherein the first subpixel is a blue subpixel, one of the second subpixel and one of the third subpixel is a red subpixel, and the other of the second subpixel and one of the third subpixel is a green subpixel. [7] Display substrate according to claim 1, wherein each subpixel further comprises, among the at least some subpixels, a first electrode and a second electrode located on both sides of the light-emitting functional layer along a direction perpendicular to the base substrate, the first electrode being located between the light-emitting functional layer and the base substrate, and the pixel definition pattern being located on a side of the first electrode away from the base substrate; the definition structure being located between the first electrode and the base substrate. [8] Display substrate according to any one of claims 1 to 7, wherein the pixel definition pattern comprises a pixel definition section surrounding the first aperture and the second aperture; along a direction perpendicular to the base substrate at least one section of the pixel definition section does not overlap with the definition structure. [9] Display substrate according to claim 1, wherein each subpixel, among the at least some subpixels, further comprises a first electrode and a second electrode located on both sides of the light-emitting functional layer along a direction perpendicular to the base substrate, the first electrode being located between the light-emitting functional layer and the base substrate, and the pixel definition pattern being located on a side of the first electrode away from the base substrate; the first definition structure not being exposed through the second opening, and a ring width of a ring section of the first definition structure not covered by the first electrode of the first subpixel being smaller than a ring width of a ring section of the second definition structure not covered by the first electrode of the second subpixel. [10] Display substrate according to claim 1, wherein each subpixel, among the at least some subpixels, further comprises a first electrode and a second electrode located on both sides of the light-emitting functional layer along a direction perpendicular to the base substrate, the first electrode being located between the light-emitting functional layer and the base substrate, and the pixel definition pattern being located on a side of the first electrode away from the base substrate; the proportion of the edge length of the section in the first definition structure exposed by the second opening to the perimeter of the first opening corresponding to the first subpixel is smaller than the proportion of the edge length of the section in the second definition structure exposed by the second opening to the perimeter of the first opening corresponding to the second subpixel;a ring width of a section that does not have an overlapping section with the second opening in a ring section of the first definition structure not covered by the first electrode of the first subpixel is a first ring width; a ring width of a section that has an overlapping section with the second opening in the ring section of the first definition structure is a second ring width, and the first ring width is smaller than the second ring width. [11] Display substrate according to any one of claims 1 to 6, wherein each subpixel, among the at least some subpixels, further comprises a first electrode and a second electrode located on both sides of the light-emitting functional layer along a direction perpendicular to the base substrate, the first electrode being located between the light-emitting functional layer and the base substrate, and the pixel definition pattern being located on a side of the first electrode away from the base substrate; the base substrate further comprising a second region, the definition structure comprising at least one loop of a closed annular definition structure surrounding the second region, and the light-emitting functional layer and the second electrode both being separated at an edge position of the annular definition structure. [12] Display substrate according to claim 11, wherein the pixel definition pattern comprises a pixel definition section surrounding the first aperture and the second aperture, and along the direction perpendicular to the base substrate at least one section of the annular definition structure does not overlap with the pixel definition section. [13] Display substrate according to claim 11, wherein the at least one loop of a closed annular definition structure comprises a plurality of loops of annular definition structures, and an interval between two adjacent loops of annular definition structures is not less than 1 micrometer. [14] Display substrate according to any one of claims 1 to 13, wherein the defining structure comprises a first insulating layer and a second insulating layer which are stacked, the first insulating layer being located on a side of the second insulating layer away from the base substrate, and an edge of the first insulating layer projecting relative to an edge of the second insulating layer. [15] Display substrate according to claim 14, wherein a material of the first insulating layer differs from a material of the second insulating layer, the material of the first insulating layer comprises an inorganic non-metallic material or a metallic material, and the material of the second insulating layer comprises an organic material or an inorganic non-metallic material. [16] Display substrate according to claim 1, wherein the plurality of subpixels further comprises a third subpixel; the plurality of subpixels is arranged into a plurality of first subpixel groups and a plurality of second subpixel groups, which are arranged alternately along a first direction; the respective first subpixel groups each comprise first subpixels and second subpixels, which are arranged alternately along a second direction; the respective second subpixel groups each comprise third subpixels, which are arranged along the second direction; and the first direction intersects with the second direction. [17] Display substrate according to claim 16, wherein the definition structure further comprises a third definition structure; the first definition structure comprises an open annular first isolation section surrounding the light-emitting area of ​​the first subpixel, the second definition structure comprises an open annular second isolation section surrounding the light-emitting area of ​​the second subpixel, and the third definition structure comprises an open annular third isolation section surrounding the light-emitting area of ​​the third subpixel; the shapes of the light-emitting areas of the first subpixel, the second subpixel, and the third subpixel are all quadrilaterals;the first isolation section surrounds two adjacent edges of the light-emitting area of ​​the first subpixel and a first corner section formed by joining the two adjacent edges, or the first isolation section surrounds a section of two adjacent edges of the light-emitting area of ​​the first subpixel except for a first corner section formed by joining the two adjacent edges; the second isolation section surrounds two adjacent edges of the light-emitting area of ​​the second subpixel and a second corner section formed by joining the two adjacent edges; the third isolation section surrounds two adjacent edges of the light-emitting area of ​​the third subpixel and a third corner section formed by joining the two adjacent edges; and the orientations of the first corner section, the second corner section, and the third corner section are all the same. [18] Display substrate according to claim 16, wherein the second definition structure comprises a non-closed annular second isolation section surrounding the light-emitting area of ​​the second subpixel; the shapes of the light-emitting areas of the first subpixel, the second subpixel and the third subpixel are all quadrilaterals, and the second isolation section surrounds four edges of the light-emitting area of ​​the second subpixel. [19] Display substrate according to claim 18, wherein the definition structure further comprises a third definition structure, the third definition structure comprising an open annular third isolation section surrounding the light-emitting area of ​​the third subpixel, and the third isolation section surrounding two edges of the light-emitting area of ​​the third subpixel that are immediately adjacent to the light-emitting area of ​​the first subpixel. [20] Display substrate according to claim 16, wherein the second definition structure comprises an open annular second isolation section surrounding the light-emitting area of ​​the second subpixel; the definition structure further comprises a third definition structure, and the third definition structure comprises an open annular third isolation section surrounding the light-emitting area of ​​the third subpixel; the shapes of the light-emitting areas of the first subpixel, the second subpixel and the third subpixel are all quadrilaterals;the second isolation section surrounds two adjacent edges of the light-emitting area of ​​the second subpixel and a second corner section formed by joining the two adjacent edges; the third isolation section surrounds two adjacent edges of the light-emitting area of ​​the third subpixel and a third corner section formed by joining the two adjacent edges; and the orientations of the second corner section and the third corner section are both the same. [21] Display substrate according to any one of claims 1 to 20, wherein at least one film layer of the light-emitting functional layer comprises a charge-generating layer, the light-emitting functional layer comprises a first light-emitting layer, the charge-generating layer and a second light-emitting layer which are stacked; the charge-generating layer is located between the first light-emitting layer and the second light-emitting layer, and the charge-generating layer is separated at an edge of the definition structure. [22] Display substrate, comprising: a base substrate comprising at least one first area; a plurality of subpixels located in the first area, each subpixel comprising a light-emitting functional layer under at least some subpixels, and the light-emitting functional layer comprising a plurality of film layers; a pixel definition pattern located on the base substrate, wherein the pixel definition pattern comprises a plurality of first apertures to define light-emitting areas of at least some subpixels; a definition structure located between the light-emitting functional layer and the base substrate, wherein the definition structure includes a section that surrounds a light-emitting area of ​​each subpixel under the at least some subpixels, wherein the pixel definition pattern further comprises second apertures, a section of at least one layer in the light-emitting functional layer located in the first aperture is a continuous section, at least one section of the at least one layer in the light-emitting functional layer located in at least one second aperture is isolated, and a section in the definition structure exposed by the second aperture is configured to isolate the at least one layer of the light-emitting functional layer; The multitude of subpixels includes a first subpixel and a second subpixel, and the turn-on voltage of the first subpixel is higher than the turn-on voltage of the second subpixel; a distance between an edge of a light-emitting region of the first subpixel and a second aperture that is closest to the edge of the light-emitting region of the first subpixel is a first distance; a distance between an edge of a light-emitting region of the second subpixel and a second aperture that is immediately adjacent to the edge of the light-emitting region of the second subpixel is a second distance, and the first distance is greater than the second distance; or the definition structure comprises a first definition structure and a second definition structure, the first definition structure comprising at least one section that surrounds the light-emitting region of the first subpixel, and the second definition structure comprising at least one section that surrounds the light-emitting region of the second subpixel;a fraction of an edge length of a section in the first definition structure, exposed by the second opening, of a perimeter of the first opening corresponding to the first subpixel, is smaller than a fraction of an edge length of a section in the second definition structure, exposed by the second opening, of a perimeter of the first opening corresponding to the second subpixel. [23] Display substrate according to claim 22, wherein the turn-on voltage of the first subpixel is 0.1 V to 5 V higher than the turn-on voltage of the second subpixel. [24] Display substrate according to claim 22 or 23, wherein the plurality of subpixels further comprises a third subpixel, the second opening is provided between the first subpixel and the third subpixel, a distance between the edge of the light-emitting area of ​​the first subpixel and the second opening is a third distance, a distance between the edge of the light-emitting area of ​​the third subpixel and the second opening is a fourth distance, and the third distance is greater than the fourth distance; or, the definition structure further comprises a third definition structure, the third definition structure comprising a section surrounding the light-emitting area of ​​the third subpixel;the fraction of the edge length of the section in the first definition structure exposed by the second opening, relative to the perimeter of the first opening corresponding to the first subpixel, is smaller than the fraction of an edge length of a section in the third definition structure exposed by the second opening, relative to the perimeter of the first opening corresponding to the third subpixel. [25] Display substrate according to one of claims 22 to 24, wherein a section of the second definition structure exposed by the second opening is an open ring structure, and a proportion of the open ring structure on the circumference of the first opening corresponding to the second subpixel is in the range of 10% to 80%. [26] Display substrate according to claim 24, wherein a section of the third definition structure exposed by the second opening is an open ring structure and a proportion of the open ring structure on the circumference of the first opening corresponding to the third subpixel is in the range of 10% to 80%. [27] Display substrate according to one of claims 22 to 24, wherein each subpixel, among the at least some subpixels, further comprises a first electrode and a second electrode located on both sides of the light-emitting functional layer along a direction perpendicular to the base substrate, the first electrode being located between the light-emitting functional layer and the base substrate, and the pixel definition pattern being located on a side of the first electrode away from the base substrate; the base substrate further comprising a second region, the definition structure comprising at least one loop of a closed annular definition structure surrounding the second region, and the light-emitting functional layer and the second electrode both being separated at an edge position of the annular definition structure. [28] Display device comprising the display substrate according to any one of claims 1 to 27.

Images