LITHOGRAPHIC COMPOSITIONS AND METHOD FOR THEIR USE FOR SUSTAINABLE AND MORE ENVIRONMENTALLY FRIENDLY SOLUTIONS FOR EDGE PROTECTION LAYERS

DE112024004094T5Undetermined Publication Date: 2026-07-09MERCK PATENT GMBH
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Patent Information

Authority / Receiving Office
DE · DE
Patent Type
Applications
Current Assignee / Owner
MERCK PATENT GMBH
Filing Date
2024-09-26
Publication Date
2026-07-09
Patent Text Reader

Abstract

The subject of this disclosure is a water-soluble material for a wafer edge protection layer (EPL) for a sustainable / more environmentally friendly solution in semiconductor processing.
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Citation Information

Patent Citations

  • Coating treatment method and coating treatment apparatus

    US8791030B2

  • Lithographic compositions and methods of use thereof

    WO2018167112A1

  • US-PATENTSCHRIFTNR.8,791,030