High-Technology antimicrobial protective face mask

Abstract

The invention is a high-technology antimicrobial protective face mask as personal protective equipment and has an air cleaning system that acts against particles and harmful gases in the environment a

Description

[0001] HIGH-TECHNOLOGY ANTIMICROBIAL PROTECTIVE FACE MASK

[0002] Field of the Invention

[0003] The invention is an air cleaning system for use in air disinfection as a personal protective equipment and further to act against particles and harmful gases in the environment , which relates to an antimicrobial surface protective face mask, having a two-stage inactivation mechanism, including an antimicrobial and a catalytic agent-containing activated carbon filter ( first stage catalytic adsorption) and a nanosi zed TiC>2 photocatalytic catalyst ( second stage photocatalytic inactivation, powered by a rechargeable battery, thereby providing ease of use and comprising an air drawing fan ( 9 ) facilitating inhalation and further providing easy discharge of the drawn air in a di f ferent way .

[0004] Known State of the Art

[0005] Many practices aiming at disinfection and sterili zation of closed areas in order to prevent airborne and respiratory infections have come to the agenda after the inception of COVID- 19 pandemic (World Health Organi zation, Rational use of personal protective equipment for coronavirus disease ( COVID- 19 ) and considerations during severe shortages , April 6th, 2020 )

[0006] In a small number of studies on total bacteria and virus concentrations in indoor air, concentrations of about 105CFU / m3bacteria and 106CFU / m3virus are reported in various indoor and outdoor air environment , respectively . Since humans carry 1012CFU microorganisms in their epidermis and 1014CFU microorganisms in their feeding channels , they are one of the largest sources of bioaerosols in their environment . ( Prussin, Aaron J . , and Linsey C . Marr . " Sources of airborne microorganisms in the built environment . " Microbiome 3 . 1 ( 2015 ) : 78 . )

[0007] It is known that a large number of viruses are easily transmitted between people through direct and indirect contact . Exposure to air, cough, or sneezing discharged from infected individuals can cause the virus spread directly to another person through the air . It can also be transmitted indirectly after contact with surfaces such as tabletops and door handles in the presence of infected people and obj ects for the personal use of the infected individual .

[0008] Various disinfection and sterili zation strategies are used to prevent the direct and indirect spread of infections . The leading, main disinfection and sterili zation embodiments are mostly physical and chemical inactivation applications that aim to prevent contamination that may occur during indirect contact from closed areas and surfaces . Its texture is not suitable for air passage , actually interferes with the required breathability of a ventilator by reducing air flow . A similar practice to reduce the spread of microorganisms is the use of hand saniti zers containing mostly ethanol . These surface sanitation systems are ef fective in reducing propagation through manual contact , but are ineffective in protecting against airborne viruses . Uninfected individuals use these alcohol-based disinfectants to kill the virus on germ-laden surfaces left by previously infected persons . And of course , hand saniti zers do not provide protection against inhalation of airborne viruses . As a result , there are many sanitation applications to prevent the spread of contamination through indirect contact . However, there is no alternative to filtration-based personal protective masks used to prevent direct contact contamination (World Health Organi zation . Infection prevention and control during health care when COVID- 19 is suspected : interim guidance , 19 March 2020 . No . who / 2 019-nCoV / IPC / 2020 . 3 . World Health Organi zation, 2020 ) .

[0009] Masks used to prevent direct contact contamination provide protection only through filtration, especially against viral diseases that may cause epidemics and pandemics .

[0010] The inactivation of the masks of the US5724964A and US 6681765B2 documents of the known state of the art is provided by filtration . Inactivation in the use of masks , which is a personal protection method applied to prevent the direct spread of infections , does not provide full protection only by filtration . Microorganisms attached to the filter surface by the filtration process further increase the risk of infection . Di sposal of these masks is also a problem and creates an indirect risk of infection .

[0011] Inactivation is provided by chemical or biological agents in masks of documents US4856509A and W02007120509A2 . The main problem of multilayer face masks consisting of textile material treated with chemical antimicrobial agents is that they make breathing di f ficult . In addition to this , the mask that is moistened with breath is not suitable for long-term use . There are health drawbacks as the chemical composition may be toxic to allergic bodies and skin prone to atopy . Apart from these , it is known that full face masks are not preferred due to di f ficulty in use thereof .

[0012] In the known technique , ultraviolet radiation is also an ef fective microbial control process generally used in the sterili zation of indoor air, surfaces , water and surgical instruments . Depending on the wavelength of the UV beam applied; three types of UV beam namely UV-A(315-400 nm) , UV- B (280-315 nm) and UV-C (100-280 nm) are used for disinfection and sterilization (Matafonova, Galina, and Valeriy Batoev. "Recent progress on application of UV excilamps for degradation of organic pollutants and microbial inactivation." Chemosphere 89.6 (2012) : 637-647) . UV-C, one of these wavelengths, is preferred to prevent microbial contamination because it has the most lethal wavelength for microorganisms (Chevrefils, G., Caron, E., Wright, H., Sakamoto, G., Payment, P., Barbeau, B., & Cairns, B. (2006) . UV dose required to achieve incremental log inactivation of bacteria, protozoa and viruses. IUVA News, 8 (1) , 38-45) . When UV-C rays are used to prevent microbial contamination, in order to eliminate the effect of harmful UV rays on humans, special filters and UV light absorber beam traps that prevent direct contact with the individuals have been developed (Liu, Q. , Chen, Z . , Wei, D., & Du, Y. (2014) . Acute toxicity formation potential of benzophenone-type UV filters in chlorination disinfection process. Journal of Environmental Sciences, 26(2) , 440-447) . In the photolytic inactivation process using UV radiation, UV radiation penetrates directly into the microbial cell and kills by disrupting the cell and protein structure.

[0013] The patent document No. AU2020100503A can be given as an example for the use of UV-LED in masks in the art. The document in question deals with filtered masks containing UV-LED chips, which are developed to solve the problem of the short life of masks made of non-wowen fabrics and not providing sufficient protection, and which increase their service life and safety. It is stated that these filter masks are used for medical purposes. One or more of the mercury-free UV led chips are used in these masks. It is stated that at least one UV radiation source with a wavelength between 100 nm and 380 nm, available as UV-LEDs containing UV-A ( 315-380 nm) , UV-B ( 280- 315 nm) and UV-C ( 100-280 nm) , is connected to one and / or more inhalation and / or exhalation valves by preventing the user ' s face region (mouth and / or nose ) from being exposed to UV radiation . In order to prevent the face region from being exposed to UV radiation, there is a UV protective device made of a suitable plastic material . It is mentioned that the mask subj ect to the document comprises one and / or more pluggable replaceable filter elements consisting of a non-woven suitable fabric placed outside a frame or mask body . The power supply required to operate the filter mask subj ect to the document is provided by a separate, rechargeable accumulator and / or battery and / or an external device via USB cable . In this document , photolytic inactivation is provided . In the photolytic inactivation process , it is known that the coloni zed microorganisms sometimes shadow each other and it reduces the inactivation ef ficiency of UV radiation . In addition to this disadvantage , in the mentioned patent about the face mask with front particle filter and this inactivation system, which provides UV radiation-based photolytic inactivation, the ozone generating potential of the wavelengths used was disregarded .

[0014] Another example of the current state of the art is the patent document No . US2012174922A. Said document relates to a breathing apparatus comprising a mask and a neck part . Said mask has been developed to substantially enclose at least the user ' s mouth or nostrils . The neck portion is attached to said mask and is adapted to substantially surround the back of the user ' s neck . The filter assembly of said device comprises one or more filters selected from the group of a coarse filter, a prefilter, a high ef ficiency particulate air (HEPA) filter, an advanced carbon filter, an active carbon filter ( steam-activated or multi-chemical-activated) , a photo catalyst filter or coating ( ambient light and / or LED- activated) and cold catalyst filters . It is noted that the photo catalyst filter is preferably made of titanium dioxide and is sensitive to all types of light . In this way, it is stated that the use of UV beam is not necessary and thus the safety of the device is increased . Therefore , the document does not provide a safe device for the use of UV rays . In this case , it is thought that inactivation of airborne microorganisms cannot be achieved at the desired level . In this patent mentioned in the literature , the UV-LED system does not actively operate . In addition, the photocatalyst filter used is TiCk doped activated carbon and is activated by daylight . Again, the ozone production and health ef fects of the UV radiation used were disregarded . Instruction to clean the device using UV-LED lamps for microbial inactivation when the ventilator is not in use reveals that there are situations where daylight cannot be suf ficient . No mechanism has been defined to prevent the harmful ef fects of UV radiation on the user or his environment .

[0015] In order to eliminate the disadvantages mentioned above , a safe , advanced technology personal protective mask has been developed that provides in situ and close to 100% inactivation, sel f-cleaning, disinfecting and improving the air and hygienic conditions of the environment in which it is used .

[0016] Detailed Description of the Invention

[0017] The invention deals with a high-technology antimicrobial protective face mask .

[0018] The developed mask is based on the principle that it provides two-stage inactivation, catalytic adsorption in the first stage and photocatalytic inactivation in the second stage . In its most general form, the invention comprises an outer cover (1) (front cover) , a prefilter (4) and / or an air filter (7) providing catalytic adsorption, a sanitation cell (10) providing photocatalytic inactivation, an intermediate inactivated surface (6) positioned between the outer cover (1) and the sanitation cell (10) , and a structure (19) .

[0019] The antimicrobial protective face mask of the present invention in more detail, comprises:

[0020] - an outer cover (1) for air to enter the mask,

[0021] - a pre-filter (4) with granular activated carbon containing antimicrobial and catalytic agent, optionally removable and placed between the outer cover (1) and intermediate inactivated surface (6) to provide catalytic adsorption and / or an air filter (7) and / or an air filter (7) with granular activated carbon containing antimicrobial and catalytic agent placed in the air inlet space (8) providing protection even when the pre-filter (4) is not used,

[0022] - an air drawing fan (9) that facilitates inhalation,

[0023] - a sanitation cell (10) comprising at least one UV led lamp (14) that does not produce ozone with a UV-C beam wavelength to provide photocatalytic inactivation, UV-C radiation attenuating black ray trap (12) , a titanium dioxide coated inactivated surface (11) which is the contact path of the UV-C ray and a power unit,

[0024] - an intermediate inactivated surface (6) between the outer cover (1) and the sanitation cell (10) , including an air inlet space (8) on its surface to pass the air passing through the outer cover (1) to the sanitation cell (10) ,

[0025] - a structure (19) under the sanitation cell (10) , covering at least a portion of the user's mouth and / or nose, and

[0026] - on said structure (19) , an outlet port for easy discharge of the air drawn into the mask in different ways. In one embodiment of the invention, the outer cover (1) comprises suction holes (3) that allow air to enter the mask.

[0027] In an embodiment of the invention, the pre-filter (4) has a content of copper, zinc and colloidal silver doped granular activated carbon.

[0028] In an embodiment of the invention, the pre-filter ( 4 ) has a cartridge model. The pre-filter (4) can be used by the user optionally for a certain period of time and can be changed by the user. The mask can work with full inactivation without using this filter.

[0029] An embodiment of the invention comprises an air filter (7) in the air inlet space (8) , in the absence of the pre-filter (4) . Said air filter (7) is an antimicrobial filter containing copper, zinc and colloidal silver.

[0030] In an embodiment of the invention, the pre-filter (4) and / or the air filter (7) have two layers. The first layer contains granular activated carbon containing antimicrobial and catalytic agent doped with copper, zinc and / or colloidal silver and provides microbial inactivation. The second layer contains an additive-free granular activated carbon filter and also acts against harmful gases in the environment.

[0031] In one embodiment of the invention, the intermediate inactivated surface (6) is the separator and support connection surface between the pre-filter (4) and the sanitation cell (10)

[0032] In an embodiment of the invention, the intermediate inactivated surface (6) is antimicrobial coated. In an embodiment of the invention, there are air flow channels (5) that regulate the air flow on the intermediate inactivated surface ( 6 ) .

[0033] In an embodiment of the invention, there is an air drawing fan (9) (suction fan) placed in the air inlet space (8) of the sanitation cell (10) on the intermediate inactivated surface (6) . The aforementioned air drawing fan (9) facilitates breathing by the user.

[0034] In an embodiment of the invention, the titanium dioxide is in nano-scale .

[0035] In one embodiment of the invention, the UV led lamp (14) has a mercury-free ozone-free UV-C wavelength. Preferably, the UV led lamp (14) is 4 pieces.

[0036] In an embodiment of the invention, the power unit provides the energy required for the sanitation cell (10) .

[0037] In one embodiment of the invention, the power unit comprises a power setting circuit (13) , a rechargeable battery (16) and a micro usb charging section (15) , and an on / off button (18) for UV-C.

[0038] In one embodiment of the invention, the sanitation cell (10) is a single layer and maze structure extending from the air / breath inlet to the air / breath outlet.

[0039] In an embodiment of the invention, the structure (19) has a soft surface that surrounds the facial contours of the user. In one embodiment of the invention, the structure (19) comprises a one-way air inlet valve (2 ) that can be opened to the breath inlet direction .

[0040] In one embodiment of the invention, the outlet port comprises a one-way air outlet valve (21) . In this way, the air that is drawn into the mask and formed as a result of inhalation is easily discharged in different ways.

[0041] The one-way air inlet valve (20) and the one-way air outlet valve (21) are facilitating and comfortable for users with breathing difficulties, and the mask can work with microbial inactivation at the same efficiency without these valves.

[0042] An embodiment of the invention comprises adjustable hangers secured to the head of the user.

[0043] In one embodiment of the invention, the UV-C radiation attenuating black ray trap (12) is located at the outlet of the sanitation cell (10) . In this way, it is ensured that every user in all risk groups and all ages is protected from the destructive effects of UV-C radiation.

[0044] In an embodiment of the invention, the in-mask sanitation comprises the catalytic adsorption and photocatalytic inactivation stages, respectively. For catalytic adsorption, there is a pre-filter (4) with antiseptic (germicidal) effect Cu, Zn and colloidal Ag doped activated carbon on all microorganisms such as viruses, bacteria, molds, etc. For photocatalytic inactivation, photolytic inactivation with UV led lamp (14) with ozone-free UV-C beam wavelength and inactivation on the surface with photocatalytic antimicrobial properties by coating the contact path of light with nano TiO2. In one embodiment of the invention, the microorganisms advancing along the respiratory tract of the mask will pass through the antiseptic (germicidal) Cu, Zn and colloidal Ag coated activated carbon filter, will move along the labyrinth pathway with UV led lamp (14) with UV-C beam-wavelength and will be inactivated on the photocatalytic antimicrobial surface by coating nano-sized TiCh respectively in three stages. In this way, 100% inactivation will be provided in practice, no matter how high the microbial load of the indoor air is.

[0045] By the working principle of one embodiment of the invention, it is ensured that the particles in the air are retained, harmful gases and odors are eliminated by adsorption with the parts of the activated carbon filter not covered with antimicrobial material, and the activated carbon filter coated with Cu, Zn and colloidal Ag doped antimicrobial and catalytic material provides a significant reduction in the number of incoming microorganisms to the mask. It then removes the remaining microorganisms by UV-C photolytic inactivation and photocatalytic inactivation on the TiO2 coated surface.

[0046] An embodiment of the invention is shown in figures 1 to 8. Figure 1 shows the outer cover (1) , and the outer cover (1) is a front cover with suction holes (3) that allow dirty air to enter the filtration system. The air flow pathway (2) on the outer cover (1) is illustrated in figure 1.

[0047] Figure 2 shows the antimicrobial pre-filter (4) that provides catalytic adsorption, and the pre-filter (4) is a catalytic adsorption filter with antiseptic (germicidal) effect Cu, Zn and colloidal Ag doped activated carbon on microorganisms such as viruses, bacteria, molds, etc. The pre-filter (4) can be used by the user optionally. It is a cartridge model and it has antimicrobial quality and can be used for a certain period of time and changed by the user. The mask can work without this catalytic adsorption cell. The air flow pathway (2) on the pre-filter (4) is shown in figure 2.

[0048] In Figure 3, the intermediate inactivated surface (6) with antimicrobial coating is shown, and the intermediate inactivated surface (6) is the separator, air flow regulator, support connection surface between the pre-filter (4) and the sanitation cell (10) . The air inlet space (8) on the surface allows the pre-filtered air to pass into the sanitation cell (10) . In this air inlet space (8) , there is a smaller sized Cu, Zn and colloidal Ag doped granular activated carbon- containing antimicrobial air filter (7) treated when the prefilter (4) providing adsorption containing Cu, Zn and colloidal Ag coated antimicrobial and catalytic material is not used, and it is shown in Figure 3. The air flow pathway (2) passes over the intermediate inactivated surface (6) .

[0049] Figure 4 shows the air drawing fan (9) (suction fan) that facilitates breathing at the airway entrance of the mask. In this way, flow is provided through the airway regardless of the breathing rate. As shown in Figure 4, the air drawing fan (9) is placed in the air inlet space (8) on the intermediate inactivated surface (6) .

[0050] As can be understood from the air flow pathway (2) shown in Figure 5, the sanitation cell (10) of the said embodiment is a single layer and maze structure extending from the air / breath inlet to the air / breath outlet rather than a layered structure. In this way, it provides ease of use and breathing comfort since it is light. The sanitation cell (10) of the said embodiment consists of 4 UV led lamps (14) with ozone-free UV-C ray wavelength, nanosized titanium dioxide coated inactivated surface (11) and UV-C radiation attenuating black ray trap (12) . As shown in Figure 5, the UV-C radiation attenuating black ray trap (12) (light trap) is positioned at the outlet of the sanitation cell (10) to protect the user from the destructive effects of UV-C radiation.

[0051] The power unit providing the energy required for the sanitation cell (10) comprises a power setting circuit (13) , a rechargeable battery (16) and a micro usb charging section (15) .Figure 6 shows the on / off button (18) for UV-C and micro USB charging port (17) .

[0052] There is a structure (19) with a soft surface that covers the nose and mouth structure of the user under the sanitation cell (10) .

[0053] Figure 7 shows the inner surface of the mask of the embodiment. The soft structure (19) surrounding the face lines of the user includes a one-way air inlet valve (20) that can be opened to the breath direction.

[0054] Figure 8 shows the air outlet pathway on the structure (19) . For this, there is an outlet port where the air is discharged, which includes a one-way air outlet valve (21) that can be opened in the direction of the air / breath outlet.

[0055] The air drawn into the cell by following the air flow pathway (2) from the intermediate inactivated surface (6) given in Figure 3 follows the air flow pathway (2) (air path) in the sanitation cell (10) shown in figure 5 and it is directed from the one-way air inlet valve (20) shown in Figure 7 to the air flow pathway (2) .

[0056] The antibacterial effect of copper and zinc ions, especially silver ions, has been studied for many years and its effectiveness has been observed. Pre-filter (4) with activated carbon content coated with copper, zinc and colloidal silver doped antimicrobial material shown in Figure 2 stops the development of microorganisms remaining in the mask during the passive process (when the mask is not used, when the sanitation system is not working) and when the system is restarted, it prevents these microorganisms from being released into the air. In addition, the contamination that may occur as a result of passive diffusion of the air flow will be inactivated at the mask entrance and will not put the person at risk when use begins. This eliminates the need for protective cover.

[0057] If desired, the mask of the invention can operate with 100% inactivation in practice even without this antiseptic (germicidal) Cu, Zn and colloidal Ag doped activated carbon pre-filter (4) thanks to the photocatalytic sanitation cell (10) .

[0058] Unlike the masks in the art that provide photolytic inactivation, photocatalytic inactivation (TiCh-UV system) processes offer more reliable sterilization. The photocatalytic system (TiCk-UV system) is a self-cleaning, disinfecting system that improves the air and hygienic conditions of the environment in which it is used. Anatase phase, which is a phase of TiCh in nanometer size, was formed on UV light contact surfaces. This phase has a photocatalytic effect. When photocatalytic systems are exposed to ultraviolet radiation, they decompose by chemical reaction and release active oxygen . It is capable of removing bacteria and removing air from unwanted odors and harmful gases by oxidation, degradation and super oxidation of organic substances in active oxygen .

[0059] In the invention developed, C class UV led lamps ( 14 ) are used and the sanitation surface is coated with TiCh to remove microorganisms in the air by providing photocatalytic inactivation .

[0060] TiO2 is the most preferred semiconductor in the literature because it is low-cost and stable and turns organic compounds into harmless compounds such as O2 , water and CO2 under UV radiation and is widely used for disinfection .

[0061] In one embodiment of the invention, the inner-outer surface and all parts are coated with copper, zinc and colloidal silver doped antimicrobial material .

[0062] Zinc, copper and / or colloidal silver doped antimicrobial material dye was used on the outer surface of an embodiment of the invention .

[0063] With the present invention, a comfortable and reliable antimicrobial protective face mask has been developed in order to be protected from pathogens and aerosols released by the infected person by inhalation directly into the indoor environment . This mask provides ease of use and breathing for health personnel working with high risk, patients and individuals in risk groups ( over 65 years of age , respiratory disease , heart disease , etc . ) .

[0064] Thanks to the invention, high protection is provided by inactivating the microorganisms that can attach to the mask surface on site. Since the microorganism is inactivated on and inside the mask surface, it does not create any risk of infection that may occur as a result of contact with the mask.

[0065] The developed mask provides durable and long-lasting use. Thanks to the sanitation system in the mask, the mask sterilizes itself. In this way, there is no risk of infection during disposal after use.

[0066] The developed mask does not make it difficult to breathe thanks to the one-way air inlet valve (20) and the one-way air outlet valve (21) on the airway. Thanks to this airway, the mask sanitation cell (10) is protected from moisture and provides user convenience. In this way, it is separated from layered face masks.

[0067] The invention does not create health drawbacks for allergic bodies and skin prone to atopy.

[0068] The invention provides ease of use with its structure (19) that grips the nose and mouth of the user and its adjustable hangers fixed to the head.

[0069] In addition to inactivating the virus and bacteria carried by the infected person, the invention also ensures the retention of bad odors and gases in the environment thanks to the active carbon filter it contains.

[0070] In the invention, the sanitation cell (10) is easy to charge with the micro USB charging section (15) and has been developed to be usable again and again. The mask, which is the subj ect of the invention, has been developed in a fast rechargeable manner with a portable power bank .

[0071] The personal protective antimicrobial face mask of the invention is suitable for use by all individuals at risk to protect public health . Apart from this , it has a large area of use for health personnel working with high risk, clinical applications , microbial research and private public laboratories conducting disinfection and sterili zation research .

[0072] Contrary to the technical documents , UV-C radiation that will not produce ozone is used in the mask subj ect to the invention . In the said invention, the photocatalytic system is actively used . When the mask is in use , the catalyst UV-C radiation photocatalytic system operates actively . The transition surfaces on the airway are catalytic coated, and the granular activated carbon filter is based on Cu, Zn and colloidal Ag to act as both antimicrobial and catalytic adsorption . In addition, the photolytic system has a photocatalytic inactivation mechanism that will prevent reproduction .

[0073] The face mask subj ect to the invention has a light trap ( light trap ) to eliminate the ef fects of UV radiation and UV-C led lamps ( 14 ) in wavelength that will not produce ozone . In this way, it of fers safe and practically 100% ef fective inactivation to the user . The photolytic and photocatalytic system used in the invention operates actively . The invention eliminates all deficiencies in the literature by photocatalytic inactivation with a catalytic adsorption filter with Cu, Zn and colloidal Ag doped activated carbon content that has an antiseptic ( germicidal ) ef fect on microorganisms such as viruses, bacteria, molds, etc., at least one UV led lamp (14) that does not produce ozone with a UV-C ray wavelength, UV-C radiation attenuating black ray trap (12) , and a titanium dioxide coated inactivated surface (11) which is the contact path of the UV-C radiation.

[0074] In summary, the invention is a high-technology antimicrobial protective face mask as personal protective equipment and has an air cleaning system that will also act against particles and harmful gases in the environment and comprises the following: an outer cover (1) , a pre-filter (4) which is optionally removable and consisting of two layers in the form of an antimicrobial and catalytic granular activated carbon containing zinc, copper and colloidal silver and a pure granular activated carbon and placed between the outer cover (1) and intermediate inactivated surface (6) to provide catalytic adsorption and to eliminate damage in the air and / or an air filter (7) placed in the air inlet space (8) consisting of two layers in the form of an antimicrobial and catalytic granular activated carbon containing zinc, copper and colloidal silver and a pure granular activated carbon, air drawing fan (9) (suction fan) that facilitates breathing, a sanitation cell (10) comprising a UV led lamp (14) with UV-C wavelength that does not produce ozone to provide photocatalytic inactivation, a nanometer-sized titanium dioxide coated inactivated surface (11) which is the contact path of the UV-C ray, and a power unit, an intermediate inactivated surface (6) between the outer cover (1) and the sanitation cell (10) , including an air inlet space (8) on its surface to pass the air passing through the outer cover (1) to the sanitation cell (10) , a structure (19) under the sanitation cell (10) , covering at least a part of the user's mouth and / or nose and an outlet port on said structure (19) for easy discharge of the air in the mask in different ways and all other mask surfaces coated with zinc, copper and colloidal silver-containing antimicrobial agent and / or painted with such antimicrobial agent containing dye .

[0075] Description of the Figures

[0076] Figure 1 : View of the outer cover of the mask of the invention Figure 2 : View of the antimicrobial prefilter of the mask of the invention

[0077] Figure 3 : View of the antimicrobial coated intermediate inactivated surface of the mask of the invention

[0078] Figure 4 : View of the air drawing fan of the mask of the invention

[0079] Figure 5 : View of the sanitation cell of the mask of the invention

[0080] Figure 6 : Another view of the sanitation cell of the mask of the invention

[0081] Figure 7 : View of the inner surface of the mask of the invention

[0082] Figure 8 : View of the mask air outlet of the mask of the invention

[0083] Descriptions for Reference Numbers in Figures

[0084] 1 . Outer cover

[0085] 2 . Air flow pathway

[0086] 3. Suction holes

[0087] 4 . Prefilter

[0088] 5 . Air flow channels

[0089] 6. Intermediate inactivated surface

[0090] 7 . Air filter

[0091] 8 . Air inlet space

[0092] 9. Air drawing fan

[0093] 10 . Sanitation Cell

[0094] 11 . Inactivated surface

[0095] 12 . UV-C radiation attenuating black ray trap 13. Power setting circuit

[0096] 14. UV led lamp

[0097] 15. Micro USB charging section

[0098] 16. Rechargeable battery 17. Micro USB charging port

[0099] 18. On / off button

[0100] 19. Structure

[0101] 20. One-way air intake valve

[0102] 21. One-way air outlet valve

Claims

CLAIMS1. An antimicrobial protective face mask comprising:- an outer cover (1) for air to enter the mask,- a pre-filter (4) with granular activated carbon containing antimicrobial and catalytic agent, optionally removable and being placed between the outer cover (1) and an intermediate inactivated surface (6) to provide catalytic adsorption and / or an air filter (7) with granular activated carbon containing antimicrobial and catalytic agent being placed in an air inlet space (8) for providing protection such that even when the pre-filter (4) is not used,- an air drawing fan (9) for facilitating inhalation,- a sanitation cell (10) comprising at least one UV led lamp (14) with a UV-C ray wavelength for providing photocatalytic inactivation, UV-C radiation attenuating black ray trap (12) , a titanium dioxide coated inactivated surface (11) which is a contact path of the UV-C ray and a power unit,- the intermediate inactivated surface (6) between the outer cover (1) and the sanitation cell (10) , including the air inlet space (8) on its surface for proceeding air passing through the outer cover (1) to the sanitation cell (10) ,- a structure (19) under the sanitation cell (10) , being covering at least a portion of an user's mouth and / or nose, and- an outlet port on the structure (19) for discharging of air drawn into the mask in a different way.

2. The mask according to claim 1, wherein the outer cover (1) comprises suction holes (3) for allowing air to enter the mask .

3. The mask according to claim 1, wherein the pre-filter (4) and the air filter (7) comprises two layers as,- a first layer comprising granular activated carbon containing antimicrobial and catalytic agent doped with copper, zinc and / or colloidal silver for providing microbial inactivation; and- a second layer comprising an additive-free granular activated carbon filter for acting against harmful gases in the environment.

4. The mask according to claim 1, wherein the pre-filter (4) has a cartridge model.

5. The mask according to claim 1, wherein the intermediate inactivated surface (6) is a separator and support connection surface between the pre-filter (4) and the sanitation cell (10) .

6. The mask according to claim 1, wherein it comprises air flow channels (5) on the intermediate inactivated surface (6) for regulating the air flow.

7. The mask according to claim 1, wherein the titanium dioxide is nanosized.

8. The mask according to claim 1, wherein the UV led lamp (14) has a mercury-free ozone-free UV-C wavelength.

9. The mask according to claim 8, wherein the UV led lamp (14) is 4 pieces.

10. The mask according to claim 1, wherein the power unit comprises a power setting circuit (13) , a rechargeablebattery (16) and a micro usb charging section (15) and an on / off button (18) for UV-C. . The mask according to claim 1, wherein the sanitation cell (10) is a single layer and maze structure extending from the breath air inlet to the breath air outlet. . The mask according to claim 1, wherein the structure (19) comprises a one-way air inlet valve (20) such that it can be opened to a breath inlet direction. . The mask according to claim 1, wherein the outlet port comprises a one-way air outlet valve (21) such that it allows air, formed as a result of inhalation, drawn into the mask and to be discharged in a different way. . The mask according to claim 1, wherein a inner surface, an outer surface and all parts of the mask are covered with zinc, copper and / or colloidal silver doped antimicrobial material . . The mask according to claim 1 or 14, wherein it comprises zinc, copper and / or colloidal silver doped antimicrobial material dye on its outer surface. . The mask according to claim 1, wherein it comprises adjustable hangers secured to head of the user. . The mask according to claim 1, wherein the UV-C radiation attenuating black ray trap (12) , for providing with a safe use for UV rays, is located at an outlet of the sanitation cell (10) .The mask according to claim 1, wherein the structure (19) comprises an inner surface covering the nose and mouth of the user.

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