Gas nozzle for substrate processing equipment

JP1746467SPending Publication Date: 2026-06-22KOKUSAI DENKI KK
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Patent Information

Authority / Receiving Office
JP · JP
Patent Type
Designs
Current Assignee / Owner
KOKUSAI DENKI KK
Filing Date
2023-01-25
Publication Date
2026-06-22

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Patent Text Reader

Abstract

The present invention relates to a gas supply nozzle used in a substrate processing apparatus that processes substrates held vertically in multiple stages inside a reaction tube. The present design features a cylindrical nozzle with gas supply ports provided at equal intervals on its side wall.
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